JPH10275772A5 - - Google Patents

Info

Publication number
JPH10275772A5
JPH10275772A5 JP1998008821A JP882198A JPH10275772A5 JP H10275772 A5 JPH10275772 A5 JP H10275772A5 JP 1998008821 A JP1998008821 A JP 1998008821A JP 882198 A JP882198 A JP 882198A JP H10275772 A5 JPH10275772 A5 JP H10275772A5
Authority
JP
Japan
Prior art keywords
solvent
forming method
film
dropping
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998008821A
Other languages
English (en)
Japanese (ja)
Other versions
JP4105269B2 (ja
JPH10275772A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP00882198A priority Critical patent/JP4105269B2/ja
Priority claimed from JP00882198A external-priority patent/JP4105269B2/ja
Publication of JPH10275772A publication Critical patent/JPH10275772A/ja
Publication of JPH10275772A5 publication Critical patent/JPH10275772A5/ja
Application granted granted Critical
Publication of JP4105269B2 publication Critical patent/JP4105269B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP00882198A 1997-01-31 1998-01-20 膜形成方法 Expired - Fee Related JP4105269B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP00882198A JP4105269B2 (ja) 1997-01-31 1998-01-20 膜形成方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-18424 1997-01-31
JP1842497 1997-01-31
JP00882198A JP4105269B2 (ja) 1997-01-31 1998-01-20 膜形成方法

Publications (3)

Publication Number Publication Date
JPH10275772A JPH10275772A (ja) 1998-10-13
JPH10275772A5 true JPH10275772A5 (enExample) 2005-08-04
JP4105269B2 JP4105269B2 (ja) 2008-06-25

Family

ID=26343414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP00882198A Expired - Fee Related JP4105269B2 (ja) 1997-01-31 1998-01-20 膜形成方法

Country Status (1)

Country Link
JP (1) JP4105269B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002343704A (ja) * 2001-05-17 2002-11-29 Nec Corp 塗付膜形成方法およびその装置
JP4669715B2 (ja) * 2005-02-23 2011-04-13 株式会社康井精機 複合材料シートの製造装置
JP5183562B2 (ja) * 2009-04-27 2013-04-17 東京エレクトロン株式会社 塗布膜形成装置及び塗布膜形成方法
JP6418130B2 (ja) * 2015-10-20 2018-11-07 株式会社Sumco 半導体ウェーハの加工方法
JP6704258B2 (ja) * 2016-02-03 2020-06-03 東京エレクトロン株式会社 基板処理方法、基板処理装置及びコンピュータ読み取り可能な記録媒体

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