JPS51117588A - Manufacturing method of semiconductor equipment - Google Patents
Manufacturing method of semiconductor equipmentInfo
- Publication number
- JPS51117588A JPS51117588A JP50042184A JP4218475A JPS51117588A JP S51117588 A JPS51117588 A JP S51117588A JP 50042184 A JP50042184 A JP 50042184A JP 4218475 A JP4218475 A JP 4218475A JP S51117588 A JPS51117588 A JP S51117588A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- semiconductor equipment
- semiconductor
- equipment
- accommodate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/90—Masterslice integrated circuits
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50042184A JPS51117588A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50042184A JPS51117588A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51117588A true JPS51117588A (en) | 1976-10-15 |
JPS5753983B2 JPS5753983B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-11-16 |
Family
ID=12628903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50042184A Granted JPS51117588A (en) | 1975-04-09 | 1975-04-09 | Manufacturing method of semiconductor equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51117588A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005723A1 (de) * | 1978-05-25 | 1979-12-12 | International Business Machines Corporation | Hochintegrierte Halbleiterschaltung und Verfahren zu ihrer Herstellung |
FR2443185A1 (fr) * | 1978-11-30 | 1980-06-27 | Ibm | Topologie de circuits integres semi-conducteurs et procede pour l'obtention de cette topologie |
JPH04218943A (ja) * | 1991-04-19 | 1992-08-10 | Toshiba Corp | 1チップlsiの製造方法 |
JPH10150083A (ja) * | 1988-05-16 | 1998-06-02 | Glenn J Leedy | 集積回路の製作および試験方法 |
-
1975
- 1975-04-09 JP JP50042184A patent/JPS51117588A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005723A1 (de) * | 1978-05-25 | 1979-12-12 | International Business Machines Corporation | Hochintegrierte Halbleiterschaltung und Verfahren zu ihrer Herstellung |
FR2443185A1 (fr) * | 1978-11-30 | 1980-06-27 | Ibm | Topologie de circuits integres semi-conducteurs et procede pour l'obtention de cette topologie |
JPH10150083A (ja) * | 1988-05-16 | 1998-06-02 | Glenn J Leedy | 集積回路の製作および試験方法 |
JPH04218943A (ja) * | 1991-04-19 | 1992-08-10 | Toshiba Corp | 1チップlsiの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS5753983B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK138770B (da) | Fremgangsmåde til fremstilling og fotoresistafmaskning af et dielektrisk isoleret, integreret halvlederkredsløb. | |
IT7925850A0 (it) | Apparecchiatura per provare circuiti semiconduttori integrati. | |
JPS52117564A (en) | Device for treating computerrcontrolled semiconductor wafer | |
GB1542572A (en) | Method of etching a semiconductor substrate | |
JPS5272176A (en) | Method of manufacturing semiconductor device using multilayer resist mask | |
JPS51124381A (en) | Method of manufacturing semiconductor device using twoolayer mask | |
EP0121412A3 (en) | Method of forming by projection an integrated circuit pattern on a semiconductor wafer | |
GB1557961A (en) | Semiconductor circuits | |
JPS51130183A (en) | Semiconductor ic and its process | |
JPS51117588A (en) | Manufacturing method of semiconductor equipment | |
JPS5232273A (en) | Method of manufacturing flat conductor system for semiconductor integrated circuit | |
JPS51142988A (en) | Semiconductor devices | |
JPS522173A (en) | Semiconductor integrated circuit | |
JPS51126083A (en) | Manufacturing method of semi-conductor equpment | |
JPS51113478A (en) | The manufacturing method of semiconductor device | |
JPS51121272A (en) | Manufacturing method for semiconductor devices | |
JPS51134587A (en) | Production method of semiconductor integrated-circuit device | |
JPS5210080A (en) | Method for manufacturing semiconductor device | |
JPS53119692A (en) | Semiconductor logic circuit device | |
JPS51113461A (en) | A method for manufacturing semiconductor devices | |
JPS5242365A (en) | Tool for semiconductors | |
JPS5264274A (en) | Wafer soldering device for semiconductor devices | |
GB1557010A (en) | Logic for a semiconductor integrated circuit | |
JPS51115777A (en) | Manufacturing method of a semiconductor apparatus | |
JPS51117587A (en) | Logical change method of logical circuit |