JPH10320810A - 半導体レーザ装置および光ピックアップ装置 - Google Patents

半導体レーザ装置および光ピックアップ装置

Info

Publication number
JPH10320810A
JPH10320810A JP9131970A JP13197097A JPH10320810A JP H10320810 A JPH10320810 A JP H10320810A JP 9131970 A JP9131970 A JP 9131970A JP 13197097 A JP13197097 A JP 13197097A JP H10320810 A JPH10320810 A JP H10320810A
Authority
JP
Japan
Prior art keywords
light
semiconductor laser
prism
semiconductor substrate
light receiving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9131970A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10320810A5 (enExample
Inventor
Kazuo Higashiura
一雄 東浦
Yoshio Hayashi
善雄 林
Tadashi Takeda
正 武田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidec Instruments Corp
Original Assignee
Sankyo Seiki Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sankyo Seiki Manufacturing Co Ltd filed Critical Sankyo Seiki Manufacturing Co Ltd
Priority to JP9131970A priority Critical patent/JPH10320810A/ja
Priority to US09/082,385 priority patent/US6184512B1/en
Priority to CNB981092233A priority patent/CN1154989C/zh
Publication of JPH10320810A publication Critical patent/JPH10320810A/ja
Publication of JPH10320810A5 publication Critical patent/JPH10320810A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0437Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using masks, aperture plates, spatial light modulators, spatial filters, e.g. reflective filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0477Prisms, wedges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/42Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/42Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Optical Head (AREA)
JP9131970A 1997-05-22 1997-05-22 半導体レーザ装置および光ピックアップ装置 Pending JPH10320810A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9131970A JPH10320810A (ja) 1997-05-22 1997-05-22 半導体レーザ装置および光ピックアップ装置
US09/082,385 US6184512B1 (en) 1997-05-22 1998-05-20 Semiconductor laser apparatus and optical pickup apparatus
CNB981092233A CN1154989C (zh) 1997-05-22 1998-05-22 半导体激光装置和光拾取装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9131970A JPH10320810A (ja) 1997-05-22 1997-05-22 半導体レーザ装置および光ピックアップ装置

Publications (2)

Publication Number Publication Date
JPH10320810A true JPH10320810A (ja) 1998-12-04
JPH10320810A5 JPH10320810A5 (enExample) 2005-03-03

Family

ID=15070491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9131970A Pending JPH10320810A (ja) 1997-05-22 1997-05-22 半導体レーザ装置および光ピックアップ装置

Country Status (3)

Country Link
US (1) US6184512B1 (enExample)
JP (1) JPH10320810A (enExample)
CN (1) CN1154989C (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004064051A1 (ja) * 2003-01-14 2004-07-29 Sony Corporation 半導体集積装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6657927B1 (en) * 1998-08-04 2003-12-02 Hitachi Maxell, Ltd. Optical head and apparatus provided therewith
SG108878A1 (en) * 2001-10-30 2005-02-28 Semiconductor Energy Lab Laser irradiation method and laser irradiation apparatus, and method for fabricating semiconductor device
JP6790364B2 (ja) * 2016-01-25 2020-11-25 三菱電機株式会社 光半導体装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5804814A (en) * 1994-05-20 1998-09-08 Musha; Toru Optical pick-up head and integrated type optical unit for use in optical pick-up head
JPH01273238A (ja) * 1988-04-25 1989-11-01 Sony Corp 光学ヘッド装置
JP3140085B2 (ja) 1991-05-28 2001-03-05 松下電子工業株式会社 半導体レーザ装置
US5350917A (en) * 1991-12-27 1994-09-27 Sony Corporation Opto-magnetic recording polarization optical apparatus including a laser diode and a light absorbing film
US5727111A (en) * 1995-06-19 1998-03-10 Sony Corporation Optical pick-up and light detecting cover therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004064051A1 (ja) * 2003-01-14 2004-07-29 Sony Corporation 半導体集積装置
US7525895B2 (en) 2003-01-14 2009-04-28 Sony Corporation Semiconductor integrated device

Also Published As

Publication number Publication date
CN1154989C (zh) 2004-06-23
US6184512B1 (en) 2001-02-06
CN1202694A (zh) 1998-12-23

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