JPH1081926A - Copper alloy for electronic device - Google Patents
Copper alloy for electronic deviceInfo
- Publication number
- JPH1081926A JPH1081926A JP8235086A JP23508696A JPH1081926A JP H1081926 A JPH1081926 A JP H1081926A JP 8235086 A JP8235086 A JP 8235086A JP 23508696 A JP23508696 A JP 23508696A JP H1081926 A JPH1081926 A JP H1081926A
- Authority
- JP
- Japan
- Prior art keywords
- copper alloy
- solderability
- property
- stamping
- strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子機器用のリー
ド(IC等の半導体素子用リードフレーム等)、端子、
コネクター、スイッチ等に適した銅合金に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to leads for electronic equipment (lead frames for semiconductor devices such as ICs), terminals,
The present invention relates to a copper alloy suitable for a connector, a switch, and the like.
【0002】[0002]
【従来の技術】電子機器用材料には、電気・熱伝導性
(導電率)、強度が高いこと、Ag等の貴金属のめっき
性や半田めっき性に優れること、半田付け性に優れるこ
と等が求められ、従来より鉄系材料やCu合金が多用さ
れている。ところで、前記諸特性は、半導体機器の小型
薄肉化、高集積化、高密度化に対応してより厳しくなり
つつある。特にリードフレームは多ピン化が進み、導電
率や強度の他、打抜加工性又はエッチング加工性の向上
が求められている。このような状況の中で、電子機器用
材料には、析出硬化型のCu−Fe系(C1940) 、Cu−
Ni−Si系(C7025) 、Cu−Cr−Sn系等の銅合金
が用いられるようになった。2. Description of the Related Art Materials for electronic devices are required to have high electrical and thermal conductivity (conductivity), high strength, excellent plating properties of noble metals such as Ag and solder plating properties, and excellent solderability. Iron-based materials and Cu alloys have been widely used. By the way, the above-mentioned characteristics are becoming more severe in response to the miniaturization, high integration, and high density of semiconductor devices. In particular, lead pins are becoming increasingly multi-pinned, and it is required to improve not only conductivity and strength but also punching workability or etching workability. Under such circumstances, materials for electronic devices include precipitation hardening type Cu-Fe (C1940), Cu-
Copper alloys such as Ni-Si (C7025) and Cu-Cr-Sn have come to be used.
【0003】[0003]
【発明が解決しようとする課題】これらの銅合金は導電
率を高める為に、合金元素量をできるだけ少なくし、又
不純物量も極力微量に抑えたものが使用されている。こ
の為エッチング性には優れるが、スタンピング性に劣る
という問題があった。本発明は、熱・電気伝導性(導電
率)、強度、熱間加工性、スタンピング性、半田付け
性、めっき性等に優れた電子機器用銅合金を提供するこ
とを目的とする。In order to increase the electric conductivity, these copper alloys are used in which the amount of alloying elements is reduced as much as possible and the amount of impurities is kept as small as possible. For this reason, the etching property is excellent, but there is a problem that the stamping property is poor. An object of the present invention is to provide a copper alloy for electronic equipment which is excellent in thermal / electrical conductivity (conductivity), strength, hot workability, stamping property, solderability, plating property and the like.
【0004】[0004]
【課題を解決するための手段】請求項1記載の発明は、
Znを 5〜42wt% 含み、Sn、Si、Al、Ni、M
n、Ti、Zr、In、Mg、0.005 〜0.5wt%のPb、
0.005 〜0.5wt%のTeのいずれか1種又は2種以上を総
計で 0.1〜3wt%含み、更に、Bi、Ca、Sr、Baの
いずれか1種又は2種以上を総計で 0.005〜3wt%含み、
残部Cuと不可避的不純物からなることを特徴とする電
子機器用銅合金である。According to the first aspect of the present invention,
Contains 5 to 42 wt% of Zn, Sn, Si, Al, Ni, M
n, Ti, Zr, In, Mg, 0.005 to 0.5 wt% Pb,
One or more kinds of 0.005 to 0.5 wt% Te are contained in a total of 0.1 to 3 wt%, and one or more of Bi, Ca, Sr, and Ba are contained in a total of 0.005 to 3 wt%. Including
It is a copper alloy for electronic devices characterized by being composed of a balance of Cu and unavoidable impurities.
【0005】[0005]
【発明の実施の形態】以下に本発明の電子機器用銅合金
の合金元素について説明する。Znはスタンピング性を
向上させる。その含有量を 5〜42wt% に規定した理由
は、5wt%未満でも 42wt%を超えてもそのスタンピング性
向上効果が十分に得られなくなる為である。5wt%未満で
は強度も十分に得られない。42wt% を超えると導電率、
熱間加工性、半田付け性、めっき性も低下する。特に望
ましいZn含有量は15〜38wt% である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The alloying elements of the copper alloy for electronic equipment of the present invention will be described below. Zn improves the stamping property. The reason why the content is specified in the range of 5 to 42% by weight is that if the content is less than 5% by weight or more than 42% by weight, the effect of improving the stamping property cannot be sufficiently obtained. If it is less than 5 wt%, sufficient strength cannot be obtained. If it exceeds 42 wt%, conductivity,
Hot workability, solderability, and plating properties also decrease. A particularly desirable Zn content is 15-38 wt%.
【0006】Sn、Si、Al、Ni、Mn、Ti、Z
r、In、Mg、Pb、Teは各々強度、スタンピング
性、半田付け性、めっき性を向上させる。その含有量を
総計で 0.1〜3wt%に規定した理由は、0.1wt%未満ではそ
の効果が十分に得られず、3wt%を超えると熱間加工性と
導電率が低下する為である。上記諸元素のうちPbとT
eは熱間加工後の酸化皮膜除去の際に行う切削加工性を
も改善する。その含有量を各々 0.005〜0.5wt%に規定し
た理由は、0.005wt%未満ではその効果が十分に得られ
ず、0.5wt%を超えるとスタンピング性が低下する為であ
る。[0006] Sn, Si, Al, Ni, Mn, Ti, Z
r, In, Mg, Pb, and Te improve strength, stamping property, solderability, and plating property, respectively. The reason why the content is specified to be 0.1 to 3% by weight in total is that if the content is less than 0.1% by weight, the effect cannot be sufficiently obtained, and if it exceeds 3% by weight, the hot workability and the electrical conductivity decrease. Of the above elements, Pb and T
e also improves the machinability performed when removing an oxide film after hot working. The content is specified to be 0.005 to 0.5 wt%, respectively, because if the content is less than 0.005 wt%, the effect cannot be sufficiently obtained, and if the content exceeds 0.5 wt%, the stamping property decreases.
【0007】Bi、Ca、Sr、Baは、各々スタンピ
ング性と半田付け性を向上させる。その含有量を総計で
0.005〜3wt%に規定した理由は、0.005wt%未満ではその
効果が十分に得られず、3wt%を超えると熱間加工性と導
電率が低下する為である。これらは単独でも効果がある
が、複数元素を含有させると相互に化合物を形成してそ
の効果がより向上する。[0007] Bi, Ca, Sr, and Ba improve the stamping property and the solderability, respectively. Their content in total
The reason why the content is specified in the range of 0.005 to 3 wt% is that if the content is less than 0.005 wt%, the effect cannot be sufficiently obtained, and if the content exceeds 3 wt%, the hot workability and the electrical conductivity are reduced. These are effective alone, but when they contain a plurality of elements, they form a compound with each other and the effect is further improved.
【0008】本発明の銅合金は、そのまま用いても優れ
た特性を示すが、更にAu、Ag、Ni、Pd、これら
の合金、又は半田等をめっきすることにより半田付け
性、耐応力腐食割れ性等が一層向上する。[0008] The copper alloy of the present invention exhibits excellent properties when used as it is. However, by plating Au, Ag, Ni, Pd, these alloys, or solder, etc., the solderability and the stress corrosion cracking resistance are improved. The properties are further improved.
【0009】[0009]
【実施例】以下に本発明を実施例により詳細に説明す
る。表1、2に示す種々組成の合金を高周波溶解炉にて
溶解し鋳造して、厚さ30mm、幅 100mm、長さ 150mmの鋳
塊を得た。次にこれら鋳塊を 980℃で厚さ10mmに熱間圧
延し、表面の酸化被膜を切削して除去したのち、種々厚
さの素板に冷間圧延し、次いでこの素板に不活性雰囲気
中で 450℃×2hr の熱処理を施し、次いで各々を厚さ0.
15mmの板材に冷間圧延した。The present invention will be described below in detail with reference to examples. Alloys of various compositions shown in Tables 1 and 2 were melted and cast in a high-frequency melting furnace to obtain ingots having a thickness of 30 mm, a width of 100 mm and a length of 150 mm. Next, these ingots are hot-rolled at 980 ° C to a thickness of 10 mm, the oxide film on the surface is removed by cutting, and then cold-rolled into base plates of various thicknesses. In a heat treatment at 450 ° C for 2 hours,
It was cold rolled into a 15 mm plate.
【0010】得られた各々の板材について、導電率、引
張強さ、熱間加工性、スタンピング性、半田付け性、め
っき性を調べた。導電率は、JIS-H-0505に、引張強さは
JIS-Z-2241にそれぞれ準じて測定した。熱間加工性は、
熱間圧延後の表面割れを目視観察して調べた。割れのな
いものを○、割れを生じたものを×で表示した。スタン
ピング性は、板材からQFP160ピンタイプのリードフレー
ムを SKD11製金型を用いて打抜き、インナーリードの段
差を測定して評価した。段差は小さい程スタンピング性
の良いことを示す。半田付け性は、板材に共晶半田(Pb-
63wt%Sn)を接着し、これを大気中で 150℃で1000時間加
熱したのち、 180度の密着曲げと曲げ戻しを行い、曲げ
戻し部分の前記共晶半田の接合状態を目視観察して評価
した。剥離のないものを○、剥離のあるものを×と表示
した。めっき性は、電解脱脂後、H2SO4-H2O2溶液でエッ
チングし、Agめっき浴に浸漬してAgを厚さ 5μmめっき
し、その後 475℃で 5分間加熱して膨れの有無を顕微鏡
により観察して評価した。膨れのないものを○、膨れの
あるものを×と表示した。結果を表3、4に示す。With respect to each of the obtained sheet materials, the conductivity, tensile strength, hot workability, stamping property, solderability, and plating property were examined. Conductivity is JIS-H-0505, tensile strength is
The measurement was performed according to JIS-Z-2241. Hot workability is
Surface cracks after hot rolling were visually observed and examined. Those without cracks were indicated by ○, and those with cracks were indicated by x. The stamping property was evaluated by stamping a QFP160 pin type lead frame from a sheet material using a SKD11 mold and measuring the step of the inner lead. The smaller the step, the better the stamping property. Solderability is determined by eutectic solder (Pb-
63wt% Sn) and heated in air at 150 ° C for 1000 hours, then performed 180 ° close contact bending and bending back, and visually observed the eutectic solder joint at the bent back part and evaluated. did. A sample without peeling was indicated by "O", and a sample with peeling was indicated by "X". Plating properties are as follows: electrolytic degreasing, etching with H 2 SO 4 -H 2 O 2 solution, immersion in Ag plating bath, plating Ag 5 μm thick, then heating at 475 ° C. for 5 minutes to check for blisters It was observed and evaluated with a microscope. Those without swelling were indicated by ○, and those with swelling were indicated by ×. The results are shown in Tables 3 and 4.
【0011】[0011]
【表1】 [Table 1]
【0012】[0012]
【表2】 [Table 2]
【0013】[0013]
【表3】 (注)*:インナーリードの段差、単位μm。[Table 3] (Note) *: Step of inner lead, unit μm.
【0014】[0014]
【表4】 (注)*:インナーリードの段差、単位μm。[Table 4] (Note) *: Step of inner lead, unit μm.
【0015】表3、4より明らかなように、本発明例の
No.1〜11は、全調査項目に対し、いずれも優れた特性を
示している。Pbを適量添加したNo.1、Teを適量添加した
No.5は熱間圧延材の面削がとりわけ良好に行えた。これ
に対し、比較例の No.12はZnが少ない為スタンピング性
に劣り、強度も低下した。 No.13はZnが多かった為スタ
ンピング性に劣り、その上、導電率、熱間加工性、半田
付け性、めっき性が低下した。 No.14はSnが少なかった
為、 No.17はSiとAlの量が少なかった為、いずれも強
度、スタンピング性、半田付け性が低下した。 No.16は
Bi,Ca,Sr,Ba のいずれも含有されていない為スタンピン
グ性と半田付け性が劣った。No.15はSnの量が多く、 N
o.18はNiの量が多く、 No.19はBiの量が多く、 No.20は
Caの量が多く、 No.21はSrの量が多く、 No.22はCaとBa
の量が多い為、いずれも導電率が低下し、又熱間加工で
割れが生じた。従来例のNo.23,24は共にスタンピング性
に劣った。 No.24は強度も低かった。As is clear from Tables 3 and 4,
Nos. 1 to 11 show excellent characteristics for all the survey items. No. 1 with an appropriate amount of Pb added, and an appropriate amount of Te added
In No. 5, the hot-rolled material was cut particularly well. In contrast, No. 12 of the comparative example was inferior in stamping property and reduced in strength because of a small amount of Zn. No.13 was inferior in stamping property due to the large amount of Zn, and furthermore, conductivity, hot workability, solderability, and plating property were reduced. No. 14 had a small amount of Sn, and No. 17 had a small amount of Si and Al, so that the strength, stamping properties, and solderability were all reduced. No.16 is
Since neither Bi, Ca, Sr, or Ba was contained, the stamping properties and solderability were poor. No.15 has a large amount of Sn and N
o.18 has a large amount of Ni, No.19 has a large amount of Bi, and No.20 has a large amount of Bi.
No. 21 has a large amount of Ca, No. 21 has a large amount of Sr, and No. 22 has a large amount of Ca and Ba.
, The conductivity decreased and cracking occurred during hot working. Both Nos. 23 and 24 of the prior art were inferior in stamping properties. No. 24 had low strength.
【0016】得られた板材について応力腐食割れ感受性
をASTM法(G37) に準じて調べた。その結果いずれも耐応
力腐食割れ性に優れることが確認された。The obtained sheet material was examined for susceptibility to stress corrosion cracking according to the ASTM method (G37). As a result, it was confirmed that all were excellent in stress corrosion cracking resistance.
【0017】[0017]
【発明の効果】以上に述べたように、本発明の電子機器
用銅合金は、電気・熱伝導性、強度、熱間加工性、スタ
ンピング性、半田付け性、めっき性に優れるので、電子
機器の高密度化、高集積化等に十分対応できる。本発明
はリードフレームに特に適するが、端子、コネクター、
電極等、他の導電材料に適用しても同様の効果が得られ
る。依って、工業上顕著な効果を奏する。As described above, the copper alloy for electronic equipment of the present invention is excellent in electric / thermal conductivity, strength, hot workability, stamping property, solderability, and plating property. High density, high integration, etc. The invention is particularly suitable for leadframes, but with terminals, connectors,
The same effect can be obtained by applying to other conductive materials such as electrodes. Therefore, an industrially remarkable effect is achieved.
Claims (1)
l、Ni、Mn、Ti、Zr、In、Mg、0.005 〜0.
5wt%のPb、0.005 〜0.5wt%のTeのいずれか1種又は
2種以上を総計で 0.1〜3wt%含み、更に、Bi、Ca、
Sr、Baのいずれか1種又は2種以上を総計で 0.005
〜3wt%含み、残部Cuと不可避的不純物からなることを
特徴とする電子機器用銅合金。1. A method according to claim 1, wherein said Zn, Sn, Si, A
1, Ni, Mn, Ti, Zr, In, Mg, 0.005-0.
5 wt% of Pb, 0.005 to 0.5 wt% of Te, or a mixture of at least one of 0.1 to 3 wt% of Bi, Ca,
One or more of Sr and Ba in total 0.005
A copper alloy for electronic equipment, characterized by containing about 3 wt% and the balance being Cu and unavoidable impurities.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23508696A JP3459520B2 (en) | 1996-09-05 | 1996-09-05 | Copper alloy for lead frame |
PCT/JP1997/003080 WO1998010105A1 (en) | 1996-09-05 | 1997-09-03 | Copper alloy for electronic devices |
KR1019980703273A KR20000064324A (en) | 1996-09-05 | 1997-09-03 | Copper alloy for electronic device |
TW86112865A TW434324B (en) | 1996-09-05 | 1997-09-03 | Copper alloy for electronic devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23508696A JP3459520B2 (en) | 1996-09-05 | 1996-09-05 | Copper alloy for lead frame |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH1081926A true JPH1081926A (en) | 1998-03-31 |
JP3459520B2 JP3459520B2 (en) | 2003-10-20 |
Family
ID=16980866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23508696A Expired - Fee Related JP3459520B2 (en) | 1996-09-05 | 1996-09-05 | Copper alloy for lead frame |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3459520B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001164328A (en) * | 1999-10-01 | 2001-06-19 | Dowa Mining Co Ltd | Copper alloy for connector and producing method therefor |
EP1508626A1 (en) * | 1998-10-09 | 2005-02-23 | Sambo Copper Alloy Co., Ltd | Free-cutting copper alloys |
US7056396B2 (en) | 1998-10-09 | 2006-06-06 | Sambo Copper Alloy Co., Ltd. | Copper/zinc alloys having low levels of lead and good machinability |
US7883589B2 (en) | 2005-09-22 | 2011-02-08 | Mitsubishi Shindoh Co., Ltd. | Free-cutting copper alloy containing very low lead |
JP2012236227A (en) * | 2011-05-11 | 2012-12-06 | Chu Hyon Cho | Copper-phosphorus-strontium brazing alloy |
US8506730B2 (en) | 1998-10-09 | 2013-08-13 | Mitsubishi Shindoh Co., Ltd. | Copper/zinc alloys having low levels of lead and good machinability |
JP2013234362A (en) * | 2012-05-09 | 2013-11-21 | San-Etsu Metals Co Ltd | Brass alloy excellent in high temperature brittleness resistance |
KR101537151B1 (en) * | 2012-03-08 | 2015-07-15 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Cu-Zn-Sn-Ca ALLOY FOR ELECTRICAL AND ELECTRONIC DEVICE |
-
1996
- 1996-09-05 JP JP23508696A patent/JP3459520B2/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1508626A1 (en) * | 1998-10-09 | 2005-02-23 | Sambo Copper Alloy Co., Ltd | Free-cutting copper alloys |
US7056396B2 (en) | 1998-10-09 | 2006-06-06 | Sambo Copper Alloy Co., Ltd. | Copper/zinc alloys having low levels of lead and good machinability |
US8506730B2 (en) | 1998-10-09 | 2013-08-13 | Mitsubishi Shindoh Co., Ltd. | Copper/zinc alloys having low levels of lead and good machinability |
JP2001164328A (en) * | 1999-10-01 | 2001-06-19 | Dowa Mining Co Ltd | Copper alloy for connector and producing method therefor |
US7883589B2 (en) | 2005-09-22 | 2011-02-08 | Mitsubishi Shindoh Co., Ltd. | Free-cutting copper alloy containing very low lead |
JP2012236227A (en) * | 2011-05-11 | 2012-12-06 | Chu Hyon Cho | Copper-phosphorus-strontium brazing alloy |
KR101537151B1 (en) * | 2012-03-08 | 2015-07-15 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | Cu-Zn-Sn-Ca ALLOY FOR ELECTRICAL AND ELECTRONIC DEVICE |
JP2013234362A (en) * | 2012-05-09 | 2013-11-21 | San-Etsu Metals Co Ltd | Brass alloy excellent in high temperature brittleness resistance |
Also Published As
Publication number | Publication date |
---|---|
JP3459520B2 (en) | 2003-10-20 |
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