SG11202000513SA - Objective lens protection device, objective lens system and lithographic device - Google Patents

Objective lens protection device, objective lens system and lithographic device

Info

Publication number
SG11202000513SA
SG11202000513SA SG11202000513SA SG11202000513SA SG11202000513SA SG 11202000513S A SG11202000513S A SG 11202000513SA SG 11202000513S A SG11202000513S A SG 11202000513SA SG 11202000513S A SG11202000513S A SG 11202000513SA SG 11202000513S A SG11202000513S A SG 11202000513SA
Authority
SG
Singapore
Prior art keywords
objective lens
protection device
lithographic
lens system
lens protection
Prior art date
Application number
SG11202000513SA
Inventor
Xianming Li
Baotong Hao
Original Assignee
Shanghai Micro Electronics Equipment Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Group Co Ltd filed Critical Shanghai Micro Electronics Equipment Group Co Ltd
Publication of SG11202000513SA publication Critical patent/SG11202000513SA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG11202000513SA 2017-07-21 2018-07-23 Objective lens protection device, objective lens system and lithographic device SG11202000513SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710602722.8A CN109283797B (en) 2017-07-21 2017-07-21 Objective lens protection device, objective lens system and lithographic apparatus
PCT/CN2018/096594 WO2019015687A1 (en) 2017-07-21 2018-07-23 Objective lens protection device, objective lens system and lithographic device

Publications (1)

Publication Number Publication Date
SG11202000513SA true SG11202000513SA (en) 2020-02-27

Family

ID=65015854

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202000513SA SG11202000513SA (en) 2017-07-21 2018-07-23 Objective lens protection device, objective lens system and lithographic device

Country Status (7)

Country Link
US (1) US10983448B2 (en)
JP (1) JP6909919B2 (en)
KR (1) KR102370165B1 (en)
CN (1) CN109283797B (en)
SG (1) SG11202000513SA (en)
TW (1) TWI704423B (en)
WO (1) WO2019015687A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112748641B (en) * 2019-10-31 2022-08-12 上海微电子装备（集团）股份有限公司 Air curtain protection device at bottom of lens
CN115608713A (en) * 2021-07-14 2023-01-17 北京小米移动软件有限公司 Cover plate bearing table, cover plate cleaning device and cover plate cleaning method
CN114951982A (en) * 2022-05-20 2022-08-30 卡门哈斯激光科技（苏州）有限公司 Field lens device with air curtain protective cover structure
CN116841137B (en) * 2023-08-31 2023-11-21 光科芯图(北京)科技有限公司 Gas bath device, temperature control system and exposure equipment

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
JP3531914B2 (en) * 2000-04-14 2004-05-31 キヤノン株式会社 Optical apparatus, exposure apparatus, and device manufacturing method
JP4503906B2 (en) 2000-05-03 2010-07-14 エーエスエムエル ホールディング エヌ．ブイ． Non-contact type seal using purge gas
US6934003B2 (en) * 2002-01-07 2005-08-23 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
SG115613A1 (en) * 2003-02-12 2005-10-28 Asml Netherlands Bv Lithographic apparatus comprising a gas flushing system
JP4289906B2 (en) * 2003-02-28 2009-07-01 キヤノン株式会社 Exposure equipment
JP2005150533A (en) * 2003-11-18 2005-06-09 Canon Inc Aligner
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
US7057702B2 (en) 2004-06-23 2006-06-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060119811A1 (en) * 2004-12-07 2006-06-08 Asml Netherlands B.V. Radiation exposure apparatus comprising a gas flushing system
WO2006069755A2 (en) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Lens module comprising at least one replaceable optical element
JP2008140982A (en) * 2006-12-01 2008-06-19 Canon Inc Exposure system and device manufacturing method
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
CN201236208Y (en) * 2008-09-24 2009-05-13 清溢精密光电（深圳）有限公司 Air-float type reaction cavity
US20110134400A1 (en) 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
CN202837812U (en) * 2012-11-01 2013-03-27 张添祥 Lens group for stepping-type exposure machine
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
JP6339658B2 (en) * 2013-03-28 2018-06-06 カール・ツァイス・エスエムティー・ゲーエムベーハー Microlithography apparatus including an objective system with a variable transmission filter
CN203426605U (en) 2013-06-04 2014-02-12 罗艺 Camera lens demister
JP2015134364A (en) * 2014-01-16 2015-07-27 株式会社デンソー Laser processing apparatus and laser processing method
CN205967805U (en) * 2016-08-22 2017-02-22 大族激光科技产业集团股份有限公司 Laser cutting head and have laser cutting device of this laser cutting head
CN107783283B (en) 2016-08-30 2020-01-24 上海微电子装备（集团）股份有限公司 Lens anti-pollution device and method

Also Published As

Publication number Publication date
JP2020526800A (en) 2020-08-31
CN109283797B (en) 2021-04-30
JP6909919B2 (en) 2021-07-28
TWI704423B (en) 2020-09-11
US20200166856A1 (en) 2020-05-28
CN109283797A (en) 2019-01-29
KR20200022498A (en) 2020-03-03
US10983448B2 (en) 2021-04-20
TW201921129A (en) 2019-06-01
WO2019015687A1 (en) 2019-01-24
KR102370165B1 (en) 2022-03-04

Similar Documents

Publication Publication Date Title
IL277057A (en) Embolic protection device
HK1254311A1 (en) Lens protection systems
GB2558967B (en) Imaging device, imaging system and movable object
EP3580597A4 (en) Optics, device, and system for assaying
HK1256547A1 (en) Modifiable-focus lens devices, systems, and related methods
EP3217643A4 (en) Wearable device, photographing device, photographing system and photographing method
EP3669149A4 (en) Light exposure tracking system, device, and methods
SG11202000513SA (en) Objective lens protection device, objective lens system and lithographic device
IL273908B1 (en) Escape system
EP3669225A4 (en) Lens system and imaging device
GB201609033D0 (en) Ear protection device
EP3605182A4 (en) Projection optical system, image projection device and image projection system
EP3662317A4 (en) Lens system and imaging device
GB201703583D0 (en) Auto-focus system
EP3425895A4 (en) Evaluation device, evaluation method, and camera system
IL264275A (en) Hearing protection device, hearing protection system, and related method
SG10202103723UA (en) Lithography optics adjustment and monitoring
GB2564110B (en) Escape system
PL3173841T3 (en) Rod lens system for an endoscope, and endoscope comprising the rod lens system
EP3734342A4 (en) Lens system and imaging device
GB2563711B (en) Escape system
EP3611547A4 (en) Single-focal lens system, imaging device having single-focal lens system, and moving body having imaging device
EP3258563A4 (en) Protection device and protection system
EP3734344A4 (en) Lens system and imaging device
FR3018672B1 (en) DEVICE FOR CONDITIONING AND APPLICATION.