JPH1167950A - Electronic component housing package - Google Patents
Electronic component housing packageInfo
- Publication number
- JPH1167950A JPH1167950A JP9229647A JP22964797A JPH1167950A JP H1167950 A JPH1167950 A JP H1167950A JP 9229647 A JP9229647 A JP 9229647A JP 22964797 A JP22964797 A JP 22964797A JP H1167950 A JPH1167950 A JP H1167950A
- Authority
- JP
- Japan
- Prior art keywords
- frame
- metal
- electronic component
- ceramic base
- metallized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Landscapes
- Ceramic Products (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は半導体素子や水晶振
動子、弾性表面波素子等の電子部品を収容するための電
子部品収納用パッケージに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for accommodating electronic components such as a semiconductor device, a quartz oscillator, and a surface acoustic wave device.
【0002】[0002]
【従来の技術】従来、半導体素子や水晶振動子、弾性表
面波素子等の電子部品を収容するための電子部品収納用
パッケージは、一般に酸化アルミニウム質焼結体等の電
気絶縁材料から成り、上面外周部に枠部を有するセラミ
ックス基体と、該セラミックス基体の枠部内側から外側
にかけて導出するタングステン、モリブデン、マンガン
等の高融点金属粉末から成るメタライズ配線層と、セラ
ミックス基体の枠部上面に取着され、鉄ーニッケルーコ
バルト合金や鉄ーニッケル合金等から成る金属製蓋体と
から構成されており、セラミックス基体の枠部内側に半
導体素子や水晶振動子等の電子部品を収容するとともに
該電子部品の各電極をボンディングワイヤを介して所定
のメタライズ配線層に接続し、しかる後、セラミックス
基体の枠部上面に金属製蓋体を溶接し、セラミックス基
体と金属製蓋体とから成る容器内部に電子部品を気密に
封止することによって最終製品としての電子装置とな
る。2. Description of the Related Art Conventionally, electronic component housing packages for housing electronic components such as semiconductor elements, quartz oscillators, surface acoustic wave elements, etc. are generally made of an electrically insulating material such as an aluminum oxide sintered body. A ceramic base having a frame portion on an outer peripheral portion, a metallized wiring layer made of a high melting point metal powder such as tungsten, molybdenum, manganese or the like derived from the inside to the outside of the frame portion of the ceramic base, and attached to an upper surface of the frame portion of the ceramic base And a metal lid made of iron-nickel-cobalt alloy, iron-nickel alloy, or the like. The electronic component such as a semiconductor element or a quartz oscillator is accommodated inside the frame of the ceramic base. Each electrode is connected to a predetermined metallized wiring layer via a bonding wire. Welding the genus made lid, the electronic device as a final product by sealing the electronic component hermetically container interior made of a ceramic base and the metallic lid.
【0003】なお、前記従来の電子部品収納用パッケー
ジは通常、酸化アルミニウム質焼結体等から成るセラミ
ックス基体の枠部上面に鉄ーニッケルーコバルト合金や
鉄ーニッケル合金等の金属材料から成る金属枠体を予め
銀ロウ等のロウ材を介して取着させておき、該金属枠体
に金属製蓋体をシームウエルド法等により溶接させるこ
とによって金属製蓋体はセラミックス基体の上面に取着
され、これによってセラミックス基体と金属製蓋体とか
ら成る容器の内部が気密に封止される。The above-mentioned conventional package for housing electronic components is usually provided with a metal frame made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy on an upper surface of a frame portion of a ceramic base made of an aluminum oxide sintered body or the like. The metal cover is attached to the upper surface of the ceramic base by welding the metal cover to the metal frame by a seam welding method or the like in advance by attaching the body via a brazing material such as silver brazing. Thus, the inside of the container composed of the ceramic base and the metal lid is hermetically sealed.
【0004】また前記セラミックス基体の枠部上面への
金属枠体の取着はまずセラミックス基体の枠部上面に金
属枠体より若干大きめの面積にタングステン、モリブデ
ン、マンガン等の高融点金属粉末から成るメタライズ金
属層を従来周知のスクリーン印刷法等の厚膜手法を採用
することによって被着形成しておき、次に前記メタライ
ズ金属層上に銀ロウ等のロウ材と金属枠体とを順次載置
させ、最後に前記ロウ材に約800℃の温度を印加し、
ロウ材を加熱溶融させることによって行われる。In order to attach the metal frame to the upper surface of the frame of the ceramic substrate, first, the upper surface of the frame of the ceramic substrate is made of a high melting point metal powder such as tungsten, molybdenum, manganese or the like in an area slightly larger than the metal frame. A metallized metal layer is formed by applying a conventionally known thick film method such as a screen printing method, and then a brazing material such as silver braze and a metal frame are sequentially placed on the metallized metal layer. And finally apply a temperature of about 800 ° C. to the brazing material,
This is performed by heating and melting the brazing material.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、近時、
電子機器はその小型化が急激に進み、該電子機器に実装
される電子装置、強いては電子部品収納用パッケージも
極めて小型のものが要求されるようになり、セラミック
ス基体の上面外周部に形成されている枠部の幅は0.4
mm程度と薄くなって枠部の機械的強度が弱いものにな
るとともに枠部上面に被着されているメタライズ金属層
の被着面積も狭く、被着強度が極めて弱いものとなって
きた。However, recently,
The size of electronic devices has been rapidly reduced, and the size of electronic devices mounted on the electronic devices and, at the very least, electronic component storage packages have been required to be extremely small. Frame width is 0.4
mm, the mechanical strength of the frame portion becomes weak, and the metalized metal layer applied to the upper surface of the frame portion has a small area to be applied, so that the applied strength has become extremely weak.
【0006】そのためこの電子部品収納用パッケージに
おいて、セラミックス基体の枠部内側に半導体素子や水
晶振動子等の電子部品を収容するとともに枠部上面の金
属枠体に金属製蓋体を溶接により取着し電子装置を製作
する際、金属枠体のみが約700℃の高温となるととも
に金属枠体の200〜800℃における熱膨張係数が約
11×10-6/℃と大きいためセラミックス基体の枠部
に比して大きく熱膨張、熱収縮してセラミックス基体の
枠部と金属枠体との間に応力が発生し、これがメタライ
ズ金属層の外側に集中作用してメタライズ金属層をセラ
ミックス基体の枠部上面より剥離させたり、機械的強度
の弱い枠部、特に枠部の基部に作用して枠部にクラック
や割れ等を発生させたりして容器の気密封止が破れ、そ
の結果、容器の内部に収容する電子部品を長期間にわた
り正常、かつ安定に作動させることができないという欠
点を有していた。Therefore, in this electronic component storage package, electronic components such as semiconductor elements and quartz oscillators are accommodated inside the frame of the ceramic base, and a metal lid is attached to the metal frame on the upper surface of the frame by welding. When manufacturing an electronic device, only the metal frame is heated to a high temperature of about 700 ° C. and the coefficient of thermal expansion of the metal frame at 200 to 800 ° C. is as large as about 11 × 10 −6 / ° C., so that the frame portion of the ceramic base is Thermal expansion and thermal shrinkage are greater than in the above, and stress is generated between the frame of the ceramic base and the metal frame. This stress acts on the outside of the metallized metal layer, and the metallized metal layer is moved to the frame of the ceramic base. The hermetic seal of the container is broken by peeling from the upper surface or acting on the frame portion having low mechanical strength, especially on the base of the frame portion, causing cracks or cracks in the frame portion, and as a result, the inside of the container is broken. Normal electronic components to accommodate for a long period of time in, and had the disadvantage that it can not be stably operated.
【0007】本発明は容器の気密封止を完全とし、容器
の内部に収容される電子部品を長期間にわたり正常、か
つ安定に作動させることができる電子部品収納用パッケ
ージを提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide an electronic component housing package that can completely and hermetically seal a container and can operate electronic components housed inside the container normally and stably for a long period of time.
【0008】[0008]
【課題を解決するための手段】本発明は、上面外周部に
枠部を有するセラミックス基体と、該枠部上面に被着さ
れた枠状のメタライズ金属層と、該メタライズ金属層に
ロウ付けされた金属枠体と、該金属枠体に溶接される金
属製蓋体とから成り、内部に電子部品を気密に収容する
電子部品収納用パッケージであって、前記金属枠体の2
00〜800℃における熱膨張係数が7.5×10-6/
℃以下であることを特徴とするものである。According to the present invention, there is provided a ceramic base having a frame portion on the outer peripheral portion of the upper surface, a frame-shaped metallized metal layer adhered to the upper surface of the frame portion, and brazed to the metallized metal layer. And a metal lid welded to the metal frame. The electronic component storage package hermetically stores electronic components therein.
The coefficient of thermal expansion at 00 to 800 ° C. is 7.5 × 10 −6 /
C. or lower.
【0009】また本発明は、前記金属枠体が銅ータング
ステン合金、銅ーモリブデン合金、タングステン、モリ
ブデンの少なくとも1種からなることを特徴とするもの
である。Further, the present invention is characterized in that the metal frame is made of at least one of a copper-tungsten alloy, a copper-molybdenum alloy, tungsten, and molybdenum.
【0010】本発明の電子部品収納用パッケージによれ
ば、セラミックス基体の枠部上面にロウ付け取着されて
いる金属枠体を銅ータングステン合金、銅ーモリブデン
合金、タングステン、モリブデン等から成る200〜8
00℃における熱膨張係数が7.5×10-6/℃以下の
金属材料で形成したことから金属枠体に金属製蓋体をシ
ームウエルド法等により溶接する際、金属枠体は大きく
熱膨張、熱収縮することはなく、その結果、セラミック
ス基体の枠部と金属枠体との間に大きな応力が発生し、
該応力によってセラミックス基体の枠部にクラックや割
れ等を発生したり、メタライズ金属層が枠部より剥離し
たりするのを有効に防止することが可能となり、これに
よってセラミックス基体と金属製蓋体とから成る容器の
気密封止の信頼性を極めて高いものとして、容器内部に
収容される電子部品を長期間にわたり正常、かつ安定に
作動させることができる。According to the electronic component housing package of the present invention, the metal frame brazed to the upper surface of the frame portion of the ceramic base is made of a copper-tungsten alloy, a copper-molybdenum alloy, tungsten, molybdenum or the like. 8
When the metal lid is welded to the metal frame by a seam welding method or the like, the metal frame has a large thermal expansion coefficient because it is formed of a metal material having a thermal expansion coefficient of 7.5 × 10 −6 / ° C. or less at 00 ° C. , Without heat shrinkage, as a result, a large stress is generated between the frame portion of the ceramic base and the metal frame,
It is possible to effectively prevent cracks and cracks in the frame portion of the ceramic substrate due to the stress, and to effectively prevent the metallized metal layer from peeling off from the frame portion. The reliability of hermetic sealing of a container made of the above can be made extremely high, and the electronic components housed inside the container can be operated normally and stably for a long period of time.
【0011】[0011]
【発明の実施の形態】次に本発明を添付図面に基づき詳
細に説明する。図1及び図2は本発明の電子部品収納用
パッケージを半導体素子を収容するパッケージに適用し
た場合の一実施例を示し、1は上面外周部に枠部2を有
するセラミックス基体、3は金属製蓋体である。この枠
部2を有するセラミックス基体1と金属製蓋体3とで内
部に半導体素子4を収容するための容器が構成される。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. FIGS. 1 and 2 show an embodiment in which the electronic component housing package of the present invention is applied to a package housing a semiconductor element. Reference numeral 1 denotes a ceramic base having a frame portion 2 on the outer peripheral portion of the upper surface; It is a lid. The ceramic base 1 having the frame portion 2 and the metal lid 3 constitute a container for accommodating the semiconductor element 4 therein.
【0012】前記上面外周部に枠部2を有するセラミッ
クス基体1は酸化アルミニウム質焼結体やムライト質焼
結体、窒化アルミニウム質焼結体、炭化珪素質焼結体、
ガラスセラミックス焼結体から成り、その枠部2内側の
セラミックス基体1上面中央部には半導体素子4が載置
される載置部1aが設けてあり、該載置部1aには半導
体素子4がロウ材、ガラス、樹脂等の接着剤を介して取
着される。A ceramic substrate 1 having a frame portion 2 on the outer peripheral portion of the upper surface includes an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, a silicon carbide sintered body,
A mounting portion 1a on which the semiconductor element 4 is mounted is provided at the center of the upper surface of the ceramic base 1 inside the frame portion 2 of the glass ceramic sintered body, and the semiconductor element 4 is mounted on the mounting portion 1a. It is attached via an adhesive such as brazing material, glass, resin, or the like.
【0013】前記上面外周部に枠部2を有するセラミッ
クス基体1は例えば、酸化アルミニウム質焼結体から成
る場合、酸化アルミニウム、酸化珪素、酸化マグネシウ
ム、酸化カルシウム等に適当な有機溶剤、溶媒を添加混
合して泥漿状となすとともにこれを従来周知のドクター
ブレード法やカレンダーロール法を採用することによっ
てグリーンシート(生シート)を形成し、しかる後、前
記グリーンシートに適当な打ち抜き加工を施すとともに
複数枚積層し、高温(約1800℃)で焼成することに
よって製作される。When the ceramic substrate 1 having the frame portion 2 on the outer periphery of the upper surface is made of, for example, an aluminum oxide sintered body, a suitable organic solvent or solvent is added to aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, or the like. A green sheet (raw sheet) is formed by mixing into a slurry and employing a well-known doctor blade method or calender roll method. Thereafter, the green sheet is subjected to appropriate punching and It is manufactured by stacking sheets and firing at a high temperature (about 1800 ° C.).
【0014】また前記セラミックス基体1には枠部2の
内側からセラミックス基体1の下面にかけて導出する複
数個のメタライズ配線層5が被着形成されており、該メ
タライズ配線層5の枠部2内側には半導体素子4の電極
がボンデイングワイヤ6を介して電気的に接続され、ま
たセラミックス基体1の下面に導出した部位は外部電気
回路基板の配線導体(不図示)が半田等を介して電気的
に接続される。A plurality of metallized wiring layers 5 extending from the inside of the frame 2 to the lower surface of the ceramic base 1 are formed on the ceramic base 1 so as to be adhered to the inside of the frame 2 of the metallized wiring layer 5. The electrode of the semiconductor element 4 is electrically connected via a bonding wire 6, and a portion led out to the lower surface of the ceramic base 1 is electrically connected to a wiring conductor (not shown) of an external electric circuit board via solder or the like. Connected.
【0015】前記セラミックス基体1に設けた複数個の
メタライズ配線層5はタングステン、モリブデン、マン
ガン等の金属粉末から成り、該メタライズ配線層5は半
導体素子4の各電極を所定の外部電気回路に電気的に接
続する作用をなす。The plurality of metallized wiring layers 5 provided on the ceramic base 1 are made of a metal powder such as tungsten, molybdenum, manganese, etc., and the metallized wiring layers 5 connect each electrode of the semiconductor element 4 to a predetermined external electric circuit. It works to connect to each other.
【0016】前記メタライズ配線層5は例えば、タング
ステン等の金属粉末に有機溶剤、溶媒を添加混合して得
た金属ペーストをセラミックス基体1となるグリーンシ
ートに予め従来周知のスクリーン印刷法により所定パタ
ーンに印刷塗布しておくことによって枠部枠部2内側か
らセラミックス基体1の下面にかけて所定パターンに被
着導出される。The metallized wiring layer 5 is formed, for example, by applying a metal paste obtained by adding an organic solvent and a solvent to a metal powder such as tungsten to a predetermined pattern on a green sheet serving as the ceramic substrate 1 by a conventionally well-known screen printing method. By printing and applying, a predetermined pattern is applied from the inside of the frame 2 to the lower surface of the ceramic base 1.
【0017】なお、前記メタライズ配線層5はその露出
する外表面にニッケル、金等の耐蝕性に優れ、且つロウ
材と濡れ性の良い金属をメッキ法によリ1.0乃至2
0.0μmの厚みに被着させておくとメタライズ配線層
5の酸化腐食を有効に防止することができるとともにメ
タライズ配線層5とボンデイングワイヤ6との接続及び
メタライズ配線層5と外部電気回路基板の配線導体との
接続を強固なものとなすことができる。従って、前記メ
タライズ配線層5の表面にはニッケル、金等の耐蝕性に
優れ、且つロウ材と濡れ性の良い金属をメッキ法により
1.0乃至20.0μmの厚みに被着させておくことが
好ましい。The metallized wiring layer 5 is coated on its exposed outer surface with a metal having excellent corrosion resistance such as nickel and gold and a good wettability with a brazing material by a plating method.
If it is applied to a thickness of 0.0 μm, oxidation corrosion of the metallized wiring layer 5 can be effectively prevented, and the connection between the metallized wiring layer 5 and the bonding wire 6 and the metallized wiring layer 5 and the external electric circuit board The connection with the wiring conductor can be made strong. Therefore, a metal having excellent corrosion resistance such as nickel and gold and having good wettability with a brazing material is applied to the surface of the metallized wiring layer 5 by a plating method to a thickness of 1.0 to 20.0 μm. Is preferred.
【0018】また前記セラミックス基体1の枠部2上面
にはメタライズ金属層7が被着形成されており、該メタ
ライズ金属層7には金属枠体8がロウ材9を介してロウ
付けされている。A metallized metal layer 7 is formed on the upper surface of the frame 2 of the ceramic base 1 and a metal frame 8 is brazed to the metallized metal layer 7 via a brazing material 9. .
【0019】前記セラミックス基体1の枠部2上面のメ
タライズ金属層7はタングステン、モリブデン、マンガ
ン等の高融点金属粉末から成り、該メタライズ金属層7
は金属枠体8をセラミックス基体1にロウ付けする際の
下地金属層として作用する。The metallized metal layer 7 on the upper surface of the frame 2 of the ceramic substrate 1 is made of a high melting point metal powder such as tungsten, molybdenum, manganese or the like.
Acts as a base metal layer when the metal frame 8 is brazed to the ceramic base 1.
【0020】前記メタライズ金属層7はタングステン等
の金属粉末に適当な有機溶剤、溶媒を添加混合して得た
金属ペーストをセラミックス基体1と成るグリーンシー
ト上に従来周知のスクリーン印刷法等により予め所定厚
み、所定パターンに印刷塗布しておくことによってセラ
ミックス基体1の枠部2上面に枠状に被着形成される。The metallized metal layer 7 is prepared by adding a suitable organic solvent and a solvent to a metal powder such as tungsten and mixing a metal paste on a green sheet serving as the ceramic substrate 1 by a conventionally known screen printing method or the like. By printing and applying in a predetermined pattern with a predetermined thickness, the ceramic substrate 1 is formed on the upper surface of the frame portion 2 in a frame shape.
【0021】なお、前記メタライズ金属層7はその露出
する外表面にニッケル、金等の耐蝕性に優れ、且つロウ
材と濡れ性の良い金属をメッキ法によリ1.0乃至2
0.0μmの厚みに被着させておくとメタライズ金属層
7の酸化腐食を有効に防止することができるとともにメ
タライズ金属層7と金属枠体8とのロウ付けを強固なも
のとなすことができる。従って、前記メタライズ金属層
7の表面にはニッケル、金等の耐蝕性に優れ、且つロウ
材と濡れ性の良い金属をメッキ法により1.0乃至2
0.0μmの厚みに被着させておくことが好ましい。The metallized metal layer 7 is coated on its exposed outer surface with a metal having excellent corrosion resistance such as nickel and gold and a good wettability with a brazing material by a plating method.
When the metallized metal layer 7 is deposited to a thickness of 0.0 μm, oxidation corrosion of the metallized metal layer 7 can be effectively prevented, and the brazing between the metallized metal layer 7 and the metal frame 8 can be made firm. . Therefore, the surface of the metallized metal layer 7 is coated with a metal having excellent corrosion resistance, such as nickel and gold, and a good wettability with the brazing material by a plating method.
Preferably, it is applied to a thickness of 0.0 μm.
【0022】更に前記メタライズ金属層7にロウ材9を
介してロウ付けされる金属枠体8は鉄ーニッケルーコバ
ルト合金や鉄ーニッケル合金等の金属材料から成る金属
製蓋体2をセラミックス基体1に取着する際の下地金属
部材として作用し、金属枠体8に金属製蓋体2をシーム
ウエルド法等により溶接することによって金属製蓋体2
はセラミックス基体1の枠部2上に取着される。Further, a metal frame 8 brazed to the metallized metal layer 7 via a brazing material 9 comprises a metal lid 2 made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy and a ceramic base 1. Acts as a base metal member when the metal cover 2 is attached to the metal frame 8, and is welded to the metal frame 8 by a seam welding method or the like.
Is mounted on the frame 2 of the ceramic base 1.
【0023】前記金属枠体8は銅ータングステン合金、
銅ーモリブデン合金、タングステン、モリブデン等の2
00〜800℃における熱膨張係数が7.5×10-6/
℃以下の金属材料により形成されており、金属枠体8の
200〜800℃における熱膨張係数を7.5×10-6
/℃以下としたことから金属枠体8に金属製蓋体3をシ
ームウエルド法等により溶接する際、金属枠体8が大き
く熱膨張、熱収縮してセラミックス基体1の枠部2と金
属枠体8との間に大きな応力が発生することはなく、そ
の結果、前記応力によってセラミックス基体1の枠部2
にクラックや割れ等を発生したり、メタライズ金属層7
が枠部2より剥離したりすることは殆どなく、これによ
ってセラミックス基体1と金属製蓋体3とから成る容器
の気密封止の信頼性が極めて高いものとなり、容器の内
部に収容する半導体素子4を長期間にわたり正常、かつ
安定に作動させることが可能となる。The metal frame 8 is made of a copper-tungsten alloy,
2 of copper-molybdenum alloy, tungsten, molybdenum, etc.
The coefficient of thermal expansion at 00 to 800 ° C. is 7.5 × 10 −6 /
The metal frame 8 is made of a metal material having a thermal expansion coefficient of 7.5 × 10 −6 at 200 to 800 ° C.
/ ° C or less, when the metal lid 3 is welded to the metal frame 8 by a seam welding method or the like, the metal frame 8 greatly expands and contracts, and the frame 2 of the ceramic base 1 and the metal frame A large stress is not generated between the ceramic body 1 and the frame portion 2 of the ceramic base 1 due to the stress.
Cracks or cracks in the metallized metal layer 7
Hardly peels off from the frame portion 2, whereby the reliability of hermetic sealing of the container composed of the ceramic base 1 and the metal lid 3 is extremely high, and the semiconductor element housed inside the container 4 can operate normally and stably over a long period of time.
【0024】前記金属枠体8はその200〜800℃に
おける熱膨張係数が7.5×10-6/℃を超えると金属
枠体8に金属製蓋体3をシームウエルド法等により溶接
する際、セラミックス基体1の枠部2と金属枠体8との
間に大きな応力が発生し、該応力によってメタライズ金
属層7に剥離を発生させたり、枠部2にクラック等が発
生したりしてしまう。従って、前記金属枠体8はその2
00〜800℃における熱膨張係数が7.5×10-6/
℃以下に特定される。When the metal frame 8 has a coefficient of thermal expansion at 200 to 800 ° C. exceeding 7.5 × 10 −6 / ° C., the metal lid 3 is welded to the metal frame 8 by a seam welding method or the like. A large stress is generated between the frame portion 2 of the ceramic base 1 and the metal frame 8, and the stress causes peeling of the metallized metal layer 7 and cracks of the frame portion 2. . Therefore, the metal frame 8 is the second
The coefficient of thermal expansion at 00 to 800 ° C. is 7.5 × 10 −6 /
It is specified below ° C.
【0025】また前記金属枠体8は、例えば、銅ータン
グステン合金で形成されている場合、タングステン及び
銅粉末を所定形状の金型内に充填してプレス成形して枠
状の成形体を得、しかる後、これを高温(約1250〜
1350℃)で焼成することによって所定の枠状に形成
される。When the metal frame 8 is formed of, for example, a copper-tungsten alloy, a metal having a predetermined shape is filled with tungsten and copper powder and press-molded to obtain a frame-shaped molded body. After that, this is heated to a high temperature (about 1250 to
By firing at 1350 ° C.), a predetermined frame shape is formed.
【0026】前記金属枠体8は更にセラミックス基体1
の枠部2上面に設けたメタライズ金属層7にロウ材9を
介してロウ付けされ、該ロウ材9としては例えば、銀ー
銅合金等の銀ロウ材が使用される。The metal frame 8 further includes a ceramic base 1
Is brazed to a metallized metal layer 7 provided on the upper surface of the frame portion 2 via a brazing material 9, and for example, a silver brazing material such as a silver-copper alloy is used.
【0027】前記銀ロウ材から成るロウ材9を介しての
金属枠体8とメタライズ金属層7とのロウ付け取着は、
メタライズ金属層7上に予め所定の枠状に打ち抜き加工
されたロウ材9と金属枠体8とを順次載置させ、しかる
後、これを約850℃の温度に加熱し、ロウ材9を加熱
溶融させることによって行われる。The brazing attachment of the metal frame 8 and the metallized metal layer 7 via the brazing material 9 made of the silver brazing material is as follows.
A brazing material 9 previously punched into a predetermined frame shape and a metal frame 8 are sequentially placed on the metallized metal layer 7 and then heated to a temperature of about 850 ° C. to heat the brazing material 9. It is performed by melting.
【0028】かくして上述のパッケージによればセラミ
ックス基体1の枠部2内側に位置する載置部1aに半導
体素子4をロウ材、ガラス、樹脂等の接着剤を介して取
着するとともに該半導体素子4の各電極をボンデイング
ワイヤ6を介してメタライズ配線層5に電気的に接続
し、しかる後、セラミックス基体1の枠部2上面にロウ
付けした金属枠体8に金属製蓋体3をシームウエルド法
等により溶接し、上面外周部に枠部2を有するセラミッ
クス基体1と金属製蓋体3とから成る容器内部に半導体
素子4を気密に封止することによって最終製品としての
電子装置となる。Thus, according to the above-described package, the semiconductor element 4 is attached to the mounting portion 1a located inside the frame portion 2 of the ceramic base 1 via an adhesive such as brazing material, glass, resin, or the like. 4 is electrically connected to the metallized wiring layer 5 via the bonding wire 6, and then the metal lid 3 is attached to the metal frame 8 brazed on the upper surface of the frame 2 of the ceramic base 1. The semiconductor device 4 is hermetically sealed in a container made of a ceramic base 1 having a frame portion 2 on the outer peripheral portion of the upper surface and a metal lid 3 by welding or the like, thereby providing an electronic device as a final product.
【0029】なお、本発明は上述したパッケージに限定
されるものではなく、本発明の要旨を逸脱しない範囲で
あれば種々の変更は可能であり、例えば、上述の実施例
ではセラミックス基体1の下面に導出するメタライズ配
線層5を直接、外部電気回路基板の配線導体に接続する
と説明したが、メタライズ配線層5に外部リード端子を
予めロウ付けしておき、該外部リード端子を外部電気回
路に接続させることによって容器の内部に収容される電
子部品を外部電気回路に接続されるようにしておいても
よい。The present invention is not limited to the above-described package, and various modifications can be made without departing from the scope of the present invention. It has been described that the metallized wiring layer 5 derived from the above is directly connected to the wiring conductor of the external electric circuit board, but the external lead terminals are previously brazed to the metallized wiring layer 5 and the external lead terminals are connected to the external electric circuit. By doing so, the electronic components housed inside the container may be connected to an external electric circuit.
【0030】[0030]
【発明の効果】本発明の電子部品収納用パッケージによ
れば、セラミックス基体の枠部上面にロウ付け取着され
ている金属枠体を銅ータングステン合金、銅ーモリブデ
ン合金、タングステン、モリブデン等から成る200〜
800℃における熱膨張係数が7.5×10-6/℃以下
の金属材料で形成したことから金属枠体に金属製蓋体を
シームウエルド法等により溶接する際、金属枠体は大き
く熱膨張、熱収縮することはなく、その結果、セラミッ
クス基体の枠部と金属枠体との間に大きな応力が発生
し、該応力によってセラミックス基体の枠部にクラック
や割れ等を発生したり、メタライズ金属層が枠部より剥
離したりするのを有効に防止することが可能となり、こ
れによってセラミックス基体と金属製蓋体とから成る容
器の気密封止の信頼性を極めて高いものとして、容器内
部に収容される電子部品を長期間にわたり正常、かつ安
定に作動させることができる。According to the electronic component housing package of the present invention, the metal frame brazed to the upper surface of the frame of the ceramic base is made of a copper-tungsten alloy, a copper-molybdenum alloy, tungsten, molybdenum, or the like. 200 ~
Since the metal frame has a thermal expansion coefficient of not more than 7.5 × 10 −6 / ° C. at 800 ° C., when the metal lid is welded to the metal frame by a seam welding method or the like, the metal frame greatly expands. As a result, a large stress is generated between the frame portion of the ceramic base and the metal frame, and the stress may cause cracks and cracks in the frame of the ceramic base, or may cause a metallized metal. It is possible to effectively prevent the layer from peeling off from the frame portion, and thereby, the reliability of hermetic sealing of the container composed of the ceramic base and the metal lid is extremely high, and the layer is housed inside the container. The electronic component to be operated can operate normally and stably for a long period of time.
【図1】本発明の電子部品収納用パッケージを半導体素
子を収容するパッケージに適用した場合の一実施例を示
す断面図ある。FIG. 1 is a cross-sectional view showing an embodiment in which an electronic component housing package of the present invention is applied to a package housing a semiconductor element.
【図2】図1に示すパッケージの要部拡大断面図であ
る。FIG. 2 is an enlarged sectional view of a main part of the package shown in FIG.
1・・・・・セラミックス基体 2・・・・・枠部 3・・・・・金属製蓋体 4・・・・・半導体素子(電子部品) 5・・・・・メタライズ配線層 7・・・・・メタライズ金属層 8・・・・・金属枠体 9・・・・・ロウ材 1 ... Ceramic base 2 ... Frame 3 ... Metal cover 4 ... Semiconductor element (electronic component) 5 ... Metalized wiring layer 7 ... ... Metalized metal layer 8 ... Metal frame 9 ... Brazing material
Claims (2)
体と、該枠部上面に被着された枠状のメタライズ金属層
と、該メタライズ金属層にロウ付けされた金属枠体と、
該金属枠体に溶接される金属製蓋体とから成り、内部に
電子部品を気密に収容する電子部品収納用パッケージで
あって、前記金属枠体の200〜800℃における熱膨
張係数が7.5×10-6/℃以下であることを特徴とす
る電子部品収納用パッケージ。1. A ceramic base having a frame on the outer periphery of an upper surface, a frame-shaped metallized metal layer attached to the upper surface of the frame, a metal frame brazed to the metallized metal layer,
An electronic component housing package comprising a metal lid welded to the metal frame and hermetically housing the electronic components therein, wherein the metal frame has a coefficient of thermal expansion at 200 to 800 ° C. of 7. An electronic component storage package having a temperature of 5 × 10 −6 / ° C. or less.
ーモリブデン合金、タングステン、モリブデンの少なく
とも1種からなることを特徴とする請求項1に記載の電
子部品収納用パッケージ。2. The electronic component storage package according to claim 1, wherein the metal frame is made of at least one of a copper-tungsten alloy, a copper-molybdenum alloy, tungsten, and molybdenum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9229647A JPH1167950A (en) | 1997-08-26 | 1997-08-26 | Electronic component housing package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9229647A JPH1167950A (en) | 1997-08-26 | 1997-08-26 | Electronic component housing package |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1167950A true JPH1167950A (en) | 1999-03-09 |
Family
ID=16895480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9229647A Pending JPH1167950A (en) | 1997-08-26 | 1997-08-26 | Electronic component housing package |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1167950A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005212017A (en) * | 2004-01-28 | 2005-08-11 | Kyocera Corp | Electronic component sealing substrate, multiple molding electronic component sealing substrate, and electronic device manufacturing method |
US20140216163A1 (en) * | 2011-05-30 | 2014-08-07 | Epcos Ag | Pressure sensor and method for producing a pressure sensor |
-
1997
- 1997-08-26 JP JP9229647A patent/JPH1167950A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005212017A (en) * | 2004-01-28 | 2005-08-11 | Kyocera Corp | Electronic component sealing substrate, multiple molding electronic component sealing substrate, and electronic device manufacturing method |
US20140216163A1 (en) * | 2011-05-30 | 2014-08-07 | Epcos Ag | Pressure sensor and method for producing a pressure sensor |
US9625336B2 (en) * | 2011-05-30 | 2017-04-18 | Epcos Ag | Pressure sensor and method for producing a pressure sensor |
CN108106777A (en) * | 2011-05-30 | 2018-06-01 | 埃普科斯股份有限公司 | Pressure sensor and the method for manufacturing pressure sensor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2000340687A (en) | Package for storing semiconductor element | |
JPH11126847A (en) | Package for electronic component | |
JP3210835B2 (en) | Package for storing semiconductor elements | |
JPH1167950A (en) | Electronic component housing package | |
JPH03196664A (en) | Package for semiconductor device | |
JP3464138B2 (en) | Electronic component storage package | |
JP3464137B2 (en) | Electronic component storage package | |
JPH11126836A (en) | Piezoelectric vibrator housing package | |
JP3464136B2 (en) | Electronic component storage package | |
JP3318453B2 (en) | Electronic component storage package | |
JP3176246B2 (en) | Package for storing semiconductor elements | |
JP3372812B2 (en) | Electronic component storage package | |
JPH1174392A (en) | Package for housing electronic component | |
JPH05160284A (en) | Semiconductor device containing package | |
JP3176267B2 (en) | Package for storing semiconductor elements | |
JP2710893B2 (en) | Electronic components with leads | |
JP3426741B2 (en) | Package for storing semiconductor elements | |
JP3318452B2 (en) | Electronic component storage package | |
JP2783735B2 (en) | Package for storing semiconductor elements | |
JPH1174393A (en) | Package for housing electronic component | |
JP2543149Y2 (en) | Package for storing semiconductor elements | |
JP2543153Y2 (en) | Package for storing semiconductor elements | |
JP3495247B2 (en) | Electronic component storage container | |
JPH08115990A (en) | Semiconductor device package | |
JP2001308212A (en) | Electronic component storing package and its manufacturing method |