JPH11176786A - 半導体基板洗浄装置 - Google Patents

半導体基板洗浄装置

Info

Publication number
JPH11176786A
JPH11176786A JP34242597A JP34242597A JPH11176786A JP H11176786 A JPH11176786 A JP H11176786A JP 34242597 A JP34242597 A JP 34242597A JP 34242597 A JP34242597 A JP 34242597A JP H11176786 A JPH11176786 A JP H11176786A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
cleaning
cleaning liquid
pure water
back surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34242597A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11176786A5 (enExample
Inventor
Tsutomu Aisaka
勉 逢坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP34242597A priority Critical patent/JPH11176786A/ja
Publication of JPH11176786A publication Critical patent/JPH11176786A/ja
Publication of JPH11176786A5 publication Critical patent/JPH11176786A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
JP34242597A 1997-12-12 1997-12-12 半導体基板洗浄装置 Pending JPH11176786A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34242597A JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34242597A JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Publications (2)

Publication Number Publication Date
JPH11176786A true JPH11176786A (ja) 1999-07-02
JPH11176786A5 JPH11176786A5 (enExample) 2004-12-24

Family

ID=18353644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34242597A Pending JPH11176786A (ja) 1997-12-12 1997-12-12 半導体基板洗浄装置

Country Status (1)

Country Link
JP (1) JPH11176786A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007222755A (ja) * 2006-02-22 2007-09-06 Hoya Corp スピン洗浄装置及びスピン洗浄方法
JP2008147364A (ja) * 2006-12-08 2008-06-26 Toyota Motor Corp 半導体ウエハを洗浄する装置と方法
WO2014050428A1 (ja) * 2012-09-26 2014-04-03 東京エレクトロン株式会社 基板洗浄装置及び基板洗浄方法
JP2023152673A (ja) * 2022-04-01 2023-10-17 セメス カンパニー，リミテッド 基板処理装置及び基板処理方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007222755A (ja) * 2006-02-22 2007-09-06 Hoya Corp スピン洗浄装置及びスピン洗浄方法
JP2008147364A (ja) * 2006-12-08 2008-06-26 Toyota Motor Corp 半導体ウエハを洗浄する装置と方法
WO2014050428A1 (ja) * 2012-09-26 2014-04-03 東京エレクトロン株式会社 基板洗浄装置及び基板洗浄方法
JP2023152673A (ja) * 2022-04-01 2023-10-17 セメス カンパニー，リミテッド 基板処理装置及び基板処理方法

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