JPS50117809A - - Google Patents

Info

Publication number
JPS50117809A
JPS50117809A JP1617175A JP1617175A JPS50117809A JP S50117809 A JPS50117809 A JP S50117809A JP 1617175 A JP1617175 A JP 1617175A JP 1617175 A JP1617175 A JP 1617175A JP S50117809 A JPS50117809 A JP S50117809A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1617175A
Other languages
Japanese (ja)
Other versions
JPS5753308B2 (US20080094685A1-20080424-C00004.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH170374A external-priority patent/CH589723A5/de
Priority claimed from CH170474A external-priority patent/CH593345A5/de
Application filed filed Critical
Publication of JPS50117809A publication Critical patent/JPS50117809A/ja
Publication of JPS5753308B2 publication Critical patent/JPS5753308B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36Carbonitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP1617175A 1974-02-07 1975-02-07 Expired JPS5753308B2 (US20080094685A1-20080424-C00004.png)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH170374A CH589723A5 (en) 1974-02-07 1974-02-07 Depositing carbide, nitride and carbonitride coatings - on inorg. substrates by using cyano cpds. as sources of carbon and nitrogen
CH170474A CH593345A5 (en) 1974-02-07 1974-02-07 Depositing carbide, nitride and carbonitride coatings - on inorg. substrates by using cyano cpds. as sources of carbon and nitrogen

Publications (2)

Publication Number Publication Date
JPS50117809A true JPS50117809A (US20080094685A1-20080424-C00004.png) 1975-09-16
JPS5753308B2 JPS5753308B2 (US20080094685A1-20080424-C00004.png) 1982-11-12

Family

ID=25688425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1617175A Expired JPS5753308B2 (US20080094685A1-20080424-C00004.png) 1974-02-07 1975-02-07

Country Status (6)

Country Link
JP (1) JPS5753308B2 (US20080094685A1-20080424-C00004.png)
AT (1) AT332697B (US20080094685A1-20080424-C00004.png)
CA (1) CA1047899A (US20080094685A1-20080424-C00004.png)
FR (1) FR2273080B1 (US20080094685A1-20080424-C00004.png)
GB (1) GB1489102A (US20080094685A1-20080424-C00004.png)
SE (1) SE410743B (US20080094685A1-20080424-C00004.png)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124904A (US20080094685A1-20080424-C00004.png) * 1974-03-20 1975-10-01
JP2005330642A (ja) * 2004-05-17 2005-12-02 Braecker Ag リングトラベラーとこの製造方法
JP2009511283A (ja) * 2005-10-15 2009-03-19 ケンナメタル ヴィディア プロドゥクツィオーンス ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト 被覆された基材成形体の製造法、被覆を有する基材成形体及び被覆された基材成形体の使用
JP2011166160A (ja) * 2011-03-22 2011-08-25 Tokyo Electron Ltd 積層膜の形成方法
CN109243654A (zh) * 2018-10-10 2019-01-18 镇江华核装备有限公司 一种核泄漏应急用屏蔽服的制备工艺
JP2022501514A (ja) * 2018-09-28 2022-01-06 コーニング インコーポレイテッド 金属基板上に無機粒子を堆積させるための低温法及びこの低温法によって製造される物品

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2227755B (en) * 1988-12-08 1993-03-10 Univ Hull A process for improving the wear and corrosion resistance of metallic components

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124904A (US20080094685A1-20080424-C00004.png) * 1974-03-20 1975-10-01
JP2005330642A (ja) * 2004-05-17 2005-12-02 Braecker Ag リングトラベラーとこの製造方法
JP4587104B2 (ja) * 2004-05-17 2010-11-24 ブレッカー アクチェンゲゼルシャフト リングトラベラーとこの製造方法
JP2009511283A (ja) * 2005-10-15 2009-03-19 ケンナメタル ヴィディア プロドゥクツィオーンス ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト 被覆された基材成形体の製造法、被覆を有する基材成形体及び被覆された基材成形体の使用
JP2011166160A (ja) * 2011-03-22 2011-08-25 Tokyo Electron Ltd 積層膜の形成方法
JP2022501514A (ja) * 2018-09-28 2022-01-06 コーニング インコーポレイテッド 金属基板上に無機粒子を堆積させるための低温法及びこの低温法によって製造される物品
US11939670B2 (en) 2018-09-28 2024-03-26 Corning Incorporated Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same
CN109243654A (zh) * 2018-10-10 2019-01-18 镇江华核装备有限公司 一种核泄漏应急用屏蔽服的制备工艺

Also Published As

Publication number Publication date
GB1489102A (en) 1977-10-19
JPS5753308B2 (US20080094685A1-20080424-C00004.png) 1982-11-12
CA1047899A (en) 1979-02-06
FR2273080B1 (US20080094685A1-20080424-C00004.png) 1977-09-16
AT332697B (de) 1976-10-11
FR2273080A1 (US20080094685A1-20080424-C00004.png) 1975-12-26
ATA92375A (de) 1976-01-15
DE2505009B2 (de) 1977-06-30
SE410743B (sv) 1979-10-29
SE7501315L (US20080094685A1-20080424-C00004.png) 1975-08-08
DE2505009A1 (de) 1975-08-14

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