JPH1081927A - Terminal-connector material made of cu alloy - Google Patents

Terminal-connector material made of cu alloy

Info

Publication number
JPH1081927A
JPH1081927A JP9116783A JP11678397A JPH1081927A JP H1081927 A JPH1081927 A JP H1081927A JP 9116783 A JP9116783 A JP 9116783A JP 11678397 A JP11678397 A JP 11678397A JP H1081927 A JPH1081927 A JP H1081927A
Authority
JP
Japan
Prior art keywords
terminal
alloy
plating
case
connector material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9116783A
Other languages
Japanese (ja)
Inventor
Masao Kobayashi
正男 小林
Takuro Iwamura
卓郎 岩村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP9116783A priority Critical patent/JPH1081927A/en
Publication of JPH1081927A publication Critical patent/JPH1081927A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain terminal-connector material excellent in spring property and bending by constituting the material of a Cu alloy having the compsn. contg. specified amounts of Ni,Ti,Cr and Zr, and the balance Cu. SOLUTION: A terminal-connector material is composed of a Cu alloy having a compsn. contg., by weight, 1 to 3.5% Ni, 0.3 to 1.5% Ti, 0.2 to 1% Cr, 0.05% Zr, and the balance Cu. This terminal-connector material has excellent spring properties and bending workability and also has good strength, electric conductivity and plating and soldering adhesion. In the case the contents of Ni and Ti are less than the lower limits, excellent spring properties can not be secured, and in the case of above the lower limits, the excellent electric conductivity owing to Cu is deteriorated. As for Cr, in the case of less than the lower limit, the effect of improving the plating adhesion without deteriorating the excellent plating properties owing to Cu can not be obtd., as for Zr, in the case of less than the lower limit, the effect of improving the peeling resistance of solder, bending workability or the like can not be obtd., and as for the Cr and Zr, in the case above the upper limits, the plating adhesion is damaged, and its melting and casting are made difficult.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、特にすぐれたば
ね性と曲げ加工性を有し、さらに導電性並びにめっきお
よびはんだ密着性の良好なCu合金製端子・コネクタ材
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a Cu alloy terminal / connector material having particularly excellent spring properties and bending workability, and further having good conductivity, good plating and good solder adhesion.

【0002】[0002]

【従来の技術】一般に、端子、コネクタ、リレー、さら
にスイッチなど(以下、これらを総称して端子・コネク
タという)の製造に用いられる材料には、(a) 疲労
などによって接触圧力の低下が生じないための高いばね
性、(b) 曲げ加工の際に割れが生じないための良好
な曲げ加工性、(c) 接触部での電圧降下損をなくす
ための高い導電性、(d) 良好なめっきおよびはんだ
の密着性、以上(a)〜(d)に示される特性をもつこ
とが要求されることから、例えば特開昭61−1834
26号公報、第3頁、第1表に記載されるCu−Ti−
Zr合金やCu−Ti−Ni合金、さらにCu−Ti−
Ni−Cr合金などのCu合金が用いられている。
2. Description of the Related Art In general, materials used for manufacturing terminals, connectors, relays, and switches (hereinafter collectively referred to as terminals / connectors) suffer from (a) a decrease in contact pressure due to fatigue or the like. (B) good bending workability to prevent cracking during bending, (c) high conductivity to eliminate voltage drop loss at the contact part, (d) good Since it is required to have the adhesion shown in (a) to (d) above, the adhesion between plating and solder is, for example, disclosed in JP-A-61-1834.
No. 26, page 3, Cu-Ti- described in Table 1.
Zr alloy, Cu-Ti-Ni alloy, and Cu-Ti-
Cu alloys such as Ni-Cr alloys are used.

【0003】[0003]

【発明が解決しようとする課題】一方、近年の電気機器
の小型化および高性能化はめざましく、これに伴ってこ
れらの構造部材である端子・コネクタにも薄肉化および
形状複雑化が強く要求されるようになっている。しか
し、上記の従来Cu合金製端子・コネクタ材は、特にば
ね性および曲げ加工性が不十分なために、これらの要求
に満足に対応することができないのが現状である。
On the other hand, in recent years, the miniaturization and high performance of electric equipment have been remarkable, and accordingly, the structural members such as terminals and connectors have been strongly required to be thinner and more complicated in shape. It has become so. However, the above-mentioned conventional Cu alloy terminal / connector material cannot satisfy these requirements satisfactorily because of particularly insufficient spring property and bending workability.

【0004】[0004]

【課題を解決するための手段】そこで、本発明者等は、
上述のような観点から、特にばね性と曲げ加工性にすぐ
れた端子・コネクタ材を開発すべく研究を行なった結
果、端子・コネクタ材を、重量%で(以下%は重量%を
示す)、 Ni:1〜3.5%、 Ti:0.3〜1.5%、 Cr:0.2〜1%、 Zr:0.05〜0.5
%、を含有し、残りがCuと不可避不純物からなる組成
を有するCu合金で構成すると、この結果のCu合金製
端子・コネクタは、すぐれたばね性と曲げ加工性を有
し、かつ良好な強度、導電性、並びにめっきおよびはん
だ密着性を具備するようになるという知見を得たのであ
る。
Means for Solving the Problems Accordingly, the present inventors have
From the above-mentioned viewpoints, as a result of conducting research to develop a terminal / connector material having particularly excellent spring properties and bending workability, the terminal / connector material was obtained by weight% (hereinafter,% means weight%). Ni: 1 to 3.5%, Ti: 0.3 to 1.5%, Cr: 0.2 to 1%, Zr: 0.05 to 0.5
%, And the remainder is composed of a Cu alloy having a composition consisting of Cu and inevitable impurities, the resulting Cu alloy terminal / connector has excellent spring properties and bending workability, and has good strength, They have obtained the knowledge that they will have conductivity and adhesion to plating and solder.

【0005】この発明は、上記知見にもとづいてさなれ
たものであって、以下に成分組成範囲を上記の通りに限
定した理由を説明する。 (a) NiおよびTi これら2成分は、結合して、結晶粒内(素地中)に微細
に分散析出する金属間化合物(Nix Tiy )を形成
し、もってばね性を飛躍的に向上させる作用があるが、
その含有量がNiおよびTiのいずれかでも、Niにあ
っては1%未満、Tiにあっては0.3%未満になる
と、金属間化合物の析出量が不十分となって所望のすぐ
れたばね性を確保することができず、一方NiおよびT
iのいずれかでも、Niにあっては3.5%、Tiにあ
っては1.5%を越えると、主成分であるCuによって
もたらされるすぐれた導電性が損なわれるようになるこ
とから、その含有量を、Ni:1〜3.5%、Ti:
0.3〜1.5%と定めた。
[0005] The present invention has been made based on the above findings, and the reason for limiting the component composition range as described above will be described below. (A) Ni and Ti These two components combine to form an intermetallic compound (Ni x Ti y ) which is finely dispersed and precipitated in the crystal grains (in the base material), thereby dramatically improving the spring property. Has an effect,
If the content of either Ni or Ti is less than 1% for Ni and less than 0.3% for Ti, the amount of intermetallic compound deposited becomes insufficient and a desired excellent spring is obtained. Properties cannot be ensured, while Ni and T
If any of i exceeds 3.5% for Ni and 1.5% for Ti, the excellent conductivity provided by Cu as the main component is impaired. The content is Ni: 1 to 3.5%, Ti:
It was determined to be 0.3 to 1.5%.

【0006】(b) Cr 端子・コネクタ材には、製造工程中はんだ付けが施され
る場合があるが、この施されたはんだが、例えば高温環
境での使用に際しても剥離しないことが必要であって、
Cr成分が主成分たるCuによってもたらされるすぐれ
ためっき性を損なうことなくはんだの密着性を向上させ
る作用をもつものである。すなわちCr成分は、母材と
はんだ層との界面に拡散し、バリアー(障壁)となっ
て、一般に界面に生成する化合物層、例えばCu3 Sn
(ε相)やCu6 Sn5 (η相)の成長を著しく抑制
し、もってはんだの密着性を向上させる作用をもつが、
その含有量が0.2%未満では前記作用に所望の効果が
得られず、一方その含有量が1%を越えると、粗大なC
r晶出物が発生するようになって、めっきの密着性が阻
害されるようになるほか、溶解・鋳造が困難になること
から、その含有量を0.2〜1%と定めた。
(B) The Cr terminal / connector material may be subjected to soldering during the manufacturing process, but it is necessary that the applied solder does not peel off, for example, even when used in a high temperature environment. hand,
This has the effect of improving the adhesion of the solder without impairing the excellent plating properties provided by Cu, the main component of which is a Cr component. That is, the Cr component diffuses to the interface between the base material and the solder layer, and serves as a barrier, and in general, a compound layer generated at the interface, for example, Cu 3 Sn
(Ε phase) and Cu 6 Sn 5 (η phase) are remarkably inhibited from growing, and thus have the effect of improving the solder adhesion.
If the content is less than 0.2%, the desired effect cannot be obtained, whereas if the content exceeds 1%, coarse C
Since r crystallized substances are generated and the adhesion of the plating is hindered, and melting and casting become difficult, the content is set to 0.2 to 1%.

【0007】(c) Zr Zr成分は、Cr成分によってもたらされるバリアー作
用並びに化合物成長抑制作用を促進させ、もってすぐれ
たはんだの耐剥離性を確保するのに不可欠の成分であ
り、またZr成分には、Cuと結合して、結晶粒内およ
び結晶粒界に微細に析出するCu3 Zrなどの金属間化
合物を形成するほか、結晶粒を微細化して、延性を向上
させ、もって曲げ加工性を向上させ、さらに前記Cu3
Zrの金属間化合物とNix Tiy の微細析出分散の金
属間化合物との共存において、ばね性を一段と向上させ
る作用があるが、その含有量が0.05%未満では前記
作用に所望の効果が得られず、一方その含有量が0.5
%を越えると、溶解・鋳造が困難になるばかりでなく、
介在物の多量の発生によってめっき密着性が阻害される
ようになることから、その含有量を0.05〜0.5%
と定めた。
(C) Zr The Zr component promotes the barrier effect and the compound growth inhibitory effect brought about by the Cr component, and is an essential component for securing excellent peeling resistance of the solder. Combines with Cu to form intermetallic compounds such as Cu 3 Zr, which are finely precipitated in crystal grains and at crystal grain boundaries, and also refines crystal grains to improve ductility, thereby improving bending workability. The Cu 3
In the coexistence of an intermetallic compound of Zr and an intermetallic compound of Ni x Ti y which is finely precipitated and dispersed, there is an effect of further improving the spring property. Is not obtained, while its content is 0.5
%, Melting and casting becomes difficult,
Since the adhesion of the plating is inhibited by the generation of a large amount of inclusions, the content is set to 0.05 to 0.5%.
It was decided.

【0008】[0008]

【発明の実施の形態】つぎに、この発明のCu合金製端
子・コネクタ材を実施例により具体的に説明する。通常
の真空溶解炉を用い、黒鉛るつぼ中で、それぞれ表1,
2に示される成分組成をもったCu合金溶湯を5kgづつ
溶製し、金型に鋳造し、面削した後、熱間鍛造および熱
間圧延を施して幅:150mm×厚さ:10mmの板材と
し、ついでこの板材に、温度:980℃に30分間保持
後水冷焼入れの溶体化処理を施し、面削して板厚を8mm
とした状態で、冷間圧延と中間焼鈍(温度:500℃に
1時間保持)を繰り返し施し、最終圧延を50%の圧延
率で行なって板厚:0.25mmを有する冷延材とし、最
終的にこれに温度:350℃に5分間保持の条件で低温
焼鈍を施すことによって本発明Cu合金製端子・コネク
タ素材(以下、本発明端子・コネクタ素材という)1〜
9、比較Cu合金製端子・コネクタ素材(以下、比較端
子・コネクタ素材という)1〜8、および従来Cu合金
製端子・コネクタ素材(以下、従来端子・コネクタ素材
という)1〜3をそれぞれ製造した。なお、比較端子・
コネクタ素材1〜8は、Cu合金を構成する成分のうち
のいずれかの成分含有量(表2に※印を付す)がこの発
明の範囲から外れたものであり、また従来端子・コネク
タ素材1〜3は、先に述べた特開昭61−183426
号公報、第3頁、第1表に記載されるCu−Ti−Zr
合金、Cu−Ti−Ni合金、およびCu−Ti−Ni
−Cr合金に相当する組成をもったCu合金で構成され
たものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The Cu alloy terminal / connector material of the present invention will now be specifically described with reference to examples. Using a normal vacuum melting furnace, in a graphite crucible,
5 kg of molten Cu alloy having the component composition shown in 2 is cast in a mold, cast and chamfered, and then subjected to hot forging and hot rolling to obtain a sheet material having a width of 150 mm and a thickness of 10 mm. Then, this plate material was subjected to a solution treatment such as water cooling and quenching after holding at a temperature of 980 ° C. for 30 minutes, and the surface was cut to a plate thickness of 8 mm.
In this state, cold rolling and intermediate annealing (temperature: kept at 500 ° C. for 1 hour) are repeatedly performed, and final rolling is performed at a rolling reduction of 50% to obtain a cold-rolled material having a thickness of 0.25 mm. Specifically, by subjecting this to low-temperature annealing at a temperature of 350 ° C. for 5 minutes, the Cu alloy terminal / connector material (hereinafter referred to as “terminal / connector material”) of the present invention is obtained.
9. Comparative Cu alloy terminal / connector material (hereinafter referred to as comparative terminal / connector material) 1 to 8 and conventional Cu alloy terminal / connector material (hereinafter referred to as conventional terminal / connector material) 1 to 3 were manufactured, respectively. . The comparison terminal
The connector materials 1 to 8 have a component content of any of the components constituting the Cu alloy (marked with * in Table 2) outside the scope of the present invention. Nos. 3 to 3 correspond to the above-mentioned JP-A-61-183426.
Publication, page 3, Cu-Ti-Zr described in Table 1
Alloy, Cu-Ti-Ni alloy, and Cu-Ti-Ni
-It is composed of a Cu alloy having a composition corresponding to a Cr alloy.

【0009】つぎに、この結果得られた各種の端子・コ
ネクタ素材について、強度、伸び、および導電率(IA
CS%)を測定し、ばね性を評価する目的で、ばね限界
値を測定し、さらに繰り返し曲げ試験、めっき密着性試
験、およびはんだの耐剥離性試験を行ない、それぞれ曲
げ加工性、めっき密着性、およびはんだ密着性を評価し
た。なお、ばね限界値は、JIS・H3130の繰り返
したわみ式試験により測定した。また、繰り返し曲げ試
験は、幅:10mm×長さ:200mm×厚さ:0.25mm
の寸法をもった試片を長さ方向に直立させた状態で、そ
の中心より下方部をコーナー部に0.2mmRの面取りを
施したブロック(50mm×50mm×50mm)で両側から
はさんで支持し、この試片中心を曲げ部とし、左右交互
に90°づつ繰り返し曲げを施すことによって行ない、
前記試片中心曲げ部が破断するまでの曲げ回数(90°
曲げを1回とする)を測定した。めっき密着性試験は、
幅:35mm×長さ:100mm×厚さ:0.25mmの寸法
をもった試片に、平均層厚:2μmの電気Agめっきを
施し、これに温度:400℃に3分間保持後、放冷の熱
処理を施し、熱処理後の「ふくれ」発生の有無を観察す
ることにより行なった。さらに、はんだの耐剥離性試験
は、63%Sn−37%Pbの組成をもった共晶はんだ
を用い、幅:10mm×長さ:30mm×厚さ:0.25mm
の寸法をもった試片を前記はんだの230℃の浴中に浸
漬して、その表面に前記はんだを付着させ、この状態
で、温度:150℃に1000時間、および100℃に
10000時間の条件で加熱することにより行ない、加
熱温度が150℃の場合は100時間毎に、また加熱温
度が100℃の場合は1000時間毎に取り出して、試
片とはんだの界面(断面)を光学顕微鏡で観察し、剥離
発生時間をチェックした。これらの結果を表1,2に示
した。
Next, the strength, elongation, and electrical conductivity (IA) of various terminal / connector materials obtained as a result are described.
CS%), and for the purpose of evaluating the spring property, the spring limit value is measured. Further, a repeated bending test, a plating adhesion test, and a solder peeling resistance test are performed. , And solder adhesion were evaluated. The spring limit value was measured by a JIS H3130 repeated bending test. In the repeated bending test, width: 10 mm x length: 200 mm x thickness: 0.25 mm
In the state where the specimen having the size of is upright in the length direction, the lower part from the center is supported by a block (50 mm × 50 mm × 50 mm) with a 0.2 mmR chamfered corner at the corner. The center of the test piece is defined as a bent portion, and the test piece is repeatedly bent by 90 ° alternately on the left and right sides.
Number of bends (90 °
Bending is performed once). The plating adhesion test
Specimens having dimensions of width: 35 mm × length: 100 mm × thickness: 0.25 mm were subjected to electro-Ag plating with an average layer thickness of 2 μm, which was kept at a temperature of 400 ° C. for 3 minutes and then allowed to cool. Was performed by observing the presence or absence of “bulging” after the heat treatment. Further, in the peeling resistance test of the solder, a eutectic solder having a composition of 63% Sn-37% Pb was used, and the width: 10 mm × length: 30 mm × thickness: 0.25 mm
Is immersed in a 230 ° C. bath of the solder to adhere the solder to the surface. In this state, the temperature is set to 150 ° C. for 1000 hours and to 100 ° C. for 10000 hours. The sample is taken out every 100 hours when the heating temperature is 150 ° C. and every 1000 hours when the heating temperature is 100 ° C., and the interface (cross section) between the sample and the solder is observed with an optical microscope. Then, the peeling time was checked. The results are shown in Tables 1 and 2.

【0010】[0010]

【表1】 [Table 1]

【0011】[0011]

【表2】 [Table 2]

【0012】[0012]

【発明の効果】表1,2に示される結果から、本発明端
子・コネクタ素材1〜9は、いずれも従来端子・コネク
タ素材1〜3のうちの最もすぐれた特性を有する従来端
子・コネクタ3と同等の良好な強度、伸び、導電性、め
っき密着性、およびはんだ密着性を有する一方、ばね性
および曲げ加工性に関しては、前記従来端子・コネクタ
素材1〜3に比して著しくすぐれたものになっており、
また比較端子・コネクタ素材1〜8に見られるように、
Cu合金の構成成分のうちのいずれかの成分含有量でも
この発明の範囲から外れると上記特性のうち少なくとも
いずれかの特性が劣ったものになることが明らかであ
る。上述のように、この発明のCu合金製端子・コネク
タ材は、これに要求される導電率、めっき密着性、およ
びはんだ密着性を十分満足して具備した上で、さらに一
段とすぐれたばね性および曲げ加工性を有しているの
で、近年の電気機器の小型化および高性能化に対応でき
る薄肉化および形状複雑化を可能とし、すぐれた性能を
発揮することができるのである。
According to the results shown in Tables 1 and 2, the terminal / connector materials 1 to 9 according to the present invention have the best characteristics among the conventional terminal / connector materials 1 to 3. While having the same good strength, elongation, conductivity, plating adhesion, and solder adhesion as those of the above, the spring property and bending workability are significantly better than those of the conventional terminal / connector materials 1-3. It has become
Also, as seen in the comparison terminal and connector materials 1 to 8,
It is clear that even if the content of any one of the constituent components of the Cu alloy is out of the range of the present invention, at least one of the above-mentioned characteristics will be inferior. As described above, the Cu alloy terminal / connector material of the present invention has sufficient electrical conductivity, plating adhesion, and solder adhesion, and further excellent spring properties and bending. Since it has workability, it is possible to make the electric equipment thinner and more complicated in shape to cope with recent miniaturization and higher performance of electric equipment, and to exhibit excellent performance.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 Ni:1〜3.5%、 Ti:0.
3〜1.5%、 Cr:0.2〜1%、 Zr:0.05〜0.5
%、を含有し、残りがCuと不可避不純物からなる組成
(以上重量%)を有するCu合金で構成したことを特徴
とするばね性および曲げ加工性のすぐれたCu合金製端
子・コネクタ材。
1. Ni: 1 to 3.5%, Ti: 0.1%.
3 to 1.5%, Cr: 0.2 to 1%, Zr: 0.05 to 0.5
%, With the balance being composed of a Cu alloy having a composition (more than weight%) consisting of Cu and unavoidable impurities.
JP9116783A 1997-05-07 1997-05-07 Terminal-connector material made of cu alloy Pending JPH1081927A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9116783A JPH1081927A (en) 1997-05-07 1997-05-07 Terminal-connector material made of cu alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9116783A JPH1081927A (en) 1997-05-07 1997-05-07 Terminal-connector material made of cu alloy

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP63199471A Division JP2689507B2 (en) 1988-08-10 1988-08-10 Cu alloy terminal and connector materials

Publications (1)

Publication Number Publication Date
JPH1081927A true JPH1081927A (en) 1998-03-31

Family

ID=14695606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9116783A Pending JPH1081927A (en) 1997-05-07 1997-05-07 Terminal-connector material made of cu alloy

Country Status (1)

Country Link
JP (1) JPH1081927A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1586667A1 (en) * 2004-04-14 2005-10-19 Mitsubishi Shindoh Co., Ltd. Copper alloy and method of manufacturing the same
JP2005539140A (en) * 2002-09-13 2005-12-22 オリン コーポレイション Age-hardening copper-based alloy and manufacturing method
WO2007052438A1 (en) * 2005-11-01 2007-05-10 Advanced Systems Japan Inc. Spiral contact and process for producing the same
US7416763B2 (en) 2003-06-18 2008-08-26 Cookson Electronics Co. Process for forming metal layers

Cited By (8)

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JP2005539140A (en) * 2002-09-13 2005-12-22 オリン コーポレイション Age-hardening copper-based alloy and manufacturing method
US7416763B2 (en) 2003-06-18 2008-08-26 Cookson Electronics Co. Process for forming metal layers
EP1586667A1 (en) * 2004-04-14 2005-10-19 Mitsubishi Shindoh Co., Ltd. Copper alloy and method of manufacturing the same
US7338631B2 (en) 2004-04-14 2008-03-04 Mitsubishi Shindoh Co., Ltd. Copper alloy and method of manufacturing the same
US7485200B2 (en) 2004-04-14 2009-02-03 Mitsubishi Shindoh Co., Ltd. Copper alloy and method of manufacturing the same
WO2007052438A1 (en) * 2005-11-01 2007-05-10 Advanced Systems Japan Inc. Spiral contact and process for producing the same
JP2007128684A (en) * 2005-11-01 2007-05-24 Advanced Systems Japan Inc Spiral contact and its manufacturing method
JP4644762B2 (en) * 2005-11-01 2011-03-02 株式会社アドバンストシステムズジャパン Spiral contact and method for manufacturing the same

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