JPH10284390A5 - - Google Patents
Info
- Publication number
- JPH10284390A5 JPH10284390A5 JP1997097922A JP9792297A JPH10284390A5 JP H10284390 A5 JPH10284390 A5 JP H10284390A5 JP 1997097922 A JP1997097922 A JP 1997097922A JP 9792297 A JP9792297 A JP 9792297A JP H10284390 A5 JPH10284390 A5 JP H10284390A5
- Authority
- JP
- Japan
- Prior art keywords
- reflecting mirror
- shape
- temperature distribution
- control device
- shape control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9097922A JPH10284390A (ja) | 1997-04-02 | 1997-04-02 | 反射鏡の形状制御装置、形状制御方法及び露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9097922A JPH10284390A (ja) | 1997-04-02 | 1997-04-02 | 反射鏡の形状制御装置、形状制御方法及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10284390A JPH10284390A (ja) | 1998-10-23 |
| JPH10284390A5 true JPH10284390A5 (enExample) | 2005-10-27 |
Family
ID=14205194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9097922A Pending JPH10284390A (ja) | 1997-04-02 | 1997-04-02 | 反射鏡の形状制御装置、形状制御方法及び露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10284390A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4006251B2 (ja) * | 2002-03-20 | 2007-11-14 | キヤノン株式会社 | ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法 |
| AU2002346911A1 (en) * | 2002-10-15 | 2004-05-04 | Carl Zeiss Smt Ag | Optical arrangement and method of specifying and performing a deformation of an optical surface of an optical element being part of the optical arrangement |
| US7423765B2 (en) * | 2004-07-31 | 2008-09-09 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus |
| US8029186B2 (en) * | 2004-11-05 | 2011-10-04 | International Business Machines Corporation | Method for thermal characterization under non-uniform heat load |
| US8064151B2 (en) | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
| KR101626737B1 (ko) * | 2009-05-16 | 2016-06-01 | 칼 짜이스 에스엠테 게엠베하 | 광학 교정 배열체를 포함하는 반도체 리소그래피를 위한 투사 노광 장치 |
| JP4935884B2 (ja) * | 2009-12-01 | 2012-05-23 | 三菱電機株式会社 | 光学反射鏡 |
| JP6797627B2 (ja) * | 2015-11-24 | 2020-12-09 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品の製造方法 |
| DE102017205405A1 (de) * | 2017-03-30 | 2018-10-04 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| JP6875925B2 (ja) * | 2017-05-09 | 2021-05-26 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品製造方法 |
| DE102018212400A1 (de) * | 2018-07-25 | 2020-01-30 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Bestimmen des Erwärmungszustandes eines optischen Elements in einem optischen System für die Mikrolithographie |
| DE102020205752A1 (de) * | 2020-05-07 | 2021-11-11 | Carl Zeiss Smt Gmbh | Verfahren zum Betreiben eines deformierbaren Spiegels, sowie optisches System mit einem deformierbaren Spiegel |
| CN114815128B (zh) * | 2022-05-19 | 2023-04-07 | 中国科学院长春光学精密机械与物理研究所 | 一种微纳遥感相机在轨实时成像调节系统 |
-
1997
- 1997-04-02 JP JP9097922A patent/JPH10284390A/ja active Pending
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