JPH10177949A - ステージ制御装置 - Google Patents

ステージ制御装置

Info

Publication number
JPH10177949A
JPH10177949A JP35326896A JP35326896A JPH10177949A JP H10177949 A JPH10177949 A JP H10177949A JP 35326896 A JP35326896 A JP 35326896A JP 35326896 A JP35326896 A JP 35326896A JP H10177949 A JPH10177949 A JP H10177949A
Authority
JP
Japan
Prior art keywords
stage
thrust
power amplifier
switching
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP35326896A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10177949A5 (enExample
Inventor
Takeshi Kaminaga
武 神永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP35326896A priority Critical patent/JPH10177949A/ja
Publication of JPH10177949A publication Critical patent/JPH10177949A/ja
Publication of JPH10177949A5 publication Critical patent/JPH10177949A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Automatic Control Of Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP35326896A 1996-12-16 1996-12-16 ステージ制御装置 Pending JPH10177949A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35326896A JPH10177949A (ja) 1996-12-16 1996-12-16 ステージ制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35326896A JPH10177949A (ja) 1996-12-16 1996-12-16 ステージ制御装置

Publications (2)

Publication Number Publication Date
JPH10177949A true JPH10177949A (ja) 1998-06-30
JPH10177949A5 JPH10177949A5 (enExample) 2004-12-02

Family

ID=18429686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35326896A Pending JPH10177949A (ja) 1996-12-16 1996-12-16 ステージ制御装置

Country Status (1)

Country Link
JP (1) JPH10177949A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001251879A (ja) * 2000-03-02 2001-09-14 Yaskawa Electric Corp 電動機制御装置とその制御方法
JP2010080863A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001251879A (ja) * 2000-03-02 2001-09-14 Yaskawa Electric Corp 電動機制御装置とその制御方法
JP2010080863A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法

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