CN1154989C - 半导体激光装置和光拾取装置 - Google Patents
半导体激光装置和光拾取装置 Download PDFInfo
- Publication number
- CN1154989C CN1154989C CNB981092233A CN98109223A CN1154989C CN 1154989 C CN1154989 C CN 1154989C CN B981092233 A CNB981092233 A CN B981092233A CN 98109223 A CN98109223 A CN 98109223A CN 1154989 C CN1154989 C CN 1154989C
- Authority
- CN
- China
- Prior art keywords
- light
- photodetector
- prism
- semiconductor chip
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 84
- 238000004381 surface treatment Methods 0.000 claims abstract description 4
- 230000003287 optical effect Effects 0.000 claims description 38
- 238000012544 monitoring process Methods 0.000 claims description 34
- 238000001514 detection method Methods 0.000 claims description 10
- 230000000149 penetrating effect Effects 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 2
- 238000009434 installation Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 5
- 201000009310 astigmatism Diseases 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000700 radioactive tracer Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0437—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using masks, aperture plates, spatial light modulators, spatial filters, e.g. reflective filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0477—Prisms, wedges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Optical Head (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP131970/97 | 1997-05-22 | ||
| JP9131970A JPH10320810A (ja) | 1997-05-22 | 1997-05-22 | 半導体レーザ装置および光ピックアップ装置 |
| JP131970/1997 | 1997-05-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1202694A CN1202694A (zh) | 1998-12-23 |
| CN1154989C true CN1154989C (zh) | 2004-06-23 |
Family
ID=15070491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB981092233A Expired - Fee Related CN1154989C (zh) | 1997-05-22 | 1998-05-22 | 半导体激光装置和光拾取装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6184512B1 (enExample) |
| JP (1) | JPH10320810A (enExample) |
| CN (1) | CN1154989C (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6657927B1 (en) * | 1998-08-04 | 2003-12-02 | Hitachi Maxell, Ltd. | Optical head and apparatus provided therewith |
| SG108878A1 (en) * | 2001-10-30 | 2005-02-28 | Semiconductor Energy Lab | Laser irradiation method and laser irradiation apparatus, and method for fabricating semiconductor device |
| JP4196266B2 (ja) * | 2003-01-14 | 2008-12-17 | ソニー株式会社 | 半導体集積装置 |
| JP6790364B2 (ja) * | 2016-01-25 | 2020-11-25 | 三菱電機株式会社 | 光半導体装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5804814A (en) * | 1994-05-20 | 1998-09-08 | Musha; Toru | Optical pick-up head and integrated type optical unit for use in optical pick-up head |
| JPH01273238A (ja) * | 1988-04-25 | 1989-11-01 | Sony Corp | 光学ヘッド装置 |
| JP3140085B2 (ja) | 1991-05-28 | 2001-03-05 | 松下電子工業株式会社 | 半導体レーザ装置 |
| US5350917A (en) * | 1991-12-27 | 1994-09-27 | Sony Corporation | Opto-magnetic recording polarization optical apparatus including a laser diode and a light absorbing film |
| US5727111A (en) * | 1995-06-19 | 1998-03-10 | Sony Corporation | Optical pick-up and light detecting cover therefor |
-
1997
- 1997-05-22 JP JP9131970A patent/JPH10320810A/ja active Pending
-
1998
- 1998-05-20 US US09/082,385 patent/US6184512B1/en not_active Expired - Lifetime
- 1998-05-22 CN CNB981092233A patent/CN1154989C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6184512B1 (en) | 2001-02-06 |
| JPH10320810A (ja) | 1998-12-04 |
| CN1202694A (zh) | 1998-12-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: NIDEC SANKYO CORP. Free format text: FORMER NAME OR ADDRESS: SANKYO SEIKI MFG. SEISAKUSHO K.K. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Nagano Patentee after: Sankyo Seiki Seisakusho KK Address before: Nagano Patentee before: Sankyo Seiki Manufacturing Co., Ltd. |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20040623 |