JPH11200011A - 真空蒸着装置 - Google Patents
真空蒸着装置Info
- Publication number
- JPH11200011A JPH11200011A JP1790798A JP1790798A JPH11200011A JP H11200011 A JPH11200011 A JP H11200011A JP 1790798 A JP1790798 A JP 1790798A JP 1790798 A JP1790798 A JP 1790798A JP H11200011 A JPH11200011 A JP H11200011A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- width direction
- vapor deposition
- vacuum
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 8
- 238000000151 deposition Methods 0.000 claims abstract description 17
- 230000008021 deposition Effects 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000010894 electron beam technology Methods 0.000 claims abstract description 5
- 238000001704 evaporation Methods 0.000 claims abstract description 5
- 230000008020 evaporation Effects 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 26
- 230000005291 magnetic effect Effects 0.000 abstract description 15
- 239000010408 film Substances 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 8
- 238000001816 cooling Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790798A JPH11200011A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1790798A JPH11200011A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11200011A true JPH11200011A (ja) | 1999-07-27 |
| JPH11200011A5 JPH11200011A5 (enExample) | 2005-08-18 |
Family
ID=11956828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1790798A Pending JPH11200011A (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11200011A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100484024B1 (ko) * | 2001-09-25 | 2005-04-20 | 세이코 엡슨 가부시키가이샤 | 마스크 및 그 제조 방법, 일렉트로루미네선스 장치 및 그제조 방법, 및 전자 기기 |
| JP2009209381A (ja) * | 2008-02-29 | 2009-09-17 | Fujifilm Corp | 成膜装置、ガスバリアフィルムおよびガスバリアフィルムの製造方法 |
| JP2013044015A (ja) * | 2011-08-24 | 2013-03-04 | Fujifilm Corp | 成膜装置 |
| JP2016065292A (ja) * | 2014-09-25 | 2016-04-28 | 株式会社アルバック | スパッタリング装置および透明導電膜の形成方法 |
-
1998
- 1998-01-13 JP JP1790798A patent/JPH11200011A/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100484024B1 (ko) * | 2001-09-25 | 2005-04-20 | 세이코 엡슨 가부시키가이샤 | 마스크 및 그 제조 방법, 일렉트로루미네선스 장치 및 그제조 방법, 및 전자 기기 |
| US6930021B2 (en) | 2001-09-25 | 2005-08-16 | Seiko Epson Corporation | Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument |
| JP2009209381A (ja) * | 2008-02-29 | 2009-09-17 | Fujifilm Corp | 成膜装置、ガスバリアフィルムおよびガスバリアフィルムの製造方法 |
| JP2013044015A (ja) * | 2011-08-24 | 2013-03-04 | Fujifilm Corp | 成膜装置 |
| JP2016065292A (ja) * | 2014-09-25 | 2016-04-28 | 株式会社アルバック | スパッタリング装置および透明導電膜の形成方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20041217 Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041217 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041217 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20041217 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050204 |
|
| RD04 | Notification of resignation of power of attorney |
Effective date: 20050225 Free format text: JAPANESE INTERMEDIATE CODE: A7424 |
|
| A977 | Report on retrieval |
Effective date: 20070724 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20070726 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070925 |
|
| A02 | Decision of refusal |
Effective date: 20071115 Free format text: JAPANESE INTERMEDIATE CODE: A02 |