JPS52112280A - X-ray exposure mask - Google Patents

X-ray exposure mask

Info

Publication number
JPS52112280A
JPS52112280A JP2882976A JP2882976A JPS52112280A JP S52112280 A JPS52112280 A JP S52112280A JP 2882976 A JP2882976 A JP 2882976A JP 2882976 A JP2882976 A JP 2882976A JP S52112280 A JPS52112280 A JP S52112280A
Authority
JP
Japan
Prior art keywords
exposure mask
ray exposure
prescribed
secure
constituting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2882976A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5746648B2 (enExample
Inventor
Takayuki Matsukawa
Hiroshi Koyama
Tadao Kato
Satoru Kawazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2882976A priority Critical patent/JPS52112280A/ja
Publication of JPS52112280A publication Critical patent/JPS52112280A/ja
Publication of JPS5746648B2 publication Critical patent/JPS5746648B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2882976A 1976-03-17 1976-03-17 X-ray exposure mask Granted JPS52112280A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2882976A JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2882976A JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Publications (2)

Publication Number Publication Date
JPS52112280A true JPS52112280A (en) 1977-09-20
JPS5746648B2 JPS5746648B2 (enExample) 1982-10-05

Family

ID=12259267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2882976A Granted JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Country Status (1)

Country Link
JP (1) JPS52112280A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743420A (en) * 1980-08-29 1982-03-11 Hitachi Ltd Mask alignment method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (enExample) * 1972-06-29 1974-06-10
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
JPS5278375A (en) * 1975-12-25 1977-07-01 Fujitsu Ltd Aligning method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (enExample) * 1972-06-29 1974-06-10
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
JPS5278375A (en) * 1975-12-25 1977-07-01 Fujitsu Ltd Aligning method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743420A (en) * 1980-08-29 1982-03-11 Hitachi Ltd Mask alignment method

Also Published As

Publication number Publication date
JPS5746648B2 (enExample) 1982-10-05

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