JPH1184632A - ペリクルの管理装置、投影露光装置および投影露光方法 - Google Patents

ペリクルの管理装置、投影露光装置および投影露光方法

Info

Publication number
JPH1184632A
JPH1184632A JP24842597A JP24842597A JPH1184632A JP H1184632 A JPH1184632 A JP H1184632A JP 24842597 A JP24842597 A JP 24842597A JP 24842597 A JP24842597 A JP 24842597A JP H1184632 A JPH1184632 A JP H1184632A
Authority
JP
Japan
Prior art keywords
pellicle
reticle
information
detecting
management device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP24842597A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1184632A5 (enExample
Inventor
Kanefumi Nakahara
兼文 中原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP24842597A priority Critical patent/JPH1184632A/ja
Publication of JPH1184632A publication Critical patent/JPH1184632A/ja
Publication of JPH1184632A5 publication Critical patent/JPH1184632A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP24842597A 1997-09-12 1997-09-12 ペリクルの管理装置、投影露光装置および投影露光方法 Withdrawn JPH1184632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24842597A JPH1184632A (ja) 1997-09-12 1997-09-12 ペリクルの管理装置、投影露光装置および投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24842597A JPH1184632A (ja) 1997-09-12 1997-09-12 ペリクルの管理装置、投影露光装置および投影露光方法

Publications (2)

Publication Number Publication Date
JPH1184632A true JPH1184632A (ja) 1999-03-26
JPH1184632A5 JPH1184632A5 (enExample) 2005-10-13

Family

ID=17177940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24842597A Withdrawn JPH1184632A (ja) 1997-09-12 1997-09-12 ペリクルの管理装置、投影露光装置および投影露光方法

Country Status (1)

Country Link
JP (1) JPH1184632A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010700A (ja) * 2003-06-23 2005-01-13 Toppan Printing Co Ltd 露光用原板の検査装置及び検査方法
JP2006133411A (ja) * 2004-11-04 2006-05-25 Toppan Printing Co Ltd フォトマスク配送管理システム及びフォトマスク配送管理方法
KR20130094682A (ko) 2012-02-16 2013-08-26 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
US11635681B2 (en) 2015-02-03 2023-04-25 Asml Netherlands B.V. Mask assembly and associated methods
US11868041B2 (en) * 2017-05-10 2024-01-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010700A (ja) * 2003-06-23 2005-01-13 Toppan Printing Co Ltd 露光用原板の検査装置及び検査方法
JP2006133411A (ja) * 2004-11-04 2006-05-25 Toppan Printing Co Ltd フォトマスク配送管理システム及びフォトマスク配送管理方法
KR20130094682A (ko) 2012-02-16 2013-08-26 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
US11635681B2 (en) 2015-02-03 2023-04-25 Asml Netherlands B.V. Mask assembly and associated methods
US11868041B2 (en) * 2017-05-10 2024-01-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Similar Documents

Publication Publication Date Title
JP3412193B2 (ja) 露光装置
JP7517155B2 (ja) マスクアダプタ、マスクアダプタ取付工具、露光装置、およびデバイス製造方法
KR20010075434A (ko) 피크-앤-플레이스 로봇 내에서 소자를 검사하는 방법
KR100788055B1 (ko) 기판 결함 검출 장치 및 방법과 기판 식별 번호 검출 방법
KR19990023632A (ko) 기판관리장치 및 기판수납장치
JPH1184632A (ja) ペリクルの管理装置、投影露光装置および投影露光方法
TW417158B (en) Method and device for positioning mask and workpiece
JP5071109B2 (ja) レチクル搬送装置、露光装置、レチクル搬送方法、レチクルの処理方法、及びデバイス製造方法
JP2006218391A (ja) 基板処理装置
JP2000221138A (ja) 基板検査装置および基板検査方法
JPH1184632A5 (enExample)
JPH11186359A (ja) 基板搬送装置およびレチクル
JP2004241736A (ja) 露光システム及び露光装置
US5396312A (en) Apparatus for optically forming pattern
JPH11162827A (ja) 露光装置
EP0678769B1 (en) Negative film masking apparatus
JP2006032555A (ja) 収容装置、マスク、及び露光装置
JP2001092110A (ja) 露光用マスク基板及びそれを用いる露光装置
JPH10279073A (ja) マスク搬送装置
JP3274235B2 (ja) フォトリソグラフィー方法及びフォトリソグラフィーシステム
KR20060110703A (ko) 노광 시 웨이퍼 식별 방법
JP2005072259A (ja) 基板処理装置及びエラー処理方法
JP2005316021A (ja) 露光用部材及び該露光用部材が設置される露光装置
JPH11224843A (ja) 露光装置
JP2000323391A (ja) 露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040913

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050531

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061101