WO2008062668A1 - Dispositif de rayonnement de faisceau d'électrons - Google Patents

Dispositif de rayonnement de faisceau d'électrons Download PDF

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Publication number
WO2008062668A1
WO2008062668A1 PCT/JP2007/071606 JP2007071606W WO2008062668A1 WO 2008062668 A1 WO2008062668 A1 WO 2008062668A1 JP 2007071606 W JP2007071606 W JP 2007071606W WO 2008062668 A1 WO2008062668 A1 WO 2008062668A1
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WO
WIPO (PCT)
Prior art keywords
electron beam
electron
emitted
shape
chamber
Prior art date
Application number
PCT/JP2007/071606
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English (en)
Japanese (ja)
Inventor
Koji Kawai
Tatsuya Matsumura
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Publication of WO2008062668A1 publication Critical patent/WO2008062668A1/fr

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means

Definitions

  • Electron beam irradiation device
  • the present invention relates to an electron beam irradiation apparatus.
  • a chamber that forms an electron beam passage hole, an electron gun that emits an electron beam provided on one end side of the chamber, a plurality of electron guns provided on the other end side of the chamber There exist some which are provided with the electron beam transmission unit which has an electron beam transmission member (for example, refer to patent documents 1).
  • Such an electron beam irradiation apparatus is particularly effective when the area to be irradiated with the electron beam is relatively wide because the electron beam emitted from the electron gun is deflected so as to sequentially pass through all the electron beam transmitting members. It is.
  • the electron beam transmission unit is provided with a plurality of electron beam transmission members because the electron beam transmission member is generally made of beryllium or the like.
  • each electron beam transmitting member is reduced in area to prevent the electron beam transmitting member from being damaged.
  • Patent Document 1 Japanese Unexamined Patent Application Publication No. 2004-239920
  • the electron beam irradiation apparatus as described above has the following problems. That is, when the electron beam emitted from the electron gun is deflected so as to sequentially pass through all the electron beam transmitting members, in the electron beam transmitting unit, adjacent electron beams that are adjacent to each other only by the electron beam transmitting member. The electron beam is also applied to the frame portion between the transmissive members. Therefore, the frame portion between adjacent electron beam transmitting members generates heat, and in the worst case, it may melt.
  • the present invention has been made in view of such circumstances, and in an electron beam transmission unit, an electron that can suppress the generation of heat at a frame portion between adjacent electron beam transmission members. It aims at providing a beam irradiation apparatus.
  • an electron beam irradiation apparatus emits an electron beam emitted from a force sword, provided in a chamber for forming an electron beam passage hole, and one end side of the chamber.
  • An electron gun an electron beam transmission unit provided on the other end side of the chamber and having a plurality of electron beam transmission members arranged in a predetermined direction, and an electron beam emitted from the electron gun and passing through the electron beam passage hole Focusing means for focusing, and deflecting means for deflecting the electron beam focused by the focusing means and passing through the electron beam passage hole in a predetermined direction, and in the direction of emission of the electron beam from the electron gun,
  • the shape of the electron emission portion and the shape of the electron beam transmission portion of the electron beam transmission member are substantially similar to each other.
  • the electron beam emitted from the electron gun is focused by the focusing means when passing through the electron beam passage hole, deflected in a predetermined direction by the deflecting means, and the predetermined direction
  • the electron beam transmission unit having a plurality of electron beam transmission members arranged in a row is irradiated.
  • the shape of the electron emission portion of the force sword and the shape of the electron beam transmission portion of the electron beam transmission member are substantially similar to each other.
  • the electron beam irradiation apparatus controls the focusing means so that the image of the electron beam applied to the electron beam transmission member is substantially the same as the shape of the electron beam transmission part in the emission direction.
  • Preferably means are provided.
  • each electron beam transmission member is emitted from the electron beam transmission unit to the outside while suppressing heat generation at the frame portion between adjacent electron beam transmission members.
  • the electron dose can be made uniform.
  • the electron gun has an intermediate electrode that generates an electric field that focuses the electron beam emitted from the electron emission portion.
  • the electron beam is also focused by the intermediate electrode before being focused by the focusing means. This prevents the electron beam image irradiated on the electron beam transmitting member from being distorted. it can.
  • the electron beam passage hole can be narrowed and the chamber can be downsized.
  • the electron beam transmission unit and the deflecting means are integrally rotatable with respect to the electron emission portion. Even when the image of the electron beam focused by the focusing means rotates with respect to the shape of the electron emitting part in the direction of emission of the electron beam from the electron gun, the electron beam transmission unit and the deflecting means with respect to the electron emitting part As a result, the force S matches the image of the electron beam applied to the electron beam transmitting member and the shape of the electron beam transmitting portion in the direction of emission of the electron beam from the electron gun.
  • the electron beam transmission part in the emission direction, preferably has a rectangular shape having a predetermined direction as a longitudinal direction. In this case, it is possible to irradiate the electron beam linearly along a predetermined direction while reducing the area of the electron beam transmitting portion and preventing the electron beam transmitting member from being damaged. Furthermore, since the electron emission portion is also rectangular in the direction of emission of the electron beam from the electron gun, it is possible to increase the amount of emitted electron springs compared to point-like ones.
  • the present invention in the electron beam transmission unit, it is possible to prevent the frame portion between adjacent electron beam transmission members from generating heat.
  • FIG. 1 is a longitudinal sectional view of an embodiment of an electron beam irradiation apparatus according to the present invention.
  • FIG. 2 is an enlarged longitudinal sectional view around the force sword of FIG.
  • FIG. 3 is an enlarged plan view around the force sword of FIG.
  • FIG. 4 is an enlarged vertical sectional view around the electron beam transmission unit of FIG.
  • FIG. 5 is a sectional view taken along line V—V in FIG.
  • FIG. 6 is an enlarged plan view of the periphery of the electron beam transmission unit of FIG.
  • FIG. 7 is a diagram showing a relationship between an electron beam image irradiated on an electron beam transmitting member and the shape of an electron beam transmitting part.
  • Bunch means 7 ... deflection coil (deflection means), 9 ... control part (control means), 10 ... electron gun, 11 ... force sword, 11a ... electron emission part, 17 ... intermediate electrode 20 ... Electron beam transmission unit, 21 ... Electron beam transmission member, 21a ... Electron beam transmission part, ⁇ ... Electron beam.
  • the electron beam irradiation apparatus 1 is hermetically sealed in the chamber 3 so as to close the chamber 3 that forms the electron beam passage hole 2 and the rear end (one end) 2a of the electron beam passage hole 2.
  • an electron beam transmission unit 20 that is airtightly attached to the chamber 3 so as to block the front end (other end) 2b of the electron beam passage hole 2.
  • the electron gun 10 emits the electron beam EB emitted from the force sword 11 in the Z-axis direction.
  • the electron beam EB emitted from the electron gun 10 passes through the electron beam passage hole 2 with a directing force toward the electron beam transmission unit 20.
  • the electron beam transmissive unit 20 has a plurality (here, five) of electron beam transmissive members 21 arranged in the Y-axis direction (predetermined direction).
  • the side irradiated with the electron beam EB by the electron beam irradiation apparatus 1 is the front side, and the opposite side is the rear side.
  • the electron beam EB emitted from the electron gun 10 is deflected in the Y-axis direction so as to sequentially pass through all the electron beam transmitting members 21.
  • the electron beam irradiation device 1 is used to irradiate an irradiation object that flows on the line in an inert gas such as nitrogen with an electron beam EB to dry, sterilize, or modify the surface of the irradiation object. Is done.
  • the chamber 3 includes a chamber 3 to which the electron gun 10 is attached and a chamber 3 to which the electron beam transmission unit 20 is attached.
  • Chamber 3 is formed in a cylindrical shape with metal
  • the cross section of the electron beam passage hole 2 formed by the chamber 3 is circular, and the electron beam passage hole 2 has a shape in which a small diameter portion on the front side and a large diameter portion on the rear side are connected.
  • the chamber 3 is formed in a trapezoidal plate shape from metal. Electron beam formed by chamber 3
  • the cross section of the passage hole 2 is a rectangular shape whose longitudinal direction is the Y-axis direction, and the electron beam passage hole 2 is The shape is divergent only in the Y-axis direction toward the front side.
  • a flange 4 formed of a metal into a disk shape.
  • Electron gun 10 In the chamber 3, an alignment coil 6 and a focusing coil (focusing means) 6 are arranged so as to be paired with the small diameter portion of the electron beam passage hole 2 interposed therebetween. Electron gun 10
  • the alignment beam 6 causes the electron beam ⁇ that passes through the sub-wire passage hole 2 to shift the mechanical center of each member constituting the electron gun section 10 and the passage of the electron beam ⁇ and the residual magnetism of each component member.
  • a deflection coil (biasing means) 7 is disposed on the front surface of the flange 4. Focused by the focusing coil 6 and passed through the electron beam passage hole 2.
  • the passing electron beam ⁇ is deflected by the deflection coil 7 in the ⁇ axis direction.
  • An exhaust pipe 8 for connecting the electron beam passage hole 2 and a vacuum pump (not shown) is formed in the chamber 3. Thereby, the inside of the chamber 3 (that is, the electron beam passage hole 2) is evacuated. Further, the electron beam irradiation apparatus 1 includes a control unit (control means) 9 for controlling the whole.
  • the electron gun 10 includes a case 12 formed of a metal in a rectangular parallelepiped shape, an insulating block 13, and a high breakdown voltage type connector 14.
  • the case 12 is airtightly fixed to the rear end portion of the chamber 3.
  • the front wall of the case 12 is provided with an opening 12a that allows the inside of the case 12 and the inside of the chamber 3 to communicate with each other.
  • an opening 12b for attaching the connector 14 is provided on the side wall of the case 12.
  • An uneven portion is provided on the inner surface of the case 12 around the opening 12b, so as to ensure the bonding strength with the insulating block 13.
  • the insulating block 13 is made of an insulating material (for example, epoxy resin) and insulates the power supply path from the connector 14 force to the cathode 11 from the outside.
  • the insulating block 13 includes a base portion 13a housed in the case 12, and a large portion of the electron beam passage hole 2 from the base portion 13a through the opening 12a.
  • a protruding portion 13b that protrudes into the diameter portion and whose front end portion faces the rear end of the small diameter portion of the electron beam passage hole 2i in the Z-axis direction.
  • the base portion 13a occupies most of the internal space of the case 12, and is in contact with the inner surface of the case 12 on the opening 12a side and the opening 12b side.
  • a film 15 made of a conductive material is affixed to a portion of the base portion 13a that does not contact the inner surface of the case 12, so that the film 15 is electrically connected to the case 12 having a ground potential.
  • the surface potential of the insulating block 13 facing the inner surface of the case 12 can be set to the ground potential, and the stability during operation can be improved.
  • the connector 14 is for supplying a high voltage to the force sword 11 from a power supply device external to the electron beam irradiation apparatus 1.
  • the connector 14 is inserted into the opening 12 b on the side wall of the case 12, and is buried and fixed in the insulating block 7 with the tip of the connector 14 positioned near the center of the insulating block 13.
  • An uneven portion is provided on the outer peripheral surface of the distal end portion of the connector 14 so as to ensure the bonding strength with the insulating block 13.
  • a proximal end portion of the connector 14 is provided with a flange inlet 14a into which a power plug for holding a distal end of an external wiring connected to the power supply device is inserted.
  • a pair of internal wires 16 and 16 are connected to the tip of the connector 14.
  • the internal wirings 16 and 16 extend from the tip of the connector 14 toward the center of the base portion 13a, and are bent at the center of the base portion 13a to extend to the front end portion of the protruding portion 13b. Sockets 31, 31 embedded in the front end portion of the protruding portion 13 b are connected to the internal wirings 16, 16.
  • the sockets 31, 31 are connected to the front end portion protruding from the front end surface of the protruding portion 13 b with a force sword 11.
  • the power supply pins 32 and 32 that are crossed are connected.
  • the power feeding pins 32 and 32 pass through the ceramic plate 33 disposed on the front end face of the protruding portion 13b, and are fixed to the ceramic plate 33 by brazing or the like.
  • the force sword 11 is a thin plate-like member that emits electrons to be an electron beam EB. That is, the cathode 11 is connected via the internal wiring 16, 16, the sockets 31 and 31, and the power supply pins 32 and 32 by a heating power supply device different from the power supply device used for emitting the electron beam EB. Thus, the electron emitter 11a (see Fig. 2) is heated to a temperature at which electrons can be emitted. After that, the force sword 11 emits electrons to be an electron beam EB when a high voltage is applied to one of the internal wirings 16 by the power supply device. Around the force sword 11, an intermediate electrode 17 which is a so-called grid is provided.
  • the intermediate electrode 17 is applied with a predetermined voltage to An electric field that focuses the electron beam EB by extracting electrons emitted from the cathode 11 is generated.
  • a predetermined voltage For applying a predetermined voltage to the intermediate electrode 17, the same potential as that of the cathode 11 can be easily applied to the intermediate electrode 17 by electrically connecting any of the internal wirings 16 near the tip of the protruding portion 13 b.
  • the internal wiring may be provided from the connector 14 in the same manner as the internal wirings 16 and 16. As a result, the electron beam EB is emitted from the electron gun 10 to the front side in the Z-axis direction.
  • a ceramic plate 33 is disposed on the front end face of the protruding portion 13b.
  • An encircling member 18 is disposed on the ceramic plate 33 so as to surround the front end portions of the power supply pins 32, 32.
  • the front end surface of the enclosing member 18 has a thin plate shape that covers and covers the front end of the opening of the enclosing member 18.
  • a lid member 19 is disposed.
  • the surrounding member 18 and the lid member 19 are made of metal and are in contact with the intermediate electrode 17. As a result, the surrounding member 18 and the lid member 19 have the same potential as the intermediate electrode 17.
  • the force sword 11, the surrounding member 18, the lid member 19, the power supply pins 32 and 32, and the ceramic plate 33 are integrally unitized. Therefore, when replacing the power sword 11, it is possible to replace this unit with force S. Accordingly, it is possible to easily replace the force sword 11 without making complicated adjustments such as positioning of the force sword 11 with respect to the lid member 19.
  • the force sword 11 is made into a thin plate shape with a high melting point metal (for example, tungsten, molybdenum, rhenium, niobium, tantalum, thorium oxide, etc.) or an alloy (for example, a mixed tungsten containing thorium oxide mixed with tungsten).
  • a rectangular electron emission portion 11a is formed and faces a rectangular aperture 19a provided on the lid member 19.
  • the aperture 19a is provided so as to include the front surface of the electron emission portion 11a when viewed from the Z-axis direction.
  • the shape is similar to that of the front surface of the electron emission portion 11a, and the distance between the edge portion of the aperture 19a and the edge portion of the front surface of the electron emission portion 11a is not in contact with each other. Yes.
  • a reflector ib supported by one of the power supply pins 32 is arranged at a distance of 0.5 mm to 1.5 mm from the electron emission portion 11a.
  • the electric field generated by the intermediate electrode 17 acts equally on the front surface of the electron emission portion 11a. Electrons are emitted substantially uniformly from the front surface of the electron emission portion 11a.
  • the electrons emitted from the electron emission part 11a are emitted as they are to the front side in the Z-axis direction.
  • electrons are also emitted from the rear and side surfaces of the electron emitting portion 11a, but among those electrons, those whose traveling direction has spread greatly are blocked by the lid member 19 without passing through the aperture 19a.
  • the reflector l ib reflects a part of the electrons emitted from the rear surface of the electron emission part 11a to the Z-axis direction side, and a part of it further reflects from the gap between the aperture 19a and the electron emission part 11a to the Z-axis. Released to the direction side. For this reason, it is placed in particular applications that require high current extraction!
  • the electron beam transmission unit 20 has a substrate 22 formed into a rectangular plate shape with brass.
  • the substrate 22 is airtightly attached to the front end surface of the chamber 3 via an O-ring 23 so that the rear end surface (one end surface) 22a contacts.
  • a frame member 24 to which the electron beam transmitting member 21 is fixed is attached to the end surface (other end surface) 22b through an O-ring 25 in an airtight manner.
  • Substrate 22 is connected to chamber 3 by bolt 26
  • the electron beam transmitting member 21 is detachably attached to the substrate 22 with bolts 27.
  • the electron beam transmitting member 21 can be kept airtight and is formed in a rectangular thin film shape using a material (for example, beryllium, titanium, aluminum, or the like) excellent in the transmittance of the electron beam EB.
  • the frame member 24 is formed in a rectangular ring shape from metal (for example, stainless steel).
  • the electron beam transmitting member 21 is airtightly fixed to the front end surface of the frame member 24 by, for example, brazing so as to cover and cover the front end of the opening of the frame member 24, and the electron beam transmitting portion of the electron beam transmitting member 21 21 a has a rectangular shape with the Y-axis direction as the longitudinal direction when viewed from the Z-axis direction. Note that, as viewed from the Z-axis direction, the shape of the electron emitting portion 11a of the force sword 11 and the shape of the electron beam transmitting portion 21a are substantially similar to each other.
  • an opening 22c having a rectangular cross-section is formed, and each opening 22c is divergent toward the rear end face 22a side of the substrate 22. It is the shape of.
  • a concave portion 22d having a rectangular cross section is formed in a portion of the rear end surface 22a of the substrate 22 facing the front end 2b of the electron beam passage hole 2.
  • the operation of the electron beam irradiation apparatus 1 configured as described above will be described.
  • the inside of the chamber 3 (that is, the electron beam passage hole 2) is evacuated by the vacuum pump through the exhaust pipe 8, and the electric power is supplied through the internal wirings 16, 16, the sockets 31, 31 and the power supply pins 32, 32.
  • a high voltage is applied to the force sword 11 by the source device, electrons are emitted from the force of the electron emitting portion 11a of the force sword 11.
  • Electrons emitted from the electron emitting portion 11a are emitted to the front side in the Z-axis direction by the aperture 19a and the reflector plate ib, accelerated and focused by the electric field generated by the intermediate electrode 17, and the electron beam EB is emitted from the electron gun.
  • the light is emitted from 10 to the front side in the Z-axis direction.
  • the electron beam EB emitted from the electron gun 10 and passing through the electron beam passage hole 2 is corrected for the central axis by the alignment coil 6, and then the electron beam transmitting member 21 by the focusing coil 6.
  • the image power S of the electron beam EB irradiated to the electron beam transmitting member 21 is controlled so as to be substantially the same as the shape of the electron beam transmitting portion 21a when viewed from the Z-axis direction.
  • the focusing coil 6 is controlled by the section 9.
  • An electron beam EB focused by the focusing coil 6 and passing through the electron beam passage hole 2 is
  • the central axial force of the electron beam EB passing through the line passing hole 2 is repeatedly changed linearly along the axial direction.
  • the time during which the electron beam EB is irradiated onto the frame portion 20a between the adjacent electron beam transmission members 21, 21 is longer than the time during which the electron beam transmission member 21 is irradiated with the electron beam EB.
  • the deflection coil 7 is controlled by the control unit 9 so as to be shortened. Such control is realized, for example, by causing the control unit 9 to pass a current whose current value changes stepwise through the deflection coil 7.
  • the electron beam EB deflected in the Y-axis direction by the deflection coil 7 is sequentially transmitted through each electron beam transmitting portion 21a and emitted to the outside.
  • the electron beam EB emitted to the outside is irradiated to an irradiation object flowing on the line in an inert gas such as nitrogen, and the irradiation object is dried, sterilized, surface-modified, and the like.
  • the electron beam EB emitted from the electron gun 10 is focused by the focusing coil 6 when passing through the electron beam passage hole 2, and is applied to the deflection coil 7.
  • the electron beam transmission unit 20 having a plurality of electron beam transmission members 21 that are deflected in the Y axis direction and arranged in the Y axis direction is irradiated.
  • the power sword 11 The shape of the child emitting portion 11a and the shape of the electron beam transmitting portion 21a of the electron beam transmitting member 21 are substantially similar to each other. Therefore, the electron beam transmitting member 21 is irradiated to the focusing coil 6.
  • Image force of the electron beam EB to be focused It becomes easy to focus the electron beam EB emitted from the electron emission portion 11a so as to be substantially the same as the shape of the electron beam transmission portion 21a in the Z-axis direction. Accordingly, the electron beam EB can be reliably emitted to the outside through each electron beam transmitting member 21, and in the electron beam transmitting unit 20, a frame portion 20a between adjacent electron beam transmitting members 21 and 21 is provided. Can be prevented from generating heat.
  • the electron beam EB emitted from the electron gun 10 and passing through the electron beam passage hole 2 is the image power S of the electron beam EB irradiated to the electron beam transmitting member 21,
  • the focusing coil 6 and the control unit 9 so as to be substantially the same as the shape of the electron beam transmitting part 21a in the Z-axis direction.
  • the electron beam EB is irradiated to the frame portion 20a between the adjacent electron beam transmissive members 21 and 21, and this portion is further suppressed from generating heat, while each electron beam transmissive unit 20 is transparent.
  • the electron dose emitted from the electron beam transmitting portion 21a to the outside can be made uniform.
  • the shape of the electron beam EB in the electron beam transmission part 21a rectangular, the X-direction width of the electron beam transmission part 2la, which is expensive and easily damaged, can be narrowed. And extending the life of the output window.
  • the electron gun 10 has an intermediate electrode 17 that generates an electric field that focuses the electron beam EB emitted from the electron emission portion 11a.
  • the electron beam EB is also focused by the intermediate electrode 17 before being focused by the focusing coil 6.
  • the electron beam passage hole 2 can be narrowed and the chamber 3 can be downsized.
  • the chamber 3 rotates about the Z axis with respect to the chamber 3 itself.
  • the electron beam transmission unit 20 and the deflection coil 7 are integrally rotatable with respect to the electron emission portion 11a.
  • an image of the electron beam EB focused by the focusing coil 6 is rotated with respect to the shape of the electron emitting portion 11a in the Z-axis direction.
  • the image of the electron beam EB irradiated on the electron beam transmission member 21 and the electrons in the Z-axis direction The shape of the line transmission part 21a can be matched.
  • the electron beam transmitting portion 21a in the Z-axis direction, has a rectangular shape with the Y-axis direction as the longitudinal direction.
  • the force S can be reduced by reducing the area of the electron beam transmitting portion 21a and irradiating the electron beam EB linearly along the Y-axis direction while preventing the electron beam transmitting member 21 from being damaged.
  • the electron emission portion 11a since the electron emission portion 11a is also rectangular, it can increase the life of the electron spring EB and increase the life of the electron spring EB compared to point-like ones. Become.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Dans un dispositif (1) de rayonnement de faisceau d'électrons, un faisceau d'électrons (EB), tel qu'émis à partir d'un canon de faisceau d'électrons (10) est concentré, lorsqu'il passe à travers un trou (2) de passage de faisceau d'électrons, par une bobine de concentration (62), et est dévié dans une direction de l'axe des Y par une bobine de déviation (7), de telle sorte qu'il irradie une unité (20) de pénétration par le faisceau d'électrons ayant une pluralité d'éléments (21) de pénétration par le faisceau d'électrons disposés dans la direction de l'axe des Y. Ici, dans une direction de l'axe des Z, la forme de la partie d'une cathode émettant le faisceau d'électrons (11) et la forme des parties de pénétration par le faisceau d'électrons des éléments (21) de pénétration par le faisceau d'électrons sont dans des relations sensiblement analogues entre elles. Par conséquent, le faisceau d'électrons (EB) tel qu'émis à partir de la partie d'émission de faisceau d'électrons, peut être concentré sur la bobine de concentration (62), de telle sorte que l'image du faisceau d'électrons (EB) pour irradier les éléments de pénétration (21) par le faisceau d'électrons peuvent avoir sensiblement la même forme que celles des parties de pénétration par le faisceau d'électrons dans la direction de l'axe des Z.
PCT/JP2007/071606 2006-11-24 2007-11-07 Dispositif de rayonnement de faisceau d'électrons WO2008062668A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-317505 2006-11-24
JP2006317505A JP2008128973A (ja) 2006-11-24 2006-11-24 電子線照射装置

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WO2008062668A1 true WO2008062668A1 (fr) 2008-05-29

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TW (1) TW200832446A (fr)
WO (1) WO2008062668A1 (fr)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10512092A (ja) * 1995-01-05 1998-11-17 アメリカン・インターナショナル・テクノロジィズ・インコーポレイテッド 単結晶の窓および整合アノードを備える電子ビーム装置
JP2000206299A (ja) * 1999-01-08 2000-07-28 Nissin High Voltage Co Ltd 電子線照射装置
JP2004020233A (ja) * 2002-06-12 2004-01-22 Matsushita Electric Ind Co Ltd 電子線管及び電子線の制御方法並びにそれを応用した電子線照射装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10512092A (ja) * 1995-01-05 1998-11-17 アメリカン・インターナショナル・テクノロジィズ・インコーポレイテッド 単結晶の窓および整合アノードを備える電子ビーム装置
JP2000206299A (ja) * 1999-01-08 2000-07-28 Nissin High Voltage Co Ltd 電子線照射装置
JP2004020233A (ja) * 2002-06-12 2004-01-22 Matsushita Electric Ind Co Ltd 電子線管及び電子線の制御方法並びにそれを応用した電子線照射装置

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TW200832446A (en) 2008-08-01

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