JPH10270707A5 - - Google Patents

Info

Publication number
JPH10270707A5
JPH10270707A5 JP1997090245A JP9024597A JPH10270707A5 JP H10270707 A5 JPH10270707 A5 JP H10270707A5 JP 1997090245 A JP1997090245 A JP 1997090245A JP 9024597 A JP9024597 A JP 9024597A JP H10270707 A5 JPH10270707 A5 JP H10270707A5
Authority
JP
Japan
Prior art keywords
electrodes
semiconductor elements
insulating film
substrate
interlayer insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997090245A
Other languages
English (en)
Japanese (ja)
Other versions
JP3934731B2 (ja
JPH10270707A (ja
Filing date
Publication date
Priority claimed from JP9024597A external-priority patent/JP3934731B2/ja
Priority to JP9024597A priority Critical patent/JP3934731B2/ja
Application filed filed Critical
Priority to US09/046,198 priority patent/US6163055A/en
Priority to KR1019980010071A priority patent/KR100505963B1/ko
Publication of JPH10270707A publication Critical patent/JPH10270707A/ja
Priority to US09/730,417 priority patent/US6617645B2/en
Priority to US10/656,170 priority patent/US6812082B2/en
Priority to KR1020050013098A priority patent/KR100536076B1/ko
Publication of JPH10270707A5 publication Critical patent/JPH10270707A5/ja
Publication of JP3934731B2 publication Critical patent/JP3934731B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP9024597A 1997-03-24 1997-03-24 アクティブマトリクス型液晶表示装置の作製方法、アクティブマトリクス型液晶表示装置、電気光学装置 Expired - Lifetime JP3934731B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9024597A JP3934731B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型液晶表示装置の作製方法、アクティブマトリクス型液晶表示装置、電気光学装置
US09/046,198 US6163055A (en) 1997-03-24 1998-03-23 Semiconductor device and manufacturing method thereof
KR1019980010071A KR100505963B1 (ko) 1997-03-24 1998-03-24 반도체장치및그의제작방법
US09/730,417 US6617645B2 (en) 1997-03-24 2000-12-04 Semiconductor device and manufacturing method thereof
US10/656,170 US6812082B2 (en) 1997-03-24 2003-09-08 Semiconductor device and manufacturing method thereof
KR1020050013098A KR100536076B1 (ko) 1997-03-24 2005-02-17 표시장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9024597A JP3934731B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型液晶表示装置の作製方法、アクティブマトリクス型液晶表示装置、電気光学装置

Publications (3)

Publication Number Publication Date
JPH10270707A JPH10270707A (ja) 1998-10-09
JPH10270707A5 true JPH10270707A5 (enExample) 2005-02-24
JP3934731B2 JP3934731B2 (ja) 2007-06-20

Family

ID=13993126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9024597A Expired - Lifetime JP3934731B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型液晶表示装置の作製方法、アクティブマトリクス型液晶表示装置、電気光学装置

Country Status (1)

Country Link
JP (1) JP3934731B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2500941A3 (en) * 1999-06-02 2017-05-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5103742B2 (ja) * 2006-01-23 2012-12-19 凸版印刷株式会社 薄膜トランジスタ装置及びその製造方法及び薄膜トランジスタアレイ及び薄膜トランジスタディスプレイ
JP2007206212A (ja) * 2006-01-31 2007-08-16 Canon Inc 反射型液晶表示装置及びその製造方法
US7738050B2 (en) * 2007-07-06 2010-06-15 Semiconductor Energy Laboratory Co., Ltd Liquid crystal display device
JP5109681B2 (ja) * 2008-01-25 2012-12-26 セイコーエプソン株式会社 液晶装置の製造方法
CN103762244A (zh) * 2013-11-29 2014-04-30 深圳市华星光电技术有限公司 薄膜晶体管及其制造方法、薄膜晶体管阵列基板及液晶面板
JP6323055B2 (ja) * 2014-02-21 2018-05-16 凸版印刷株式会社 薄膜トランジスタアレイおよびその製造方法

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