JP3359536B2 - Electronic component storage container - Google Patents

Electronic component storage container

Info

Publication number
JP3359536B2
JP3359536B2 JP10916097A JP10916097A JP3359536B2 JP 3359536 B2 JP3359536 B2 JP 3359536B2 JP 10916097 A JP10916097 A JP 10916097A JP 10916097 A JP10916097 A JP 10916097A JP 3359536 B2 JP3359536 B2 JP 3359536B2
Authority
JP
Japan
Prior art keywords
weight
sealing material
electronic component
container
insulating base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10916097A
Other languages
Japanese (ja)
Other versions
JPH10303326A (en
Inventor
吉明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP10916097A priority Critical patent/JP3359536B2/en
Publication of JPH10303326A publication Critical patent/JPH10303326A/en
Application granted granted Critical
Publication of JP3359536B2 publication Critical patent/JP3359536B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item

Landscapes

  • Glass Compositions (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体素子や圧電振
動子等の電子部品を気密に封止して収容するための電子
部品収納用容器に関し、特に封止材にガラスを用いて封
止を行なう電子部品収納用容器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component storage container for hermetically sealing and storing electronic components such as a semiconductor element and a piezoelectric vibrator. The present invention relates to a container for storing electronic components.

【0002】[0002]

【従来の技術】従来、半導体集積回路素子を初めとする
半導体素子あるいは水晶振動子・弾性表面波素子といっ
た圧電振動子等の電子部品を収容するための電子部品収
納用容器は、例えば酸化アルミニウム(Al2 3 )質
焼結体等の電気絶縁材料から成り、その上面あるいは下
面の略中央部に電子部品を収容するための凹部およびそ
の凹部周辺から下面にかけて導出された、例えばタング
ステンやモリブデン等の高融点金属粉末から成る複数個
のメタライズ配線層を有する絶縁基体と、電子部品を外
部電気回路に電気的に接続するための外部接続端子、例
えばメタライズ配線層に銀ロウ等のロウ材を介して取着
された外部リード端子あるいは外部電極パッド等と、絶
縁基体と同じく酸化アルミニウム質焼結体やガラス等の
電気絶縁材料から成る蓋体とから構成されている。
2. Description of the Related Art Conventionally, an electronic component storage container for storing electronic components such as a semiconductor device such as a semiconductor integrated circuit device or a piezoelectric vibrator such as a crystal vibrator or a surface acoustic wave device has been made of, for example, aluminum oxide al 2 O 3) made of electrically insulating material quality sintered body or the like, derived over the lower surface of the recess and the recess periphery for accommodating an electronic component on a substantially central portion of the upper surface or the lower surface, for example, tungsten or molybdenum An insulating base having a plurality of metallized wiring layers made of a high melting point metal powder and external connection terminals for electrically connecting electronic components to an external electric circuit, for example, a metallized wiring layer with a brazing material such as silver brazing. The external lead terminals or external electrode pads, etc. attached by the same method as the insulating base are made of an electrically insulating material such as aluminum oxide sintered body or glass. It is composed of a lid that.

【0003】そして、電子部品が例えば半導体素子の場
合には、絶縁基体の凹部の底面に半導体素子をガラス・
樹脂・ロウ材等から成る接着剤を介して接着固定すると
ともに半導体素子の各電極とメタライズ配線層とをボン
ディングワイヤ等の電気的接続手段を介して電気的に接
続し、しかる後、絶縁基体の上面に蓋体を低融点ガラス
から成る封止材を介して接合させ、絶縁基体と蓋体とか
ら成る容器内部に半導体素子を気密に収容することによ
って最終製品としての半導体装置となる。
When the electronic component is, for example, a semiconductor element, the semiconductor element is placed on the bottom surface of the concave portion of the insulating base by glass.
The electrodes of the semiconductor element and the metallized wiring layer are electrically connected via electrical connection means such as bonding wires, and then the insulating base is fixed. A lid is bonded to the upper surface via a sealing material made of low-melting glass, and the semiconductor element is hermetically housed in a container formed of the insulating base and the lid, thereby obtaining a semiconductor device as a final product.

【0004】また、電子部品が例えば圧電振動子の場合
には、絶縁基体の凹部の底面に形成された一対の段差部
に、真空中において圧電振動子の一端をポリイミド導電
性樹脂等から成る接着剤を介して接着固定するとともに
圧電振動子の各電極をメタライズ配線層に電気的に接続
し、しかる後、絶縁基体の上面に蓋体を半田等の低融点
ロウ材や有機樹脂あるいは低融点ガラスから成る封止材
を介して接合させ、絶縁基体と蓋体とから成る容器内部
に圧電振動子を気密に収容することによって最終製品と
しての電子部品装置となる。
In the case where the electronic component is, for example, a piezoelectric vibrator, one end of the piezoelectric vibrator is bonded to a pair of steps formed on the bottom surface of the concave portion of the insulating base in a vacuum by using a polyimide conductive resin or the like. At the same time, the electrodes of the piezoelectric vibrator are electrically connected to the metallized wiring layer, and then a lid is placed on the upper surface of the insulating substrate with a low melting point brazing material such as solder, an organic resin, or a low melting point glass. And a piezoelectric vibrator is hermetically accommodated in a container formed of an insulating base and a lid, thereby providing an electronic component device as a final product.

【0005】なお、絶縁基体に蓋体を接合させる低融点
ガラスから成る封止材としては、一般に例えば酸化鉛56
〜66重量%・酸化ホウ素4〜14重量%・酸化珪素1〜6
重量%・酸化ビスマス0.5 〜5重量%・酸化亜鉛0.5 〜
3重量%を含むガラス成分にフィラーとしてのコージェ
ラント系化合物を9〜19重量%・チタン酸錫系化合物を
10〜20重量%添加したガラスが使用されている。
[0005] As a sealing material made of low-melting glass for joining a lid to an insulating substrate, for example, lead oxide 56 is generally used.
66% by weight, boron oxide 4-14% by weight, silicon oxide 1-6
Weight% bismuth oxide 0.5 to 5 weight% zinc oxide 0.5 to
9 to 19% by weight of a cordierant-based compound as a filler and a tin titanate-based compound in a glass component containing 3% by weight
Glass added with 10-20% by weight is used.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、従来の
電子部品収納用容器においては、電子部品が例えば圧電
振動子の場合には、封止材として有機樹脂を使用した場
合、有機樹脂は耐湿性に劣るため大気中に含まれる水分
が封止材を通して絶縁基体と蓋体とから成る容器内部に
入り込んでしまい、その結果、容器内部に収容された圧
電振動子の表面に水分が付着して表面の電極を酸化腐食
させ、圧電振動子の振動周波数にバラツキを発生させる
という欠点を有していた。
However, in a conventional container for storing electronic components, when the electronic component is, for example, a piezoelectric vibrator, when the organic resin is used as a sealing material, the organic resin becomes less resistant to moisture. Because of the inferiority, the moisture contained in the air enters the inside of the container consisting of the insulating base and the lid through the sealing material, and as a result, moisture adheres to the surface of the piezoelectric vibrator accommodated inside the container, and There is a drawback in that the electrodes are oxidized and corroded, causing variations in the vibration frequency of the piezoelectric vibrator.

【0007】また、封止材として半田等の低融点ロウ材
を使用した場合は、低融点ロウ材には通常フラックスが
含有されているため、絶縁基体と蓋体とを接合させて容
器内部に圧電振動子を気密に収容する際に封止材に含有
されているフラックスの一部が容器内部に入り込んで内
部に収容する圧電振動子の表面に付着して表面の電極を
腐食し、圧電振動子の振動周波数にバラツキを発生させ
るという欠点を有していた。
When a low-melting-point brazing material such as solder is used as a sealing material, the low-melting-point brazing material usually contains a flux. When the piezoelectric vibrator is housed in an airtight manner, part of the flux contained in the sealing material enters the container and adheres to the surface of the piezoelectric vibrator housed inside, causing corrosion of the electrodes on the surface, This has the disadvantage of causing variations in the vibration frequency of the child.

【0008】さらに、電子部品が圧電振動子の場合に封
止材に従来の低融点ガラスを使用した場合は、その際の
封止温度が約400 ℃程度と有機樹脂および低融点ロウ材
に比べて高いため圧電振動子を接着固定している導電性
樹脂が劣化してしまい、圧電振動子の振動周波数にバラ
ツキを発生させるという欠点を有していた。また、導電
性樹脂の耐熱性との関係で、耐熱性の低いエポキシ系の
樹脂を用いた場合には蓋体をガラス封止できないという
制約があり、圧電振動子の固定に対する耐衝撃性を高め
ることが困難であるという欠点も有していた。
Further, when a conventional low melting point glass is used as a sealing material when the electronic component is a piezoelectric vibrator, the sealing temperature at that time is about 400 ° C., which is lower than that of an organic resin and a low melting point brazing material. As a result, the conductive resin to which the piezoelectric vibrator is adhered and fixed is deteriorated, and the vibration frequency of the piezoelectric vibrator is varied, which has a disadvantage. Also, due to the heat resistance of the conductive resin, when an epoxy resin having low heat resistance is used, there is a restriction that the lid body cannot be sealed with glass, and the impact resistance to fixing the piezoelectric vibrator is improved. It also has the disadvantage that it is difficult to do so.

【0009】なお、封止温度の悪影響を低減する目的で
従来の低融点ガラスを封止材に用いて300 ℃以下の低い
封止温度で蓋体を接合した場合には、封止後の電子部品
収納用容器を外部電気回路基板の配線導体に半田等のロ
ウ材を介して実装する際の熱で封止材の低融点ガラスが
再溶融し、容器内部に流動して圧電振動子に接触するこ
ととなり、その結果、圧電振動子の周波数特性に封止後
の周波数変動(目標周波数からの変動)等の不具合を発
生させるという問題点があった。
When the lid is bonded at a low sealing temperature of 300 ° C. or less using a conventional low-melting glass as a sealing material for the purpose of reducing the adverse effect of the sealing temperature, the electron after sealing is removed. The low melting glass of the sealing material is re-melted by the heat of mounting the component storage container to the wiring conductor of the external electric circuit board via solder or other brazing material, flows into the container, and contacts the piezoelectric vibrator As a result, there has been a problem that the frequency characteristics of the piezoelectric vibrator cause problems such as frequency fluctuation after sealing (fluctuation from a target frequency).

【0010】また、以上のような電子部品が圧電振動子
の場合に限らず、従来の電子部品収納用容器において
は、絶縁基体に蓋体を接合させる封止材である低融点ガ
ラスの軟化溶融温度が約400 ℃程度であること、近時の
電子部品は高密度化・高集積化に伴って耐熱性が低下し
てきたこと等から、絶縁基体と蓋体とを封止材を介して
接合し、絶縁基体と蓋体とからなる絶縁容器の内部に電
子部品を気密に収容する場合、封止材を溶融させる熱が
内部に収容する電子部品に作用して電子部品の特性に劣
化を招来させ、電子部品を正常に作動させることができ
ないという問題点を有していた。
In addition, not only when the above electronic components are piezoelectric vibrators but also in conventional electronic component storage containers, the softening and melting of the low melting glass, which is a sealing material for joining the lid to the insulating base, is used. Since the temperature is about 400 ° C and the heat resistance of electronic components has recently been reduced due to higher density and higher integration, the insulating base and the lid are joined via a sealing material. However, when the electronic component is hermetically accommodated in an insulating container including an insulating base and a lid, heat for melting the sealing material acts on the electronic component accommodated therein, thereby deteriorating the characteristics of the electronic component. As a result, there is a problem that the electronic components cannot be operated normally.

【0011】また、電子部品を絶縁基体の凹部の底面あ
るいは段差部へ接着固定する際の接着剤の耐熱性から、
電子部品を接着固定している導電性樹脂が封止材を溶融
させる熱により劣化してしまい、電子部品を安定して作
動させることができないという問題点もあり、封止温度
に対してはより低温化が要求されている。
[0011] Further, from the heat resistance of the adhesive when the electronic component is bonded and fixed to the bottom surface or the step portion of the concave portion of the insulating base,
There is also a problem that the conductive resin adhesively fixing the electronic component is deteriorated by heat that melts the sealing material, and the electronic component cannot be operated stably. Low temperature is required.

【0012】そのため、最近では電子部品収納用容器の
絶縁基体と蓋体とを接合させて絶縁容器の内部を気密に
封止する封止材として、軟化溶融温度が300 ℃以下のも
のが要求されるようになってきた。
Therefore, recently, a sealing material having a softening / melting temperature of 300 ° C. or less is required as a sealing material for joining an insulating base and a lid of an electronic component housing container to hermetically seal the inside of the insulating container. It has become.

【0013】本発明は上記問題点に鑑みて案出されたも
のであり、その目的は、絶縁基体と蓋体とからなる絶縁
容器の内部に電子部品をその特性の劣化を招来すること
なく気密性をより高めて気密に封止し、かつ容器内部に
収容される電子部品の固定を確実かつ強固なものとする
とともに電子部品表面の電極の酸化腐食等を有効に防止
して、電子部品を長期間にわたり正常に作動させること
ができる電子部品収納用容器を提供することにある。
The present invention has been devised in view of the above problems, and has as its object to hermetically seal electronic components in an insulating container comprising an insulating base and a lid without deteriorating its characteristics. Enhance the airtightness of the electronic components, and secure and firmly secure the electronic components housed inside the container. An object of the present invention is to provide an electronic component storage container that can be normally operated for a long period of time.

【0014】[0014]

【課題を解決するための手段】本発明の電子部品収納用
容器は、絶縁基体と蓋体とを封止材を介して接合させ、
絶縁基体と蓋体とから成る容器内部に電子部品を気密に
収容する電子部品収納用容器であって、前記封止材が酸
化鉛30乃至50重量%、酸化硼素1乃至6重量%、酸化亜
鉛7乃至15重量%、弗化鉛21乃至30重量%、酸化ビスマ
ス14乃至20重量%を含むガラス成分に、フィラーとして
のチタン酸鉛系化合物を5乃至24重量%添加したガラス
から成ることを特徴とするものである。
According to a first aspect of the present invention, there is provided a container for storing electronic parts, wherein an insulating base and a lid are joined via a sealing material.
An electronic component storage container for hermetically storing electronic components in a container including an insulating base and a lid, wherein the sealing material is 30 to 50% by weight of lead oxide, 1 to 6% by weight of boron oxide, and zinc oxide. The glass is composed of glass containing 7 to 15% by weight, 21 to 30% by weight of lead fluoride, and 14 to 20% by weight of bismuth oxide, and 5 to 24% by weight of a lead titanate compound as a filler. It is assumed that.

【0015】本発明の電子部品収納用容器によれば、絶
縁基体と蓋体とを接合させる封止材として、酸化鉛30〜
50重量%、酸化硼素1〜6重量%、酸化亜鉛7〜15重量
%、弗化鉛21〜30重量%、酸化ビスマス14〜20重量%を
含むガラス成分に、フィラーとしてのチタン酸鉛系化合
物を5〜24重量%添加したガラスを使用したことから、
封止材の軟化溶融温度が280 ℃以下(ただし200 ℃以
上)と低く、そのような低温でも封止の際の熱で結晶化
するものとなり、絶縁基体と蓋体とを封止材を介して接
合させて絶縁基体と蓋体とからなる絶縁容器内部に電子
部品を気密に収容する際、封止材を溶融させる熱が内部
に収容する電子部品に作用しても電子部品に特性の劣化
を招来することはなく、その結果、電子部品を長期間に
わたり正常に作動させることが可能となる。
According to the electronic component storage container of the present invention, the sealing material for joining the insulating base and the lid is made of lead oxide 30 to 30.
Glass titanate containing 50% by weight, 1 to 6% by weight of boron oxide, 7 to 15% by weight of zinc oxide, 21 to 30% by weight of lead fluoride, 14 to 20% by weight of bismuth oxide, and a lead titanate compound as a filler From 5 to 24% by weight was used,
The softening and melting temperature of the sealing material is as low as 280 ° C or less (200 ° C or more). Even at such a low temperature, the material is crystallized by the heat generated during sealing. When the electronic components are hermetically housed inside an insulating container consisting of an insulating base and a lid, the characteristics of the electronic components deteriorate even if the heat that melts the sealing material acts on the electronic components housed inside. Therefore, the electronic component can be normally operated for a long period of time.

【0016】また、本発明の電子部品収納用容器によれ
ば、封止材として上記の軟化溶融温度が280 ℃以下のガ
ラスを使用したことから、絶縁基体と蓋体とを封止材を
介して接合させて絶縁基体と蓋体とからなる絶縁容器内
部に電子部品を気密に収容する際、封止材を溶融させる
熱によって電子部品を接着固定する接着剤を劣化させる
ことが防止でき、従来の接着剤より耐熱性の低い例えば
エポキシ樹脂系の接着剤の使用が可能となるため、電子
部品の接着固定に対する耐衝撃性の改善を図ることがで
き、電子部品の接着固定の信頼性を高いものとして長期
間にわたり正常かつ安定に作動させることが可能とな
る。
According to the electronic component storage container of the present invention, since the above-mentioned glass having a softening / melting temperature of 280 ° C. or less is used as the sealing material, the insulating base and the lid are connected via the sealing material. When the electronic components are hermetically housed inside an insulating container consisting of an insulating base and a lid by joining together, it is possible to prevent the adhesive for bonding and fixing the electronic components from being deteriorated by the heat of melting the sealing material. For example, it is possible to use an epoxy resin adhesive having a lower heat resistance than the adhesive of the present invention, so that it is possible to improve the impact resistance to the adhesive fixing of the electronic component, and to improve the reliability of the adhesive fixing of the electronic component. As a result, it is possible to operate normally and stably for a long period of time.

【0017】さらに、本発明の電子部品収納用容器によ
れば、封止材として上記の軟化溶融温度が280 ℃以下の
ガラスを使用したことから、封止材の耐湿性が高くて有
機樹脂を用いた場合のように大気中に含まれる水分が封
止材を通して絶縁基体と蓋体とから成る容器内部に入り
込んでしまうことがなく、低融点ロウ材を用いた場合の
ようにフラックスが容器内部に入り込んでしまうことも
ない。
Further, according to the electronic component storage container of the present invention, since the above-mentioned glass having a softening / melting temperature of 280 ° C. or less is used as the sealing material, the sealing material has a high moisture resistance and the organic resin can be used. The moisture contained in the air does not enter the inside of the container consisting of the insulating base and the lid through the sealing material as in the case of using the soldering material, and the flux inside the container as in the case of using the low melting point brazing material. You don't get into it.

【0018】さらにまた、本発明の電子部品収納用容器
によれば、封止材が280 ℃以下の低温でも結晶化するの
で、封止後の電子部品収納用容器を外部電気回路基板の
配線導体に半田等のロウ材を介して実装する際の熱で封
止材の低融点ガラスが再溶融し、容器内部に流動して電
子部品に接触することもない。
Further, according to the electronic component storage container of the present invention, since the sealing material is crystallized even at a low temperature of 280 ° C. or lower, the sealed electronic component storage container can be connected to the wiring conductor of the external electric circuit board. The low-melting-point glass of the sealing material is re-melted by the heat generated when soldering is performed via a brazing material such as solder, and does not flow into the container and come into contact with the electronic component.

【0019】[0019]

【発明の実施の形態】次に、本発明を添付図面に基づき
詳細に説明する。図1は本発明の電子部品収納用容器の
実施の形態の一例を示す断面図であり、同図においては
電子部品が半導体集積回路素子であり電子部品収納用容
器が半導体素子収納用パッケージである場合の例を示し
ている。
Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a sectional view showing an example of an embodiment of an electronic component storage container according to the present invention, in which the electronic component is a semiconductor integrated circuit element and the electronic component storage container is a semiconductor element storage package. An example of the case is shown.

【0020】図1において1は絶縁基体、2は蓋体であ
る。この絶縁基体1と蓋体2とで半導体集積回路素子3
を収容するための絶縁容器4が構成される。
In FIG. 1, 1 is an insulating base and 2 is a lid. The insulating substrate 1 and the lid 2 make the semiconductor integrated circuit device 3
Is formed.

【0021】絶縁基体1はその上面あるいは下面の略中
央部に半導体集積回路素子3を収容する空所を形成する
ための凹部1aが設けてあり、この凹部1aの底面には
半導体集積回路素子3がガラス・樹脂・ロウ材等から成
る接着剤を介して接着固定される。
The insulating substrate 1 is provided with a recess 1a for forming a cavity for accommodating the semiconductor integrated circuit element 3 at a substantially central portion of the upper surface or the lower surface thereof. Are bonded and fixed via an adhesive made of glass, resin, brazing material or the like.

【0022】絶縁基体1は、酸化アルミニウム質焼結体
やムライト質焼結体・窒化アルミニウム質焼結体・炭化
珪素質焼結体等の電気絶縁材料から成り、例えば酸化ア
ルミニウム質焼結体から成る場合であれば、酸化アルミ
ニウム・酸化珪素・酸化マグネシウム・酸化カルシウム
等の原料粉末に適当な有機バインダ・溶剤・可塑剤・分
散剤等を添加混合して泥漿物を作り、その泥漿物を従来
周知のドクターブレード法やカレンダーロール法等のシ
ート成形法を採用してシート状に成形してセラミックグ
グリーンシート(セラミック生シート)を得、しかる
後、それらセラミックグリーンシートに適当な打ち抜き
加工を施すとともにこれを複数枚積層し、約1600℃の高
温で焼成することによって製作される。
The insulating substrate 1 is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, and a silicon carbide sintered body. If this is the case, a suitable organic binder, solvent, plasticizer, dispersant, etc. is added to the raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc., and mixed to form a slurry. The sheet is formed into a sheet by using a well-known sheet forming method such as a doctor blade method or a calender roll method to obtain a ceramic green sheet (ceramic green sheet). Thereafter, the ceramic green sheet is subjected to an appropriate punching process. It is manufactured by laminating a plurality of these and firing at a high temperature of about 1600 ° C.

【0023】また絶縁基体1は凹部1a周辺から上面に
かけて複数個のメタライズ配線層5が被着形成されてお
り、このメタライズ配線層5の凹部1a周辺部には半導
体集積回路素子3の各電極がボンディングワイヤ6を介
して電気的に接続され、また絶縁基体1の上面に導出さ
れた部位には外部電気回路と接続される外部リード端子
7が銀ロウ等のロウ材を介して取着されている。
A plurality of metallized wiring layers 5 are formed on the insulating substrate 1 from the periphery of the concave portion 1a to the upper surface. Each electrode of the semiconductor integrated circuit element 3 is formed around the concave portion 1a of the metallized wiring layer 5. An external lead terminal 7 electrically connected via a bonding wire 6 and connected to an external electric circuit is attached to a portion led out to the upper surface of the insulating base 1 via a brazing material such as silver brazing. I have.

【0024】メタライズ配線層5は半導体集積回路素子
3の各電極を外部電気回路に電気的に接続する際の導電
路として作用し、タングステン・モリブデン・マンガン
等の高融点金属粉末により形成されている。
The metallized wiring layer 5 functions as a conductive path when each electrode of the semiconductor integrated circuit element 3 is electrically connected to an external electric circuit, and is formed of a high melting point metal powder such as tungsten, molybdenum and manganese. .

【0025】メタライズ配線層5はタングステン・モリ
ブデン・マンガン等の高融点金属粉末に適当な有機溶剤
・溶媒・可塑剤等を添加混合して得た金属ペーストを従
来周知のスクリーン印刷法等の厚膜手法を採用して絶縁
基体1と成るセラミックグリーンシートに予め印刷塗布
しておき、これをセラミックグリーンシートと同時に焼
成することによって絶縁基体1の凹部1a周辺から上面
にかけて所定パターンに被着形成される。
The metallized wiring layer 5 is a thick film formed by adding a suitable organic solvent, solvent, plasticizer, etc. to a high melting point metal powder such as tungsten, molybdenum, manganese or the like and mixing the resulting metal paste with a conventionally well-known screen printing method. The ceramic green sheet serving as the insulating substrate 1 is preliminarily printed and applied by employing a technique, and is fired at the same time as the ceramic green sheet, so that a predetermined pattern is formed from the periphery of the concave portion 1a of the insulating substrate 1 to the upper surface. .

【0026】なお、メタライズ配線層5はその表面にニ
ッケル・金等の良導電性でかつ耐蝕性およびロウ材との
濡れ性が良好な金属をメッキ法により1〜20μmの厚み
に層着させておくと、メタライズ配線層5の酸化腐食を
有効に防止することができるとともにメタライズ配線層
5とボンディングワイヤ6との接続およびメタライズ配
線層5と外部リード端子7とのロウ付けを極めて強固と
なすことができる。従って、メタライズ配線層5の酸化
腐食を防止し、メタライズ配線層5とボンディングワイ
ヤ6との接続およびメタライズ配線層5と外部リード端
子7とのロウ付けを強固となすには、メタライズ配線層
5の表面にニッケル・金等をメッキ法により1〜20μm
の厚みに層着させておくことが好ましい。
The metallized wiring layer 5 is formed by depositing a metal having good conductivity, such as nickel or gold, having good corrosion resistance and good wettability with a brazing material to a thickness of 1 to 20 μm on its surface by plating. In other words, it is possible to effectively prevent oxidation corrosion of the metallized wiring layer 5 and to make the connection between the metallized wiring layer 5 and the bonding wire 6 and the brazing between the metallized wiring layer 5 and the external lead terminals 7 extremely strong. Can be. Accordingly, in order to prevent the metallized wiring layer 5 from being oxidized and corroded, and to firmly connect the metallized wiring layer 5 to the bonding wires 6 and braze the metallized wiring layer 5 to the external lead terminals 7, Nickel, gold, etc. on the surface by plating method 1-20μm
It is preferable that the layer is layered to a thickness of.

【0027】また一方、メタライズ配線層5にロウ付け
される外部リード端子7は絶縁容器4の内部に収容する
半導体集積回路素子3を外部電気回路に接続する作用を
為し、外部リード端子7を外部電気回路に接続すること
によって内部に収容される半導体集積回路素子3はボン
ディングワイヤ6・メタライズ配線層5および外部リー
ド端子7を介して外部電気回路に電気的に接続されるこ
ととなる。
On the other hand, the external lead terminals 7 brazed to the metallized wiring layer 5 serve to connect the semiconductor integrated circuit element 3 housed inside the insulating container 4 to an external electric circuit. The semiconductor integrated circuit element 3 accommodated therein by being connected to the external electric circuit is electrically connected to the external electric circuit via the bonding wire 6, the metallized wiring layer 5, and the external lead terminal 7.

【0028】外部リード端子7は鉄−ニッケル−コバル
ト合金や鉄−ニッケル合金等の金属材料から成り、鉄−
ニッケル−コバルト合金等のインゴット(塊)に圧延加
工法や打ち抜き加工法等、従来周知の金属加工法を施す
ことによって所定の形状に形成される。
The external lead terminal 7 is made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.
It is formed into a predetermined shape by subjecting an ingot (a lump) such as a nickel-cobalt alloy to a conventionally known metal working method such as a rolling method or a punching method.

【0029】外部リード端子7はまたその表面にニッケ
ル・金等から成る良導電性でかつ耐蝕性に優れた金属を
メッキ法により1〜20μmの厚みに層着させておくと、
外部リード端子7の酸化腐食を有効に防止することがで
きるとともに外部リード端子7と外部電気回路との電気
的接続を良好となすことができる。そのため、外部リー
ド端子7はその表面にニッケル・金等をメッキ法により
1〜20μmの厚みに層着させておくことが好ましい。
When the external lead terminal 7 is coated with a metal having good conductivity and excellent corrosion resistance made of nickel, gold or the like on its surface by plating to a thickness of 1 to 20 μm,
Oxidative corrosion of the external lead terminal 7 can be effectively prevented, and good electrical connection between the external lead terminal 7 and an external electric circuit can be achieved. For this reason, it is preferable that the external lead terminal 7 is coated with nickel, gold, or the like on its surface to a thickness of 1 to 20 μm by plating.

【0030】さらに外部リード端子7が取着された絶縁
基体1はその上面あるいは下面に蓋体2が封止材8を介
して接合され、これによって絶縁基体1と蓋体2とから
成る絶縁容器4の内部に半導体集積回路素子3が気密に
収容される。
Further, the insulating base 1 to which the external lead terminals 7 are attached is joined to the upper or lower surface of the insulating base 1 via a sealing material 8, thereby forming an insulating container comprising the insulating base 1 and the lid 2. The semiconductor integrated circuit element 3 is hermetically accommodated in the inside 4.

【0031】封止材8は酸化鉛30〜50重量%、酸化硼素
1〜6重量%、酸化亜鉛7〜15重量%、弗化鉛21〜30重
量%、酸化ビスマス14〜20重量%を含むガラス成分に、
フィラーとしてのチタン酸鉛系化合物を5〜24重量%添
加したガラスで形成されており、このような組成成分お
よび組成比から成る封止材8は、その軟化溶融温度が28
0 ℃以下(ただし200 ℃以上)と低く、そのような低い
温度で結晶化するものである。そのため、封止材8を加
熱溶融させ、絶縁基体1と蓋体2とから成る絶縁容器4
の内部に半導体集積回路素子3を気密に収容する際、封
止材8を溶融させる熱が絶縁容器4の内部に収容する半
導体集積回路素子3に作用しても半導体集積回路素子3
に特性の劣化を招来させることはなく、封止後の熱履歴
により際溶融することもなく、その結果、半導体集積回
路素子3を長期間にわたり正常に作動させることが可能
となる。
The sealing material 8 contains 30 to 50% by weight of lead oxide, 1 to 6% by weight of boron oxide, 7 to 15% by weight of zinc oxide, 21 to 30% by weight of lead fluoride, and 14 to 20% by weight of bismuth oxide. In the glass component,
The sealing material 8 made of glass to which a lead titanate-based compound as a filler is added in an amount of 5 to 24% by weight has a softening / melting temperature of 28%.
It is as low as 0 ° C or lower (but 200 ° C or higher) and crystallizes at such a low temperature. Therefore, the sealing material 8 is heated and melted, and the insulating container 4 including the insulating base 1 and the lid 2 is melted.
When the semiconductor integrated circuit element 3 is hermetically housed inside the semiconductor integrated circuit element 3 even if heat for melting the sealing material 8 acts on the semiconductor integrated circuit element 3 housed inside the insulating container 4.
Therefore, the semiconductor integrated circuit element 3 can be normally operated for a long period of time without causing the deterioration of the characteristics and without melting due to the heat history after sealing.

【0032】なお、封止材8はそれを構成する酸化鉛
(PbO)が30重量%未満であるとガラスの軟化溶融温
度が高くなり、封止材8を介して絶縁容器4を気密封止
する際、封止材8を軟化溶融させる熱によって半導体集
積回路素子3に特性の劣化が招来してしまう傾向があ
り、また50重量%を超えると封止材8の耐薬品性が低下
し、絶縁容器4の気密封止の信頼性が大きく低下する傾
向がある。従って、酸化鉛(PbO)はその量が30〜50
重量%の範囲に特定される。
If lead oxide (PbO) constituting the sealing material 8 is less than 30% by weight, the softening and melting temperature of the glass increases, and the insulating container 4 is hermetically sealed via the sealing material 8. In this case, the heat of softening and melting the sealing material 8 tends to cause deterioration of the characteristics of the semiconductor integrated circuit element 3, and if it exceeds 50% by weight, the chemical resistance of the sealing material 8 decreases, The reliability of hermetic sealing of the insulating container 4 tends to be greatly reduced. Therefore, the amount of lead oxide (PbO) is 30-50.
It is specified in the range of weight%.

【0033】また酸化硼素(B2 3 )はその量が1重
量%未満であるとガラスの結晶化が進んで流動性が低下
し、封止材8を介して絶縁容器4を気密封止することが
困難となる傾向があり、また6重量%を超えると封止材
8の軟化溶融温度が高くなり、封止材8を介して絶縁容
器4を気密封止する際、封止材8を軟化溶融させる熱に
よって半導体集積回路素子3に特性の劣化が招来してし
まう傾向がある。従って、酸化硼素(B2 3 )はその
量が1〜6重量%の範囲に特定される。
If the amount of boron oxide (B 2 O 3 ) is less than 1% by weight, the crystallization of the glass proceeds and the fluidity decreases, and the insulating container 4 is hermetically sealed via the sealing material 8. When the amount exceeds 6% by weight, the softening and melting temperature of the sealing material 8 increases, and when the insulating container 4 is hermetically sealed via the sealing material 8, the sealing material 8 Tend to cause the characteristics of the semiconductor integrated circuit element 3 to be degraded by the heat of softening and melting. Thus, boron oxide (B 2 O 3) is that amount is specified in the range of 1-6 wt%.

【0034】また酸化亜鉛(ZnO)はその量が7重量
%未満であると封止時の熱履歴で封止材8のガラスの結
晶化が十分に進まず、封止後の電子部品収納用容器を外
部電気回路基板の配線導体に半田等のロウ材を介して実
装する際の熱で封止材8が再溶融する傾向があり、また
15重量%を超えると封止材8の結晶化が進みすぎて流動
性が低下し、絶縁容器4の封止が困難となる傾向があ
る。従って、酸化亜鉛(ZnO)はその量が7〜15重量
%の範囲に特定される。
If the amount of zinc oxide (ZnO) is less than 7% by weight, the crystallization of the glass of the sealing material 8 does not sufficiently proceed due to the heat history at the time of sealing, and the electronic component storage after sealing. When the container is mounted on the wiring conductor of the external electric circuit board via a brazing material such as solder, the sealing material 8 tends to be re-melted by heat,
If the content exceeds 15% by weight, the crystallization of the sealing material 8 proceeds too much, and the fluidity is reduced, so that the sealing of the insulating container 4 tends to be difficult. Therefore, the amount of zinc oxide (ZnO) is specified in the range of 7 to 15% by weight.

【0035】また弗化鉛(PbF2 )はその量が21重量
%未満であると酸化亜鉛がガラス成分として7重量%以
上存在する場合にガラスの軟化溶融温度が高くなり、封
止材8を介して絶縁容器4を気密封止する際、所望の低
温封止を行なうことが困難となる傾向があり、また30重
量%を超えると酸化亜鉛がガラス成分として7重量%以
上存在する場合に封止材8の耐薬品性が低下し、絶縁容
器4の気密封止の信頼性が大きく低下する傾向がある。
従って、弗化鉛(PbF2 )はその量が21〜30重量%の
範囲に特定される。
When the amount of lead fluoride (PbF 2 ) is less than 21% by weight, the softening and melting temperature of the glass increases when zinc oxide is present in an amount of 7% by weight or more as a glass component. When the insulating container 4 is hermetically sealed through the intermediary, there is a tendency that it is difficult to perform a desired low-temperature sealing, and if it exceeds 30% by weight, the sealing is performed when zinc oxide is present as 7% by weight or more as a glass component. The chemical resistance of the stopper 8 tends to decrease, and the reliability of hermetic sealing of the insulating container 4 tends to greatly decrease.
Therefore, lead fluoride (PbF 2) is that amount is specified in the range of 21 to 30 wt%.

【0036】また酸化ビスマス(Bi2 3 )はその量
が14重量%未満であると酸化亜鉛がガラス成分として7
重量%以上存在する場合にガラスの軟化溶融温度が高く
なり、封止材8を介して絶縁容器4を気密封止する際、
所望の低温封止を行なうことが困難となる傾向があり、
また20重量%を超えると酸化亜鉛がガラス成分として7
重量%以上存在する場合に封止材8の結晶化が進みすぎ
て流動性が低下し、絶縁容器4の封止が困難となる傾向
がある。従って、酸化ビスマス(Bi2 3 )はその量
が14〜20重量%の範囲に特定される。
If the amount of bismuth oxide (Bi 2 O 3 ) is less than 14% by weight, zinc oxide becomes 7% as a glass component.
In the case where the content is not less than 10% by weight, the softening and melting temperature of the glass increases, and when the insulating container 4 is hermetically sealed via the sealing material 8,
It tends to be difficult to perform the desired low-temperature sealing,
If it exceeds 20% by weight, zinc oxide becomes 7 as a glass component.
In the case where the content is not less than% by weight, the crystallization of the sealing material 8 is excessively advanced, and the fluidity is reduced, so that the sealing of the insulating container 4 tends to be difficult. Thus, bismuth oxide (Bi 2 O 3) is that amount is specified in the range of 14 to 20 wt%.

【0037】さらにフィラーとして添加されるチタン酸
鉛系化合物はその量が5重量%未満であると封止材8の
結晶化後のガラス強度が低下し、絶縁容器4の気密封止
の信頼性が大きく低下する傾向があり、また24重量%を
超えると酸化亜鉛がガラス成分として7重量%以上存在
する場合に封止材8の流動性が低下し、絶縁容器4の封
止が困難となる傾向がある。従って、フィラーとして添
加されるチタン酸鉛系化合物はその量が5〜24重量%の
範囲に特定される。
If the amount of the lead titanate compound added as a filler is less than 5% by weight, the glass strength of the sealing material 8 after crystallization is reduced, and the reliability of hermetic sealing of the insulating container 4 is reduced. When the content exceeds 24% by weight, when the zinc oxide is present in an amount of 7% by weight or more as a glass component, the fluidity of the sealing material 8 decreases, and it becomes difficult to seal the insulating container 4. Tend. Therefore, the amount of the lead titanate-based compound added as a filler is specified in the range of 5 to 24% by weight.

【0038】かくして本発明の電子部品収納用容器によ
れば、絶縁基体1の凹部1aの底面に半導体集積回路素
子3をガラス・樹脂・ロウ材等から成る接着剤を介して
接着固定するとともに半導体集積回路素子3の各電極を
メタライズ配線層5にボンディングワイヤ6を介して電
気的に接続し、しかる後、絶縁基体1の上面に凹部1a
を覆うように蓋体2を封止材8を介して接合させ、絶縁
基体1と蓋体2とから成る絶縁容器4の内部に半導体集
積回路素子3を気密に封止することによって最終製品と
しての半導体装置が完成する。
Thus, according to the electronic component storage container of the present invention, the semiconductor integrated circuit element 3 is bonded and fixed to the bottom surface of the concave portion 1a of the insulating base 1 with an adhesive made of glass, resin, brazing material or the like. Each electrode of the integrated circuit element 3 is electrically connected to the metallized wiring layer 5 via the bonding wire 6, and thereafter, the recess 1 a is formed on the upper surface of the insulating base 1.
Of the semiconductor integrated circuit element 3 in an insulating container 4 composed of the insulating base 1 and the lid 2 in a hermetically sealed manner as a final product. Is completed.

【0039】次に、図2は本発明の電子部品収納用容器
の実施の形態の他の例を示す断面図であり、同図におい
ては電子部品が水晶振動子等の圧電振動子であり電子部
品収納用容器が圧電振動子収納用容器である場合の例を
示している。
FIG. 2 is a sectional view showing another embodiment of the electronic component storage container according to the present invention. In FIG. 2, the electronic component is a piezoelectric vibrator such as a quartz vibrator, and An example is shown in which the component storage container is a piezoelectric vibrator storage container.

【0040】図2において11は絶縁基体、12は蓋体であ
る。この絶縁基体11と蓋体12とで圧電振動子13を収容す
るための絶縁容器14が構成される。
In FIG. 2, 11 is an insulating base, and 12 is a lid. The insulating base 11 and the lid 12 constitute an insulating container 14 for housing the piezoelectric vibrator 13.

【0041】絶縁基体11はその上面に圧電振動子13を収
容する空所を形成するための段差部を有する凹部11aが
設けてあり、この凹部11aの段差部には圧電振動子13が
樹脂等から成る接着剤15を介して接着固定される。
The insulating base 11 is provided with a recess 11a having a step for forming a space for accommodating the piezoelectric vibrator 13 on the upper surface thereof, and the piezoelectric vibrator 13 is made of resin or the like at the step of the recess 11a. Is fixed by means of an adhesive 15 made of.

【0042】接着剤15は例えばエポキシ樹脂系の導電性
樹脂から成り、絶縁基体11の凹部11aの段差部に接着剤
15を介して圧電振動子13を載置させ、しかる後、接着剤
15に熱硬化処理を施して熱硬化させることによって圧電
振動子13を絶縁基体11に接着固定する。本発明の電子部
品収納用容器によれば、絶縁容器14の封止温度が280℃
以下と低いので接着剤15として耐衝撃性に優れるが耐熱
性の低いエポキシ樹脂系の導電性樹脂を用いることがで
き、これにより圧電振動子13の耐衝撃性を高めて固定の
信頼性を高めることができ、圧電振動子13を長期間にわ
たり正常かつ安定に差動させることができる。
The adhesive 15 is made of, for example, an epoxy resin-based conductive resin.
The piezoelectric vibrator 13 is placed via 15 and then the adhesive
The piezoelectric vibrator 13 is adhered and fixed to the insulating base 11 by subjecting 15 to a thermosetting treatment and thermosetting. According to the electronic component storage container of the present invention, the sealing temperature of the insulating container 14 is 280 ° C.
Since it is as low as the following, it is possible to use an epoxy resin-based conductive resin having excellent impact resistance but low heat resistance as the adhesive 15, thereby increasing the impact resistance of the piezoelectric vibrator 13 and improving the reliability of fixing. Thus, the piezoelectric vibrator 13 can be normally and stably made differential for a long period of time.

【0043】なお、絶縁基体11は前述の絶縁基体1と同
様の材料により同様に製作される。
It should be noted that the insulating base 11 is made of the same material as the above-mentioned insulating base 1 in the same manner.

【0044】また、絶縁基体11には凹部11aの段差部よ
り底面にかけて導出するメタライズ配線層16が形成され
ており、このメタライズ配線層16の凹部11a段差部に位
置する部位には圧電振動子13の各電極がエポキシ系導電
性樹脂から成る接着剤15を介して電気的に接続され、絶
縁基体11の底面に導出された部位には外部電気回路の配
線導体が半田等のロウ材を介して取着される。
A metallized wiring layer 16 extending from the step of the concave portion 11a to the bottom surface is formed in the insulating base 11, and a portion of the metallized wiring layer 16 located at the step of the concave portion 11a is provided with a piezoelectric vibrator 13. Are electrically connected to each other through an adhesive 15 made of an epoxy-based conductive resin, and a wiring conductor of an external electric circuit is connected to a portion led out to the bottom surface of the insulating base 11 through a brazing material such as solder. Be attached.

【0045】なお、メタライズ配線層16も前述のメタラ
イズ配線層5と同様の材料により同様に形成される。ま
た、メタライズ配線層16にもその露出する外表面にニッ
ケル・金等の良導電性でかつ耐蝕性およびロウ材との濡
れ性が良好な金属をメッキ法により1〜20μmの厚みに
層着させておくと、メタライズ配線層16の酸化腐食を有
効に防止することができるとともにメタライズ配線層16
を外部電気回路の配線導体に半田等のロウ材を介してロ
ウ付けする際、そのロウ付け強度を極めて強固となすこ
とができる。従って、メタライズ配線層16の露出する外
表面にニッケル・金等をメッキ法により1〜20μmの厚
みに層着させておくことが好ましい。
Note that the metallized wiring layer 16 is also formed of the same material as the metallized wiring layer 5 described above. A metal having good conductivity, such as nickel and gold, and having good corrosion resistance and good wettability with the brazing material is deposited on the exposed outer surface of the metallized wiring layer 16 to a thickness of 1 to 20 μm by plating. By doing so, oxidation corrosion of the metallized wiring layer 16 can be effectively prevented, and
Is brazed to a wiring conductor of an external electric circuit via a brazing material such as solder, so that the brazing strength can be made extremely strong. Therefore, it is preferable that nickel, gold, or the like is applied to the exposed outer surface of the metallized wiring layer 16 by plating to a thickness of 1 to 20 μm.

【0046】そして、圧電振動子13が接着固定された絶
縁基体11の上面に電気絶縁材料等から成る蓋体12が封止
材17を介して接合され、これによって絶縁基体11と蓋体
12とから成る絶縁容器14の内部に圧電振動子13が気密に
収容される。
Then, a lid 12 made of an electrically insulating material or the like is joined to the upper surface of the insulating base 11 to which the piezoelectric vibrator 13 is adhered and fixed via a sealing member 17, whereby the insulating base 11 and the lid
The piezoelectric vibrator 13 is hermetically housed inside an insulating container 14 composed of

【0047】封止材17は、前述の封止材8と同様に、酸
化鉛30〜50重量%、酸化硼素1〜6重量%、酸化亜鉛7
〜15重量%、弗化鉛21〜30重量%、酸化ビスマス14〜20
重量%を含むガラス成分に、フィラーとしてのチタン酸
鉛系化合物を5〜24重量%添加したガラスで形成されて
おり、この酸化鉛・酸化硼素・酸化亜鉛等から成る封止
材17はその軟化溶融温度が280 ℃以下と低く、そのため
封止材17を加熱溶融させ、絶縁基体11と蓋体12とから成
る絶縁容器14の内部に圧電振動子13を気密に収容する
際、封止材17を溶融させる熱が絶縁容器14の内部に収容
する圧電振動子13に作用しても圧電振動子13に特性の劣
化を招来させることはなく、その結果、圧電振動子13を
長期間にわたり正常に作動させることが可能となる。
The sealing material 17 is made of 30 to 50% by weight of lead oxide, 1 to 6% by weight of boron oxide,
~ 15 wt%, lead fluoride 21 ~ 30 wt%, bismuth oxide 14 ~ 20
The sealing material 17 made of lead oxide, boron oxide, zinc oxide or the like is formed of glass in which 5 to 24% by weight of a lead titanate-based compound as a filler is added to a glass component containing 5% by weight. The melting temperature is as low as 280 ° C. or less, so that the sealing material 17 is heated and melted, and when the piezoelectric vibrator 13 is hermetically accommodated inside the insulating container 14 including the insulating base 11 and the lid 12, the sealing material 17 is melted. Even if the heat for melting the piezoelectric vibrator 13 acts on the piezoelectric vibrator 13 accommodated inside the insulating container 14, the characteristics of the piezoelectric vibrator 13 are not degraded. It can be activated.

【0048】また、封止材17はガラスから成り、耐湿性
に優れていることから、大気中に含まれる水分が封止材
17を通して絶縁容器14内部に入り込もうとしても封止材
17で完全に阻止され、その結果、絶縁容器14内部に収容
する圧電振動子13に水分が付着して圧電振動子13表面の
電極が酸化腐食するのを有効に防止して圧電振動子13を
長期間にわたり安定して所定の振動周波数で振動させる
ことが可能となる。
The sealing material 17 is made of glass and has excellent moisture resistance.
Sealing material when trying to get inside insulating container 14 through 17
As a result, moisture is prevented from adhering to the piezoelectric vibrator 13 housed inside the insulating container 14 and the electrodes on the surface of the piezoelectric vibrator 13 are effectively prevented from being oxidized and corroded, thereby preventing the piezoelectric vibrator 13 It is possible to stably vibrate at a predetermined vibration frequency for a long period of time.

【0049】さらに、封止材17は280 ℃以下と低い温度
でも結晶化するものであるため、封止後の電子部品収納
用容器を外部電気回路基板の配線導体に半田等のロウ材
を介して実装する際の熱で封止材の低融点ガラスが再溶
融し、容器内部に流動して圧電振動子13に接触すること
もなく、絶縁容器14内部に流動した封止材17が圧電振動
子13に接触して周波数特性上の不具合を発生させること
もない。
Further, since the sealing material 17 is crystallized even at a low temperature of 280 ° C. or less, the sealed electronic component storage container is connected to the wiring conductor of the external electric circuit board by a brazing material such as solder. The low-melting-point glass of the sealing material is re-melted by the heat of mounting, and flows inside the container without contacting the piezoelectric vibrator 13. There is no occurrence of a failure in frequency characteristics due to contact with the child 13.

【0050】かくして本発明の電子部品収納用容器によ
れば、真空中もしくは中性雰囲気中において絶縁基体11
の凹部11aの段差部に圧電振動子13の一端をエポキシ系
導電性樹脂等から成る接着剤15を介して接着固定すると
ともに圧電振動子13の各電極をメタライズ配線層16に電
気的に接続し、しかる後、絶縁基体11の上面に凹部11a
を覆うように蓋体12を封止材17を介して接合させ、絶縁
基体11と蓋体12とから成る絶縁容器14の内部に圧電振動
子13を気密に封止することによって最終製品としての圧
電振動子装置が完成する。
Thus, according to the electronic component storage container of the present invention, the insulating substrate 11 can be formed in a vacuum or in a neutral atmosphere.
One end of the piezoelectric vibrator 13 is bonded and fixed to the stepped portion of the concave portion 11a via an adhesive 15 made of an epoxy conductive resin or the like, and each electrode of the piezoelectric vibrator 13 is electrically connected to the metallized wiring layer 16. Thereafter, the concave portion 11a is formed on the upper surface of the insulating base 11.
The lid 12 is joined via a sealing material 17 so as to cover the piezoelectric vibrator 13, and the piezoelectric vibrator 13 is hermetically sealed inside an insulating container 14 composed of the insulating base 11 and the lid 12, thereby obtaining a final product. The piezoelectric vibrator device is completed.

【0051】なお、本発明は上述の実施の形態に限定さ
れるものではなく、本発明の要旨を逸脱しない範囲で種
々の変更や改良を加えることは何ら差し支えない。例え
ば、前述の例では圧電振動子13として水晶振動子を例示
したが、圧電磁気振動子や弾性表面波振動子等を収容す
る圧電振動子収納用容器にも適用できることは言うまで
もない。
It should be noted that the present invention is not limited to the above-described embodiment, and that various changes and improvements can be made without departing from the scope of the present invention. For example, in the above-described example, a quartz oscillator is illustrated as the piezoelectric oscillator 13, but it is needless to say that the present invention can be applied to a container for accommodating a piezoelectric vibrator or a surface acoustic wave oscillator.

【0052】[0052]

【発明の効果】本発明の電子部品収納用容器によれば、
絶縁基体と蓋体とを接合させる封止材として、酸化鉛30
〜50重量%、酸化硼素1〜6重量%、酸化亜鉛7〜15重
量%、弗化鉛21〜30重量%、酸化ビスマス14〜20重量%
を含むガラス成分に、フィラーとしてのチタン酸鉛系化
合物を5〜24重量%添加したガラスを使用したことか
ら、封止材の軟化溶融温度が280 ℃以下と低く、そのよ
うな低温でも封止の際の熱で結晶化するものとなり、絶
縁基体と蓋体とを封止材を介して接合させて絶縁容器内
部に電子部品を気密に収容する際、封止材を溶融させる
熱が内部に収容する電子部品に作用しても電子部品に特
性の劣化を招来することはなく、その結果、電子部品を
長期間にわたり正常に作動させることが可能となった。
According to the electronic component storage container of the present invention,
As a sealing material for joining the insulating base and the lid, lead oxide 30
~ 50% by weight, boron oxide 1 ~ 6% by weight, zinc oxide 7 ~ 15% by weight, lead fluoride 21 ~ 30% by weight, bismuth oxide 14 ~ 20% by weight
The glass component containing 5 to 24% by weight of a lead titanate-based compound as a filler was used, so that the softening and melting temperature of the sealing material was as low as 280 ° C or lower, and the sealing was performed even at such a low temperature. When the electronic component is air-tightly housed inside the insulating container by joining the insulating base and the lid via the sealing material, the heat for melting the sealing material is Even when acting on the housed electronic components, the characteristics of the electronic components are not degraded, and as a result, the electronic components can be normally operated for a long period of time.

【0053】また、本発明の電子部品収納用容器によれ
ば、封止材として上記の軟化溶融温度が280 ℃以下のガ
ラスを使用したことから、絶縁基体と蓋体とを封止材を
介して接合させて絶縁容器内部に電子部品を気密に収容
する際、封止材を溶融させる熱によって電子部品を接着
固定する接着剤を劣化させることが防止でき、従来の接
着剤より耐熱性の低い例えばエポキシ樹脂系の接着剤の
使用が可能となり、電子部品の接着固定に対する耐衝撃
性の改善を図ることができ、電子部品の接着固定の信頼
性を高いものとして長期間にわたり正常かつ安定に作動
させることが可能となった。
Further, according to the electronic component storage container of the present invention, since the above-mentioned glass having a softening and melting temperature of 280 ° C. or less is used as the sealing material, the insulating base and the lid are interposed via the sealing material. When the electronic components are airtightly housed inside the insulating container by joining together, the heat of melting the sealing material can be prevented from deteriorating the adhesive that adheres and fixes the electronic components, and has lower heat resistance than conventional adhesives For example, it is possible to use an epoxy resin-based adhesive, which can improve the impact resistance of electronic components for bonding and fixing, and can operate normally and stably for a long period of time with high reliability of bonding and fixing of electronic components. It became possible to make it.

【0054】さらに、本発明の電子部品収納用容器によ
れば、封止材として上記の軟化溶融温度が280 ℃以下の
ガラスを使用したことから、封止材の耐湿性が高くて大
気中に含まれる水分が封止材を通して絶縁基体と蓋体と
から成る容器内部に入り込んでしまうことがなく、フラ
ックスが容器内部に入り込んでしまうこともない。
Further, according to the electronic component storage container of the present invention, since the above-mentioned glass having a softening / melting temperature of 280 ° C. or less is used as the sealing material, the sealing material has high moisture resistance and can be used in the atmosphere. The moisture contained does not enter the inside of the container formed of the insulating base and the lid through the sealing material, and the flux does not enter the inside of the container.

【0055】さらにまた、本発明の電子部品収納用容器
によれば、封止材が280 ℃以下の低温でも結晶化するの
で、封止後の電子部品収納用容器を外部電気回路基板の
配線導体に半田等のロウ材を介して実装する際の熱で封
止材の低融点ガラスが再溶融し、容器内部に流動して電
子部品に接触することもない。
Further, according to the electronic component storage container of the present invention, since the sealing material is crystallized even at a low temperature of 280 ° C. or less, the sealed electronic component storage container can be connected to the wiring conductor of the external electric circuit board. The low-melting-point glass of the sealing material is re-melted by the heat generated when soldering is performed via a brazing material such as solder, and does not flow into the container and come into contact with the electronic component.

【0056】以上により、本発明の電子部品収納用容器
によれば、絶縁基体と蓋体とからなる絶縁容器の内部に
電子部品をその特性の劣化を招来することなく気密性を
より高めて気密に封止し、かつ容器内部に収容される電
子部品の固定を確実かつ強固なものとするとともに電子
部品表面の電極の酸化腐食等を有効に防止して、電子部
品を長期間にわたり正常に作動させることができる電子
部品収納用容器を提供することができた。
As described above, according to the electronic component storage container of the present invention, the airtightness is improved by further increasing the airtightness of the electronic component without deteriorating its characteristics inside the insulating container including the insulating base and the lid. The electronic components are securely and firmly fixed, and the electrodes on the surface of the electronic components are effectively prevented from being oxidized and corroded. An electronic component storage container which can be provided can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電子部品収納用容器の実施の形態の一
例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of an electronic component storage container according to the present invention.

【図2】本発明の電子部品収納用容器の実施の形態の他
の例を示す断面図である。
FIG. 2 is a sectional view showing another example of the embodiment of the electronic component storage container of the present invention.

【符号の説明】[Explanation of symbols]

1、11・・・・・絶縁基体 2、12・・・・・蓋体 3・・・・・・・電子部品(半導体集積回路素子) 13・・・・・・・電子部品(圧電振動子) 4、14・・・・・絶縁容器 8、17・・・・・封止材 1, 11 ... Insulating base 2, 12 ... Lid 3 ... Electronic components (semiconductor integrated circuit elements) ) 4, 14 ... Insulating container 8, 17 ... Sealing material

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/00 - 23/10 C03C 8/10 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) H01L 23/00-23/10 C03C 8/10

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 絶縁基体と蓋体とを封止材を介して接合
させ、絶縁基体と蓋体とから成る容器内部に電子部品を
気密に収容する電子部品収納用容器であって、前記封止
材が酸化鉛30乃至50重量%、酸化硼素1乃至6重量%、
酸化亜鉛7乃至15重量%、弗化鉛21乃至30重量%、酸化
ビスマス14乃至20重量%を含むガラス成分に、フィラー
としてのチタン酸鉛系化合物を5乃至24重量%添加した
ガラスから成ることを特徴とする電子部品収納用容器。
1. An electronic component storage container in which an insulating base and a lid are joined via a sealing material, and an electronic component is hermetically stored inside a container formed of the insulating base and the lid. The stopper is 30 to 50% by weight of lead oxide, 1 to 6% by weight of boron oxide,
The glass component contains 7 to 15% by weight of zinc oxide, 21 to 30% by weight of lead fluoride, and 14 to 20% by weight of bismuth oxide, and is made of glass in which 5 to 24% by weight of a lead titanate compound as a filler is added. A container for storing electronic components.
JP10916097A 1997-04-25 1997-04-25 Electronic component storage container Expired - Fee Related JP3359536B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10916097A JP3359536B2 (en) 1997-04-25 1997-04-25 Electronic component storage container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10916097A JP3359536B2 (en) 1997-04-25 1997-04-25 Electronic component storage container

Publications (2)

Publication Number Publication Date
JPH10303326A JPH10303326A (en) 1998-11-13
JP3359536B2 true JP3359536B2 (en) 2002-12-24

Family

ID=14503173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10916097A Expired - Fee Related JP3359536B2 (en) 1997-04-25 1997-04-25 Electronic component storage container

Country Status (1)

Country Link
JP (1) JP3359536B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110922166A (en) * 2019-11-08 2020-03-27 安徽大学 High-corrosion-resistance composite material and preparation method thereof

Also Published As

Publication number Publication date
JPH10303326A (en) 1998-11-13

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