JPH11176786A5 - - Google Patents

Info

Publication number
JPH11176786A5
JPH11176786A5 JP1997342425A JP34242597A JPH11176786A5 JP H11176786 A5 JPH11176786 A5 JP H11176786A5 JP 1997342425 A JP1997342425 A JP 1997342425A JP 34242597 A JP34242597 A JP 34242597A JP H11176786 A5 JPH11176786 A5 JP H11176786A5
Authority
JP
Japan
Prior art keywords
semiconductor substrate
cleaning
cleaning liquid
liquid outlet
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997342425A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11176786A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP34242597A priority Critical patent/JPH11176786A/ja
Priority claimed from JP34242597A external-priority patent/JPH11176786A/ja
Publication of JPH11176786A publication Critical patent/JPH11176786A/ja
Publication of JPH11176786A5 publication Critical patent/JPH11176786A5/ja
Pending legal-status Critical Current

Links

JP34242597A 1997-12-12 1997-12-12 半導体基板洗浄装置 Pending JPH11176786A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34242597A JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34242597A JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Publications (2)

Publication Number Publication Date
JPH11176786A JPH11176786A (ja) 1999-07-02
JPH11176786A5 true JPH11176786A5 (enExample) 2004-12-24

Family

ID=18353644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34242597A Pending JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Country Status (1)

Country Link
JP (1) JPH11176786A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007222755A (ja) * 2006-02-22 2007-09-06 Hoya Corp スピン洗浄装置及びスピン洗浄方法
JP2008147364A (ja) * 2006-12-08 2008-06-26 Toyota Motor Corp 半導体ウエハを洗浄する装置と方法
JP2014067864A (ja) * 2012-09-26 2014-04-17 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法
KR102616585B1 (ko) * 2022-04-01 2023-12-21 세메스 주식회사 기판처리장치 및 기판처리방법

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