JPH1194756A5 - - Google Patents
Info
- Publication number
- JPH1194756A5 JPH1194756A5 JP1997258559A JP25855997A JPH1194756A5 JP H1194756 A5 JPH1194756 A5 JP H1194756A5 JP 1997258559 A JP1997258559 A JP 1997258559A JP 25855997 A JP25855997 A JP 25855997A JP H1194756 A5 JPH1194756 A5 JP H1194756A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- observation unit
- inspected
- objective lens
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25855997A JP3944285B2 (ja) | 1997-09-24 | 1997-09-24 | 基板検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25855997A JP3944285B2 (ja) | 1997-09-24 | 1997-09-24 | 基板検査装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1194756A JPH1194756A (ja) | 1999-04-09 |
| JPH1194756A5 true JPH1194756A5 (enExample) | 2005-06-16 |
| JP3944285B2 JP3944285B2 (ja) | 2007-07-11 |
Family
ID=17321920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25855997A Expired - Fee Related JP3944285B2 (ja) | 1997-09-24 | 1997-09-24 | 基板検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3944285B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4673953B2 (ja) * | 2000-03-21 | 2011-04-20 | オリンパス株式会社 | マクロ照明装置 |
| JP2002098641A (ja) * | 2000-09-21 | 2002-04-05 | Olympus Optical Co Ltd | 大型基板検査装置 |
| TWI264532B (en) * | 2001-11-05 | 2006-10-21 | Olympus Corp | Substrate inspection device |
| JP4517574B2 (ja) * | 2002-11-26 | 2010-08-04 | 凸版印刷株式会社 | カラーフィルタ評価方法 |
| JP2006038825A (ja) * | 2004-01-22 | 2006-02-09 | Ntn Corp | 微細パターン観察装置およびそれを用いた微細パターン修正装置 |
| JP2008082705A (ja) * | 2006-09-25 | 2008-04-10 | Olympus Corp | 透過照明ステージおよび基板検査装置 |
| CN101852744B (zh) * | 2009-03-30 | 2012-11-21 | 松下电器产业株式会社 | 拍摄检查装置及拍摄检查方法 |
| JP4762351B2 (ja) * | 2009-03-30 | 2011-08-31 | パナソニック株式会社 | 撮像検査装置および撮像検査方法 |
| CN104656682B (zh) * | 2014-12-30 | 2017-07-14 | 中国科学院长春光学精密机械与物理研究所 | 一种宏微两级驱动精密定位机构 |
| CN109239068B (zh) * | 2018-09-13 | 2021-04-16 | 山东大学 | 一种针对宏微运动平台的视觉检测装置及方法 |
| KR102242093B1 (ko) * | 2019-07-30 | 2021-04-20 | (주)샘테크 | 메탈 마스크 검사 장치 |
-
1997
- 1997-09-24 JP JP25855997A patent/JP3944285B2/ja not_active Expired - Fee Related
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