JP2689507B2 - Cu alloy terminal and connector materials - Google Patents

Cu alloy terminal and connector materials

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Publication number
JP2689507B2
JP2689507B2 JP63199471A JP19947188A JP2689507B2 JP 2689507 B2 JP2689507 B2 JP 2689507B2 JP 63199471 A JP63199471 A JP 63199471A JP 19947188 A JP19947188 A JP 19947188A JP 2689507 B2 JP2689507 B2 JP 2689507B2
Authority
JP
Japan
Prior art keywords
solder
alloy
terminal
materials
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63199471A
Other languages
Japanese (ja)
Other versions
JPH0249371A (en
Inventor
正男 小林
卓郎 岩村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
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Filing date
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Priority to JP63199471A priority Critical patent/JP2689507B2/en
Publication of JPH0249371A publication Critical patent/JPH0249371A/en
Application granted granted Critical
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Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、特にすぐれたばね性と曲げ加工性を有
し、さらに導電性並びにめっきおよびはんだ密着性の良
好なCu合金製端子・コネクタ材に関するものである。
TECHNICAL FIELD The present invention relates to a Cu alloy terminal / connector material having particularly excellent spring properties and bending workability, as well as good conductivity, plating and solder adhesion. It is a thing.

〔従来の技術〕[Conventional technology]

一般に、端子、コネクタ、リレー、さらにスイッチな
ど(以下、これらを総称して端子・コネクタという)の
製造に用いられる材料には、 (a) 疲労などによって接触圧力の低下が生じないた
めの高いばね性、 (b) 曲げ加工の際に割れが生じないための良好な曲
げ加工性、 (c) 接触部での電圧降下損をなくすための高い導電
性、 (d) 良好なめっきおよびはんだの密着性、 以上(a)〜(d)に示される特性をもつことが要求さ
れることから、例えば特開昭61−183426号公報、第3
頁、第1表に記載されるCu−Ti−Zr合金やCu−Ti−Ni合
金、さらにCu−Ti−Ni−Cr合金などのCu合金が用いられ
ている。
In general, materials used for manufacturing terminals, connectors, relays, switches and the like (hereinafter collectively referred to as terminals and connectors) include (a) a high spring for preventing contact pressure from decreasing due to fatigue or the like. (B) Good bendability to prevent cracks from occurring during bending, (c) High conductivity to eliminate voltage drop loss at the contact area, (d) Good plating and solder adhesion Since it is required to have the characteristics shown in the above (a) to (d), for example, Japanese Patent Laid-Open No. 61-183426, No. 3,
Cu alloys such as Cu-Ti-Zr alloys, Cu-Ti-Ni alloys, and Cu-Ti-Ni-Cr alloys described in Table 1 and Table 1 are used.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

一方、近年の電気機器の小型化および高性能化はめざ
ましく、これに伴ってこれらの構造部材である端子・コ
ネクタにも薄肉化および形状複雑化が強く要求されるよ
うになっている。
On the other hand, the recent miniaturization and high performance of electrical equipment have been remarkable, and accordingly, thinning and complicated shape of terminals and connectors, which are these structural members, have been strongly demanded.

しかし、上記の従来Cu合金製端子・コネクタ材は、特
にばね性および曲げ加工性が不十分なために、これらの
要求に満足に対応することができないのが現状である。
However, the above-mentioned conventional Cu alloy terminal / connector material cannot satisfy these requirements at present because of its insufficient spring property and bending workability.

〔課題を解決するための手段〕[Means for solving the problem]

そこで、本発明者等は、上述のような観点から、特に
ばね性と曲げ加工性にすぐれた端子・コネクタ材を開発
すべく研究を行なった結果、端子・コネクタ材を、重量
%で(以下%は重量%を示す)、 Ni:1〜3.5%、Ti:0.3〜1.5%、 Cr:0.2〜1%、Zr:0.05〜0.5%、 を含有し、さらに、 Mg:0.001〜0.2%、Zr:0.05〜0.5%、 のうちの1種または2種、 を含有し、残りがCuと不可避不純物からなる組成を有す
るCu合金で構成すると、この結果のCu合金製端子・コネ
クタは、すぐれたばね性と曲げ加工性を有し、かつ良好
な強度、導電性、並びにめっきおよびはんだ密着性を具
備するようになるという知見を得たのである。
Therefore, as a result of conducting research to develop a terminal / connector material excellent in spring property and bending workability from the above viewpoints, the present inventors have found that the terminal / connector material is % Indicates weight%), Ni: 1 to 3.5%, Ti: 0.3 to 1.5%, Cr: 0.2 to 1%, Zr: 0.05 to 0.5%, and Mg: 0.001 to 0.2%, Zr. : 0.05-0.5%, one or two of them, and the rest being composed of a Cu alloy having a composition of Cu and inevitable impurities, the resulting Cu alloy terminal / connector has excellent spring properties. It has been found that it has bending workability, and also has good strength, conductivity, and plating and solder adhesion.

この発明は、上記知見にもとづいてさなれたものであ
って、以下に成分組成範囲を上記の通りに限定した理由
を説明する。
The present invention has been made based on the above findings, and the reason why the component composition range is limited as described above will be described below.

(a) NiおよびTi これら2成分は、結合して、結晶粒内(素地中)に微
細に分散析出する金属間化合物(NixTiy)を形成し、も
ってばね性を飛躍的に向上させる作用があるが、その含
有量がNiおよびTiのいずれかでも、Niにあっては1%未
満、Tiにあっては0.3%未満になると、金属間化合物の
析出量が不十分となって所望のすぐれたばね性を確保す
ることができず、一方NiおよびTiのいずれかでも、Niに
あっては3.5%、Tiにあっては1.5%を越えると、主成分
であるCuによってもたらされるすぐれた導電性が損なわ
れるようになることから、その含有量を、Ni:1〜3.5
%、Ti:0.3〜1.5%と定めた。
(A) Ni and Ti These two components are combined to form an intermetallic compound (Ni x Ti y ) which is finely dispersed and precipitated in the crystal grains (in the base material), and thus the spring property is dramatically improved. Although it has an effect, if the content of either Ni or Ti is less than 1% for Ni and less than 0.3% for Ti, the precipitation amount of intermetallic compounds becomes insufficient, which is desirable. It is not possible to secure the excellent springiness of the alloy, while if either Ni or Ti exceeds 3.5% for Ni and 1.5% for Ti, it is excellent due to Cu as the main component. Since the conductivity will be impaired, the content should be Ni: 1 to 3.5.
%, Ti: 0.3 to 1.5%.

(b) Cr 端子・コネクタ材には、製造工程中はんだ付けが施さ
れる場合があるが、この施されたはんだが、例えば高温
環境での使用に際しても剥離しないことが必要であっ
て、Cr成分が主成分たるCuによってもたらされるすぐれ
ためっき性を損なうことなくはんだの密着性を向上させ
る作用をもつものである。すなわちCr成分は、母材とは
んだ層との界面に拡散し、バリアー(障壁)となって、
一般に界面に生成する化合物層、例えばCu3Sn(ε相)
やCu6Sn5(η相)の成長を著しく抑制し、もってはんだ
の密着性を向上させる作用をもつが、その含有量が0.2
%未満では前記作用に所望の効果が得られず、一方その
含有量が1%を越えると、粗大なCr晶出物が発生するよ
うになって、めっきの密着性が阻害されるようになるほ
か、溶解・鋳造が困難になることから、その含有量を0.
2〜1%と定めた。
(B) Cr The terminal / connector material may be soldered during the manufacturing process. It is necessary that this solder does not peel off even when used in a high temperature environment. It has the function of improving the adhesiveness of the solder without impairing the excellent plating properties brought about by the main component Cu. That is, the Cr component diffuses into the interface between the base material and the solder layer, forming a barrier (barrier),
A compound layer that generally forms at the interface, such as Cu 3 Sn (ε phase)
And Cu 6 Sn 5 (η phase) growth was significantly inhibited in, but with the effect of improving the adhesion of the solder with, the content is 0.2
If the content is less than 0.1%, the desired effect cannot be obtained, while if the content exceeds 1%, coarse Cr crystallized substances are generated and the adhesion of the plating is impaired. In addition, its melting and casting becomes difficult, so its content is set to 0.
Specified as 2-1%.

(c) Zr Zr成分は、Cr成分によってもたらされるバリアー作用
並びに化合物成長抑制作用を促進させ、もってすぐれた
はんだの耐剥離性を確保するのに不可欠の成分であり、
またZr成分には、Cuと結合して、結晶粒内および結晶粒
界に微細に析出するCu3Zrなどの金属間化合物を形成す
るほか、結晶粒を微細化して、延性を向上させ、もって
曲げ加工性を向上させ、さらに前記Cu3Zrの金属間化合
物とNixTiyの微細析出分散の金属間化合物との共存にお
いて、ばね性を一段と向上させる作用があるが、その含
有量が0.05%未満では前記作用に所望の効果が得られ
ず、一方その含有量が0.5%を越えると、溶解・鋳造が
困難になるばかりでなく、介在物の多量の発生によって
めっき密着性が阻害されるようになることから、その含
有量を0.05〜0.5%と定めた。
(C) Zr Zr component is an essential component for promoting the barrier action and the compound growth inhibiting action provided by the Cr component and ensuring the excellent solder peeling resistance.
In addition, in the Zr component, in addition to forming an intermetallic compound such as Cu 3 Zr which is finely precipitated in the crystal grains and in the crystal grain boundaries by combining with Cu, the crystal grains are refined to improve the ductility. Bending workability is improved, and further, in the coexistence of the intermetallic compound of Cu 3 Zr and the intermetallic compound of fine precipitation dispersion of Ni x Ti y , there is an action of further improving the spring property, but the content is 0.05. If it is less than 0.1%, the desired effect cannot be obtained, while if its content exceeds 0.5%, not only melting and casting become difficult, but also the plating adhesion is impaired by the generation of a large amount of inclusions. Therefore, the content was determined to be 0.05 to 0.5%.

(d) MgおよびZn これらの成分には、Crとの共存において、はんだの密
着性を一層改善する作用があるが、その含有量が、Mg:
0.001%未満およびZn:0.05%未満では前記作用に所望の
向上効果が得られず、一方その含有量が、Mg:0.2%およ
びZn:0.5%を越えると、導電性が著しく低下するように
なることから、その含有量を、Mg:0.001〜0.2%、Zn:0.
05〜0.5%とそれぞれ定めた。
(D) Mg and Zn These components have the effect of further improving the solder adhesion in the coexistence with Cr, but their contents are Mg:
If it is less than 0.001% and Zn: less than 0.05%, the desired improving effect on the above action cannot be obtained. On the other hand, if its content exceeds Mg: 0.2% and Zn: 0.5%, the conductivity is remarkably reduced. Therefore, the content of Mg: 0.001-0.2%, Zn: 0.
It was set as 05-0.5%.

〔実施例〕〔Example〕

つぎに、この発明のCu合金製端子・コネクタ材を実施
例より具体的に説明する。
Next, the Cu alloy terminal / connector material of the present invention will be described more specifically with reference to Examples.

通常の真空溶解炉を用い、黒鉛るつぼ中で、それぞれ
第1表に示される成分組成をもったCu合金溶湯を5kgづ
つ溶製し、金型に鋳造し、面削した後、熱間鍛造および
熱間圧延を施して幅:150mm×厚さ:10mmの板材とし、つ
いでこの板材に、温度:980℃に30分間保持後水冷焼入れ
の溶体化処理を施し、面削して板厚を8mmとした状態
で、冷間圧延と中間焼鈍(温度:500℃に1時間保持)を
繰り返し施し、最終圧延を50%の圧延率で行なって板
厚:0.25mmを有する冷延材とし、最終的にこれに温度:35
0℃に5分間保持の条件で低温焼鈍を施すことによって
本発明Cu合金製端子・コネクタ素材(以下、本発明材と
いう)1〜8、比較Cu合金製端子・コネクタ素材(以
下、比較材という)1,2、および従来Cu合金製端子・コ
ネクタ素材(以下、従来材という)1〜3をそれぞれ製
造した。
Using a normal vacuum melting furnace, in a graphite crucible, 5 kg each of molten Cu alloy having the composition shown in Table 1 was melted, cast into a die, face-polished, hot forged and It is hot-rolled into a plate with a width of 150 mm and a thickness of 10 mm, and then this plate is held at a temperature of 980 ° C for 30 minutes and then subjected to a solution treatment by water-quenching, and then surface-shaved to a thickness of 8 mm In this state, cold rolling and intermediate annealing (temperature: held at 500 ° C for 1 hour) are repeatedly performed, and final rolling is performed at a rolling rate of 50% to obtain a cold rolled material having a plate thickness of 0.25 mm, and finally Temperature to this: 35
The present invention Cu alloy terminal / connector material (hereinafter referred to as the present invention material) 1 to 8 and comparative Cu alloy terminal / connector material (hereinafter referred to as the comparative material) by low-temperature annealing under the condition of holding at 0 ° C for 5 minutes ) 1, 2 and conventional Cu alloy terminal / connector materials (hereinafter referred to as conventional materials) 1 to 3 were manufactured.

なお、比較材1,2は、Cu合金を構成するMgまたはZn成
分の含有量(第1表に※印を付す)がこの発明の範囲か
ら高い方に外れたものであり、また従来材1〜3は、先
に述べた特開昭61−183426号公報、第3頁、第1表に記
載されるCu−Ti−Zr合金、Cu−Ti−Ni合金、およびCu−
Ti−Ni−Cr合金に相当する組成をもったCu合金で構成さ
れたものである。
The comparative materials 1 and 2 are those in which the content of the Mg or Zn component constituting the Cu alloy (marked with * in Table 1) is outside the range of the present invention, and the conventional material 1 3 to 3 are Cu-Ti-Zr alloys, Cu-Ti-Ni alloys, and Cu-described in JP-A-61-183426, page 3, page 1 described above.
It is composed of a Cu alloy having a composition equivalent to that of a Ti-Ni-Cr alloy.

つぎに、この結果得られた本発明材1〜8、比較材1,
2、および従来材1〜3について、強度、伸び、および
導電率(IACS%)を測定し、ばね性を評価する目的で、
ばね限界値を測定し、さらに繰り返し曲げ試験、めっき
密着性試験、およびはんだの耐剥離性試験を行ない、そ
れぞれ曲げ加工性、めっき密着性、およびはんだ密着性
を評価した。
Next, the invention materials 1 to 8 and the comparative material 1 obtained as a result
For the purpose of evaluating the spring property by measuring the strength, elongation, and electrical conductivity (IACS%) of 2, and the conventional materials 1 to 3,
The spring limit value was measured, and a bending test, a plating adhesion test, and a solder peeling resistance test were repeated to evaluate bending workability, plating adhesion, and solder adhesion, respectively.

なお、ばね限界値は、JIS・H3130の繰り返したわみ式
試験により測定した。
The spring limit value was measured by the JIS-H3130 repeated flexure test.

また、繰り返し曲げ試験は、幅:10mm×長さ:200mm×
厚さ:0.25mmの寸法を もった試片を長さ方向に直立させた状態で、その中心よ
り下方部をコーナー部に0.2mmRの面取りを施したブロッ
ク(50mm×50mm×50mm)で面側からはさんで支持し、こ
の試片中心を曲げ部とし、左右交互に90゜づつ繰り返し
曲げを施すことによって行ない、前記試片中心曲げ部が
破断するまでの曲げ回数(90゜曲げを1回とする)を測
定した。
In addition, repeated bending test, width: 10 mm × length: 200 mm ×
Thickness: 0.25mm dimension With the test piece held upright in the length direction, the lower part from the center is supported by a block (50 mm × 50 mm × 50 mm) with a chamfered 0.2 mm R at the corner from the surface side, The test piece center was used as a bent portion, and the test piece center was bent repeatedly by 90 °, and the number of times of bending until the test piece center bent portion was broken (90 ° bending was once) was measured.

めっき密着性試験は、幅:35mm×長さ:100mm×厚さ:0.
25mmの寸法をもった試片に、平均層厚:2μmの電気Agめ
っきを施し、これに温度:400℃に3分間保持後、放冷の
熱処理を施し、熱処理後の「ふくれ」発生の有無を観察
することにより行なった。
Plating adhesion test, width: 35 mm × length: 100 mm × thickness: 0.
A sample with a size of 25 mm was electroplated with an average layer thickness of 2 μm and kept at a temperature of 400 ° C for 3 minutes, and then heat-treated for cooling, and there was no blister after heat treatment. Was observed.

さらに、はんだの耐剥離性試験は、63%Sn−37%Pbの
組成をもった共晶はんだを用い、幅:10mm×長さ:30mm×
厚さ:0.25mmの寸法をもった試片を前記はんだの230℃の
浴中に浸漬して、その表面に前記はんだを付着させ、こ
の状態で、温度:150℃に1000時間、および100℃に10000
時間の条件で加熱することにより行ない、加熱温度が15
0℃の場合は100時間毎に、また加熱温度が100℃の場合
は1000時間毎に取り出して、試片とはんだの界面(断
面)を光学顕微鏡で観察し、剥離発生時間をチェックし
た。これらの結果を第2表に示した。
Further, the solder peeling resistance test uses a eutectic solder having a composition of 63% Sn-37% Pb, width: 10 mm × length: 30 mm ×
Thickness: A sample with a dimension of 0.25 mm is immersed in a bath of the solder at 230 ° C to adhere the solder to the surface, and in this state, the temperature is 150 ° C for 1000 hours, and 100 ° C. At 10000
The heating temperature is 15 for 15 hours.
When the temperature was 0 ° C, the sample was taken out every 100 hours, and when the heating temperature was 100 ° C, the sample was taken out every 1000 hours, and the interface (cross section) between the sample and the solder was observed with an optical microscope to check the peeling occurrence time. Table 2 shows the results.

〔発明の効果〕〔The invention's effect〕

第1,2表に示される結果から、本発明材1〜8は、い
ずれも従来材1〜3のうちの最もすぐれた特性を有する
従来材3に比して、特に近年の端子・コネクタ材に要求
されるばね性および曲げ加工性にすぐれ、かつ伸びおよ
びはんだ密着性にもすぐれ、また従来材1,2との比較に
おいても、強度、ばね性、曲げ加工性、およびはんだ密
着性にすぐれ、一方従来材1〜3に比して導電性に劣る
が、端子・コネクタ材に要求される50IACS%以上の導電
率を示すので問題はなく、さらに比較材1,2に見られる
ように、MgまたはZnの含有量がこの発明の範囲を外れて
高くなると、特に導電率が40IACS%以下に低下してしま
うことが明らかである。
From the results shown in Tables 1 and 2, the present invention materials 1 to 8 are particularly recent terminal / connector materials as compared with the conventional material 3 having the best characteristics among the conventional materials 1 to 3. Excellent in spring property and bending workability as well as excellent elongation and solder adhesion, and also superior in strength, spring property, bending workability, and solder adhesion compared with conventional materials 1 and 2. On the other hand, although it is inferior in conductivity to the conventional materials 1 to 3, there is no problem because it exhibits a conductivity of 50 IACS% or more required for the terminal / connector material, and as seen in the comparative materials 1 and 2, It is clear that when the content of Mg or Zn is out of the range of the present invention and becomes high, the electric conductivity is particularly lowered to 40 IACS% or less.

上述のように、この発明のCu合金製端子・コネクタ材
は、これに要求される導電率、めっき密着性、およびは
んだ密着性を十分満足して具備した上で、さらに一段と
すぐれたばね性および曲げ加工性を有しているので、近
年の電気機器の小型化および高性能化に対応できる薄肉
化および形状複雑化を可能とし、すぐれた性能を発揮す
ることができるのである。
As described above, the Cu alloy terminal / connector material of the present invention sufficiently satisfies the required conductivity, plating adhesion, and solder adhesion, and further has excellent spring property and bending property. Since it has workability, it can be made thinner and more complicated in shape to cope with recent miniaturization and higher performance of electric devices, and can exhibit excellent performance.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】Ni:1〜3.5%、Ti:0.3〜1.5%、 Cr:0.2〜1%、Zr:0.05〜0.5%、 を含有し、さらに、 Mg:0.001〜0.2%、Zn:0.05〜0.5%、 のうちの1種または2種、 を含有し、残りがCuと不可避不純物からなる組成(以上
重量%)を有するCu合金で構成したことを特徴とするば
ね性および曲げ加工性のすぐれたCu合金製端子・コネク
タ材。
1. Ni: 1 to 3.5%, Ti: 0.3 to 1.5%, Cr: 0.2 to 1%, Zr: 0.05 to 0.5%, and further Mg: 0.001 to 0.2%, Zn: 0.05 to 0.5%, 1 type or 2 types of them, and the balance is made of a Cu alloy having a composition of Cu and inevitable impurities (above weight%), which is excellent in spring property and bendability. Cu alloy terminal / connector material.
JP63199471A 1988-08-10 1988-08-10 Cu alloy terminal and connector materials Expired - Fee Related JP2689507B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63199471A JP2689507B2 (en) 1988-08-10 1988-08-10 Cu alloy terminal and connector materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63199471A JP2689507B2 (en) 1988-08-10 1988-08-10 Cu alloy terminal and connector materials

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9116783A Division JPH1081927A (en) 1997-05-07 1997-05-07 Terminal-connector material made of cu alloy

Publications (2)

Publication Number Publication Date
JPH0249371A JPH0249371A (en) 1990-02-19
JP2689507B2 true JP2689507B2 (en) 1997-12-10

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Country Status (1)

Country Link
JP (1) JP2689507B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005539140A (en) * 2002-09-13 2005-12-22 オリン コーポレイション Age-hardening copper-based alloy and manufacturing method

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JPS6250428A (en) * 1985-08-29 1987-03-05 Furukawa Electric Co Ltd:The Copper alloy for electronic appliance

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* Cited by examiner, † Cited by third party
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JP2005539140A (en) * 2002-09-13 2005-12-22 オリン コーポレイション Age-hardening copper-based alloy and manufacturing method

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