JPH10335282A5 - - Google Patents

Info

Publication number
JPH10335282A5
JPH10335282A5 JP1997140443A JP14044397A JPH10335282A5 JP H10335282 A5 JPH10335282 A5 JP H10335282A5 JP 1997140443 A JP1997140443 A JP 1997140443A JP 14044397 A JP14044397 A JP 14044397A JP H10335282 A5 JPH10335282 A5 JP H10335282A5
Authority
JP
Japan
Prior art keywords
brush
substrate
discharge
scrubber
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997140443A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10335282A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9140443A priority Critical patent/JPH10335282A/ja
Priority claimed from JP9140443A external-priority patent/JPH10335282A/ja
Publication of JPH10335282A publication Critical patent/JPH10335282A/ja
Publication of JPH10335282A5 publication Critical patent/JPH10335282A5/ja
Pending legal-status Critical Current

Links

JP9140443A 1997-05-29 1997-05-29 ブラシスクラバ Pending JPH10335282A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9140443A JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9140443A JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Publications (2)

Publication Number Publication Date
JPH10335282A JPH10335282A (ja) 1998-12-18
JPH10335282A5 true JPH10335282A5 (enrdf_load_html_response) 2005-03-17

Family

ID=15268762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9140443A Pending JPH10335282A (ja) 1997-05-29 1997-05-29 ブラシスクラバ

Country Status (1)

Country Link
JP (1) JPH10335282A (enrdf_load_html_response)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6295683B1 (en) * 1999-12-09 2001-10-02 United Microelectronics Corp. Equipment for brushing the underside of a semiconductor wafer
JP5058085B2 (ja) * 2008-07-02 2012-10-24 東京エレクトロン株式会社 基板洗浄装置
JP2010102772A (ja) * 2008-10-23 2010-05-06 Showa Denko Kk 磁気記録媒体用基板の洗浄装置及び磁気記録媒体用基板の洗浄方法
KR101020332B1 (ko) * 2009-02-04 2011-03-08 주식회사 엘지실트론 척 세척유니트
US10276365B2 (en) 2016-02-01 2019-04-30 SCREEN Holdings Co., Ltd. Substrate cleaning device, substrate processing apparatus, substrate cleaning method and substrate processing method
JP6726575B2 (ja) 2016-02-01 2020-07-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置、基板処理装置、基板洗浄方法および基板処理方法
CN117878026A (zh) * 2024-03-12 2024-04-12 西安奕斯伟材料科技股份有限公司 硅片清洗设备及硅片清洗方法

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