JPH10284390A - 反射鏡の形状制御装置、形状制御方法及び露光装置 - Google Patents

反射鏡の形状制御装置、形状制御方法及び露光装置

Info

Publication number
JPH10284390A
JPH10284390A JP9097922A JP9792297A JPH10284390A JP H10284390 A JPH10284390 A JP H10284390A JP 9097922 A JP9097922 A JP 9097922A JP 9792297 A JP9792297 A JP 9792297A JP H10284390 A JPH10284390 A JP H10284390A
Authority
JP
Japan
Prior art keywords
reflecting mirror
surface temperature
temperature
temperature distribution
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9097922A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10284390A5 (enExample
Inventor
Hitoshi Takeuchi
仁 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9097922A priority Critical patent/JPH10284390A/ja
Publication of JPH10284390A publication Critical patent/JPH10284390A/ja
Publication of JPH10284390A5 publication Critical patent/JPH10284390A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9097922A 1997-04-02 1997-04-02 反射鏡の形状制御装置、形状制御方法及び露光装置 Pending JPH10284390A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9097922A JPH10284390A (ja) 1997-04-02 1997-04-02 反射鏡の形状制御装置、形状制御方法及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9097922A JPH10284390A (ja) 1997-04-02 1997-04-02 反射鏡の形状制御装置、形状制御方法及び露光装置

Publications (2)

Publication Number Publication Date
JPH10284390A true JPH10284390A (ja) 1998-10-23
JPH10284390A5 JPH10284390A5 (enExample) 2005-10-27

Family

ID=14205194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9097922A Pending JPH10284390A (ja) 1997-04-02 1997-04-02 反射鏡の形状制御装置、形状制御方法及び露光装置

Country Status (1)

Country Link
JP (1) JPH10284390A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1353232A3 (en) * 2002-03-20 2004-01-02 Canon Kabushiki Kaisha Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
WO2004036316A1 (en) * 2002-10-15 2004-04-29 Carl Zeiss Smt Ag Optical arrangement and method of specifying and performing a deformation of an optical surface of an optical element being part of the optical arrangement
JP2006054453A (ja) * 2004-07-31 2006-02-23 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置の光学システム
CN100466238C (zh) * 2004-11-05 2009-03-04 国际商业机器公司 用于表征在非均匀热负荷下的热特性的方法和设备
JP2009081419A (ja) * 2007-08-14 2009-04-16 Asml Netherlands Bv リソグラフィ装置および熱光学マニピュレータの制御方法
WO2010133231A1 (en) * 2009-05-16 2010-11-25 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement
DE102010060907A1 (de) 2009-12-01 2011-06-09 Mitsubishi Electric Corp. Optischer Spiegel
JP2017103451A (ja) * 2015-11-24 2017-06-08 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
WO2018177649A1 (de) * 2017-03-30 2018-10-04 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage
KR20180123629A (ko) * 2017-05-09 2018-11-19 캐논 가부시끼가이샤 광학장치, 투영 광학계, 노광장치, 및 물품 제조방법
KR20210035181A (ko) * 2018-07-25 2021-03-31 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피용 광학 시스템에서 광학 요소의 가열 상태를 결정하기 위한 방법 및 디바이스
WO2021224036A1 (de) * 2020-05-07 2021-11-11 Carl Zeiss Smt Gmbh Verfahren zum betreiben eines deformierbaren spiegels, sowie optisches system mit einem deformierbaren spiegel
CN114815128A (zh) * 2022-05-19 2022-07-29 中国科学院长春光学精密机械与物理研究所 一种微纳遥感相机在轨实时成像调节系统

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6831744B2 (en) 2002-03-20 2004-12-14 Canon Kabushiki Kaisha Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
EP1353232A3 (en) * 2002-03-20 2004-01-02 Canon Kabushiki Kaisha Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
WO2004036316A1 (en) * 2002-10-15 2004-04-29 Carl Zeiss Smt Ag Optical arrangement and method of specifying and performing a deformation of an optical surface of an optical element being part of the optical arrangement
JP2006054453A (ja) * 2004-07-31 2006-02-23 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置の光学システム
CN100466238C (zh) * 2004-11-05 2009-03-04 国际商业机器公司 用于表征在非均匀热负荷下的热特性的方法和设备
JP2011211237A (ja) * 2007-08-14 2011-10-20 Asml Netherlands Bv リソグラフィ投影装置
JP2009081419A (ja) * 2007-08-14 2009-04-16 Asml Netherlands Bv リソグラフィ装置および熱光学マニピュレータの制御方法
US8861102B2 (en) 2007-08-14 2014-10-14 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
US8064151B2 (en) 2007-08-14 2011-11-22 Asml Netherlands B.V. Lithographic apparatus and thermal optical manipulator control method
JP2012527099A (ja) * 2009-05-16 2012-11-01 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学補正構成体を備える半導体リソグラフィ用の投影露光装置
WO2010133231A1 (en) * 2009-05-16 2010-11-25 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising an optical correction arrangement
CN102428408A (zh) * 2009-05-16 2012-04-25 卡尔蔡司Smt有限责任公司 包括光学校正布置的用于半导体光刻的投射曝光设备
US9366977B2 (en) 2009-05-16 2016-06-14 Carl Zeiss Smt Gmbh Semiconductor microlithography projection exposure apparatus
TWI494706B (zh) * 2009-05-16 2015-08-01 Zeiss Carl Smt Gmbh 包含光學校正結構的半導體微影投射曝光裝置
US8419196B2 (en) 2009-12-01 2013-04-16 Mitsubishi Electric Corporation Optical mirror
JP2011118042A (ja) * 2009-12-01 2011-06-16 Mitsubishi Electric Corp 光学反射鏡
DE102010060907A1 (de) 2009-12-01 2011-06-09 Mitsubishi Electric Corp. Optischer Spiegel
JP2017103451A (ja) * 2015-11-24 2017-06-08 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
WO2018177649A1 (de) * 2017-03-30 2018-10-04 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage
US10908509B2 (en) 2017-03-30 2021-02-02 Carl Zeiss Smt Gmbh Mirror, in particular for a microlithographic projection exposure apparatus
KR20180123629A (ko) * 2017-05-09 2018-11-19 캐논 가부시끼가이샤 광학장치, 투영 광학계, 노광장치, 및 물품 제조방법
KR20210035181A (ko) * 2018-07-25 2021-03-31 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피용 광학 시스템에서 광학 요소의 가열 상태를 결정하기 위한 방법 및 디바이스
WO2021224036A1 (de) * 2020-05-07 2021-11-11 Carl Zeiss Smt Gmbh Verfahren zum betreiben eines deformierbaren spiegels, sowie optisches system mit einem deformierbaren spiegel
CN114815128A (zh) * 2022-05-19 2022-07-29 中国科学院长春光学精密机械与物理研究所 一种微纳遥感相机在轨实时成像调节系统

Similar Documents

Publication Publication Date Title
US7191599B2 (en) Cooling apparatus and method, and exposure apparatus having the cooling apparatus
JP3695000B2 (ja) 露光方法及び露光装置
US7250616B2 (en) Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method
JP2000036449A (ja) 露光装置
JP2005109158A (ja) 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
US7095480B2 (en) Cooling apparatus
JPH0992613A (ja) 温調装置及び走査型露光装置
JPH10284390A (ja) 反射鏡の形状制御装置、形状制御方法及び露光装置
JPH09102454A (ja) 投影露光装置
WO2002054460A1 (fr) Dispositif d'exposition
US6191843B1 (en) Exposure device, method of making and using same, and objects exposed by the exposure device
JP2002190438A (ja) 露光装置
US6211947B1 (en) Illuminance distribution measuring method, exposing method and device manufacturing method
JP2001052986A (ja) Ｘ線投影露光装置
US7360366B2 (en) Cooling apparatus, exposure apparatus, and device fabrication method
JPH0869964A (ja) ステージ位置計測装置
US7295284B2 (en) Optical system, exposure apparatus using the same and device manufacturing method
JP3622867B2 (ja) 露光装置及び露光方法
JP3632264B2 (ja) Ｘ線投影露光装置
JP5517847B2 (ja) 露光装置、及びそれを用いたデバイスの製造方法
JP3541262B2 (ja) Ｘ線投影露光装置
JPH09148228A (ja) 露光装置
JP3316983B2 (ja) 投影露光方法及び装置、並びに素子製造方法
JP2006019561A (ja) 露光方法
JPH08321459A (ja) 投影露光方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040401

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050720

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050906

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050913

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20060207