JPH1116989A5 - - Google Patents

Info

Publication number
JPH1116989A5
JPH1116989A5 JP1998166528A JP16652898A JPH1116989A5 JP H1116989 A5 JPH1116989 A5 JP H1116989A5 JP 1998166528 A JP1998166528 A JP 1998166528A JP 16652898 A JP16652898 A JP 16652898A JP H1116989 A5 JPH1116989 A5 JP H1116989A5
Authority
JP
Japan
Prior art keywords
reactor
magazine
detection device
optical detection
photoelectric barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998166528A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1116989A (ja
Filing date
Publication date
Priority claimed from DE19725527A external-priority patent/DE19725527A1/de
Application filed filed Critical
Publication of JPH1116989A publication Critical patent/JPH1116989A/ja
Publication of JPH1116989A5 publication Critical patent/JPH1116989A5/ja
Pending legal-status Critical Current

Links

JP10166528A 1997-06-17 1998-06-15 反応器 Pending JPH1116989A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19725527:2 1997-06-17
DE19725527A DE19725527A1 (de) 1997-06-17 1997-06-17 Reaktor zur Verarbeitung von Wafern mit einer Schutzvorrichtung

Publications (2)

Publication Number Publication Date
JPH1116989A JPH1116989A (ja) 1999-01-22
JPH1116989A5 true JPH1116989A5 (cg-RX-API-DMAC7.html) 2005-10-20

Family

ID=7832699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10166528A Pending JPH1116989A (ja) 1997-06-17 1998-06-15 反応器

Country Status (5)

Country Link
US (1) US6385503B2 (cg-RX-API-DMAC7.html)
EP (1) EP0886302A3 (cg-RX-API-DMAC7.html)
JP (1) JPH1116989A (cg-RX-API-DMAC7.html)
DE (1) DE19725527A1 (cg-RX-API-DMAC7.html)
TW (1) TW396493B (cg-RX-API-DMAC7.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001127044A (ja) * 1999-10-29 2001-05-11 Hitachi Ltd 真空処理装置および真空処理システム
US6662070B1 (en) * 2000-03-08 2003-12-09 Advanced Micro Devices, Inc. Wafer rotation randomization in cluster tool processing
DE10103253A1 (de) * 2001-01-25 2002-08-01 Leica Microsystems Verfahren und Anordnung zum Transportieren und Inspizieren von Halbleitersubstraten
DE10123062A1 (de) * 2001-05-11 2002-11-21 Steag Hamatech Ag Vorrichtung und Verfahren zum Bewegen von Substraten mit Bewegungskopplung
JP3832294B2 (ja) * 2001-08-31 2006-10-11 株式会社ダイフク 荷保管設備
DE10239311B4 (de) * 2002-08-27 2004-08-26 Infineon Technologies Ag Justagehorde und Verfahren zur Justierung einer Hubeinrichtung in einer Bestückungseinheit für Waferhorden
US6852644B2 (en) * 2002-11-25 2005-02-08 The Boc Group, Inc. Atmospheric robot handling equipment
DE102006015089A1 (de) * 2006-03-31 2007-10-11 Advanced Micro Devices, Inc., Sunnyvale System und Verfahren zur Scheibenhandhabung in Halbleiterprozessanlagen
CN102315085B (zh) * 2010-06-30 2013-12-18 中芯国际集成电路制造(北京)有限公司 一种等离子体刻蚀机反应腔均匀环倾斜警报装置
US10777438B2 (en) 2013-10-18 2020-09-15 Brooks Automation, Inc. Processing apparatus

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0611069B2 (ja) * 1985-11-05 1994-02-09 キヤノン株式会社 ウエハ整列装置
US4705951A (en) * 1986-04-17 1987-11-10 Varian Associates, Inc. Wafer processing system
US5882165A (en) * 1986-12-19 1999-03-16 Applied Materials, Inc. Multiple chamber integrated process system
US4819167A (en) * 1987-04-20 1989-04-04 Applied Materials, Inc. System and method for detecting the center of an integrated circuit wafer
JPH0743245B2 (ja) * 1987-07-03 1995-05-15 キヤノン株式会社 アライメント装置
JPH0410639A (ja) * 1990-04-27 1992-01-14 Tokyo Electron Ltd 基板処理装置
JPH0475362A (ja) * 1990-07-18 1992-03-10 Canon Inc ウエハ搬送装置
JP2868645B2 (ja) * 1991-04-19 1999-03-10 東京エレクトロン株式会社 ウエハ搬送装置、ウエハの傾き検出方法、およびウエハの検出方法
DE69329269T2 (de) * 1992-11-12 2000-12-28 Applied Materials, Inc. System und Verfahren für automatische Positionierung eines Substrats in einem Prozessraum
US5539323A (en) * 1993-05-07 1996-07-23 Brooks Automation, Inc. Sensor for articles such as wafers on end effector
JPH06338558A (ja) * 1993-05-28 1994-12-06 Tel Varian Ltd 検出装置及び処理装置
US5563798A (en) 1994-04-05 1996-10-08 Applied Materials, Inc. Wafer positioning system
US5606251A (en) * 1994-07-15 1997-02-25 Ontrak Systems, Inc. Method and apparatus for detecting a substrate in a substrate processing system
US5980194A (en) * 1996-07-15 1999-11-09 Applied Materials, Inc. Wafer position error detection and correction system

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