JP3464137B2 - Electronic component storage package - Google Patents

Electronic component storage package

Info

Publication number
JP3464137B2
JP3464137B2 JP04081598A JP4081598A JP3464137B2 JP 3464137 B2 JP3464137 B2 JP 3464137B2 JP 04081598 A JP04081598 A JP 04081598A JP 4081598 A JP4081598 A JP 4081598A JP 3464137 B2 JP3464137 B2 JP 3464137B2
Authority
JP
Japan
Prior art keywords
metal layer
conductive
frame
electronic component
shaped metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04081598A
Other languages
Japanese (ja)
Other versions
JPH11238819A (en
Inventor
孝太郎 中本
治己 竹岡
崇 柴田
吉明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP04081598A priority Critical patent/JP3464137B2/en
Publication of JPH11238819A publication Critical patent/JPH11238819A/en
Application granted granted Critical
Publication of JP3464137B2 publication Critical patent/JP3464137B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Landscapes

  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子や圧電振
動子等の電子部品を気密に収容するための電子部品収納
用パッケージに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component housing package for hermetically housing electronic components such as semiconductor elements and piezoelectric vibrators.

【0002】[0002]

【従来の技術】従来、半導体集積回路素子を初めとする
半導体素子あるいは水晶振動子、弾性表面波素子といっ
た圧電振動子等の電子部品を収容するための電子部品収
納用パッケージは、例えば、酸化アルミニウム(Al2
3 )質焼結体等の電気絶縁材料から成り、その上面あ
るいは下面の略中央部に電子部品を収容するための凹部
およびその凹部周辺から下面にかけて導出された、例え
ば、タングステンやモリフデン等の高融点金属粉末から
成る複数個のメタライズ配線層を有する絶縁基体と、電
子部品を外部電気回路に電気的に接続するためにメタラ
イズ配線層に銀ロウ等のロウ材を介して取着された外部
リード端子と、蓋体とから構成されている。
2. Description of the Related Art Conventionally, an electronic component housing package for housing a semiconductor element such as a semiconductor integrated circuit element or an electronic component such as a crystal resonator or a surface acoustic wave element such as a piezoelectric resonator is, for example, aluminum oxide. (Al 2
O 3 ), which is made of an electrically insulating material such as a sintered body, has a concave portion for accommodating electronic components in the substantially central portion of the upper surface or the lower surface thereof and is led out from the peripheral portion of the concave portion to the lower surface, such as tungsten or molyfden. An insulating substrate having a plurality of metallized wiring layers made of refractory metal powder, and an external body attached to the metallized wiring layers via a brazing material such as silver brazing to electrically connect electronic parts to an external electric circuit. It is composed of a lead terminal and a lid.

【0003】そして、電子部品が、例えば、半導体素子
の場合には、絶縁基体の凹部の底面に半導体素子をガラ
ス、樹脂、ロウ材等から成る接着材を介して接着固定す
るとともに半導体素子の各電極とメタライズ配線層とを
ボンディングワイヤ等の電気的接続手投を介して電気的
に接続し、しかる後、絶縁基体の上面に蓋体を低融点ガ
ラスから成る封止材を介して接合させ、絶縁基体と蓋体
とから成る容器内部に半導体素子を気密に収容すること
によって最終製品としての半導体装置と成る。
When the electronic component is, for example, a semiconductor element, the semiconductor element is adhered and fixed to the bottom surface of the recess of the insulating substrate via an adhesive material such as glass, resin, or brazing material, and each semiconductor element is attached. The electrodes and the metallized wiring layer are electrically connected via an electric connection hand throw such as a bonding wire, and thereafter, the lid is joined to the upper surface of the insulating substrate via a sealing material made of low melting point glass, A semiconductor device as a final product is obtained by hermetically accommodating a semiconductor element inside a container composed of an insulating base and a lid.

【0004】また電子部品が、例えば、圧電振動子の場
合には、絶縁基体の凹部の底面に形成された段差部に圧
電振動子の一端を導電性エポキシ樹脂等から成る接着材
を介して接着固定するとともに圧電振動子の各電極をメ
タライズ配線層に電気的に接続し、しかる後、絶縁基体
の上面に蓋体を低融点ガラスから成る封止材を介して接
合させ、絶縁基体と蓋体とから成る容器内部に半導体素
子を気密に収容することによって最終製品としての電子
部品装置と成る。
In the case where the electronic component is, for example, a piezoelectric vibrator, one end of the piezoelectric vibrator is adhered to the step portion formed on the bottom surface of the recess of the insulating substrate with an adhesive material made of a conductive epoxy resin or the like. The electrodes of the piezoelectric vibrator are fixed and electrically connected to the metallized wiring layer, and then the lid is bonded to the upper surface of the insulating base through a sealing material made of low-melting glass to form the insulating base and the lid. An electronic component device as a final product is obtained by hermetically accommodating a semiconductor element inside a container made of.

【0005】なお、絶縁基体に蓋体を接合させる封止材
としては、一般に酸化鉛56乃至66重量%、酸化ホウ
素4乃至14重量%、酸化珪素1乃至6重量%、酸化ビ
スマス0.5乃至5重量%、酸化亜鉛0.5乃至3重量
%を含むガラス成分に、フィラーとしてのコージェライ
ト系化合物を9乃至19重量%、チタン酸錫系化合物を
10乃至20重量%添加したガラスが使用されている。
As a sealing material for joining the lid to the insulating substrate, generally 56 to 66% by weight of lead oxide, 4 to 14% by weight of boron oxide, 1 to 6% by weight of silicon oxide, and 0.5 to bismuth oxide are used. Glass containing 5 wt% and 0.5 to 3 wt% of zinc oxide, 9 to 19 wt% of cordierite compound as a filler, and 10 to 20 wt% of tin titanate compound is used. ing.

【0006】しかしながら、この従来の電子部品収納用
パッケージにおいては、絶縁基体や蓋体を形成する酸化
アルミニウム(Al2 3 )質焼結体等のセラミック
ス、及び封止材を形成するガラスが共に電磁波に対しあ
まり遮断能力がないことから外部電気回路基板等に他の
電子部品とともに実装した場合、隣接する電子部品間に
電磁波の相互干渉が起こり電子部品に誤動作を起こさせ
るという問題も有していた。特に最近では外部電気回路
基板に電子部品が極めて高密度に実装され、隣接する電
子部品間の距離が極めて狭いものとなってきており、こ
の電磁波の相互干渉による問題は極めて大きなものとな
ってきた。
However, in this conventional package for storing electronic parts, ceramics such as aluminum oxide (Al 2 O 3 ) sintered material forming the insulating substrate and lid, and glass forming the sealing material are both used. When it is mounted together with other electronic components on an external electric circuit board, etc., it has a problem of mutual interference of electromagnetic waves between adjacent electronic components, causing malfunction of the electronic components, because it does not have much ability to block electromagnetic waves. It was In particular, recently, electronic parts have been mounted on an external electric circuit board at an extremely high density, and the distance between adjacent electronic parts has become extremely small. The problem due to the mutual interference of electromagnetic waves has become extremely large. .

【0007】そこで上記欠点を解消するために本願出願
人は先に、電子部品が搭載される搭載部下方に金属層を
形成するとともに上面に前記金属層の一部がスルーホー
ル導体を介して導出されている絶縁基体と、導電性蓋体
と導電性封止材とで構成される電子部品収納用パッケー
ジを提案した(特願平9ー291299号参照)。
Therefore, in order to solve the above-mentioned drawbacks, the applicant of the present application first forms a metal layer below a mounting portion on which an electronic component is mounted, and at the same time, a part of the metal layer is led out through a through-hole conductor. The present invention proposes a package for housing an electronic component, which includes an insulating base body, a conductive lid and a conductive sealing material (see Japanese Patent Application No. 9-291299).

【0008】かかる電子部品収納用パッケージによれば
絶縁基体の上面に導電性蓋体を導電性封止材を介して接
合させ、絶縁基体に設けた金属層と導電性蓋体とをスル
ーホール導体及び導電性封止材とで電気的に接続し、電
子部品を金属層と導電性蓋体とで上下より囲みこむこと
によって外部より内部に収容する電子部品に電磁波が作
用するのが有効に防止され、電子部品を長期間にわたり
正常、かつ安定に作動させることが可能となる。
According to such an electronic component storing package, the conductive lid is bonded to the upper surface of the insulating base through the conductive sealing material, and the metal layer provided on the insulating base and the conductive lid are through-hole conductors. Also, by electrically connecting with a conductive sealing material and surrounding the electronic component from above and below with a metal layer and a conductive lid, it is possible to effectively prevent electromagnetic waves from acting on the electronic component housed inside from the outside. Therefore, it becomes possible to operate the electronic component normally and stably for a long period of time.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、この電
子部品収納用パッケージでは、金属層の一部を絶縁基体
上面に導出させるスルーホール導体の径が0.2mm程
度と小さいこと、及び導電性封止材の体積抵抗が1×1
4 Ω程度と高いこと等から導電性蓋体と絶縁基体に設
けたスルーホール導体とを導電性封止材を介して接続さ
せても両者の電気的接続は導通抵抗が高く信頼性の低い
ものとなり、その結果、金属層と導電性蓋体とを確実に
電気的接続させて電子部品を外部の電磁波より確実、完
全に保護することができないという解決すべき課題を有
していた。
However, in this electronic component storing package, the diameter of the through-hole conductor for leading out a part of the metal layer to the upper surface of the insulating substrate is as small as about 0.2 mm, and the conductive sealing is provided. Volume resistance of material is 1 × 1
Since it is as high as about 0 4 Ω, even if the conductive lid and the through-hole conductor provided on the insulating base are connected via a conductive sealing material, the electrical connection between them has high conduction resistance and low reliability. As a result, there is a problem to be solved in that it is impossible to securely electrically connect the metal layer and the conductive lid to protect the electronic component from external electromagnetic waves, and it is not possible to completely protect the electronic component.

【0010】本発明は上記諸欠点に鑑み案出されたもの
で、その目的は容器内部に収容する電子部品に電磁波が
作用するのを確実に防止し、電子部品を長期間にわたり
正常、かつ安定に作動させることができる電子部品収納
用パッケージを提供することにある。
The present invention has been devised in view of the above drawbacks, and its purpose is to reliably prevent electromagnetic waves from acting on electronic parts housed inside a container, and to keep the electronic parts normal and stable for a long period of time. An object of the present invention is to provide a package for storing electronic components that can be operated at any time.

【0011】[0011]

【課題を解決するための手段】本発明は、上面に電子部
品が搭載される搭載部および該搭載部を囲繞するように
形成された枠状金属層を有し、かつ前記搭載部の下方に
前記枠状金属層と電気的に接続されている金属層が配設
されている絶縁基体と、導電性蓋体とからなり、前記枠
状金属層に導電性蓋体を導電性封止材を介して接合さ
せ、前記金属層と導電性蓋体とを電気的に接続させつつ
絶縁基体と導電性蓋体とからなる容器内部に電子部品を
気密に収容するようになした電子部品収納用パッケージ
であって、前記枠状金属層に多数の貫通孔が形成されて
いることを特徴とするものである。
According to the present invention, there is provided on a top surface a mounting portion on which an electronic component is mounted, and a frame-shaped metal layer formed so as to surround the mounting portion, and below the mounting portion. An insulating substrate provided with a metal layer electrically connected to the frame-shaped metal layer and a conductive lid, and a conductive lid is provided on the frame-shaped metal layer with a conductive sealing material. A package for storing electronic parts, which is joined via a metal layer to electrically connect the metal layer and the conductive cover, and hermetically stores the electronic parts inside a container formed of an insulating base and a conductive cover. A large number of through holes are formed in the frame-shaped metal layer.

【0012】また本発明は、前記貫通孔の平面積の合計
が枠状金属層の平面積の5乃至50%であることを特徴
とするものである。
The present invention is also characterized in that the total plane area of the through holes is 5 to 50% of the plane area of the frame-shaped metal layer.

【0013】本発明の電子部品収納用パッケージによれ
ば、絶縁基体の電子部品が搭載される搭載部下方に金属
層を配するとともに該金属層の一部を絶縁基体上面に形
成した枠状金属層に電気的に接続させたことから絶縁基
体上面に導電性蓋体を導電性封止材を介して接合させる
際、導電性封止材は枠状金属層と極めて広い面積で接触
して導電性蓋体と金属層とが確実に、かつ低い導通抵抗
で電気的接続されることとなり、その結果、電子部品に
電磁波が作用するのを確実に防止して電子部品を長期間
にわたり正常、かつ安定に作動させることが可能とな
る。
According to the package for storing electronic parts of the present invention, a frame-shaped metal is provided in which a metal layer is arranged below the mounting portion of the insulating base on which electronic parts are mounted and a part of the metal layer is formed on the upper surface of the insulating base. When the conductive lid is bonded to the upper surface of the insulating substrate via the conductive sealing material, the conductive sealing material contacts the frame-shaped metal layer in an extremely wide area and becomes conductive. The conductive lid and the metal layer are reliably and electrically connected with a low conduction resistance, and as a result, electromagnetic waves are surely prevented from acting on the electronic component, and the electronic component is kept normal for a long period of time, and It becomes possible to operate stably.

【0014】また本発明の電子部品収納用パッケージに
よれば、枠状金属層に該枠状金属層の平面積に対し、合
計の平面積が例えば、5乃至50%となる複数個の貫通
孔を形成し、貫通孔内部に導電性封止材と接合性の良い
絶縁基体の上面を露出させたことから、枠状金属層に導
電性蓋体を導電性封止材を介して接合させる際、導電性
封止材の一部が、貫通孔内部に露出する絶縁基体上面に
強固に接合し、その結果、絶縁基体と導電性蓋体とから
成る容器の気密封止が完全となり、容器内部に収容する
電子部品を長期間にわたり正常、かつ安定に作動させる
こともできる。
Further, according to the electronic component storage package of the present invention, the frame-shaped metal layer has a plurality of through-holes whose total plane area is, for example, 5 to 50% of the plane area of the frame-shaped metal layer. When the conductive lid is bonded to the frame-shaped metal layer through the conductive sealing material, the upper surface of the insulating substrate having good bonding properties with the conductive sealing material is exposed inside the through hole. , A part of the conductive sealing material is firmly bonded to the upper surface of the insulating base exposed inside the through hole, and as a result, the container including the insulating base and the conductive lid is completely hermetically sealed, It is also possible to operate the electronic components housed in the normal and stable operation for a long period of time.

【0015】[0015]

【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。図1は本発明の電子部品収納用パッケ
ージの実施の形態の一例を示す断面図、図2はその要部
拡大断面図、図3は要部拡大平面図であり、同図におい
ては電子部品が半導体素子であり、電子部品収納用パッ
ケージが半導体素子収納用パッケージである場合の例を
示している。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. 1 is a sectional view showing an example of an embodiment of an electronic component storing package of the present invention, FIG. 2 is an enlarged sectional view of an essential part thereof, and FIG. 3 is an enlarged plan view of an essential part. In FIG. It is a semiconductor element, and shows an example in the case where the electronic component storage package is a semiconductor element storage package.

【0016】図において、1は絶縁基体、2は導電性蓋
体である。この絶縁基体1と導電性蓋体2とで半導体素
子3を収容するための容器4が構成される。
In the figure, 1 is an insulating substrate, and 2 is a conductive lid. The insulating substrate 1 and the conductive lid 2 constitute a container 4 for housing the semiconductor element 3.

【0017】前記絶縁基体1はその上面の略中央部に半
導体素子3が搭載収容される凹状の搭載部1aが設けて
あり、該搭載部1aには半導体素子3がガラス、樹脂、
ロウ材等からなる接着材を介して接着固定される。
The insulating substrate 1 is provided with a recessed mounting portion 1a in which the semiconductor element 3 is mounted and accommodated in the substantially central portion of the upper surface thereof. The mounting portion 1a includes the semiconductor element 3 made of glass, resin,
It is adhesively fixed through an adhesive material made of a brazing material or the like.

【0018】前記絶縁基体1は、酸化アルミニウム質焼
結体やムライト質焼結体、窒化アルミニウム質焼結体、
炭化珪素質焼結体等の電気絶縁材料から成り、例えば、
酸化アルミニウム質焼結体からなる場合であれば、酸化
アルミニウム、酸化珪素、酸化マグネシウム、酸化カル
シウム等の原料粉末に適当な有機バインター、溶剤、可
塑剤、分散剤等を添加混合して泥漿物を作り、該泥漿物
を従来周知のドクターブレード法やカレンダーロール法
等のシート成形法を採用しシート状に成形してセラミッ
クグリーンシート(セラミック生シート)を得、しかる
後、それらセラミックグリーンシートに適当な打ち抜き
加工を施すとともにこれを複数枚積層し、約1600℃
の高温で焼成することによって製作される。
The insulating substrate 1 is made of an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body,
It is made of an electrically insulating material such as a silicon carbide sintered body.
When it is made of an aluminum oxide sintered body, a suitable organic binder, a solvent, a plasticizer, a dispersant, etc. are added to and mixed with the raw material powder of aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc. Then, the sludge is formed into a sheet by using a sheet forming method such as a well-known doctor blade method or calendar roll method to obtain a ceramic green sheet (ceramic green sheet), which is then suitable for those ceramic green sheets. Punching and stacking multiple sheets at about 1600 ℃
It is manufactured by firing at high temperature.

【0019】また前記絶縁基体1は搭載部1a周辺から
上面にかけて複数個のメタライス配線層5が被着形成さ
れており、このメタライズ配線層5の搭載部1a周辺部
には半導体素子3の各電極がボンディングワイヤ6を介
して電気的に接続され、また絶縁基体1の上面に導出さ
れた部位には外部電気回路と接続される外部リード端子
7が銀ロウ等のロウ材を介して取着されている。
Further, a plurality of metallized wiring layers 5 are adhered and formed from the periphery of the mounting portion 1a to the upper surface of the insulating base 1, and the electrodes of the semiconductor element 3 are formed around the mounting portion 1a of the metallized wiring layer 5. Are electrically connected via a bonding wire 6, and external lead terminals 7 connected to an external electric circuit are attached to a portion led out to the upper surface of the insulating substrate 1 via a brazing material such as silver brazing. ing.

【0020】前記メタライズ配線層5は半導体素子3の
各電極を外部電気回路に電気的に接続する際の導電路と
して作用し、タングステン、モリプデン、マンガン等の
高融点金属粉末により形成されている。
The metallized wiring layer 5 functions as a conductive path when each electrode of the semiconductor element 3 is electrically connected to an external electric circuit, and is made of a refractory metal powder such as tungsten, molybdenum or manganese.

【0021】前記メタライズ配線層5はタングステン、
モリブデン、マンガン等の高融点金属粉末に適当な有機
バインダー、溶剤、可塑剤等を添加混合して得た金属ペ
ーストを従来周知のスクリーン印刷法等の厚膜手法を採
用して絶縁基体1となるセラミックグリーンシートに予
め印刷塗布しておき、これをセラミックグリーンシート
と同時に焼成することによって絶縁基体1の搭載部1a
周辺から上面にかけて所定パターンに被着形成される。
The metallized wiring layer 5 is made of tungsten,
A metal paste obtained by adding and mixing a suitable organic binder, a solvent, a plasticizer, etc. to a refractory metal powder such as molybdenum or manganese is used as the insulating substrate 1 by adopting a thick film technique such as a conventionally known screen printing method. The ceramic green sheet is printed and applied in advance, and the ceramic green sheet is fired at the same time to mount the insulating substrate 1 on the mounting portion 1a.
It is formed in a predetermined pattern from the periphery to the upper surface.

【0022】なお、前記メタライズ配線層5はその表面
にニッケル、金等の良導電性で耐蝕性及びロウ材との濡
れ性が良好な金属をめっき法により1〜20μmの厚み
に被着させておくと、メタライズ配線層5の酸化腐蝕を
有効に防止することができるとともにメタライズ配線層
5とボンディングワイヤ6との接続及びメタライズ配線
層5と外部リード端子7とのロウ付けを極めて強固とな
すことができる。従って、メタライズ配線層5の酸化腐
蝕を防止し、メタライズ配線層5とボンディングワイヤ
6との接続及びメタライズ配線層5と外部リード端子7
とのロウ付けを強固となすにはメタライズ配線層5の表
面にニッケル、金等をめっき法によリ1〜20μmの厚
みに被着させておくことが好ましい。
The metallized wiring layer 5 is formed by depositing a metal such as nickel or gold having good conductivity, corrosion resistance and wettability with a brazing material to a thickness of 1 to 20 μm by plating. By doing so, it is possible to effectively prevent oxidative corrosion of the metallized wiring layer 5, and to make the connection between the metallized wiring layer 5 and the bonding wire 6 and the brazing of the metallized wiring layer 5 and the external lead terminal 7 extremely strong. You can Therefore, oxidative corrosion of the metallized wiring layer 5 is prevented, the metallized wiring layer 5 and the bonding wire 6 are connected, and the metallized wiring layer 5 and the external lead terminal 7 are connected.
In order to firmly braze the metal with nickel, it is preferable to deposit nickel, gold, etc. on the surface of the metallized wiring layer 5 by a plating method to a thickness of 1 to 20 μm.

【0023】また前記絶縁基体1は搭載部1aの下方に
金属層8が配設されており、その一部は絶縁基体1上面
で搭載部1aを囲繞する位置に形成されている枠状金属
層9に電気的に接続されている。
Further, the insulating base 1 has a metal layer 8 disposed below the mounting portion 1a, and a part of the metal layer 8 is formed on the upper surface of the insulating base 1 so as to surround the mounting portion 1a. 9 is electrically connected.

【0024】前記金属層8は後述する導電性蓋体2とで
内部に収容する半導体素子3を囲み、半導体素子3に外
部より電磁波が作用するのを阻止し、半導体素子3を安
定に作動させる作用をなす。
The metal layer 8 surrounds the semiconductor element 3 housed inside with a conductive lid 2 described later, prevents electromagnetic waves from acting on the semiconductor element 3 from the outside, and operates the semiconductor element 3 stably. Act.

【0025】前記金属層8は、例えば、タングステン、
モリブデン、マンガン等の高融点金属粉末から成り、タ
ングステン、モリブデン、マンガン等の高融点金属粉末
に適当な有機バインダー、溶剤、可塑剤等を添加混合し
て得た金属ペーストを従来周知のスクリーン印刷法等の
厚膜手法を採用して絶縁基体1となるセラミックグリー
ンシートに予め印刷塗布しておき、これをセラミックグ
リーンシートと同時に焼成することによって絶縁基体1
の搭載部1a下方に配されている。
The metal layer 8 is, for example, tungsten,
A metal paste made of refractory metal powder such as molybdenum and manganese, which is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer and the like to refractory metal powder such as tungsten, molybdenum and manganese, and the conventionally known screen printing method. Insulating substrate 1 is formed by applying a thick film method such as the above to a ceramic green sheet to be insulating substrate 1 in advance by printing, and firing the ceramic green sheet simultaneously with the ceramic green sheet.
Is disposed below the mounting portion 1a of the.

【0026】また一方、前記絶縁基体1に形成したメタ
ライズ配線層5には外部リード端子7がロウ付けされて
おり、該外部リード端子7は容器4の内部に収容する半
導体素子3を外部電気回路に接続する作用をなし、外部
リード端子7を外部電気回路に接続することによって内
部に収容される半導体素子3はボンディングワイヤ6、
メタライズ配線層5及び外部リード端子7を介して外部
電気回路に電気的に接続されることとなる。
On the other hand, an external lead terminal 7 is brazed to the metallized wiring layer 5 formed on the insulating base 1, and the external lead terminal 7 connects the semiconductor element 3 housed inside the container 4 to an external electric circuit. The semiconductor element 3 housed inside by connecting the external lead terminal 7 to an external electric circuit has a bonding wire 6,
It is electrically connected to an external electric circuit through the metallized wiring layer 5 and the external lead terminal 7.

【0027】前記外部リード端子7は鉄ーニッケルーコ
バルト合金や鉄ーニッケル合金等の金属材料からなり、
鉄ーニッケルーコバルト合金等のインゴット(塊)に圧
延加工法や打ち抜き加工法等、従来周知の金属加工法を
施すことによって所定の形状に形成される。
The external lead terminal 7 is made of a metal material such as iron-nickel-cobalt alloy or iron-nickel alloy,
It is formed into a predetermined shape by subjecting an ingot (lump) of iron-nickel-cobalt alloy or the like to a conventionally known metal working method such as a rolling working method or a punching working method.

【0028】前記外部リード端子7はまたその表面にニ
ッケル、金等の良導電性で、かつ耐蝕性に優れた金属を
めっき法により1〜20μmの厚みに被着させておく
と、外部リード端子7の酸化腐蝕を有効に防止すること
ができるとともに外部リード端子7と外部電気回路との
電気的接続を良好となすことができる。そのため、前記
外部リード端子7はその表面にニッケル、金等をめっき
法により1〜20μmの厚みに被着させておくことが好
ましい。
The external lead terminal 7 is also coated on its surface with a metal having good conductivity and excellent corrosion resistance such as nickel and gold by plating to a thickness of 1 to 20 μm. It is possible to effectively prevent the oxidative corrosion of 7 and to make good electrical connection between the external lead terminal 7 and the external electric circuit. Therefore, it is preferable to deposit nickel, gold or the like on the surface of the external lead terminal 7 by a plating method to a thickness of 1 to 20 μm.

【0029】更に前記外部リード端子7が取着された絶
縁基体1はその上面に被着されている枠状金属層9に導
電性蓋体2が導電性封止材10を介して接合され、これ
によって絶縁基体1の金属層8と導電性蓋体2とは電気
的に接続されつつ絶縁基体1と導電性蓋体2とから成る
容器4の内部に半導体素子3が気密に収容される。
Further, in the insulating substrate 1 to which the external lead terminals 7 are attached, the conductive lid 2 is bonded to the frame-shaped metal layer 9 adhered on the upper surface thereof via the conductive sealing material 10, As a result, the metal layer 8 of the insulating base 1 and the conductive lid 2 are electrically connected to each other, and the semiconductor element 3 is hermetically housed inside the container 4 including the insulating base 1 and the conductive lid 2.

【0030】前記枠状金属層9は金属層8と電気的に接
続しており、導電性蓋体2を金属層8に電気的に接続さ
せる作用をなし、絶縁基体1の上面で搭載部1aを囲繞
するように幅が、例えば、0.4〜1mm程度で枠状に
形成されている。
The frame-shaped metal layer 9 is electrically connected to the metal layer 8 and has a function of electrically connecting the conductive lid 2 to the metal layer 8, and is mounted on the upper surface of the insulating base 1 on the mounting portion 1a. Is formed in a frame shape with a width of, for example, about 0.4 to 1 mm.

【0031】前記枠状金属層9はその幅が、例えば、
0.4〜1mm程度と広いことから枠状金属層9に導電
性蓋体2を導電性封止材10を介して接合させた際、導
電性封止材10は枠状金属層9と極めて広い面積で接触
して導電性蓋体2と金属層8とが確実に、かつ低い導通
抵抗で電気的接続されることとなり、その結果、容器4
内部に収容する半導体素子3に電磁波が作用するのを確
実に防止して半導体素子3を長期間にわたり正常、かつ
安定に作動させることができる可能となる。
The width of the frame-shaped metal layer 9 is, for example,
Since it is as wide as about 0.4 to 1 mm, when the conductive lid 2 is bonded to the frame-shaped metal layer 9 via the conductive sealing material 10, the conductive sealing material 10 and the frame-shaped metal layer 9 are extremely strong. The conductive lid 2 and the metal layer 8 are contacted with each other over a wide area and are electrically connected to each other reliably and with low conduction resistance. As a result, the container 4
It is possible to reliably prevent the electromagnetic waves from acting on the semiconductor element 3 housed inside and operate the semiconductor element 3 normally and stably for a long period of time.

【0032】なお、前記枠状金属層9は、前述の金属層
8と同一の材料、例えば、タングステン、モリブデン、
マンガン等の高融点金属粉末から成り、絶縁基体1に金
属層8を形成するのと同じ方法によって絶縁基体1の上
面に枠状に形成される。
The frame-shaped metal layer 9 is made of the same material as the metal layer 8 described above, for example, tungsten, molybdenum,
It is made of a refractory metal powder such as manganese and is formed in a frame shape on the upper surface of the insulating base 1 by the same method as that for forming the metal layer 8 on the insulating base 1.

【0033】また前記枠状金属層9には、例えば、孔径
が0.05〜0.4mm程度の複数個の貫通孔9aが設
けてあり、該貫通孔9a内に導電性封止材10と接合性
のよい絶縁基体1の上面を露出させておくことによって
枠状金属層9に導電性蓋体2を導電性封止材10を介し
て接合させる際に絶縁基体1上面に導電性蓋体2を強固
に接合させることができ、これによって絶縁基体1と導
電性蓋体2とから成る容器4の気密封止が完全となり、
容器4内部に収容する半導体素子3を長期間にわたり正
常、かつ安定に作動させることが可能となる。
The frame-shaped metal layer 9 is provided with a plurality of through holes 9a having a hole diameter of about 0.05 to 0.4 mm, and the conductive sealing material 10 is provided in the through holes 9a. When the conductive lid 2 is bonded to the frame-shaped metal layer 9 through the conductive sealing material 10 by exposing the upper surface of the insulating base 1 having good bonding property, the conductive lid is mounted on the upper surface of the insulating base 1. 2 can be firmly joined to each other, whereby the container 4 including the insulating base 1 and the conductive lid 2 is completely hermetically sealed,
The semiconductor element 3 housed inside the container 4 can be operated normally and stably for a long period of time.

【0034】前記枠状金属層9に形成する貫通孔9aは
その平面積の合計が枠状金属層9の平面積の5%未満と
なると枠状金属層9を有する絶縁基体1上面への導電性
蓋体2の接合強度が低下し、絶縁基体1と導電性蓋体2
とから成る容器4の気密封止の信頼性が低下してしまう
傾向にあり、また50%を超えると絶縁基体1に設けた
金属層8に対する導電性封止材10を介しての導電性蓋
体2の電気的接続が信頼性の低いものとなる危険性があ
る。従って、前記枠状金属層9に形成する貫通孔9aは
その平面積の合計を枠状金属層9の平面積の5乃至50
%の範囲としておくことが好ましい。
When the total area of the through holes 9a formed in the frame-shaped metal layer 9 is less than 5% of the plane area of the frame-shaped metal layer 9, the conduction to the upper surface of the insulating substrate 1 having the frame-shaped metal layer 9 is conducted. The bonding strength of the flexible lid 2 is reduced, and the insulating base 1 and the conductive lid 2 are
The reliability of the hermetic sealing of the container 4 composed of is likely to deteriorate, and if it exceeds 50%, the conductive lid for the metal layer 8 provided on the insulating substrate 1 via the conductive sealing material 10 is provided. There is a risk that the electrical connection of the body 2 will be unreliable. Therefore, the through holes 9a formed in the frame-shaped metal layer 9 have a total plane area of 5 to 50 of the plane area of the frame-shaped metal layer 9.
It is preferable to set it in the range of%.

【0035】前記貫通孔9aは枠状金属層9をスクリー
ン印刷法等の厚膜手法を採用することによって形成する
際、予めスクリーンマスクに貫通孔9aに対応する形状
の非貫通部を形成しておくことによって枠状金属層9の
所定位置に所定形状に形成される。
When the frame-shaped metal layer 9 is formed by using a thick film method such as a screen printing method, the through-hole 9a is formed in advance by forming a non-through portion having a shape corresponding to the through-hole 9a on the screen mask. By placing it, the frame-shaped metal layer 9 is formed in a predetermined shape at a predetermined position.

【0036】更に前記枠状金属層9には導電性封止材1
0を介して導電性蓋体2が接合され、該導電性蓋体2は
酸化アルミニウム質焼結体の表面に銅やアルミニウム等
の金属膜を被着させたもの、或いは鉄ーニッケルーコバ
ルト合金や鉄ーニッケル合金等の金属材料からなり、絶
縁基体1の搭載部1aに搭載された半導体素子3を気密
に封止するとともに前述の絶縁基体1に配設した金属層
8とで半導体素子3を囲み半導体素子3に外部より電磁
波が作用するのを阻止し、半導体素子3を安定に作動さ
せる作用をなす。
Further, the frame-shaped metal layer 9 has a conductive sealing material 1
The conductive lid body 2 is joined via 0, and the conductive lid body 2 is obtained by depositing a metal film such as copper or aluminum on the surface of an aluminum oxide sintered body, or an iron-nickel-cobalt alloy. And a metal layer 8 made of a metal material such as an iron-nickel alloy and hermetically sealing the semiconductor element 3 mounted on the mounting portion 1a of the insulating base 1 and the metal layer 8 disposed on the insulating base 1 to form the semiconductor element 3 It acts to prevent electromagnetic waves from acting on the surrounding semiconductor element 3 and to operate the semiconductor element 3 in a stable manner.

【0037】また更に、前記枠状金属層9に導電性蓋体
2を接合させる導電性封止材10は絶縁基体1と導電性
蓋体2とから成る容器4内部に半導体素子3を気密に封
止するとともに絶縁基体1の金属層8と導電性蓋体2と
を電気的に接続させる作用をなし、例えば、ガラスや有
機樹脂に金属粉末を含有させたもので形成されている。
Furthermore, the conductive sealing material 10 for bonding the conductive lid 2 to the frame-shaped metal layer 9 hermetically seals the semiconductor element 3 inside the container 4 composed of the insulating base 1 and the conductive lid 2. It has a function of electrically connecting the metal layer 8 of the insulating substrate 1 and the conductive lid body 2 while sealing, and is formed of, for example, glass or an organic resin containing metal powder.

【0038】前記導電性封止材10は、これを酸化鉛5
0乃至65重量%、酸化ホウ素2乃至10重量%、フッ
化鉛10乃至30重量%、酸化亜鉛1乃至6重量%、酸
化ビスマス10乃至20重量%を含むガラス成分に、フ
ィラーとしてのチタン酸鉛系化合物を26乃至45重量
%、銅、鉄ーニッケル合金、鉄ーニッケルーコバルト合
金を5乃至20重量%添加した導電性のガラスで形成し
ておくと該導電性のガラスは軟化溶融温度が320℃以
下と低く、そのため絶縁基体1と導電性蓋体2とを接合
させ、容器4を気密に封止する際、封止温度を低温とな
すことができ、その結果、導電性封止材10を溶融させ
る熱が内部に収容する半導体素子3に作用しても半導体
素子3の特性に劣化を招来することはなく、半導体素子
3を長期間にわたり正常、かつ安定に作動させることが
可能となる。またこの導電性ガラスの軟化溶融温度は3
20℃以下と低いことから半導体素子3が絶縁基体1の
搭載部1aに樹脂等の接着材を介して接着固定されてい
る場合、半導体素子3の接着固定の特性が導電性封止材
10を軟化溶融させる熱によって大きく劣化することも
なく、これによって半導体素子3を絶縁基体1の搭載部
1aに極めて強固に接着固定しておくことが可能とな
り、半導体素子3を常に安定に作動させることもでき
る。
The conductive sealing material 10 is made of lead oxide 5
Lead titanate as a filler in a glass component containing 0 to 65% by weight, boron oxide 2 to 10% by weight, lead fluoride 10 to 30% by weight, zinc oxide 1 to 6% by weight, and bismuth oxide 10 to 20% by weight. When the conductive glass is formed of conductive glass containing 26 to 45% by weight of a compound and 5 to 20% by weight of copper, iron-nickel alloy, iron-nickel-cobalt alloy, the conductive glass has a softening melting temperature of 320. The temperature is as low as not more than 0 ° C., and therefore, when the insulating substrate 1 and the conductive lid 2 are bonded and the container 4 is hermetically sealed, the sealing temperature can be set to a low temperature, and as a result, the conductive sealing material 10 can be obtained. Even if the heat for melting the semiconductor element acts on the semiconductor element 3 contained therein, the characteristics of the semiconductor element 3 are not deteriorated, and the semiconductor element 3 can be operated normally and stably for a long period of time. . The softening and melting temperature of this conductive glass is 3
Since the temperature is as low as 20 ° C. or lower, when the semiconductor element 3 is adhesively fixed to the mounting portion 1a of the insulating substrate 1 via an adhesive material such as a resin, the semiconductor element 3 has the adhesive fixing characteristic of the conductive sealing material 10. The semiconductor element 3 can be extremely firmly adhered and fixed to the mounting portion 1a of the insulating substrate 1 without being significantly deteriorated by the heat of softening and melting, and the semiconductor element 3 can always be stably operated. it can.

【0039】なお、前記導電性封止材10を酸化鉛50
乃至65重量%、酸化ホウ素2乃至10重量%、フッ化
鉛10乃至30重量%、酸化亜鉛1乃至6重量%、酸化
ビスマス10乃至20重量%を含むガラス成分に、フィ
ラーとしてのチタン酸鉛系化合物を26乃至45重量
%、銅、鉄ーニッケル合金、鉄ーニッケルーコバルト合
金を5乃至20重量%添加した導電性のガラスで形成す
る場合、酸化鉛の量が50重量%未満であるとガラスの
軟化溶融温度が高くなって、容器4を気密封止する際の
熱によって半導体素子3の特性に劣化を招来してしま
い、また65重量%を超えるとガラスの耐薬品性が低下
し、容器4の気密封止の信頼性が大きく低下してしま
う。従って、前記酸化鉛の量は50乃至65重量%の範
囲としておくことが好ましい。
The conductive sealing material 10 is made of lead oxide 50.
To 65% by weight, boron oxide 2 to 10% by weight, lead fluoride 10 to 30% by weight, zinc oxide 1 to 6% by weight, bismuth oxide 10 to 20% by weight, and a lead titanate-based filler as a filler. When the compound is made of conductive glass containing 26 to 45% by weight of copper, 5 to 20% by weight of copper, iron-nickel alloy and iron-nickel-cobalt alloy, the glass containing less than 50% by weight of lead oxide is used. The softening and melting temperature of the container becomes high, and the heat of hermetically sealing the container 4 causes deterioration of the characteristics of the semiconductor element 3. If it exceeds 65% by weight, the chemical resistance of the glass decreases, and The reliability of the hermetic sealing of No. 4 will be greatly reduced. Therefore, the amount of lead oxide is preferably set in the range of 50 to 65% by weight.

【0040】また酸化ホウ素の量は2重量%未満である
とガラスの結晶化が進んで流動性が大きく低下し、容器
4の気密封止が困難となってしまい、また10重量%を
超えるとガラスの軟化溶融温度が高くなって、容器4を
気密封止する際の熱によって半導体素子3の特性に劣化
を招来してしまう。従って、前記酸化ホウ素の量は2乃
至10重量%の範囲としておくことが好ましい。
If the amount of boron oxide is less than 2% by weight, the crystallization of the glass will proceed and the fluidity will be greatly reduced, making it difficult to hermetically seal the container 4, and if it exceeds 10% by weight. The softening and melting temperature of the glass becomes high, and the heat of sealing the container 4 hermetically deteriorates the characteristics of the semiconductor element 3. Therefore, the amount of boron oxide is preferably set in the range of 2 to 10% by weight.

【0041】またフッ化鉛の量は10重量%未満である
とガラスの軟化溶融温度が高くなって、容器4を気密封
止する際の熱によって半導体素子3の特性に劣化を招来
してしまい、また30重量%を適えるとガラスの耐薬品
性が低下し、容器4の気密封止の信頼性が大きく低下し
てしまう。従って、前記フッ化鉛の量は10乃至30重
量%の範囲としておくことが好ましい。
If the amount of lead fluoride is less than 10% by weight, the softening and melting temperature of the glass becomes high, and the heat of sealing the container 4 hermetically deteriorates the characteristics of the semiconductor element 3. Further, if 30% by weight is suitable, the chemical resistance of the glass is lowered, and the reliability of hermetic sealing of the container 4 is greatly lowered. Therefore, the amount of lead fluoride is preferably set in the range of 10 to 30% by weight.

【0042】また酸化亜鉛の量は1重量%未満であると
ガラスの耐薬品性が低下し、容器4の気密封止の信頼性
が大きく低下してしまい、また6重量%を超えるとガラ
スの結晶化が進んで流動性が大きく低下し、容器4の気
密封止が困難となってしまう。従って、前記酸化亜鉛の
量は1乃至6重量%の範囲としておくことが好ましい。
If the amount of zinc oxide is less than 1% by weight, the chemical resistance of the glass is lowered, and the reliability of hermetic sealing of the container 4 is greatly lowered. Crystallization proceeds and the fluidity is greatly reduced, making it difficult to hermetically seal the container 4. Therefore, the amount of zinc oxide is preferably set in the range of 1 to 6% by weight.

【0043】また酸化ビスマスの量は10重量%未満で
あるとガラスの軟化溶融温度が高くなって、容器4を気
密封止する際の熱によって半導体素子3の特性に劣化を
招来してしまい、また20重量%を超えるとガラスの結
晶化が進んで流動性が大きく低下し、容器4の気密封止
が困難となってしまう。従って、前記酸化ビスマスの量
は10乃至20重量%の範囲としておくことが好まし
い。
When the amount of bismuth oxide is less than 10% by weight, the softening and melting temperature of the glass becomes high and the heat of the hermetically sealing the container 4 causes the characteristics of the semiconductor element 3 to deteriorate. On the other hand, if it exceeds 20% by weight, the crystallization of the glass will proceed and the fluidity will be greatly reduced, making it difficult to hermetically seal the container 4. Therefore, it is preferable that the amount of bismuth oxide is in the range of 10 to 20% by weight.

【0044】また前記導電性封止材10にフィラーとし
て添加されるチタン酸鉛系化合物は導電性封止材10の
熱膨張係数を調整し、絶縁基体1と導電性蓋体2とに導
電性封止材10を強固に接合させ、容器4の気密封止の
信頼性を大きく向上させる作用をなし、その量が26重
量%未満であると導電性封止材10の熱膨張係数が絶縁
基体1と導電性蓋体2の熱膨張係数に対し大きく相違し
て導電性封止材10を絶縁基体1及び導電性蓋体2に強
固に接合させることができなくなり、また45重量%を
超えると導電性封止材10の流動性が低下し、容器4の
気密封止が困難となってしまう。従って、前記チタン酸
鉛系化合物はその量を26乃至45重量%の範囲として
おくことが好ましい。
The lead titanate compound added as a filler to the conductive sealing material 10 adjusts the coefficient of thermal expansion of the conductive sealing material 10 so that the insulating substrate 1 and the conductive lid 2 are made conductive. If the amount of the sealing material 10 is less than 26% by weight, the coefficient of thermal expansion of the conductive sealing material 10 will be an insulating substrate. 1 and the conductive lid 2 are greatly different from each other in thermal expansion coefficient, the conductive sealing material 10 cannot be firmly bonded to the insulating substrate 1 and the conductive lid 2, and when it exceeds 45% by weight. The fluidity of the conductive encapsulant 10 decreases, making it difficult to hermetically seal the container 4. Therefore, the amount of the lead titanate-based compound is preferably set in the range of 26 to 45% by weight.

【0045】また前記導電性封止材10にフィラーとし
て添加される銅、鉄ーニッケル合金、鉄ーニッケルーコ
バルト合金は導電性封止材10の導電性付与材であり、
その量が5重量%未満であると導電性封止材10の導電
率が低下し、絶縁基体1の金属層8に接続されている枠
状金属層9に対し導電性蓋体2を確実に電気的接続する
ことができなくなり、また20重量%を超えると導電性
封止材10の流動性が低下し、容器4の気密封止が困難
となってしまう。従って、前記銅はその量が5乃至20
重量%の範囲としておくことが好ましい。
Copper, iron-nickel alloy, and iron-nickel-cobalt alloy added as fillers to the conductive sealing material 10 are conductivity-imparting materials for the conductive sealing material 10.
When the amount is less than 5% by weight, the conductivity of the conductive encapsulant 10 is lowered, and the conductive lid 2 is surely attached to the frame-shaped metal layer 9 connected to the metal layer 8 of the insulating substrate 1. It becomes impossible to make electrical connection, and if it exceeds 20% by weight, the fluidity of the conductive sealing material 10 is lowered, and it becomes difficult to hermetically seal the container 4. Therefore, the amount of copper is 5 to 20
It is preferable to set it in the range of% by weight.

【0046】かくして上述の半導体素子収納用パッケー
ジによれば、絶縁基体1の搭載部1aに半導体素子3を
ガラス、樹脂、ロウ材等から成る接着材を介して接着固
定するとともに半導体素子3の各電極をメタライズ配線
層5にボンディングワイヤ6を介して電気的に接続し、
しかる後、絶縁基体1上面の枠状金属層9に導電性蓋体
2を前記搭載部1aを覆うように導電性封止材10を介
して接合させ、絶縁基体1の金属層8と導電性蓋体2と
を電気的に接続させつつ絶縁基体1と導電性蓋体2とか
ら成る容器4の内部に半導体素子3を気密に収容するこ
とによって最終製品としての半導体装置が完成する。
Thus, according to the above-mentioned package for accommodating semiconductor elements, the semiconductor element 3 is adhered and fixed to the mounting portion 1a of the insulating substrate 1 via the adhesive material made of glass, resin, brazing material or the like, and The electrodes are electrically connected to the metallized wiring layer 5 via the bonding wires 6,
After that, the conductive lid 2 is bonded to the frame-shaped metal layer 9 on the upper surface of the insulating base 1 via the conductive sealing material 10 so as to cover the mounting portion 1a, and the metal layer 8 of the insulating base 1 and the conductive layer 2 are made conductive. The semiconductor device as a final product is completed by hermetically housing the semiconductor element 3 inside the container 4 composed of the insulating base 1 and the conductive lid 2 while electrically connecting the lid 2.

【0047】なお、本発明は上述の実施の形態に限定さ
れるものではなく、本発明の要旨を逸脱しない範囲であ
れば種々の変更は可能であり、例えば、前述の例では電
子部品として半導体素子を収容する電子部品収納用パッ
ケージを例示したが、電子部品が圧電磁気振動子や弾性
表面波素子等であり、これを収容するための電子部品収
納用パッケージにも適用し得る。
The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the present invention. For example, in the above-described example, a semiconductor is used as an electronic component. Although the electronic component storage package for accommodating the element has been illustrated, the electronic component is a piezoelectric magnetic vibrator, a surface acoustic wave element, or the like, and can be applied to an electronic component storage package for accommodating this.

【0048】また前述の例ではメタライズ配線層5に外
部リード端子7をロウ付けした電子部品収納用パッケー
ジを例示したが、必ずしもこれに限定されるものではな
く、メタライズ配線層を絶縁基体の下面に導出させ、こ
れをそのまま外部電気回路に接続させる端子としたもの
であってもよい。
Further, in the above-mentioned example, the package for storing electronic parts in which the external lead terminals 7 are brazed to the metallized wiring layer 5 is illustrated, but the invention is not necessarily limited to this, and the metallized wiring layer is provided on the lower surface of the insulating substrate. It may be a terminal which is led out and connected directly to an external electric circuit.

【0049】[0049]

【発明の効果】本発明の電子部品収納用パッケージによ
れば、絶縁基体の電子部品が搭載される搭載部下方に金
属層を配するとともに該金属層の一部を絶縁基体上面に
形成した枠状金属層に電気的に接続させたことから絶縁
基体上面に導電性蓋体を導電性封止材を介して接合させ
る際、導電性封止材は枠状金属層と極めて広い面積で接
触して導電性蓋体と金属層とが確実に、かつ低い導通抵
抗で電気的接続されることとなり、その結果、電子部品
に電磁波が作用するのを確実に防止して電子部品を長期
間にわたり正常、かつ安定に作動させることが可能とな
る。
According to the electronic component storage package of the present invention, a frame is provided in which a metal layer is arranged below the mounting portion of the insulating base on which electronic components are mounted, and a part of the metal layer is formed on the upper surface of the insulating base. When the conductive lid is bonded to the upper surface of the insulating substrate via the conductive sealing material, the conductive sealing material makes contact with the frame-shaped metal layer in an extremely large area. As a result, the conductive lid and the metal layer are reliably and electrically connected with a low conduction resistance, and as a result, electromagnetic waves are surely prevented from acting on the electronic components and the electronic components are kept in a normal operating condition for a long time. And, it becomes possible to operate stably.

【0050】また本発明の電子部品収納用パッケージに
よれば、枠状金属層に該枠状金属層の平面積に対し、合
計の平面積が例えば、5乃至50%となる複数個の貫通
孔を形成し、貫通孔内部に導電性封止材と接合性の良い
絶縁基体の上面を露出させたことから、枠状金属層が形
成されている絶縁基体上面に導電性蓋体を導電性封止材
を介して接合させる際、導電性封止材の一部が、貫通孔
内部に露出する絶縁基体上面に強固に接合し、その結
果、絶縁基体と導電性蓋体とから成る容器の気密封止が
完全となり、容器内部に収容する電子部品を長期間にわ
たり正常、かつ安定に作動させることもできる。
Further, according to the package for housing electronic parts of the present invention, the frame-shaped metal layer has a plurality of through holes having a total plane area of, for example, 5 to 50% of the plane area of the frame-shaped metal layer. Since the upper surface of the insulating substrate having good bonding property with the conductive sealing material is exposed inside the through hole, the conductive lid is conductively sealed on the upper surface of the insulating substrate on which the frame-shaped metal layer is formed. At the time of joining through the stopper, a part of the conductive sealing material is firmly joined to the upper surface of the insulating base exposed inside the through hole, and as a result, the gas of the container including the insulating base and the conductive lid is sealed. The tight sealing is complete, and the electronic components housed inside the container can be operated normally and stably for a long period of time.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の電子部品収納用パッケージの実施の形
態の一例を示す断面図である。
FIG. 1 is a sectional view showing an example of an embodiment of a package for housing an electronic component of the present invention.

【図2】図1に示す電子部品収納用パッケージの要部拡
大断面図である。
FIG. 2 is an enlarged cross-sectional view of a main part of the electronic component storage package shown in FIG.

【図3】図1に示す電子部品収納用パッケージの絶縁基
体の搭載部周辺の拡大平面図である。
FIG. 3 is an enlarged plan view around the mounting portion of the insulating base of the electronic component storage package shown in FIG.

【符号の説明】[Explanation of symbols]

1・・・・・・・絶縁基体 2・・・・・・・導電性蓋体 3・・・・・・・半導体素子(電子部品) 4・・・・・・・容器 8・・・・・・・金属層 9・・・・・・・枠状金属層 9a・・・・・・貫通孔 10・・・・・・導電性封止材 1 ... Insulating substrate 2 .... Conductive lid 3 ... Semiconductor element (electronic component) 4 ... Container 8 ... Metal layer 9 .... Frame-shaped metal layer 9a ... through hole 10 ... Conductive sealing material

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−216652(JP,A) 特開 平6−268091(JP,A) 特開 平8−204059(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 23/00 H01L 23/02 H01L 23/10 H05K 9/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-216652 (JP, A) JP-A-6-268091 (JP, A) JP-A-8-204059 (JP, A) (58) Field (Int.Cl. 7 , DB name) H01L 23/00 H01L 23/02 H01L 23/10 H05K 9/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】上面に電子部品が搭載される搭載部および
該搭載部を囲繞するように形成された枠状金属層を有
し、かつ前記搭載部の下方に前記枠状金属層と電気的に
接続されている金属層が配設されている絶縁基体と、導
電性蓋体とからなり、前記枠状金属層に導電性蓋体を導
電性封止材を介して接合させ、前記金属層と導電性蓋体
とを電気的に接続させつつ絶縁基体と導電性蓋体とから
なる容器内部に電子部品を気密に収容するようになした
電子部品収納用パッケージであって、前記枠状金属層に
多数の貫通孔が形成されていることを特徴とする電子部
品収納用パッケージ。
1. A top surface having a mounting portion on which an electronic component is mounted and a frame-shaped metal layer formed so as to surround the mounting portion, and electrically connected to the frame-shaped metal layer below the mounting portion. An insulating substrate having a metal layer connected thereto and a conductive lid, and the frame-shaped metal layer is joined to the conductive lid through a conductive sealing material to form the metal layer. And a conductive lid are electrically connected to each other, and an electronic component storing package for hermetically storing electronic components inside a container made of an insulating base and a conductive lid, wherein the frame-shaped metal A package for housing electronic components, characterized in that a number of through holes are formed in the layer.
【請求項2】前記貫通孔の平面積の合計が枠状金属層の
平面積の5乃至50%であることを特徴とする請求項1
に記載の電子部品収納用パッケージ。
2. The total plane area of the through holes is 5 to 50% of the plane area of the frame-shaped metal layer.
The electronic component storage package described in.
JP04081598A 1998-02-23 1998-02-23 Electronic component storage package Expired - Fee Related JP3464137B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04081598A JP3464137B2 (en) 1998-02-23 1998-02-23 Electronic component storage package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04081598A JP3464137B2 (en) 1998-02-23 1998-02-23 Electronic component storage package

Publications (2)

Publication Number Publication Date
JPH11238819A JPH11238819A (en) 1999-08-31
JP3464137B2 true JP3464137B2 (en) 2003-11-05

Family

ID=12591160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04081598A Expired - Fee Related JP3464137B2 (en) 1998-02-23 1998-02-23 Electronic component storage package

Country Status (1)

Country Link
JP (1) JP3464137B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7001445B2 (en) * 2017-11-30 2022-01-19 ローム株式会社 Semiconductor devices and their manufacturing methods

Also Published As

Publication number Publication date
JPH11238819A (en) 1999-08-31

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