JPS5248974A - Process for production of diffusion type semiconductor device - Google Patents

Process for production of diffusion type semiconductor device

Info

Publication number
JPS5248974A
JPS5248974A JP12491475A JP12491475A JPS5248974A JP S5248974 A JPS5248974 A JP S5248974A JP 12491475 A JP12491475 A JP 12491475A JP 12491475 A JP12491475 A JP 12491475A JP S5248974 A JPS5248974 A JP S5248974A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
type semiconductor
diffusion type
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12491475A
Other languages
Japanese (ja)
Other versions
JPS6011459B2 (en
Inventor
Hirotake Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP50124914A priority Critical patent/JPS6011459B2/en
Publication of JPS5248974A publication Critical patent/JPS5248974A/en
Publication of JPS6011459B2 publication Critical patent/JPS6011459B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE: To prevent step-cutting of wiring metal layers, by making the oxide film layers on a diffusion resistance layer for prevention of concentration of emitter current and on a base diffusion layer nearly the same.
COPYRIGHT: (C)1977,JPO&Japio
JP50124914A 1975-10-17 1975-10-17 Method for manufacturing a diffused semiconductor device Expired JPS6011459B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50124914A JPS6011459B2 (en) 1975-10-17 1975-10-17 Method for manufacturing a diffused semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50124914A JPS6011459B2 (en) 1975-10-17 1975-10-17 Method for manufacturing a diffused semiconductor device

Publications (2)

Publication Number Publication Date
JPS5248974A true JPS5248974A (en) 1977-04-19
JPS6011459B2 JPS6011459B2 (en) 1985-03-26

Family

ID=14897232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50124914A Expired JPS6011459B2 (en) 1975-10-17 1975-10-17 Method for manufacturing a diffused semiconductor device

Country Status (1)

Country Link
JP (1) JPS6011459B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746821U (en) * 1980-09-01 1982-03-16
JPH08306959A (en) * 1995-09-29 1996-11-22 Rohm Co Ltd Surface mounting type chip light-emitting device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5024593A (en) * 1973-07-03 1975-03-15

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5024593A (en) * 1973-07-03 1975-03-15

Also Published As

Publication number Publication date
JPS6011459B2 (en) 1985-03-26

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