JPH11140514A - ニッケル粉の製造方法 - Google Patents
ニッケル粉の製造方法Info
- Publication number
- JPH11140514A JPH11140514A JP32707997A JP32707997A JPH11140514A JP H11140514 A JPH11140514 A JP H11140514A JP 32707997 A JP32707997 A JP 32707997A JP 32707997 A JP32707997 A JP 32707997A JP H11140514 A JPH11140514 A JP H11140514A
- Authority
- JP
- Japan
- Prior art keywords
- nickel powder
- washing
- water
- drying
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000005406 washing Methods 0.000 claims abstract description 66
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 26
- 238000001035 drying Methods 0.000 claims abstract description 23
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims abstract description 10
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims abstract description 10
- 238000001291 vacuum drying Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 14
- 239000001301 oxygen Substances 0.000 abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 abstract description 14
- 239000002245 particle Substances 0.000 abstract description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 9
- 239000000460 chlorine Substances 0.000 abstract description 9
- 229910052801 chlorine Inorganic materials 0.000 abstract description 9
- 238000004140 cleaning Methods 0.000 abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 4
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000006722 reduction reaction Methods 0.000 description 21
- 239000007789 gas Substances 0.000 description 14
- 239000000126 substance Substances 0.000 description 9
- 238000011084 recovery Methods 0.000 description 7
- 150000004820 halides Chemical class 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000006213 oxygenation reaction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
Landscapes
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Conductive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32707997A JPH11140514A (ja) | 1997-11-12 | 1997-11-12 | ニッケル粉の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32707997A JPH11140514A (ja) | 1997-11-12 | 1997-11-12 | ニッケル粉の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11140514A true JPH11140514A (ja) | 1999-05-25 |
| JPH11140514A5 JPH11140514A5 (enExample) | 2004-11-04 |
Family
ID=18195062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32707997A Pending JPH11140514A (ja) | 1997-11-12 | 1997-11-12 | ニッケル粉の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11140514A (enExample) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000003823A1 (en) * | 1998-07-15 | 2000-01-27 | Toho Titanium Co., Ltd. | Metal powder |
| WO2000006326A1 (en) * | 1998-07-27 | 2000-02-10 | Toho Titanium Co., Ltd. | Metal nickel powder |
| WO2001057885A1 (en) * | 2000-01-31 | 2001-08-09 | Toho Titanium Co., Ltd. | Nickel power dispersion, method of producing nickel power dispersion and method of producing conductive paste |
| WO2002102533A1 (fr) * | 2001-06-14 | 2002-12-27 | Toho Titanium Co., Ltd. | Procede de production de poudre metallique et poudre metallique ainsi produite, pate electroconductrice et condensateur ceramique monolithique |
| JP2007197836A (ja) * | 2007-03-06 | 2007-08-09 | Mitsui Mining & Smelting Co Ltd | ニッケル粉 |
| CN100454444C (zh) * | 2001-08-21 | 2009-01-21 | Tdk株式会社 | 导电糊用组合物、导电糊及其制备方法 |
| JP2011149080A (ja) * | 2010-01-25 | 2011-08-04 | Sumitomo Metal Mining Co Ltd | ニッケル粉末およびその製造方法 |
| CN102962470A (zh) * | 2012-11-06 | 2013-03-13 | 昆明舒扬科技有限公司 | 常温下制备球形超细镍粉的方法 |
| JP2014189867A (ja) * | 2013-03-28 | 2014-10-06 | Sumitomo Metal Mining Co Ltd | ニッケル粉末の乾燥方法 |
| JP2023079720A (ja) * | 2021-11-29 | 2023-06-08 | 住友金属鉱山株式会社 | ニッケル粉末の製造方法 |
| JP2023079721A (ja) * | 2021-11-29 | 2023-06-08 | 住友金属鉱山株式会社 | ニッケル粉末の製造方法 |
-
1997
- 1997-11-12 JP JP32707997A patent/JPH11140514A/ja active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000003823A1 (en) * | 1998-07-15 | 2000-01-27 | Toho Titanium Co., Ltd. | Metal powder |
| WO2000006326A1 (en) * | 1998-07-27 | 2000-02-10 | Toho Titanium Co., Ltd. | Metal nickel powder |
| US6391084B1 (en) | 1998-07-27 | 2002-05-21 | Toho Titanium Co., Ltd. | Metal nickel powder |
| EP1195773A4 (en) * | 2000-01-31 | 2009-01-28 | Toho Titanium Co Ltd | PULVERULENT NICKEL DISPERSION, PROCESS FOR PRODUCING THE SAME, AND PROCESS FOR PRODUCING CONDUCTIVE PASTE |
| WO2001057885A1 (en) * | 2000-01-31 | 2001-08-09 | Toho Titanium Co., Ltd. | Nickel power dispersion, method of producing nickel power dispersion and method of producing conductive paste |
| US6620220B2 (en) | 2000-01-31 | 2003-09-16 | Toho Titanium Co., Ltd. | Nickel powder dispersion, method of producing nickel power dispersion and method of producing conductive paste |
| WO2002102533A1 (fr) * | 2001-06-14 | 2002-12-27 | Toho Titanium Co., Ltd. | Procede de production de poudre metallique et poudre metallique ainsi produite, pate electroconductrice et condensateur ceramique monolithique |
| US6863708B2 (en) | 2001-06-14 | 2005-03-08 | Toho Titanium Co., Ltd. | Method for producing metal powder and metal powder, and electroconductive paste and monolithic ceramic capacitor |
| KR100891061B1 (ko) | 2001-06-14 | 2009-03-31 | 도호 티타늄 가부시키가이샤 | 금속 분말의 제조방법 및 금속 분말 |
| CN100454444C (zh) * | 2001-08-21 | 2009-01-21 | Tdk株式会社 | 导电糊用组合物、导电糊及其制备方法 |
| JP2007197836A (ja) * | 2007-03-06 | 2007-08-09 | Mitsui Mining & Smelting Co Ltd | ニッケル粉 |
| JP2011149080A (ja) * | 2010-01-25 | 2011-08-04 | Sumitomo Metal Mining Co Ltd | ニッケル粉末およびその製造方法 |
| CN102962470A (zh) * | 2012-11-06 | 2013-03-13 | 昆明舒扬科技有限公司 | 常温下制备球形超细镍粉的方法 |
| JP2014189867A (ja) * | 2013-03-28 | 2014-10-06 | Sumitomo Metal Mining Co Ltd | ニッケル粉末の乾燥方法 |
| JP2023079720A (ja) * | 2021-11-29 | 2023-06-08 | 住友金属鉱山株式会社 | ニッケル粉末の製造方法 |
| JP2023079721A (ja) * | 2021-11-29 | 2023-06-08 | 住友金属鉱山株式会社 | ニッケル粉末の製造方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20041015 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20041130 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
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| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050131 |
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| A521 | Written amendment |
Effective date: 20050131 Free format text: JAPANESE INTERMEDIATE CODE: A821 |
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| A02 | Decision of refusal |
Effective date: 20050420 Free format text: JAPANESE INTERMEDIATE CODE: A02 |