JPH10165877A - Continuous coating applicator and continuous coating method therefor - Google Patents

Continuous coating applicator and continuous coating method therefor

Info

Publication number
JPH10165877A
JPH10165877A JP32691896A JP32691896A JPH10165877A JP H10165877 A JPH10165877 A JP H10165877A JP 32691896 A JP32691896 A JP 32691896A JP 32691896 A JP32691896 A JP 32691896A JP H10165877 A JPH10165877 A JP H10165877A
Authority
JP
Japan
Prior art keywords
coating
cylindrical
cylindrical substrate
gripping
base materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32691896A
Other languages
Japanese (ja)
Other versions
JP3709634B2 (en
Inventor
Akira Ohira
晃 大平
Junji Ujihara
淳二 氏原
Masanari Asano
真生 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP32691896A priority Critical patent/JP3709634B2/en
Publication of JPH10165877A publication Critical patent/JPH10165877A/en
Application granted granted Critical
Publication of JP3709634B2 publication Critical patent/JP3709634B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve coatability without coating film defects, such as unequal coating and fluctuation in film thicknesses, by preventing the transfer of vibration to a coating means even if the vibration occurs at the time of clamping of cylindrical base materials. SOLUTION: This device includes the coating means 40 which continuously applies a coating liquid on the outer peripheral surfaces of the cylindrical base materials 1 while aligning the cylindrical axes of these base materials, stacking the base materials and pushing the base materials perpendicular from below to above in the ring of the annular coating applicator, a supplying means 10 which supplies the cylindrical base materials 1 to the coating means 40, a clamping and transporting means 20 which transports the cylindrical base materials 1 while correcting the differences in level for clamping and stacking the cylindrical base materials, a positioning means 30 which aligns the centers of the cylindrical base materials 1 to the annular center of the annular coating applicator, a means 50 which dries or dries and adjusts the coated cylindrical base materials 1 and a separating and discharging means 60 which takes out the cylindrical base materials 1 after the coating. At least one cylindrical base materials 1 which are not clamped by the clamping and transporting means 20 are made to exist between the positioning means 30 and the clamping and transporting means 20.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、複数の円筒状基材
外周面上に塗布液を連続的に塗布する垂直塗布装置及び
方法に関し、特に、該円筒状基材を供給、搬送、位置決
め、塗布、乾燥、搬出する連続塗布装置及び連続塗布方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vertical coating apparatus and method for continuously applying a coating liquid on a plurality of cylindrical substrates, and more particularly, to supplying, transporting, positioning, and supplying the cylindrical substrates. The present invention relates to a continuous coating device and a continuous coating method for coating, drying, and carrying out.

【0002】[0002]

【従来の技術】エンドレスに形成された連続面を有する
円筒状基材の外面上への薄膜で均一な塗布に関連してス
プレー塗布法、浸漬塗布法、ブレード塗布法、ロール塗
布法等の種々の方法が検討されている。特に電子写真感
光体ドラムのような薄膜で均一な塗布については生産性
の優れた塗布装置を開発すべく検討されている。しかし
ながら、従来のエンドレスに形成された連続面を有する
円筒状基材への塗布装置及び塗布方法においては、均一
な塗膜が得られなかったり、生産性が悪い等の短所があ
った。
2. Description of the Related Art Various methods such as spray coating, dip coating, blade coating, roll coating, etc. are used in connection with thin and uniform coating on the outer surface of a cylindrical substrate having a continuous surface formed endlessly. Methods are being considered. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop a coating apparatus having excellent productivity. However, the conventional coating apparatus and coating method for a cylindrical substrate having a continuous surface formed endlessly have disadvantages such as a failure to obtain a uniform coating film and poor productivity.

【0003】スプレー塗布法では、スプレーガンより噴
出した塗布液滴が該エンドレスに形成された連続面を有
する円筒状基材の外周面上に到達するまでに溶媒が蒸発
するために塗布液滴の固形分濃度が上昇してしまい、そ
れにともない塗布液滴の粘度上昇が起って液滴が面に到
達したとき、液滴が面上を充分に広がらないために、或
いは乾燥固化してしまった粒子が表面に付着するため
に、塗布表面の平滑性の良いものがえられない。また、
該連続面を有する円筒状基材への液滴の到達率が100
%でなく塗布液のロスがあったり、部分的にも不均一で
あるため、膜厚コントロールが非常に困難である。更
に、高分子溶液等では糸引きを起こす事があるため、使
用する溶媒及び樹脂に制限がある。
In the spray coating method, the solvent evaporates before the coating droplet ejected from the spray gun reaches the outer peripheral surface of the endlessly formed cylindrical substrate having a continuous surface. When the solid concentration increased, and the viscosity of the applied droplets increased accordingly, and the droplets reached the surface, the droplets did not spread sufficiently on the surface, or dried and solidified. Since the particles adhere to the surface, a product having good smoothness on the coated surface cannot be obtained. Also,
The arrival rate of droplets on the cylindrical substrate having the continuous surface is 100
%, And the coating liquid is lost or partially non-uniform, making it very difficult to control the film thickness. Furthermore, since stringing may occur in a polymer solution or the like, the solvent and resin used are limited.

【0004】ブレード塗布法、ロール塗布法は例えば円
筒状基材の長さ方向にブレード若しくはロールを配置
し、該円筒状基材を回転させて塗布を行い円筒状基材を
1回転させたのち、ブレード若しくはロールを後退させ
るものである。しかしながらブレード若しくはロールを
後退させる際、塗布液の粘性により、塗布膜厚の一部に
他の部分より厚い部分が生じ、均一な塗膜が得られない
欠点がある。
In the blade coating method and the roll coating method, for example, a blade or a roll is arranged in the longitudinal direction of a cylindrical substrate, the cylindrical substrate is rotated to perform coating, and the cylindrical substrate is rotated once. , Blades or rolls are retracted. However, when the blade or the roll is retracted, there is a disadvantage that a portion of the coating film thickness is thicker than other portions due to the viscosity of the coating solution, and a uniform coating film cannot be obtained.

【0005】浸漬塗布法は、上記におけるような塗布液
表面の平滑性、塗布膜の均一性の悪い点は改良される。
[0005] The dip coating method improves the above-mentioned problems of poor surface smoothness of the coating solution and uniformity of the coating film.

【0006】しかし、塗布膜厚の制御が塗布液物性例え
ば粘度、表面張力、密度、温度等と塗布速度に支配さ
れ、塗布液物性の調整が非常に重要となる。また塗布速
度も低いし、塗布液槽を満たすためにはある一定量以上
の液量が必要である。さらに重層する場合、下層成分が
溶け出し塗布液槽が汚染されやすい等の欠点がある。
However, the control of the coating film thickness is governed by the properties of the coating liquid, such as viscosity, surface tension, density, temperature, etc., and the coating speed, and the adjustment of the physical properties of the coating liquid is very important. In addition, the coating speed is low, and a certain amount or more of liquid is required to fill the coating liquid tank. Further, when layers are formed, there is a disadvantage that the lower layer components are dissolved and the coating solution tank is easily contaminated.

【0007】そこで特開昭58−189061号公報に
記載の如く円形量規制型塗布装置(この中にはスライド
ホッパー型塗布装置が含まれる)が開発された。このス
ライドホッパー型塗布装置はエンドレスに形成された連
続周面を有する円筒状基材を連続的にその長手方向に移
動させながら、その周囲を環状に取り囲み、円筒状基材
の外周面に対して塗布液を塗布するものであって、さら
にこの塗布装置は環状の塗布液溜まり室と、この塗布液
溜まり室内の一部に対して外部から塗布液を供給する供
給口と、前記塗布液溜まり室の内方に開口する塗布液分
配スリットとを有し、このスリットから流出した塗布液
を斜め下方に傾斜する塗布液スライド面上に流下させ、
塗布液スライド面の下端のホッパー塗布面と円筒状基材
との僅かな間隙部分にビードを形成し、円筒状基材の移
動に伴ってその外周面に塗布するものである。このスラ
イドホッパー型塗布装置を用いることにより、少ない液
量で塗布でき、塗布液が汚染されず、生産性の高い、膜
厚制御の容易な塗布が可能となった。
[0007] Therefore, as disclosed in Japanese Patent Application Laid-Open No. 58-189061, a circular amount-regulated type coating apparatus (including a slide hopper type coating apparatus) has been developed. This slide hopper type coating apparatus surrounds the periphery of the cylindrical base material while continuously moving the cylindrical base material having a continuous peripheral surface formed endlessly in the longitudinal direction thereof, with respect to the outer peripheral surface of the cylindrical base material. The coating apparatus is for applying a coating liquid. The coating apparatus further includes an annular coating liquid storage chamber, a supply port for supplying a coating liquid from outside to a part of the coating liquid storage chamber, and the coating liquid storage chamber. Having a coating liquid distribution slit that opens inward, and allows the coating liquid flowing out of this slit to flow down onto a coating liquid slide surface that is inclined obliquely downward,
A bead is formed at a small gap between the hopper application surface at the lower end of the application liquid slide surface and the cylindrical substrate, and the outer peripheral surface is applied as the cylindrical substrate moves. By using this slide hopper type coating apparatus, coating can be performed with a small amount of liquid, the coating liquid is not contaminated, and the coating with high productivity and easy control of the film thickness can be performed.

【0008】なお、円筒状基材の外周面を把持搬送する
手段は特開平3−21371号公報及び特開平4−53
955号公報に、位置決め手段は特開平3−27456
8号公報及び特開平3−280063号公報に、乾燥手
段は特開平6−308747号公報及び特開平7−64
306号公報にそれぞれ開示されている。
Means for gripping and transporting the outer peripheral surface of the cylindrical substrate are disclosed in Japanese Patent Application Laid-Open Nos. Hei 3-21371 and Hei 4-53.
Japanese Patent Application Laid-Open No. 3-27456 discloses a positioning means.
8 and JP-A-3-280063, the drying means is disclosed in JP-A-6-308747 and JP-A-7-64.
No. 306, respectively.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、前記ス
ライドホッパー型塗布装置を用いてもなお諸問題があり
未だ満足のいくものではない。
However, the use of the slide hopper type coating apparatus still has various problems and is not yet satisfactory.

【0010】本発明は従来の諸問題を解決するために提
案されたものであり、その目的とするところのものは、 (イ)使用塗布液による塗膜が均一であり、塗布ムラや
膜厚変動等の塗膜欠陥がなく、塗布性を向上する。
The present invention has been proposed in order to solve the conventional problems. The object of the present invention is to achieve the following: (a) a coating film using a coating solution to be used is uniform; There is no coating defect such as fluctuation, and the coatability is improved.

【0011】(ロ)円筒状基材の把持搬送性能を向上
し、長期の安定塗布を可能にする。
(B) The gripping and transporting performance of the cylindrical substrate is improved, and long-term stable coating is enabled.

【0012】(ハ)円筒状基材の把持搬送性能を安定化
し、円筒状基材の変形や損傷を防止する。
(C) Stabilize the gripping / transporting performance of the cylindrical substrate and prevent deformation and damage of the cylindrical substrate.

【0013】(ニ)円筒状基材を供給、搬送、位置決
め、塗布、乾燥、搬出する生産工程を連続安定生産にす
ることにより、生産性が向上する。
(D) The productivity is improved by making the production process of supplying, transporting, positioning, coating, drying, and carrying out the cylindrical substrate continuous and stable.

【0014】(ホ)上記工程を連続且つ完全自動化する
ことにより、ゴミやほこり等の異物混入を防止し、高品
質な製品を得る。
(E) By continuously and completely automating the above steps, foreign substances such as dust and dust are prevented from being mixed, and a high quality product is obtained.

【0015】(ヘ)円筒状基材の把持時に振動が発生し
ても、塗布手段に振動が伝わることを防止することによ
り、塗布ムラや膜厚変動等の塗膜欠陥がなく、塗布性を
向上する。
(F) Even if vibration occurs during gripping of the cylindrical base material, by preventing the vibration from being transmitted to the coating means, there is no coating defect such as coating unevenness and variation in film thickness, and coating property is improved. improves.

【0016】等の効果が達成される優れた連続塗布装置
及び連続塗布方法を提供することにある。
An object of the present invention is to provide an excellent continuous coating apparatus and a continuous coating method which achieve the above-mentioned effects.

【0017】[0017]

【課題を解決するための手段】[Means for Solving the Problems]

(1) 本発明の連続塗布装置は、円筒状基材の筒軸を
合わせて積み重ね、環状塗布装置の環中を下から上へ垂
直に押し上げながら前記円筒状基材の外周面上に塗布液
を連続的に塗布する塗布手段、前記塗布手段に円筒状基
材を供給するための供給手段、前記円筒状基材を把持段
差修正して積み重ねしながら搬送する把持搬送手段、前
記環状塗布装置の環状の中心に前記円筒状基材の中心を
合わせる位置決め手段、前記塗布された円筒状基材を乾
燥又は乾燥調整する手段及び前記塗布された後の円筒状
基材を取り出す為の分離排出手段を具備する連続塗布装
置において、前記位置決め手段と前記把持搬送手段との
間に、該把持搬送手段に把持されていない前記円筒状基
材を少なくとも1つ存在させることを特徴とするもので
ある(請求項1の発明)。
(1) The continuous coating apparatus according to the present invention is arranged such that the cylindrical substrates are stacked with their cylindrical axes aligned, and the coating liquid is applied on the outer peripheral surface of the cylindrical substrate while vertically pushing up the ring of the annular coating apparatus from bottom to top. Coating means, a supply means for supplying a cylindrical base material to the coating means, a gripping / transporting means for transporting the cylindrical base material while correcting the gripping step and stacking the cylindrical base material, Positioning means for aligning the center of the cylindrical substrate with an annular center, means for drying or adjusting the applied cylindrical substrate, and separation and discharge means for taking out the coated cylindrical substrate. In the continuous coating apparatus provided, at least one cylindrical base material not gripped by the gripping / transporting means is present between the positioning means and the gripping / transporting means (claim) Departure of item 1 Akira).

【0018】(2) 本発明の連続塗布方法は、円筒状
基材の筒軸を合わせて積み重ね、環状塗布装置の環中を
下から上へ垂直に押し上げながら前記円筒状基材の外周
面上に塗布液を連続的に塗布する塗布手段、前記塗布手
段に円筒状基材を供給するための供給手段、前記円筒状
基材を把持段差修正して積み重ねしながら搬送する把持
搬送手段、前記環状塗布装置の環状の中心に前記円筒状
基材の中心を合わせる位置決め手段、前記塗布された円
筒状基材を乾燥又は乾燥調整する手段及び前記塗布され
た後の円筒状基材を取り出す為の分離排出手段により塗
布される連続塗布方法において、前記位置決め手段と前
記把持搬送手段との間に、該把持搬送手段に把持されて
いない円筒状基材を少なくとも1つ存在させることを特
徴とするものである。(請求項6の発明)。
(2) In the continuous coating method of the present invention, the cylindrical substrates are stacked with their cylindrical axes aligned, and while being pushed vertically upward from the bottom in the ring of the annular coating device, the cylindrical substrate is placed on the outer peripheral surface of the cylindrical substrate. A coating means for continuously applying a coating liquid to the coating means, a supply means for supplying a cylindrical substrate to the coating means, a gripping / transporting means for transporting the cylindrical substrate while correcting and stacking the cylindrical substrate, and the ring Positioning means for aligning the center of the cylindrical substrate with the annular center of the coating device, means for drying or adjusting the drying of the coated cylindrical substrate, and separation for taking out the coated cylindrical substrate In the continuous coating method applied by the discharging means, at least one cylindrical base material not gripped by the gripping / transporting means is present between the positioning means and the gripping / transporting means. is there . (The invention of claim 6).

【0019】[0019]

【発明の実施の形態】以下、図面を用いて本発明の一実
施例を説明する。図1は本発明による連続塗布装置の全
体構成を示す斜視図である。図において、10は円筒状
基材1を塗布手段の垂直下方の所定位置に供給して上方
に押し上げる供給手段、20は供給された円筒状基材1
の外周面を把持して筒軸を合わせて積み重ね下から上へ
垂直に押し上げて搬送する把持搬送手段、30は前記円
筒状基材1を塗布装置の環状塗布部の中心に位置合わせ
する位置決め手段、40は前記円筒状基材の外周面上に
塗布液を連続的に塗布する塗布手段、50は円筒状基材
1上に塗布された塗布液を乾燥させる乾燥手段、60は
乾燥されて垂直搬送されてきた積み重ね状の複数の円筒
状基材から分離させて1個ずつ取り出し排出させる分離
排出手段である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention. In the figure, reference numeral 10 denotes supply means for supplying the cylindrical substrate 1 to a predetermined position vertically below the coating means and pushing it up, and reference numeral 20 denotes the supplied cylindrical substrate 1
Gripping / transporting means for gripping the outer peripheral surface of the cylinder, aligning the cylinder axis, vertically pushing up from the bottom and transporting the pile, and conveying means 30 for positioning the cylindrical substrate 1 at the center of the annular coating section of the coating apparatus. , 40 is a coating means for continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate, 50 is a drying means for drying the coating liquid applied on the cylindrical substrate 1, and 60 is a dried and vertical This is a separation / discharge unit that separates from a plurality of stacked cylindrical base materials that have been conveyed and takes out and discharge one by one.

【0020】本発明の連続塗布装置は、上記の各手段を
連続して垂直中心線ZZ上に配置した構成であり、人手
を要しない完全自動化生産が高精度で達成される。即
ち、前記供給手段10は前記円筒状基材1を載置するた
めの複数の取り付け手段11を備えた可動テーブル1
2、該可動テーブル12を回転させて前記把持搬送手段
20へつながる垂直ラインへ送り込む駆動手段13、前
記把持搬送手段20により既に上方に把持搬送されてい
る円筒状基材1を積み重なるように上方に押し上げる昇
降手段14、該昇降手段14の上端に設けられた円筒状
基材供給用のハンド手段15及び前記駆動手段13によ
る回転や昇降手段14による押し上げのタイミングを制
御する図示しない制御手段等から構成されている。な
お、前記可動テーブル12上への円筒状基材1の供給
は、ロボットハンドルにより行われる。
The continuous coating apparatus of the present invention has a configuration in which the above-described units are continuously arranged on the vertical center line ZZ, and achieves fully automatic production with high accuracy without requiring any manual operation. That is, the supply means 10 is a movable table 1 having a plurality of mounting means 11 for mounting the cylindrical substrate 1 thereon.
2. A driving means 13 for rotating the movable table 12 to feed it to a vertical line connected to the gripping / transporting means 20, and the cylindrical substrate 1 already gripped and transported upward by the gripping / transporting means 20 is stacked upward. It comprises a lifting means 14 for pushing up, a hand means 15 for supplying a cylindrical base material provided at an upper end of the lifting means 14, and a control means (not shown) for controlling rotation by the driving means 13 and timing of pushing up by the lifting means 14. Have been. The supply of the cylindrical substrate 1 onto the movable table 12 is performed by a robot handle.

【0021】前記供給手段10の上方に設けられた把持
搬送手段20は、円筒状基材1の外周面に圧接離間可能
で且つ垂直上下方向に移動可能な2組の把持手段21,
22を有し、円筒状基材1を位置決めして把持し上方に
搬送する機能を有する。以下、上記各手段20,30,
40,50,60の詳細は後述する。
The gripping / transporting means 20 provided above the supply means 10 is capable of pressing and separating from the outer peripheral surface of the cylindrical substrate 1 and moving vertically in the vertical direction.
22 and has a function of positioning, grasping and transporting the cylindrical substrate 1 upward. Hereinafter, each of the above means 20, 30,
Details of 40, 50 and 60 will be described later.

【0022】図2は本発明による連続塗布装置の他の実
施例を示す斜視図である。この実施例では、前記把持搬
送手段20の上方の垂直中心線ZZ上に、位置決め手段
30、塗布手段40、乾燥手段50から成るユニット
A,B,Cを複数組縦列配置したものである。最上段に
は前記分離排出手段60が配置されている。各塗布手段
40A,40B,40Cからそれぞれ吐出された塗布液
は、円筒状基材1上に多層の塗布層を逐次形成する。
FIG. 2 is a perspective view showing another embodiment of the continuous coating apparatus according to the present invention. In this embodiment, a plurality of units A, B and C comprising a positioning means 30, a coating means 40 and a drying means 50 are arranged in tandem on a vertical center line ZZ above the gripping and conveying means 20. The separating / discharging means 60 is arranged at the uppermost stage. The coating liquid discharged from each of the coating units 40A, 40B, and 40C sequentially forms a multilayer coating layer on the cylindrical substrate 1.

【0023】図3は前記把持搬送手段20の正面図であ
る。互いに相対向する一組の搬送装置本体23A,23
Bの内側には、それぞれ垂直上下方向に支持されたボー
ルねじ24A,24Bが設けられている。該各ボールね
じ24A,24Bはそれぞれ駆動用モータ25A,25
Bにより正逆回転される。各ボールねじ24A,24B
にそれぞれ螺合する昇降部材26A,26Bは、ボール
ねじ24A,24Bの正逆回転により直進昇降する。該
昇降部材26A,26Bにはそれぞれアーム部材27
A,27Bが固定され、その各先端部にはそれぞれ前記
把持手段21,22が取り付けられた構成になってい
る。
FIG. 3 is a front view of the gripping / transporting means 20. A pair of transfer device bodies 23A and 23 opposed to each other
Inside B, ball screws 24A and 24B supported in the vertical and vertical directions, respectively, are provided. The ball screws 24A, 24B are respectively connected to drive motors 25A, 25A.
B rotates forward and backward. Each ball screw 24A, 24B
The elevating members 26A, 26B respectively screwed up and down move straight up and down by forward and reverse rotation of the ball screws 24A, 24B. The elevating members 26A and 26B have arm members 27 respectively.
A and 27B are fixed, and the gripping means 21 and 22 are attached to the respective distal ends thereof.

【0024】前記搬送装置本体23A,23Bの間に
は、前記昇降手段14が設置され、該昇降手段14の上
端には、円筒状基材供給用のハンド手段15が取り付け
られている。該ハンド手段15の上側には順に円筒状基
材1D,1C,1B,1Aが積載されている。最上段の
円筒状基材1Aは前記分離排出手段60の排出用ハンド
61により分離して取り出される。
The elevating means 14 is provided between the conveying device main bodies 23A and 23B, and the upper end of the elevating means 14 is attached with a hand means 15 for supplying a cylindrical base material. On the upper side of the hand means 15, cylindrical base materials 1D, 1C, 1B, 1A are stacked in order. The uppermost cylindrical base material 1A is separated and taken out by the discharge hand 61 of the separation / discharge means 60.

【0025】前記塗布手段40は位置決め手段30の上
に固定されており、位置決め手段30は図示省略した保
持手段により保持されている。位置決め手段30は円筒
状基材1を所定の位置に正確に保持する装置であり、例
えばエアーベアリング等により非接触保持される。塗布
手段40は円筒状基材1(1A,1B,1C,1D)の
外周面上に塗布液を均一に塗布するものであり、円筒状
基材1A,1B,1C,1Dが前記把持搬送手段20に
より把持搬送されるに従って、円筒状基材1A,1B,
1C,1D上に順次塗膜が形成される。
The coating means 40 is fixed on the positioning means 30, and the positioning means 30 is held by holding means (not shown). The positioning means 30 is a device for accurately holding the cylindrical substrate 1 at a predetermined position, and is held in a non-contact manner by, for example, an air bearing. The coating means 40 is for uniformly applying a coating liquid on the outer peripheral surface of the cylindrical base material 1 (1A, 1B, 1C, 1D), and the cylindrical base materials 1A, 1B, 1C, 1D are provided by the gripping and conveying means. 20, the cylindrical substrates 1A, 1B,
A coating film is sequentially formed on 1C and 1D.

【0026】図4は前記把持手段21,22の斜視図で
ある。上段側の把持手段21は、2個の可動把手21
1,212と、該可動把手211,212の各揺動中心
穴に嵌合して揺動可能に保持する支軸213と、該可動
把手211,212の各先端部に形成されたV字形状の
ハンド部214,215の内側にそれぞれ固定された把
持子216とから構成されている。前記可動把手21
1,212を図示しないピストンシリンダー等の駆動手
段により開閉することにより、前記把持子216は円筒
状基材の外周面に接離する。図示の把持子216は4箇
所または3箇所で円筒状基材1に圧接する。
FIG. 4 is a perspective view of the gripping means 21 and 22. The upper gripping means 21 includes two movable grips 21.
1 and 212; a support shaft 213 that is fitted into each swing center hole of the movable handles 211 and 212 so as to be able to swing; and a V-shape formed at each end of the movable handles 211 and 212. And the grippers 216 fixed to the inside of the hand units 214 and 215, respectively. The movable handle 21
The gripper 216 comes into contact with and separates from the outer peripheral surface of the cylindrical base material by opening and closing the first and second parts 212 by driving means such as a piston cylinder (not shown). The illustrated gripper 216 presses against the cylindrical substrate 1 at four or three locations.

【0027】下段側の把持手段22も、上記上段側の把
持手段21と同様の構成をなし、221,222は可動
把手、223は支軸、224,225はハンド部、22
6は把持子である。なお、上段側の把持手段21は、円
筒状基材1B,1Cの接続位置の各外周面を把持した状
態を示し、下段側の把持手段22は円筒状基材1C,1
Dの接続位置の各外周面から離間した状態を示す。
The lower gripping means 22 also has the same structure as the upper gripping means 21; 221, 222 are movable grips; 223, a support shaft;
6 is a gripper. Note that the upper gripping means 21 shows a state where each outer peripheral surface at the connection position of the cylindrical substrates 1B and 1C is gripped, and the lower gripping means 22 is a cylindrical substrate 1C and 1C.
The state where the connection position of D was separated from each outer peripheral surface is shown.

【0028】前記上段側の把持手段21の把持子216
は、図示の円筒状基材1B,1Cの端面間の接続部(繋
ぎ部)K1付近の外周面を把持するのが好ましい。ま
た、下段側の把持手段22の把持子226は、円筒状基
材1C,1Dの端面間の接続部(繋ぎ部)K2付近の外
周面を把持するのが好ましい。前記接続部K1付近の外
周面及びK2付近の外周面は、感光体ドラムの非画像形
成領域である。
The gripper 216 of the upper gripping means 21
It is preferable to grip the outer peripheral surface near the connecting portion (connecting portion) K1 between the end surfaces of the illustrated cylindrical substrates 1B and 1C. Further, it is preferable that the gripper 226 of the lower gripping means 22 grip the outer peripheral surface near the connecting portion (connecting portion) K2 between the end surfaces of the cylindrical substrates 1C and 1D. The outer peripheral surface near the connection portion K1 and the outer peripheral surface near K2 are non-image forming areas of the photosensitive drum.

【0029】図5は把持手段21の他の実施例を示す斜
視図である。図5(a)は、V字形状のハンド部28
1,282の内側にそれぞれ固定された把持子280を
有し、該ハンド部281,282をそれぞれ前進、後退
させることにより、円筒状基材1を4点支持で圧接把持
または離間する。図5(b)は、切り欠き円筒形状のハ
ンド部283,284の内側にそれぞれ固定された把持
子280を有し、該ハンド部283,284を前進、後
退させることにより、円筒状基材1を円筒状外周面支持
で圧接把持または離間する。図5(c)は、前記V字形
状のハンド部281と平面状のハンド部285の内側に
それぞれ固定された把持子280を有し、該ハンド部2
81,285をそれぞれ前進、後退させることにより、
円筒状基材1を3点支持で圧接把持または離間する。
FIG. 5 is a perspective view showing another embodiment of the gripping means 21. As shown in FIG. FIG. 5A shows a V-shaped hand portion 28.
The handpieces 281 and 282 are respectively moved forward and backward by holding the grippers 280 fixed to the insides of the cylindrical bases 1 and 282, respectively. FIG. 5 (b) has grippers 280 fixed inside the notched cylindrical hand portions 283 and 284, respectively, and by moving the hand portions 283 and 284 forward and backward, the cylindrical base material 1 is removed. Is pressed and held or separated by supporting the cylindrical outer peripheral surface. FIG. 5C shows a gripper 280 fixed to the inside of the V-shaped hand portion 281 and the flat hand portion 285, respectively.
By moving 81 and 285 forward and backward respectively,
The cylindrical substrate 1 is pressed and gripped or separated by three-point support.

【0030】図6は、位置決め手段30と垂直型塗布手
段40とを示す断面図、図7は塗布手段40の斜視図で
ある。
FIG. 6 is a sectional view showing the positioning means 30 and the vertical coating means 40, and FIG. 7 is a perspective view of the coating means 40.

【0031】図6に示されるように中心線Z−Zに沿っ
て垂直状に重ね合わせた複数の円筒状基材1A,1B
(以下、円筒状基材1と称す)を連続的に矢示方向に上
昇移動させ、その周囲を取り囲み、円筒状基材1の外周
面に対しスライドホッパー型の塗布手段10の塗布に直
接係わる部分(ホッパー塗布面)41により塗布液(感
光液)Lが塗布される。なお、円筒状基材1としては中
空ドラム例えばアルミニウムドラム、プラスチックドラ
ムのほかシームレスベルト型の基材でも良い。
As shown in FIG. 6, a plurality of cylindrical substrates 1A, 1B vertically superimposed along the center line ZZ.
(Hereinafter referred to as the cylindrical substrate 1) is continuously moved upward in the direction of the arrow to surround the periphery thereof, and is directly involved in the application of the slide hopper type application means 10 to the outer peripheral surface of the cylindrical substrate 1. The coating liquid (photosensitive liquid) L is applied by the portion (hopper application surface) 41. The cylindrical substrate 1 may be a hollow drum, for example, an aluminum drum, a plastic drum, or a seamless belt type substrate.

【0032】前記ホッパー塗布面41には、円筒状基材
1側に開口する塗布液流出口42を有する幅狭の塗布液
分配スリット(スリットと略称する)43が水平方向に
形成されている。このスリット43は環状の塗布液分配
室(塗布液溜り室)44に連通し、この環状の塗布液分
配室44には貯留タンク2内の塗布液Lを圧送ポンプ3
により供給管4を介して供給するようになっている。
On the hopper coating surface 41, a narrow coating liquid distribution slit (abbreviated as a slit) 43 having a coating liquid outlet 42 opening toward the cylindrical substrate 1 is formed in the horizontal direction. The slit 43 communicates with an annular coating liquid distribution chamber (coating liquid reservoir) 44, and the annular coating liquid distribution chamber 44 feeds the coating liquid L in the storage tank 2 to the pump 3.
The supply is made via the supply pipe 4.

【0033】他方、スリット43の塗布液流出口42の
下側には、連続して下方に傾斜し、円筒状基材1の外径
寸法よりやや大なる寸法で終端をなすように形成された
塗布液スライド面(以下、スライド面と称す)45が形
成されている。さらに、このスライド面45終端より下
方に延びる唇状部46が形成されている。
On the other hand, on the lower side of the coating liquid outlet 42 of the slit 43, it is formed so as to be continuously inclined downward and terminate at a dimension slightly larger than the outer diameter of the cylindrical substrate 1. A coating liquid slide surface (hereinafter, referred to as a slide surface) 45 is formed. Further, a lip 46 extending downward from the end of the slide surface 45 is formed.

【0034】かかる塗布手段(スライドホッパー型塗布
装置)40による塗布においては、円筒状基材1を引き
上げる過程で、塗布液Lをスリット43から押し出し、
スライド面45に沿って流下させると、スライド面45
の終端に至った塗布液は、そのスライド面45の終端と
円筒状基材1の外周面との間にビードを形成した後、円
筒状基材1の表面に塗布される。
In the application by the application means (slide hopper type application device) 40, the application liquid L is extruded from the slit 43 in the process of lifting the cylindrical substrate 1,
When flowing down along the slide surface 45, the slide surface 45
Is applied to the surface of the cylindrical substrate 1 after forming a bead between the terminal of the slide surface 45 and the outer peripheral surface of the cylindrical substrate 1.

【0035】スライド面45の終端と円筒状基材1は、
ある間隙を持って配置されているため円筒状基材1を傷
つける事なく、また性質の異なる層を多層形成させる場
合においても、既に塗布された層を損傷することなく塗
布できる。
The end of the slide surface 45 and the cylindrical substrate 1 are
Since they are arranged with a certain gap, they can be applied without damaging the cylindrical substrate 1 and without damaging already applied layers even when forming layers having different properties in multiple layers.

【0036】一方、前記圧送ポンプ3の塗布液供給部よ
り最も遠い位置で、前記塗布液分配室44の一部には、
塗布液分配室44内の泡抜き用の空気抜き部材46が設
けられている。貯留タンク2内の塗布液Lが塗布液分配
室44に供給されて塗布液分配スリット43から塗布液
流出口42に供給されるとき、開閉弁47を開いて空気
抜き部材46より塗布液分配室44内の空気を排出す
る。
On the other hand, at a position furthest from the coating liquid supply section of the pressure feed pump 3, a part of the coating liquid distribution chamber 44
An air release member 46 for removing bubbles in the coating liquid distribution chamber 44 is provided. When the coating liquid L in the storage tank 2 is supplied to the coating liquid distribution chamber 44 and supplied to the coating liquid outlet 42 from the coating liquid distribution slit 43, the opening / closing valve 47 is opened and the coating liquid distribution chamber 44 is opened from the air release member 46. Discharge air inside.

【0037】前記スライドホッパー型塗布装置40の下
部には、円筒状基材の円周方向を位置決めする位置決め
手段30が固定されている。前記円筒状基材1の位置決
め装置30の本体31には、複数の給気口32と、複数
の排気口33が穿設されている。該複数の給気口32
は、図示しない給気ポンプに接続され、空気等の流体が
圧送される。該給気口32の一端部で円筒状基材1の外
周面に対向する側には、吐出口34が貫通している。該
吐出口34は前記円筒状基材1の外周面と所定の間隙を
保って対向している。該間隙は、20μm〜3mm、好
ましくは30μm〜2mmである。この間隙が20μm
より小さいと、円筒状基材1の僅かな振れで本体31の
内壁に接触して円筒状基材1を傷つけやすい。また、こ
の間隙が3mmより大であると、円筒状基材1の位置決
め精度が低下する。前記吐出口34は直径0.01〜
1.0mmの小口径のノズルであり、好ましくは0.0
5〜0.5mmが良い。
Below the slide hopper type coating apparatus 40, a positioning means 30 for positioning the cylindrical base material in the circumferential direction is fixed. A plurality of air inlets 32 and a plurality of air outlets 33 are formed in the main body 31 of the positioning device 30 for the cylindrical substrate 1. The plurality of air inlets 32
Is connected to an air supply pump (not shown), and a fluid such as air is pumped. A discharge port 34 passes through one end of the air supply port 32 at a side facing the outer peripheral surface of the cylindrical substrate 1. The discharge port 34 faces the outer peripheral surface of the cylindrical substrate 1 with a predetermined gap. The gap is between 20 μm and 3 mm, preferably between 30 μm and 2 mm. This gap is 20 μm
If it is smaller, the cylindrical base material 1 is likely to be damaged due to a slight swing of the cylindrical base material 1 and coming into contact with the inner wall of the main body 31. Further, if the gap is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 is reduced. The discharge port 34 has a diameter of 0.01 to
It is a small-diameter nozzle of 1.0 mm, preferably 0.0
5 to 0.5 mm is good.

【0038】前記本体31の内壁下部の内周面は、入り
口側が広がったテーパー面35になっている。このテー
パー面35は、例えば軸方向の長さが50mmで、片側
傾斜角が0.5mmの円錐面である。このテーパー面3
5を設けることにより、円筒状基材1が本体31の内壁
に進入するとき、円筒状基材1の先端部が内壁の内周面
に接触することを防止している。
The inner peripheral surface of the lower part of the inner wall of the main body 31 is formed as a tapered surface 35 whose entrance side is widened. The tapered surface 35 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. This tapered surface 3
Provision of 5 prevents the tip of cylindrical substrate 1 from contacting the inner peripheral surface of the inner wall when cylindrical substrate 1 enters the inner wall of main body 31.

【0039】前記給気ポンプから圧送された流体は、複
数の給気口32から本体31の内部に導入されて、複数
の吐出口34から吐出され、前記円筒状基材1A(1
B)の外周面と均一な流体膜層を形成する。吐出後の流
体は複数の排気口33から装置外に排出される。
The fluid pumped from the air supply pump is introduced into the main body 31 through a plurality of air inlets 32, is discharged from a plurality of outlets 34, and is discharged from the cylindrical substrate 1A (1).
A uniform fluid film layer is formed on the outer peripheral surface of B). The discharged fluid is discharged out of the apparatus from the plurality of exhaust ports 33.

【0040】前記吐出口34の開口直径は0.01〜1
mm、好ましくは0.05〜0.5mm、例えば0.2
〜0.5mmの円形に形成されている。排気口33の開
口直径は1.0〜10mm、好ましくは2.0〜8.0
mm、例えば3〜5mmの円形に形成されている。
The opening diameter of the discharge port 34 is 0.01 to 1
mm, preferably 0.05-0.5 mm, for example 0.2
It is formed in a circular shape of about 0.5 mm. The opening diameter of the exhaust port 33 is 1.0 to 10 mm, preferably 2.0 to 8.0.
mm, for example, 3 to 5 mm.

【0041】前記給気口32に供給される流体は、空
気、不活性ガス例えば窒素ガスが良い。そして該流体
は、JIS規格でクラス100以上の清浄な気体が良
い。
The fluid supplied to the air supply port 32 is preferably air, an inert gas such as nitrogen gas. The fluid is preferably a clean gas of class 100 or more according to JIS.

【0042】なお、本発明の位置決め装置に接続される
垂直塗布装置としては、スライドホッパー型、押し出し
型、リングコーター等の各種装置が用いられる。
As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type, and a ring coater are used.

【0043】図8は、本発明による把持搬送手段20と
位置決め手段30の相対位置関係を示す断面図である。
FIG. 8 is a sectional view showing the relative positional relationship between the gripping / conveying means 20 and the positioning means 30 according to the present invention.

【0044】図8(a)は、2個のハンド部214,2
15の内側にそれぞれ固定された把持子216を有する
上段側の把持手段21が、円筒状基材1D,1Eの端面
間の接続部(繋ぎ部)K付近の外周面を把持した状態を
示す。また、2個のハンド部224,225の内側にそ
れぞれ固定された把持子226を有する下段側の把持手
段22は、円筒状基材1Eの下端付近の外周面を把持す
るため待機している。
FIG. 8A shows two hand units 214 and 2
15 shows a state in which the upper gripping means 21 having grippers 216 respectively fixed inside 15 grips the outer peripheral surface in the vicinity of a connecting portion (connecting portion) K between the end surfaces of the cylindrical substrates 1D and 1E. The lower gripping means 22 having grippers 226 fixed inside the two hand portions 224 and 225 are on standby to grip the outer peripheral surface near the lower end of the cylindrical substrate 1E.

【0045】前記上段側の把持手段21に把持された円
筒状基材1Dの上端面の上部には、円筒状基材1Cが、
更にその上方には円筒状基材1B,1Aが自重で載置さ
れている。把持手段21に把持された前記円筒状基材1
Dの上に載置されている円筒状基材1Cの上端側は、前
記位置決め手段30に未だ進入していない状態にあり、
その円筒面には外力が加えられていない状態である。
On the upper part of the upper end surface of the cylindrical substrate 1D gripped by the gripping means 21 on the upper side, a cylindrical substrate 1C is provided.
Further above, the cylindrical substrates 1B and 1A are placed under their own weight. The cylindrical substrate 1 gripped by the gripping means 21
The upper end side of the cylindrical base material 1C placed on D has not yet entered the positioning means 30,
No external force is applied to the cylindrical surface.

【0046】前記把持搬送手段20の上段側の把持手段
21の上面と、位置決め手段30の入口部下面との間隔
D1内には、外力の加えられていない長さD0の円筒状
基材1Cが少なくとも1個存在する。
[0046] The gripping and the upper surface of the gripping means 21 of the upper side of the conveying means 20, within the distance D1 of the inlet lower surface of the positioning means 30, the cylindrical substrate 1C length D 0 not added external force Exists at least one.

【0047】円筒状基材1Bは、流体吐出口を有するリ
ング状の位置決め手段30により位置決めされている。
通常、把持の中心と位置決めの中心をいつも一致させる
のは極めて困難(ドラムの寸法や精度にバラツキがある
ため)なため、外部把持されていない円筒状基材を少な
くとも1つ以上有することにより、位置決め手段の修正
が行いやすくなる。
The cylindrical substrate 1B is positioned by a ring-shaped positioning means 30 having a fluid discharge port.
Usually, it is extremely difficult to always match the center of the grip with the center of the positioning (because there is variation in the dimensions and accuracy of the drum), so by having at least one or more cylindrical substrates that are not externally gripped, The positioning means can be easily corrected.

【0048】前記上段側の把持手段21による把持及び
把持解除時や、昇降駆動時に発生した振動により、把持
された円筒状基材1Dから伝達された振動は、前記外力
の加えられていない円筒状基材1Cに吸収されて、位置
決め中の円筒状基材1Bや、塗布中の円筒状基材1Aに
は伝達されない。なお円筒状基材1Aはリング状の塗布
手段40により塗布液が塗布されている。
The vibration transmitted from the gripped cylindrical substrate 1D due to the vibration generated at the time of gripping / releasing by the gripping means 21 on the upper stage side or at the time of driving up and down is the cylindrical shape to which the external force is not applied. It is absorbed by the base material 1C and is not transmitted to the cylindrical base material 1B during positioning or the cylindrical base material 1A during coating. The coating liquid is applied to the cylindrical substrate 1A by the ring-shaped application means 40.

【0049】図8(b)は、上段側の把持手段21が、
円筒状基材1Dの円筒面の上端側付近で、円筒状基材1
Cとの繋ぎ部Kの下方の位置を把持した状態を示す。ま
た、下段側の把持手段22は、円筒状基材1Dの下端付
近の外周面を把持するため待機している。
FIG. 8B shows that the upper gripping means 21
Near the upper end side of the cylindrical surface of the cylindrical substrate 1D, the cylindrical substrate 1
4 shows a state where a position below a connecting portion K with C is grasped. Further, the lower gripping means 22 is on standby to grip the outer peripheral surface near the lower end of the cylindrical substrate 1D.

【0050】前記上段側の把持手段21の上面と、位置
決め手段30の入口部下面との間隔D2内には、外力の
加えられていない長さD0の円筒状基材(1C)が少な
くとも1個存在する。このような円筒状基材の把持方法
においても、前記上段側の把持手段21による把持及び
把持解除時や、昇降駆動時に発生した振動により、把持
された円筒状基材1Dから伝達された振動は、前記外力
の加えられていない円筒状基材1Cに吸収されて、位置
決め中の円筒状基材1Bや、塗布中の円筒状基材1Aに
は伝達されない。
[0050] and the upper surface of the upper side of the gripping means 21, within the distance D2 between the inlet lower surface of the positioning means 30, the cylindrical base material of length D 0 not added external force (1C) of at least 1 Exists. Even in such a method of gripping the cylindrical base material, the vibration transmitted from the gripped cylindrical base material 1D due to the vibration generated at the time of gripping and release by the gripping means 21 on the upper stage side and at the time of lifting / lowering drive is not performed. Is absorbed by the cylindrical substrate 1C to which no external force is applied, and is not transmitted to the cylindrical substrate 1B during positioning or the cylindrical substrate 1A during coating.

【0051】前記塗布手段40の上方には、乾燥フード
51と乾燥器53とから成る乾燥手段50が設けられて
いる。
Above the coating means 40, a drying means 50 comprising a drying hood 51 and a dryer 53 is provided.

【0052】図9は前記塗布手段40と該塗布手段40
の上部に設けた乾燥フード51の断面図である。該乾燥
フード51は環状の壁面を有し、該壁面には多数の開口
51Aが穿設されている。前記円筒状基材1を矢示方向
に上昇させ、前記塗布手段40のホッパー塗布面(塗布
ヘッド)41で塗布液Lを塗布し、感光層5を形成す
る。円筒状基材1上に形成された感光層5は前記乾燥フ
ード51内を通過しながら徐々に乾燥される。この乾燥
は前記多数の開口51Aより塗布液Lに含まれている溶
媒を壁面外に放出することにより行われる。
FIG. 9 shows the coating means 40 and the coating means 40.
It is sectional drawing of the drying hood 51 provided in the upper part of FIG. The drying hood 51 has an annular wall surface, and a large number of openings 51A are formed in the wall surface. The cylindrical substrate 1 is raised in the direction of the arrow, and the coating liquid L is applied on the hopper application surface (application head) 41 of the application means 40 to form the photosensitive layer 5. The photosensitive layer 5 formed on the cylindrical substrate 1 is gradually dried while passing through the drying hood 51. This drying is performed by discharging the solvent contained in the coating liquid L out of the wall surface through the large number of openings 51A.

【0053】前記のように、塗布手段40により円筒状
基材1上に塗布液Lを塗布することにより、形成された
感光層5は、塗布直後において乾燥フード51により包
囲されており、開口51Aからのみ溶媒が放出されるた
め、塗布直後における感光層5の乾燥速度は、前記開口
51Aの開口面積にほぼ比例する。
As described above, the photosensitive layer 5 formed by applying the coating liquid L onto the cylindrical substrate 1 by the coating means 40 is surrounded by the drying hood 51 immediately after the coating, and the opening 51A is provided. The drying speed of the photosensitive layer 5 immediately after the application is almost proportional to the opening area of the opening 51A.

【0054】図10は乾燥フードの他の実施例を示す断
面図である。この乾燥フード52は前記図9における乾
燥フード51(A部)の上部を延長してB部を形成した
ものである。このA部には複数個の52Aが、B部には
複数個の52Bがそれぞれ穿設されている。この乾燥フ
ード52を塗布手段40の上部に設けることにより、円
筒状基材1の外周面上に塗布された塗布液Lの溶媒蒸気
濃度が制御される。従って塗膜乾燥速度が制御されるこ
とで塗膜の均一化を計ることが可能である。また前記の
ような乾燥フード52を設けることで、ビード部分の溶
媒蒸気濃度が高くなるため、急速な乾燥が防止され、ビ
ード切れを防止できる。
FIG. 10 is a sectional view showing another embodiment of the drying hood. The drying hood 52 is formed by extending the upper portion of the drying hood 51 (A portion) in FIG. 9 to form a B portion. A plurality of 52A are drilled in the A section, and a plurality of 52B are drilled in the B section. By providing the drying hood 52 above the coating means 40, the solvent vapor concentration of the coating liquid L applied on the outer peripheral surface of the cylindrical substrate 1 is controlled. Therefore, by controlling the coating film drying speed, it is possible to make the coating film uniform. In addition, by providing the drying hood 52 as described above, the solvent vapor concentration in the bead portion is increased, so that rapid drying is prevented, and bead breakage can be prevented.

【0055】図11に本発明の乾燥器53の断面図を示
す。乾燥器53は吸引スリット531、吸引チャンバー
532、吸引ノズル533を有する吸引スリット部材5
34の下部に筒状部材535、上部に筒状部材536が
それぞれ同心に結合されている。
FIG. 11 is a sectional view of the dryer 53 of the present invention. The drying device 53 includes a suction slit member 5 having a suction slit 531, a suction chamber 532, and a suction nozzle 533.
A cylindrical member 535 is concentrically connected to the lower part of the tube 34, and a cylindrical member 536 is concentrically connected to the upper part of the tube 34.

【0056】そして、複数設けられた吸引ノズル533
から吸引を行ない、周方向均一な吸引チャンバー53
2、周方向均一な吸引スリット531により周方向の均
一化がなされた吸引エアーが流れ、更に、吸引スリット
部材534、その上下の筒状部材536,535の各内
径面と塗布済みの円筒状基材1の外周面との間の空気流
の乱れをバッファー空間537で極く僅かにおさえて、
538に示す乾燥の為の均一吸引エアーの空気流を作り
出している。
Then, a plurality of suction nozzles 533 are provided.
Suction from the suction chamber 53 in the circumferential direction.
2. The suction air uniformized in the circumferential direction by the suction slit 531 which is uniform in the circumferential direction flows, and the suction slit member 534, the inner diameter surfaces of the upper and lower cylindrical members 536, 535 and the coated cylindrical base are further separated. The turbulence of the airflow between the outer peripheral surface of the material 1 and the outer surface of the material 1 is very slightly suppressed by the buffer space 537,
An air flow of uniform suction air for drying shown at 538 is created.

【0057】この乾燥ゾーンに矢印で示す方向に塗布済
の円筒状基材1を搬送することにより、塗布膜の乾燥を
行うものである。
The coated film is dried by transporting the coated cylindrical substrate 1 to the drying zone in the direction indicated by the arrow.

【0058】次に、乾燥手段50の他の実施例として図
12に示された排気乾燥装置54について説明する。前
記のように円筒状基体1A、1Bに環状のスライドホッ
パー型塗布装置40にて塗布液(感光液)Lが塗布され
て感光層LAが形成される。前記排気乾燥装置54は塗
布した直後の感光層LAより蒸発する溶媒を吸引し、更
に乾燥を行うもので、前記塗布装置40の直上に設けら
れている。541は環状に形成された吸引ダクトで、該
吸引ダクト541より前記感光層LAに向けて吸引口5
42が形成されている。前記吸引ダクト541の一部に
は排気管543が接続され、該排気管543内に設けた
排気ファン544により前記感光層LAより蒸発する溶
媒を吸引して、強制的に外部に排出し乾燥させる。
Next, an exhaust drying device 54 shown in FIG. 12 will be described as another embodiment of the drying means 50. As described above, the coating liquid (photosensitive liquid) L is applied to the cylindrical substrates 1A and 1B by the annular slide hopper type coating apparatus 40 to form the photosensitive layer LA. The exhaust drying device 54 sucks a solvent that evaporates from the photosensitive layer LA immediately after the application, and further performs drying, and is provided immediately above the application device 40. Reference numeral 541 denotes a suction duct formed in an annular shape, and a suction port 5 from the suction duct 541 toward the photosensitive layer LA.
42 are formed. An exhaust pipe 543 is connected to a part of the suction duct 541, and a solvent evaporating from the photosensitive layer LA is sucked by an exhaust fan 544 provided in the exhaust pipe 543, forcibly discharged to the outside and dried. .

【0059】前記のように塗布装置40にて感光液Lを
塗布した直後に、該感光液Lより発生する溶媒蒸気を排
気するため円筒状基体1A、1Bに塗布された感光液L
が多量に流下するのを停止させることができる。その
際、前記排気ファン544による排気風速を0.5〜5
m/secで行い、前記吸引口542は前記塗布ヘッド
41の位置より300mm以下が望ましい。そして前記
感光液L内の溶媒が30%以上蒸発するまで前記円筒状
基体1A、1Bを連結状態に保ち、分離した後、感光層
LAを完全に乾燥させる。前記のような排気乾燥装置5
4を作動させることにより、多数の円筒状基体を接続し
て感光液Lを塗布した場合でも感光層LAの近傍より溶
媒を急速に排出出来ると共に、感光液Lによる塗膜の流
下を強制的に制御して感光層LAに発生する前記薄膜や
液溜りの発生を防止する事も出来る。尚、前記排気ファ
ン544は、吸引ダクト541に複数箇所設けてもよ
い。
Immediately after the application of the photosensitive liquid L by the coating apparatus 40 as described above, the photosensitive liquid L applied to the cylindrical substrates 1A and 1B to exhaust the solvent vapor generated from the photosensitive liquid L is exhausted.
Can be stopped from flowing down in large quantities. At this time, the exhaust air speed by the exhaust fan 544 is set to 0.5 to 5
The suction port 542 is desirably 300 mm or less from the position of the coating head 41. Then, the cylindrical substrates 1A and 1B are kept in a connected state until the solvent in the photosensitive liquid L evaporates by 30% or more. After separation, the photosensitive layer LA is completely dried. Exhaust drying device 5 as described above
By operating 4, even when a large number of cylindrical substrates are connected and the photosensitive liquid L is applied, the solvent can be rapidly discharged from the vicinity of the photosensitive layer LA, and the falling of the coating film by the photosensitive liquid L is forcibly performed. By controlling, it is possible to prevent the thin film and the liquid pool from being generated in the photosensitive layer LA. Note that the exhaust fan 544 may be provided at a plurality of locations in the suction duct 541.

【0060】以上のようにして塗布及び塗布膜乾燥が行
なわれた円筒状基体1A,1B,1C〜・・・・を分離
する方法を図13の分離過程の各プロセスの状態図を用
いて説明する。
A method for separating the cylindrical substrates 1A, 1B, 1C,... Which have been coated and dried as described above will be described with reference to the state diagrams of the respective steps in the separation process shown in FIG. I do.

【0061】分離排出手段60は垂直移動ロボットステ
ージ61、エアーシリンダー62、上チャック63及び
下チャック64により構成される。
The separating / discharging means 60 comprises a vertically moving robot stage 61, an air cylinder 62, an upper chuck 63 and a lower chuck 64.

【0062】塗布済みの円筒状基体1は下方より上方へ
向けて積み上げられ、上方向へ移動し、図13(a)に
示すように分離位置に達する。この時垂直ロボットが起
動し被分離円筒状基体1Aと同軸,等速度で同架された
分離ユニット全体を移動する。
The coated cylindrical substrates 1 are stacked upward from below, move upward, and reach the separation position as shown in FIG. At this time, the vertical robot is activated and moves the entire separation unit coaxially and at the same speed as the cylindrical base 1A to be separated.

【0063】まず、図13(b)に示す位置で下チャッ
ク64が被分離円筒状基体1Aに隣接する円筒状基体1
Bを保持する。次いで図13(c)に示す位置で上チャ
ック63が被分離円筒状基体1Aを保持する。
First, at the position shown in FIG. 13 (b), the lower chuck 64 moves the cylindrical substrate 1 adjacent to the cylindrical substrate 1A to be separated.
Hold B. Next, the upper chuck 63 holds the cylindrical substrate 1A to be separated at the position shown in FIG.

【0064】エアーシリンダー62により上チャック6
3は被分離円筒状基体1Aを保持したまま上方向へ移動
して図13(d)に示す位置になる。この時被分離円筒
状基体1Aと隣接する円筒状基体1Bにまたがる塗布膜
が切り裂かれて図13(d)図に示すように1A,1B
の分離が行なわれる。
The upper chuck 6 is moved by the air cylinder 62.
Reference numeral 3 moves upward while holding the cylindrical substrate 1A to be separated, and reaches the position shown in FIG. At this time, the coating film straddling the cylindrical substrate 1B adjacent to the cylindrical substrate 1A to be separated is cut off, and as shown in FIG.
Is performed.

【0065】分離済み円筒状基体1Aを回収する為、図
13(e)に示すように下チャック64はアンチャック
状態となり、垂直移動ロボットステージ61が急上昇を
行い、隣接する円筒状基体1Bの位置よりはるか上方に
配置された分離ドラム回収装置に該分離済み円筒状基体
1Aを置き(上チャック63がアンチャックになり)行
程を終了する。
In order to collect the separated cylindrical substrate 1A, the lower chuck 64 is in the uncucked state as shown in FIG. 13 (e), the vertical moving robot stage 61 rises rapidly, and the position of the adjacent cylindrical substrate 1B is changed. The separated cylindrical substrate 1A is placed on the separation drum collecting device disposed far above (the upper chuck 63 becomes an unchuck), and the process is completed.

【0066】そして次なる円筒状基体1Bの分離動作の
為、垂直移動ロボットステージ61が下降し、また、エ
アーシリンダー62が下降し、初期状態の位置図13
(a)に戻る。
Then, for the next separating operation of the cylindrical base 1B, the vertically moving robot stage 61 is lowered, and the air cylinder 62 is lowered, so that the initial position of FIG.
Return to (a).

【0067】その他に、被分離円筒状基体1Aと隣接円
筒状基体1Bの分離を行なう際に被分離円筒状基体1A
に回転を加えながら円筒状基体1Aを引き上げる方法も
有効である。これは、分離される膜に引張り力ではな
く、剪断力を加えるものであり、ウェット状態の膜では
分離部近傍の塗布膜プロフィールが薄膜化する現象を低
減できる。また塗布膜の切断時に発生する膜の小片の飛
散が該円筒状基体1内面へ引き込まれることにより、低
減する。
In addition, when separating the cylindrical substrate 1A to be separated from the adjacent cylindrical substrate 1B, the cylindrical substrate 1A
It is also effective to pull up the cylindrical base 1A while applying rotation to the substrate. This applies a shearing force instead of a tensile force to a film to be separated, and can reduce a phenomenon in which a coating film profile near the separation portion becomes thinner in a wet state of the film. Further, scattering of small pieces of the film generated at the time of cutting the coating film is reduced by being drawn into the inner surface of the cylindrical substrate 1.

【0068】[実施例]次に、具体的な実施例により本
発明を説明するが、本発明はこれに限定されるものでは
ない。
[Examples] Next, the present invention will be described with reference to specific examples, but the present invention is not limited to these examples.

【0069】実施例1 導電性支持体(円筒状基材)1としては鏡面加工を施し
た直径80mm、高さ355mm、283gのアルミニ
ウムドラム支持体を用いた。また、塗布液Lとしては下
記記載のUCL−1塗布液組成物を用いた。
Example 1 As a conductive support (cylindrical substrate) 1, a mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g was used. As the coating liquid L, the following UCL-1 coating liquid composition was used.

【0070】 UCL−1塗布液組成物(3.0 W/V%ポリマー濃度) 共重合ナイロン樹脂(CM−8000 東レ社製) 3g メタノール/n−ブタノール=10/1(Vol比) 1000ml 図1により円筒状基材1の連続塗布工程を説明する。円
筒状基材1は図示されていない供給ロボットにより円筒
状基材1(アルミニウムドラム)収納室より可動テーブ
ル12上にある円筒状基材1の1Fの位置に置かれる。
円筒状基材1Fは可動テーブル11の矢印方向の回転に
より1Eの位置に達する。この時、昇降手段14の供給
アームが下方より上方へ円筒状基材1Eを押し上げ、ハ
ンド手段15の位置まで供給される。好ましくは供給ア
ームによる押し上げが完了すると同時に緩衝機構が作用
し、先行の円筒状基材1Dの下端と後続の円筒状基材1
Eの上端との接合時のショックを無くすのが良い。この
ようにして円筒状基材1E,1Fが順次、把持搬送手段
20のところまで運び込まれる。
UCL-1 coating solution composition (3.0 W / V% polymer concentration) Copolymerized nylon resin (CM-8000 manufactured by Toray Industries, Ltd.) 3 g Methanol / n-butanol = 10/1 (vol ratio) 1000 ml A continuous application step of the cylindrical substrate 1 will be described. The cylindrical substrate 1 is placed at a position 1F of the cylindrical substrate 1 on the movable table 12 from the cylindrical substrate 1 (aluminum drum) storage chamber by a supply robot (not shown).
The cylindrical base 1F reaches the position 1E by rotating the movable table 11 in the direction of the arrow. At this time, the supply arm of the lifting / lowering means 14 pushes the cylindrical substrate 1E upward from below and is supplied to the position of the hand means 15. Preferably, at the same time as the push-up by the supply arm is completed, the buffer mechanism operates, and the lower end of the preceding cylindrical base material 1D and the following cylindrical base material 1D
It is good to eliminate the shock at the time of joining with the upper end of E. In this way, the cylindrical substrates 1E and 1F are sequentially carried to the gripping / conveying means 20.

【0071】円筒状基材1Dは可動把手21,22によ
り把持されかつ上方に搬送される。把持される場所は円
筒状基材1Dに悪影響が無ければどの場所でもよいが、
円筒状基材1D,1Cとの繋ぎ部(接続部)Kを把持す
る事により円筒状基材1D,1C間の段差修正がある程
度まで行われ好ましいし、上に積み重ねられた円筒状基
材1Cの全重量に抗して強い力で把持するのだからキズ
や故障の発生を防ぐため、繋ぎ部Kの非画像部を把持す
るのが良い。
The cylindrical substrate 1D is gripped by the movable handles 21 and 22 and transported upward. The place to be gripped may be any place as long as there is no adverse effect on the cylindrical substrate 1D,
It is preferable that the level difference between the cylindrical substrates 1D and 1C is corrected to a certain extent by gripping a connecting portion (connecting portion) K with the cylindrical substrates 1D and 1C, and the cylindrical substrate 1C stacked on top It is preferable to grip the non-image portion of the connecting portion K in order to prevent the occurrence of scratches and failures since it is gripped with a strong force against the total weight of the connecting portion K.

【0072】把持搬送手段20については、図3〜5の
説明の項を参照されたい。
For the gripping / transporting means 20, see the description of FIGS.

【0073】このようにして図1の把持搬送手段20に
より円筒状基材1Dが上方向へ移行され、位置決め手段
30へ至る。位置決め手段30は、特開平3−2800
63号公報に記載されている位置決め手段の他、図6に
示した環状の位置決め手段が好ましく用いられる。本実
施例では、把持手段と位置決め手段との間に、2個分の
ドラム長を採用した。
As described above, the cylindrical substrate 1D is moved upward by the gripping / transporting means 20 shown in FIG. The positioning means 30 is disclosed in JP-A-3-2800.
In addition to the positioning means described in JP-A-63-63, an annular positioning means shown in FIG. 6 is preferably used. In this embodiment, two drum lengths are employed between the gripping means and the positioning means.

【0074】このようにして正確に位置決めされた円筒
状基材1は図6、図7に示した塗布手段40へ移行され
塗布される。40は垂直型の塗布手段であり、スライド
ホッパー型、押し出し型、リングコーター型、スプレー
コーター型等、円筒状基材1を積み重ねて上方又は下方
に相対的に移動する事により塗布するものであれば種類
を問わないが、信頼性の高い連続安定塗布が得られる事
によりスライドホッパー型コーターが好ましい。この塗
布手段は特開昭58−189061号公報に詳しい。ま
た泡ぬき口やスペーサーを用いるのが良い。また、塗布
手段40の位置の微調整の為、公知のX−Y軸可動制御
テーブル上に塗布手段を設置するのが良い。また特開平
3−21371号公報の如く制御手段を設けても良い。
このようにして塗布組成物UCL−1が円筒状基材1
上に塗布される。
The thus precisely positioned cylindrical base material 1 is transferred to the coating means 40 shown in FIGS. 6 and 7 and coated. Reference numeral 40 denotes a vertical type coating means, such as a slide hopper type, an extrusion type, a ring coater type, a spray coater type, or the like, which applies by stacking the cylindrical substrates 1 and moving relatively upward or downward. Any type can be used, but a slide hopper type coater is preferable because a highly reliable continuous stable coating can be obtained. This coating means is described in detail in JP-A-58-189061. Further, it is preferable to use a bubble-free port or a spacer. Further, in order to finely adjust the position of the application unit 40, it is preferable to install the application unit on a known XY axis movable control table. Further, control means may be provided as in JP-A-3-21371.
In this way, the coating composition UCL-1 is
Applied on top.

【0075】塗布された円筒状基材1は乾燥手段50に
移行される。50は乾燥手段であり、図9、図10の如
くの乾燥フード51(52)と、吸引式乾燥器53とを
重ねて用いても良いし、塗布液Lの溶媒や液膜厚に応じ
て乾燥フード51(52)のみでも良いし、吸引式乾燥
器53のみでも良い。
The applied cylindrical substrate 1 is transferred to the drying means 50. Numeral 50 is a drying means, and a drying hood 51 (52) as shown in FIGS. 9 and 10 and a suction-type dryer 53 may be used in an overlapping manner, or depending on the solvent and the liquid film thickness of the coating liquid L. The drying hood 51 (52) alone or the suction dryer 53 alone may be used.

【0076】円筒状基材1は乾燥処理の後、分離排出手
段60へ移行される。分離排出手段60としては特願平
5−124270号明細書に詳しく述べられているもの
が良い。別のものとしては特開昭61−120662
号、同61−120664号公報等も良い。
After the drying process, the cylindrical substrate 1 is transferred to the separating / discharging means 60. As the separation and discharge means 60, those described in detail in Japanese Patent Application No. 5-124270 are preferred. Another example is disclosed in JP-A-61-120662.
And JP-A-61-120664.

【0077】分離された円筒状基材1は排出ロボットに
より収納室、乾燥室あるいは次の工程に移行される。
The separated cylindrical substrate 1 is transferred to a storage room, a drying room or the next step by a discharge robot.

【0078】以上のようにUCL−1が塗布される。
得られたドラムをNo.1−1(実施例)及び1−2
(比較例)とする。比較例は把持手段と位置決め手段と
の間に外部把持されていないドラムが無い場合である。
The UCL-1 is applied as described above.
The obtained drum was no. 1-1 (Example) and 1-2
(Comparative Example) The comparative example is a case where there is no drum that is not externally gripped between the gripping means and the positioning means.

【0079】この上に下記CGL−1塗布液組成物か
らなるCGLを、UCL−1と同様にし乾燥膜厚0.7
μのCGLを塗布した。
On top of this, a CGL comprising the following CGL-1 coating composition was dried in the same manner as UCL-1 to a dry film thickness of 0.7.
μCGL was applied.

【0080】 CGL−1塗布液組成物 フルオレノン型ジスアゾ顔料(CGM−1) 25g ブチラール樹脂(エスレックBX−L 積水化学社製) 10g メチルエチルケトン 1430ml 上記塗布液組成物(固形分については固形分重量比CG
M−1:BX−L=2:1に固定)をサンドミルを用い
て20時間分散したもの。
CGL-1 Coating Liquid Composition Fluorenone-Type Disazo Pigment (CGM-1) 25 g Butyral Resin (Eslec BX-L, manufactured by Sekisui Chemical Co., Ltd.) 10 g Methyl ethyl ketone 1430 ml The above coating liquid composition (solid content: CG
M-1: BX-L = 2: 1) dispersed using a sand mill for 20 hours.

【0081】[0081]

【化1】 Embedded image

【0082】更にこの上に下記CTL−1塗布液組成
物を上記UCL−1と同様に26μになるように塗布し
た。
Further, the following CTL-1 coating solution composition was applied thereon to a thickness of 26 μm in the same manner as in UCL-1.

【0083】 CTL−1塗布液組成物 CTM−1 500g ポリカーボネート(Z−200 三菱瓦斯化学社製) 560g 1,2−ジクロロエタン 2800ml 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定。
CTL-1 coating solution composition CTM-1 500 g Polycarbonate (Z-200, manufactured by Mitsubishi Gas Chemical Company) 560 g 1,2-dichloroethane 2800 ml For the solid content, the weight ratio of solid content CTM-1: Z-200
= Fixed at 0.89: 1.

【0084】[0084]

【化2】 Embedded image

【0085】得られた感光体ドラムの膜厚変動は中央部
のD0/2(D0=ドラム長)以内の部分に於いても、±
0.55μ以内であった。これに反し比較例のドラムは
位置決め手段の入口でぶつかりキズを生じた。このよう
に垂直型塗布機は振動に対し極めて敏感に作用する。
[0085] Also the thickness variation of the obtained photosensitive drum at the portion within D of the central portion 0/2 (D 0 = drum length), ±
It was within 0.55μ. On the other hand, the drum of the comparative example hit at the entrance of the positioning means and was scratched. In this way, vertical applicators are very sensitive to vibration.

【0086】得られた感光体ドラムをコニカ社製U−B
IX 3035複写機で、10本目と1000本目のド
ラムについて実写したところ、1000コピー後の画像
を評価をしたところ両者の差は無く、濃淡ムラ、カブリ
ムラや画像欠陥(黒ポチ、白ポチ、ゴミ、スジ、キズ)
等がなく良好であった。比較例ドラムNo.1−2で
は、衝突キズによる画像欠陥が多発している。
The obtained photosensitive drum was manufactured by Konica UB.
When an actual image was taken of the 10th and 1000th drums with an IX 3035 copier, the images after 1000 copies were evaluated. When the images were evaluated, there was no difference between the two. There was no unevenness in density, fog unevenness, or image defects (black spots, white spots, dust, Streaks, scratches)
It was good without any other factors. Comparative Example Drum No. In 1-2, image defects due to collision scratches occur frequently.

【0087】このように外部把持されていない円筒状基
材1が最上部の把持手段21(外部チャック)から位置
決め手段30まで2個長設けることにより、主として接
合、把持、塗布、分離の際に生ずる振動、衝撃による塗
布ムラ、膜厚ムラ、キズ、ゴミ、ドラム損傷等の塗膜欠
陥がなく、塗布性の良好な塗布ドラムが得られた。しか
も長時間、多数本の安定な連続塗布や完全自動化ができ
るため、ホコリ、ゴミ等が混入せず高品質の製品が可能
となった。
As described above, by providing two cylindrical base materials 1 that are not externally gripped from the uppermost gripping means 21 (external chuck) to the positioning means 30, mainly for joining, gripping, coating, and separating. There was no coating defects such as coating unevenness, film thickness unevenness, scratches, dust, and drum damage due to the generated vibration and impact, and a coating drum having good coatability was obtained. In addition, stable continuous application of a large number of tubes and complete automation can be performed for a long time, so that high-quality products can be obtained without contamination of dust and dirt.

【0088】この理由としては、たとえ外部把持や位置
決めを注意深く行ったとしても、円筒状基材の寸法のバ
ラツキのため、垂直に搬送できず少し傾きのあるものが
あったり、最上部の把持手段(外部チャック)から位置
決め手段30まで外部把持されてないドラムが無い時
は、位置決め手段と衝突したり、柔らかいアルミニウム
製円筒状基材自体や円筒状基材間の接続部Kで振動が吸
収されず、塗布時振動が残り塗布ムラ、段ムラ等を生じ
る。
The reason for this is that even if the external gripping and positioning are performed carefully, there are some substrates which cannot be transported vertically and have a slight inclination due to the variation in the dimensions of the cylindrical base material, or the uppermost gripping means. If there is no drum which is not externally gripped from the (external chuck) to the positioning means 30, the vibration is absorbed by the positioning means or the soft aluminum cylindrical base material itself or the connection K between the cylindrical base materials. However, vibration during coating remains, causing coating unevenness, step unevenness, and the like.

【0089】以上のように本発明の各手段10,20,
30,40,50,60を設置することにより、塗布ム
ラ、膜厚ムラ、キズ、ゴミ、ドラム損傷等の塗膜欠陥が
なく、塗布性の良好な塗布ドラムが得られた。しかも長
時間、多数本の安定な連続塗布や完全自動化ができるた
め、ホコリ、ゴミ等が混入せず高品質の製品が可能とな
った。
As described above, each means 10, 20,
By installing 30, 40, 50, and 60, a coating drum having good coating properties without coating defects such as coating unevenness, film thickness unevenness, scratches, dust, and drum damage was obtained. In addition, stable continuous application of a large number of tubes and complete automation can be performed for a long time, so that high-quality products can be obtained without contamination of dust and dirt.

【0090】実施例2 図2の逐次連続塗布装置を用い、鏡面加工を施した直径
80mm、高さ355mm、283gのアルミニウムド
ラム支持体上に、下記の如く各々塗布液組成物 UCL−1(3.0W/V%ポリマー濃度)、CG
L−1、CTL−1を調整し、第一のスライドホッパ
ー型塗布装置40A(UCL−1用)、第二の塗布装
置40B(CGL−1用)、第三の塗布装置40C
(CTL−1用)にて実施例1と同様にして3層の逐
次重層塗布を行った。なお、乾燥膜厚としてはUCL−
1は0.3μm、CGL−2は0.5μm、CTL−1
は27μmとした。また、本逐次塗布の場合、把持手段
21と位置決め手段30との間に存在する円筒状基材の
数を3本とした(図8(a)参照)。
Example 2 Using the sequential continuous coating apparatus shown in FIG. 2, a coating liquid composition UCL-1 (3) was coated on a mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g as follows. 0.0W / V% polymer concentration), CG
L-1 and CTL-1 are adjusted, and a first slide hopper type coating device 40A (for UCL-1), a second coating device 40B (for CGL-1), and a third coating device 40C.
In the same manner as in Example 1 (for CTL-1), three successive multilayer coatings were performed. The dry film thickness is UCL-
1 is 0.3 μm, CGL-2 is 0.5 μm, CTL-1
Was 27 μm. In the case of this sequential application, the number of cylindrical base materials existing between the gripping means 21 and the positioning means 30 was set to three (see FIG. 8A).

【0091】 UCL−1塗布液組成物 共重合ナイロン樹脂(CM−8000 東レ社製) 3g メタノール/n−ブタノール=10/1(Vol比) 1000ml CGL−2塗布液組成物 ペリレン顔料(CGM−2) 500g ブチラール樹脂(エスレックBX−L 積水化学社製) 500g メチルエチルケトン 24000ml 上記塗布液組成物(固形分については固形分重量比CG
M−2:BX−L=2:1に固定)をサンドミルを用い
て20時間分散したもの。
UCL-1 coating solution composition Copolymer nylon resin (CM-8000, manufactured by Toray Industries) 3 g methanol / n-butanol = 10/1 (vol ratio) 1000 ml CGL-2 coating solution composition Perylene pigment (CGM-2) 500 g butyral resin (S-LEC BX-L manufactured by Sekisui Chemical Co., Ltd.) 500 g methyl ethyl ketone 24000 ml The above coating solution composition (solid content: CG for solid content)
M-2: BX-L = 2: 1) dispersed using a sand mill for 20 hours.

【0092】[0092]

【化3】 Embedded image

【0093】 CTL−1塗布液組成物 CTM−1 (前記化2と同じ) 500g ポリカーボネート(Z−200 三菱瓦斯化学社製) 560g 1,2−ジクロロエタン 2800ml 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定得られた感光体ドラムの膜厚変動
は中央部のD0/2(D0=ドラム長)以内の部分に於い
ては、±0.64μ以内であった。
CTL-1 coating liquid composition CTM-1 (same as in Chemical formula 2) 500 g Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 560 g 1,2-dichloroethane 2800 ml : Z-200
= 0.89: The thickness variation of the fixed resultant photoreceptor drum 1 at the portion within D of the central portion 0/2 (D 0 = drum length) was within ± 0.64μ.

【0094】得られた感光体をコニカ社製U−BIX
3035複写機で、10本目と1000本目のドラムに
ついて実写したところ、1000コピー後の画像を評価
をしたところ両者の差は無く、濃淡ムラ、カブリムラや
画像欠陥(黒ポチ、白ポチ、ゴミ、スジ、キズ)等がな
く良好であった。
The obtained photoreceptor was manufactured using Konica U-BIX.
When the 10th and 1000th drums were actually photographed with a 3035 copier, the images after 1000 copies were evaluated. When the images were evaluated, there was no difference between the two, and there was no unevenness in density, fog unevenness, or image defects (black spots, white spots, dust, stripes, , Flaws) and the like.

【0095】[0095]

【発明の効果】本発明の第1発明の連続塗布装置及び第
2発明の連続塗布方法によるときは、円筒状基材の供
給、把持搬送、位置決め、塗布、乾燥、分離排出の各手
段を連続配置して、上記手段の各工程を連続処理するこ
とを可能にするもであるから、以下の優れた効果を奏す
る。
According to the continuous coating apparatus of the first invention of the present invention and the continuous coating method of the second invention, the means for supplying, gripping and transporting, positioning, coating, drying and separating / discharging the cylindrical substrate are continuously operated. Since it is possible to arrange and arrange each step of the above means continuously, the following excellent effects can be obtained.

【0096】(1)円筒状基材上に形成された塗膜が均
一であり、塗布ムラや塗膜欠陥がなく塗布性が良好であ
る。
(1) The coating film formed on the cylindrical substrate is uniform, and has good coating properties without coating unevenness and coating defects.

【0097】(2)円筒状基材の把持搬送性能をが高
く、長期安定塗布ができる。
(2) The gripping / transporting performance of the cylindrical substrate is high, and long-term stable coating can be performed.

【0098】(3)円筒状基材の変形や損傷を受けるこ
となく確実に保持できる。
(3) The cylindrical substrate can be securely held without being deformed or damaged.

【0099】(4)連続安定生産が可能となり、生産性
が向上する。
(4) Continuous stable production becomes possible, and productivity is improved.

【0100】(5)連続かつ完全自動化が達成されたか
らゴミやほこり等の異物が混入せず高品質な製品が得ら
れる。
(5) Since continuous and complete automation is achieved, a high quality product can be obtained without foreign substances such as dust and dirt mixing.

【0101】(6)円筒状基材の把持時に振動が発生し
ても、塗布手段に振動が伝わることを防止することによ
り、塗布ムラや膜厚変動等の塗膜欠陥がなく、塗布性ガ
向上する。
(6) Even if vibration occurs during gripping of the cylindrical base material, by preventing the vibration from being transmitted to the coating means, there is no coating defects such as coating unevenness and film thickness variation, and improves.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による連続塗布装置の全体構成を示す斜
視図。
FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention.

【図2】本発明による連続塗布装置の他の実施例を示す
斜視図。
FIG. 2 is a perspective view showing another embodiment of the continuous coating apparatus according to the present invention.

【図3】把持搬送手段の正面図。FIG. 3 is a front view of the gripping and conveying means.

【図4】上記把持搬送手段の把持手段の斜視図。FIG. 4 is a perspective view of a gripping means of the gripping transport means.

【図5】上記把持搬送手段の把持手段の他の実施例を示
す斜視図。
FIG. 5 is a perspective view showing another embodiment of the holding means of the holding and conveying means.

【図6】位置決め手段と塗布手段とを示す断面図。FIG. 6 is a sectional view showing a positioning unit and an application unit.

【図7】上記塗布手段の斜視図。FIG. 7 is a perspective view of the application unit.

【図8】本発明による把持搬送手段と位置決め手段の相
対位置関係を示す断面図。
FIG. 8 is a sectional view showing a relative positional relationship between the gripping / conveying means and the positioning means according to the present invention.

【図9】上記塗布手段と乾燥フードとを示す断面図。FIG. 9 is a sectional view showing the coating means and a drying hood.

【図10】乾燥フードの他の実施例を示す断面図。FIG. 10 is a sectional view showing another embodiment of the drying hood.

【図11】乾燥器の断面図。FIG. 11 is a sectional view of a dryer.

【図12】乾燥手段の他の実施例としての排気乾燥装置
の断面図。
FIG. 12 is a cross-sectional view of an exhaust drying device as another embodiment of the drying means.

【図13】分離排出手段による分離過程を示す状態図。FIG. 13 is a state diagram showing a separation process by the separation and discharge means.

【符号の説明】[Explanation of symbols]

1,1A,1B,1C,1D,1E 円筒状基材(導電
性支持体) 10 供給手段 20 把持搬送手段 21,22 把持手段 30 位置決め手段 40,40A,40B,40C 塗布手段 41 塗布ヘッド(コーター、ホッパー塗布面) 50 乾燥手段 51,52 乾燥フード 53 乾燥器 54 排気乾燥装置 60 分離排出手段(分離器) D0 円筒状基材の長さ(ドラム長) D1,D2 把持手段と位置決め手段間の間隔 K,K1,K2 接続部(繋ぎ部) L 塗布液(感光液)
1, 1A, 1B, 1C, 1D, 1E Cylindrical substrate (conductive support) 10 Supply means 20 Grip transport means 21, 22 Grip means 30 Positioning means 40, 40A, 40B, 40C Coating means 41 Coating head (coater) , hopper coating surface) 50 drying means 51, 52 drying hood 53 dryer 54 exhaust drying apparatus 60 separating discharging means (separator) D 0 length of the cylindrical base material (drum length) D1, between D2 gripping means and the positioning means Distance K, K1, K2 Connection part (connection part) L Coating liquid (photosensitive liquid)

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 円筒状基材の筒軸を合わせて積み重ね、
環状塗布装置の環中を下から上へ垂直に押し上げながら
前記円筒状基材の外周面上に塗布液を連続的に塗布する
塗布手段、前記塗布手段に円筒状基材を供給するための
供給手段、前記円筒状基材を把持段差修正して積み重ね
しながら搬送する把持搬送手段、前記環状塗布装置の環
状の中心に前記円筒状基材の中心を合わせる位置決め手
段、前記塗布された円筒状基材を乾燥又は乾燥調整する
手段及び前記塗布された後の円筒状基材を取り出す為の
分離排出手段を具備する連続塗布装置において、 前記位置決め手段と前記把持搬送手段との間に、該把持
搬送手段に把持されていない前記円筒状基材を少なくと
も1つ存在させることを特徴とする連続塗布装置。
Claims: 1. A cylindrical base material having a cylindrical axis aligned and stacked,
Coating means for continuously applying a coating liquid on the outer peripheral surface of the cylindrical substrate while vertically pushing up the ring in the annular coating device from bottom to top, supply for supplying the cylindrical substrate to the coating means Gripping / transporting means for transporting the cylindrical substrate while correcting and stacking the cylindrical substrate, positioning means for aligning the center of the cylindrical substrate with an annular center of the annular coating device, and the coated cylindrical substrate. In a continuous coating apparatus comprising means for drying or adjusting the drying of the material and a separating and discharging means for taking out the coated cylindrical base material, the gripping and transporting means is provided between the positioning means and the gripping and transporting means. A continuous coating apparatus characterized in that at least one cylindrical base material that is not gripped by means is present.
【請求項2】 前記塗布手段がスライドホッパー型塗布
装置であることを特徴とする請求項1に記載の連続塗布
装置。
2. The continuous coating apparatus according to claim 1, wherein said coating means is a slide hopper type coating apparatus.
【請求項3】 前記位置決め手段が円筒状基材の外周面
に流体を吹き付ける吐出口を有するリング状位置決め装
置であることを特徴とする請求項1または2に記載の連
続塗布装置。
3. The continuous coating apparatus according to claim 1, wherein said positioning means is a ring-shaped positioning apparatus having a discharge port for spraying a fluid to the outer peripheral surface of the cylindrical substrate.
【請求項4】 前記把持搬送手段は円筒状基材間の繋ぎ
部を外部把持する装置であることを特徴とする請求項1
に記載の連続塗布装置。
4. The apparatus according to claim 1, wherein said gripping and conveying means is a device for externally gripping a joint between cylindrical substrates.
4. The continuous coating device according to 1.
【請求項5】 前記塗布手段が複数個あり、前記円筒状
基材に外周面に複数の塗布層を逐次形成させることを特
徴とする請求項1または2に記載の連続塗布装置。
5. The continuous coating apparatus according to claim 1, wherein a plurality of the coating units are provided, and a plurality of coating layers are sequentially formed on an outer peripheral surface of the cylindrical substrate.
【請求項6】 円筒状基材の筒軸を合わせて積み重ね、
環状塗布装置の環中を下から上へ垂直に押し上げながら
前記円筒状基材の外周面上に塗布液を連続的に塗布する
塗布手段、前記塗布手段に円筒状基材を供給するための
供給手段、前記円筒状基材を把持段差修正して積み重ね
しながら搬送する把持搬送手段、前記環状塗布装置の環
状の中心に前記円筒状基材の中心を合わせる位置決め手
段、前記塗布された円筒状基材を乾燥又は乾燥調整する
手段及び前記塗布された後の円筒状基材を取り出す為の
分離排出手段により塗布される連続塗布方法において、 前記位置決め手段と前記把持搬送手段との間に、該把持
搬送手段に把持されていない円筒状基材を少なくとも1
つ存在させることを特徴とする連続塗布方法。
6. A stack in which the cylindrical axes of the cylindrical substrates are aligned.
Coating means for continuously applying a coating liquid onto the outer peripheral surface of the cylindrical substrate while vertically pushing up the ring in the annular coating apparatus from bottom to top; supply for supplying the cylindrical substrate to the coating means Gripping / transporting means for transporting the cylindrical substrate while correcting and stacking the cylindrical substrate, positioning means for aligning the center of the cylindrical substrate with the annular center of the annular coating device, and the coated cylindrical substrate. In a continuous coating method in which the material is dried or adjusted by drying and a separating and discharging means for taking out the coated cylindrical substrate, the gripping is performed between the positioning means and the gripping and conveying means. At least one cylindrical base material that is not gripped by the transfer means
A continuous coating method characterized by being present in a continuous manner.
JP32691896A 1996-12-06 1996-12-06 Continuous coating apparatus and continuous coating method Expired - Fee Related JP3709634B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32691896A JP3709634B2 (en) 1996-12-06 1996-12-06 Continuous coating apparatus and continuous coating method

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Application Number Priority Date Filing Date Title
JP32691896A JP3709634B2 (en) 1996-12-06 1996-12-06 Continuous coating apparatus and continuous coating method

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JPH10165877A true JPH10165877A (en) 1998-06-23
JP3709634B2 JP3709634B2 (en) 2005-10-26

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