JPS5278375A - Aligning method - Google Patents
Aligning methodInfo
- Publication number
- JPS5278375A JPS5278375A JP50153972A JP15397275A JPS5278375A JP S5278375 A JPS5278375 A JP S5278375A JP 50153972 A JP50153972 A JP 50153972A JP 15397275 A JP15397275 A JP 15397275A JP S5278375 A JPS5278375 A JP S5278375A
- Authority
- JP
- Japan
- Prior art keywords
- aligning method
- diffracted
- rays
- mask
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To improve production process considerably by performing relative alignment of water and mask using diffracted X-rays.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50153972A JPS5278375A (en) | 1975-12-25 | 1975-12-25 | Aligning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50153972A JPS5278375A (en) | 1975-12-25 | 1975-12-25 | Aligning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5278375A true JPS5278375A (en) | 1977-07-01 |
Family
ID=15574091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50153972A Pending JPS5278375A (en) | 1975-12-25 | 1975-12-25 | Aligning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5278375A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112280A (en) * | 1976-03-17 | 1977-09-20 | Mitsubishi Electric Corp | X-ray exposure mask |
JPS55113330A (en) * | 1979-02-23 | 1980-09-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | X-ray exposure system and device |
JPH02309A (en) * | 1987-12-29 | 1990-01-05 | Canon Inc | Mask for x-ray and light exposing method using it |
JPH05206011A (en) * | 1991-10-11 | 1993-08-13 | Internatl Business Mach Corp <Ibm> | Apparatus and method for alignment of x-ray lithographic system |
-
1975
- 1975-12-25 JP JP50153972A patent/JPS5278375A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52112280A (en) * | 1976-03-17 | 1977-09-20 | Mitsubishi Electric Corp | X-ray exposure mask |
JPS5746648B2 (en) * | 1976-03-17 | 1982-10-05 | ||
JPS55113330A (en) * | 1979-02-23 | 1980-09-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | X-ray exposure system and device |
JPH02309A (en) * | 1987-12-29 | 1990-01-05 | Canon Inc | Mask for x-ray and light exposing method using it |
JPH05206011A (en) * | 1991-10-11 | 1993-08-13 | Internatl Business Mach Corp <Ibm> | Apparatus and method for alignment of x-ray lithographic system |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5252871A (en) | Method of treating exhaust gas | |
JPS5278375A (en) | Aligning method | |
JPS5230170A (en) | Method of photoetching | |
JPS52182A (en) | Method of forming planar type fet electrodes | |
JPS51143633A (en) | Process for preparation of novel epoxy compounds | |
JPS5212476A (en) | Production method of gapped ascr | |
JPS51151073A (en) | Method to adjust the position of an mask for an integrated circuit | |
JPS5239622A (en) | Process for preparation of methacrylic acid | |
JPS5259112A (en) | Process for preparation of delta-substituted negamycine derivatives | |
JPS521957A (en) | Process and apparatus for treating sewage water | |
JPS5217261A (en) | Waste water treating device | |
JPS5279664A (en) | Forming method for electrodes of semiconductor devices | |
JPS51137191A (en) | Method of removing flaws from steel piece | |
JPS5219616A (en) | Process for preparation of amides | |
JPS51125356A (en) | Process for preparing 4-hydroxycyclopent -2-ene-1-one | |
JPS5236843A (en) | Method for treating water | |
JPS5221692A (en) | Production method of e shape sleeve | |
JPS51132195A (en) | Process for production of soluble basic aluminum salt | |
JPS51147190A (en) | Method of manufacturing of integurated circuit for lsi | |
JPS5225706A (en) | Process for preparation of long chain unsaturated alkylether | |
JPS523431A (en) | Video correcting method | |
JPS51125952A (en) | Apparatus for collecting precipitates of sewage etc. | |
JPS51115439A (en) | Method for preparing 3-hydroxyphenetylamine-2-carboxylic acid | |
JPS51119578A (en) | Method of controlling processing size | |
JPS5239252A (en) | Aligning method of baggages and apparatus therefor |