JPH10512092A - 単結晶の窓および整合アノードを備える電子ビーム装置 - Google Patents
単結晶の窓および整合アノードを備える電子ビーム装置Info
- Publication number
- JPH10512092A JPH10512092A JP8521265A JP52126596A JPH10512092A JP H10512092 A JPH10512092 A JP H10512092A JP 8521265 A JP8521265 A JP 8521265A JP 52126596 A JP52126596 A JP 52126596A JP H10512092 A JPH10512092 A JP H10512092A
- Authority
- JP
- Japan
- Prior art keywords
- film
- membrane
- fluid
- electrons
- major surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
- H01J33/02—Details
- H01J33/04—Windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/18—Windows permeable to X-rays, gamma-rays, or particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
- B29C2035/0877—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using electron radiation, e.g. beta-rays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2007/00—Flat articles, e.g. films or sheets
- B29L2007/008—Wide strips, e.g. films, webs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/34—Electrical apparatus, e.g. sparking plugs or parts thereof
- B29L2031/3462—Cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
- H01J2237/164—Particle-permeable windows
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Lasers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.電子ビーム装置であって、 概ね真空の室を定める気体を透過させる本体を含み、前記本体は、薄い、電子 を透過させ、気体を透過させない単結晶の膜を含み、前記膜は第1および第2の 主表面を有し、前記第1の主表面は前記室に近接し、さらに、 前記膜より離れて前記室内に電子を発生させるための手段と、 前記膜から離して配置され前記膜近くよりもより負の電位で保たれるカソード を備える、前記電子を前記膜に向けて加速させるための手段とを含む、電子ビー ム装置。 2.前記電子を前記膜に向けて加速させるための前記手段は、前記膜に接続され る結晶性アノードを含む、請求項1に記載の装置。 3.前記第2の主表面に近接して少なくとも1つの支持構造が横切る開口部が貫 通する前記本体に取付けられる結晶性の層をさらに含む、請求項1に記載の装置 。 4.前記本体に取付けられ、前記第2の主表面に近接する開口部を定める固体の 層をさらに含み、前記固体の層は前記開口部と流体で連通する複数のマイクロチ ャネルを有する、請求項1に記載の装置。 5.前記マイクロチャネルを流れ前記第2の主表面を通過する流体をさらに含む 、請求項4に記載の装置。 6.前記主表面の少なくとも1つは、複数の窪みを分離させる少なくとも1つの 隆起部を有する、請求項1に記載の装置。 7.前記膜は、前記第1および第2の主表面の少なくとも1つに沿い圧縮される 、請求項1に記載の装置。 8.前記アノードに接続され前記アノードに衝突する前記電子の流れをモニタす るための手段をさらに含む、請求項2に記載の装置。 9.前記第2の主表面に近接して間隔を置かれて設けられる、第2の、電子を透 過させ、気体を透過させない単結晶の膜と、 前記膜の間に配置される熱交換流体とをさらに含む、請求項1に記載の装置。 10.前記流体は、前記室内の圧力よりも大きく前記本体の外側の周囲圧力より も小さな圧力を有するため、前記流体は前記室と前記周囲圧力との間の差圧と比 較し、前記膜への差圧を減じさせる、請求項9に記載の装置。 11.前記第2の主表面に近接して配置される乱流を伴う流体をさらに含み、前 記膜からの熱は前記第2の主表面から迅速に移動する、請求項1に記載の装置。 12.前記第2の主表面に共通する温度および圧力でのならびに前記膜の融点よ りも低い沸点を有する、前記第2の主表面に近接して配置される流体をさらに含 み、前記流体は前記第2の主表面に近接して液体状態から気体状態へと変化する ため、熱が前記膜から吸収される、請求項1に記載の装置。 13.前記流体は前記第2の主表面を横切り移動する流体のパルスで配置され、 前記電子は前記膜を通して移動する電子パルスで配置され、前記流体パルスおよ び前記電子パルスは前記膜を概ね別のときに通過する、請求項12に記載の装置 。 14.前記単結晶は本質的にIV族の原子種からなる、請求項1に記載の装置。 15.前記単結晶は本質的にIII族およびV族の原子種からなる、請求項1に 記載の装置。 16.前記アノードは主としてシリコンである、請求項2に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US369,127 | 1982-04-16 | ||
US08/369,127 US5612588A (en) | 1993-05-26 | 1995-01-05 | Electron beam device with single crystal window and expansion-matched anode |
PCT/US1996/000272 WO1996021238A1 (en) | 1995-01-05 | 1996-01-03 | Electron beam device with single crystal window and matching anode |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10512092A true JPH10512092A (ja) | 1998-11-17 |
JP3899524B2 JP3899524B2 (ja) | 2007-03-28 |
Family
ID=23454190
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52126596A Expired - Lifetime JP3899524B2 (ja) | 1995-01-05 | 1996-01-03 | 単結晶の窓および整合アノードを備える電子ビーム装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US5612588A (ja) |
EP (1) | EP0871972B1 (ja) |
JP (1) | JP3899524B2 (ja) |
KR (1) | KR100385583B1 (ja) |
AU (1) | AU685350B2 (ja) |
CA (1) | CA2209593A1 (ja) |
DE (1) | DE69635189T2 (ja) |
TW (1) | TW282551B (ja) |
WO (1) | WO1996021238A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1684557A2 (en) | 2005-01-24 | 2006-07-26 | Ushiodenki Kabushiki Kaisha | Extreme UV radiation source device and method for eliminating debris which forms within the device |
WO2008062668A1 (fr) * | 2006-11-24 | 2008-05-29 | Hamamatsu Photonics K.K. | Dispositif de rayonnement de faisceau d'électrons |
JP5070616B1 (ja) * | 2012-03-09 | 2012-11-14 | レーザーテック株式会社 | プラズマシールド装置及びプラズマ光源装置 |
Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5909032A (en) * | 1995-01-05 | 1999-06-01 | American International Technologies, Inc. | Apparatus and method for a modular electron beam system for the treatment of surfaces |
US6140755A (en) * | 1996-06-12 | 2000-10-31 | American International Technologies, Inc. | Actinic radiation source and uses thereofor |
US6002202A (en) * | 1996-07-19 | 1999-12-14 | The Regents Of The University Of California | Rigid thin windows for vacuum applications |
DE19810922A1 (de) * | 1998-03-13 | 1999-09-30 | Karlsruhe Forschzent | Gastargetfenster |
US7264771B2 (en) * | 1999-04-20 | 2007-09-04 | Baxter International Inc. | Method and apparatus for manipulating pre-sterilized components in an active sterile field |
US6140657A (en) * | 1999-03-17 | 2000-10-31 | American International Technologies, Inc. | Sterilization by low energy electron beam |
US6239543B1 (en) * | 1999-08-23 | 2001-05-29 | American International Technologies, Inc. | Electron beam plasma formation for surface chemistry |
US7424764B2 (en) * | 1999-09-01 | 2008-09-16 | Hagleitner Hygiene International Gmbh | Brush with locking and detaching structure for disposable head |
TW464947B (en) | 1999-11-29 | 2001-11-21 | Ushio Electric Inc | Measuring apparatus of electron beam quantity and processing apparatus of electron beam irradiation |
US7243689B2 (en) * | 2000-02-11 | 2007-07-17 | Medical Instill Technologies, Inc. | Device with needle penetrable and laser resealable portion and related method |
US7100646B2 (en) * | 2000-02-11 | 2006-09-05 | Medical Instill Technologies, Inc. | Sealed containers and methods of making and filling same |
DE10050810A1 (de) * | 2000-10-13 | 2002-04-18 | Philips Corp Intellectual Pty | Verfahren zur Herstellung eines elektronenstrahltransparenten Fensters sowie elektronenstrahltransparentes Fenster |
DE10050811A1 (de) | 2000-10-13 | 2002-04-18 | Philips Corp Intellectual Pty | Elektronenstrahltransparentes Fenster |
US7331944B2 (en) | 2000-10-23 | 2008-02-19 | Medical Instill Technologies, Inc. | Ophthalmic dispenser and associated method |
KR100865599B1 (ko) * | 2000-10-23 | 2008-10-27 | 피 페턴트, 인크. | 유체 분배기 및 유체 분배기 충진 방법 |
US6559424B2 (en) | 2001-01-02 | 2003-05-06 | Mattson Technology, Inc. | Windows used in thermal processing chambers |
AU2002353790A1 (en) * | 2001-10-03 | 2003-04-14 | Medical Instill Technologies, Inc. | Syringe and reconstitution syringe |
JP4405802B2 (ja) * | 2001-10-16 | 2010-01-27 | メディカル・インスティル・テクノロジーズ・インコーポレイテッド | 計量された量の物質を供給するための、密閉チャンバ及び一方向弁を備えたディスペンサ |
US7798185B2 (en) | 2005-08-01 | 2010-09-21 | Medical Instill Technologies, Inc. | Dispenser and method for storing and dispensing sterile food product |
US6696018B2 (en) | 2001-11-14 | 2004-02-24 | Electron Process Company, Llc | System and method for sterilization of biological connections |
US20030226857A1 (en) * | 2002-04-12 | 2003-12-11 | Hyclone Laboratories, Inc. | Systems for forming sterile fluid connections and methods of use |
AU2003251594A1 (en) | 2002-06-19 | 2004-01-06 | Medical Instill Technologies, Inc. | Sterile filling machine having needle filling station within e-beam chamber |
US6977492B2 (en) * | 2002-07-10 | 2005-12-20 | Marvell World Trade Ltd. | Output regulator |
BRPI0313452B1 (pt) * | 2002-08-13 | 2015-07-07 | Medical Instill Tech Inc | Conjunto de válvula e recipiente para armazenar e distribuir substâncias, e método relacionado |
EP1594749B1 (en) * | 2003-01-28 | 2013-05-29 | Medical Instill Technologies, Inc. | Combination of a thermoplastic stopper and a needle, and method of filling a vial using said combination |
EP1631496B1 (en) | 2003-04-28 | 2014-02-26 | Medical Instill Technologies, Inc. | Container with valve assembly for filling and dispensing substances, and apparatus and method for filling |
WO2004101027A2 (en) * | 2003-05-12 | 2004-11-25 | Medical Instill Technologies, Inc. | Dispenser and apparatus for fillling a dispenser |
JP2005003564A (ja) * | 2003-06-13 | 2005-01-06 | Ushio Inc | 電子ビーム管および電子ビーム取り出し用窓 |
US7145988B2 (en) * | 2003-12-03 | 2006-12-05 | General Electric Company | Sealed electron beam source |
US7264142B2 (en) | 2004-01-27 | 2007-09-04 | Medical Instill Technologies, Inc. | Dispenser having variable-volume storage chamber and depressible one-way valve assembly for dispensing creams and other substances |
DE102004013620B4 (de) * | 2004-03-19 | 2008-12-04 | GE Homeland Protection, Inc., Newark | Elektronenfenster für eine Flüssigmetallanode, Flüssigmetallanode, Röntgenstrahler und Verfahren zum Betrieb eines solchen Röntgenstrahlers |
US7148613B2 (en) | 2004-04-13 | 2006-12-12 | Valence Corporation | Source for energetic electrons |
US7197116B2 (en) * | 2004-11-16 | 2007-03-27 | General Electric Company | Wide scanning x-ray source |
WO2006127736A2 (en) * | 2005-05-23 | 2006-11-30 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Silicon substrates with thermal oxide windows for transmission electron microscopy |
US8212225B2 (en) * | 2005-05-13 | 2012-07-03 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | TEM grids for determination of structure-property relationships in nanotechnology |
US7495239B2 (en) * | 2005-12-22 | 2009-02-24 | Asml Netherlands B.V. | Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
US7504643B2 (en) * | 2005-12-22 | 2009-03-17 | Asml Netherlands B.V. | Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
US7656236B2 (en) | 2007-05-15 | 2010-02-02 | Teledyne Wireless, Llc | Noise canceling technique for frequency synthesizer |
US8179045B2 (en) * | 2008-04-22 | 2012-05-15 | Teledyne Wireless, Llc | Slow wave structure having offset projections comprised of a metal-dielectric composite stack |
DE102008031846A1 (de) * | 2008-07-08 | 2010-01-21 | ELROG GmbH & Co. Elektronenröhren KG | Verfahren und Vorrichtung zum Erzeugen eines Elektronenstrahls |
US8699206B1 (en) * | 2009-10-21 | 2014-04-15 | The Board Of Trustees Of The University Of Illinois | Nano vacuum tube arrays for energy storage |
WO2013121078A1 (en) | 2012-02-15 | 2013-08-22 | Hs Foils Oy | Method and arrangement for manufacturing a radiation window |
EP2819708B1 (en) | 2012-02-28 | 2017-08-02 | Life Technologies Corporation | Systems and containers for sterilizing a fluid |
WO2013138258A1 (en) | 2012-03-11 | 2013-09-19 | Mark Larson | Improved radiation window with support structure |
US9535100B2 (en) | 2012-05-14 | 2017-01-03 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor and method for using same |
US9383460B2 (en) | 2012-05-14 | 2016-07-05 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor |
US9202660B2 (en) | 2013-03-13 | 2015-12-01 | Teledyne Wireless, Llc | Asymmetrical slow wave structures to eliminate backward wave oscillations in wideband traveling wave tubes |
FR3006499B1 (fr) * | 2013-05-31 | 2016-11-25 | Commissariat Energie Atomique | Lentille electrostatique a membrane isolante ou semiconductrice |
JP2016211850A (ja) * | 2013-12-19 | 2016-12-15 | 日立造船株式会社 | 電子線照射装置 |
CN105939734B (zh) * | 2014-01-31 | 2019-11-08 | 利乐拉瓦尔集团及财务有限公司 | 用于将包装容器灭菌的装置和方法 |
WO2015113835A1 (en) * | 2014-01-31 | 2015-08-06 | Tetra Laval Holdings & Finance S.A. | Device and method for sterilization of packaging containers |
JP2017512088A (ja) * | 2014-02-25 | 2017-05-18 | テトラ ラバル ホールディングス アンド ファイナンス エス エイ | 殺菌デバイスのためのコンディショニングシステム、殺菌機械および殺菌デバイスを調整するための方法 |
US9576765B2 (en) * | 2014-09-17 | 2017-02-21 | Hitachi Zosen Corporation | Electron beam emitter with increased electron transmission efficiency |
GB2556258B (en) | 2015-06-19 | 2021-07-14 | Larson Mark | High-performance, low-stress support structure with membrane |
US10832885B2 (en) * | 2015-12-23 | 2020-11-10 | Massachusetts Institute Of Technology | Electron transparent membrane for cold cathode devices |
EP3563399A4 (en) * | 2016-12-29 | 2020-07-29 | The University of British Columbia | OPTICALLY ADDRESSED THERMIONIC ELECTRON BEAM DEVICE |
WO2018204470A1 (en) | 2017-05-02 | 2018-11-08 | Spark Thermionics, Inc. | System and method for work function reduction and thermionic energy conversion |
US10818327B2 (en) | 2018-06-29 | 2020-10-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory circuit and method of operating same |
CN113614876A (zh) | 2018-11-06 | 2021-11-05 | 火花热离子学公司 | 用于热离子能量转换的系统和方法 |
AU2021267176B2 (en) | 2020-05-06 | 2024-05-02 | Spark Thermionics, Inc. | System and method for thermionic energy conversion |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3319318A (en) * | 1964-02-24 | 1967-05-16 | Stanford Research Inst | Thin gas tight window assembly |
GB1166053A (en) * | 1966-08-08 | 1969-10-01 | Atomic Energy Authority Uk | Improvements in or relating to Particle Accelerators |
US3486060A (en) * | 1967-09-06 | 1969-12-23 | High Voltage Engineering Corp | Cooling apparatus with laminar flow for electron permeable windows |
US3607680A (en) * | 1967-10-03 | 1971-09-21 | Matsushita Electric Ind Co Ltd | Methof for producing a device for transmitting an electron beam |
US3629576A (en) * | 1970-05-21 | 1971-12-21 | Deltaray Corp | Accelerator tube electrode for focusing a beam of charged particles |
US3702973A (en) * | 1970-09-17 | 1972-11-14 | Avco Corp | Laser or ozone generator in which a broad electron beam with a sustainer field produce a large area, uniform discharge |
DE2151079A1 (de) * | 1971-10-13 | 1973-04-19 | Siemens Ag | Strahlendurchtrittsfenster |
US3883413A (en) * | 1972-09-25 | 1975-05-13 | Avco Corp | Ozone generator using pulsed electron beam and decaying electric field |
US4061944A (en) * | 1975-06-25 | 1977-12-06 | Avco Everett Research Laboratory, Inc. | Electron beam window structure for broad area electron beam generators |
US4095115A (en) * | 1976-12-27 | 1978-06-13 | Accelerators, Inc. | Ozone generation apparatus and method |
US4328443A (en) * | 1980-03-11 | 1982-05-04 | Avco Everett Research Laboratory, Inc. | Apparatus for providing improved characteristics of a broad area electron beam |
US4362965A (en) * | 1980-12-29 | 1982-12-07 | The United States Of America As Represented By The Secretary Of The Army | Composite/laminated window for electron-beam guns |
US4409511A (en) * | 1981-02-23 | 1983-10-11 | Rpc Industries | Phase transition cooled window for broad beam electron gun |
US4468282A (en) * | 1982-11-22 | 1984-08-28 | Hewlett-Packard Company | Method of making an electron beam window |
US4455561A (en) * | 1982-11-22 | 1984-06-19 | Hewlett-Packard Company | Electron beam driven ink jet printer |
FR2581212B1 (fr) * | 1985-04-26 | 1988-06-17 | Commissariat Energie Atomique | Imprimante a canon a electrons |
US4764947A (en) * | 1985-12-04 | 1988-08-16 | The Machlett Laboratories, Incorporated | Cathode focusing arrangement |
US4825123A (en) * | 1986-12-31 | 1989-04-25 | General Electric Company | Two-piece cathode cup |
US4873468A (en) * | 1988-05-16 | 1989-10-10 | Varian Associates, Inc. | Multiple sheet beam gridded electron gun |
US4966663A (en) * | 1988-09-13 | 1990-10-30 | Nanostructures, Inc. | Method for forming a silicon membrane with controlled stress |
US5093602A (en) * | 1989-11-17 | 1992-03-03 | Charged Injection Corporation | Methods and apparatus for dispersing a fluent material utilizing an electron beam |
US5235239A (en) * | 1990-04-17 | 1993-08-10 | Science Research Laboratory, Inc. | Window construction for a particle accelerator |
JPH052100A (ja) * | 1990-10-12 | 1993-01-08 | Toshiba Corp | 電子ビーム照射装置および電子ビーム透過膜の製造方法 |
US5391958A (en) * | 1993-04-12 | 1995-02-21 | Charged Injection Corporation | Electron beam window devices and methods of making same |
US5414267A (en) * | 1993-05-26 | 1995-05-09 | American International Technologies, Inc. | Electron beam array for surface treatment |
-
1995
- 1995-01-05 US US08/369,127 patent/US5612588A/en not_active Expired - Lifetime
-
1996
- 1996-01-03 KR KR1019970704608A patent/KR100385583B1/ko not_active IP Right Cessation
- 1996-01-03 CA CA002209593A patent/CA2209593A1/en not_active Abandoned
- 1996-01-03 AU AU47495/96A patent/AU685350B2/en not_active Ceased
- 1996-01-03 WO PCT/US1996/000272 patent/WO1996021238A1/en active IP Right Grant
- 1996-01-03 EP EP96903392A patent/EP0871972B1/en not_active Expired - Lifetime
- 1996-01-03 DE DE69635189T patent/DE69635189T2/de not_active Expired - Lifetime
- 1996-01-03 JP JP52126596A patent/JP3899524B2/ja not_active Expired - Lifetime
- 1996-01-04 TW TW085100033A patent/TW282551B/zh active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1684557A2 (en) | 2005-01-24 | 2006-07-26 | Ushiodenki Kabushiki Kaisha | Extreme UV radiation source device and method for eliminating debris which forms within the device |
WO2008062668A1 (fr) * | 2006-11-24 | 2008-05-29 | Hamamatsu Photonics K.K. | Dispositif de rayonnement de faisceau d'électrons |
JP5070616B1 (ja) * | 2012-03-09 | 2012-11-14 | レーザーテック株式会社 | プラズマシールド装置及びプラズマ光源装置 |
Also Published As
Publication number | Publication date |
---|---|
AU685350B2 (en) | 1998-01-15 |
JP3899524B2 (ja) | 2007-03-28 |
TW282551B (ja) | 1996-08-01 |
KR19980701219A (ko) | 1998-05-15 |
US5612588A (en) | 1997-03-18 |
WO1996021238A1 (en) | 1996-07-11 |
EP0871972A1 (en) | 1998-10-21 |
KR100385583B1 (ko) | 2003-08-19 |
DE69635189D1 (de) | 2005-10-20 |
AU4749596A (en) | 1996-07-24 |
EP0871972B1 (en) | 2005-09-14 |
CA2209593A1 (en) | 1996-07-11 |
EP0871972A4 (en) | 2000-03-01 |
DE69635189T2 (de) | 2006-07-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3899524B2 (ja) | 単結晶の窓および整合アノードを備える電子ビーム装置 | |
EP0904594B1 (en) | Monolithic anode adapted for inclusion in an actinic radiation source and method of manufacturing the same | |
Wells | Low‐loss image for surface scanning electron microscope | |
US7737614B2 (en) | Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device | |
JP2650930B2 (ja) | 超格子構作の素子製作方法 | |
JPS5814644B2 (ja) | ヒカリデンソウロノセイゾウホウホウ | |
JP5131735B2 (ja) | 面エミッタの製造方法、点エミッタの製造方法及び構造体 | |
WO2017135332A1 (ja) | 超小型加速器および超小型質量分析装置および超小型イオン注入装置 | |
US6472241B2 (en) | Radical cell device and method for manufacturing groups II-VI compound semiconductor device | |
US4831628A (en) | Denices fabricated using method of selective area epitaxial growth using ion beams | |
US5811819A (en) | Electron beam source and its manufacturing method and electron beam source apparatus and electron beam apparatus using the same | |
Ishikawa | The properties of high-intensity impregnated-electrode-type liquid-metal ion sources | |
JPH0778581A (ja) | 単色化電子線源およびその製造方法 | |
JPH0676733A (ja) | 偏極電子線発生素子 | |
JPH0855800A (ja) | プラズマ発生装置 | |
EP0633593A1 (en) | Electrom beam source and electron beam application apparatus and electronic apparatus using the same | |
KR100852764B1 (ko) | 수평 전계방출 반도체 진공관 및 그 제조방법 | |
WO1995034093A1 (fr) | Procede de formation d'un film semi-conducteur fait d'un compose des groupes ii et vi dope a l'azote | |
Toda et al. | Monolithically integrated carbon nanotube bundle field emitters using a double-SOI process | |
JP2006351231A (ja) | 金属酸化物構造体の製造方法 | |
JPH02123739A (ja) | 半導体集積回路装置の製造方法 | |
JP2002343229A (ja) | 電子素子 | |
JPS60130819A (ja) | 分子線エピタクシ−装置 | |
JP2009211987A (ja) | 弾道電子放出源、真空管デバイス、表示デバイス、テラヘルツ放出源、電磁波放出デバイス及びx線源 | |
JPS61242991A (ja) | 粒子線エピタキシヤル装置の粒子線源 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20040216 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20040405 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20040903 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20050906 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051005 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051101 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20051117 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20061205 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20061218 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100112 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110112 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120112 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130112 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130112 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140112 Year of fee payment: 7 |
|
EXPY | Cancellation because of completion of term |