JPH1048517A5 - - Google Patents

Info

Publication number
JPH1048517A5
JPH1048517A5 JP1996208649A JP20864996A JPH1048517A5 JP H1048517 A5 JPH1048517 A5 JP H1048517A5 JP 1996208649 A JP1996208649 A JP 1996208649A JP 20864996 A JP20864996 A JP 20864996A JP H1048517 A5 JPH1048517 A5 JP H1048517A5
Authority
JP
Japan
Prior art keywords
element group
refractive power
group
pairs
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996208649A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1048517A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8208649A priority Critical patent/JPH1048517A/ja
Priority claimed from JP8208649A external-priority patent/JPH1048517A/ja
Priority to EP97113554A priority patent/EP0828171A3/en
Priority to US08/906,981 priority patent/US5956182A/en
Publication of JPH1048517A publication Critical patent/JPH1048517A/ja
Publication of JPH1048517A5 publication Critical patent/JPH1048517A5/ja
Pending legal-status Critical Current

Links

JP8208649A 1996-08-07 1996-08-07 投影光学系 Pending JPH1048517A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8208649A JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系
EP97113554A EP0828171A3 (en) 1996-08-07 1997-08-06 Projection optical system
US08/906,981 US5956182A (en) 1996-08-07 1997-08-06 Projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8208649A JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系

Publications (2)

Publication Number Publication Date
JPH1048517A JPH1048517A (ja) 1998-02-20
JPH1048517A5 true JPH1048517A5 (enExample) 2004-08-05

Family

ID=16559751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8208649A Pending JPH1048517A (ja) 1996-08-07 1996-08-07 投影光学系

Country Status (3)

Country Link
US (1) US5956182A (enExample)
EP (1) EP0828171A3 (enExample)
JP (1) JPH1048517A (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3925576B2 (ja) 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
JPH11214293A (ja) 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
US6867922B1 (en) 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP2000356741A (ja) 1999-06-14 2000-12-26 Canon Inc 投影光学系
JP3359302B2 (ja) 1999-06-14 2002-12-24 キヤノン株式会社 投影露光装置
KR100319455B1 (ko) * 1999-12-24 2002-01-05 오길록 결정화 장비용 광학 시스템
AU2001255502A1 (en) * 2000-04-21 2001-11-26 Lockheed Martin Corporation Wide-field extended-depth doubly telecentric catadioptric optical system for digital imaging
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170129271A (ko) 2004-05-17 2017-11-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102005060034A1 (de) * 2005-12-15 2006-11-16 Siemens Ag Linse oder Anordnung von Linsen für ein Lasersystem
CN101479637B (zh) * 2006-05-05 2011-09-21 康宁股份有限公司 准远心成像透镜的畸变调谐
US8215776B2 (en) * 2009-01-07 2012-07-10 Eastman Kodak Company Line illumination apparatus using laser arrays
CN112415865B (zh) * 2020-12-01 2023-11-17 中国科学院光电技术研究所 一种应用于投影光刻机的单倍率大视场投影曝光物镜
CN113568281B (zh) * 2021-07-29 2023-10-03 中国科学院光电技术研究所 一种应用于投影光刻机的大视场投影曝光物镜系统

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897138A (en) * 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
SU935099A1 (ru) * 1980-03-05 1982-06-15 Казахский Научно-Исследовательский Институт Офтальмологии,Объединенный С Кафедрой Алма-Атинского Государственного Медицинского Института Способ лечени крыловидной плевы
SU909652A1 (ru) * 1980-06-04 1982-02-28 Центральный Ордена "Знак Почета" Научно-Исследовательский Институт Геодезии, Аэросъемки И Картографии Им.Ф.Н.Красовского Репродукционный объектив
DE3203445A1 (de) * 1982-02-02 1983-08-11 Mannesmann Veba Umwelttechnik GmbH, 4690 Herne Verfahren und einrichtung zur biologischen schlammbehandlung
JPS6067915A (ja) * 1983-09-22 1985-04-18 Konishiroku Photo Ind Co Ltd 複写用レンズ
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US5808814A (en) * 1996-07-18 1998-09-15 Nikon Corporation Short wavelength projection optical system

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