JPH10270708A5 - - Google Patents

Info

Publication number
JPH10270708A5
JPH10270708A5 JP1997090246A JP9024697A JPH10270708A5 JP H10270708 A5 JPH10270708 A5 JP H10270708A5 JP 1997090246 A JP1997090246 A JP 1997090246A JP 9024697 A JP9024697 A JP 9024697A JP H10270708 A5 JPH10270708 A5 JP H10270708A5
Authority
JP
Japan
Prior art keywords
electrodes
semiconductor elements
dlc film
insulating
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997090246A
Other languages
English (en)
Japanese (ja)
Other versions
JP3934201B2 (ja
JPH10270708A (ja
Filing date
Publication date
Priority claimed from JP9024697A external-priority patent/JP3934201B2/ja
Priority to JP9024697A priority Critical patent/JP3934201B2/ja
Application filed filed Critical
Priority to US09/046,198 priority patent/US6163055A/en
Priority to KR1019980010071A priority patent/KR100505963B1/ko
Publication of JPH10270708A publication Critical patent/JPH10270708A/ja
Priority to US09/730,417 priority patent/US6617645B2/en
Priority to US10/656,170 priority patent/US6812082B2/en
Priority to KR1020050013098A priority patent/KR100536076B1/ko
Publication of JPH10270708A5 publication Critical patent/JPH10270708A5/ja
Publication of JP3934201B2 publication Critical patent/JP3934201B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP9024697A 1997-03-24 1997-03-24 アクティブマトリクス型表示装置およびその作製方法 Expired - Fee Related JP3934201B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP9024697A JP3934201B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型表示装置およびその作製方法
US09/046,198 US6163055A (en) 1997-03-24 1998-03-23 Semiconductor device and manufacturing method thereof
KR1019980010071A KR100505963B1 (ko) 1997-03-24 1998-03-24 반도체장치및그의제작방법
US09/730,417 US6617645B2 (en) 1997-03-24 2000-12-04 Semiconductor device and manufacturing method thereof
US10/656,170 US6812082B2 (en) 1997-03-24 2003-09-08 Semiconductor device and manufacturing method thereof
KR1020050013098A KR100536076B1 (ko) 1997-03-24 2005-02-17 표시장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9024697A JP3934201B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型表示装置およびその作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006122907A Division JP4712601B2 (ja) 2006-04-27 2006-04-27 単純マトリクス型液晶表示装置の作製方法

Publications (3)

Publication Number Publication Date
JPH10270708A JPH10270708A (ja) 1998-10-09
JPH10270708A5 true JPH10270708A5 (enExample) 2005-02-24
JP3934201B2 JP3934201B2 (ja) 2007-06-20

Family

ID=13993153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9024697A Expired - Fee Related JP3934201B2 (ja) 1997-03-24 1997-03-24 アクティブマトリクス型表示装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP3934201B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3062163B2 (ja) * 1998-12-01 2000-07-10 キヤノン販売株式会社 半導体装置及び半導体装置の膜の形成方法
CN1515931A (zh) * 1998-12-23 2004-07-28 ���ܿ���ϵͳ���޹�˾ 反射式显示底板
US6429132B1 (en) * 1998-12-23 2002-08-06 Aurora Systems, Inc. Combination CMP-etch method for forming a thin planar layer over the surface of a device
JP4643786B2 (ja) * 2000-02-28 2011-03-02 インテレクチュアル ベンチャーズ ホールディング ４５ リミティド ライアビリティ カンパニー 反射型液晶表示装置用モジュール、その製造方法及び反射型液晶表示装置
JP2011133603A (ja) * 2009-12-24 2011-07-07 Seiko Epson Corp 電気光学装置、電気光学装置の製造方法および電子機器
JP2012242439A (ja) * 2011-05-16 2012-12-10 Dainippon Printing Co Ltd アクティブマトリックス基板及びアクティブマトリックス基板の製造方法、液晶表示装置

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