JPH10213903A5 - - Google Patents
Info
- Publication number
- JPH10213903A5 JPH10213903A5 JP1997340012A JP34001297A JPH10213903A5 JP H10213903 A5 JPH10213903 A5 JP H10213903A5 JP 1997340012 A JP1997340012 A JP 1997340012A JP 34001297 A JP34001297 A JP 34001297A JP H10213903 A5 JPH10213903 A5 JP H10213903A5
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- coor
- hydrogen
- alkyl
- photoacid generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US76303196A | 1996-12-10 | 1996-12-10 | |
| US08/910,188 US5981135A (en) | 1997-08-13 | 1997-08-13 | High resolution positive acting dry film photoresist |
| US08/910188 | 1997-08-13 | ||
| US08/763031 | 1997-08-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10213903A JPH10213903A (ja) | 1998-08-11 |
| JPH10213903A5 true JPH10213903A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2005-07-14 |
Family
ID=27117220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9340012A Pending JPH10213903A (ja) | 1996-12-10 | 1997-12-10 | 高解像ポジティブ型乾燥膜フォトレジスト |
Country Status (8)
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW502133B (en) * | 1999-06-10 | 2002-09-11 | Wako Pure Chem Ind Ltd | Resist composition, agent and method for reducing substrate dependence thereof |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| JP2002169291A (ja) * | 2000-12-04 | 2002-06-14 | Canon Inc | 感光性樹脂組成物、レジスト組成物、パターン形成方法およびデバイス |
| TW200401164A (en) * | 2002-03-01 | 2004-01-16 | Shipley Co Llc | Photoresist compositions |
| KR20040035345A (ko) * | 2002-10-22 | 2004-04-29 | 주식회사 코오롱 | 샌드블라스트레지스트용 감광성수지조성물 및 이를포함하는 감광성 필름 |
| CN1527136B (zh) * | 2003-03-05 | 2014-02-26 | 希普利公司 | 光致抗蚀剂组合物 |
| KR101142631B1 (ko) | 2007-12-14 | 2012-05-10 | 코오롱인더스트리 주식회사 | 샌드블라스트 레지스트용 감광성 수지 조성물 및 드라이필름 포토레지스트 |
| JP5390964B2 (ja) * | 2009-07-01 | 2014-01-15 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びそれを用いた感光性フィルム |
| JP6191169B2 (ja) * | 2013-03-06 | 2017-09-06 | ナガセケムテックス株式会社 | 電子部品保護膜形成用組成物 |
| EP2784586B1 (en) * | 2013-03-27 | 2015-03-18 | Univerza v Mariboru Fakulteta za strojnistvo | Multidimensionally photopatterned substrates on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof |
| KR101636865B1 (ko) * | 2013-09-10 | 2016-07-06 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| FR3034881B1 (fr) * | 2015-04-09 | 2017-05-05 | Univ Claude Bernard Lyon | Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert |
| JP6809873B2 (ja) * | 2015-12-28 | 2021-01-06 | 旭化成株式会社 | 積層体 |
| KR102690556B1 (ko) * | 2020-11-05 | 2024-07-30 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| DE102021000478A1 (de) | 2021-02-01 | 2022-08-04 | Giesecke+Devrient Currency Technology Gmbh | Maskenbelichtungsverfahren, transparente, leitfähige Metallisierung und Pigment |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2627571B2 (ja) * | 1990-05-31 | 1997-07-09 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH06342212A (ja) * | 1993-04-07 | 1994-12-13 | Matsushita Electric Ind Co Ltd | 微細パターン形成用レジストおよび微細パターン形成方法 |
| JP3078153B2 (ja) * | 1993-07-08 | 2000-08-21 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH086252A (ja) * | 1994-06-24 | 1996-01-12 | Sony Corp | 感光性樹脂組成物 |
-
1997
- 1997-11-25 TW TW86117705A patent/TW574628B/zh not_active IP Right Cessation
- 1997-12-09 KR KR1019970066939A patent/KR100278257B1/ko not_active Expired - Fee Related
- 1997-12-10 CN CN97114183A patent/CN1118002C/zh not_active Expired - Fee Related
- 1997-12-10 CA CA002224312A patent/CA2224312C/en not_active Expired - Fee Related
- 1997-12-10 DE DE69702828T patent/DE69702828T2/de not_active Expired - Fee Related
- 1997-12-10 EP EP97309966A patent/EP0848290B1/en not_active Expired - Lifetime
- 1997-12-10 JP JP9340012A patent/JPH10213903A/ja active Pending
- 1997-12-10 ES ES97309966T patent/ES2152067T3/es not_active Expired - Lifetime