JPH1048517A - 投影光学系 - Google Patents

投影光学系

Info

Publication number
JPH1048517A
JPH1048517A JP8208649A JP20864996A JPH1048517A JP H1048517 A JPH1048517 A JP H1048517A JP 8208649 A JP8208649 A JP 8208649A JP 20864996 A JP20864996 A JP 20864996A JP H1048517 A JPH1048517 A JP H1048517A
Authority
JP
Japan
Prior art keywords
refractive power
group
optical system
element group
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8208649A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1048517A5 (enExample
Inventor
Yuutou Takahashi
友刀 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8208649A priority Critical patent/JPH1048517A/ja
Priority to EP97113554A priority patent/EP0828171A3/en
Priority to US08/906,981 priority patent/US5956182A/en
Publication of JPH1048517A publication Critical patent/JPH1048517A/ja
Publication of JPH1048517A5 publication Critical patent/JPH1048517A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8208649A 1996-08-07 1996-08-07 投影光学系 Pending JPH1048517A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8208649A JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系
EP97113554A EP0828171A3 (en) 1996-08-07 1997-08-06 Projection optical system
US08/906,981 US5956182A (en) 1996-08-07 1997-08-06 Projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8208649A JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系

Publications (2)

Publication Number Publication Date
JPH1048517A true JPH1048517A (ja) 1998-02-20
JPH1048517A5 JPH1048517A5 (enExample) 2004-08-05

Family

ID=16559751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8208649A Pending JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系

Country Status (3)

Country Link
US (1) US5956182A (enExample)
EP (1) EP0828171A3 (enExample)
JP (1) JPH1048517A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171699A (ja) * 1998-11-30 2000-06-23 Carl Zeiss:Fa 投影対物レンズ
US6459534B1 (en) 1999-06-14 2002-10-01 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6621555B1 (en) 1999-06-14 2003-09-16 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP2014030044A (ja) * 2006-05-05 2014-02-13 Corning Inc 疑似テレセントリック結像レンズの歪調整

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3925576B2 (ja) 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
JPH11214293A (ja) 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
KR100319455B1 (ko) * 1999-12-24 2002-01-05 오길록 결정화 장비용 광학 시스템
AU2001255502A1 (en) * 2000-04-21 2001-11-26 Lockheed Martin Corporation Wide-field extended-depth doubly telecentric catadioptric optical system for digital imaging
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005060034A1 (de) * 2005-12-15 2006-11-16 Siemens Ag Linse oder Anordnung von Linsen für ein Lasersystem
US8215776B2 (en) * 2009-01-07 2012-07-10 Eastman Kodak Company Line illumination apparatus using laser arrays
CN112415865B (zh) * 2020-12-01 2023-11-17 中国科学院光电技术研究所 一种应用于投影光刻机的单倍率大视场投影曝光物镜
CN113568281B (zh) * 2021-07-29 2023-10-03 中国科学院光电技术研究所 一种应用于投影光刻机的大视场投影曝光物镜系统

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897138A (en) * 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
SU935099A1 (ru) * 1980-03-05 1982-06-15 Казахский Научно-Исследовательский Институт Офтальмологии,Объединенный С Кафедрой Алма-Атинского Государственного Медицинского Института Способ лечени крыловидной плевы
SU909652A1 (ru) * 1980-06-04 1982-02-28 Центральный Ордена "Знак Почета" Научно-Исследовательский Институт Геодезии, Аэросъемки И Картографии Им.Ф.Н.Красовского Репродукционный объектив
DE3203445A1 (de) * 1982-02-02 1983-08-11 Mannesmann Veba Umwelttechnik GmbH, 4690 Herne Verfahren und einrichtung zur biologischen schlammbehandlung
JPS6067915A (ja) * 1983-09-22 1985-04-18 Konishiroku Photo Ind Co Ltd 複写用レンズ
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US5808814A (en) * 1996-07-18 1998-09-15 Nikon Corporation Short wavelength projection optical system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171699A (ja) * 1998-11-30 2000-06-23 Carl Zeiss:Fa 投影対物レンズ
US6459534B1 (en) 1999-06-14 2002-10-01 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6621555B1 (en) 1999-06-14 2003-09-16 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus with the same, and device manufacturing method
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP2014030044A (ja) * 2006-05-05 2014-02-13 Corning Inc 疑似テレセントリック結像レンズの歪調整

Also Published As

Publication number Publication date
US5956182A (en) 1999-09-21
EP0828171A3 (en) 1998-07-08
EP0828171A2 (en) 1998-03-11

Similar Documents

Publication Publication Date Title
JPH1048517A (ja) 投影光学系
JP3819048B2 (ja) 投影光学系及びそれを備えた露光装置並びに露光方法
JP3624973B2 (ja) 投影光学系
JP3454390B2 (ja) 投影光学系、投影露光装置及び投影露光方法
EP0717299B2 (en) Exposure apparatus
JP3750123B2 (ja) 投影光学系
JP3396935B2 (ja) 投影光学系及び投影露光装置
US8970964B2 (en) Projection objective lens system
JP3864399B2 (ja) 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
US6879383B2 (en) Large-field unit-magnification projection system
JP3823436B2 (ja) 投影光学系
JPH11214293A (ja) 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
JPH116957A (ja) 投影光学系および投影露光装置並びに投影露光方法
JPH07140384A (ja) 投影光学系及び投影露光装置
US6781766B2 (en) Projection optical system
JPH1079345A (ja) 投影光学系及び露光装置
JP2006512777A (ja) 可変開口数・大フィールド等倍投影系
JPH06313845A (ja) 投影レンズ系
JPH07128592A (ja) 縮小投影レンズ
KR100511360B1 (ko) 투영광학계 및 그것을 사용한 투영노광장치, 및디바이스제조방법
TWI440988B (zh) Projection optical systems and exposure devices
JP3359302B2 (ja) 投影露光装置
JPH11352398A (ja) 両側テレセントリック光学系
JP3423644B2 (ja) 投影光学系及びそれを用いた投影露光装置
JP6511701B2 (ja) 投影光学系、投影露光装置、及びデバイス製造方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050304

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050802

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060404