TWI220393B - Ultrasonic cleaning module - Google Patents
Ultrasonic cleaning module Download PDFInfo
- Publication number
- TWI220393B TWI220393B TW92110104A TW92110104A TWI220393B TW I220393 B TWI220393 B TW I220393B TW 92110104 A TW92110104 A TW 92110104A TW 92110104 A TW92110104 A TW 92110104A TW I220393 B TWI220393 B TW I220393B
- Authority
- TW
- Taiwan
- Prior art keywords
- electronic
- electronic packaging
- substrate
- components
- packaging components
- Prior art date
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
1220393 五、發明說明(1) 【發明所屬之技術領域] 本發明係有關於一種清洗已分割的半導體或電子封裝 元件之清洗裝置與方法,特別是有關於一種使用清洗液體 噴灑在已分割的半導體或電子封裝元件之清洗裝置與方法 〇 【先前技術】 在大部份半導體的生產技術中,一些個別的電子封裝 元件(electronic packages ),例如半導體近似晶片尺 寸封裝元件(chip scale package ;CSP)係為形成在單 一基材(substrate )上。上述之個別的電子封装元件在 使用前必須進行切割分離。一分割基材的方法是應用一晶 粒切割來切割上述的基材,其間上述的基材固定在切割夹 盤上。典型的每一基材係由一積體電路裝置陣列(an array of integrated circuit devices)或多陣列部八 (sections of multiple arrays)所組成,可稱為麥板 (panels )。這些嵌板可在基材上以等間距的方式安^置、約 3到5組。在切割製程後所得到的電子封裝元件仍然須要 接受進一步的清潔、沖洗與乾燥的製程。上述之製^ — 保持已切割的電子封裝元件之相關的位置與定位, =4 須不使電子封裝元件發生傾斜與部分重疊的現象,以 在後續組裝製程中不發生處理上的困難。 於 常用來清洗與乾燥已切割基材的方法之一是藉由 加壓水噴嘴與吹氣農置來完成,其中已切割的基^是 , 在一固定盤上並且固定盤的表面為具有多孔性的材=。气1220393 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a cleaning device and method for cleaning divided semiconductors or electronic packaging components, and particularly to a method for spraying divided semiconductors with a cleaning liquid. Or electronic packaging components cleaning device and method. [Previous technology] In most semiconductor production technologies, some individual electronic packages, such as semiconductor chip scale package (CSP), are To form on a single substrate. The individual electronic package components mentioned above must be cut and separated before use. A method of dividing a substrate is to cut the above-mentioned substrate using a grain cutting, during which the above-mentioned substrate is fixed on a cutting chuck. Each substrate is typically composed of an array of integrated circuit devices or sections of multiple arrays, which can be called panels. These panels can be placed on the substrate at equal intervals, about 3 to 5 groups. The electronic packaging components obtained after the dicing process still need to undergo further cleaning, rinsing and drying processes. The above-mentioned system ^ — Maintain the relevant position and positioning of the cut electronic packaging components. = 4 The electronic packaging components must not be tilted and partially overlapped, so as to avoid processing difficulties in the subsequent assembly process. One of the commonly used methods for cleaning and drying the cut substrate is to complete it with a pressurized water nozzle and an air blower. The cut substrate is on a fixed plate and the surface of the fixed plate is porous. Sexual material =. gas
第6頁 1220393Page 6 1220393
五、發明說明(2) 洗喷嘴之清 將會造成在 設備的電路 基材在一加 需要複雜的 槽,其中已 並且係浸泡 波槽是極為 、較長的乾 理上的困難 適用於清洗 心清洗。一 器上。上述 切割的基材 進行乾燥。 基材的凹槽 切割的基材 termarks ) &在濕度控 材之乾燥時 響。此外, 進行沖洗時 製造。另一 係為固定、 清洗液中。 一般會導致 具有超音波 傳統之超音 電子裝置。 材係為藉由 後進行快速 喷嘴進行沖 水與碎屑將 ’由於搬運 洗效果將被 成在已切割 而,加壓沖 難,因此, ,並且將對 係為了固定 的困難,其 用一超音波 狀結構上, 上述之超音 的製程時間 污染物在處 頻率也許不 係為應用離 定在一搬運 且上述之已 由旋轉運動 之已切割的 引力,在已 ’水痕(w a 面。 洗會造成諸 已切割的基 系統造成影 壓空間内來 裝置設計與 切割的基材 在一超音波 複雜的並且 燥時間、且 。另外,如 打線接合的 已切割的基 之搬運器其 藉由加壓水 無論如何, 拋出,但是 的下方的清 與污染物形 制之類的困 間上的增加 上述之方式 之定位方面 方式係為使 覆蓋在一巢 然而’設定 須耗費較長 清洗液内之 波槽的驅動 第三種方式 真空裝置固 地旋轉,並 洗,然後藉 透過在上述 器之真空吸 受限。最後 的基材的表 準的基材洗淨與縮短循 生改善製程的需求。 因此’為了達成朝向次微米水 根製造時間的完全清洗製程,故產 【發明内容】 鑒於上述之發明背寻Φ 杜,士文 、 為了 ’月洗複數個電子封矣分 件,本發明試圖提供一改進 吸双1U电丁对裝兀 又現過的模組與方法,藉以排除先V. Description of the invention (2) The cleaning of the nozzle will cause a complex groove in the circuit substrate of the device, and the immersion wave groove is extremely long and difficult to dry. It is suitable for cleaning the heart. Cleaning. On the device. The cut substrate is dried. Grooves of the substrate Cut substrates (termarks) & when the humidity control material is dry. In addition, it is manufactured during flushing. The other is fixed and cleaned. This typically results in a traditional ultrasonic electronic device with an ultrasonic wave. The material is flushed and chipped by fast nozzles later. Because of the effect of conveying and washing, it will be cut when it is pressed, and it will be difficult to press. Therefore, it will be difficult to fix the system. On the sonic structure, the frequency of the above-mentioned superconducting process pollutants may not be the application of the gravitational force that has been removed from a handle and the above-mentioned already rotated motion, on the 'water mark (wa surface. Wash. It will cause the cut base system to cause the design and cutting of the substrate in the shadow pressure space. It is complex and time consuming. Also, the carrier of the cut base such as wire bonding can be added by adding The pressurized water is thrown out anyway, but the clearance between the bottom of the clear and the formation of pollutants is increased. The positioning method of the above method is to make it covered in a nest. However, the setting needs to consume a long time in the cleaning solution. The third way of driving the wave groove is that the vacuum device rotates solidly, and is washed, and then the vacuum suction is restricted by passing through the above device. The final substrate is the standard substrate washing And the need to shorten the process of improving the process. Therefore, 'To achieve a complete cleaning process towards the production time of sub-micron water roots, [Product Summary] In view of the above invention, Φ Du, Shiwen, in order to' monthly wash multiple electrons Sealing the parts, the present invention attempts to provide an improved module and method for attracting dual 1U electric modules, which eliminates the
1220393 五、發明說明(3) 前技術的問題。 淨模:據一觀點,本發明係提供-種超音波洗 ίί盤包I 先淨模組包含:-切割夹盤,上述之切 為-切割裝置,藉】::::2其上’係為使切割夾盤成 數個電子裝置;_!震動$ ^ 表面之基材分割個別的複 已切割基材之已八喷、位於切割失盤之上方,並且 藉此,震動元件也在切割夹盤之上, 。此外,-趙立、、士朝電子封裝元件射出具能量的液體 透過震動哭噴u生器與震動器喷嘴相互組合,其令’ 量。的液體流將藉由超音波產生器產生能 複數:第二觀點,*發明係提供-種從具有 與清洗上述電二”,基材形成複數個電子封裝元件 個電子封裝元俥夕ΐ70件之方法。包含:放置一具有複數 材在上述㈣夾盤::在:割夾盤之表面上;®定上述基 電子封裝元件,1門上2 土述基材成為個別的複數個 裝元件俜固定I if述基材與上述個別的複數個電子封 :係固疋在上述切割夾盤上; 的上述複數個電子陣= 出之:述液ΐ器精以供應超音波能量給透過震動器喷嘴流 多的差Ϊ照=實施例中的描述,本發明可能有許 内加以理解ί要在其附加的權利要求項之範圍 示了上述详細的描述外,本發明還可以廣泛 12203931220393 V. Description of the invention (3) Problems with the previous technology. Net mold: According to a viewpoint, the present invention provides a kind of ultrasonic washing package I. The first net module includes:-cutting chuck, the above-mentioned cutting is-cutting device, borrow] :::: 2 above it In order to make the cutting chuck into several electronic devices; _! Vibrate $ ^ The surface of the substrate is divided into individual sprayed substrates that have been sprayed eight times above the cutting disc, and by this, the vibration element is also on the cutting chuck Above. In addition, -Zhao Li, and Shi Chao ejected energetic liquid from electronic packaging components through vibration, crying, spraying, and vibrator nozzles, which combined with each other. The liquid flow will be generated by the ultrasonic generator with a plurality of energy: the second aspect, * invention is to provide-a kind of electronic package with the above-mentioned electric two ", the substrate forms a plurality of electronic packaging elements, electronic packaging elements, 70 pieces The method includes: placing a plurality of materials on the chuck: on: the surface of the cutting chuck; ® fixing the above-mentioned electronic packaging component, 1 on the door 2 and the earth substrate as a plurality of individual mounting components 俜 fixed I if the substrate and the above-mentioned individual plurality of electronic seals are fastened to the above-mentioned cutting chuck; the above-mentioned plurality of electronic arrays = the output is as follows: the liquid container is used to supply ultrasonic energy to flow through the nozzle of the vibrator Many differential photos = descriptions in the embodiments, the present invention may be understood to a certain extent. In addition to the above detailed description, which is shown in the scope of the appended claims, the present invention can also be widely 1220393
地在其他的實施例中施行。 而已,並非用以限定本發明 離本發明所揭示之精神下所 包含在下述申請專利範圍内 【實施方式】 上述僅為本發明之較佳實施例 之申請專利範圍;凡丼它未脫 完成的等效改變或修飾,均應 第一圖為一用以固定基材之真空切割夾盤13的平面圖 上述之真空切割夾盤1 3包含橫與縱之組成圖案的切割凹 槽22,其中,㈣凹槽22允許一切割丨(未顯示於圖上) 切割一具有複數個電子封裂元件(electr〇nic packages )之基材。上述之切割凹槽22的安排是依據在此未分割基 材2 8之上之電子封裝元件的安排來設計。上述之真空切割 夾盤13之表面具有複數個真空孔洞27。其中,上述之複數 個真空孔洞27係位於複數個電子封裝元件下方,以便於在 分割製程之後固定個別封裝元件丨在真空切割夾盤丨3之上 第二圖為一其上包含三個電子封裝元件之未分割基材 28的真空切割夾盤13之平面圖。 、第三圖所示為-先前技藝的清潔設備之平面圖。上述 之清潔設備係I用-加壓 < 水噴冑,藉卩清潔肖風乾一農 有複數個電子封裝元件的已切割基⑷。上述之已切割基 材1係固定在-疊套托盤2之上,並且覆蓋著多孔材料3。 其中’上潤濕喷嘴6與下潤濕喷嘴7可喷灑加壓水在已 基材1之上,其後,上空氣噴嘴4與下空氣喷嘴5可吹乾此 基材。無論如~,此吹乾的製程可產生水氣,且上述之製Ground is implemented in other embodiments. However, it is not intended to limit the scope of the present invention covered by the present invention within the spirit disclosed by the present invention. [Embodiment] The above is only the scope of patent application of the preferred embodiment of the present invention; For equivalent changes or modifications, the first figure should be a plan view of a vacuum cutting chuck 13 for fixing the substrate. The vacuum cutting chuck 13 described above includes cutting grooves 22 in a horizontal and vertical pattern. The groove 22 allows a cutting (not shown in the figure) to cut a substrate having a plurality of electronic packaging components. The arrangement of the cutting grooves 22 described above is designed based on the arrangement of the electronic packaging components on the undivided substrate 28. The vacuum cutting chuck 13 has a plurality of vacuum holes 27 on its surface. Among them, the above-mentioned plurality of vacuum holes 27 are located under the plurality of electronic packaging components, in order to fix the individual packaging components after the splitting process 丨 on the vacuum cutting chuck 丨 3 The second picture is a three-electronic package A plan view of the vacuum-cut chuck 13 of the element's undivided substrate 28. The third figure shows the plan view of the prior art cleaning equipment. The above-mentioned cleaning equipment is I-pressurized < water spraying, which is used to clean Xiao Fenggan, a farmer, which has a plurality of electronic packaging components, which have been cut. The above-mentioned cut base material 1 is fixed on a nested tray 2 and is covered with a porous material 3. Among them, the upper wetting nozzle 6 and the lower wetting nozzle 7 may spray pressurized water on the substrate 1, and thereafter, the upper air nozzle 4 and the lower air nozzle 5 may blow dry the substrate. Regardless of ~, this drying process can produce water vapor, and the above-mentioned process
第9頁 1220393 五、發明說明(5) ---- 程將會增加環境中的濕度並影響已切割基材丨的乾燥時間 。上述之疊套托盤2具有一疊套的設計,其係為使用一複 數個分隔壁,藉以固定已切割基材丨。上述之複數個分隔 壁可以固定已切割基材1,但是可能打斷水的喷灑。已切 割基材1在複數個分隔壁部份地覆蓋後,將導致洗 佳的結果。 第四圖係一先前技藝的清潔設備平面圖。上述之清絮 設備係將一已切割基材1浸泡於一超音波清洗槽11之中/、 ΪΓ超音波清洗槽11内包含清洗液。已切割基材1係固 孫一搬迗器9之上,並且由一上蓋8覆蓋著。上述之搬送 係位於一超音波變換器1〇之上,上述之各部分元件均 ,丨、2滿清洗液12的超音波清洗槽"之内。由於有為數不 二:处理程序將產生碎屑或污染微塵在超音波清洗槽"之 :以’維持良好乾淨之去離子水的循環是必需要求的 ^此類的槽式浸泡不具效率並且須要花費大量時間來進 二、=作與維修保養。上述之技術亦不適合大部份使用之超 二和驅動頻率’其中,上述之超音波頻率大約在4〇 kHz , 因2 f頻率與在電子裴置打線接合的共振頻率相接近, 影響可能對在已切割基材1上之打線接合的電子裝置產生 。如第五圖所示,係為一先前技藝的清潔設備等尺寸圖 真i述之清潔設備係使用離心清洗方式來進行清洗固定在 於二爽盤上的已切割基材1。上述之已切割基材1係為固定 、—搬運器29之上,其中,上述之搬運器29依序固定在一Page 9 1220393 V. Description of the invention (5) ---- The process will increase the humidity in the environment and affect the drying time of the cut substrate. The stack tray 2 described above has a stack design, which uses a plurality of partition walls to fix the cut substrates. The plurality of partition walls described above can hold the cut substrate 1 but may interrupt the spraying of water. After the cut substrate 1 is partially covered by a plurality of partition walls, it will lead to good results. The fourth figure is a plan view of a cleaning device of the prior art. The above-mentioned flocculation cleaning device is a method in which a cut substrate 1 is immersed in an ultrasonic cleaning tank 11. The ultrasonic cleaning tank 11 contains a cleaning liquid. The cut base material 1 is fixed on the sun-lifter 9 and is covered by an upper cover 8. The above-mentioned conveying system is located on an ultrasonic transducer 10, and each of the above-mentioned components is within an ultrasonic cleaning tank " filled with cleaning solution 12. Because there are many: the processing procedure will generate debris or contaminated dust in the ultrasonic cleaning tank " of it: to maintain a good and clean deionized water circulation is required ^ This type of tank immersion is not efficient and requires Spend a lot of time to do two, = work and maintenance. The above-mentioned technology is not suitable for most of the super 2 and driving frequencies. Among them, the above-mentioned ultrasonic frequency is about 40 kHz, because the 2 f frequency is close to the resonance frequency of the electronic wire bonding, the impact may be on A wire-bonded electronic device on the cut substrate 1 is produced. As shown in the fifth figure, it is a size drawing of a cleaning device of the prior art. The cleaning device described in the first embodiment uses a centrifugal cleaning method to clean the cut substrate 1 fixed on the second disk. The above-mentioned cut substrate 1 is fixed on a carrier 29, wherein the above-mentioned carrier 29 is sequentially fixed on a
五、發明說明(6) 離心平台30之上。加壓水噴嘴6可產生水喷射,藉以沖洗 固定在搬運器29上已切割基材!,其中,上述之已切割基 材1係以真空吸附的方式固定在在搬運器2 9上。其後,上 述之離心平台30將依一確定的方向31進行旋轉,藉以乾燥 已切割基材1。無論如何’上述之沖洗與旋轉步驟,將 已切割基材1造成污染與水痕(watermarks)。藉由真* f定的已切割基材1依—確定的方向31進行果 提供一驅動力,係為一藉以透過在已切割基材i上之K 碎屑四散開的方式’其中’上述之方式將導致表 “根據本發明的一較佳實施例,如第六圖所示,係 精以清洗已切割基材i之超音波洗淨模組的概,’、、 七圖所示係為一藉以清洗已切割基材;: ^八: 材1包含一複數個電子封裝元件 拉ί二〆具有一複數個電子封裝元件之基材28、1前後4 藉由切副夾盤13來固定基材28、1。上述之切到类盤 包:d使得切割夾盤13可成為,裝置 表面的基㈣分割出個:數 夹盤"之表面可以是由具彈性的材料置二,2 ,並且辦力:其:;疗 上述切割夾盤13之表面 固定在切割夾盤13的效果。此外,辞由 電、于装70件與切割夾盤1 3表面的摩捧運動, ^ 的材料可增加電子封裝元件的摩擦==述 1220393 五、發明說明(7) 封裝元件的摩擦清洗係為當已切割基 果走時’…基材1沿著切割夾上:以 在從基材上分割上述複數個電子封裝元件 割基材1的個別電子封裝元件可藉由真空裝置的真灸空吸引 而停留固定在切割夾盤13。上述真空 、 二上的真空孔穴’使其能夠在從基材⑼上切割電 im:,可以固定具有電子封裝元件的整個基材 。其後,在基材28分割成為個別的電子封裝元件之 可以將個別的封裝元件固定在切割夾盤丨3之上。 一震動器噴嘴1 4係位於切割夾盤1 3之上方,並且在切 割夾盤13的已切割基材!之已分割的電子封裝元件之上, ,此、,震動器噴嘴14可以朝上述的電子封裝元件射出具能 量的液體。一超音波產生器17可與震動器噴嘴14相互組合 ,其中,透過震動器喷嘴14流出的液體流將藉由超音波】 生器17產生能量。上述之超音波產生器17在一超音波頻率 下運作,其超音波頻率可以在液體流通過喷嘴時 流能量。巧之液體可以是去離子水 係為開啟狀態時,去離子水24可通過震動器喷嘴丨4 (例如 the W-357P-50 pulsator nozzle from Honda Electronics Co Ltd),其中,當上述之震動器喷嘴“對 已切割基材1喷射去離子水時,上述之震動器喷嘴可在 切割夾盤1 3上方進行前後的移動。 上述之震動器喷嘴14係與垂直方向傾斜形成一個角度 第12頁 1220393 五、發明說明(8) ,較佳的角度係小於30度,並且震動器喷嘴14在已切割基 材1上方的較佳距離16係5到20公釐。一流量感應器19盥& 位流量傳輸器1 8可作為液體流量偵測之用。上述之液體流 量的較佳範圍係為每分鐘3· 5公升,或更高。因此,流量& 感應器1 9與數位流量傳輸器18的較佳設計係為在給起始 信號藉以啟動超音波產生器丨7之前即偵測到每分鐘3· 5公 升的最小流量。上述之去離子水24可透過具有超音波產生 器17的震動器喷嘴14流出,其中,超音波頻率約在數百千 赫。較佳的超音波頻率在大約40〇千赫,其為遠離在電子 裝置打線接合的典型共鳴頻率。超音波能量將傳送至在薄 片狀去離子水24的水分子中,其係為從震動器噴嘴14喷出 ,,且具有超音波能量。當已切割基材丨被帶來喷射中的 路,下方時,將產生一藉以移除次微米至微米等級之微塵 的同水準α洗,並且以此方式移除在基板切割製程所形成 的微塵。 在清洗製程之後,關閉去離子水的供應。一氣體乾燥 °可以是氣刀(air knives )或氣體喷嘴(air nozzles )。氣體乾燥器15在切割夾盤Η與已切割基材!上 仃前後的移t ’並且朝已切割基材i喷射氣體,藉以 將殘餘在切割基材丨之表面的水吹離。 > 顯然地,依照上面實施例中的描述,本發明可能有許 的修正與差異。因此需要在其附加的權利要求項之範圍 加以理解,除了上述詳細的描述外,本發明還可以廣泛 土在其他的實施例中施行。上述僅為本發明之較佳實施例 1220393 五、發明說明(9) 而已,並非用以限定本發明之申請專利範圍;凡其它未脫 離本發明所揭示之精神下所完成的等效改變或修飾,均應 包含在下述申請專利範圍内。V. Description of the invention (6) Above the centrifugal platform 30. The pressurized water nozzle 6 generates a water jet, thereby rinsing the cut substrate fixed on the carrier 29! Among them, the above-mentioned cut substrate 1 is fixed on the carrier 29 in a vacuum adsorption manner. Thereafter, the above-mentioned centrifugal platform 30 will be rotated in a determined direction 31 to dry the cut substrate 1. In any case, the above-mentioned rinsing and rotating steps will cause the cut substrate 1 to cause contamination and watermarks. The driving force provided by the cut substrate 1 determined by the true * f according to the determined direction 31 provides a driving force, which is a method in which the K debris on the cut substrate i spreads out, among which is the method described above. This will result in the table "According to a preferred embodiment of the present invention, as shown in the sixth figure, the outline of the ultrasonic cleaning module for cleaning the cut substrate i is shown in the figure. The cleaned substrate is cleaned by: ^ Eight: Material 1 includes a plurality of electronic packaging components, two substrates 28, 1 and 4 with a plurality of electronic packaging components are fixed by cutting the auxiliary chuck 13 to fix the substrate 28, 1. The above-mentioned cut-to-disc package: d enables the cutting chuck 13 to become, the base of the device surface is divided into a number: the surface of the number chuck can be set by a flexible material, 2, and Working force: It: The effect of fixing the surface of the cutting chuck 13 on the cutting chuck 13. In addition, the electric movement of 70 pieces and the surface of the cutting chuck 13 can be used to increase the material of ^ Friction of electronic packaging components == 1220393 V. Description of the invention (7) The friction cleaning system of packaging components is When the cut fruit has gone, '... the substrate 1 is along the cutting clip: the individual electronic packaging components of the substrate 1 are cut by dividing the plurality of electronic packaging components from the substrate, and the individual electronic packaging components can be attracted by the true moxibustion of the vacuum device While staying fixed on the cutting chuck 13. The above-mentioned vacuum, the vacuum holes on the second ′ make it possible to cut the electric im: from the substrate ,, which can fix the entire substrate with electronic packaging components. Thereafter, the substrate 28 Divided into individual electronic packaging components, the individual packaging components can be fixed on the cutting chuck 3. A vibrator nozzle 14 is located above the cutting chuck 13 and is on the cut base of the cutting chuck 13. On the divided electronic packaging element, the vibrator nozzle 14 can emit a liquid with energy toward the above-mentioned electronic packaging element. An ultrasonic generator 17 and the vibrator nozzle 14 can be combined with each other, wherein, The liquid flow flowing through the vibrator nozzle 14 will generate energy through the ultrasonic generator 17. The above-mentioned ultrasonic generator 17 operates at an ultrasonic frequency, and its ultrasonic frequency can pass through the liquid flow Flow energy at the mouth. When the deionized water is in the open state, the deionized water 24 can pass through the vibrator nozzle (for example, the W-357P-50 pulsator nozzle from Honda Electronics Co Ltd). When the shaker nozzle "sprays deionized water on the cut substrate 1, the above-mentioned shaker nozzle can be moved back and forth above the cutting chuck 13". The above-mentioned vibrator nozzle 14 is inclined to form an angle with the vertical direction. Page 12 1220393 V. Description of the invention (8), the preferred angle is less than 30 degrees, and the vibrator nozzle 14 is preferably above the cut substrate 1. Distance 16 series is 5 to 20 mm. A flow sensor 19 & bit flow transmitter 18 can be used for liquid flow detection. The preferable range of the above-mentioned liquid flow rate is 3.5 liters per minute or more. Therefore, the preferred design of the flow & sensor 19 and the digital flow transmitter 18 is to detect a minimum flow of 3.5 litres per minute before the start signal is used to activate the ultrasonic generator. The above-mentioned deionized water 24 can flow out through the vibrator nozzle 14 having an ultrasonic generator 17, wherein the ultrasonic frequency is about several hundred kHz. A preferred ultrasonic frequency is about 40 kHz, which is a typical resonance frequency away from wire bonding in electronic devices. The ultrasonic energy will be transmitted to the water molecules in the thin sheet of deionized water 24, which is ejected from the vibrator nozzle 14 and has ultrasonic energy. When the cut substrate 丨 is brought to the bottom of the spray path, a par α wash to remove sub-micron to micron-level particles will be generated, and in this way, the particles formed during the substrate cutting process will be removed. . After the cleaning process, the supply of deionized water was turned off. A gas drying ° can be air knives or air nozzles. The gas dryer 15 is on the cutting chuck Η with the cut substrate! The upper and lower sides are shifted t 'and a gas is sprayed toward the cut substrate i, thereby blowing off water remaining on the surface of the cut substrate 丨. > Obviously, according to the description in the above embodiment, the present invention may have some modifications and differences. Therefore, it needs to be understood within the scope of the appended claims. In addition to the above detailed description, the present invention can be widely implemented in other embodiments. The above is only the preferred embodiment of the present invention. 1220393 V. Description of the invention (9) It is not intended to limit the scope of patent application of the present invention; any other equivalent changes or modifications made without departing from the spirit disclosed by the present invention , Should be included in the scope of patent application below.
第14頁 1220393 圖式簡單說明 【圖式的簡單說明】 第一圖係一用以固定基材之真空切割夾盤的平面圖; 第二圖係一包含三個電子封裝元件之未分割基材於其 上的真空切割夾盤之平面圖; 第三圖係一先前技藝的清潔設備之平面圖,上述之清 潔設備係使用加壓之水喷嘴,藉以清潔與風乾一複數個電 子陣列的已切·割基材;、Page 14 1220393 Brief description of the drawings [Simplified description of the drawings] The first diagram is a plan view of a vacuum cutting chuck for fixing a substrate; the second diagram is an undivided substrate containing three electronic packaging components on The plan view of the vacuum cutting chuck thereon. The third figure is a plan view of a cleaning device of the prior art. The above cleaning device uses a pressurized water nozzle to clean and air dry the cut and cut bases of a plurality of electronic arrays. material;,
第四圖係一先前技藝的清潔設備之平面圖,上述之清 潔設備係將一已切割基材浸泡於一超音波清洗槽之中,其 中,超音波清洗槽内包含清洗液; 第五圖係一先前技藝的清潔設備之等尺寸圖,上述之 清潔設備係使用離心清洗方式來進行清洗固定在真空夾盤 上的已切割基材; 第六圖係一用以清洗已切割基材之超音波洗淨模組的 概要圖解;及 第七圖係一用以清洗已切割基材之超音波洗淨模組的 應用概要圖解。 【主要部分之代表符號】The fourth figure is a plan view of a cleaning device of the prior art. The above-mentioned cleaning device is a soaked substrate in an ultrasonic cleaning tank, wherein the ultrasonic cleaning tank contains a cleaning liquid; the fifth image is a Isometric drawing of the cleaning equipment of the prior art. The above cleaning equipment uses a centrifugal cleaning method to clean the cut substrate fixed on the vacuum chuck; the sixth image is an ultrasonic washing for cleaning the cut substrate The schematic diagram of the cleaning module; and the seventh diagram is an application schematic diagram of the ultrasonic cleaning module for cleaning the cut substrate. [Representative symbols for main parts]
1 已切割基材 2 疊套托盤 ^ 3 多孔材料 4 上空氣喷嘴 5 下空氣噴嘴 6 上潤濕喷嘴1 Cut substrate 2 Stacked pallets ^ 3 Porous material 4 Upper air nozzle 5 Lower air nozzle 6 Upper wetting nozzle
第15頁 1220393 圖式簡單說明 7 下 潤 濕 喷嘴 8 上 蓋 9 搬 送 器 10 超 音 波 變 換 器 11 超 音 波 清 洗 槽 12 清 洗 液 13 切 割 夾 盤 14 震 動 器 喷 嘴 15 氣 體 乾 燥 器 16 距 離 17 超 音 波 產 生 器 18 數 位 流 量 傳 輸器 19 流 量 感 應 器 20 去 離 子 水 閥 21 控 制 器 (Controller) 22 切 割 凹 槽 24 去 離 子 水 25 去 離 子 水 的 流向 27 真 空 孔 洞 28 基 材 29 搬 運 器 30 離 心 平 台 31 確 定 的 方 向Page 15 1220393 Brief description of the drawing 7 Lower wetting nozzle 8 Upper cover 9 Transporter 10 Ultrasonic transducer 11 Ultrasonic cleaning tank 12 Cleaning liquid 13 Cutting chuck 14 Vibrator nozzle 15 Gas dryer 16 Distance 17 Ultrasonic generator 18 Digital flow transmitter 19 Flow sensor 20 Deionized water valve 21 Controller 22 Cutting groove 24 Deionized water 25 Direction of deionized water 27 Vacuum hole 28 Substrate 29 Carrier 30 Centrifugal platform 31 Determined direction
第16頁Page 16
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37701802P | 2002-04-30 | 2002-04-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200306235A TW200306235A (en) | 2003-11-16 |
TWI220393B true TWI220393B (en) | 2004-08-21 |
Family
ID=29420338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92110104A TWI220393B (en) | 2002-04-30 | 2003-04-30 | Ultrasonic cleaning module |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN1278789C (en) |
TW (1) | TWI220393B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI492794B (en) * | 2009-09-08 | 2015-07-21 | Tokyo Electron Ltd | An ultrasonic cleaning apparatus, an ultrasonic cleaning method, and a recording medium for recording a computer program for carrying out the ultrasonic cleaning method |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4442383B2 (en) * | 2004-10-12 | 2010-03-31 | 国立大学法人 東京大学 | Ultrasonic cleaning equipment |
US8327861B2 (en) * | 2006-12-19 | 2012-12-11 | Lam Research Corporation | Megasonic precision cleaning of semiconductor process equipment components and parts |
CN102664157B (en) * | 2012-06-04 | 2014-07-30 | 扬州扬杰电子科技股份有限公司 | Vibration flushing device for diode after acid treatment |
DE102013100473A1 (en) * | 2013-01-17 | 2014-07-17 | Seho Systemtechnik Gmbh | Method and device for cleaning a soldering nozzle |
JP2017139343A (en) * | 2016-02-04 | 2017-08-10 | 株式会社ディスコ | Processing method for package substrate |
CN110592656B8 (en) * | 2019-09-17 | 2021-06-11 | 义乌市择木工业产品设计有限公司 | Rust removing device for hardware |
-
2003
- 2003-04-30 CN CN 03124335 patent/CN1278789C/en not_active Expired - Lifetime
- 2003-04-30 TW TW92110104A patent/TWI220393B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI492794B (en) * | 2009-09-08 | 2015-07-21 | Tokyo Electron Ltd | An ultrasonic cleaning apparatus, an ultrasonic cleaning method, and a recording medium for recording a computer program for carrying out the ultrasonic cleaning method |
Also Published As
Publication number | Publication date |
---|---|
CN1278789C (en) | 2006-10-11 |
TW200306235A (en) | 2003-11-16 |
CN1456395A (en) | 2003-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW550630B (en) | Method and apparatus for wet processing wafers | |
US7819985B2 (en) | Method and apparatus for wafer cleaning | |
WO2003001576A2 (en) | Assisted rinsing in a single wafer cleaning process | |
US10090189B2 (en) | Substrate cleaning apparatus comprising a second jet nozzle surrounding a first jet nozzle | |
JPH10113627A (en) | Ultrasonic washer and ultrasonic washing method | |
JP2002280343A (en) | Cleaning process apparatus and cutting work apparatus | |
TWI220393B (en) | Ultrasonic cleaning module | |
JP2011077144A (en) | Substrate processing apparatus and method of processing substrate | |
US6949146B2 (en) | Ultrasonic cleaning module for singulated electronic packages | |
JP6940281B2 (en) | Substrate processing equipment and substrate processing method | |
JP2930583B1 (en) | Spin wafer single wafer processing equipment | |
JPH02250324A (en) | Manufacture of semiconductor device and cleaning apparatus used therefor | |
JP2015099852A (en) | Substrate cleaning device and substrate processing device | |
JP2018046259A (en) | Substrate processing method, substrate processing device, and recording medium | |
JP2003163195A (en) | Substrate treatment unit | |
JPS61181134A (en) | Cleansing apparatus | |
JPH08290136A (en) | Substrate washing method and device therefor | |
JPH0786145A (en) | Rotary substrate treating equipment | |
JPH03258381A (en) | Ultrasonic cleaning machine | |
JP2006140201A (en) | Substrate cleaning apparatus | |
JPH07230979A (en) | Method and device for drying | |
JPS6245126A (en) | Washer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |