JPH11262714A - Coating method and apparatus for applying coating liquid to uneven substrate and method and apparatus for manufacturing member for plasma display - Google Patents
Coating method and apparatus for applying coating liquid to uneven substrate and method and apparatus for manufacturing member for plasma displayInfo
- Publication number
- JPH11262714A JPH11262714A JP10360119A JP36011998A JPH11262714A JP H11262714 A JPH11262714 A JP H11262714A JP 10360119 A JP10360119 A JP 10360119A JP 36011998 A JP36011998 A JP 36011998A JP H11262714 A JPH11262714 A JP H11262714A
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- Japan
- Prior art keywords
- coating liquid
- coating
- opening
- substrate
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、基板上に凹凸状の
特定のパターンが形成されたもの、特に一定形状の隔壁
を等ピッチで配置したプラズマディスプレイパネルや、
ストライプ形ブラックマトリックス式のカラー受像管の
パネル内面等における一定パターンの塗布に適用でき
る、凹凸基板への塗液の塗布方法および塗布装置、並び
にこれらの方法および装置を使用したプラズマディスプ
レイ用部材の製造方法および製造装置の改良に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel having a specific pattern of concavities and convexities formed on a substrate, in particular, a plasma display panel having fixed-shaped partition walls arranged at equal pitches,
Applicable method and apparatus for applying a coating liquid to a concavo-convex substrate, which can be applied to the application of a fixed pattern on the inner surface of a panel of a striped black matrix type color picture tube, and the production of plasma display members using these methods and apparatuses The present invention relates to improvements in methods and manufacturing equipment.
【０００２】[0002]
【従来の技術】近年、ディスプレイはその方式において
次第に多様化してきている。現在注目されているものの
一つが、従来のブラウン管よりも大型で薄型軽量化が可
能なプラズマディスプレイである。これは、一定ピッチ
で一方向に延びる隔壁によりストライプ状の凹凸部をガ
ラス基板上に形成し、該凹凸部の凹部に赤（Ｒ）、緑
（Ｇ）、青（Ｂ）の蛍光体を充填し、任意の部位を紫外
線により発光させ、所定のカラーパターンを達成するも
のである。2. Description of the Related Art In recent years, displays have become increasingly diversified in their system. One of the things that are currently attracting attention is a plasma display that is larger, thinner and lighter than conventional cathode ray tubes. That is, stripe-shaped uneven portions are formed on a glass substrate by partition walls extending in one direction at a constant pitch, and the concave portions of the uneven portions are filled with red (R), green (G), and blue (B) phosphors. Then, an arbitrary portion is caused to emit light by ultraviolet rays to achieve a predetermined color pattern.
【０００３】蛍光体がストライプ状に構成されていると
いう構造は、ストライプ形ブラックマトリックス式のカ
ラー受像管のパネルも有している。The structure in which the phosphors are formed in a stripe shape also has a striped black matrix type color picture tube panel.
【０００４】このような構造のものを高い生産性と高品
質で製造するには、蛍光体を一定のパターン状に、塗り
分ける技術が重要となる。In order to manufacture such a structure with high productivity and high quality, it is important to apply phosphors in a predetermined pattern.
【０００５】通常は、隔壁パターンを形成後、特開平５
−１４４３７５号公報に示されるように一色の蛍光体を
全面スクリーン印刷し、必要な部分のみフォトリソグラ
フィー法で残すようにして、高精度のパターンが得られ
るようにしている。しかし、この方法では、Ｒ、Ｇ、Ｂ
の各蛍光体パターンを形成するために、各色の塗布、露
光、現像、乾燥等の工程を３回繰り返す必要があり、コ
ストがかかる上、生産性に著しく劣るという欠点を持
つ。Usually, after a partition pattern is formed,
As shown in JP-A-144375, a phosphor of one color is screen-printed on the entire surface, and only a necessary portion is left by photolithography so that a highly accurate pattern can be obtained. However, in this method, R, G, B
In order to form each of the phosphor patterns described above, it is necessary to repeat the steps of coating, exposing, developing, and drying each color three times, which is costly and has a disadvantage that productivity is extremely poor.
【０００６】単にガラス基板上にストライプ状の着色パ
ターンを形成する他の方法としては、ノズルを用いる特
開平５−１１１０５号公報等に記載されている方法があ
るが、表面に凹凸が形成されているものに対してこの技
術をそのまま用いることはできない。As another method of simply forming a striped colored pattern on a glass substrate, there is a method described in JP-A-5-11105 using a nozzle. This technology cannot be used directly for those who do.
【０００７】また、特開昭５２−１３４３６８号公報に
は、ストライプ形ブラックマトリックス式のカラー受像
管のパネル内面の、凸状となっているブラックマトリッ
クス間の凹部に所定の蛍光体を塗布する方法として、蛇
行防止等の制御装置を有する改良されたノズル装置を用
いることが示されている。しかし、一本のノズルを用い
ているために時間がかかり、また、塗布開始、終了部で
の塗布技術が明示されていないために、与えられた基板
内の有効領域内で均一に塗布することが難しく、基板を
最大限に活用することができず、生産性や品質で所定の
目標のものが得られなかった。Japanese Patent Application Laid-Open No. 52-134368 discloses a method of coating a predetermined phosphor on a concave portion between convex black matrices on the inner surface of a panel of a striped black matrix type color picture tube. Discloses the use of an improved nozzle device having a control device such as meandering prevention. However, it takes time because a single nozzle is used, and since the coating technique at the start and end of the coating is not specified, it is necessary to apply the coating uniformly within the effective area within a given substrate. It was difficult to make the best use of the substrate, and it was not possible to obtain the desired targets in productivity and quality.
【０００８】[0008]
【発明が解決しようとする課題】本発明の課題は、プラ
ズマディスプレイの隔壁のように一定の凹凸状パターン
が形成された基材の凹部に所定の塗液を、短い時間で、
しかも与えられた有効領域全面にわたって均一に塗布で
きるようにすることによって、高生産性と高品質を実現
できる、凹凸基材への塗液の塗布方法および塗布装置並
びにプラズマディスプレイの製造方法および製造装置を
提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to apply a predetermined coating solution to a concave portion of a substrate on which a predetermined uneven pattern is formed, such as a partition wall of a plasma display, in a short time.
Moreover, a method and an apparatus for applying a coating liquid to an uneven substrate, and a method and an apparatus for manufacturing a plasma display, which can realize high productivity and high quality by enabling uniform application over a given effective area. Is to provide.
【０００９】[0009]
【課題を解決するための手段】上記課題を解決するため
に、本発明の凹凸基材への塗液の塗布方法は、表面に一
定ピッチで凹凸部が形成されている基材と、該凹凸部と
対面して複数の開口部を有する塗液吐出装置とを相対的
に移動させ、かつ前記塗液吐出装置に塗液を供給して開
口部より塗液を吐出し、基材の凹部に塗布する塗布方法
であって、前記塗液吐出装置の開口部と基材の凸部頂上
間の間隙を設定するのと同時、または設定した後、塗液
の供給を開始することを特徴とする方法からなる。In order to solve the above-mentioned problems, a method for applying a coating liquid to an uneven substrate according to the present invention comprises: a substrate having an uneven portion formed on a surface thereof at a constant pitch; The coating liquid discharge device having a plurality of openings facing the portion is relatively moved, and the coating liquid is supplied to the coating liquid discharge device to discharge the coating liquid from the openings, and to the concave portion of the base material. A coating method for coating, wherein the supply of the coating liquid is started simultaneously with or after setting the gap between the opening of the coating liquid discharge device and the top of the convex part of the base material. Consist of methods.
【００１０】この方法においては、基材と塗液吐出装置
の相対移動を開始して設定された塗布速度に到達した後
または同時であって、塗液吐出装置の開口部が基材の塗
布開始位置に到達する前に塗液の供給を開始することが
好ましい。In this method, after the relative movement between the base material and the coating liquid discharge device is started and the set coating speed is reached, or at the same time, the opening of the coating liquid discharge device starts coating the base material. It is preferable to start supplying the coating liquid before reaching the position.
【００１１】また、基材を塗液吐出装置に対し相対的に
塗液吐出装置の開口部下方で停止させた後に塗液の供給
を開始するとともに、さらに一定時間後に、塗液吐出装
置と基材の少なくとも一方を相対的に移動開始すること
もできる。[0011] Further, the supply of the coating liquid is started after the base material is stopped below the opening of the coating liquid discharge device relative to the coating liquid discharge device. At least one of the members can be relatively moved.
【００１２】さらに、塗液の供給停止のタイミングとし
ては、塗液吐出装置の開口部が基材の塗布終了位置に到
達した時点、または塗布終了位置に到達する前の時点
で、塗液の供給を停止することが好ましい。Further, the supply of the coating liquid is stopped when the opening of the coating liquid discharge device reaches the coating end position of the base material or before the coating end position. Is preferably stopped.
【００１３】さらにまた、塗液の供給停止が所定のタイ
ミングで行われるように、あるいは、塗液の供給停止後
に塗液吐出装置の開口部から塗液が不要にたれたり吐出
されたりするのを防止するために、塗液の供給を停止す
ると同時に、塗液吐出装置内の圧力を大気圧にすること
が好ましい。あるいは、塗液の供給停止後、塗液吐出装
置の開口部に溜まっている塗液を塗液吐出装置を通して
吸引するようにしてもよい。そして、塗液吐出装置の開
口部が基材の塗布終了位置に到達した時点、または塗布
終了位置を通りすぎた後に、塗液吐出装置を基材から遠
ざかる方向に移動するようにすることが好ましい。Furthermore, the supply of the coating liquid may be stopped at a predetermined timing, or after the supply of the coating liquid is stopped, the coating liquid may be unnecessarily dripped or discharged from the opening of the coating liquid discharge device. In order to prevent this, it is preferable that the supply of the coating liquid is stopped and, at the same time, the pressure in the coating liquid discharge device is set to the atmospheric pressure. Alternatively, after the supply of the coating liquid is stopped, the coating liquid stored in the opening of the coating liquid discharging device may be sucked through the coating liquid discharging device. Then, when the opening of the coating liquid discharge device reaches the coating end position of the base material, or after passing through the coating end position, it is preferable to move the coating liquid discharge device in a direction away from the base material. .
【００１４】また、塗液の塗布に際しては、基材の凸部
頂上位置を検知し、該凸部頂上と塗液吐出装置の開口部
面との間隙を一定に保ちながら塗布することが好まし
い。この基材の凸部頂上位置は塗布前に検知すればよ
い。また、複数の開口部を有する塗液吐出装置の開口部
面全体にわたって所定の位置に決めるには、たとえば、
塗液吐出装置の開口部面の両端部に対応する基材の凸部
頂上位置を検知し、検知した凸部頂上位置に応じて、塗
液吐出装置の開口部面の両端部と基材の凸部頂上との間
隙を一定に保つようにすることが好ましい。さらに凸部
頂上と塗液吐出装置の開口部面の間隙を一定に保つため
に、凹部底面位置を検知し、検知した凹部底面位置と凸
部頂上〜凹部底面間の距離から凸部頂上位置を算出して
もよい。この基材の凹部底面位置は塗布前に検知するこ
とが好ましい。また、塗液吐出装置の開口部面の両端部
と基材の凸部頂上との間隙を一定に保つために、塗液吐
出装置の開口部面の両端位置に対応する基材の凹部底面
位置を検知し、検知した各々の凹部底面位置と凸部頂上
〜凹部底面間の距離から凸部頂上位置を算出してもよ
い。In applying the coating liquid, it is preferable to detect the position of the top of the convex portion of the base material and to apply the coating liquid while keeping the gap between the top of the convex portion and the opening surface of the coating liquid discharge device constant. The position of the top of the convex portion of the substrate may be detected before coating. Further, in order to determine a predetermined position over the entire opening surface of the coating liquid ejection device having a plurality of openings, for example,
Detecting the tops of the convex portions of the base material corresponding to both ends of the opening surface of the coating liquid discharge device, and detecting both the ends of the base surface of the coating liquid discharge device according to the detected top positions of the convex portions. It is preferable to keep the gap with the top of the projection constant. Furthermore, in order to keep the gap between the top of the convex portion and the opening surface of the coating liquid discharge device constant, the position of the concave bottom surface is detected, and the convex top position is determined from the detected concave bottom position and the distance between the convex top and the concave bottom surface. It may be calculated. It is preferable to detect the position of the bottom surface of the concave portion of the base material before coating. Further, in order to keep a constant gap between both ends of the opening surface of the coating liquid discharge device and the top of the convex portion of the base material, the concave bottom positions of the base material corresponding to both end positions of the opening surface of the coating liquid discharge device. May be detected, and the top position of the convex portion may be calculated from the detected bottom position of the concave portion and the distance between the top of the convex portion and the bottom surface of the concave portion.
【００１５】この基材の凸部頂上と塗液吐出装置の開口
部面との間隙は、たとえば、５０〜２００μｍの範囲に
制御される。間隙の制御精度としては、±５０μｍ程度
でも十分である場合が多いが、±１０μｍ以内としてお
くことが好ましい。基材の凸部頂上位置の検知精度は、
公知の検出器で十分に±５μｍ以内の精度で検知でき
る。フィードバックをかける場合には、±１μｍ以内の
精度で検知することが好ましく、このような高精度検知
も市販の検出器で十分に達成可能である。The gap between the top of the convex portion of the base material and the surface of the opening of the coating liquid discharge device is controlled, for example, in the range of 50 to 200 μm. In many cases, the control accuracy of the gap is about ± 50 μm, but it is preferable that the gap be within ± 10 μm. The detection accuracy of the convex part top position of the substrate is
The detection can be sufficiently performed with a known detector with an accuracy within ± 5 μm. When feedback is applied, it is preferable to perform detection with an accuracy within ± 1 μm, and such high-precision detection can be sufficiently achieved with a commercially available detector.
【００１６】また、塗布に際しては、塗液吐出装置の開
口部の位置を検知し、検知した開口部の位置を基材の凹
部に位置決めして塗布することが好ましい。In the application, it is preferable to detect the position of the opening of the coating liquid discharging apparatus, and to position the detected position of the opening in the concave portion of the base material before applying.
【００１７】基材の凹凸部に関しては、表面に一定ピッ
チで凹凸部が形成されている基材であれば特に限定しな
いが、本発明は、プラズマディスプレイのように基材凹
凸部が一方向にストライプ状に形成されているものに特
に好適である。The irregularities of the substrate are not particularly limited as long as the irregularities are formed at a constant pitch on the surface. However, the present invention is not limited to the case where the irregularities of the substrate are unidirectional as in a plasma display. It is particularly suitable for those formed in a stripe shape.
【００１８】本発明に係るプラズマディスプレイの製造
方法は、塗液が赤色、緑色、青色のいずれかの色に発光
する蛍光体粉末を含むペーストであって、上記いずれか
に記載の塗布方法を用いてプラズマディスプレイパネル
用部材を製造することを特徴とする方法からなる。According to a method of manufacturing a plasma display according to the present invention, the coating liquid is a paste containing a phosphor powder that emits light of any one of red, green and blue. And manufacturing a member for a plasma display panel.
【００１９】このような凹凸基材への塗液の塗布方法お
よびプラズマディスプレイ用部材の製造方法によれば、
とくに塗布開始、終了時の塗布厚み精度を高くすること
が可能となり、品質、生産性を著しく向上できる。According to the method of applying a coating liquid to the uneven substrate and the method of manufacturing a member for a plasma display,
In particular, it is possible to increase the coating thickness accuracy at the start and end of coating, and it is possible to significantly improve quality and productivity.
【００２０】本発明に係る凹凸基材への塗液の塗布装置
は、表面に一定ピッチで凹凸部が形成されている基材を
固定するテーブルと、基材の凹凸部と対面して複数の開
口部を有する塗液吐出装置と、塗液吐出装置に塗液を供
給する供給手段と、テーブルと塗液吐出装置を３次元的
に相対移動させる移動手段とを備えた凹凸基材への塗液
の塗布装置において、塗液吐出装置の開口部に対する基
材の相対位置を検知する位置検知手段と、塗液吐出装置
の開口部に対する基材の相対位置に応じて塗液の吐出開
始／終了の実行を制御する吐出制御手段と、塗液吐出装
置の開口部を基材の凹部に対応して位置決めする位置決
め制御手段とを有することを特徴とするものからなる。According to the present invention, there is provided an apparatus for applying a coating liquid onto an uneven base material, comprising: a table for fixing a base material having uneven portions formed at a constant pitch on the surface; Coating a concave-convex substrate with a coating liquid ejection device having an opening, supply means for supplying a coating liquid to the coating liquid ejection device, and moving means for moving the table and the coating liquid ejection device relative to each other three-dimensionally. In a liquid application device, position detection means for detecting a relative position of the substrate with respect to an opening of the coating liquid discharge device, and start / end of discharge of the coating liquid according to a relative position of the substrate with respect to the opening of the coating liquid discharge device And a positioning control means for positioning the opening of the coating liquid discharge device in correspondence with the concave portion of the base material.
【００２１】この塗布装置においては、さらに、基材の
凸部頂上位置を検知する凸部頂上位置検知手段と、基材
の凸部頂上と塗液吐出装置の開口部面との間隙を一定に
制御する制御手段を有することが望ましい。あるいは、
凹部底面位置検知手段と、検知した凹部底面位置と凸部
頂上〜凹部底面間の距離から算出した凸部頂上位置に基
づいて、凸部頂上と塗液吐出装置の開口部面との間隙を
一定に制御する制御手段を有するものであってもよい。
また、塗液の供給停止が所定のタイミングで行われるよ
うに、あるいは、塗液の供給停止後に塗液吐出装置の開
口部から塗液が不要にたれたり吐出されたりするのを防
止するために、さらに、塗液吐出装置内の圧力を吐出圧
力から大気圧〜負圧まで任意に設定および調整できる圧
力調整手段を有することが望ましい。In this coating apparatus, furthermore, a convex top position detecting means for detecting a convex top position of the base material, and a constant gap between the convex top of the base material and the opening surface of the coating liquid discharge device. It is desirable to have control means for controlling. Or,
The concave bottom surface position detecting means, and the gap between the convex top and the opening surface of the coating liquid discharge device is fixed based on the detected concave bottom position and the convex top position calculated from the distance between the convex top and the concave bottom surface. May be provided.
Further, in order to prevent the supply of the coating liquid from being performed at a predetermined timing or to prevent the coating liquid from being unnecessarily dripped or discharged from the opening of the coating liquid discharge device after the supply of the coating liquid is stopped. Further, it is desirable to have a pressure adjusting means capable of arbitrarily setting and adjusting the pressure in the coating liquid discharge device from the discharge pressure to the atmospheric pressure to the negative pressure.
【００２２】また、該塗液の塗布装置は、さらに、テー
ブル面に垂直な方向における塗液吐出装置の開口部位置
検知手段と、テーブル面に対しての塗液吐出装置の傾き
度を調整可能な傾き調整手段と、基材の凸部頂上に対し
塗液吐出装置の開口部面を実質的に平行でかつ所定の間
隙に制御する間隙制御手段とを有する構成とすることも
できる。この間隙制御手段は、塗液の塗布中、基材の凸
部頂上と塗液吐出装置の開口部面とを実質的に平行でか
つ所定の間隙に制御するものであることが好ましい。ま
た、凸部頂上は凸部頂上位置検知手段によって直接、あ
るいは凹部底面を検知する凹部底面位置検知手段と、検
知した凹部底面位置と凸部頂上〜凹部底面間の距離から
求めるのが好ましく、さらに塗布前に基材の凸部頂上位
置または凹部底面位置を検知するものであることが好ま
しい。さらに、上記凸部頂上位置検知手段、凹部底面位
置検知手段および上記開口部位置検知手段は、塗液吐出
装置の開口部面の両端部に対応する位置においてそれぞ
れ検知するようにしておけば、開口部面の全体にわたっ
て、凸部頂上との所望の相対位置関係に保つことができ
る。Further, the coating liquid application device can further adjust the opening position detecting means of the coating liquid discharge device in a direction perpendicular to the table surface and adjust the inclination of the coating liquid discharge device with respect to the table surface. It is also possible to adopt a configuration having a suitable inclination adjusting means and a gap control means for controlling the opening surface of the coating liquid discharge device to be substantially parallel to the top of the convex portion of the base material and to have a predetermined gap. Preferably, the gap control means controls the top of the convex portion of the base material and the opening surface of the coating liquid discharge device to be substantially parallel to a predetermined gap during application of the coating liquid. Further, the convex part top is preferably obtained directly from the convex part top position detecting means or the concave part bottom position detecting means for detecting the concave part bottom, and the distance between the detected concave part bottom position and the convex part top to the concave part bottom, and It is preferable to detect the top position of the convex portion or the bottom position of the concave portion of the base material before coating. Furthermore, if the convex part top position detecting means, the concave part bottom position detecting means and the opening position detecting means detect at the positions corresponding to both ends of the opening surface of the coating liquid discharge device, the opening The desired relative positional relationship with the top of the convex portion can be maintained over the entire surface.
【００２３】また、塗液吐出装置の開口部に対する基材
の相対位置を検知する手段が、塗液吐出装置の開口部の
位置を直接または間接的に検知するものであり、さらに
基材の凹部をテーブル上の定められた位置に配置する基
材位置決め手段を有する構造とすれば、凹部内への塗液
の塗布をさらに精度よく行うことが可能になる。Further, the means for detecting the relative position of the substrate with respect to the opening of the coating liquid discharge device directly or indirectly detects the position of the opening of the coating liquid discharge device. Has a substrate positioning means for arranging the substrate at a predetermined position on the table, it is possible to more accurately apply the coating liquid into the concave portion.
【００２４】この塗液吐出装置においても、基材の凹凸
部に関しては、表面に一定ピッチで凹凸部が形成されて
いる基材であれば特に限定しないが、本発明は、プラズ
マディスプレイのように基材凹凸部が一方向にストライ
プ状に形成されているものに特に好適である。Also in this coating liquid discharging apparatus, the irregularities of the substrate are not particularly limited as long as the irregularities are formed at a constant pitch on the surface, but the present invention is not limited to the plasma display. It is particularly suitable for those in which the substrate irregularities are formed in a stripe shape in one direction.
【００２５】本発明に係るプラズマディスプレイ用部材
の製造装置は、塗液が赤色、緑色、青色のいずれかの色
に発光する蛍光体粉末を含むペーストであって、請求項
１６ないし２４のいずれかに記載の塗布装置を有するこ
とを特徴とするものからなる。In the apparatus for manufacturing a member for a plasma display according to the present invention, the coating liquid is a paste containing a phosphor powder that emits any one of red, green and blue colors. Characterized by having the coating device described in (1).
【００２６】このような凹凸基材への塗液の塗布装置お
よびプラズマディスプレイ用部材の製造装置によれば、
とくに塗布開始、終了時の塗布厚み精度を高くすること
が装置的にも可能となり、品質、塗布速度を高めて、コ
スト、生産性の面で有利な設備を提供できる。According to the apparatus for applying a coating liquid to the uneven substrate and the apparatus for manufacturing a member for a plasma display,
In particular, it is possible for the apparatus to increase the coating thickness accuracy at the start and end of coating, and it is possible to provide equipment that is advantageous in terms of cost and productivity by increasing quality and coating speed.
【００２７】[0027]
【発明の実施の形態】以下、本発明の好ましい実施形態
を図面に基づいて説明する。図１は、本発明の一実施態
様に係る塗布装置の全体斜視図、図２は図１のテーブル
６とノズル２０回りの模式図、図３は図１のノズル２０
を下側からみた拡大平面図である。Preferred embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an overall perspective view of a coating apparatus according to one embodiment of the present invention, FIG. 2 is a schematic view around the table 6 and the nozzle 20 in FIG. 1, and FIG. 3 is a nozzle 20 in FIG.
FIG. 5 is an enlarged plan view as viewed from below.
【００２８】図１は、本発明に係るプラズマディスプレ
イパネル用部材の製造に適用される塗布装置を示してい
る。この塗布装置は基台２を備えている。基台２上に
は、一対のガイド溝レール８が設けられており、このガ
イド溝レール８上にはテーブル６が配置されている。こ
のテーブル６の上面には、表面に凹凸が一定ピッチで一
方向にストライプ状に形成された基材４が、真空吸引に
よってテーブル面に固定可能となるように、サクション
面を構成する複数の吸着孔７が設けられている。また、
基材４は図示しないリフトピンによってテーブル６上を
昇降する。さらにテーブル６はスライド脚９を介してガ
イド溝レール８上をＸ軸方向に往復動自在となってい
る。FIG. 1 shows a coating apparatus applied to manufacture of a member for a plasma display panel according to the present invention. This coating apparatus includes a base 2. A pair of guide groove rails 8 is provided on the base 2, and a table 6 is arranged on the guide groove rails 8. On the upper surface of the table 6, a plurality of suction surfaces constituting a suction surface are formed so that a substrate 4 having a surface formed with stripes in one direction at a constant pitch can be fixed to the table surface by vacuum suction. A hole 7 is provided. Also,
The base material 4 is moved up and down on the table 6 by lift pins (not shown). Further, the table 6 is reciprocally movable in the X-axis direction on the guide groove rail 8 via the slide legs 9.
【００２９】一対のガイド溝レール８間には、図２に示
す送りねじ機構を構成するフィードスクリュー１０が、
テーブル６の下面に固定されたナット状のコネクタ１１
を貫通して延びている。フィードスクリュー１０の両端
部は軸受１２に回転自在に支持され、さらに片方の一端
にはＡＣサーボモータ１６が連結されている。Between the pair of guide groove rails 8, a feed screw 10 constituting a feed screw mechanism shown in FIG.
Nut-shaped connector 11 fixed to the lower surface of table 6
Extends through it. Both ends of the feed screw 10 are rotatably supported by bearings 12, and an AC servomotor 16 is connected to one end.
【００３０】図１に示すように、テーブル６の上方に
は、塗液吐出装置であるノズル２０がホルダー２２を介
して昇降機構３０、幅方向移動機構３６に連結してい
る。昇降機構３０は昇降可能な昇降ブラケット２８を備
えており、昇降機構３０のケーシング内部で一対のガイ
ドロッドに昇降自在に取り付けられている。また、この
ケーシング内にはガイドロッド間に位置してボールねじ
からなるフィードスクリュー（図示しない）もまた回転
自在に配置されており、ナット型のコネクタを介して昇
降ブラケット２８と連結されている。さらにフィードス
クリューの上端には図示しないＡＣサーボモータが接続
されており、このＡＣサーボモータの回転によって昇降
ブラケット２８を任意に昇降動作させることができるよ
うになっている。As shown in FIG. 1, above the table 6, a nozzle 20, which is a coating liquid discharging device, is connected via a holder 22 to an elevating mechanism 30 and a width direction moving mechanism 36. The elevating mechanism 30 includes an elevating bracket 28 that can be moved up and down, and is attached to a pair of guide rods inside the casing of the elevating mechanism 30 so as to be able to move up and down. A feed screw (not shown) composed of a ball screw is also rotatably disposed in the casing between the guide rods, and is connected to the lifting bracket 28 via a nut-type connector. Further, an AC servomotor (not shown) is connected to the upper end of the feed screw, and the lifting bracket 28 can be arbitrarily moved up and down by rotation of the AC servomotor.
【００３１】さらに、昇降機構３０はＹ軸移動ブラケッ
ト３２（アクチュエータ）を介して幅方向移動機構３６
に接続されている。幅方向移動機構３６はＹ軸移動ブラ
ケット３２をノズル２０の幅方向、すなわちＹ軸方向に
往復自在に移動させるものである。動作のために必要な
ガイドロッド、フィードスクリュー、ナット型コネクタ
ー、ＡＣサーボモータ等は、ケーシング内に昇降機構３
０と同じように配置されている。幅方向移動機構３６は
支柱３４により基台２上に固定されている。Further, the elevating mechanism 30 is moved by a width-direction moving mechanism 36 via a Y-axis moving bracket 32 (actuator).
It is connected to the. The width direction moving mechanism 36 is for moving the Y-axis moving bracket 32 reciprocally in the width direction of the nozzle 20, that is, in the Y-axis direction. The guide rod, feed screw, nut-type connector, AC servomotor, etc. necessary for the operation are provided with a lifting mechanism 3 inside the casing.
It is arranged in the same way as 0. The width direction moving mechanism 36 is fixed on the base 2 by the columns 34.
【００３２】これらの構成によって、ノズル２０はＺ軸
とＹ軸方向に自在に移動させることができる。With these configurations, the nozzle 20 can be freely moved in the Z-axis and Y-axis directions.
【００３３】ノズル２０は、テーブル６の往復動方向と
直交する方向、つまりＹ軸方向に水平に延びているが、
これを直接保持するコの字形のホルダー２２は昇降ブラ
ケット２８内にて回転自在に支持されており、垂直面内
で自在に図中の矢印方向に回転することができる。The nozzle 20 extends horizontally in the direction orthogonal to the reciprocating direction of the table 6, that is, in the Y-axis direction.
A U-shaped holder 22 for directly holding the holder is rotatably supported in an elevating bracket 28, and can freely rotate in a vertical direction in the direction of the arrow in the figure.
【００３４】このホルダ２２の上方には水平バー２４も
昇降ブラケット２８に固定されている。この水平バー２
４の両端部には、電磁作動型のリニアアクチュエータ２
６が取り付けられている。このリニアアクチュエータ２
６は水平バー２４の下面から突出する伸縮ロッドを有し
ており、これら伸縮ロッドがホルダ２２の両端部に接触
することによってホルダ２２の回転角度を規制すること
ができ、結果としてノズル２０の傾き度を任意に設定す
ることができる。A horizontal bar 24 is also fixed to the lifting bracket 28 above the holder 22. This horizontal bar 2
4 are electromagnetically actuated linear actuators 2 at both ends.
6 is attached. This linear actuator 2
Numeral 6 has telescopic rods projecting from the lower surface of the horizontal bar 24, and these telescopic rods can regulate the rotation angle of the holder 22 by contacting both ends of the holder 22. The degree can be set arbitrarily.
【００３５】さらに図１を参照すると、基台２の上面に
は逆Ｌ字形のセンサ支柱３８が固定されており、その先
端にはテーブル６上の基材４の凸部頂上の位置（高さ）
を測定する高さセンサ４０が取り付けられている。ま
た、高さセンサ４０の隣には、基材４の隔壁間の凹部の
位置を検知するカメラ７２が支柱７０に取り付けられて
いる。図２に示すように、カメラ７２は画像処理装置７
４に電気的に接続されており、隔壁間の凹部位置の変化
を定量的に求めることができる。Still referring to FIG. 1, an inverted L-shaped sensor support 38 is fixed to the upper surface of the base 2, and the tip (the height) of the convex portion of the base material 4 on the table 6 is provided at the tip. )
Is mounted. Next to the height sensor 40, a camera 72 for detecting the position of the concave portion between the partition walls of the base material 4 is attached to the column 70. As shown in FIG. 2, the camera 72 is connected to the image processing device 7.
4, and can quantitatively determine a change in the position of the concave portion between the partition walls.
【００３６】さらに、テーブル６の一端には、センサー
ブラケット６４を介して、ノズル２０の開口部のある下
端面（開口部面）のテーブル６に対する垂直方向の位置
を検出するセンサー６６が取り付けられている。なお高
さセンサー４０の検知位置を変えれば、基材４の凹部底
面位置（高さ）を測定することができる。Further, a sensor 66 for detecting the vertical position of the lower end surface (opening surface) of the nozzle 20 with respect to the table 6 with the opening of the nozzle 20 is attached to one end of the table 6 via a sensor bracket 64. I have. If the detection position of the height sensor 40 is changed, the bottom position (height) of the concave portion of the base material 4 can be measured.
【００３７】図２に示すように、ノズル２０はそのマニ
ホールド４１内に塗液４２が充填されており、開口部で
ある吐出孔４４が開口部先端面４５上で長手方向に一直
線状にならんでいる（図３参照）。そしてこの吐出孔４
４より塗液４２が吐出される。ノズル４０には供給ホー
ス４６が接続されており、さらに吐出用電磁切換え弁４
８、供給ユニット５０、吸引ホース５２、吸引用電磁切
換え弁５４、塗液タンク５６へと連なっている。塗液タ
ンク５６には塗液４２が蓄えられている。塗液４２は、
赤色、緑色、青色のいずれかの色に発光する蛍光体粉末
を含むペーストからなる。As shown in FIG. 2, the nozzle 20 has a manifold 41 filled with a coating liquid 42, and the discharge holes 44, which are openings, are arranged in a straight line in the longitudinal direction on the opening end surface 45. (See FIG. 3). And this discharge hole 4
4, the coating liquid 42 is discharged. A supply hose 46 is connected to the nozzle 40.
8, a supply unit 50, a suction hose 52, an electromagnetic switching valve for suction 54, and a coating liquid tank 56. The coating liquid 42 is stored in the coating liquid tank 56. The coating liquid 42
It is composed of a paste containing a phosphor powder that emits light of any of red, green and blue colors.
【００３８】供給ユニット５０の具体例としては、ピス
トン、ダイヤフラム型等の定容量ポンプ、チュービング
ポンプ、ギアポンプ、モータポンプ、さらには液体を気
体の圧力で押し出す圧送コントローラ等がある。供給装
置コントローラ５８からの制御信号をうけて、供給ユニ
ット５０や、各々の電磁切換え弁の動作を行なわせ、塗
液タンク５６から塗液４２を吸引して、ノズル２０に塗
液４２を供給することができる。塗液タンク５６から定
容量ポンプへの塗液４２の吸引動作を安定化させるため
に、塗液タンク５６に空気、窒素等の気体で圧力を付加
してもよい。圧力の大きさは０．０１〜１ＭＰａ、特に
０．０２〜０．５ＭＰａが好ましい。Specific examples of the supply unit 50 include a piston, a constant volume pump such as a diaphragm type, a tubing pump, a gear pump, a motor pump, and a pressure feed controller for pushing out a liquid by gas pressure. In response to a control signal from the supply device controller 58, the supply unit 50 and each of the electromagnetic switching valves are operated to suck the coating liquid 42 from the coating liquid tank 56 and supply the coating liquid 42 to the nozzle 20. be able to. In order to stabilize the suction operation of the coating liquid 42 from the coating liquid tank 56 to the constant volume pump, pressure may be applied to the coating liquid tank 56 with a gas such as air or nitrogen. The magnitude of the pressure is preferably 0.01 to 1 MPa, particularly preferably 0.02 to 0.5 MPa.
【００３９】供給装置コントローラはさらに、全体コン
トローラ６０に電気的に接続されている。この全体コン
トローラ６０には、モータコントローラ６２、高さセン
サー４０の電気入力等、カメラ７２の画像処理装置７４
からの情報等、すべての制御情報が電気的に接続されて
おり、全体のシーケンス制御を司れるようになってい
る。全体コントローラ６０は、コンピュータでも、シー
ケンサでも、制御機能を持つものならばどのようなもの
でもよい。The feeder controller is further electrically connected to the general controller 60. The general controller 60 includes an image processing device 74 of a camera 72 such as a motor controller 62 and electric inputs of the height sensor 40.
All the control information, such as information from the computer, is electrically connected, so that the entire sequence control can be performed. The general controller 60 may be a computer, a sequencer, or any controller having a control function.
【００４０】またモータコントローラ６２には、テーブ
ル６を駆動するＡＣサーボモータ１６や、昇降機構３０
と幅方向移動機構３６のそれぞれのアクチュエータ７
６、７８（たとえば、ＡＣサーボモータ）、さらにはテ
ーブル６の移動位置を検出する位置センサ６８からの信
号、ノズル２０の作動位置を検出するＹ、Ｚ軸の各々の
リニアセンサ（図示しない）からの信号などが入力され
る。なお、位置センサ６８を使用する代わりに、ＡＣサ
ーボモータ１６にエンコーダを組み込み、このエンコー
ダから出力されるパルス信号に基づき、テーブル６の位
置を検出することも可能である。The motor controller 62 includes the AC servomotor 16 for driving the table 6 and the lifting mechanism 30.
And each actuator 7 of the width direction moving mechanism 36
6, 78 (for example, an AC servomotor), a signal from a position sensor 68 for detecting the moving position of the table 6, and a linear sensor (not shown) for each of the Y and Z axes for detecting the operating position of the nozzle 20. Is input. Instead of using the position sensor 68, an encoder may be incorporated in the AC servomotor 16 and the position of the table 6 may be detected based on a pulse signal output from the encoder.
【００４１】次にこの塗布装置を使った塗布方法につい
て説明する。まず塗布装置における各作動部の原点復帰
が行われるとテーブル６、ノズル２０は各々Ｘ軸、Ｙ
軸、Ｚ軸の準備位置に移動する。この時、塗液タンク５
６〜ノズル２０まで塗液はすでに充満されており、吐出
用電磁切換え弁４８は開、吸引用電磁切換え弁５４は閉
の状態にする。そして、テーブル６の表面には図示しな
いリフトピンが上昇し、図示しないローダから隔壁が一
定ピッチのストライプ状に形成されている基材４がリフ
トピン上部に載置される。Next, a coating method using this coating apparatus will be described. First, when the origin return of each operation unit in the coating apparatus is performed, the table 6 and the nozzle 20 are respectively moved to the X axis and the Y
Move to the preparation position of the axis and Z axis. At this time, the coating liquid tank 5
The coating liquid has already been filled from No. 6 to Nozzle 20, and the discharge electromagnetic switching valve 48 is opened and the suction electromagnetic switching valve 54 is closed. Then, lift pins (not shown) rise on the surface of the table 6, and the base material 4, whose partitions are formed in a stripe pattern at a constant pitch, is placed on the lift pins from a loader (not shown).
【００４２】次にリフトピンを下降させて基材４をテー
ブル６の上面に載置し、図示しないアライメント装置に
よってテーブル６上の位置決めが行われた後に基材２を
吸着する。Next, the substrate 4 is placed on the upper surface of the table 6 by lowering the lift pins, and the substrate 2 is sucked after the positioning on the table 6 is performed by an alignment device (not shown).
【００４３】次にテーブル６はカメラ７２と、高さセン
サー４０の真下に基材４の隔壁（凸部頂上）がくるまで
移動し、停止する。カメラ７２はテーブル６上に位置決
めされた基材４上の隔壁端部を写し出すようにあらかじ
め位置調整されており、画像処理によって一番端の凹部
の位置を検出し、カメラ基準点からの位置変化量ｌａを
求める。一方、カメラ７２の基準点と、所定のＹ軸座標
位置Ｙａにある時のホルダ２２に固定されたノズル２０
の最端部に位置する吐出孔４４間の長さｌｂは、事前の
調整時に測定し、情報として全体コントローラ６０に入
力しているので、画像処理装置７４からカメラ基準点か
らの隔壁凹部の位置変化量ｌａが電送されると、ノズル
２０の最端部に位置する吐出孔４４が隔壁端部の凹部の
真上となるＹ軸座標値Ｙｃを計算し（例えば、Ｙｃ＝Ｙ
ａ＋ｌｂ−ｌａ）、ノズル２０をその位置に移動させ
る。なお、カメラ２は、ノズル２０やホルダ２２に取り
付けても同じ機能が得られる。Next, the table 6 moves until the partition wall (the top of the convex portion) of the base material 4 comes just below the camera 72 and the height sensor 40, and stops. The position of the camera 72 is adjusted in advance so as to project the end of the partition wall on the base material 4 positioned on the table 6, and the position of the endmost concave portion is detected by image processing, and the position change from the camera reference point is performed. Find the quantity la. On the other hand, the reference point of the camera 72 and the nozzle 20 fixed to the holder 22 at the predetermined Y-axis coordinate position Ya
The length lb between the discharge holes 44 located at the end of the partition is measured at the time of advance adjustment, and is input to the overall controller 60 as information. When the change amount la is transmitted, the Y-axis coordinate value Yc at which the discharge hole 44 located at the end of the nozzle 20 is directly above the concave portion at the end of the partition wall is calculated (for example, Yc = Y).
a + lb-la), the nozzle 20 is moved to that position. The same function can be obtained by attaching the camera 2 to the nozzle 20 or the holder 22.
【００４４】この間に高さセンサ４０は基材４の隔壁頂
上部の垂直方向の位置を検知し、テーブル６上面との位
置の差から基材４の隔壁頂上部の高さを算出する。この
高さに、あらかじめ与えておいたノズル２０開口部〜基
材４の隔壁頂上部間の間隙値を加算して、ノズル２０の
Ｚ軸リニアセンサー上での下降すべき値を演算し、その
位置にノズルを移動する。これによって、テーブル６上
での隔壁頂上部位置が基材ごとに変化しても、塗布に重
要なノズル２０開口部〜基材上の隔壁頂上部間の間隙を
常に一定に保てるようになる。なお隔壁の溝の深さが均
一で既知の値ｌkとなっているならば、高さセンサー４
０で隔壁溝の底面部位置を検知して、テーブル６上面と
の位置の差から基材４の隔壁溝底面部の高さを算出し、
この値に隔壁溝の深さｌｋを加算して隔壁頂上部の高さ
を求めてもよい。以下同様にして、算出した隔壁頂上部
高さにノズル２０開口部〜基材４の隔壁頂上部間の間隙
値を加算して、ノズル２０のＺ軸リニアセンサー上での
下降すべき値が求まり、塗布の最中にノズル２０開口部
〜基材４の隔壁頂上部間の間隙値を一定に保つことがで
きる。隔壁の溝（凹部の溝）の底面部位置を検知するこ
とは、隔壁の溝幅（凹部幅）が隔壁頂上部幅（凸部幅）
よりも大きい時や、隔壁頂上部幅が小さすぎて隔壁頂上
部（凸部頂上部）の高さが検知できないときに有効とな
る。During this time, the height sensor 40 detects the vertical position of the top of the partition wall of the base material 4 and calculates the height of the top of the partition wall of the base material 4 from the difference in position from the upper surface of the table 6. To this height, a predetermined gap value between the opening of the nozzle 20 and the top of the partition wall of the substrate 4 is added, and a value to be lowered on the Z-axis linear sensor of the nozzle 20 is calculated. Move the nozzle to the position. Thus, even if the top position of the partition on the table 6 changes for each substrate, the gap between the opening of the nozzle 20 important for coating and the top of the partition on the substrate can always be kept constant. If the depth of the groove of the partition is uniform and has a known value lk, the height sensor 4
0, the position of the bottom surface of the partition groove is detected, and the height of the bottom surface of the partition groove of the base material 4 is calculated from the difference in position from the upper surface of the table 6;
The height of the top of the partition wall may be obtained by adding the depth lk of the partition groove to this value. Similarly, a gap value between the opening of the nozzle 20 and the top of the partition wall of the substrate 4 is added to the calculated height of the partition top to obtain a value to be lowered on the Z-axis linear sensor of the nozzle 20. During the coating, the gap value between the opening of the nozzle 20 and the top of the partition wall of the substrate 4 can be kept constant. Detecting the position of the bottom surface of the groove of the partition wall (groove of the concave portion) means that the groove width of the partition wall (recess width) is equal to the width of the top of the partition wall (projection width)
This is effective when the height of the top of the partition is too small or the height of the top of the partition (top of the convex portion) cannot be detected because the width of the top of the partition is too small.
【００４５】次にテーブル６をノズル２０の方へ向けて
動作を開始させ、ノズル２０の開口部の真下に基材４の
塗布開始位置が到達する前に所定の塗布速度まで増速さ
せておく。テーブル６の動作開始位置と塗布開始位置ま
での距離は塗布速度まで増速できるよう十分確保できて
いなければならない。Next, the operation is started by directing the table 6 toward the nozzle 20, and the table 6 is accelerated to a predetermined coating speed before the coating start position of the substrate 4 reaches just below the opening of the nozzle 20. . The distance between the operation start position of the table 6 and the application start position must be sufficiently ensured that the speed can be increased to the application speed.
【００４６】さらに基材４の塗布開始位置がノズル２０
の開口部の真下に至るまでの所に、テーブル６の位置を
検知する位置センサー６８を配置しておき、テーブル６
がこの位置に達したら、供給ユニット５０の動作を開始
して塗液４２のノズル２０への供給を開始する。ノズル
２０開口部より吐出される塗液４２が基材４に達するに
は、基材〜ノズル開口部間の間隙だけ時間遅れが生じ
る。そのため、事前に塗液４２をノズル２０に供給する
ことによって、基材４の塗布開始位置がノズル２０開口
部の丁度真下に来たところでノズル２０から吐出された
所定量の塗液４２が基板４に到達するので、ほとんど厚
みむらゼロの状態で塗布を開始することができる。塗液
４２の供給を開始する位置は位置センサー６８の設置場
所を変えて調整することができる。この位置センサー６
８の代わりに、モータあるいはフィードスクリューにエ
ンコーダを接続したり、テーブルにリニアセンサーを付
けたりすると、エンコーダやリニアセンサーの値で検知
しても同様なことが可能となる。Further, the application start position of the substrate 4 is
A position sensor 68 for detecting the position of the table 6 is disposed immediately below the opening of the table 6.
When this reaches this position, the operation of the supply unit 50 is started, and the supply of the coating liquid 42 to the nozzle 20 is started. In order for the coating liquid 42 discharged from the opening of the nozzle 20 to reach the base material 4, a time delay occurs by the gap between the base material and the nozzle opening. Therefore, by supplying the coating liquid 42 to the nozzle 20 in advance, a predetermined amount of the coating liquid 42 discharged from the nozzle 20 is applied to the substrate 4 when the coating start position of the base material 4 is just below the opening of the nozzle 20. , The application can be started with almost no thickness unevenness. The position where the supply of the coating liquid 42 is started can be adjusted by changing the installation location of the position sensor 68. This position sensor 6
When an encoder is connected to the motor or the feed screw or a linear sensor is attached to the table instead of 8, a similar operation can be performed even if the value is detected by the encoder or the linear sensor.
【００４７】塗布は、基材４の塗布終了位置がノズル２
０の開口部の真下付近に来るまで行われる。すなわち、
基材４はいつもテーブル６上の定められた位置に置かれ
ているから、基材４の塗布終了位置がノズル２０の開口
部の（ａ）たとえば真下にくる５ｍｍ前や、（ｂ）丁度
真下になる位置に相当するテーブル６の位置に、位置セ
ンサーやそのエンコーダ値をあらかじめ設定しておき、
テーブル６が（ａ）に対応する位置にきたら、全体コン
トローラ６０から供給装置コントローラ５８に停止指令
を出して塗液４２のノズル２０への供給を停止して、
（ｂ）の位置までスキージ塗工し、次いでテーブル６が
（ｂ）に対応する位置にきたら、ノズル２０を上昇させ
て完全に塗液４２をたちきる。塗液４２が比較的高粘度
の液体である場合には、単に塗液の供給を停止しただけ
では、残圧によるノズル２０開口部からの塗液吐出まで
も瞬時に停止することは難しい。そのために、塗液の供
給を停止するとと同時にノズル２０内のマニホールド４
１圧力を大気圧にすると、短時間で開口部からの塗液の
吐出停止が可能となるので、供給ユニットにこのような
機能をもたせるか、あるいは、供給ユニットの吐出電磁
切換え弁４８〜ノズル２０の間に大気開放バルブを設け
るのが望ましい。In the application, the application end position of the substrate 4 is
The process is performed until the position is just below the opening of 0. That is,
Since the base material 4 is always placed at a predetermined position on the table 6, the coating end position of the base material 4 is (a) 5 mm before, for example, just below the opening of the nozzle 20, or (b) just below. The position sensor and its encoder value are set in advance at the position of the table 6 corresponding to the position
When the table 6 comes to the position corresponding to (a), a stop command is issued from the general controller 60 to the supply device controller 58 to stop supplying the coating liquid 42 to the nozzle 20.
The squeegee coating is performed up to the position (b), and when the table 6 comes to the position corresponding to the position (b), the nozzle 20 is raised to completely turn off the coating liquid 42. When the coating liquid 42 is a liquid having a relatively high viscosity, it is difficult to stop the supply of the coating liquid from the opening of the nozzle 20 due to the residual pressure instantaneously simply by stopping the supply of the coating liquid. Therefore, when the supply of the coating liquid is stopped, the manifold 4 in the nozzle 20 is stopped.
When the pressure is set to atmospheric pressure, the discharge of the coating liquid from the opening can be stopped in a short time. Therefore, the supply unit may be provided with such a function, or the discharge electromagnetic switching valve 48 to the nozzle 20 of the supply unit may be provided. It is desirable to provide an atmosphere release valve between them.
【００４８】さて、塗布終了位置を通過しても、テーブ
ル６は動作を続け、終点位置にきたら停止する。このと
き塗布すべき部分がまだ残っている場合には、次の塗布
すべき開始位置までノズルをＹ軸方向に塗布幅分（ノズ
ルピッチ×穴数）移動して、以下テーブル６を反対方向
に移動させることを除いては同じ手順で塗布を行う。１
回目と同一のテーブル６の移動方向で塗布を行なうのな
ら、ノズル２０は次の塗布すべき開始位置までＹ軸方向
に移動、テーブル６はＸ軸準備位置まで復帰させる。The table 6 continues to operate even after passing the coating end position, and stops when it reaches the end position. At this time, if the portion to be applied still remains, the nozzle is moved by the application width (nozzle pitch × number of holes) in the Y-axis direction to the next start position to be applied, and then the table 6 is moved in the opposite direction. Coating is performed in the same procedure except that it is moved. 1
If the application is performed in the same moving direction of the table 6 as the first time, the nozzle 20 is moved in the Y-axis direction to the next start position to be applied, and the table 6 is returned to the X-axis preparation position.
【００４９】そして塗布工程が完了したら、基材４をア
ンローダで移載する場所までテーブル６を移動して停止
させ、基材４の吸着を解除するとともに大気開放した後
に、リフトピンを上昇させて基材４をテーブル６の面か
ら引き離し、持ち上げる。When the coating process is completed, the table 6 is moved to the place where the substrate 4 is transferred by the unloader and stopped, and the suction of the substrate 4 is released, and the substrate 4 is released to the atmosphere. The material 4 is separated from the surface of the table 6 and lifted.
【００５０】このとき図示されないアンローダによって
基材４の下面が保持され、次の工程に基材４を搬送す
る。基材４をアンローダに受け渡したら、テーブル６は
リフトピンを下降させ原点位置に復帰する。At this time, the lower surface of the substrate 4 is held by an unloader (not shown), and the substrate 4 is transported to the next step. When the substrate 4 is delivered to the unloader, the table 6 lowers the lift pins and returns to the original position.
【００５１】このとき、吐出用電磁切換え弁４８を閉、
吸引用電磁切換え弁５４を開状態にして供給ユニット５
０を動作させ、塗液タンク５６から１枚の基材の塗布に
必要な量だけ塗液を供給する。At this time, the discharge electromagnetic switching valve 48 is closed,
With the suction electromagnetic switching valve 54 opened, the supply unit 5
0 is operated, and the coating liquid is supplied from the coating liquid tank 56 in an amount necessary for coating one substrate.
【００５２】以上の塗布工程では、与えられた有効領域
での塗布厚み精度を向上させるためには、塗布開始位置
に対するノズル２０への塗液供給開始、塗布終了位置に
対するノズル２０への塗液供給／停止のタイミングが重
要となるので、それぞれの動作を最適なポイントで行わ
なければならない。In the above coating process, in order to improve the coating thickness accuracy in a given effective area, the supply of the coating liquid to the nozzle 20 at the coating start position and the coating liquid supply to the nozzle 20 at the coating end position are performed. Since the timing of stop / stop is important, each operation must be performed at an optimum point.
【００５３】また、本実施態様では塗液の供給開始を、
ノズル２０の開口部面と基材４の隔壁頂上との間隙を設
定してから行っている。これは、両者間の間隙を設定す
る前の状態で塗液の供給を開始すると、塗液が開口部か
ら吐出された時点で開口部先端面に広がり開口部（孔）
以外の部分を汚染し、甚だしい場合には隣同士の孔から
吐出される塗液が合流するという不都合が生じ、精度の
高い塗布ができなくなるためである。ノズル２０の開口
部先端面を基材４に近接させてから塗液の供給を開始す
ると、先端面で塗液が広がる前に隔壁間の凹部に塗液が
案内されることになるので、このような不都合は発生し
ない。In this embodiment, the supply of the coating liquid is started at
This is performed after setting a gap between the opening surface of the nozzle 20 and the top of the partition wall of the substrate 4. This is because, when the supply of the coating liquid is started before the gap is set between the two, the coating liquid spreads to the tip end of the opening when the coating liquid is discharged from the opening, and the opening (hole) is formed.
This is because the other parts are contaminated, and in severe cases, there is a disadvantage that the coating liquids discharged from the adjacent holes merge, which makes it impossible to perform coating with high accuracy. When the supply of the coating liquid is started after the opening end surface of the nozzle 20 is brought close to the base material 4, the coating liquid is guided to the concave portion between the partition walls before the coating liquid spreads on the front end surface. Such inconvenience does not occur.
【００５４】次に、塗布開始位置での塗布厚みを改善す
る別の実施態様について説明する。まず上述の実施態様
では、ノズル２０と基材４が所定の塗布速度に到達して
から塗液の吐出を開始するために、ノズル２０の空走区
間がどうしても必要である。しかし、決められた位置か
ら高い精度で塗布を開始するには、この空走区間を最小
限度まで抑えなければならない。そこで別の実施態様で
ある塗布方法では、ノズル２０の開口部の真下に基材の
塗布開始位置を停止させ、ノズル２０の開口部先端面〜
基材４の隔壁頂上部間の間隙が所定の値になるまで両者
を近接させた後に、塗液の吐出を開始する。そして、塗
液の吐出開始の一定時間ｔ秒後にテーブル６の動作を開
始する。Next, another embodiment for improving the coating thickness at the coating start position will be described. First, in the above-described embodiment, the idle running section of the nozzle 20 is absolutely necessary in order to start discharging the coating liquid after the nozzle 20 and the base material 4 reach the predetermined coating speed. However, in order to start coating with high accuracy from a predetermined position, this idle running section must be minimized. Therefore, in a coating method according to another embodiment, the coating start position of the base material is stopped immediately below the opening of the nozzle 20, and the tip end surface of the opening of the nozzle 20 is stopped.
After bringing the two close together until the gap between the tops of the partition walls of the base material 4 reaches a predetermined value, the discharge of the coating liquid is started. Then, the operation of the table 6 is started a fixed time t seconds after the start of the discharge of the coating liquid.
【００５５】時間ｔは塗液の物性や、ノズル２０の開口
部先端面〜基材４の隔壁頂上部間の間隙によって変化す
るので、品種毎に塗布厚みむらを最小とするものに設定
しなければならない。時間ｔの設定は、図２に示す全体
コントローラ６０内に設けられるタイマーコントローラ
によって行われる。この塗布方法の場合、テーブル６と
塗液の吐出動作の昇速曲線を一致させておくことが望ま
しい。Since the time t varies depending on the physical properties of the coating liquid and the gap between the tip of the opening of the nozzle 20 and the top of the partition wall of the substrate 4, the coating thickness unevenness must be set to a minimum for each type. Must. The setting of the time t is performed by a timer controller provided in the overall controller 60 shown in FIG. In the case of this coating method, it is desirable to make the table 6 and the speed-up curve of the coating liquid discharge operation coincide.
【００５６】一方、塗布終了位置での厚みむらをさらに
小さくするには、基材に近接させたノズル２０を引き上
げるタイミングが重要となるが、上述のようにノズル２
０の開口部が基材の塗布開始終了位置に到達した時点
か、通過した後の最適な時点で行わなければならない。
このタイミングは、隔壁形状、特に壁高さや塗液物性に
よって変化するので、各品種ごとに定める必要がある。On the other hand, in order to further reduce the thickness unevenness at the coating end position, it is important to raise the nozzle 20 close to the base material.
It must be performed when the opening of No. 0 reaches the coating start / end position of the base material or at an optimum time after passing through.
This timing varies depending on the shape of the partition wall, particularly, the height of the wall and the physical properties of the coating liquid, and thus needs to be determined for each product type.
【００５７】塗布終了位置での厚みは中央部と比べると
厚くなりやすい。この厚みむらを改善するための別の実
施態様としては、塗布終了位置でノズル２０を引き上げ
る代わりに、塗液をノズル２０の開口部である孔から吸
引して、余剰分を回収するのがよい。ノズル２０の開口
部の吐出孔４４から液を逆流させる手段としては、供給
ユニット５０にポンプを使う場合はポンプを逆動作（吸
引する方向に動作）させたり、圧送の場合は供給ユニッ
ト５０に真空源が連なるようにしてノズル２０内の圧力
を負圧にすればよい。The thickness at the coating end position tends to be larger than that at the center. As another embodiment for improving the thickness unevenness, instead of pulling up the nozzle 20 at the coating end position, it is preferable that the coating liquid is sucked from a hole which is an opening of the nozzle 20 to collect an excess. . As means for causing the liquid to flow backward from the discharge hole 44 in the opening of the nozzle 20, when the pump is used for the supply unit 50, the pump is operated in reverse (operates in the suction direction). What is necessary is just to make the pressure in the nozzle 20 negative pressure by connecting the source.
【００５８】ノズル２０内の圧力を負圧にする別の手段
としては、吐出用電磁切換え弁４８〜ノズル２０間、ま
たはノズル２０そのものに真空源に接続される電磁切換
え弁を設けておき、これの切換えによっても実現でき
る。このとき、真空源の圧力を大気圧から任意の負圧の
大きさに調整できるようにしておけば、吐出孔４４から
塗液を吸引する速度を調整できる。真空源としては、真
空ポンプやアスピレータの他に、ピストン型のポンプを
逆動作させるものを使用してもよい。なお、真空源が無
くて大気開放になっても、継続時間は短いが、残圧で液
が上記切換え弁から出ていくので、ノズル２０内の液は
逆流して、同じ効果が得られる。As another means for reducing the pressure in the nozzle 20 to a negative pressure, an electromagnetic switching valve connected to a vacuum source is provided between the discharge electromagnetic switching valve 48 and the nozzle 20 or the nozzle 20 itself. Can also be realized by switching. At this time, if the pressure of the vacuum source can be adjusted from the atmospheric pressure to an arbitrary negative pressure, the speed at which the coating liquid is sucked from the discharge holes 44 can be adjusted. As the vacuum source, in addition to the vacuum pump and the aspirator, a source that reversely operates a piston type pump may be used. In addition, even if the air is released to the atmosphere without a vacuum source, the duration is short, but the liquid flows out of the switching valve with the residual pressure, so that the liquid in the nozzle 20 flows backward, and the same effect is obtained.
【００５９】本発明は塗布を行うノズル２０の開口部数
に限定されるものではなく、基本的には開口部（孔）数
の制限はない。しかし、現実的には、開口部数が多くな
ってノズル２０の幅が広くなってくると、ノズル２０の
開口部先端を基材４の隔壁頂上部と平行に配置し、両者
間の間隙を全幅にわたって均一にするのが難しくなって
くる。ノズル２０の開口部先端面〜基材４間の間隙が不
均一だと、塗布速度が高くなると間隙の大きい方から吐
出した塗液がとぎれる、いわゆる膜切れが生じて、塗布
速度が制限されるとともに、幅方向の厚みむら精度も低
下する。幅広のノズルでも基材４と全幅にわたって均一
に間隙を設定できるようにするには、次の実施態様から
なる塗布装置が必要となる。The present invention is not limited to the number of openings of the nozzle 20 for performing coating, and there is basically no limitation on the number of openings (holes). However, in reality, when the number of openings increases and the width of the nozzle 20 increases, the tip of the opening of the nozzle 20 is arranged in parallel with the top of the partition wall of the base material 4 and the gap between them is set to the full width. It becomes difficult to make it uniform over the whole area. If the gap between the opening end surface of the nozzle 20 and the base material 4 is not uniform, the coating liquid discharged from the larger gap is cut off when the coating speed is increased, that is, a so-called film break occurs, and the coating speed is limited. At the same time, the accuracy of thickness unevenness in the width direction decreases. In order to be able to set the gap uniformly over the entire width with the base material 4 even with a wide nozzle, a coating apparatus according to the following embodiment is required.
【００６０】まずノズル２０をホルダー２２に取り付け
た状態で開口部先端面をセンサー６６に近接させる。こ
のセンサー６６によってテーブル６の上面を基準とした
ノズル２０の開口部先端面位置を検出できる。一方ノズ
ル２０は、リニアアクチュエータ２６を作動させればテ
ーブル６に対する傾き角度を変化させられるので、左右
一対のセンサー６６から送られてくるノズル２０開口部
先端面の両端の位置信号が同じになるようにようにリニ
アアクチュエータ２６を制御すると、テーブル６に対し
て開口部先端面を平行に配置することができる。基材４
の隔壁は全面にわたって高さがほぼ均等となっているの
で、ノズル２０の開口部先端面をテーブル面に対して平
行としておけば、基材に対しても略平行にすることがで
きる。First, with the nozzle 20 attached to the holder 22, the tip of the opening is brought close to the sensor 66. The sensor 66 can detect the position of the tip of the opening of the nozzle 20 with reference to the upper surface of the table 6. On the other hand, since the inclination angle of the nozzle 20 with respect to the table 6 can be changed by operating the linear actuator 26, the position signals at both ends of the tip end surface of the nozzle 20 opening sent from the pair of left and right sensors 66 are the same. By controlling the linear actuator 26 as described above, the front end surface of the opening can be arranged parallel to the table 6. Base material 4
Since the height of the partition wall is substantially uniform over the entire surface, if the opening end surface of the nozzle 20 is set parallel to the table surface, it can be set substantially parallel to the base material.
【００６１】両者が平行となったときのセンサー６６の
測定値、すなわちテーブル６上面からノズル２０の開口
部先端面までの高さをａ、このときの昇降機構３０のＺ
軸リニアセンサ座標値をＺｐとすれば、開口部先端面が
丁度テーブル６上面に接するときのＺ軸座標値、すなわ
ちＺ軸原点座標値はＺｐ−ａとなる。塗布工程で、高さ
センサー４０によって基材の高さＬを測定し、あらかじ
め開口部先端面〜基材４の隔壁頂上部間の間隙Ｃが与え
られていれば、Ｚｅ＝Ｚｐ−ａ＋Ｌ＋Ｃがノズル２０の
塗布時の位置となる。なお、センサー６６としては、う
ず電流、レーザ、超音波等を利用した非接触のもの、ダ
イヤルゲージ、作動トランス等の接触式のもののいずれ
を用いてもよい。The measured value of the sensor 66 when the two become parallel, that is, the height from the upper surface of the table 6 to the tip of the opening of the nozzle 20 is a, and the Z of the elevating mechanism 30 at this time is a.
Assuming that the coordinate value of the axis linear sensor is Zp, the Z-axis coordinate value when the opening end surface is just in contact with the upper surface of the table 6, that is, the Z-axis origin coordinate value is Zp-a. In the coating step, the height L of the base material is measured by the height sensor 40, and if a gap C between the front end surface of the opening and the top of the partition wall of the base material 4 is given in advance, Ze = Zp−a + L + C is a nozzle. 20 is the position at the time of application. As the sensor 66, any of a non-contact sensor using an eddy current, a laser, an ultrasonic wave, or the like, and a contact sensor such as a dial gauge or an operation transformer may be used.
【００６２】上記方式は、基材の凸部の高さが基板全領
域にわたって均一な場合はよいが、そうでないときは塗
布する領域ごとに基材の凸部高さを測定し、それに合わ
せてノズルの開口部と基材の凸部との間の間隙が一定に
なるようにノズルのＺ軸方向位置を設定せねばならな
い。そうしないと間隙が場所によって変動し、甚だしい
場合には均一な塗布ができなかったり、塗布すべき凹部
以外の部分、たとえば凸部や隣の凹部に塗布してしまう
などの不都合が発生する。The above method is good when the height of the projections of the base material is uniform over the entire area of the substrate. Otherwise, the height of the projections of the base material is measured for each area to be coated, and the height is adjusted accordingly. The position of the nozzle in the Z-axis direction must be set so that the gap between the opening of the nozzle and the convex portion of the substrate is constant. Otherwise, the gap fluctuates from place to place, and in severe cases, inconvenient application may not be possible, or the coating may be applied to a portion other than the concave portion to be coated, for example, a convex portion or an adjacent concave portion.
【００６３】図４はそれに対応するための別の実施態様
を示している。図４では２台の高さセンサー４０Ａ、４
０ＢがＬ型の架台１０２に取り付けられている。高さセ
ンサー４０Ａと４０ＢとのＹ軸方向（幅方向）の取り付
け間隔は、ノズル２０の左右両端の開口部の間隔に合わ
せている。架台１０２はスライダー１０４上を自在に幅
方向に往復できるので、図示しない駆動源によって高さ
センサー４０Ａ、４０Ｂを凹凸基材４の幅方向の任意の
位置の上に配することが可能となる。FIG. 4 shows another embodiment corresponding to this. In FIG. 4, two height sensors 40A, 4A
OB is attached to the L-shaped gantry 102. The mounting interval between the height sensors 40A and 40B in the Y-axis direction (width direction) is set to the interval between the openings at the left and right ends of the nozzle 20. Since the gantry 102 can freely reciprocate in the width direction on the slider 104, the height sensors 40A and 40B can be arranged on arbitrary positions in the width direction of the uneven substrate 4 by a driving source (not shown).
【００６４】これら高さセンサー４０Ａ、４０Ｂを用い
た塗布方法はつぎのようになる。まずノズル２０で基材
４に塗布するＹ軸方向の位置に合わせて高さセンサー４
０Ａ、４０Ｂを移動させる。ノズル２０で塗布を行う前
に塗布する領域での基材凸部の高さを高さセンサー４０
Ａ、４０Ｂで検知する。このとき吸着テーブル６がＸ軸
方向に移動をして、あらかじめ決めた任意のＸ軸方向位
置での基材４の高さを検知してもよいし、Ｘ軸方向に沿
って基板高さを連続的に測定してその平均値をとっても
よい。この時、凹部の溝（隔壁の溝）の深さが一定値で
均一となっているならば、高さセンサー４０Ａ、４０Ｂ
の位置を変えて凹部溝の底面部位置を検知して、これに
凹部溝深さを加算し、基材凸部高さを算出してもよい。The coating method using these height sensors 40A and 40B is as follows. First, the height sensor 4 is adjusted to the position in the Y-axis direction to be applied to the base material 4 by the nozzle 20.
Move 0A and 40B. Before the application by the nozzle 20, the height of the substrate convex portion in the area to be applied is determined by a height sensor 40.
A and 40B detect. At this time, the suction table 6 may move in the X-axis direction to detect the height of the base material 4 at a predetermined position in the X-axis direction, or to detect the substrate height along the X-axis direction. It is also possible to measure continuously and take the average value. At this time, if the depth of the groove of the concave portion (the groove of the partition wall) is uniform at a constant value, the height sensors 40A, 40B
May be changed to detect the bottom surface position of the concave groove, and the concave groove depth may be added thereto to calculate the base material convex portion height.
【００６５】以上のように検知した基材４の凸部の高さ
から、ノズル２０の開口部面と基板凸部との距離、すな
わち間隙が一定になるようにノズル２０のＺ軸位置を演
算し、その位置にノズル２０を移動させる。ついで吸着
テーブル６をＸ軸方向の原点に戻して、塗液供給装置の
準備が完了したら塗布を開始する。次にノズル２０で基
材４に塗布すべき位置にノズル２０をＹ軸方向に移動さ
せるとともに、高さセンサー４０Ａ、４０Ｂも移動させ
る。以下同様に、基材高さを検知して、間隙が一定にな
るようにノズル２０を配置して塗布を行う。以上の動作
は決められた基材全領域を塗布し終わるまで続ける。つ
まり、基材４の凸部頂上位置を検知し、該凸部頂上と塗
液吐出装置の開口部面との間隙を一定に保ちながら塗布
する。From the height of the convex portion of the base material 4 detected as described above, the Z-axis position of the nozzle 20 is calculated so that the distance between the opening surface of the nozzle 20 and the substrate convex portion, that is, the gap is constant. Then, the nozzle 20 is moved to that position. Then, the suction table 6 is returned to the origin in the X-axis direction, and application is started when the preparation of the coating liquid supply device is completed. Next, the nozzle 20 is moved in the Y-axis direction to a position to be applied to the base material 4 by the nozzle 20, and the height sensors 40A and 40B are also moved. Hereinafter, similarly, the height of the base material is detected, and the nozzle 20 is disposed so that the gap is constant, and the coating is performed. The above operation is continued until the entire predetermined base material area is applied. That is, the position of the top of the convex portion of the base material 4 is detected, and the coating is performed while keeping a constant gap between the top of the convex portion and the opening surface of the coating liquid discharge device.
【００６６】以上の工程で、検知した基板凸部の高さ
や、凹部底面の高さ（凹部溝の底面位置）が高さセンサ
ー４０Ａ、４０Ｂで異なるときは、直接、あるいは凹部
底面高さに凹部底面から凸部頂上までの距離（凹部溝深
さ）を加算して間接的に求めた凸部頂上位置に基づい
て、ノズル２０の開口部面の両端でノズル開口部面と基
材凸部との間隙が一定になるように、ノズル２０の傾き
を変えてもよい。このときはリニアアクチュエータ２６
によってＯ点回りにノズル２０が回転するのでこの回転
角を制御するとともに、ノズル２０のＺ軸方向の位置も
制御して間隙が一定になるようにする。以上の操作は図
４に示す機構を使わず、ノズル２０の両端部が独立して
Ｚ軸方向に上下する機構を用いても実現できる。In the above steps, when the detected height of the convex portion of the substrate or the height of the bottom surface of the concave portion (the bottom position of the concave groove) differs between the height sensors 40A and 40B, the concave portion is directly or at the concave bottom height. The distance between the bottom surface and the top of the projection (the depth of the groove of the recess) is added and the nozzle opening surface and the base material projection at both ends of the opening surface of the nozzle 20 are determined based on the position of the projection top obtained indirectly. The inclination of the nozzle 20 may be changed so that the gap is constant. In this case, the linear actuator 26
As a result, the nozzle 20 rotates around the point O, so that the rotation angle is controlled, and the position of the nozzle 20 in the Z-axis direction is also controlled so that the gap becomes constant. The above operation can also be realized by using a mechanism in which both ends of the nozzle 20 move up and down independently in the Z-axis direction without using the mechanism shown in FIG.
【００６７】さらに上記した実施態様では、高さセンサ
ー４０Ａ、４０Ｂで、ノズル２０の両端部に相当する領
域の高さを検知したが、一台の高さセンサーでノズル２
０の中央部分付近に相当する場所を測定してもよい。Further, in the above-described embodiment, the height sensors 40A and 40B detect the heights of the areas corresponding to both ends of the nozzle 20, but the height sensors 40A and 40B detect the height of the nozzle 2 with one height sensor.
A location corresponding to the vicinity of the center of zero may be measured.
【００６８】また、高さセンサーで基材凸部高さまたは
凹部底面高さ（凹部溝の底面位置）をＸ軸方向に吸着テ
ーブルを移動させて連続的に測定した後、直接、あるい
は凹部底面高さと凹部底面から凸部頂上までの距離（凹
部溝深さ）を加算して間接的に求めた凸部頂上位置に基
づいて、塗布実行時にそれに合わせてノズル開口部面と
基材凸部との間隙が連続して一定になるようにノズル２
０のＺ軸位置や、Ｏ点回りの回転角を制御してもよい。
さらに、このとき連続的に測定するのではなくて、任意
の数点の高さを測定して、塗布時にそこでの間隙が一定
になるようにノズル２０のＺ軸位置等を制御してもよ
い。さらにまた高さセンサーはノズル２０と同時に移動
する部分、たとえばノズル２０そのもの、あるいはノズ
ル２０を取り付けているフレーム等に取り付けても同じ
機能を発揮できる。Further, after continuously measuring the height of the base portion of the base material or the height of the bottom surface of the concave portion (the bottom position of the concave groove) by moving the suction table in the X-axis direction using a height sensor, directly or directly to the bottom surface of the concave portion. Based on the height of the convex part obtained indirectly by adding the height and the distance from the bottom of the concave part to the top of the convex part (depth of the concave groove), the nozzle opening surface and the base material convex part are adjusted in accordance with the position at the time of performing coating. Nozzle 2 so that the gap of
The Z-axis position of 0 or the rotation angle around the O point may be controlled.
Further, at this time, instead of continuously measuring, the height of any number of points may be measured, and the Z-axis position and the like of the nozzle 20 may be controlled so that the gap thereat is constant during coating. . Further, the same function can be exerted when the height sensor is attached to a portion that moves at the same time as the nozzle 20, for example, the nozzle 20 itself, or a frame to which the nozzle 20 is attached.
【００６９】さらに、上記間隙の制御においては、測定
実行時に高さセンサーによって検知した情報に基づいて
フィードバック制御を行い、実質的にリアルタイムに所
望の間隙に制御して塗布するようにしてもよいし、上記
で説明したように１回空で走査させ高さセンサーによっ
て検知した情報に基づいて高さプロファイルを作成し、
そのプロファイルに基づいて制御するようにしてもよ
い。以上の実施態様は高さセンサー４０が一つでノズル
２０の中央部に相当する位置で、基板凸部高さや凹部底
面高さを求めてノズル２０の下降位置を制御する場合に
も適用することができる。ただしこの時はＯ点周りの回
転角の回転角の制御は不要である。Further, in the control of the gap, feedback control may be performed based on information detected by the height sensor at the time of execution of measurement, and the desired gap may be controlled and applied substantially in real time. As described above, a height profile is created based on information scanned once by the sky and detected by the height sensor,
Control may be performed based on the profile. The above embodiment is also applicable to a case where the height of the substrate 20 is controlled at a position corresponding to the central portion of the nozzle 20 with one height sensor 40 and the lowering position of the nozzle 20 is controlled by obtaining the height of the substrate convex portion and the concave portion bottom. Can be. However, at this time, it is not necessary to control the rotation angle of the rotation angle about the point O.
【００７０】なお、上述の各実施態様においては、前述
の如く、カメラ７２からの信号に基づく画像処理装置７
４における基材位置の情報により、ノズル２０の開口部
の位置を基材４の凹部の位置に合わせたが、塗液吐出装
置の開口部の位置を検知し、検知した開口部の位置を例
えば図５に示すような位置決めユニット８４で吸着テー
ブル６上の所定位置に配置した基材の凹部に位置決めし
て塗布するようにしてもよい。In each of the above-described embodiments, as described above, the image processing device 7 based on the signal from the camera 72 is used.
4, the position of the opening of the nozzle 20 was adjusted to the position of the concave portion of the substrate 4, but the position of the opening of the coating liquid ejection device was detected, and the detected position of the opening was determined, for example. The coating may be performed by positioning the positioning unit 84 as shown in FIG. 5 in a concave portion of the base material arranged at a predetermined position on the suction table 6.
【００７１】位置決めユニット８４は、左右１対あり、
ベース９６の上に位置決め片９０を支えてＹ軸方向に案
内するガイド９２、位置決め片９０を駆動するエアーシ
リンダー９４よりなる。駆動手段は、エアーシリンダー
９４に代えてパルスモータやサーボモータとしてもよ
い。位置決め片９０の先端は直角に折れ曲がっており、
基材４の角部と接触して、凹凸基材４のストライプ方向
を吸着テーブル６の進行方向（Ｘ軸）と平行に設定でき
るようになっている。The positioning unit 84 has a pair of right and left.
A guide 92 supports the positioning piece 90 on the base 96 and guides the positioning piece 90 in the Y-axis direction, and an air cylinder 94 drives the positioning piece 90. The driving means may be a pulse motor or a servo motor instead of the air cylinder 94. The tip of the positioning piece 90 is bent at a right angle,
The stripe direction of the uneven substrate 4 can be set in parallel with the traveling direction (X-axis) of the suction table 6 by contacting the corners of the substrate 4.
【００７２】ノズル２０の開口部の位置を検知する手段
としては、たとえばテーブル６にカメラ８２を取り付け
ることにより構成できる。カメラ８２でたとえばノズル
２０の一番端の孔を写し出し、図示を省略した画像処理
装置でその孔のＹ軸方向における位置Ｙｈを測定する。
一方、基材４上の一番端の凹部の位置の基材４の端部か
らの長さはあらかじめ与えられているので、その長さを
考慮して基材４の一番端の凹部は位置決めユニット８４
によりＹ軸方向の所定位置Ｙｓに位置決めされる。次
に、ノズル２０の一番端の孔の位置をＹｓのところまで
移動させて、基材４の一番端の凹部の位置に正確に決め
られる。位置決め後に、基材４をテーブル６上に吸着保
持し、前述の間隙制御を行いながら塗布を開始する。こ
のとき、基材４の一番端の凹部の位置をＹ軸方向のＹｈ
の位置に、位置決めユニット８４で移動させ、ノズル２
０の一番端の孔と位置決めしてもよい。なお、ノズル２
０の開口部の位置を検知する手段として、上記カメラ８
２に代えてレーザー変位計等のセンサーを用いてもよ
く、ノズル２０の開口部の位置を直接的に、あるいは間
接的に検知するいずれの手段でもよい。The means for detecting the position of the opening of the nozzle 20 can be constituted, for example, by attaching a camera 82 to the table 6. For example, the end of the hole of the nozzle 20 is projected by the camera 82, and the position Yh of the hole in the Y-axis direction is measured by an image processing device (not shown).
On the other hand, since the length of the position of the endmost concave portion on the base material 4 from the end of the base material 4 is given in advance, the endmost concave portion of the base material 4 is determined in consideration of the length. Positioning unit 84
Is positioned at a predetermined position Ys in the Y-axis direction. Next, the position of the hole at the end of the nozzle 20 is moved to the position of Ys, so that the position of the concave at the end of the substrate 4 is accurately determined. After the positioning, the substrate 4 is sucked and held on the table 6, and the application is started while performing the above-described gap control. At this time, the position of the concave portion at the end of the base material 4 is set to Yh in the Y-axis direction.
Is moved by the positioning unit 84 to the position
It may be positioned with the 0-most hole. The nozzle 2
As means for detecting the position of the opening 0, the camera 8
A sensor such as a laser displacement meter may be used in place of 2, and any means for directly or indirectly detecting the position of the opening of the nozzle 20 may be used.
【００７３】なお、ノズル２０の開口部位置の検知はノ
ズル２０を取り付けた後、一度だけやっておけばよい。Note that the position of the opening of the nozzle 20 need only be detected once after the nozzle 20 is attached.
【００７４】本発明において、適用できるノズルとして
は、前記実施態様で説明したような平坦な面中に所定ピ
ッチ、所定直径の孔が開口部として設けられているいる
ものの他に、一定の孔径、長さ形状を有するパイプをマ
ニホールドを構成するユニットに接続する形のものでも
よい。ただし、塗液が吐出される先端面が同一平面上に
あることが望ましい。In the present invention, applicable nozzles include, as described in the above embodiment, nozzles having holes of a predetermined pitch and a predetermined diameter as openings in a flat surface as described in the above-described embodiment. A pipe having a length shape may be connected to a unit constituting the manifold. However, it is desirable that the tip surfaces from which the coating liquid is discharged are on the same plane.
【００７５】さらに高さセンサー４０としては、レー
ザ、超音波等を利用した非接触測定形式のもの、ダイヤ
ルゲージ、差動トランス等を利用した接触測定形式のも
の等、測定可能な原理のものならいかなるものを用いて
もよい。Further, as the height sensor 40, if it is of a principle that can be measured, such as a non-contact measurement type using a laser, an ultrasonic wave, etc., a contact measurement type using a dial gauge, a differential transformer, etc. Any one may be used.
【００７６】また、塗液吐出装置の開口部の凹部に対す
る相対位置を検知する検知手段は、基材の凹部とノズル
の孔を各々別個に検知するカメラを用いた画像処理装置
により構成してもよい。Further, the detecting means for detecting the relative position of the opening of the coating liquid discharging device with respect to the concave portion may be constituted by an image processing device using a camera for separately detecting the concave portion of the substrate and the hole of the nozzle. Good.
【００７７】さらにまた、前記実施態様では基材はＸ軸
方向に移動し、ノズルがＹ軸、Ｚ軸方向に移動する場合
での適用例について記述したが、ノズル２０と基材４が
相対的に３次元的に移動できる構造、形式のものである
のなら、テーブル、ノズルの移動形式はいかなるもので
もよい。Further, in the above-described embodiment, an application example in which the substrate moves in the X-axis direction and the nozzle moves in the Y-axis and Z-axis directions has been described. The table and the nozzle may be moved in any manner as long as the table and the nozzle can be moved three-dimensionally.
【００７８】なお、本実施態様では、塗布はテーブルの
移動、凹凸のピッチ方向への移動は、ノズルの移動によ
って行う例を示したが、塗布をノズルの移動、凹凸のピ
ッチ方向への移動をテーブルの移動で行ってもよい。In the present embodiment, the application is performed by moving the table and moving the unevenness in the pitch direction by moving the nozzle. However, the application is performed by moving the nozzle and moving the unevenness in the pitch direction. It may be performed by moving the table.
【００７９】さらに、本発明における基材としては、ガ
ラス板の他、鉄板、アルミ板等、枚葉状のものならどの
ようなものでもよい。また、一種類の塗液を塗布する場
合について詳しく言及したが、赤、青、緑等の３色の蛍
光体を同時に塗布する場合にも本発明は適用できる。Further, as the substrate in the present invention, other than a glass plate, any substrate such as an iron plate and an aluminum plate may be used as long as it has a single-leaf shape. Further, the case where one type of coating liquid is applied has been described in detail, but the present invention can be applied to a case where phosphors of three colors such as red, blue, and green are applied simultaneously.
【００８０】[0080]
【実施例】幅３４０ｍｍ×４４０ｍｍ×厚さ２．８ｍｍ
のソーダガラス基板上の全面に感光性銀ペーストを５μ
ｍの厚みにスクリーン印刷した後で、フォトマスクを用
いて露光し、現像および焼成の各工程を経て、ピッチ２
２０μｍのストライプ状の１９２０本の銀電極を形成し
た。その電極上に、ガラスとバインダーからなるガラス
ペーストをスクリーン印刷機で塗布した後に、焼成して
誘電体層を形成した。次にガラス粉末と感光性有機成分
からなる感光性ガラスペーストを、塗布厚さ２００μｍ
でスクリーン印刷機を用いて塗布した。ついで輻射ヒー
タを用いた乾燥炉で乾燥後、塗布厚み分布を基板幅方向
にわたって測定したところ、１４０μｍ±３μｍの範囲
に収まった。この後、隣あった電極間に隔壁が形成され
るように設計されたフォトマスクを用いて露光し、現像
と焼成を行って隔壁を形成した。隔壁の形状はピッチ２
２０μｍ、線幅３０μｍ、高さ１３０μｍであり、隔壁
本数は１９２１本であった。次に、各色蛍光体粉末４０
ｇをエチルセルロース１０ｇ、テルピネオール１０ｇ、
及びベンジンアルコール４０ｇとを混合した後、セラミ
ックス製の３本ローラで混練して、Ｒ、Ｇ、Ｂ各色の蛍
光体ペーストを作製した。[Example] width 340 mm x 440 mm x thickness 2.8 mm
5μ of photosensitive silver paste on the entire surface of soda glass substrate
After screen printing to a thickness of m, exposure is performed using a photomask, development and baking are performed, and the pitch 2
1920 silver electrodes having a stripe shape of 20 μm were formed. A glass paste composed of glass and a binder was applied on the electrode by a screen printer, and then fired to form a dielectric layer. Next, a photosensitive glass paste composed of glass powder and a photosensitive organic component was applied to a thickness of 200 μm.
Was applied using a screen printing machine. Then, after drying in a drying oven using a radiation heater, the coating thickness distribution was measured in the width direction of the substrate and found to be within 140 μm ± 3 μm. Thereafter, exposure was performed using a photomask designed to form a partition between adjacent electrodes, and development and baking were performed to form a partition. The shape of the partition is pitch 2.
The thickness was 20 μm, the line width was 30 μm, and the height was 130 μm, and the number of partition walls was 1921. Next, each color phosphor powder 40
g of ethyl cellulose 10 g, terpineol 10 g,
After mixing with 40 g of benzene alcohol, the mixture was kneaded with three ceramic rollers to produce phosphor pastes of R, G, and B colors.
【００８１】続いて図１に示す装置にて塗布を行うため
に、ノズル２０にピッチ６６０μｍで平均口径１５０μ
ｍの吐出口を１６０個設けたものを使用して、これを１
基図１の装置に取り付けるとともに、隔壁まで形成され
た基板を３４０ｍｍの辺が走行方向（Ｘ方向）と平行と
なるようにテーブルに取付け吸着保持した。そしてノズ
ル２０の吐出口部を基板上の隔壁の溝にあわせた後に、
テーブルの上面を基準にした溝の底面の高さをレーザ変
位計によって測定し、この測定値に溝の高さ１３０μ
ｍ、ノズル２０の吐出口〜隔壁頂上部までの間隙１００
μｍを加算してノズル２０が下降すべき位置を求めて、
その位置にノズル２０を実際に下降させた。つづいて基
板を３４０ｍｍの辺に平行にテーブルを走行させ、塗布
速度の３ｍ／分に達した基板端部から１０ｍｍの位置で
２．６ｋｇ／ｃｍ2 の圧力をＲ色のペーストに付加し
て、ノズル２０からＲ色のペーストを隔壁の溝１５０個
に吐出して塗布を開始した。基板端部から３２０ｍｍの
位置に到達したところでバルブを閉じてペーストの吐出
を停止するとともに、３３０ｍｍの位置に達したところ
でノズル２０を引き上げて、残存しているペーストを断
ち切って塗布を終了させた。次にノズル２０を図１のＹ
方向に１０５．６ｍｍ移動するとともに、基板もＸ方向
のもとの位置に戻して、同様の塗布を合計４回行わせる
ことによってＲ色ペーストの塗布を完了し、８０℃１５
分で乾燥を行った。以降Ｂ、Ｇ色についても同様に塗
布、乾燥を行って、隔壁溝にＲ、Ｇ、Ｂ３色ペーストが
充填された部材を作製し、最後に４６０℃１５分の焼成
を行って、プラズマディスプレイ背面板まで作製した。
得られたプラズマディスプレイ背面板の表面品位は申し
分ないものであった。Subsequently, in order to perform coating with the apparatus shown in FIG. 1, the nozzle 20 was pitched to 660 μm and had an average diameter of 150 μm.
m with 160 outlets, and
In addition to being attached to the device shown in FIG. 1, the substrate formed up to the partition was attached to a table and held by suction so that the 340 mm side was parallel to the running direction (X direction). Then, after aligning the discharge port of the nozzle 20 with the groove of the partition on the substrate,
The height of the bottom of the groove with respect to the top of the table was measured with a laser displacement meter, and the measured value
m, the gap 100 from the discharge port of the nozzle 20 to the top of the partition wall
The position at which the nozzle 20 should descend by adding μm,
The nozzle 20 was actually lowered to that position. Subsequently, the substrate was run on the table in parallel with the 340 mm side, and a pressure of 2.6 kg / cm 2 was applied to the R color paste at a position 10 mm from the end of the substrate at which the coating speed reached 3 m / min. The R-color paste was discharged from the nozzles 20 into 150 grooves of the partition walls to start coating. When the position reached 320 mm from the end of the substrate, the valve was closed to stop the discharge of the paste, and when the position reached 330 mm, the nozzle 20 was pulled up to cut off the remaining paste and terminate the application. Next, the nozzle 20 is moved to Y in FIG.
In the X direction, and the substrate is returned to the original position in the X direction, and the same application is performed four times in total, thereby completing the application of the R color paste.
Drying in minutes. Thereafter, coating and drying are performed in the same manner for B and G colors to produce a member in which R, G, and B color pastes are filled in the partition grooves. A face plate was manufactured.
The surface quality of the obtained plasma display back plate was satisfactory.
【００８２】[0082]
【発明の効果】以上詳述したように、本発明の凹凸基材
への塗液の塗布方法および装置によれば、塗布開始時の
塗液の供給開始タイミング、基材速度との関係を詳細に
規定したので、塗布厚み精度を向上することが方法およ
び装置的に可能となり、品質を向上することができるば
かりでなく、与えられた有効領域を最大限に活用して歩
留まりも向上できるので、コスト低減、生産性向上に寄
与できる。As described above in detail, according to the method and apparatus for applying a coating liquid to an uneven substrate of the present invention, the relationship between the supply start timing of the coating liquid at the start of coating and the substrate speed is detailed. Since it is specified in the above, it is possible to improve the coating thickness accuracy in a method and apparatus, and it is possible not only to improve the quality, but also to improve the yield by maximizing a given effective area, It can contribute to cost reduction and productivity improvement.
【００８３】また、塗布終了位置での塗液の供給停止、
塗液供給装置と基材との位置関係、塗液吐出装置の圧力
調整手段等について詳しく規定したので、塗布終了時で
の塗布厚み精度を向上することが可能となり、品質、生
産性を高めることができる。Further, the supply of the coating liquid is stopped at the coating end position,
Since the positional relationship between the coating liquid supply device and the base material, the pressure adjusting means of the coating liquid discharge device, and the like have been specified in detail, it is possible to improve the coating thickness accuracy at the end of coating, and to improve the quality and productivity. Can be.
【００８４】さらに、塗液吐出装置と基材間の間隙を平
行に保つための具体的装置構成についても提供したの
で、幅の大きなノズルでも基材との間隙を均一にするこ
とができ、均一かつ高速の塗布が可能となる。Further, since a specific device configuration for keeping the gap between the coating liquid discharging device and the substrate parallel is provided, the gap between the substrate and the substrate can be made uniform even with a wide nozzle. In addition, high-speed coating becomes possible.
【００８５】さらにまた、ノズルの開口部と基材の凹部
との位置決め手段についても提供したので、両者の位置
を高い精度で位置決めでき、凹部だけの塗布が可能とな
り、品質、生産性を高めることができる。Further, since a means for positioning the opening of the nozzle and the concave portion of the base material is also provided, the positions of the two can be positioned with high accuracy, and only the concave portion can be applied, thereby improving the quality and productivity. Can be.
【００８６】本発明のプラズマディスプレイ用部材の製
造方法および装置によれば、上記凹凸基材への塗液の塗
布方法および装置を使用しているので、品質の高いプラ
ズマディスプレイ用部材を、高い生産性で製造すること
が可能となる。According to the method and apparatus for manufacturing a member for a plasma display of the present invention, since the method and apparatus for applying a coating liquid to the uneven substrate are used, high-quality members for a plasma display can be produced at a high production rate. It is possible to manufacture with the nature.
【図１】本発明の一実施態様に係る塗液の塗布装置の全
体斜視図である。FIG. 1 is an overall perspective view of a coating liquid application apparatus according to an embodiment of the present invention.
【図２】図１の装置のテーブル６とノズル２０周りの構
成を示す模式図である。FIG. 2 is a schematic diagram showing a configuration around a table 6 and a nozzle 20 of the apparatus shown in FIG.
【図３】図１の装置におけるノズル２０を下側からみた
拡大平面図である。FIG. 3 is an enlarged plan view of a nozzle 20 in the apparatus of FIG. 1 as viewed from below.
【図４】本発明の別の実施態様に係る塗液の塗布装置の
部分斜視図である。FIG. 4 is a partial perspective view of a coating liquid application device according to another embodiment of the present invention.
【図５】本発明のさらに別の実施態様に係る塗液の塗布
装置の部分平面図である。FIG. 5 is a partial plan view of a coating liquid application apparatus according to still another embodiment of the present invention.
２ 基台 ４ 基材 ６ テーブル ８ ガイド溝レール １０ フィードスクリュー １６ ＡＣサーボモータ ２０ ノズル ２６ リニアアクチュエータ ３０ 昇降機構 ３６ 幅方向移動機構 ４０、４０Ａ、４０Ｂ 高さセンサー ４２ 塗液 ４４ 開口部（吐出孔） ４５ 開口部面 ５０ 供給ユニット ５６ 塗液タンク ５８ 供給装置コントローラ ６０ 全体コントローラ ６６ センサー ７２ カメラ ８２ カメラ ８４ 位置決めユニット ９０ 位置決め片 ９４ エアーシリンダー 2 Base 4 Base 6 Table 8 Guide groove rail 10 Feed screw 16 AC servomotor 20 Nozzle 26 Linear actuator 30 Lifting mechanism 36 Width moving mechanism 40, 40A, 40B Height sensor 42 Coating liquid 44 Opening (discharge hole) 45 Opening surface 50 Supply unit 56 Coating tank 58 Supply device controller 60 Overall controller 66 Sensor 72 Camera 82 Camera 84 Positioning unit 90 Positioning piece 94 Air cylinder
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｇ０９Ｆ 9/30 ３１２ Ｇ０９Ｆ 9/30 ３１２Ａ 9/313 9/313 Ｚ Ｈ０１Ｊ 9/227 Ｈ０１Ｊ 9/227 Ｅ 11/02 11/02 Ｂ ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI G09F 9/30 312 G09F 9/30 312A 9/313 9/313 Z H01J 9/227 H01J 9/227 E 11/02 11/02 B
Claims (31)
いる基材と、該凹凸部と対面して複数の開口部を有する
塗液吐出装置とを相対的に移動させ、かつ前記塗液吐出
装置に塗液を供給して開口部より塗液を吐出し、基材の
凹部に塗布する塗布方法であって、前記塗液吐出装置の
開口部と基材の凸部頂上間の間隙を設定するのと同時、
または設定した後、塗液の供給を開始することを特徴と
する、凹凸基材への塗液の塗布方法。1. A method according to claim 1, further comprising: moving a substrate having a plurality of irregularities formed on the surface thereof at a constant pitch, and a coating liquid ejecting apparatus having a plurality of openings facing the irregularities. A coating method for supplying a coating liquid to a discharge device, discharging the coating liquid from an opening, and applying the coating liquid to a concave portion of a substrate, wherein a gap between the opening of the coating liquid discharging device and the top of a convex portion of the substrate is formed. At the same time as setting,
Alternatively, a method of applying a coating liquid to the uneven base material, comprising starting supply of the coating liquid after setting.
て設定された塗布速度に到達した後または同時であっ
て、塗液吐出装置の開口部が基材の塗布開始位置に到達
する前に塗液の供給を開始する、請求項１に記載の凹凸
基材への塗液の塗布方法。2. After the relative movement between the base material and the coating liquid discharge device is started and the set coating speed is reached, or simultaneously or simultaneously, the opening of the coating liquid discharge device reaches the coating start position of the base material. The method for applying a coating liquid to the uneven substrate according to claim 1, wherein the supply of the coating liquid is started before the coating.
吐出装置の開口部下方で停止させた後に塗液の供給を開
始するとともに、さらに一定時間後に、塗液吐出装置と
基材の少なくとも一方を相対的に移動開始する、請求項
１に記載の凹凸基材への塗液の塗布方法。3. The method according to claim 1, wherein the supply of the coating liquid is started after the base material is stopped below the opening of the coating liquid discharge device relative to the coating liquid discharge device. The method according to claim 1, wherein at least one of the members is relatively moved.
位置に到達した時点、または塗布終了位置に到達する前
の時点で、塗液の供給を停止する、請求項１ないし３の
いずれかに記載の凹凸基材への塗液の塗布方法。4. The supply of the coating liquid is stopped when the opening of the coating liquid discharging device reaches the coating end position of the base material or before the coating liquid reaches the coating end position. The method for applying a coating liquid to the uneven substrate according to any one of the above.
出装置内の圧力を大気圧にする、請求項４に記載の凹凸
基材への塗液の塗布方法。5. The method for applying a coating liquid to an uneven substrate according to claim 4, wherein the supply of the coating liquid is stopped and, at the same time, the pressure in the coating liquid discharge device is set to the atmospheric pressure.
位置に到達した時点、または塗布終了位置を通りすぎた
後に、塗液吐出装置を基材から遠ざかる方向に移動す
る、請求項４または５に記載の凹凸基材への塗液の塗布
方法。6. The coating liquid discharge device is moved in a direction away from the base material when the opening of the coating liquid discharge device reaches the coating end position of the base material or after passing through the coating end position. 6. The method for applying a coating liquid to the uneven substrate according to 4 or 5.
部に溜まっている塗液を塗液吐出装置を通して吸引す
る、請求項４に記載の凹凸基材への塗液の塗布方法。7. The method for applying a coating liquid to an uneven substrate according to claim 4, wherein after the supply of the coating liquid is stopped, the coating liquid stored in the opening of the coating liquid discharging apparatus is sucked through the coating liquid discharging apparatus. .
上と塗液吐出装置の開口部面との間隙を一定に保ちなが
ら塗布する、請求項１ないし７のいずれかに記載の凹凸
基材への塗液の塗布方法。8. The method according to claim 1, wherein a position of the top of the convex portion of the base material is detected, and the coating is performed while keeping a constant gap between the top of the convex portion and the opening surface of the coating liquid discharge device. Method for applying a coating liquid to the uneven substrate of (1).
る、請求項８に記載の凹凸基材への塗液の塗布方法。9. The method according to claim 8, wherein the position of the top of the convex portion of the substrate is detected before the application.
応する基材の凸部頂上位置を検知し、検知した凸部頂上
位置に応じて、塗液吐出装置の開口部面の両端部と基材
の凸部頂上との間隙を一定に保ちながら塗布する、請求
項８または９に記載の凹凸基材への塗液の塗布方法。10. A method for detecting the top positions of the convex portions of the base material corresponding to both ends of the opening surface of the coating liquid discharge device, and according to the detected top positions of the convex portions, both ends of the opening surface of the coating liquid discharge device. The method for applying a coating liquid to an uneven substrate according to claim 8, wherein the application is performed while maintaining a constant gap between the portion and the top of the convex portion of the substrate.
精度で検知する、請求項８ないし１０のいずれかに記載
の凹凸基材への塗液の塗布方法。11. The method for applying a coating liquid to an uneven substrate according to claim 8, wherein the position of the top of the convex portion of the substrate is detected with an accuracy within ± 5 μm.
た凹部底面位置と凸部頂上〜凹部底面間の距離から凸部
頂上位置を算出することによって、凸部頂上と塗液吐出
装置の開口部との間隙を一定に保ちながら塗布する、請
求項１ないし７のいずれかに記載の凹凸基材への塗液の
塗布方法。12. A method for detecting the position of the bottom of the concave portion of the base material and calculating the position of the top of the convex portion from the detected position of the bottom surface of the concave portion and the distance between the top of the convex portion and the bottom of the concave portion. The method for applying a coating liquid to an uneven substrate according to any one of claims 1 to 7, wherein the coating is performed while maintaining a constant gap with the opening.
る、請求項１２に記載の凹凸基材への塗液の塗布方法。13. The method according to claim 12, wherein the position of the bottom surface of the concave portion of the substrate is detected before the application.
対応する基材の凹部底面位置を検知し、検知した各々の
凹部底面位置と凸部頂上〜凹部底面間の距離から凸部頂
上位置を算出することによって、塗液吐出装置の開口部
面の両端部と基材の凸部頂上との間隙を一定に保ちなが
ら塗布する、請求項１２または１３に記載の凹凸基材へ
の塗液の塗布方法。14. A bottom surface of a concave portion of a base material corresponding to both end positions of an opening surface of a coating liquid discharge device is detected, and a top of a convex portion is determined based on each detected bottom position of the concave portion and a distance between the top of the convex portion and the bottom surface of the concave portion. The coating on the uneven substrate according to claim 12 or 13, wherein the position is calculated so that the gap between the both ends of the opening surface of the coating liquid discharge device and the top of the convex portion of the substrate is kept constant. Liquid application method.
精度で検知する、請求項１２ないし１４のいずれかに記
載の凹凸基材への塗液の塗布方法。15. The method according to claim 12, wherein the position of the bottom surface of the concave portion of the substrate is detected with an accuracy of ± 5 μm or less.
部面との間隙を５０〜２００μｍの範囲に制御する、請
求項１ないし１５のいずれかに記載の凹凸基材への塗液
の塗布方法。16. The method according to claim 1, wherein the gap between the top of the convex portion of the base material and the opening surface of the coating liquid discharge device is controlled in the range of 50 to 200 μm. Liquid application method.
し、検知した開口部の位置を基材の凹部に位置決めして
塗布する、請求項１ないし１６のいずれかに記載の凹凸
基材への塗液の塗布方法。17. The uneven base material according to claim 1, wherein the position of the opening of the coating liquid ejection device is detected, and the detected position of the opening is positioned in a concave portion of the base material and applied. How to apply coating liquid to
に形成されている、請求項１ないし１７のいずれかに記
載の凹凸基材への塗液の塗布方法。18. The method of applying a coating liquid to an uneven substrate according to claim 1, wherein the uneven portions of the substrate are formed in a stripe shape in one direction.
色に発光する蛍光体粉末を含むペーストであって、請求
項１ないし１８のいずれかに記載の塗布方法を用いてプ
ラズマディスプレイパネル用部材を製造することを特徴
とする、プラズマディスプレイ用部材の製造方法。19. A plasma display panel using the coating method according to any one of claims 1 to 18, wherein the coating liquid is a paste containing a phosphor powder that emits any one of red, green, and blue colors. A method for manufacturing a member for a plasma display, comprising manufacturing a member for a plasma display.
ている基材を固定するテーブルと、基材の凹凸部と対面
して複数の開口部を有する塗液吐出装置と、塗液吐出装
置に塗液を供給する供給手段と、テーブルと塗液吐出装
置を３次元的に相対移動させる移動手段とを備えた凹凸
基材への塗液の塗布装置において、塗液吐出装置の開口
部に対する基材の相対位置を検知する位置検知手段と、
塗液吐出装置の開口部に対する基材の相対位置に応じて
塗液の吐出開始／終了の実行を制御する吐出制御手段
と、塗液吐出装置の開口部を基材の凹部に対応して位置
決めする位置決め制御手段とを有することを特徴とす
る、凹凸基材への塗液の塗布装置。20. A table for fixing a base material having irregularities formed on the surface thereof at a constant pitch, a coating liquid ejecting apparatus having a plurality of openings facing the irregularities of the substrate, and a coating liquid ejecting apparatus. And a moving means for three-dimensionally moving the table and the coating liquid discharge device relative to the opening of the coating liquid discharge device. Position detection means for detecting the relative position of the substrate,
Discharge control means for controlling the start / end of the discharge of the coating liquid in accordance with the relative position of the substrate with respect to the opening of the coating liquid discharge device, and positioning the opening of the coating liquid discharge device in correspondence with the concave portion of the substrate And a positioning control means for applying the coating liquid to the uneven base material.
る凸部頂上位置検知手段と、基材の凸部頂上と塗液吐出
装置の開口部面との間隙を一定に制御する制御手段を有
する、請求項２０に記載の凹凸基材への塗液の塗布装
置。21. A convex top position detecting means for detecting a convex top position of the base material, and a control means for controlling a gap between the convex top of the base material and the opening surface of the coating liquid discharging device to be constant. The apparatus for applying a coating liquid to the uneven substrate according to claim 20, comprising:
る凹部底面位置検知手段と、検知した凹部底面位置と凸
部頂上〜凹部底面間の距離から算出した凸部頂上位置に
基づいて、凸部頂上と塗液吐出装置の開口部面との間隙
を一定に制御する制御手段を有する、請求項２０に記載
の凹凸基材への塗液の塗布装置。22. A concave bottom position detecting means for detecting a concave bottom position of the substrate, and a convex top position calculated from the detected concave bottom position and a distance between the convex top and the concave bottom. 21. The apparatus for applying a coating liquid to an uneven substrate according to claim 20, further comprising control means for controlling a gap between the top of the part and an opening surface of the coating liquid discharging apparatus to be constant.
圧力から大気圧〜負圧まで任意に設定および調整できる
圧力調整手段を有する、請求項２０または２２に記載の
凹凸基材への塗液の塗布装置。23. The method according to claim 20, further comprising a pressure adjusting means capable of arbitrarily setting and adjusting the pressure in the coating liquid discharge device from the discharge pressure to the atmospheric pressure to the negative pressure. Liquid coating device.
ける塗液吐出装置の開口部位置検知手段と、テーブル面
に対しての塗液吐出装置の傾き度を調整可能な傾き調整
手段と、基材の凸部頂上に対し塗液吐出装置の開口部面
を実質的に平行でかつ所定の間隙に制御する間隙制御手
段とを有する、請求項２０ないし２３のいずれかに記載
の凹凸基材への塗液の塗布装置。24. A means for detecting the position of the opening of the coating liquid discharging device in a direction perpendicular to the table surface, a tilt adjusting device capable of adjusting the degree of tilt of the coating liquid discharging device with respect to the table surface, And a gap control means for controlling the surface of the opening of the coating liquid discharge device to be substantially parallel to a predetermined gap with respect to the top of the convex portion. Coating liquid coating device.
に基材の凸部頂上位置を検知するものである、請求項２
１、２３、２４のいずれかに記載の凹凸基材への塗液の
塗布装置。25. The convex top position detecting means detects the convex top position of the base material before coating.
25. An apparatus for applying a coating liquid to the uneven substrate according to any one of 1, 23, and 24.
開口部位置検知手段は、塗液吐出装置の開口部面の両端
部に対応する位置においてそれぞれ検知するものであ
る、請求項２４または２５に記載の凹凸基材への塗液の
塗布装置。26. The method according to claim 24, wherein the convex portion top position detecting means and the opening position detecting means detect at positions corresponding to both ends of an opening surface of the coating liquid discharging apparatus. An apparatus for applying a coating liquid to the uneven substrate according to the above.
に基材の凹部底面位置を検知するものである、請求項２
２または２４のいずれかに記載の凹凸基材への塗液の塗
布装置。27. The concave bottom position detecting means detects the concave bottom position of the base material before coating.
25. An apparatus for applying a coating liquid to the uneven substrate according to any one of 2 and 24.
開口部位置検知手段は、塗液吐出装置の開口部面の両端
部に対応する位置においてそれぞれ検知するものであ
る、請求項２４または２７のいずれかに記載の凹凸基材
への塗液の塗布装置。28. The method according to claim 24, wherein the recess bottom surface position detecting means and the opening position detecting means detect at positions corresponding to both ends of the opening surface of the coating liquid discharge device. An apparatus for applying a coating liquid to an uneven substrate according to the above aspect.
材の相対位置を検知する手段が、塗液吐出装置の開口部
の位置を直接または間接的に検知するものであり、さら
に基材の凹部をテーブル上の定められた位置に配置する
基材位置決め手段を有する、請求項２０ないし２８のい
ずれかに記載の凹凸基材への塗液の塗布装置。29. The means for detecting the relative position of the substrate with respect to the opening of the coating liquid discharge device directly or indirectly detects the position of the opening of the coating liquid discharge device. The apparatus for applying a coating liquid to an uneven substrate according to any one of claims 20 to 28, further comprising substrate positioning means for arranging the concave portions at predetermined positions on the table.
に形成されている、請求項２０ないし２９のいずれかに
記載の凹凸基材への塗液の塗布装置。30. The apparatus for applying a coating liquid to an uneven substrate according to claim 20, wherein the uneven portions of the substrate are formed in a stripe shape in one direction.
色に発光する蛍光体粉末を含むペーストであって、請求
項２０ないし３０のいずれかに記載の塗布装置を有する
ことを特徴とする、プラズマディスプレイ用部材の製造
装置。31. A paste containing a phosphor powder that emits light of any of red, green and blue colors, wherein the paste has the coating device according to claim 20. To manufacture a member for a plasma display.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36011998A JP3199239B2 (en) | 1998-01-06 | 1998-12-18 | Manufacturing method and apparatus for plasma display member |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1206798 | 1998-01-06 | ||
| JP10-12067 | 1998-01-06 | ||
| JP36011998A JP3199239B2 (en) | 1998-01-06 | 1998-12-18 | Manufacturing method and apparatus for plasma display member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11262714A true JPH11262714A (en) | 1999-09-28 |
| JP3199239B2 JP3199239B2 (en) | 2001-08-13 |
Family
ID=26347619
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP36011998A Expired - Fee Related JP3199239B2 (en) | 1998-01-06 | 1998-12-18 | Manufacturing method and apparatus for plasma display member |
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| Country | Link |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003229055A (en) * | 2002-02-05 | 2003-08-15 | Tatsumo Kk | Phosphor layer filling device and filling method for plasma display panel |
| JP2006102684A (en) * | 2004-10-07 | 2006-04-20 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus and substrate processing method |
| JP2006175314A (en) * | 2004-12-21 | 2006-07-06 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JP2007136332A (en) * | 2005-11-17 | 2007-06-07 | Shibaura Mechatronics Corp | Apparatus and method for applying paste |
| JP2011011203A (en) * | 2009-06-05 | 2011-01-20 | Panasonic Corp | Method and apparatus of coating display panel, and method and apparatus of manufacturing display panel |
| US20110052826A1 (en) * | 2009-08-28 | 2011-03-03 | Casio Computer Co., Ltd. | Application device and driving method thereof |
| JP2013255889A (en) * | 2012-06-13 | 2013-12-26 | Misaki Conveyor Kk | Device for applying liquid |
| KR101411448B1 (en) * | 2006-08-31 | 2014-06-24 | 무사시 엔지니어링 가부시키가이샤 | Deformable gantry type working apparatus |
| CN106607300A (en) * | 2016-10-29 | 2017-05-03 | 安徽省光明粮油工业有限公司 | Machining device integrating protecting function and feeding and discharging function |
| CN109894320A (en) * | 2019-04-11 | 2019-06-18 | 昆山大阳机电设备制造有限公司 | A kind of vertical coating machine |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52134368A (en) * | 1976-05-06 | 1977-11-10 | Hitachi Ltd | Manufacture for color receivers |
| JPH05142407A (en) * | 1991-11-20 | 1993-06-11 | Toyo Gosei Kogyo Kk | Production of color filter |
| JPH0731168U (en) * | 1993-05-31 | 1995-06-13 | 平田機工株式会社 | Fluid coating device |
| JPH09173938A (en) * | 1995-12-22 | 1997-07-08 | Dainippon Screen Mfg Co Ltd | Treating liquid discharge device and method for adjusting gap between its discharge nozzle and substrate surface |
| JPH09206652A (en) * | 1996-01-30 | 1997-08-12 | Toray Ind Inc | Equipment and method for coating, and device and method for manufacturing color filter |
| JPH09329706A (en) * | 1996-06-13 | 1997-12-22 | Seiko Epson Corp | Color filter, color display device, manufacture thereof and color liquid crystal device |
-
1998
- 1998-12-18 JP JP36011998A patent/JP3199239B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52134368A (en) * | 1976-05-06 | 1977-11-10 | Hitachi Ltd | Manufacture for color receivers |
| JPH05142407A (en) * | 1991-11-20 | 1993-06-11 | Toyo Gosei Kogyo Kk | Production of color filter |
| JPH0731168U (en) * | 1993-05-31 | 1995-06-13 | 平田機工株式会社 | Fluid coating device |
| JPH09173938A (en) * | 1995-12-22 | 1997-07-08 | Dainippon Screen Mfg Co Ltd | Treating liquid discharge device and method for adjusting gap between its discharge nozzle and substrate surface |
| JPH09206652A (en) * | 1996-01-30 | 1997-08-12 | Toray Ind Inc | Equipment and method for coating, and device and method for manufacturing color filter |
| JPH09329706A (en) * | 1996-06-13 | 1997-12-22 | Seiko Epson Corp | Color filter, color display device, manufacture thereof and color liquid crystal device |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003229055A (en) * | 2002-02-05 | 2003-08-15 | Tatsumo Kk | Phosphor layer filling device and filling method for plasma display panel |
| JP2006102684A (en) * | 2004-10-07 | 2006-04-20 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus and substrate processing method |
| JP4490780B2 (en) * | 2004-10-07 | 2010-06-30 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate processing method |
| JP2006175314A (en) * | 2004-12-21 | 2006-07-06 | Dainippon Screen Mfg Co Ltd | Substrate treatment apparatus |
| JP4490803B2 (en) * | 2004-12-21 | 2010-06-30 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2007136332A (en) * | 2005-11-17 | 2007-06-07 | Shibaura Mechatronics Corp | Apparatus and method for applying paste |
| KR101411448B1 (en) * | 2006-08-31 | 2014-06-24 | 무사시 엔지니어링 가부시키가이샤 | Deformable gantry type working apparatus |
| JP2011011203A (en) * | 2009-06-05 | 2011-01-20 | Panasonic Corp | Method and apparatus of coating display panel, and method and apparatus of manufacturing display panel |
| JP2011045850A (en) * | 2009-08-28 | 2011-03-10 | Casio Computer Co Ltd | Coater and coating method |
| CN102000650A (en) * | 2009-08-28 | 2011-04-06 | 卡西欧计算机株式会社 | Application device and driving method thereof |
| US20110052826A1 (en) * | 2009-08-28 | 2011-03-03 | Casio Computer Co., Ltd. | Application device and driving method thereof |
| JP2013255889A (en) * | 2012-06-13 | 2013-12-26 | Misaki Conveyor Kk | Device for applying liquid |
| CN106607300A (en) * | 2016-10-29 | 2017-05-03 | 安徽省光明粮油工业有限公司 | Machining device integrating protecting function and feeding and discharging function |
| CN106607300B (en) * | 2016-10-29 | 2018-12-11 | 安徽省光明粮油工业有限公司 | A kind of protection of collection is loaded and unloaded on integrated processing unit (plant) |
| CN109894320A (en) * | 2019-04-11 | 2019-06-18 | 昆山大阳机电设备制造有限公司 | A kind of vertical coating machine |
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