JPH1034097A - Washing device - Google Patents

Washing device

Info

Publication number
JPH1034097A
JPH1034097A JP8215361A JP21536196A JPH1034097A JP H1034097 A JPH1034097 A JP H1034097A JP 8215361 A JP8215361 A JP 8215361A JP 21536196 A JP21536196 A JP 21536196A JP H1034097 A JPH1034097 A JP H1034097A
Authority
JP
Japan
Prior art keywords
cleaning
tank
steam
cleaning liquid
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8215361A
Other languages
Japanese (ja)
Other versions
JP3096241B2 (en
Inventor
Takeshi Yamamoto
健 山本
Ryuichi Wada
龍一 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aqua Chemical Co Ltd
Original Assignee
Aqua Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aqua Chemical Co Ltd filed Critical Aqua Chemical Co Ltd
Priority to JP08215361A priority Critical patent/JP3096241B2/en
Publication of JPH1034097A publication Critical patent/JPH1034097A/en
Priority to JP2000121121A priority patent/JP3634718B2/en
Application granted granted Critical
Publication of JP3096241B2 publication Critical patent/JP3096241B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a high performance washing device capable of realizing ultrasonic washing and vapor washing by a distilled and regenerated solvent of high purity. SOLUTION: This device is provided with a washing tank 2, a reverse tank 3, a vacuum pump 7, a vapor generation tank 4 containing a washing liquid in a heated state, a heat insulating tank 15 provided on the outer peripheral part of the washing tank 2 and receiving washing vapor, a clean tank 16 for storing the washing liquid liquefied in the heat insulating tank 15, a condenser 17 for condensing the washing vapor passing through the clean tank 16, an ejector 20 for maintaining the vapor generation tank 4 in a reduced pressure state, and a vapor generator 23 communicated with the washing tank 2 and also provided with a heating mechanism in the inside, and the washing vapor is fed to the washing tank 2 by jetting the washing liquid fed from the clean tank 16 into a vapor generator 23 in a reduced pressure state.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品や機械部
品などを洗浄する洗浄装置に関し、特に、高純度に蒸留
再生された炭化水素系溶剤によって超音波洗浄や蒸気洗
浄を実現する高性能の洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning electronic parts and mechanical parts, and more particularly to a high-performance cleaning apparatus for performing ultrasonic cleaning and steam cleaning using a hydrocarbon solvent that has been distilled and regenerated with high purity. The present invention relates to a cleaning device.

【0002】[0002]

【従来の技術】フロンやトリエタンの全廃を目前に控え
て、理想的な代替洗浄剤の開発が進まない中、汎用性や
価格上の利点から水溶性洗剤や炭化水素系溶剤への切替
えが積極的に推進されており、例えば、特開平5−12
3658号に記載の洗浄装置が提案されている。この装
置は、蒸気発生槽と洗浄槽とを制御弁を介して連通さ
せ、減圧状態にある蒸気発生槽で沸騰させた溶剤を洗浄
槽に導入して蒸気洗浄を行うものである。この装置は、
可燃性溶剤を用いることができるものであり、また、高
沸点溶剤を沸点以下の温度で沸騰させて蒸気洗浄を行
い、その後、凝縮器で液化された溶剤を蒸気発生槽に還
流させている。
[Prior Art] With the elimination of CFCs and triethane being imminent and the development of ideal alternative detergents not progressing, aggressive switching to water-soluble detergents and hydrocarbon solvents due to versatility and price advantages For example, Japanese Patent Laid-Open No. 5-12 / 1993
No. 3658 has proposed a cleaning apparatus. In this apparatus, a steam generation tank and a cleaning tank are communicated via a control valve, and a solvent boiled in the steam generation tank in a reduced pressure state is introduced into the cleaning tank to perform steam cleaning. This device is
A combustible solvent can be used, and a high-boiling solvent is boiled at a temperature not higher than the boiling point to perform steam cleaning, and thereafter, the solvent liquefied by the condenser is returned to the steam generating tank.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この装
置では、回収された溶剤をそのまま蒸気洗浄に用いるの
で、蒸気発生能力を高めるべく溶剤を過大に加熱するか
過大に減圧すると、発生蒸気に少なからず不純物を含ん
でしまうという問題点があった。つまり、上記の洗浄装
置では、蒸気発生能力が劣るか、或いは、発生する蒸気
の純度が劣るので、その分だけ余分の洗浄時間を要する
ことになった。また、上記の装置では、超音波洗浄と蒸
気洗浄を同じ洗浄槽で行う場合に、ポンプによって溶剤
を供給しているので給排液に時間を要し、しかも、動力
機器が余分に必要である分だけ安全性などにおいて問題
があった。本発明は、この問題点に着目してなされたも
のであって、高純度に蒸留再生された溶剤によって超音
波洗浄や蒸気洗浄を実現する高性能の洗浄装置を提供す
ることを目的とする。
However, in this apparatus, since the recovered solvent is used for steam cleaning as it is, if the solvent is excessively heated or excessively decompressed in order to enhance the steam generating ability, not a small amount of the generated steam is generated. There is a problem that impurities are contained. That is, in the above-described cleaning apparatus, the steam generation capability is poor or the purity of generated steam is poor, so that extra cleaning time is required. Further, in the above-described apparatus, when the ultrasonic cleaning and the steam cleaning are performed in the same cleaning tank, the solvent is supplied by the pump, so that it takes time to supply and discharge the liquid, and further, an additional power device is required. There was a problem in terms of safety, etc. The present invention has been made in view of this problem, and has as its object to provide a high-performance cleaning apparatus that realizes ultrasonic cleaning and steam cleaning using a solvent that has been distilled and regenerated to high purity.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
め、請求項1に係る発明では、開閉弁を介して互いに連
通している洗浄槽及び貯留槽と、前記洗浄槽及び貯留槽
を所定レベルまで減圧可能な第1の減圧機構と、適宜な
加熱状態にある洗浄液を内部に含む蒸気発生槽と、前記
洗浄槽の外周部に設けられ前記蒸気発生槽から洗浄蒸気
の供給を受ける洗浄槽保温部と、前記洗浄液保温部にお
いて液化した洗浄液を蓄えるクリーンタンクと、前記ク
リーンタンクを経由する洗浄蒸気を凝縮する凝縮機構
と、前記凝縮機構に接続されて前記蒸気発生槽を所定の
減圧状態に維持する第2の減圧機構と、前記洗浄槽に連
通されると共に内部に加熱機構を備える蒸気発生器とを
備え、クリーンタンクから供給される洗浄液が、減圧状
態にある前記蒸気発生器に噴射されることにより、前記
洗浄槽に洗浄蒸気が供給されるようになっている。
According to the first aspect of the present invention, a cleaning tank and a storage tank communicating with each other via an on-off valve are provided. A first decompression mechanism capable of reducing pressure to a level, a steam generation tank containing a cleaning liquid in an appropriate heating state therein, and a cleaning tank provided on an outer peripheral portion of the cleaning tank and receiving supply of cleaning steam from the steam generation tank. A heat retaining section, a clean tank for storing the cleaning liquid liquefied in the cleaning liquid heat retaining section, a condensing mechanism for condensing the cleaning steam passing through the clean tank, and a vapor generating tank connected to the condensing mechanism to set the vapor generating tank to a predetermined reduced pressure state. A cleaning device connected to the cleaning tank and having a steam generator provided therein with a heating mechanism therein, wherein the cleaning liquid supplied from the clean tank is supplied to the steam generating device in a reduced pressure state. By being injected into the vessel, cleaning vapor is to be supplied to the cleaning tank.

【0005】請求項2に係る洗浄装置では、開閉弁を介
して互いに連通している洗浄槽及び貯留槽と、前記洗浄
槽及び貯留槽を所定レベルまで減圧可能な第1の減圧機
構と、適宜な加熱状態にある洗浄液を内部に含む蒸気発
生槽と、前記洗浄槽の外周部に設けられ前記蒸気発生槽
から洗浄蒸気の供給を受ける洗浄槽保温部と、前記洗浄
液保温部において液化した洗浄液を蓄えるクリーンタン
クと、前記クリーンタンクを経由する洗浄蒸気を凝縮す
る凝縮機構と、前記凝縮機構に接続されて前記蒸気発生
槽を所定の減圧状態に維持する第2の減圧機構と、前記
クリーンタンクの洗浄液を加熱しつつ前記洗浄槽に供給
する強制加熱部とを備え、クリーンタンクから供給され
る洗浄液が、減圧状態にある前記洗浄槽に噴射されるこ
とにより、前記洗浄槽に洗浄蒸気が供給されるようにな
っている。
According to a second aspect of the present invention, there is provided a cleaning apparatus, comprising: a cleaning tank and a storage tank communicating with each other through an on-off valve; a first pressure reducing mechanism capable of reducing the pressure of the cleaning tank and the storage tank to a predetermined level; A steam generating tank containing a cleaning liquid in a heated state, a cleaning tank heat retaining unit provided on an outer peripheral portion of the cleaning tank and receiving a supply of cleaning steam from the steam generating tank, and a cleaning liquid liquefied in the cleaning liquid heat retaining unit. A clean tank for storing, a condensing mechanism for condensing cleaning steam passing through the clean tank, a second depressurizing mechanism connected to the condensing mechanism for maintaining the steam generating tank in a predetermined depressurized state, A forced heating unit that supplies the cleaning liquid to the cleaning tank while heating the cleaning liquid, wherein the cleaning liquid supplied from the clean tank is jetted into the cleaning tank in a reduced pressure state, thereby performing the cleaning. Washing steam are supplied to the bath.

【0006】本発明では、蒸気発生槽と洗浄槽保温部と
クリーンタンクとで第1の蒸留再生部を形成することが
できる。そして、蒸気発生槽から発生する蒸気は、蒸気
洗浄に用いられる訳ではないので、洗浄液の種類に応じ
た最適な温度と圧力とで蒸気を発生させることができ、
洗浄槽保温部を経ることにより、純度の高い洗浄液を蒸
留再生することができる。高純度に蒸留再生された洗浄
液は、蒸気発生器か強制加熱部を経て洗浄槽に供給され
るが、洗浄液の純度が高いので、例え過大に加熱したと
しても洗浄蒸気の質を劣化させることはない。また、洗
浄槽は、洗浄槽保温部に供給される洗浄蒸気によって保
温されているので、この点でも蒸気洗浄の効率が高い。
また、本発明では、洗浄槽及び貯留槽を所定レベルまで
減圧可能な第1の減圧機構を備えているので、動力機器
を用いることなく、洗浄液の供給と排出を実現すること
ができる。
In the present invention, the first distillation regeneration section can be formed by the steam generation tank, the washing tank heat retaining section, and the clean tank. And since the steam generated from the steam generation tank is not used for steam cleaning, it is possible to generate steam at an optimal temperature and pressure according to the type of the cleaning liquid,
By passing through the washing tank heat retaining section, a highly pure washing solution can be distilled and regenerated. The cleaning liquid that has been distilled and regenerated to high purity is supplied to the cleaning tank via a steam generator or a forced heating unit, but the purity of the cleaning liquid is high, so even if it is heated excessively, the quality of the cleaning steam will not be deteriorated. Absent. In addition, since the cleaning tank is kept warm by the cleaning steam supplied to the cleaning tank heat retaining unit, the efficiency of the steam cleaning is high also in this regard.
Further, in the present invention, since the first decompression mechanism capable of decompressing the cleaning tank and the storage tank to a predetermined level is provided, supply and discharge of the cleaning liquid can be realized without using a power device.

【0007】[0007]

【発明の実施の形態】以下、実施例に基づいて、この発
明を更に詳細に説明する。 (A)第1実施例 図1は、この発明の一実施例である洗浄装置1Aを図示
したものである。この洗浄装置1Aは、密閉シャッター
付きの洗浄槽2と、洗浄液を蓄えるリザーブタンク3
と、洗浄液の蒸留釜として機能する蒸気発生槽4と、真
空対応形のエアバルブV1〜V14とを中心的に備えて
いる。洗浄槽2とリザーブタンク3は、ともに1Torr以
下の真空度に対応できる液槽であり、洗浄槽2は、必要
に応じて、超音波洗浄、シャワー洗浄、又は蒸気洗浄を
行うようになっている。なお、洗浄液の種類は、特に限
定されないが、可燃性液体である炭化水素溶剤を用いる
ことができる。洗浄槽2は、その内部に超音波発振器5
を備えており、蓋体6によって適宜に密閉されるが、蓋
体6の内側表面には、冷却水を循環させることができる
ようになっている。また、洗浄槽2は、真空弁V5を通
して真空ポンプ7に接続されており、真空ポンプ7の出
力側は、コールドトラップ8と排気ファン9とを経由し
て大気に連通している。ここで、真空ポンプ7は、洗浄
液の給排液と、蒸気洗浄及び真空乾燥を実現するもので
あり、その排気能力は、毎時100m3 以上であり、到
達圧力が1Torr以下のものである。また、ドライ式の真
空ポンプであり(油回転式や水封式ではない)、洗浄液
の気化ガスやミストの排気もできるようになっている。
なお、洗浄槽2は、大気開放弁V6を通して大気に開放
され、真空ポンプ7の入力側は、真空度調整弁V7を通
して大気に開放されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail based on embodiments. (A) First Embodiment FIG. 1 illustrates a cleaning apparatus 1A according to an embodiment of the present invention. The cleaning apparatus 1A includes a cleaning tank 2 having a closed shutter and a reserve tank 3 for storing a cleaning liquid.
And a steam generation tank 4 functioning as a distillation tank for washing liquid, and air valves V1 to V14 corresponding to vacuum. The cleaning tank 2 and the reserve tank 3 are both liquid tanks that can cope with a degree of vacuum of 1 Torr or less, and the cleaning tank 2 performs ultrasonic cleaning, shower cleaning, or steam cleaning as necessary. . The type of the cleaning liquid is not particularly limited, but a hydrocarbon solvent that is a flammable liquid can be used. The cleaning tank 2 has an ultrasonic oscillator 5 inside.
The cover 6 is appropriately sealed by the cover 6, but cooling water can be circulated on the inner surface of the cover 6. The cleaning tank 2 is connected to a vacuum pump 7 through a vacuum valve V5, and an output side of the vacuum pump 7 is connected to the atmosphere via a cold trap 8 and an exhaust fan 9. Here, the vacuum pump 7 realizes supply and discharge of a cleaning liquid, steam cleaning, and vacuum drying, and has an exhaust capacity of 100 m 3 or more per hour and an ultimate pressure of 1 Torr or less. In addition, it is a dry vacuum pump (not an oil rotary type or a water ring type), and is capable of exhausting vaporized gas and mist of the cleaning liquid.
The cleaning tank 2 is opened to the atmosphere through an atmosphere opening valve V6, and the input side of the vacuum pump 7 is opened to the atmosphere through a vacuum adjustment valve V7.

【0008】洗浄槽2とリザーブタンク3とは、洗浄液
導入管10と洗浄液排出管11で接続されており、それ
ぞれには、洗浄液導入弁V9と洗浄液排出弁V4が設け
られている。また、リザーブタンク3には、濾過フィル
ターFと循環ポンプ12と循環停止弁V11とによって
循環路が形成されており、内部の洗浄液を循環させるこ
とによって濾過している。なお、リザーブタンク2に
は、大気開放弁V10が設けられており、また、真空ポ
ンプ7の入力側とリザーブタンク2とは、真空弁V8を
通して接続されている。蒸気発生槽4には、オイルヒー
タ13aとポンプPとによる加熱部13が設けられてお
り、洗浄液の沸点と内部圧力とに対応した所定温度で加
熱することにより、洗浄液の蒸気を常に発生させてい
る。そして、蒸発によって減少する洗浄液は、液面調整
タンク14から補給されるようになっている。蒸気発生
槽4から発生した蒸気は、洗浄槽2の外周部に設けられ
た保温タンク15を通過するとき、洗浄槽2を加熱して
一部が液化されるが、洗浄液及びその蒸気は、保温弁V
2を通してクリーンタンク16に導入される。ここで、
蒸気発生槽4では、急激な加熱を行わないので、クリー
ンタンク16には純度の高い洗浄液が回収される。クリ
ーンタンク16の上部は、コンデンサ17と接続されて
おり、コンデンサ17の出力側は、セパレートタンク1
8や循環ポンプ19などで構成されたエゼクター20に
接続されている。その為、クリーンタンク16から吸引
された洗浄液の蒸気は、コンデンサ17で液化された
後、エゼクター20によって吸引されてセパレートタン
ク18に導入される。一方、セパレートタンク18は、
クッションタンク21に接続されており、クッションタ
ンク21は、再生液流入弁V12と循環ポンプ12と供
給液停止弁V13とを介して、液面調整タンク14に接
続されている。尚、クッションタンク21は、コールド
トラップ8とも接続されておりコールドトラップ8で液
化された洗浄液を回収するようになっている。
[0008] The cleaning tank 2 and the reserve tank 3 are connected by a cleaning liquid introducing pipe 10 and a cleaning liquid discharging pipe 11, and each of them is provided with a cleaning liquid introducing valve V9 and a cleaning liquid discharging valve V4. In addition, a circulation path is formed in the reserve tank 3 by the filtration filter F, the circulation pump 12, and the circulation stop valve V11, and the inside of the tank is filtered by circulating the cleaning liquid therein. The reserve tank 2 is provided with an atmosphere release valve V10, and the input side of the vacuum pump 7 and the reserve tank 2 are connected through a vacuum valve V8. The steam generation tank 4 is provided with a heating unit 13 including an oil heater 13a and a pump P. The heating unit 13 is heated at a predetermined temperature corresponding to the boiling point and the internal pressure of the cleaning liquid to constantly generate the cleaning liquid vapor. I have. The cleaning liquid reduced by evaporation is supplied from the liquid level adjusting tank 14. When the steam generated from the steam generating tank 4 passes through the heat retaining tank 15 provided on the outer peripheral portion of the cleaning tank 2, the cleaning tank 2 is heated and a part thereof is liquefied. Valve V
2 to the clean tank 16. here,
Since no rapid heating is performed in the steam generation tank 4, a highly pure cleaning liquid is collected in the clean tank 16. The upper part of the clean tank 16 is connected to the condenser 17, and the output side of the condenser 17 is connected to the separate tank 1.
8 and a circulating pump 19. Therefore, the vapor of the cleaning liquid sucked from the clean tank 16 is liquefied by the condenser 17, then sucked by the ejector 20 and introduced into the separate tank 18. On the other hand, the separate tank 18
The cushion tank 21 is connected to a liquid level adjusting tank 14 via a regeneration liquid inflow valve V12, a circulation pump 12, and a supply liquid stop valve V13. The cushion tank 21 is also connected to the cold trap 8, and collects the cleaning liquid liquefied by the cold trap 8.

【0009】このように、この洗浄装置1Aでは、蒸気
発生槽4→保温タンク15→クリーンタンク16→コン
デンサ17→エゼクター20→クッションタンク21→
リザーブタンク3→液面調整タンク14からなる蒸留再
生ラインが形成されている。なお、洗浄液の種類に応じ
て異なるが、蒸気発生槽4は、エゼクター20によって
500〜650mmHg程度の減圧状態になっており、
洗浄液の沸点を低下させた状態で、効率のよい蒸留再生
が行われている。一方、クリーンタンク16と洗浄槽2
の間には、蒸気発生ラインが形成されている。すなわ
ち、クリーンタンク16の下部は、シャワーポンプ22
と蒸気発生弁V1とを介して蒸気発生器23に接続され
ており、蒸気発生器23には、オイルヒータ24aとポ
ンプPなどによる強制加熱部24が設けられている。こ
の蒸気発生器23は、その出力部が洗浄槽2に連通する
と共に、液溜部が液循環弁V14を介してクリーンタン
ク16に接続されている。そして、蒸気発生弁V1が開
放されると、蒸気発生器23の入力部に設けられたスプ
レーノズルから洗浄液が噴射されるので、真空環境下で
急速加熱されることによって洗浄液の蒸気が発生する。
このとき、蒸気発生器23に導入される洗浄液は、その
純度が高いので、急速加熱しても発生蒸気の純度が損な
われることはない。なお、蒸気発生弁V1に合わせて液
循環弁V14も開放されており、気化しなかった洗浄液
はクリーンタンク16に回収される。同様に、蒸気発生
弁V1に合わせて蒸気排出弁V3も開放されるので、洗
浄槽2に供給された蒸気や洗浄槽2で液化した洗浄液
は、エゼクター20の機能によってコンデンサ17に吸
入される。
As described above, in the cleaning apparatus 1A, the steam generating tank 4 → the heat retaining tank 15 → the clean tank 16 → the condenser 17 → the ejector 20 → the cushion tank 21 →
A distillation regeneration line consisting of the reserve tank 3 and the liquid level adjustment tank 14 is formed. In addition, although it changes according to the kind of washing | cleaning liquid, the steam generation tank 4 is in the reduced pressure state of about 500-650 mmHg by the ejector 20,
With the boiling point of the washing liquid lowered, efficient distillation regeneration is performed. On the other hand, the clean tank 16 and the cleaning tank 2
Between them, a steam generation line is formed. That is, the lower part of the clean tank 16 is
The steam generator 23 is connected to a steam generator 23 via a steam generator valve V1. The steam generator 23 is provided with an oil heater 24a and a forced heating unit 24 such as a pump P. The output of the steam generator 23 communicates with the cleaning tank 2 and the liquid reservoir is connected to the clean tank 16 via a liquid circulation valve V14. Then, when the steam generation valve V1 is opened, the cleaning liquid is jetted from the spray nozzle provided at the input portion of the steam generator 23, so that the cleaning liquid is vaporized by being rapidly heated in a vacuum environment.
At this time, since the cleaning liquid introduced into the steam generator 23 has a high purity, the purity of the generated steam is not impaired even if the cleaning liquid is rapidly heated. Note that the liquid circulation valve V14 is also opened in accordance with the steam generation valve V1, and the cleaning liquid that has not been vaporized is collected in the clean tank 16. Similarly, since the steam discharge valve V3 is also opened in accordance with the steam generation valve V1, the steam supplied to the cleaning tank 2 and the cleaning liquid liquefied in the cleaning tank 2 are sucked into the condenser 17 by the function of the ejector 20.

【0010】以上、図1に示す洗浄装置1Aについて、
主として機器構成を説明したので、次に、洗浄装置1A
の洗浄動作について説明する。 〔超音波洗浄〕洗浄槽2に被洗浄物を投入して蓋体6を
密閉したら、最初に、真空弁V5のみを開放し、真空ポ
ンプ7を駆動させて、洗浄槽2の気圧を60mmHg
(−700mmHg)程度まで減圧させる。次に、真空
弁V5を閉じた後、洗浄液導入弁V9と大気開放弁V1
0とを開放する。すると、洗浄槽2が減圧状態であるこ
とから、リザーブタンク3の洗浄液は、1分間に200
リットル程度、洗浄液導入管10を通って洗浄槽2に供
給される。この時、スプレーノズルを通して洗浄槽2の
壁面全体に洗浄液を膜状に供給するか、或いは、スプレ
ーノズルからの洗浄液を霧状、フラット状、又は円錐状
に形成して真空下にさらすことにより、洗浄液の溶存気
体(酸素)を脱気させる。なお、この脱気処理により、
6〜7ppm の溶存酸素が1〜2ppm 程度まで減少し、音
圧測定によると音圧が8mVから18mVまで上昇すること
が実験的に確認されている。
As described above, the cleaning apparatus 1A shown in FIG.
Since the device configuration has been mainly described, the cleaning apparatus 1A is next described.
Will be described. [Ultrasonic cleaning] After the object to be cleaned is put into the cleaning tank 2 and the lid 6 is closed, first, only the vacuum valve V5 is opened, and the vacuum pump 7 is driven to reduce the pressure of the cleaning tank 2 to 60 mmHg.
The pressure is reduced to about (−700 mmHg). Next, after closing the vacuum valve V5, the cleaning liquid introduction valve V9 and the atmosphere release valve V1 are opened.
Release 0. Then, since the cleaning tank 2 is in a depressurized state, the cleaning liquid in the reserve tank 3 is discharged for 200 minutes per minute.
About 1 liter is supplied to the cleaning tank 2 through the cleaning liquid introduction pipe 10. At this time, the cleaning liquid is supplied in the form of a film to the entire wall surface of the cleaning tank 2 through the spray nozzle, or the cleaning liquid from the spray nozzle is formed into a mist, flat, or conical shape and exposed to a vacuum. Degas the dissolved gas (oxygen) in the cleaning solution. In addition, by this deaeration process,
It has been experimentally confirmed that the dissolved oxygen of 6 to 7 ppm is reduced to about 1 to 2 ppm, and the sound pressure is increased from 8 mV to 18 mV according to the sound pressure measurement.

【0011】その後、洗浄液導入弁V9と大気開放弁V
10を閉じて、超音波発振器5を動作させて洗浄槽2内
の被洗浄物を超音波洗浄する。前述したように、この洗
浄液からは、キャビテーションを阻害する溶存酸素が除
去されているので、強力な洗浄力を発揮する。なお、こ
の超音波洗浄の動作中、真空弁V8を開放させて、真空
ポンプ7によってリザーブタンク3の気圧を60mmH
g(−700mmHg)程度まで減圧させる。超音波洗
浄が完了すると、洗浄槽2の大気開放弁V6と、洗浄液
排出管11の洗浄液排出弁V4とを共に開放して、洗浄
槽2の洗浄液をリザーブタンク3に回収する。このよう
に、本発明の洗浄装置1Aでは、リザーブタンク3と洗
浄槽2の気圧差を利用して、洗浄液の供給や排出を行っ
ているので、ポンプなどの動力機器を用いる場合より安
全であり、しかも迅速に給排液の動作を終えることがで
きる。
Thereafter, the cleaning liquid introduction valve V9 and the atmosphere release valve V
10 is closed, the ultrasonic oscillator 5 is operated, and the object to be cleaned in the cleaning tank 2 is ultrasonically cleaned. As described above, since the dissolved oxygen that inhibits cavitation is removed from the cleaning liquid, a strong cleaning power is exhibited. During the operation of the ultrasonic cleaning, the vacuum valve V8 is opened, and the pressure of the reserve tank 3 is reduced to 60 mmH by the vacuum pump 7.
g (−700 mmHg). When the ultrasonic cleaning is completed, the air release valve V6 of the cleaning tank 2 and the cleaning liquid discharge valve V4 of the cleaning liquid discharge pipe 11 are both opened, and the cleaning liquid in the cleaning tank 2 is collected in the reserve tank 3. As described above, in the cleaning apparatus 1A of the present invention, the supply and discharge of the cleaning liquid are performed by utilizing the pressure difference between the reserve tank 3 and the cleaning tank 2, so that it is safer than using a power device such as a pump. In addition, the operation of supply and drainage can be completed quickly.

【0012】〔蒸気洗浄(シャワー洗浄)〕蒸気洗浄を
行う場合は、続いて、真空弁V5のみを開放し、真空ポ
ンプ7によって洗浄槽2を60mmHg程度まで減圧し
た後、真空弁V5を閉じる。なお、蒸気発生器23と洗
浄槽2とは連通されているので、この状態では、蒸気発
生器23も、洗浄槽2と同様の減圧状態にある。次に、
蒸気発生弁V1、蒸気排出弁V3、及び循環弁V14を
開放すると、シャワーポンプ22によって蒸気発生器2
3に供給された洗浄液シャワーは、減圧状態で急速加熱
されて一気に気化されて洗浄槽2に供給される。この
時、洗浄槽2の壁面は、保温タンク15に流通する蒸留
再生用の蒸気により保温されているので、蒸気発生器2
3から供給される蒸気は、洗浄槽2の壁面で液化するこ
となく、有効に被洗浄物を蒸気洗浄する。洗浄槽2に噴
出された洗浄液の蒸気は、被洗浄物を蒸気洗浄しつつ一
部は液化し、蒸気と共に蒸気排出弁23を通ってコンデ
ンサ17に伝えられる。そして、洗浄液の蒸気は、コン
デンサ17で液化され、エゼクタ20のセパレートタン
ク18に吸入される。
[Steam Cleaning (Shower Cleaning)] When performing steam cleaning, subsequently, only the vacuum valve V5 is opened, the pressure of the cleaning tank 2 is reduced to about 60 mmHg by the vacuum pump 7, and then the vacuum valve V5 is closed. Since the steam generator 23 and the cleaning tank 2 are in communication with each other, in this state, the steam generator 23 is also in a reduced pressure state similar to that of the cleaning tank 2. next,
When the steam generation valve V1, the steam discharge valve V3, and the circulation valve V14 are opened, the steam generator 2 is
The cleaning liquid shower supplied to the cleaning liquid 3 is rapidly heated under reduced pressure, vaporized at a stretch, and supplied to the cleaning tank 2. At this time, since the wall surface of the washing tank 2 is kept warm by the steam for distillation regeneration flowing through the heat keeping tank 15, the steam generator 2
The steam supplied from 3 does not liquefy on the wall surface of the washing tank 2 and effectively steam-cleans the object to be washed. The vapor of the cleaning liquid ejected to the cleaning tank 2 is partially liquefied while performing vapor cleaning on the object to be cleaned, and is transmitted to the condenser 17 through the vapor discharge valve 23 together with the vapor. Then, the vapor of the cleaning liquid is liquefied by the condenser 17 and is sucked into the separate tank 18 of the ejector 20.

【0013】本発明における蒸気洗浄では、蒸留再生さ
れたクリーンタンク16の洗浄液を、蒸気発生器23に
おいて再度気化させ、これが被洗浄物に触れることによ
って液化している。従って、非常に高純度の蒸気洗浄を
実現することができ、洗浄時間を短縮化することができ
る。このようにして、蒸気洗浄が完了すれば、蒸気発生
弁V1と循環弁V14を閉じて、蒸気排出弁V3のみ開
放状態にして蒸気を排出する。なお、この蒸気洗浄の動
作中、保温弁V2は開放状態であるので、蒸留再生の動
作は持続されており中断することはない。以上、蒸気洗
浄について説明したが、蒸気発生器23から蒸気を噴出
させた状態で、洗浄槽2の蓋体6の内面に冷却水を循環
させるようにすれば、導入された蒸気が液化して被洗浄
物に降り注がれるのでシャワー洗浄を行うことができ
る。このシャワー洗浄の場合には、二段再生(保温タン
ク15での再生と蓋体6での再生)された洗浄液を用い
ることになるので、きわめて高純度の洗浄液によるシャ
ワー洗浄を実現することができる。また、シャワー洗浄
と蒸気洗浄とは、蓋体6の内面に冷却水を循環させるか
否かで切替えできるので、所定時間だけシャワー洗浄を
行い、その後、円滑に蒸気洗浄に移行させることができ
る。
In the steam cleaning according to the present invention, the cleaning liquid of the clean tank 16 that has been distilled and regenerated is vaporized again in the steam generator 23 and liquefied by touching the object to be cleaned. Therefore, very high-purity steam cleaning can be realized, and the cleaning time can be shortened. In this manner, when the steam cleaning is completed, the steam generation valve V1 and the circulation valve V14 are closed, and only the steam discharge valve V3 is opened to discharge the steam. During the operation of the steam cleaning, the heat retaining valve V2 is in the open state, so that the operation of the distillation regeneration is continued and is not interrupted. Although the steam cleaning has been described above, if the cooling water is circulated through the inner surface of the lid 6 of the cleaning tank 2 in a state where the steam is jetted from the steam generator 23, the introduced steam is liquefied. Since it is poured onto the object to be cleaned, shower cleaning can be performed. In the case of this shower cleaning, the cleaning liquid regenerated in two steps (regeneration in the heat retaining tank 15 and regeneration in the lid 6) is used, so that shower cleaning with an extremely high-purity cleaning liquid can be realized. . In addition, since the shower cleaning and the steam cleaning can be switched depending on whether or not the cooling water is circulated through the inner surface of the lid 6, the shower cleaning can be performed for a predetermined time, and then the process can be smoothly shifted to the steam cleaning.

【0014】〔真空乾燥〕続いて、蒸気排出弁V3を閉
じ、真空弁V5のみを開放して真空ポンプ7によって洗
浄槽2を減圧する。すると、被洗浄物表面に付着してい
る洗浄液は、急速に気化され被洗浄物が乾燥することに
なる。なお、洗浄槽2から吸引される洗浄液の蒸気やミ
ストは、コールドトラップ8において液化され、クッシ
ョンタンク21に無駄なく回収される。この真空乾燥を
行う場合、被洗浄物に付着した溶剤は沸騰乾燥するが、
反面、蒸気潜熱によって被洗浄物の表面温度を急激に低
下させることにもなる。そこで、被洗浄物の表面温度を
あまり低下させることがないよう、真空度調整弁V7を
適宜に開閉制御して、被洗浄物の材質、形状、寸法など
を考慮した最適な真空乾燥を実現している。
[Vacuum Drying] Subsequently, the steam discharge valve V3 is closed, only the vacuum valve V5 is opened, and the pressure in the cleaning tank 2 is reduced by the vacuum pump 7. Then, the cleaning liquid adhering to the surface of the object to be cleaned is rapidly vaporized and the object to be cleaned is dried. Note that the vapor or mist of the cleaning liquid sucked from the cleaning tank 2 is liquefied in the cold trap 8 and is collected in the cushion tank 21 without waste. When performing this vacuum drying, the solvent adhering to the object to be washed is dried by boiling,
On the other hand, the surface temperature of the object to be cleaned is rapidly lowered by the latent heat of steam. Therefore, the vacuum degree adjusting valve V7 is appropriately opened and closed so as not to lower the surface temperature of the object to be cleaned so that the optimum vacuum drying is realized in consideration of the material, shape, dimensions, etc. of the object to be cleaned. ing.

【0015】(B)第2実施例 図2は、この発明の別の実施例である洗浄装置1Bを図
示したものである。この洗浄装置1Bは、クリーンタン
ク16と洗浄槽2の間の蒸気発生ラインに特徴があり、
それ以外は、図1の洗浄装置1Aの構成と同様である。
すなわち、クリーンタンク16と洗浄槽2の間には、ク
リーンタンク16の洗浄液を洗浄槽2に供給するシャワ
ーポンプ22と、洗浄液を100〜150℃程度まで加
熱する加熱ヒータ24Bと、洗浄動作時に開放される蒸
気発生弁V1とが設けられている。超音波洗浄や真空乾
燥の動作については、図2の洗浄装置1Bは、図1の洗
浄装置1Aの動作と同じであるので、シャワー洗浄と蒸
気洗浄の動作について説明する。
(B) Second Embodiment FIG. 2 shows a cleaning apparatus 1B according to another embodiment of the present invention. This cleaning apparatus 1B is characterized by a steam generation line between the clean tank 16 and the cleaning tank 2.
Otherwise, the configuration is the same as that of the cleaning apparatus 1A in FIG.
That is, between the clean tank 16 and the cleaning tank 2, a shower pump 22 for supplying the cleaning liquid of the clean tank 16 to the cleaning tank 2, a heater 24B for heating the cleaning liquid to about 100 to 150 ° C., and an opening during the cleaning operation. The steam generation valve V1 is provided. The operations of the ultrasonic cleaning and the vacuum drying are the same as those of the cleaning device 1A of FIG. 1 in the cleaning device 1B in FIG.

【0016】〔蒸気洗浄(シャワー洗浄)〕真空弁V5
のみを開放し、真空ポンプ7によって洗浄槽2を60m
mHg程度まで減圧した後、真空弁V5を閉じる。な
お、この洗浄装置1Bでは、蒸気発生弁V1が、洗浄槽
2に近接して設けられているので、洗浄槽2のみが減圧
状態となる。この状態で、蒸気発生弁V1を開放する
と、シャワーポンプ22によってクリーンタンク16か
ら吸入された洗浄液は、加温ヒータ24Bを通過する過
程で急激に加熱されて100〜150℃程度となり、こ
の状態のままスプレーノズルから洗浄槽2に供給され
る。この時、洗浄槽2は、減圧状態にあるので、霧状、
粒子状、又は膜状に噴出された洗浄液は、一気に蒸気と
なり、その一部が被洗浄物に接触することによって液化
される。なお、洗浄槽2の壁面は、保温タンク15に流
通する蒸留再生用の蒸気により保温されているので、有
効に被洗浄物を蒸気洗浄するのは洗浄装置1Aの場合と
同じである。被洗浄物を蒸気洗浄しつつ液化した洗浄液
は、洗浄液の蒸気と共に蒸気排出弁3を通ってコンデン
サ17に伝えられ、洗浄液の蒸気はコンデンサ17で液
化されて、エゼクタ20のセパレートタンク18に吸入
される。以上、蒸気洗浄について説明したが、蒸気洗浄
に先立ってシャワー洗浄を行うのであれば、加温ヒータ
24Bを動作させない状態で、蒸気発生弁V1を開放さ
せてシャワーポンプ22を動作させれば良い。すると、
スプレーノズルからの洗浄液が被洗浄物に降り注がれシ
ャワー洗浄を行うことができる。
[Steam cleaning (shower cleaning)] Vacuum valve V5
Only, and the cleaning tank 2 is
After reducing the pressure to about mHg, the vacuum valve V5 is closed. In the cleaning apparatus 1B, since the steam generation valve V1 is provided near the cleaning tank 2, only the cleaning tank 2 is in a reduced pressure state. When the steam generation valve V1 is opened in this state, the cleaning liquid sucked from the clean tank 16 by the shower pump 22 is rapidly heated to about 100 to 150 ° C. while passing through the heating heater 24B. It is supplied to the washing tank 2 from the spray nozzle as it is. At this time, the cleaning tank 2 is in a depressurized state,
The cleaning liquid ejected in the form of particles or film becomes vapor at a stretch, and is liquefied when a part thereof comes into contact with the object to be cleaned. Since the wall surface of the cleaning tank 2 is kept warm by the steam for distillation regeneration flowing through the heat retaining tank 15, the object to be cleaned is effectively vapor-cleaned as in the case of the cleaning apparatus 1A. The cleaning liquid liquefied while the object to be cleaned is vapor-cleaned is transmitted to the condenser 17 through the vapor discharge valve 3 together with the vapor of the cleaning liquid, and the vapor of the cleaning liquid is liquefied by the condenser 17 and sucked into the separate tank 18 of the ejector 20. You. Although the steam cleaning has been described above, if the shower cleaning is performed prior to the steam cleaning, the steam generating valve V1 may be opened and the shower pump 22 may be operated without operating the heating heater 24B. Then
The cleaning liquid from the spray nozzle is poured onto the object to be cleaned, and shower cleaning can be performed.

【0017】[0017]

【発明の効果】以上、説明したように、本発明では、蒸
気発生槽から発生する蒸気は、蒸気洗浄に用いられる訳
ではないので、洗浄液の種類に応じた最適な温度と圧力
とで蒸気を発生させることができ、洗浄槽保温部を経る
ことにより、純度の高い洗浄液を蒸留再生することがで
きる。高純度に蒸留再生された洗浄液は、蒸気発生器か
強制加熱部を経て洗浄槽に供給されるが、洗浄液の純度
が高いので、例え、過大に加熱したとしても洗浄蒸気の
質を劣化させることはない。また、洗浄槽は、洗浄槽保
温部に供給される洗浄蒸気によって保温されているの
で、この点でも蒸気洗浄の効率が高い。また、本発明で
は、洗浄槽及び貯留槽を所定レベルまで減圧可能な第1
の減圧機構を備えているので、動力機器を用いることな
く、洗浄液の供給と排出を実現することができる。
As described above, in the present invention, since the steam generated from the steam generation tank is not used for steam cleaning, the steam is generated at the optimum temperature and pressure according to the type of the cleaning liquid. The cleaning liquid having a high purity can be distilled and regenerated by passing through the cleaning tank heat retaining section. The cleaning liquid that has been distilled and regenerated to high purity is supplied to the cleaning tank via a steam generator or a forced heating unit.However, since the cleaning liquid has high purity, even if heated excessively, the quality of the cleaning steam may deteriorate. There is no. In addition, since the cleaning tank is kept warm by the cleaning steam supplied to the cleaning tank heat retaining unit, the efficiency of the steam cleaning is high also in this regard. Further, in the present invention, the first tank capable of reducing the pressure of the washing tank and the storage tank to a predetermined level.
, The supply and discharge of the cleaning liquid can be realized without using any power equipment.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例である洗浄装置を図示したも
のである。
FIG. 1 illustrates a cleaning apparatus according to an embodiment of the present invention.

【図2】本発明の別の実施例である洗浄装置を図示した
ものである。
FIG. 2 illustrates a cleaning apparatus according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

V4,V9 開閉弁 2 洗浄槽 3 リザーブタンク(貯留槽) 4 蒸気発生槽 7 真空ポンプ(第1の減圧機構) 15 保温タンク(洗浄槽保温部) 16 クリーンタンク 17 コンデンサ(凝縮機構) 20 エゼクター(第2の減圧機構) 23 蒸気発生器 24 強制加熱部(加熱機構) 24B 加温ヒータ(強制加熱部) V4, V9 On-off valve 2 Cleaning tank 3 Reserve tank (storage tank) 4 Steam generation tank 7 Vacuum pump (first decompression mechanism) 15 Heat retention tank (Washing tank heating section) 16 Clean tank 17 Condenser (condensing mechanism) 20 Ejector ( (Second decompression mechanism) 23 Steam generator 24 Forced heating unit (heating mechanism) 24B Heating heater (forced heating unit)

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 開閉弁を介して互いに連通している洗浄
槽及び貯留槽と、前記洗浄槽及び貯留槽を所定レベルま
で減圧可能な第1の減圧機構と、適宜な加熱状態にある
洗浄液を内部に含む蒸気発生槽と、前記洗浄槽の外周部
に設けられ前記蒸気発生槽から洗浄蒸気の供給を受ける
洗浄槽保温部と、前記洗浄液保温部において液化した洗
浄液を蓄えるクリーンタンクと、前記クリーンタンクを
経由する洗浄蒸気を凝縮する凝縮機構と、前記凝縮機構
に接続されて前記蒸気発生槽を所定の減圧状態に維持す
る第2の減圧機構と、前記洗浄槽に連通されると共に内
部に加熱機構を備える蒸気発生器とを備え、 クリーンタンクから供給される洗浄液が、減圧状態にあ
る前記蒸気発生器に噴射されることにより、前記洗浄槽
に洗浄蒸気が供給されるようになっていることを特徴と
する洗浄装置。
1. A cleaning tank and a storage tank communicating with each other via an on-off valve, a first pressure reducing mechanism capable of reducing the pressure of the cleaning tank and the storage tank to a predetermined level, and a cleaning liquid in an appropriate heating state. A steam generation tank included therein, a cleaning tank warming section provided on an outer peripheral portion of the cleaning tank and receiving a supply of cleaning steam from the steam generating tank, a clean tank storing a cleaning liquid liquefied in the cleaning liquid warming section, and A condensing mechanism for condensing the cleaning steam passing through the tank, a second depressurizing mechanism connected to the condensing mechanism to maintain the steam generating tank in a predetermined depressurized state, and connected to the cleaning tank and heated inside A steam generator provided with a mechanism, wherein a cleaning liquid supplied from a clean tank is injected into the steam generator in a reduced pressure state so that cleaning steam is supplied to the cleaning tank. Cleaning apparatus, characterized in that it it.
【請求項2】 開閉弁を介して互いに連通している洗浄
槽及び貯留槽と、前記洗浄槽及び貯留槽を所定レベルま
で減圧可能な第1の減圧機構と、適宜な加熱状態にある
洗浄液を内部に含む蒸気発生槽と、前記洗浄槽の外周部
に設けられ前記蒸気発生槽から洗浄蒸気の供給を受ける
洗浄槽保温部と、前記洗浄液保温部において液化した洗
浄液を蓄えるクリーンタンクと、前記クリーンタンクを
経由する洗浄蒸気を凝縮する凝縮機構と、前記凝縮機構
に接続されて前記蒸気発生槽を所定の減圧状態に維持す
る第2の減圧機構と、前記クリーンタンクの洗浄液を加
熱しつつ前記洗浄槽に供給する強制加熱部とを備え、 クリーンタンクから供給される洗浄液が、減圧状態にあ
る前記洗浄槽に噴射されることにより、前記洗浄槽に洗
浄蒸気が供給されるようになっていることを特徴とする
洗浄装置。
2. A cleaning tank and a storage tank communicating with each other via an on-off valve, a first decompression mechanism capable of reducing the pressure of the cleaning tank and the storage tank to a predetermined level, and a cleaning liquid in an appropriate heating state. A steam generation tank included therein, a cleaning tank warming section provided on an outer peripheral portion of the cleaning tank and receiving a supply of cleaning steam from the steam generating tank, a clean tank storing a cleaning liquid liquefied in the cleaning liquid warming section, and A condensing mechanism for condensing the cleaning steam passing through the tank, a second depressurizing mechanism connected to the condensing mechanism to maintain the steam generating tank in a predetermined depressurized state, and the cleaning while heating the cleaning liquid in the clean tank. A cleaning liquid supplied from a clean tank to the cleaning tank in a reduced pressure state, whereby cleaning steam is supplied to the cleaning tank. Cleaning apparatus, characterized in that turned earthenware pots.
【請求項3】 前記第1の減圧機構は、浸漬洗浄や超音
波洗浄に先立って前記洗浄槽を所定レベルまで減圧し、
一方、洗浄動作中は前記貯留槽を所定レベルまで減圧し
て、前記洗浄槽と貯留槽の気圧差によって洗浄液の供給
と排出を行っていることを特徴とする請求項1又は請求
項2に記載の洗浄装置。
3. The first decompression mechanism depressurizes the cleaning tank to a predetermined level prior to immersion cleaning or ultrasonic cleaning,
On the other hand, during the cleaning operation, the pressure of the storage tank is reduced to a predetermined level, and the supply and discharge of the cleaning liquid are performed by a pressure difference between the cleaning tank and the storage tank. Cleaning equipment.
【請求項4】 前記洗浄槽には、貯留槽から供給される
洗浄液の流入口にシャワー手段が設けられていて、所定
の減圧状態において脱気しつつ洗浄液の流入を実現して
いることを特徴とする請求項3に記載の洗浄装置。
4. The cleaning tank is provided with a shower means at an inlet of a cleaning liquid supplied from a storage tank, and realizes an inflow of the cleaning liquid while being degassed in a predetermined reduced pressure state. The cleaning device according to claim 3, wherein
【請求項5】 前記洗浄槽には、強制冷却手段が設けら
れていて、洗浄蒸気が供給されているとき、これを強制
的に液化させてシャワー洗浄を実現していることを特徴
とする請求項1に記載の洗浄装置。
5. The cleaning bath is provided with a forced cooling means, and when cleaning steam is supplied, the cleaning steam is forcibly liquefied to realize shower cleaning. Item 7. The cleaning device according to Item 1.
JP08215361A 1996-07-25 1996-07-25 Cleaning equipment Expired - Fee Related JP3096241B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP08215361A JP3096241B2 (en) 1996-07-25 1996-07-25 Cleaning equipment
JP2000121121A JP3634718B2 (en) 1996-07-25 2000-04-21 Cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08215361A JP3096241B2 (en) 1996-07-25 1996-07-25 Cleaning equipment

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2000121121A Division JP3634718B2 (en) 1996-07-25 2000-04-21 Cleaning device

Publications (2)

Publication Number Publication Date
JPH1034097A true JPH1034097A (en) 1998-02-10
JP3096241B2 JP3096241B2 (en) 2000-10-10

Family

ID=16671025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP08215361A Expired - Fee Related JP3096241B2 (en) 1996-07-25 1996-07-25 Cleaning equipment

Country Status (1)

Country Link
JP (1) JP3096241B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004321875A (en) * 2003-04-22 2004-11-18 Fujitsu Ltd Ultrasonic cleaning method and semiconductor device production method
JP2006231272A (en) * 2005-02-28 2006-09-07 Nachi Fujikoshi Corp Vacuum degreasing and washing apparatus
JP2006231273A (en) * 2005-02-28 2006-09-07 Nachi Fujikoshi Corp Vacuum degreasing and washing apparatus
CN108998837A (en) * 2018-09-07 2018-12-14 河北宇腾羊绒制品有限公司 A kind of wool cleaning device with circular water replenishing function
CN114713153A (en) * 2022-04-18 2022-07-08 苏州云合成智能技术有限公司 Continuous flow reaction apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05123658A (en) * 1991-10-17 1993-05-21 Japan Field Kk Method for cleaning body to be cleaned and apparatus therefor
JPH0767552B2 (en) * 1986-05-29 1995-07-26 株式会社日立製作所 Cleaning equipment
JPH08158080A (en) * 1994-11-29 1996-06-18 Dowa Mining Co Ltd Cleaning work of metal or the like and device therefor
JPH0938600A (en) * 1995-07-31 1997-02-10 Japan Field Kk Washing method of article to be washed and apparatus therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0767552B2 (en) * 1986-05-29 1995-07-26 株式会社日立製作所 Cleaning equipment
JPH05123658A (en) * 1991-10-17 1993-05-21 Japan Field Kk Method for cleaning body to be cleaned and apparatus therefor
JPH08158080A (en) * 1994-11-29 1996-06-18 Dowa Mining Co Ltd Cleaning work of metal or the like and device therefor
JPH0938600A (en) * 1995-07-31 1997-02-10 Japan Field Kk Washing method of article to be washed and apparatus therefor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004321875A (en) * 2003-04-22 2004-11-18 Fujitsu Ltd Ultrasonic cleaning method and semiconductor device production method
JP4587646B2 (en) * 2003-04-22 2010-11-24 富士通セミコンダクター株式会社 Manufacturing method of semiconductor device
JP2006231272A (en) * 2005-02-28 2006-09-07 Nachi Fujikoshi Corp Vacuum degreasing and washing apparatus
JP2006231273A (en) * 2005-02-28 2006-09-07 Nachi Fujikoshi Corp Vacuum degreasing and washing apparatus
CN108998837A (en) * 2018-09-07 2018-12-14 河北宇腾羊绒制品有限公司 A kind of wool cleaning device with circular water replenishing function
CN114713153A (en) * 2022-04-18 2022-07-08 苏州云合成智能技术有限公司 Continuous flow reaction apparatus
CN114713153B (en) * 2022-04-18 2024-01-26 苏州云合成智能技术有限公司 Continuous flow reaction apparatus

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