JPS5247688A - Process for production of semiconductor device - Google Patents
Process for production of semiconductor deviceInfo
- Publication number
- JPS5247688A JPS5247688A JP12390975A JP12390975A JPS5247688A JP S5247688 A JPS5247688 A JP S5247688A JP 12390975 A JP12390975 A JP 12390975A JP 12390975 A JP12390975 A JP 12390975A JP S5247688 A JPS5247688 A JP S5247688A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- plating
- prevented
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 238000007747 plating Methods 0.000 abstract 3
- 230000002159 abnormal effect Effects 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12390975A JPS5247688A (en) | 1975-10-15 | 1975-10-15 | Process for production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12390975A JPS5247688A (en) | 1975-10-15 | 1975-10-15 | Process for production of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5247688A true JPS5247688A (en) | 1977-04-15 |
| JPS5731661B2 JPS5731661B2 (enExample) | 1982-07-06 |
Family
ID=14872332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12390975A Granted JPS5247688A (en) | 1975-10-15 | 1975-10-15 | Process for production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5247688A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582044A (ja) * | 1981-06-26 | 1983-01-07 | Seiko Epson Corp | 半導体装置の製造方法 |
| JPH023228A (ja) * | 1987-12-28 | 1990-01-08 | Texas Instr Inc <Ti> | 平坦化せれた、選択的なタングステン金属処理層システム |
-
1975
- 1975-10-15 JP JP12390975A patent/JPS5247688A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS582044A (ja) * | 1981-06-26 | 1983-01-07 | Seiko Epson Corp | 半導体装置の製造方法 |
| JPH023228A (ja) * | 1987-12-28 | 1990-01-08 | Texas Instr Inc <Ti> | 平坦化せれた、選択的なタングステン金属処理層システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5731661B2 (enExample) | 1982-07-06 |
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