JPH10263450A - Method and device for continuous coating - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a continuous coating method and a continuous coating device in which the displacement of a cylindrical base at the time of positioning is easy, the vibration is not generated at the time of displacement correction, a film formed of a coating liquid is uniform, film defects such as coating unevenness and film thickness fluctuation are not generated and a product of high quality can be manufactured. SOLUTION: In this continuous coating method, coating layers are applied on the outer peripheral face of a cylindrical base 1 while an annular center of an annular coating means 40 is pushed vertically from below upward, and the coated cylindrical base 1 is dried by a drying means 50, and positioning, coating and drying are repeated to laminate and coat a plurality of coating layers successively on the cylindrical base 1. The dry film thickness of the coating layers formed on the outer peripheral face of the cylindrical base 1 is 5-40 μm, and the residual solvent rate in the coating layers on the cylindrical base 1 on a cylindrical base introduction section of a positioning means 30 after drying is 3-40%.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous coating method in which a process including positioning, coating, and drying is repeatedly performed on a cylindrical substrate a plurality of times, and a plurality of coating layers are sequentially coated on the cylindrical substrate. The present invention relates to a method and a continuous coating device.

[0002]

2. Description of the Related Art Various methods such as spray coating, dip coating, blade coating, roll coating, etc. are used in connection with thin and uniform coating on the outer surface of a cylindrical substrate having a continuous surface formed endlessly. Methods are being considered. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop a coating apparatus having excellent productivity. However, the conventional coating apparatus and coating method for a cylindrical substrate having a continuous surface formed endlessly have disadvantages such as a failure to obtain a uniform coating film and poor productivity.

In the spray coating method, the solvent evaporates before the coating droplet ejected from the spray gun reaches the outer peripheral surface of the endlessly formed cylindrical substrate having a continuous surface. When the solid concentration increased, and the viscosity of the applied droplets increased accordingly, and the droplets reached the surface, the droplets did not spread sufficiently on the surface, or dried and solidified. Since the particles adhere to the surface, a product having good smoothness on the coated surface cannot be obtained. Also,
The arrival rate of droplets on the cylindrical substrate having the continuous surface is 100
%, And the coating liquid is lost or partially non-uniform, making it very difficult to control the film thickness. Furthermore, since stringing may occur in a polymer solution or the like, the solvent and resin used are limited.

In the blade coating method and the roll coating method, for example, a blade or a roll is arranged in the longitudinal direction of a cylindrical substrate, the cylindrical substrate is rotated to perform coating, and the cylindrical substrate is rotated once. , Blades or rolls are retracted. However, when the blade or the roll is retracted, there is a disadvantage that a portion of the coating film thickness is thicker than other portions due to the viscosity of the coating solution, and a uniform coating film cannot be obtained.

[0005] The dip coating method improves the above-mentioned problems of poor surface smoothness of the coating solution and uniformity of the coating film.

However, the control of the coating film thickness is governed by the properties of the coating liquid, such as viscosity, surface tension, density, temperature, etc., and the coating speed, and the adjustment of the physical properties of the coating liquid is very important. In addition, the coating speed is low, and a certain amount or more of liquid is required to fill the coating liquid tank. Further, when layers are formed, there is a disadvantage that the lower layer components are dissolved and the coating solution tank is easily contaminated.

Therefore, as described in Japanese Patent Application Laid-Open No. 58-189061, a circular amount-regulated coating apparatus (including a slide hopper type coating apparatus) has been developed. This slide hopper type coating apparatus surrounds the periphery of the cylindrical base material while continuously moving the cylindrical base material having a continuous peripheral surface formed endlessly in the longitudinal direction thereof, with respect to the outer peripheral surface of the cylindrical base material. The coating apparatus is for applying a coating liquid. The coating apparatus further includes an annular coating liquid storage chamber, a supply port for supplying a coating liquid from outside to a part of the coating liquid storage chamber, and the coating liquid storage chamber. A coating liquid distributing slit which opens inward, and allows the coating liquid flowing out of this slit to flow down onto the coating liquid slide surface which is inclined obliquely downward, and the hopper coating surface at the lower end of the coating liquid slide surface and the cylindrical shape. A bead is formed in a slight gap with the substrate, and the bead is applied to the outer peripheral surface as the cylindrical substrate moves. By using this slide hopper type coating apparatus, coating can be performed with a small amount of liquid, the coating liquid is not contaminated, and the coating with high productivity and easy control of the film thickness can be performed.

Means for gripping and transporting the outer peripheral surface of the cylindrical substrate are disclosed in Japanese Patent Application Laid-Open Nos. Hei 3-21371 and Hei 4-53.
Japanese Patent Application Laid-Open No. 3-27456 discloses a positioning means.
8 and JP-A-3-280063, the drying means is disclosed in JP-A-6-308747 and JP-A-7-64.
No. 306, respectively.

[0009]

However, the use of the slide hopper type coating apparatus still has various problems and is not yet satisfactory.

[0010] Since a cylindrical substrate (drum) used in the continuous coating apparatus has a certain degree of variation in cylindricity, verticality, and the like, a positioning means for accurately positioning the cylindrical substrate is essential. In order to properly position the cylindrical base material by the positioning means and to introduce the cylindrical base material into the coating means (coater part), the displacement correction between the cylindrical base materials which are arranged in tandem in the axial direction and stacked by their own weight is performed smoothly. -Need to be done.

Further, the end surfaces of the cylindrical base material that come into contact with each other after application are in a state of being bonded to each other by a coating film, and become a stronger adhesive film as they dry. For this reason, it is necessary to send the coating film to the positioning means in the next process while the coating film is soft and correct the position before the film becomes a strong dry film. For this reason,
It is necessary to regulate the residual solvent ratio in the coating film.

Further, the coating film on the surface of the cylindrical substrate applied by the coating means in the previous step is roughened by the wind pressure of the gas discharged from the discharge port of the positioning means in the next step. It is necessary to regulate the solvent ratio.

The present invention has been proposed to solve the above-mentioned problems, and its object is to provide:
(1) When the position of the cylindrical substrate after the coating and drying treatment is corrected by the positioning means in the next step, the cylindrical substrate and the coating film are not damaged, and (2) the positioning accuracy of the cylindrical substrate is high. ,
(3) The cylindrical substrate is easily displaced at the time of positioning, and there is no vibration when correcting the displacement. (4) The coating film using the coating liquid is uniform, and the coating film has uneven coating and fluctuations in film thickness. There is no defect. (5) The productivity is improved by making the production process of positioning, coating and drying the cylindrical substrate continuous and stable. (6) The garbage is produced by continuously and fully automating the above process. It is an object of the present invention to provide an excellent continuous coating method and a continuous coating apparatus which can prevent foreign matters such as dust and dust from being mixed and obtain a high quality product.

[0014]

According to the continuous coating method of the present invention, the cylindrical base material is stacked, conveyed in alignment with the cylindrical axis of the cylindrical base material, and the cylindrical base material is positioned at the center of the annular coating portion of the annular coating means by the positioning means. And apply the coating layer on the outer peripheral surface of the cylindrical base material while vertically pushing up the inside of the ring of the annular coating means from bottom to top, and drying the coated cylindrical base material Drying by means, repeating the positioning, coating and drying, sequentially on the cylindrical substrate, in a continuous coating method of laminating a plurality of coating layers, formed on the outer peripheral surface of the cylindrical substrate The dry thickness of the coating layer is 5
And a residual solvent ratio in the coating layer on the cylindrical base material at the cylindrical base introduction portion of the positioning means after the drying treatment is 3 to 40%. 1 invention).

In the continuous coating apparatus of the present invention, the cylindrical substrates are stacked with their cylindrical axes aligned, and the coating liquid is applied to the outer peripheral surface of the cylindrical substrate while vertically pushing up the ring of the annular coating means from bottom to top. Annular coating means for continuously applying the liquid, a positioning means for aligning the center of the cylindrical substrate with the annular center of the annular coating apparatus, and a plurality of drying means for drying the applied cylindrical substrate. In a continuous coating apparatus for sequentially coating a plurality of coating layers on the cylindrical substrate by repeatedly performing a process including positioning, coating, and drying a plurality of times, the coating is formed on the outer peripheral surface of the cylindrical substrate. The dried film thickness of the applied layer is 5 to 40 μm, and after the drying treatment, the residual solvent ratio in the applied layer on the cylindrical substrate at the cylindrical substrate introduction portion of the positioning means is adjusted to 3 to 40%. Characterized by the provision of means Is shall. (Invention of claim 2).

[0016]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention. In the figure, reference numeral 10 denotes supply means for supplying the cylindrical substrate 1 to a predetermined position vertically below the coating means and pushing it up, and reference numeral 20 denotes a cylinder axis which is held by gripping the outer peripheral surface of the supplied cylindrical substrate 1. Gripping / transporting means for vertically pushing up from the bottom of the stack and transporting the same; 30 means positioning means for positioning the cylindrical substrate 1 at the center of the annular coating section of the coating apparatus; 40 means the outer peripheral surface of the cylindrical substrate A coating means for continuously applying a coating liquid on the top surface;
A drying unit 60 for drying the coating liquid applied thereon is a separation / discharge unit 60 for separating and discharging one by one from a plurality of stacked cylindrical base materials that have been dried and conveyed vertically.

The continuous coating apparatus according to the present invention has a configuration in which the above-described units are continuously arranged on the vertical center line ZZ, so that fully automated production requiring no manual operation can be achieved with high precision. That is, the supply means 10 is a movable table 1 having a plurality of mounting means 11 for mounting the cylindrical substrate 1 thereon.
2. A driving means 13 for rotating the movable table 12 to feed it to a vertical line connected to the gripping / transporting means 20, and the cylindrical substrate 1 already gripped and transported upward by the gripping / transporting means 20 is stacked upward. It comprises a lifting means 14 for pushing up, a hand means 15 for supplying a cylindrical base material provided at an upper end of the lifting means 14, and a control means (not shown) for controlling rotation by the driving means 13 and timing of pushing up by the lifting means 14. Have been. The supply of the cylindrical substrate 1 onto the movable table 12 is performed by a robot handle.

The gripping / transporting means 20 provided above the supply means 10 is capable of pressing and separating from the outer peripheral surface of the cylindrical substrate 1 and moving vertically in the vertical direction.
22 and has a function of positioning, grasping and transporting the cylindrical substrate 1 upward.

FIG. 2 is a perspective view showing the overall configuration of the continuous coating apparatus according to the present invention. In the figure, reference numeral 10 denotes supply means for supplying the cylindrical substrate 1 to a predetermined position vertically below the coating means and pushing it up, and reference numeral 20 denotes a cylinder axis which is held by gripping the outer peripheral surface of the supplied cylindrical substrate 1. This is a gripping / transporting unit that vertically pushes up and transports the stack from below.

The vertical center line ZZ above the gripping / conveying means 20
On the top, a unit A including a positioning unit 30A, a coating unit (annular coating unit) 40A, and a drying unit 50A, a positioning unit 30B, a unit B including a coating unit (annular coating unit) 40B, and a drying unit 50B, a positioning unit 30
C, coating means (annular coating means) 40C, drying means 50C
Are arranged in tandem. Positioning means 30A, 30B and 30C position the cylindrical substrate 1 at the center of the annular coating section of the annular coating device. The coating means 40A, 40B, and 40C continuously apply a predetermined coating liquid (photosensitive liquid) on the outer peripheral surface of the cylindrical substrate 1. The coating liquid discharged from each of the coating units 40A, 40B, and 40C sequentially forms a multilayer coating layer on the cylindrical substrate 1.

The coating means 40A is fixed on the positioning means 30A, and the positioning means 30A is held by holding means (not shown). Similarly, the application unit 40B is fixed on the positioning unit 30B, and the application unit 40C is fixed on the positioning unit 30C.

The positioning means 30A, 30B and 30C are devices for accurately holding the cylindrical substrate 1 at a predetermined position.
For example, it is held in a non-contact manner by an air bearing or the like. The coating means 40A, 40B, and 40C apply the coating liquid uniformly on the outer peripheral surface of the cylindrical substrate 1.
Are gripped and transported by the gripping and transporting means 20, a coating layer is sequentially formed on the cylindrical substrate 1 in a laminated state.

The drying means 50 dries the coating liquid applied on the cylindrical substrate 1. On the uppermost stage, the separation and discharge means 60 for separating and discharging one by one from a plurality of stacked cylindrical base materials which have been dried and vertically conveyed
Is arranged.

The continuous coating apparatus of the present invention has a configuration in which the above-described units are continuously arranged on the vertical center line ZZ, and achieves fully automatic production with high accuracy without requiring any manual operation. That is, the supply unit 10 includes a movable table 12 having a plurality of attachment units 11 for mounting the cylindrical substrate 1, and a driving unit that rotates the movable table 12 and feeds the movable table 12 to a vertical line connected to the gripping / conveying unit 20. 13. Elevating means 1 for pushing up cylindrical base materials 1 already gripped and transported upward by the gripping and transporting means 20 so as to be stacked.
4, a hand means 15 for supplying a cylindrical base material provided at the upper end of the elevating means 14, and a control means (not shown) for controlling the rotation of the driving means 13 and the timing of pushing up by the elevating means 14. . The supply of the cylindrical substrate 1 onto the movable table 12 is performed by a robot handle.

The gripping / transporting means 20 provided above the supply means 10 can be pressed and separated from the outer peripheral surface of the cylindrical substrate 1 and can be moved vertically in two directions.
And has a function of positioning, gripping and transporting the cylindrical substrate 1 upward.

FIG. 3 is a perspective view of the holding means 21 and 22. The upper gripping means 21 includes two movable grips 211,
212, a support shaft 213 that fits into each swing center hole of the movable handles 211 and 212 and holds the swingable swing, and a movable handle 21.
The grippers 21 fixed inside the V-shaped hand portions 214 and 215 formed at the respective end portions of the first and second 212
6 is comprised. The movable handles 211 and 212
Is opened and closed by a driving means such as a piston cylinder (not shown), so that the gripper 216 comes into contact with and separates from the outer peripheral surface of the cylindrical base material. The illustrated grippers 216 have four positions or three.
It is pressed against the cylindrical substrate 1 at the location.

The lower gripping means 22 also has the same structure as the upper gripping means 21, 221 and 222 are movable grips, 223 is a support shaft, 224 and 225 are hand parts, 226
Is a gripper. Note that the upper gripping means 21 shows a state in which each outer peripheral surface of the connection position of the cylindrical substrates 1B and 1C is gripped, and the lower gripping means 22 is a cylindrical substrate 1C and 1D.
3 shows a state where the connection position is separated from each outer peripheral surface.

The gripper 216 of the upper gripping means 21
It is preferable to grip the outer peripheral surface near the connecting portion (connecting portion) K1 between the end surfaces of the illustrated cylindrical substrates 1B and 1C. Further, it is preferable that the gripper 226 of the lower gripping means 22 grip the outer peripheral surface near the connecting portion (connecting portion) K2 between the end surfaces of the cylindrical substrates 1C and 1D. The outer peripheral surface in the vicinity of the connection portion K1 and the outer peripheral surface in the vicinity of the connection portion K2 are non-image forming areas of the cylindrical substrate (photosensitive drum) 1.

The positioning means 30A, 30B, 30C
Since they have substantially the same structure, they will be generically referred to as positioning means 30 hereinafter. Similarly, the coating means 40A, 40B, and 40C are collectively referred to as the coating means 40, and the drying means 50A, 50B, 50C
Are collectively referred to as drying means 50.

FIG. 4 shows the positioning means 30 and the coating means 40.
FIG. 5 is a perspective view of the application unit 40.

As shown in FIG. 4, a plurality of cylindrical substrates 1A, 1 vertically superposed along a center line ZZ.
B, 1C (hereinafter, referred to as the cylindrical substrate 1) are continuously moved upward in the direction of the arrow, and the positioning means 30 and the coating means 4 are moved.
Pass through zero.

Below the slide hopper type coating device 40, a positioning means 30 for positioning the cylindrical substrate in the circumferential direction is fixed. A plurality of air inlets 32 and a plurality of air outlets 33 are formed in the main body 31 of the positioning device 30 for the cylindrical substrate 1. The plurality of air supply ports 32 are connected to an air supply pump (not shown), and a fluid such as air is pumped. A discharge port 34 passes through one end of the air supply port 32 at a side facing the outer peripheral surface of the cylindrical substrate 1. The discharge port 34 faces the outer peripheral surface of the cylindrical substrate 1 with a predetermined gap. The gap is between 20 μm and 3 mm, preferably between 30 μm and 2 mm. If this gap is smaller than 20 μm, the cylindrical substrate 1 is likely to be damaged due to the slight vibration of the cylindrical substrate 1 coming into contact with the inner wall of the main body 31. Further, if the gap is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 is reduced. The discharge port 34 has a diameter of 0.01 to 1.0 m.
m, a small-diameter nozzle, preferably from 0.05 to 0.1 m.
5 mm is good.

The inner peripheral surface of the lower portion of the inner wall of the main body 31 is formed as a tapered surface 35 whose entrance side is widened. The tapered surface 35 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. By providing the tapered surface 35, when the cylindrical substrate 1 enters the inner wall of the main body 31, the tip of the cylindrical substrate 1 is prevented from contacting the inner peripheral surface of the inner wall.

The fluid pressure-fed from the air supply pump is introduced into the main body 31 from the plurality of air supply ports 32, is discharged from the plurality of discharge ports 34, and contacts the outer peripheral surface of the cylindrical substrate 1A (1B). Form a uniform fluid film layer. The discharged fluid is discharged out of the apparatus from the plurality of exhaust ports 33.

The opening diameter of the discharge port 34 is 0.01 to 1 m.
m, preferably 0.05 to 0.5 mm, for example 0.2 to
It is formed in a 0.5 mm circular shape. The opening diameter of the exhaust port 33 is 1.0 to 10 mm, preferably 2.0 to 8.0 m.
m, for example, a circular shape of 3 to 5 mm.

The fluid supplied to the air supply port 32 is preferably air, an inert gas such as nitrogen gas. And the fluid is JI
A clean gas of class 100 or higher in S standard is good.

A slide hopper type coating device 40 is fixed above the positioning means 30. Coating means 40
Is formed by a coating head (coater, hopper coating surface) 41 that surrounds the periphery of the cylindrical substrate 1 and is directly related to the application of the slide hopper type coating means 10 to the outer peripheral surface of the cylindrical substrate 1. Photosensitive liquid) L is applied. In addition,
The cylindrical substrate 1 may be a hollow drum, for example, an aluminum drum, a plastic drum, or a seamless belt type substrate.

On the hopper coating surface 41, a narrow coating liquid distribution slit (abbreviated as a slit) 43 having a coating liquid outlet 42 opening toward the cylindrical substrate 1 is formed in the horizontal direction. The slit 43 communicates with an annular coating liquid distribution chamber (coating liquid storage chamber) 44, and the coating liquid L in the storage tank 2 is supplied to the annular coating liquid distribution chamber 44 through the supply pipe 4 by the pressure pump 3. Supply.

On the other hand, below the coating liquid outlet 42 of the slit 43, the slit 43 is continuously inclined downward so as to terminate at a dimension slightly larger than the outer diameter of the cylindrical substrate 1. A coating liquid slide surface (hereinafter, referred to as a slide surface) 45 is formed. Further, a lip 46 extending downward from the end of the slide surface 45 is formed.

In the application by the application means (slide hopper type application device) 40, the application liquid L is extruded from the slit 43 in the process of lifting the cylindrical substrate 1,
When flowing down along the slide surface 45, the slide surface 45
Is applied to the surface of the cylindrical substrate 1 after forming a bead between the terminal of the slide surface 45 and the outer peripheral surface of the cylindrical substrate 1.

The end of the slide surface 45 and the cylindrical substrate 1 are
Since they are arranged with a certain gap, they can be applied without damaging the cylindrical substrate 1 and without damaging already applied layers even when forming layers having different properties in multiple layers.

On the other hand, at a position furthest from the application liquid supply section of the pressure feed pump 3, a part of the application liquid distribution chamber 44
An air release member 46 for removing bubbles in the coating liquid distribution chamber 44 is provided. When the coating liquid L in the storage tank 2 is supplied to the coating liquid distribution chamber 44 and supplied to the coating liquid outlet 42 from the coating liquid distribution slit 43, the on-off valve 47 is opened and the coating liquid distribution chamber 44 is opened from the air release member 48. Discharge air inside.

As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type, and a ring coater are used.

Above the coating means 40, a drying means 50 comprising a drying hood 51 and a dryer 53 is provided.

FIG. 6 is a sectional view of the coating means 40 and the drying hood 51 provided on the upper part of the coating means 40. The drying hood 51 has an annular wall surface, and the wall surface has a number of openings 51A.
Are drilled. The cylindrical substrate 1 is raised in the direction of the arrow, and the hopper application surface (application head) 41 of the application means 40 is applied.
Is applied to form a photosensitive layer. Cylindrical substrate 1
The photosensitive layer formed thereon is gradually dried while passing through the drying hood 51. This drying is performed by the large number of openings 5
This is performed by discharging the solvent contained in the coating liquid L from 1A to the outside of the wall surface.

As described above, the photosensitive layer formed by coating the coating liquid L on the cylindrical substrate 1 by the coating means 40 is surrounded by the drying hood 51 immediately after the coating, and is formed through the opening 51A. Since only the solvent is released, the drying speed of the photosensitive layer immediately after coating is limited by the opening 5
It is almost proportional to the opening area of 1A.

FIG. 7 is a sectional view of a main part of a sequential continuous coating apparatus having a plurality of coating means.

On the vertical center line ZZ, the positioning means 30
A, lower unit A comprising coating means 40A, drying means 50A, positioning means 30B, middle unit B comprising coating means 40B, drying means 50B, positioning means 3
Three units of the upper unit C, which are composed of OC, coating means 40C and drying means 50C, are arranged in tandem. The lower coating means 40A applies a predetermined lower coating liquid LA on the outer peripheral surface of the cylindrical substrate 1. Middle coating means 40B
Applies the intermediate layer coating liquid LB onto the lower layer coating liquid LA previously coated on the outer peripheral surface of the cylindrical base material 1. The upper coating means 40C is provided with a coating liquid LB of the intermediate layer previously applied.
Is coated with an upper layer coating solution LC. In this way,
On the outer peripheral surface of the cylindrical substrate 1, the coating liquids LA, LB, LC
Are successively and continuously applied.

In each of the above-mentioned successive and continuous coating processes, the positioning of the cylindrical substrate 1 is performed before coating, and a drying process is performed after coating.

After the drying treatment by the drying means 50A, the drying means 50A is adjusted so that the residual solvent ratio in the coating layer on the cylindrical substrate 1 at the cylindrical substrate introduction part of the positioning means 30B is adjusted to 3 to 40%. Is set. Similarly,
After the drying process by the drying unit 50B, the positioning unit 30
The drying means 50B is set so that the residual solvent ratio in the coating layer on the cylindrical substrate 1 in the cylindrical substrate introduction portion C is adjusted to 3 to 40%. The drying unit 50C is adjusted and set so that the dried film thickness of the coating layer formed on the outer peripheral surface of the cylindrical substrate 1 after the drying process by the drying unit 50C is 5 to 40 μm.

The position of the cylindrical substrate 1 is corrected before a strong dried film is formed by drying the coating liquid by the drying means 50, that is, while the coating having a residual solvent ratio of 5% or more is soft. Further, since the coating film is roughened by the wind pressure of the positioning means 30, the residual solvent ratio in the coating film is set to 40% or less. Preferably 5 to 3
0%, more preferably 7 to 25%.

The residual solvent ratio can be measured from a calibration curve by gas chromatography. In addition,% of this invention means weight%.

FIG. 8 is a sectional view showing another embodiment of the drying hood. The drying hood 52 is formed by extending the upper part of the drying hood 51 (A part) in FIG. 6 to form a B part. In this part A, a plurality of openings 52A are provided.
A plurality of openings 52B are formed in the portion.
By providing the drying hood 52 above the coating means 40, the coating liquid L applied on the outer peripheral surface of the cylindrical substrate 1 is formed.
Is controlled. Therefore, by controlling the coating film drying speed, it is possible to make the coating film uniform.
In addition, by providing the drying hood 52 as described above, the solvent vapor concentration in the bead portion is increased, so that rapid drying is prevented, and bead breakage can be prevented.

FIG. 9 is a sectional view of the dryer 53 of the present invention. The drying device 53 includes a suction slit member 5 having a suction slit 531, a suction chamber 532, and a suction nozzle 533.
A cylindrical member 535 is concentrically connected to the lower part of the tube 34, and a cylindrical member 536 is concentrically connected to the upper part of the tube 34. Then, suction is performed from a plurality of suction nozzles 533 provided, and a suction chamber 532 having a uniform circumferential direction and a suction slit 531 having a uniform circumferential direction are provided.
The suction air, which has been made uniform in the circumferential direction, flows, and the suction slit member 534 and the cylindrical members 53 above and below the suction slit member 534.
6, 535, the turbulence of the air flow between the inner diameter surface of each of the cylindrical substrates 1 and the outer peripheral surface of the coated cylindrical substrate 1 is very slightly suppressed in the buffer space 537, and the uniform suction air for drying shown in 538 is used. Creating an air flow.

The coated film is dried by transporting the coated cylindrical substrate 1 to the drying zone in the direction indicated by the arrow.

Next, an exhaust drying device 54 shown in FIG. 10 will be described as another embodiment of the drying means 50. As described above, the coating liquid (photosensitive liquid) L is applied to the cylindrical substrates 1A and 1B by the annular slide hopper type coating apparatus (coating means) 40 to form a photosensitive layer. The exhaust drying device 54 sucks a solvent evaporating from the photosensitive layer immediately after coating, and further performs drying, and is provided immediately above the coating unit 40. Reference numeral 541 denotes a suction duct formed in an annular shape, and a suction port 542 is formed from the suction duct 541 toward the photosensitive layer. An exhaust pipe 543 is connected to a part of the suction duct 541, and a solvent evaporating from the photosensitive layer is sucked by an exhaust fan 544 provided in the exhaust pipe 543, and is forcibly discharged to the outside and dried.

Immediately after the coating liquid L is applied by the coating means 40 as described above, the coating liquid L applied to the cylindrical substrates 1A and 1B to exhaust the solvent vapor generated from the coating liquid L.
Can be stopped from flowing down in large quantities. At this time, the exhaust air speed by the exhaust fan 544 is set to 0.5 to 5
The suction port 542 is desirably 300 mm or less from the position of the coating head 41. Then, the cylindrical substrates 1A and 1B are maintained in a connected state until the solvent in the coating liquid L evaporates by 30% or more, and after separation, the photosensitive layer is completely dried. By operating the exhaust drying device 54 as described above, even when a large number of cylindrical substrates are connected and the coating liquid L is applied, the solvent can be rapidly discharged from the vicinity of the photosensitive layer, and the coating liquid L Can be forcibly controlled to prevent the thin film and liquid pool from being generated in the photosensitive layer. Note that the exhaust fan 544 is
The suction duct 541 may be provided at a plurality of locations.

The process of separating the cylindrical substrates 1A, 1B, 1C on which the coating and the coating film drying have been performed as described above will be described with reference to the state diagrams of the respective processes by the separation and discharge means in FIG.

The separating / discharging means 60 comprises a vertically moving robot stage 61, an air cylinder 62, an upper chuck 63 and a lower chuck 64.

The coated cylindrical substrates 1 are stacked upward from below, move upward, and reach the separation position as shown in FIG. At this time, the vertical robot is activated and moves the entire separation unit coaxially and at the same speed as the cylindrical base 1A to be separated.

First, at the position shown in FIG. 11 (b), the lower chuck 64 moves the cylindrical substrate 1 adjacent to the cylindrical substrate 1A to be separated.
Hold B. Next, the upper chuck 63 holds the cylindrical substrate 1A to be separated at the position shown in FIG.

The upper chuck 6 is moved by the air cylinder 62.
Reference numeral 3 moves upward while holding the cylindrical substrate 1A to be separated, and reaches the position shown in FIG. At this time, the coating film straddling the cylindrical substrate 1B adjacent to the cylindrical substrate 1A to be separated is cut off to separate 1A and 1B as shown in FIG. 11D.

In order to collect the separated cylindrical substrate 1A, the lower chuck 64 is in the uncucked state as shown in FIG. 11 (e), the vertical moving robot stage 61 rises rapidly, and the position of the adjacent cylindrical substrate 1B is changed. The separated cylindrical substrate 1A is placed on the separation drum collecting device disposed far above (the upper chuck 63 becomes an unchuck), and the process is completed.

Then, for the next separating operation of the cylindrical substrate 1B, the vertically moving robot stage 61 is lowered, and the air cylinder 62 is lowered, so that the initial position of FIG.
Return to (a).

In addition, when the cylindrical substrate 1A to be separated is separated from the adjacent cylindrical substrate 1B, the cylindrical substrate 1A
It is also effective to pull up the cylindrical base 1A while applying rotation to the substrate. This applies a shearing force instead of a tensile force to a film to be separated, and can reduce a phenomenon in which a coating film profile near the separation portion becomes thinner in a wet state of the film. Further, scattering of small pieces of the film generated at the time of cutting the coating film is reduced by being drawn into the inner surface of the cylindrical substrate 1.

[0067]

Next, the present invention will be described with reference to specific examples, but the present invention is not limited to these examples.

Example 1 Using the continuous coating apparatus shown in FIG. 1, a UCL-1 coating solution composition described below was coated on a mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g. It was applied to 0.3 μm and dried.

The coating drum was transferred to the sequential coating apparatus shown in FIG. 1, and the coating compositions, CGL-1, CTL-1, and CTL-2 were adjusted on the UCL-1 as described below, and the slide hopper was used. Mold coating device 40A (CGL-1
40B (for CTL-1), 40C (for CTL-1)
2) for three successive multi-layer coatings. The dry film thickness was 0.5 μm for CGL-1 and 2 μm for CTL-1.
3 μm, and CTL-2 was 7 μm.

UCL-1 coating solution composition Copolymer nylon resin (CM-8000, manufactured by Toray Industries) 3 g methanol / n-butanol = 10/1 (vol ratio) 1000 g CGL-1 coating solution composition Perylene pigment (CGM-1) 500 g butyral resin (S-LEC BX-L, manufactured by Sekisui Chemical Co., Ltd.) 500 g methyl ethyl ketone 24 l The above coating solution composition (solid content: CG for solid content)
M-1: BX-L = 2: 1) dispersed using a sand mill for 20 hours.

CTL-1 coating liquid composition CTM-1 500 g Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 560 g 1,2-dichloroethane 2800 ml CTL-2 coating liquid composition CTM-1 400 g polycarbonate (Z-800 Mitsubishi Gas) 560 g 1,2-dichloroethane 2800 ml

[0072]

Embedded image

[0073]

Embedded image

After setting the residual solvent ratio in the coating layer on the cylindrical substrate (photosensitive drum) 1 to 3 to 40%, 50 lots of each coating lot are continuously coated in the coating lots having the same residual solvent ratio. went. Adjustment of the residual solvent ratio was performed based on the air volume and temperature of the drying means 50B of the unit B in FIG. The residual solvent ratio was determined from the result of separately measuring the drying speed of the coating film by a gravimetric method. The obtained photosensitive drum was used in a Konica U-Bix 3
A 035 copying machine was used to evaluate actual photography.

Table 1 shows the residual solvent ratio and the operation status of positioning.
The state of the coating film and the image results are shown. The residual solvent ratio of the present invention is 3
-40% of photosensitive drums (Lot Nos. 2 to 6)
The positioning operation state was good, and there was no unevenness in density, fog, image defects (black spots, white spots, dust, streaks, scratches, etc.) and the like.

[0076]

[Table 1]

Example 2 Using the sequential continuous coating apparatus shown in FIG. 2, a coating liquid composition was prepared as follows on a mirror-finished aluminum drum support having a diameter of 80 mm and a height of 355 mm as a conductive support.
After adjusting UCL-2 and PCL-1, slide hopper type coating devices 40A (for UCL-2) and 40B (P
(For CL-1), two successive layers were applied (40C
Is not used). The dry film thickness was 6 for UCL-2.
μm and PCL-1 were 25 μm.

UCL-2 Coating Composition Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 20 g 1,2-dichloroethane 10000 ml On this UCL-2, the following coating composition PCL-1 was dispersed and adjusted to 25 μm. So that the photosensitive drum No. 11-16 were obtained.

PCL-1 coating liquid composition Perylene pigment (CGM-1) 0.2 g Brominated anthuanthrone 25 g Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 100 g CTM-1 75 g 1,2-dichloroethane 500 ml Silicone oil (SH-510, manufactured by Toray Silicone Co., Ltd.) 500 ppm based on the total solid content After the residual solvent ratio in the coating layer on the cylindrical substrate (photosensitive drum) 1 is set to 3 to 40%, the residual solvent ratio is the same for each. In the application lot, 50 lots were continuously applied in one lot. Adjustment of the residual solvent ratio was performed based on the air volume and temperature of the drying means 50A of the unit A in FIG. The residual solvent ratio was determined from the result of separately measuring the drying speed of the coating film by a gravimetric method. The obtained photoreceptor was mounted on a positive charging remodeling machine of U-BIX 2028 manufactured by Konica Corporation, and evaluated by actual printing.

Table 2 shows the residual solvent ratio and the operation status of positioning.
The state of the coating film and the image results are shown. The residual solvent ratio of the present invention is 3
In the case of ４０40% of the photoconductors (lot Nos. 12 to 15), the positioning operation status was good, and there was no unevenness in shading, fogging or image defects (black spots, white spots, dust, streaks, scratches, etc.). Was.

[0081]

[Table 2]

[0082]

According to the continuous coating method of the first invention and the continuous coating apparatus of the second invention, the following excellent effects can be obtained.

(1) When the position of the cylindrical substrate after the coating and drying treatment is corrected by the positioning means in the next step, the cylindrical substrate and the coating film are not damaged.

(2) High positioning accuracy.

(3) The displacement of the cylindrical base material at the time of positioning is easy, and no vibration is generated when the displacement is corrected.

(4) The coating film formed by the coating solution is uniform, and there are no coating defects such as coating unevenness and film thickness variation.

(5) The productivity is improved by setting the production process for positioning, coating and drying the cylindrical base material to be continuous and stable production.

(6) By continuously and completely automating the above steps, foreign matters such as dust and dust are prevented from being mixed, and a high quality product can be obtained.

[Brief description of the drawings]

FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention.

FIG. 2 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention.

FIG. 3 is a perspective view of a holding unit of the holding and conveying unit.

FIG. 4 is a sectional view showing a positioning unit and a coating unit.

FIG. 5 is a perspective view of the application unit.

FIG. 6 is a sectional view showing the application unit and a drying hood.

FIG. 7 is a cross-sectional view of a main part of a sequential continuous coating apparatus having a plurality of coating units.

FIG. 8 is a sectional view showing another embodiment of the drying hood.

FIG. 9 is a sectional view of a dryer.

FIG. 10 is a sectional view of an exhaust drying device as another embodiment of the drying means.

FIG. 11 is a state diagram showing a separation process by the separation and discharge means.

[Explanation of symbols]

1, 1A, 1B, 1C, 1D, 1E Cylindrical base material (conductive support) 10 Supply means 20 Grip transport means 21, 22 Grip means 30, 30A, 30B, 30C Positioning means 40, 40A, 40B, 40C Coating Means (slide hopper type coating device) 41 Coating head (coater, hopper coating surface) 50, 50A, 50B, 50C Drying device 51, 52 Drying hood 53 Dryer 54 Exhaust drying device 60 Separating and discharging device (separator) L, LA , LB, LC Coating solution (photosensitive solution)

Claims (5)

[Claims] 1. The method according to claim 1, further comprising: stacking and transporting the cylindrical substrate with the cylindrical axis thereof aligned, and positioning the cylindrical substrate by aligning the center of the cylindrical substrate with the center of the annular coating portion of the annular coating means by the positioning means;
Applying a coating layer on the outer peripheral surface of the cylindrical base material while vertically pushing up the ring of the annular coating means from below to above, drying the coated cylindrical base material by drying means, the positioning, In a continuous coating method in which coating and drying are repeated and a plurality of coating layers are sequentially laminated on the cylindrical substrate, the dried film thickness of the coating layer formed on the outer peripheral surface of the cylindrical substrate is 5 A continuous coating method, wherein the residual solvent ratio in the coating layer on the cylindrical substrate at the cylindrical substrate introduction portion of the positioning means after the drying treatment is 3 to 40%. 2. A stack in which the cylindrical axes of the cylindrical substrates are aligned.
An annular coating means for continuously applying a coating liquid on the outer peripheral surface of the cylindrical substrate while vertically pushing up the ring of the annular coating means from bottom to top; Positioning means for aligning the center of the material, each comprising a plurality of drying means for drying the coated cylindrical substrate, positioning, coating, repeatedly performing a process comprising drying a plurality of times on the cylindrical substrate In a continuous coating apparatus for sequentially stacking and coating a plurality of coating layers, the coating film formed on the outer peripheral surface of the cylindrical substrate has a dry film thickness of 5 to 40 μm, and the cylindrical shape of the positioning means after the drying process. The residual solvent ratio in the coating layer on the cylindrical substrate at the substrate introduction portion is 3 to
A continuous coating apparatus comprising a drying means for adjusting the coating rate to 40%. 3. The continuous coating apparatus according to claim 2, wherein said annular coating means is a slide hopper type coating apparatus. 4. The continuous coating apparatus according to claim 2, wherein said positioning means is a ring-shaped positioning apparatus having a discharge port for spraying a fluid to the outer peripheral surface of the cylindrical base material. 5. The annular coating means includes a plurality of coating liquid distribution slits, a coating liquid outlet, and a hopper-coating surface.
A different coating liquid is supplied to each coating liquid distribution slit, and supplied to each hopper-coating surface from each coating liquid outlet to form a plurality of coating layers sequentially on a cylindrical substrate. The continuous coating device according to claim 2.