FR3034881B1 - Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert - Google Patents
Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfertInfo
- Publication number
- FR3034881B1 FR3034881B1 FR1553072A FR1553072A FR3034881B1 FR 3034881 B1 FR3034881 B1 FR 3034881B1 FR 1553072 A FR1553072 A FR 1553072A FR 1553072 A FR1553072 A FR 1553072A FR 3034881 B1 FR3034881 B1 FR 3034881B1
- Authority
- FR
- France
- Prior art keywords
- transfer
- chitosan
- lithography
- alginate
- implementing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1553072A FR3034881B1 (fr) | 2015-04-09 | 2015-04-09 | Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert |
PCT/FR2016/050795 WO2016162638A1 (fr) | 2015-04-09 | 2016-04-07 | Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procédés de lithographie et de transfert |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1553072A FR3034881B1 (fr) | 2015-04-09 | 2015-04-09 | Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3034881A1 FR3034881A1 (fr) | 2016-10-14 |
FR3034881B1 true FR3034881B1 (fr) | 2017-05-05 |
Family
ID=53200204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1553072A Expired - Fee Related FR3034881B1 (fr) | 2015-04-09 | 2015-04-09 | Mise en œuvre de chitosane ou d'alginate en tant que masque de transfert dans des procedes de lithographie et de transfert |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR3034881B1 (fr) |
WO (1) | WO2016162638A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2738112C1 (ru) * | 2019-11-15 | 2020-12-08 | Автономная некоммерческая образовательная организация высшего образования «Сколковский институт науки и технологий» | Применение соединения полисахарида в литографии |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3985915A (en) * | 1974-12-20 | 1976-10-12 | International Business Machines Corporation | Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam positive resists |
TW574628B (en) * | 1996-12-10 | 2004-02-01 | Morton Int Inc | High resolution positive acting dry film photoresist |
JP2002169291A (ja) * | 2000-12-04 | 2002-06-14 | Canon Inc | 感光性樹脂組成物、レジスト組成物、パターン形成方法およびデバイス |
US9760009B2 (en) * | 2011-05-13 | 2017-09-12 | Clarkson University | Cross-linked polymer based hydrogel material compositions, methods and applications |
-
2015
- 2015-04-09 FR FR1553072A patent/FR3034881B1/fr not_active Expired - Fee Related
-
2016
- 2016-04-07 WO PCT/FR2016/050795 patent/WO2016162638A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2016162638A1 (fr) | 2016-10-13 |
FR3034881A1 (fr) | 2016-10-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 2 |
|
PLSC | Publication of the preliminary search report |
Effective date: 20161014 |
|
PLFP | Fee payment |
Year of fee payment: 3 |
|
TP | Transmission of property |
Owner name: ECOLE SUPERIEURE DE CHIMIE PHYSIQUE ELECTRONIQ, FR Effective date: 20170629 |
|
PLFP | Fee payment |
Year of fee payment: 4 |
|
PLFP | Fee payment |
Year of fee payment: 5 |
|
PLFP | Fee payment |
Year of fee payment: 6 |
|
PLFP | Fee payment |
Year of fee payment: 7 |
|
ST | Notification of lapse |
Effective date: 20221205 |