JPH1133473A - Continuous coating method and continuos coating applicator - Google Patents

Continuous coating method and continuos coating applicator

Info

Publication number
JPH1133473A
JPH1133473A JP18967597A JP18967597A JPH1133473A JP H1133473 A JPH1133473 A JP H1133473A JP 18967597 A JP18967597 A JP 18967597A JP 18967597 A JP18967597 A JP 18967597A JP H1133473 A JPH1133473 A JP H1133473A
Authority
JP
Japan
Prior art keywords
coating
cylindrical
cylindrical base
cleaning
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18967597A
Other languages
Japanese (ja)
Inventor
Akira Ohira
晃 大平
Junji Ujihara
淳二 氏原
Masanari Asano
真生 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP18967597A priority Critical patent/JPH1133473A/en
Publication of JPH1133473A publication Critical patent/JPH1133473A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a continuous coating method and continuos coating applicator with which surface oxidation after washing is suppressed, the pickup of dust is averted, continuos coating is well executed without coating defects and bead break and the long-term stable continuos coating and fully automatic continuos coating are made possible by incorporation of annular washing means. SOLUTION: This coating method comprises supplying cylindrical base materials 1A, 1B, stacking and superposing these supplied cylindrical base materials 1A, 1B in alignment of their cylindrical axes, clamping and transporting these base materials, perpendicularly pushing the clamped and transported cylindrical base materials 1A, 1B from below to above, washing their outer peripheral surfaces while, aligning and positioning the annular centers of coating means 40 to the centers of the cylindrical base materials 1A, 1B after washing, continuously applying a coating liquid onto the outer peripheral surfaces of the cylindrical base materials 1A, 1B after the positioning, drying or drying and conditioning 50 the coated cylindrical base materials 1A, 1B, then separating and discharging the dried or dried and conditioned cylindrical base materials 1A, 1B.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は連続塗布方法及び連
続塗布装置に係わり、さらに詳しくは、円筒状基材を積
み重ね、下から上へ垂直に押し上げながら円筒状基材の
外周面上に塗布液を均一に連続的に塗布する連続塗布方
法及び連続塗布装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous coating method and a continuous coating apparatus, and more particularly, to a method of stacking cylindrical substrates and vertically pushing up from the bottom to the upper surface of the cylindrical substrate to form a coating solution. The present invention relates to a continuous coating method and a continuous coating apparatus for uniformly and continuously coating the same.

【0002】[0002]

【従来の技術】円筒状基材の外周面上への薄膜で均一な
塗布に関連してスプレー塗布法、浸漬塗布法、ブレード
塗布法、ロール塗布法等の種々の方法が検討されてい
る。特に電子写真感光体ドラムのような薄膜で均一な塗
布については生産性の優れた塗布手段を開発すべく検討
されている。しかしながら、従来の円筒状基材への塗布
手段及び塗布方法においては、均一な塗膜が得られなか
ったり、生産性が悪い等の短所があった。
2. Description of the Related Art Various methods such as a spray coating method, a dip coating method, a blade coating method, and a roll coating method have been studied in relation to a thin and uniform coating on the outer peripheral surface of a cylindrical substrate. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop coating means having excellent productivity. However, the conventional means and method of applying to a cylindrical substrate have disadvantages such as the inability to obtain a uniform coating film and poor productivity.

【0003】スプレー塗布法では、スプレーガンより噴
出した塗布液滴が該円筒状基材の外周面上に到達するま
でに溶媒が蒸発するために塗布液滴の固形分濃度が上昇
してしまい、それにともない塗布液滴の粘度上昇が起っ
て液滴が面に到達したとき、液滴が面上を充分に広がら
ないために、或いは乾燥固化してしまった粒子が表面に
付着するために、塗布表面の平滑性の良いものがえられ
ない。また、該連続面を有する円筒状基材への液滴の到
達率が100%でなく塗布液のロスがあったり、部分的
にも不均一であるため、膜厚コントロールが非常に困難
である。更に、高分子溶液等では糸引きを起こす事があ
るため、使用する溶媒及び樹脂に制限がある。
In the spray coating method, the solvent evaporates before the coating droplet ejected from the spray gun reaches the outer peripheral surface of the cylindrical substrate, so that the solid concentration of the coating droplet increases, When the viscosity of the applied droplets increases and the droplets reach the surface, the droplets do not spread sufficiently on the surface, or the dried and solidified particles adhere to the surface. Good surface smoothness cannot be obtained. In addition, it is very difficult to control the film thickness because the arrival rate of the liquid droplets to the cylindrical substrate having the continuous surface is not 100% and there is a loss of the coating liquid or the coating liquid is partially non-uniform. . Furthermore, since stringing may occur in a polymer solution or the like, the solvent and resin used are limited.

【0004】ブレード塗布法、ロール塗布法は例えば円
筒状基材の長さ方向にブレード若しくはロールを配置
し、該円筒状基材を回転させて塗布を行い円筒状基材を
1回転させた後、ブレード若しくはロールを後退させる
ものである。ブレード若しくはロールを後退させる際、
塗布液の粘性により、塗布膜厚の一部に他の部分より厚
い部分が生じ、均一な塗膜が得られない欠点がある。
[0004] In the blade coating method and the roll coating method, for example, a blade or a roll is arranged in the longitudinal direction of a cylindrical substrate, and the cylindrical substrate is rotated to perform coating, and then the cylindrical substrate is rotated once. , Blades or rolls are retracted. When retracting the blade or roll,
Due to the viscosity of the coating solution, a portion of the coating film thickness has a portion thicker than the other portions, and there is a disadvantage that a uniform coating film cannot be obtained.

【0005】浸漬塗布法は、上記におけるような塗布液
表面の平滑性、塗布膜の均一性の悪い点は改良される。
しかし、塗布膜厚の制御が塗布液物性、例えば粘度、表
面張力、密度、温度等と塗布速度に支配され、塗布液物
性の調整が非常に重要となる。また塗布速度も低いし、
塗布液槽を満たすためにはある一定量以上の液量が必要
である。更に重層する場合、下層成分が溶け出し塗布液
槽が汚染されやすい等の欠点がある。
[0005] The dip coating method improves the above-mentioned problems of poor surface smoothness of the coating solution and uniformity of the coating film.
However, the control of the coating film thickness is governed by the physical properties of the coating liquid, for example, viscosity, surface tension, density, temperature, etc. and the coating speed, and the adjustment of the physical properties of the coating liquid is very important. Also the coating speed is low,
In order to fill the coating liquid tank, a certain amount or more of liquid is required. Further, when layers are formed, there is a drawback that the lower layer components are dissolved and the coating solution tank is easily contaminated.

【0006】そこで特開昭58−189061号公報に
記載の如く円形量規制型塗布手段(この中にはスライド
ホッパー型塗布手段が含まれる)が開発された。このス
ライドホッパー型塗布手段は円筒状基材を連続的にその
長手方向に移動させながら、その周囲を環状に取り囲
み、円筒状基材の外周面に対して塗布液を塗布するもの
であって、更にこの塗布手段は環状の塗布液溜まり室
と、この塗布液溜まり室内の1部に対して外部から塗布
液を供給する供給口と、前記塗布液溜まり室の内方に開
口する塗布液分配スリットとを有し、このスリットから
流出した塗布液を斜め下方に傾斜する塗布液スライド面
上に流下させ、塗布液スライド面の下端のホッパー塗布
面と円筒状基材との僅かな間隙部分にビードを形成し、
円筒状基材の移動に伴ってその外周面に塗布するもので
ある。このスライドホッパー型塗布手段を用いることに
より、少ない液量で塗布でき、塗布液が汚染されず、膜
厚制御の容易な塗布が可能となった。
Accordingly, as disclosed in Japanese Patent Application Laid-Open No. 58-189061, a circular amount-regulating type coating means (including a slide hopper type coating means) has been developed. This slide hopper type application means is to apply a coating liquid to the outer peripheral surface of the cylindrical base material while continuously moving the cylindrical base material in the longitudinal direction, surrounding the circumference in an annular manner, Further, the coating means includes an annular coating liquid storage chamber, a supply port for supplying a coating liquid from outside to a part of the coating liquid storage chamber, and a coating liquid distribution slit opened inside the coating liquid storage chamber. The coating liquid flowing out of the slit is caused to flow down onto the coating liquid slide surface inclined obliquely downward, and a bead is formed in a slight gap between the hopper coating surface at the lower end of the coating liquid slide surface and the cylindrical substrate. To form
This is applied to the outer peripheral surface of the cylindrical substrate as it moves. By using this slide hopper type coating means, coating can be performed with a small amount of liquid, the coating liquid is not contaminated, and coating with easy control of the film thickness can be performed.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、前記ス
ライドホッパー型塗布手段を用いても、なお、円筒状基
材の洗浄後の表面酸化が抑えられず、ゴミの付着やまた
塗布欠陥やビード切れが発生して連続塗布されることが
あり、長時間安定して連続塗布や完全自動連続塗布がで
きにくいという課題がある。
However, even if the above-mentioned slide hopper type coating means is used, the surface oxidation of the cylindrical base material after cleaning cannot be suppressed, and adhesion of dust, coating defects and bead breakage can be prevented. There is a problem that it may occur and be continuously applied, and it is difficult to perform continuous application or fully automatic continuous application stably for a long time.

【0008】本発明は上記の課題に鑑みなされたもの
で、本発明の目的は、環状洗浄手段の組み込みにより、
円筒状基材の洗浄後に表面酸化が抑えられて円筒状基材
に塗布でき、ゴミの付着が無く、又塗布欠陥やビード切
れが無く良好に連続塗布され、,長時間安定して連続塗
布や完全自動連続塗布ができる連続塗布方法及び連続塗
布装置を提供することにある。
[0008] The present invention has been made in view of the above problems, and an object of the present invention is to provide an annular cleaning means,
After washing the cylindrical substrate, the surface oxidation is suppressed and it can be applied to the cylindrical substrate, there is no adhesion of dust, there is no coating defect and there is no bead break. An object of the present invention is to provide a continuous coating method and a continuous coating apparatus capable of performing fully automatic continuous coating.

【0009】[0009]

【課題を解決するための手段】上記の目的は下記のよう
な手段により達成される。即ち、(1)円筒状基材を供
給し、供給された前記円筒状基材の円筒軸を合わせ積み
重ねて把持搬送し、把持搬送された前記円筒状基材を下
から上へ垂直に押し上げながら外周面を洗浄し、洗浄後
の前記円筒状基材の中心に塗布手段の環状の中心を合わ
せて位置決めし、位置決め後の前記円筒状基材の外周面
上に塗布液を連続的に塗布し、塗布された前記円筒状基
材を乾燥又は乾燥調整し、乾燥又は乾燥調整した前記円
筒状基材を分離し排出することを特徴とする連続塗布方
法。
The above object is achieved by the following means. That is, (1) a cylindrical base material is supplied, the supplied cylindrical base material is aligned with a cylindrical axis, stacked, and conveyed, and the gripped and conveyed cylindrical base material is vertically pushed upward from below. Cleaning the outer peripheral surface, positioning the annular center of the application means in alignment with the center of the cleaned cylindrical substrate, and continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate after the positioning. A continuous coating method, wherein the applied cylindrical substrate is dried or dried and adjusted, and the dried or dried adjusted cylindrical substrate is separated and discharged.

【0010】または、(2)円筒状基材を供給する供給
手段と、前記供給手段により供給された前記円筒状基材
を円筒軸を合わせて積み重ね把持搬送する把持搬送手段
と、把持搬送された前記円筒状基材を下から上へ垂直に
押し上げながら、外周面を洗浄する環状洗浄手段と、塗
布手段の環状の中心に洗浄後の前記円筒状基材の中心を
合わせる位置決め手段と、前記円筒状基材の外周面上に
塗布液を連続的に塗布する塗布手段と、塗布された前記
円筒状基材を乾燥又は乾燥調整する乾燥/乾燥調整手段
と、塗布された前記円筒状基材を分離し排出するための
分離排出手段と、を備えたことを特徴とする連続塗布装
置。
Or (2) supply means for supplying the cylindrical base material, gripping / conveying means for stacking and conveying the cylindrical base materials supplied by the supply means with their cylindrical axes aligned, An annular washing means for washing the outer peripheral surface while vertically pushing the cylindrical base material upward from below, a positioning means for aligning the center of the cylindrical base material after washing with the annular center of the coating means, and Coating means for continuously applying a coating liquid on the outer peripheral surface of the base material, drying / drying adjustment means for drying or adjusting the applied cylindrical base material, and the applied cylindrical base material A continuous coating apparatus, comprising: a separating and discharging unit for separating and discharging.

【0011】ここでいう連続塗布装置とは、スライドホ
ッパー型コーター、押し出し型コーター、リングコータ
ー、スプレーコーター等の円筒状基材を積み重ねて上方
又は下方に相対的に移動することにより連続塗布するも
ので、好ましくはスライドホッパー型コーターである。
[0011] The continuous coating apparatus as referred to herein is one in which cylindrical base materials such as a slide hopper type coater, an extrusion type coater, a ring coater, a spray coater and the like are stacked and relatively moved upward or downward to continuously apply. And preferably a slide hopper type coater.

【0012】[0012]

【発明の実施の形態】以下に本発明の連続塗布方法、連
続塗布装置の実施形態について説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a continuous coating method and a continuous coating apparatus according to the present invention will be described below.

【0013】(実施の形態1)図1は第1実施形態の連
続塗布装置の全体構成を示す斜視図で、図2は供給手段
を示す斜視図で、図3は把持搬送手段における把持の斜
視図で、図4は環状洗浄手段を示す断面図で、図5は他
の環状洗浄手段を示す断面図で、図6は乾燥手段を示す
断面図で、図7は位置決め手段と塗布手段とを示す断面
図で、図8は塗布手段を示す斜視図で、図9は塗布手段
と塗布手段の上部に設けた乾燥フードを示す断面図で、
図10は乾燥/乾燥調整手段を示す断面図で、図11は
分離排出手段による分離排出過程を説明する状態図であ
る。
(Embodiment 1) FIG. 1 is a perspective view showing an entire configuration of a continuous coating apparatus according to a first embodiment, FIG. 2 is a perspective view showing a supply means, and FIG. FIG. 4 is a sectional view showing the annular cleaning means, FIG. 5 is a sectional view showing another annular cleaning means, FIG. 6 is a sectional view showing the drying means, and FIG. FIG. 8 is a perspective view showing the application means, and FIG. 9 is a cross-sectional view showing the application means and a drying hood provided above the application means.
FIG. 10 is a cross-sectional view showing the drying / drying adjustment means, and FIG. 11 is a state diagram illustrating a separation and discharge process by the separation and discharge means.

【0014】図1で、連続塗布装置は円筒状基材1を供
給する供給手段10と、供給手段10により供給された
円筒状基材1を円筒軸を合わせて積み重ね把持搬送する
把持搬送手段20と、把持搬送された円筒状基材1を下
から上へ垂直に押し上げながら、円筒状基材1の外周面
を洗浄する環状洗浄手段70と、塗布手段の環状の中心
に前記円筒状基材の中心を合わせる位置決め手段30
と、円筒状基材の外周面上に塗布液を連続的に塗布する
塗布手段40と、前記塗布された円筒状基材を乾燥又は
乾燥調整する乾燥/乾燥調整手段50と、塗布された前
記円筒状基材を分離し排出するための分離排出手段60
とを備えている。また、洗浄後に乾燥する乾燥手段80
がある。また、把持搬送手段20、位置決め手段30、
塗布手段40、乾燥/乾燥調整手段50、分離排出手段
60の各手段は作動開始位置がそれぞれ独立に調整でき
る手段を有している。前記独立に調整できる手段はそれ
ぞれ作動の開始位置が独立して公知技術の調整機構等に
より容易で確実に行えるようになっている。
In FIG. 1, a continuous coating apparatus comprises a supply means 10 for supplying a cylindrical substrate 1 and a gripping / conveying means 20 for gripping / conveying the cylindrical substrate 1 supplied by the supplying means 10 with its cylindrical axis aligned. An annular cleaning means 70 for cleaning the outer peripheral surface of the cylindrical substrate 1 while vertically pushing up the gripped and conveyed cylindrical substrate 1 from below, and the cylindrical substrate 1 Positioning means 30 for adjusting the center of
A coating means 40 for continuously applying a coating liquid on the outer peripheral surface of the cylindrical base material; a drying / drying adjustment means 50 for drying or adjusting the applied cylindrical base material; Separation / discharge means 60 for separating and discharging a cylindrical substrate
And A drying means 80 for drying after washing.
There is. Further, the gripping and conveying means 20, the positioning means 30,
Each of the application unit 40, the drying / drying adjustment unit 50, and the separation / discharge unit 60 has a unit that can independently adjust the operation start position. The means that can be independently adjusted have their operation start positions independently and easily and reliably performed by an adjustment mechanism or the like of a known technique.

【0015】図2で、供給手段を説明すると、供給手段
10は円筒状基材を供給する。塗布処理工程前の複数個
の円筒状基材1は予め供給台161に収容されている。
自動運搬装置162の移動可能な運搬部材163は、供
給台161上の円筒状基材1から1個の円筒状基材1を
把持して移動し、回転テーブル12上の載置案内部材1
1内に載置する。載置案内部材11は円筒状基材1が遊
嵌して収容可能な円形溝を有し、回転テーブル12の回
転円周方向に複数個(図示の6箇所)設けられている。
回転テーブル12はモータM1、ギア列131,132
により間欠回転駆動される。1個の円筒状基材1が垂直
中心線Zの下方に運搬されて停止すると、モータM2の
始動によりピニオンギア141及びラックギア142を
介して昇降部材14を上昇させる。昇降部材14の上部
には緩衝部材であるコイルバネ143を介して押し上げ
部材15が設けられていて、押し上げ部材15の上昇に
より載置案内部材11の底部が押し上げられるようにな
っている。
Referring to FIG. 2, the supply means will be described. The supply means 10 supplies a cylindrical substrate. The plurality of cylindrical substrates 1 before the coating process are stored in the supply table 161 in advance.
The movable transport member 163 of the automatic transport device 162 moves by gripping one cylindrical substrate 1 from the cylindrical substrate 1 on the supply table 161, and moves the placement guide member 1 on the rotary table 12.
Place in 1. The placement guide member 11 has a circular groove in which the cylindrical base material 1 can be loosely fitted and accommodated, and a plurality of (six in the drawing) are provided in the rotation circumferential direction of the turntable 12.
The rotary table 12 includes a motor M1 and gear trains 131 and 132.
Is driven intermittently. When one cylindrical substrate 1 is conveyed below the vertical center line Z and stopped, the elevating member 14 is raised via the pinion gear 141 and the rack gear 142 by starting the motor M2. A push-up member 15 is provided above the elevating member 14 via a coil spring 143 serving as a buffer member, and the bottom of the placement guide member 11 is pushed up by the lift of the push-up member 15.

【0016】次に、図3で把持搬送手段を説明すると、
把持搬送手段20は把持段差を修正して搬送する。円筒
状基材(ドラム)1は搬送ハンドにより把持されかつ上
方に搬送される。把持される場所はドラム1に悪影響が
無ければどの場所でもよいが、ドラムとドラムとの間の
繋ぎ部を把持する事によりドラム間の段差修正がある程
度まで行われることが好ましい。また、上に積み重ねら
れたドラムの全重量に抗して強い力で把持するからキズ
故障の発生を防ぐため、繋ぎ部の非画像部を把持するの
が良い。詳しく述べると、先ず上部位置に設けた把持部
21の搬送ハンド211の把持部材214と、搬送ハン
ド212の把持部材215は軸213により回転自在に
支持され、先に押し上げられて上方に搬送された円筒状
基材1と、同様に先に押し上げられた円筒状基材1間
を、前記把持部材214と把持部材215とで段差調整
して把持しながら塗布速度と同速度で矢示方向に上昇さ
せる。更に下部位置に設けた把持部22の搬送ハンド2
21の把持部材224と、搬送ハンド222の把持部材
225も軸223により回転自在に支持され、円筒状基
材1間と、新たに押し上げられた円筒状基材1間を前記
把持部材224と、把持部材225とで段差調整して把
持するようにする。そして把持完了後、前記把持部21
と同速度となる塗布速度と同速度で矢示方向に上昇させ
る。なお、216,226は把持部先端に取り付けら
れ、滑り止めと円筒状基材1周面を保護するための押圧
緩衝部材である。なお、段差修正搬送する例は特開平3
−21371号公報のものが好ましく使用される。
Next, the holding and conveying means will be described with reference to FIG.
The gripping / transporting means 20 corrects and transports the gripping step. The cylindrical substrate (drum) 1 is gripped by the transport hand and transported upward. The place to be gripped may be any place as long as the drum 1 is not adversely affected. However, it is preferable that the level difference between the drums is corrected to a certain extent by gripping the connecting portion between the drums. In addition, since the drum is gripped with a strong force against the total weight of the drum stacked thereon, it is preferable to grip the non-image portion of the connecting portion in order to prevent occurrence of a scratch failure. Specifically, first, the holding member 214 of the transfer hand 211 of the holding unit 21 provided at the upper position and the holding member 215 of the transfer hand 212 are rotatably supported by the shaft 213, and are pushed up first and transferred upward. The gap between the cylindrical base material 1 and the cylindrical base material 1 that has been pushed up similarly is raised in the direction indicated by the arrow at the same speed as the application speed while holding the holding member 214 and the holding member 215 while adjusting the step. Let it. Further, the transfer hand 2 of the gripper 22 provided at the lower position
21 and the holding member 225 of the transfer hand 222 are also rotatably supported by the shaft 223, and the holding members 224 between the cylindrical substrates 1 and between the newly pushed cylindrical substrates 1 are provided. The step is adjusted with the holding member 225 to hold the object. After the completion of the grip, the grip 21
Is increased in the direction indicated by the arrow at the same speed as the coating speed. Incidentally, reference numerals 216 and 226 denote pressure buffer members which are attached to the tips of the gripping portions and which prevent slipping and protect the peripheral surface of the cylindrical substrate 1. An example of carrying a step-corrected conveyance is disclosed in
Japanese Patent No. 21371 is preferably used.

【0017】図4で環状洗浄手段70を説明すると、環
状洗浄手段70は円筒状基材の表面のゴミを除去するエ
アーシャワー部71と、洗浄剤液による洗浄剤液部72
及び濯ぎ部73より構成されている。前記エアーシャワ
ー部71は高圧エアーが吹き付けられ、洗浄剤液部72
は第1洗浄部721、第2洗浄部722、第3洗浄部7
23と分かれており、洗浄液が高圧で吹き付けられる。
洗浄剤としては水系洗浄剤が環境汚染の点からよく、特
開平7−152161号公報の3頁の実施例1、あるい
は特願平7−340761号の14頁の組成に記載のア
ルカリ性水系洗浄剤が好ましく用いられる。この時、超
音波を照射すると効率を高めることが出来る。洗浄剤に
よる洗浄を終えた後、濯ぎ部73の第1濯ぎ731、第
2濯ぎ732により超純水の高圧流がたたきつけられて
完了する。洗浄剤成分は第1洗浄部721、第2洗浄部
722、第3洗浄部723で、異なるものでもよいが、
通常洗浄剤の成分は同じにして濃度を第1洗浄部72
1、第2洗浄部722、第3洗浄部723の順に上げて
行くと共に、洗浄温度も例えば第1洗浄部721では2
5℃、第2洗浄部722では28℃、第3洗浄部723
では30℃と異ならせるのがよい。
The annular cleaning means 70 will be described with reference to FIG. 4. The annular cleaning means 70 includes an air shower section 71 for removing dust on the surface of the cylindrical substrate, and a cleaning liquid section 72 using a cleaning liquid.
And a rinsing section 73. The air shower section 71 is blown with high-pressure air, and the cleaning agent liquid section 72 is provided.
Are the first cleaning unit 721, the second cleaning unit 722, and the third cleaning unit 7
The cleaning liquid is sprayed at a high pressure.
As the detergent, an aqueous detergent is preferable from the viewpoint of environmental pollution, and the alkaline aqueous detergent described in Example 1 on page 3 of JP-A-7-152161 or the composition on page 14 of Japanese Patent Application No. 7-340761 is used. Is preferably used. At this time, the efficiency can be increased by irradiating ultrasonic waves. After the cleaning with the cleaning agent is completed, the high-pressure flow of the ultrapure water is beaten by the first rinsing 731 and the second rinsing 732 of the rinsing section 73 to complete the cleaning. The cleaning agent components may be different in the first cleaning unit 721, the second cleaning unit 722, and the third cleaning unit 723,
Usually, the components of the cleaning agent are the same and the concentration is set to the first cleaning unit 72.
1, the second cleaning unit 722, and the third cleaning unit 723 are sequentially increased, and the cleaning temperature is set to, for example, 2 in the first cleaning unit 721.
5 ° C., 28 ° C. in the second cleaning unit 722,
Then it is better to make it different from 30 ° C.

【0018】図5で他の環状洗浄手段70を説明する
と、環状洗浄手段70は円筒状基材の表面のゴミを除去
するエアーシャワー部71と、洗浄剤液による洗浄剤液
部72及び濯ぎ部73より構成されている。この環状洗
浄手段は図4で環状洗浄手段70の洗浄剤液部72が異
なっており、洗浄剤液部72は図4の第1洗浄部、第2
洗浄部、第3洗浄部が一体となったもので、図5で下よ
り第1洗浄部、第2洗浄部、第3洗浄部となっている。
さらに詳しくは、特開平62−183867号公報、特
開平6−210202号公報、また、環状洗浄ユニット
については特開平5−142804号公報に記載のもの
が好ましく用いられる。洗浄された円筒状基材は次の乾
燥手段80に移行される。
Referring to FIG. 5, another annular cleaning means 70 will be described. The annular cleaning means 70 includes an air shower section 71 for removing dust on the surface of the cylindrical substrate, a cleaning liquid section 72 using a cleaning liquid, and a rinsing section. 73. This annular cleaning means is different from the annular cleaning means 70 in FIG. 4 in the cleaning liquid section 72, and the cleaning liquid section 72 is different from the first cleaning section and the second cleaning section in FIG.
The washing unit and the third washing unit are integrated, and the first washing unit, the second washing unit, and the third washing unit are shown from below in FIG.
More specifically, those described in JP-A-62-183867 and JP-A-6-210202, and those described in JP-A-5-142804 are preferably used as the annular cleaning unit. The washed cylindrical substrate is transferred to the next drying means 80.

【0019】図6で乾燥手段80を説明すると、垂直中
心線Z−Zに沿って垂直状に重ね合わせた複数の円筒状
基材1A,1B,1Cを連続的に矢示方向に上昇移動さ
せ、円筒状基材の表面に温度30℃〜120℃の高圧清
浄空気81を吹き付けることにより乾燥される。なお、
さらに詳しくは、特願平5−216495号、特願平5
−99559号の明細書に記載のものが好ましく用いら
れる。乾燥手段80を経て位置決め手段60へ至るよう
になっている。
Referring to FIG. 6, the drying means 80 will be described. A plurality of cylindrical substrates 1A, 1B, 1C vertically stacked along a vertical center line ZZ are continuously moved upward in the direction indicated by the arrow. The substrate is dried by blowing high-pressure clean air 81 at a temperature of 30 ° C. to 120 ° C. onto the surface of the cylindrical substrate. In addition,
For further details, refer to Japanese Patent Application No. 5-216495, Japanese Patent Application No.
What is described in the specification of -99559 is preferably used. It reaches the positioning means 60 via the drying means 80.

【0020】次に、図7で垂直中心線Z−Zに沿って垂
直状に重ね合わせた複数の円筒状基材1A,1B(以
下、円筒状基材1と称す)を連続的に矢示方向に上昇移
動させ、その周囲を取り囲み、円筒状基材1の外周面に
対しスライドホッパー型塗布手段40の塗布に直接係わ
る部分(ホッパー塗布面)41により塗布液(感光液)
Lが塗布される。なお、円筒状基材1としては中空ドラ
ム例えばアルミニウムドラム、プラスチックドラムのほ
かシームレスベルト型の基材でも良い。前記ホッパー塗
布面41には、円筒状基材1側に開口する塗布液流出口
42を有する幅狭の塗布液分配スリット(スリットと略
称する)43が水平方向に形成されている。このスリッ
ト43は環状の塗布液分配室(塗布液溜り室)44に連
通し、この環状の塗布液分配室44には、貯留タンク2
内の塗布液Lを圧送ポンプ3により供給管4を介して、
供給口48から導入して供給するようになっている。他
方、スリット43の塗布液流出口42の下側には、連続
して下方に傾斜し、円筒状基材1の外径寸法よりやや大
なる寸法で終端をなすように形成された塗布液スライド
面(以下、スライド面と称す)45が形成されている。
更に、このスライド面45の終端より下方に延びる唇状
部46が形成されている。かかる塗布手段(スライドホ
ッパー型塗布手段)40による塗布においては、円筒状
基材1を引き上げる過程で、塗布液Lをスリット43か
ら押し出し、スライド面45に沿って流下させると、ス
ライド面45の終端に至った塗布液は、そのスライド面
45の終端と円筒状基材1の外周面との間にビードを形
成した後、円筒状基材1の表面に塗布される。スライド
面45の終端と円筒状基材1は、ある間隙を持って配置
されているため円筒状基材1を傷つける事なく、また性
質の異なる層を多層形成させる場合においても、既に塗
布された層を損傷することなく塗布できる。
Next, in FIG. 7, a plurality of cylindrical substrates 1A, 1B (hereinafter, referred to as cylindrical substrates 1) vertically superposed along a vertical center line ZZ are continuously shown by arrows. In the direction, and surrounds the periphery thereof, and the coating liquid (photosensitive liquid) is applied to the outer peripheral surface of the cylindrical substrate 1 by a portion (hopper application surface) 41 directly involved in the application of the slide hopper type application means 40.
L is applied. The cylindrical substrate 1 may be a hollow drum, for example, an aluminum drum, a plastic drum, or a seamless belt type substrate. On the hopper coating surface 41, a narrow coating liquid distribution slit (abbreviated as a slit) 43 having a coating liquid outlet 42 opening toward the cylindrical substrate 1 is formed in the horizontal direction. The slit 43 communicates with an annular coating liquid distribution chamber (coating liquid reservoir) 44, and the annular coating liquid distribution chamber 44 has a storage tank 2.
The application liquid L in the inside is supplied by the pressure feed pump 3 through the supply pipe 4,
The liquid is supplied from the supply port 48. On the other hand, below the coating liquid outlet 42 of the slit 43, a coating liquid slide which is continuously inclined downward and is formed so as to terminate at a dimension slightly larger than the outer diameter of the cylindrical substrate 1. A surface (hereinafter, referred to as a slide surface) 45 is formed.
Further, a lip 46 extending downward from the end of the slide surface 45 is formed. In the application by the application means (slide hopper type application means) 40, when the coating liquid L is pushed out from the slit 43 and flows down along the slide surface 45 in the process of lifting the cylindrical substrate 1, the end of the slide surface 45 Is applied to the surface of the cylindrical substrate 1 after forming a bead between the end of the slide surface 45 and the outer peripheral surface of the cylindrical substrate 1. Since the end of the slide surface 45 and the cylindrical substrate 1 are arranged with a certain gap therebetween, the cylindrical substrate 1 is already applied without damaging the cylindrical substrate 1 and even in the case of forming multiple layers having different properties. Can be applied without damaging the layer.

【0021】一方、前記圧送ポンプ3の塗布液供給部よ
り最も遠い位置で、前記塗布液分配室44の1部には、
塗布液分配室44内の泡抜き用の空気抜き手段47が設
けられている。貯留タンク2内の塗布液Lが塗布液分配
室44に供給されて塗布液分配スリット43から塗布液
流出口42に供給されるとき、開閉弁を開いて空気抜き
手段47より塗布液分配室44内の空気を排出する。
On the other hand, at a position furthest from the application liquid supply section of the pressure feed pump 3, a part of the application liquid distribution chamber 44
Air bleeding means 47 for removing bubbles in the coating liquid distribution chamber 44 is provided. When the coating liquid L in the storage tank 2 is supplied to the coating liquid distribution chamber 44 and supplied from the coating liquid distribution slit 43 to the coating liquid outlet 42, the opening / closing valve is opened and the air release means 47 opens the coating liquid distribution chamber 44. Exhaust the air.

【0022】塗布手段40の下部には、円筒状基材1の
円周方向を位置決めする位置決め手段30が固定されて
いる。円筒状基材1の位置決め手段30の本体31に
は、複数の給気口32と、複数の排気口33が穿設され
ている。複数の給気口32は、図示しない給気ポンプに
接続され、空気等の流体が圧送される。給気口32の一
端部で円筒状基材1の外周面に対向する側には、吐出口
34が貫通している。吐出口34は円筒状基材1の外周
面と所定の間隙を保って対向している。該間隙は、30
μm〜2mmである。吐出口34は直径0.05〜0.
5mmの小口径のノズルである。給気ポンプから圧送さ
れた流体は、複数の給気口32から本体31の内部に導
入されて、複数の吐出口34から吐出され、前記円筒状
基材1A(1B)の外周面と均一な流体膜層を形成す
る。吐出後の流体は複数の排気口33から装置外に排出
される。なお、詳しくは特開平3−274568号公報
に、特開平3−280063号公報に記載の位置決め手
段が好ましく用いられる。
Below the coating means 40, a positioning means 30 for positioning the cylindrical substrate 1 in the circumferential direction is fixed. A plurality of air supply ports 32 and a plurality of exhaust ports 33 are formed in the main body 31 of the positioning means 30 of the cylindrical substrate 1. The plurality of air supply ports 32 are connected to an air supply pump (not shown), and a fluid such as air is pumped. A discharge port 34 passes through one end of the air supply port 32 on the side facing the outer peripheral surface of the cylindrical substrate 1. The discharge port 34 faces the outer peripheral surface of the cylindrical substrate 1 with a predetermined gap. The gap is 30
μm to 2 mm. The discharge port 34 has a diameter of 0.05-0.
The nozzle has a small diameter of 5 mm. The fluid pumped from the air supply pump is introduced into the main body 31 from the plurality of air inlets 32 and is discharged from the plurality of outlets 34 to be uniform with the outer peripheral surface of the cylindrical substrate 1A (1B). Form a fluid film layer. The discharged fluid is discharged out of the apparatus from the plurality of exhaust ports 33. Incidentally, the positioning means described in JP-A-3-274568 and JP-A-3-280063 are preferably used in detail.

【0023】次に、図8で塗布手段40を説明すると、
塗布手段40は垂直型のスライドホッパー型コーターで
ある。塗布手段40は円筒状基材1の横断面上における
塗布装置の位置を調整できる図示しない可動テーブル
(X−Y軸可動制御テーブル)上に設けられている。又
特開平3−21371号公報のごとく制御手段を設けて
も良い。このようにして塗布組成物がドラム上に塗布さ
れる。塗布されたドラムは乾燥/乾燥調整手段80に移
行される。詳しくは特開昭58−189061号公報に
記載の塗布手段が好ましく用いられる。なお、供給手段
10は緩衝機構があることが好ましい。
Next, the coating means 40 will be described with reference to FIG.
The application means 40 is a vertical slide hopper type coater. The coating means 40 is provided on a movable table (XY axis movable control table) (not shown) that can adjust the position of the coating device on the cross section of the cylindrical substrate 1. Further, a control means may be provided as disclosed in JP-A-3-21371. Thus, the coating composition is applied on the drum. The applied drum is transferred to the drying / drying adjusting means 80. Specifically, the coating means described in JP-A-58-189061 is preferably used. The supply means 10 preferably has a buffer mechanism.

【0024】図9で乾燥/乾燥調整手段の乾燥フードを
説明する。乾燥フード51は環状の壁面を有し、該壁面
には多数の開口51Aが穿設されている。円筒状基材1
を矢示方向に上昇させ、塗布手段40のホッパー塗布面
(塗布ヘッド)41で塗布液Lを塗布し、感光層5を形
成する。円筒状基材1上に形成された感光層5は前記乾
燥フード51内を通過しながら徐々に乾燥される。この
乾燥は前記多数の開口51Aより塗布液Lに含まれてい
る溶媒を壁面外に放出することにより行われる。前記の
ように、塗布手段40により円筒状基材1上に塗布液を
塗布することにより、形成された感光層5は、塗布直後
において乾燥フード51により包囲されており、開口5
1Aからのみ溶媒が放出されるため、塗布直後における
感光層5の乾燥速度は、前記開口51Aの開口面積にほ
ぼ比例する。
Referring to FIG. 9, the drying hood of the drying / drying adjusting means will be described. The drying hood 51 has an annular wall surface, and a large number of openings 51A are formed in the wall surface. Cylindrical substrate 1
Is raised in the direction of the arrow, and the coating liquid L is applied on the hopper application surface (application head) 41 of the application means 40 to form the photosensitive layer 5. The photosensitive layer 5 formed on the cylindrical substrate 1 is gradually dried while passing through the drying hood 51. This drying is performed by discharging the solvent contained in the coating liquid L out of the wall surface through the large number of openings 51A. As described above, the photosensitive layer 5 formed by applying the application liquid onto the cylindrical substrate 1 by the application means 40 is surrounded by the drying hood 51 immediately after the application, and the opening 5
Since the solvent is released only from 1A, the drying speed of the photosensitive layer 5 immediately after the application is substantially proportional to the opening area of the opening 51A.

【0025】図10で乾燥/乾燥調整手段の吸引式乾燥
器53を説明する。吸引式乾燥器53は、吸引スリット
531と吸引チャンバー532と吸引ノズル533とを
有する吸引スリット部材534、下部の筒状部材53
5、上部の筒状部材536がそれぞれ同心に結合されて
いる。そして、複数設けられた吸引ノズル533から吸
引を行ない、周方向均一な吸引チャンバー532、周方
向均一な吸引スリット531により周方向の均一化がな
された吸引エアーが流れ、更に、吸引スリット部材53
4、その上下の筒状部材536,535の各内径面と塗
布済みの円筒状基材1の外周面との間の空気流の乱れを
バッファー空間537で極く僅かにおさえて、538に
示す乾燥の為の均一吸引エアーの空気流を作り出してい
る。この乾燥ゾーンに矢印で示すZ方向に塗布済の円筒
状基材1を搬送することにより、塗布膜の乾燥を行うも
のである。
Referring to FIG. 10, the suction dryer 53 of the drying / drying adjusting means will be described. The suction dryer 53 includes a suction slit member 534 having a suction slit 531, a suction chamber 532, and a suction nozzle 533, and a lower cylindrical member 53.
5. The upper cylindrical member 536 is connected concentrically. Then, suction is performed from a plurality of suction nozzles 533 provided, suction air uniformized in the circumferential direction by the suction chamber 532 having a uniform circumferential direction and the suction slit 531 having a uniform circumferential direction flows, and the suction slit member 53 is further provided.
4. The turbulence of the air flow between the inner diameter surfaces of the upper and lower cylindrical members 536 and 535 and the outer peripheral surface of the coated cylindrical substrate 1 is extremely slightly suppressed by the buffer space 537, and is indicated by 538. It creates an air flow of uniform suction air for drying. The applied film is dried by transporting the applied cylindrical substrate 1 to the drying zone in the Z direction indicated by the arrow.

【0026】図11で分離排出手段60を説明すると、
垂直移動ロボットステージ61、軸体62、上チャック
(上把持子)63、下チャック(下把持子)64、エア
ーシリンダー65により構成されている。なお、別のも
のとしては特開昭61−120662号、特開昭61−
120664号公報等に記載のものでも良い。
The separation / discharge means 60 will be described with reference to FIG.
It comprises a vertical moving robot stage 61, a shaft body 62, an upper chuck (upper gripper) 63, a lower chuck (lower gripper) 64, and an air cylinder 65. In addition, as another thing, Japanese Patent Application Laid-Open No.
No. 120664 may be used.

【0027】塗布済の円筒状基材1は下方より上方へ向
けて積み上げられ、上方向へ移動し図11(a)に示す
ように分離位置に達する。この時、垂直ロボットが起動
し被分離円筒状基材1と同軸、等速度で同架された分離
装置全体を移動する。まず、図11(b)に示す位置で
下把持子64が被分離円筒状基材1Aに隣接する円筒状
基材1Bを保持する。次いで図11(c)に示す位置で
上把持子63が被分離円筒状基材1Aを保持する。エア
ーシリンダー65に接続する軸体62により上把持子6
3は被分離円筒状基材1Aを保持したまま上方向へ移動
して図11(d)に示す位置になる。この時、被分離円
筒状基材1Aと隣接する円筒状基材1Bにまたがる塗布
膜が切り裂かれ図11(d)に示すように円筒状基材1
A、1Bの分離が行われる。分離済みの円筒状基材1A
を排出するために図11(e)に示すように下把持子6
4は解放状態となり、次いで図11(f)に示すように
上把持子63が被分離円筒状基材1Aを保持した状態で
垂直移動ロボットステージ61が急上昇を行い、隣接す
る円筒状基材1Bの位置よりはるか上方に配置された分
離装置に分離済の円筒状基材1Aを置き、上把持子63
が解放となり工程を終了する。そして次なる円筒状基材
1Bの分離の為、垂直移動ロボットステージ61が下降
しまた軸体62が下降し、初期状態の位置の図11
(a)に戻る。詳しくは特願平5−124270記載の
分離手段が好ましく用いられる。
The coated cylindrical base material 1 is stacked upward from below, moves upward, and reaches the separation position as shown in FIG. At this time, the vertical robot is activated and moves the entire separation device coaxially and at the same speed with the cylindrical substrate 1 to be separated. First, the lower gripper 64 holds the cylindrical substrate 1B adjacent to the cylindrical substrate 1A to be separated at the position shown in FIG. Next, the upper grip 63 holds the cylindrical substrate 1A to be separated at the position shown in FIG. The upper gripper 6 is moved by the shaft 62 connected to the air cylinder 65.
Reference numeral 3 moves upward while holding the cylindrical substrate 1A to be separated, and reaches the position shown in FIG. 11D. At this time, the coating film straddling the cylindrical substrate 1B adjacent to the cylindrical substrate 1A to be separated is cut off, and the cylindrical substrate 1 is cut as shown in FIG.
A, 1B separation is performed. Separated cylindrical substrate 1A
As shown in FIG. 11E, the lower gripper 6
4 is in a released state, and then, as shown in FIG. 11 (f), the vertical moving robot stage 61 rises rapidly with the upper grip 63 holding the cylindrical substrate 1A to be separated, and the adjacent cylindrical substrate 1B The separated cylindrical substrate 1A is placed on a separation device disposed far above the position
Is released and the process ends. Then, in order to separate the next cylindrical substrate 1B, the vertically moving robot stage 61 is lowered, and the shaft 62 is lowered.
Return to (a). Specifically, the separation means described in Japanese Patent Application No. 5-124270 is preferably used.

【0028】以上のように環状洗浄手段の組込みによ
り、洗浄後に表面酸化が抑えられ塗布でき、ゴミの付着
が無くまた塗布欠陥やビード切れ無く良好に連続塗布さ
れ、長時間安定に連続塗布や完全自動連続塗布ができ
る。
As described above, by incorporating the annular cleaning means, surface oxidation can be suppressed and coating can be performed after cleaning, and good continuous coating can be performed without adhesion of dust and without coating defects or bead breaks. Automatic continuous application is possible.

【0029】(実施の形態2)この実施形態は図1の連
続塗布装置を逐次塗布できるようにしたもので、図12
は第2実施形態の連続塗布装置の全体構成を示す斜視図
である。なお、図1と機構的、機能的に同一部材は同一
符号を付け説明を省略する。
(Embodiment 2) In this embodiment, the continuous coating apparatus shown in FIG. 1 can be sequentially coated.
It is a perspective view which shows the whole structure of the continuous coating device of 2nd Embodiment. Note that the same members as those in FIG. 1 are mechanically and functionally the same, and description thereof is omitted.

【0030】環状洗浄手段70、乾燥手段80の上方の
垂直中心線Z−Z上には、位置決め手段30A、塗布手
段40A、乾燥/乾燥調整手段50Aとから成る塗布ユ
ニットAがある。さらに上に、位置決め手段30B、塗
布手段40B、乾燥/乾燥調整手段50Bとから成る塗
布ユニットBがある。さらに上に、位置決め手段30
C、塗布手段40C、乾燥/乾燥調整手段50Cとから
成る塗布ユニットCを配置している。最上段には分離排
出手段60が配置されている。各塗布手段40A,40
B,40Cからそれぞれ吐出された塗布液は、円筒状基
材1上に多層の塗布層を逐次形成し、各乾燥手段50
A,50B,50Cにより乾燥される。乾燥済みの最上
段の円筒状基材1Aは、分離排出手段60により把持さ
れて下方の円筒状基材1Bから分離されて、機外の図示
しないパレット上に載置されるようになっている。ま
た、逐次塗布の場合、塗布手段の前に位置ぎめ手段、塗
布手段の直後に乾燥/乾燥調整手段があることが好まし
い。
On the vertical center line ZZ above the annular cleaning means 70 and the drying means 80, there is a coating unit A comprising a positioning means 30A, a coating means 40A and a drying / drying adjusting means 50A. Further above, there is a coating unit B including a positioning unit 30B, a coating unit 40B, and a drying / drying adjusting unit 50B. Further above, the positioning means 30
C, an application unit C including an application unit 40C and a drying / drying adjustment unit 50C. Separation / discharge means 60 is arranged at the top. Each coating means 40A, 40
The coating liquid discharged from each of B and 40C forms a multi-layered coating layer on the cylindrical substrate 1 sequentially,
A, 50B, and 50C are dried. The dried uppermost cylindrical substrate 1A is gripped by the separating / discharging means 60, separated from the lower cylindrical substrate 1B, and placed on a pallet (not shown) outside the machine. . In the case of sequential application, it is preferable that a positioning means is provided before the application means and a drying / drying adjustment means is provided immediately after the application means.

【0031】[0031]

【実施例】次に、本発明の実施例につき説明する。Next, embodiments of the present invention will be described.

【0032】(実施例1)導電性支持体としては鏡面加
工を施した直径80mm、高さ355mm、283gの
アルミニウムドラム支持体を用いた。図1の連続塗布装
置を用い塗布液としては下記記載のUCL−1塗布液
組成物を用いた。
(Example 1) A mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g was used as a conductive support. UCL-1 coating liquid composition described below was used as a coating liquid using the continuous coating apparatus of FIG.

【0033】UCL−1塗布液組成物(3.0W/V
%ポリマー濃度) 共重合ナイロン樹脂(CM−8000東レ社製) メタノール/n−ブタノール=10/1(Vol比) また、環状洗浄手段は図4に示す環状洗浄手段であり、
洗浄液の内容はつぎの表1、表2の通りである。表1は
各工程の洗浄液の種類と洗浄温度で、表2は前記表1の
洗浄液の洗浄剤組成を示している。なお、表2の洗浄剤
は重量比で、洗浄液のpHは11.3である。
UCL-1 coating composition (3.0 W / V
% Polymer concentration) Copolymer nylon resin (manufactured by CM-8000 Toray) Methanol / n-butanol = 10/1 (vol ratio) The annular washing means is an annular washing means shown in FIG.
The contents of the cleaning liquid are as shown in Tables 1 and 2 below. Table 1 shows the type of cleaning liquid and the cleaning temperature in each step, and Table 2 shows the detergent composition of the cleaning liquid in Table 1 above. The cleaning agents in Table 2 are in weight ratio, and the pH of the cleaning solution is 11.3.

【0034】[0034]

【表1】 [Table 1]

【0035】[0035]

【表2】 [Table 2]

【0036】以上のように環状洗浄手段を組み込むこと
により、洗浄後、表面酸化が抑えられ、しかもゴミ等の
付着が無く、高感度の塗布性の良好な塗布ドラムが得ら
れた。また、長時間で多数本の安定な連続塗布や完全自
動化ができるため、ホコリ、ゴミ等が混入せず高品質の
製品が可能となった。
By incorporating the annular cleaning means as described above, a coating drum with high sensitivity and good coatability was obtained, in which the surface oxidation was suppressed after cleaning and there was no adhesion of dust and the like. In addition, since stable continuous coating of many pieces and complete automation can be performed in a long time, a high quality product can be obtained without contamination of dust and dirt.

【0037】(実施例2)導電性支持体としては鏡面加
工を施した直径80mm、高さ355mm、283gの
アルマイト加工したアルミニウムドラム支持体を用い
た。図12の逐次の連続塗布装置を用い、上記アルミニ
ウムドラム支持体上に、下記の如く各々塗布液組成物
UCL−1、CGL−1、CTL−1を調製し、ス
ライドホッパー型塗布装置40A(UCL−1用)、
40B(CGL−1用)、40C(CTL−1用)
にて実施例1と同様にして3層の逐次重層塗布を行っ
た。環状洗浄手段は図5に示す環状洗浄手段であり、洗
浄液と洗浄温度は(実施例1)と同様にして行った。C
TL塗布後は分離後更に乾燥室にて95℃、1時間の本
乾燥を行い感光体を製作した。
Example 2 As a conductive support, a mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and a thickness of 283 g was used. Using the sequential continuous coating apparatus shown in FIG. 12, coating liquid compositions UCL-1, CGL-1, and CTL-1 were prepared on the aluminum drum support as described below, respectively, and the slide hopper type coating apparatus 40A (UCL) was used. -1),
40B (for CGL-1), 40C (for CTL-1)
In the same manner as in Example 1, three successive multi-layer coatings were performed. The annular cleaning means was the annular cleaning means shown in FIG. 5, and the cleaning liquid and the cleaning temperature were the same as in (Example 1). C
After the TL coating, after the separation, main drying was performed at 95 ° C. for 1 hour in a drying chamber to produce a photoreceptor.

【0038】UCL−1塗布液組成物 共重合ナイロン樹脂(CM−8000東レ社製);3g メタノール/n−ブタノール=10/1(Vol比);
1000g CGL−1塗布液組成物 フルオレノン型ジスアゾ顔料(CGM−1);25g ブチラール樹脂(エスレックBX−L積水化学社製);
10g メチルエチルケトン;1430ml 上記塗布液組成物をサンドミルを用いて20時間分散し
たもの。
UCL-1 coating liquid composition copolymerized nylon resin (CM-8000 manufactured by Toray Industries, Ltd.); 3 g methanol / n-butanol = 10/1 (vol ratio);
1000 g CGL-1 coating liquid composition fluorenone type disazo pigment (CGM-1); 25 g butyral resin (manufactured by Esrec BX-L Sekisui Chemical Co., Ltd.);
10 g methyl ethyl ketone; 1430 ml A dispersion of the above coating solution composition for 20 hours using a sand mill.

【0039】CTL−1塗布液組成物 CTM−1;500g ポリカーボネート(Z−200三菱瓦斯化学社製);5
60g 1,2−ジクロロエタン;2800ml ここで、CGM−1の化学式を「化1」に、CTM−1
の化学式を「化2」にそれぞれ示す。
CTL-1 coating solution composition CTM-1; 500 g polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company); 5
60 g 1,2-dichloroethane; 2800 ml Here, the chemical formula of CGM-1 is represented by “Chemical Formula 1” and CTM-1
Is shown in “Chemical formula 2”.

【0040】[0040]

【化1】 Embedded image

【0041】[0041]

【化2】 Embedded image

【0042】得られた感光体のドラムをコニカ社製U−
BIX−3035複写機で実写したところ10本目と1
0000本目も差が無く濃淡ムラ、カブリムラや画像欠
陥(黒ポチ、白ポチ、ゴミ、スジ、キズ)等がなく良好
であった。また比較例として別ラインで洗浄したドラム
(洗浄後3時間経過の物)を使用して同様な感光体を作
成し、感度の比較を行ったところ、本発明の感光体のド
ラムは+15%の向上が見られた。
The obtained drum of the photoreceptor was manufactured by Konica U-
The 10th and 1st shots were taken with a BX-3035 copier.
There was no difference in the 0000th line, and there was no unevenness in density, fogging, image defects (black spots, white spots, dust, streaks, scratches, etc.), and the results were good. As a comparative example, a similar photosensitive member was prepared using a drum washed on another line (three hours after washing), and the sensitivity was compared. As a result, the drum of the photosensitive member of the present invention showed + 15%. Improvements were seen.

【0043】[0043]

【発明の効果】以上のように構成したので下記の効果を
奏する。請求項1,2に記載の発明によれば、円筒状基
材を供給し、供給された前記円筒状基材の円筒軸を合わ
せ積み重ねて把持搬送し、把持搬送された前記円筒状基
材を下から上へ垂直に押し上げながら外周面を洗浄し、
洗浄後の前記円筒状基材の中心に塗布手段の環状の中心
を合わせて位置決めし、位置決め後の前記円筒状基材の
外周面上に塗布液を連続的に塗布し、塗布された前記円
筒状基材を乾燥又は乾燥調整し、乾燥又は乾燥調整した
前記円筒状基材を分離し排出するので、連続的に安定し
て円筒状基材の塗布ができ、生産性が向上する。塗膜が
均一であり、塗布ムラや塗膜欠陥がなく、ゴミ、ほこり
が混入せず塗布性が良好となる。また、円筒状基材の洗
浄から塗布までの時間が短くでき、円筒状基材の酸化が
進行しないうちに塗布できる。
According to the structure described above, the following effects can be obtained. According to the first and second aspects of the present invention, a cylindrical base material is supplied, the supplied cylindrical base material is aligned, stacked, conveyed and gripped and conveyed, and the gripped and conveyed cylindrical base material is provided. Clean the outer peripheral surface while vertically pushing up from the bottom,
The center of the annular shape of the coating means is aligned with the center of the cylindrical base material after cleaning, and the coating liquid is continuously applied on the outer peripheral surface of the cylindrical base material after the positioning, and the coated cylindrical shape is applied. Since the cylindrical base material is dried or adjusted for drying, and the dried or dried cylindrical base material is separated and discharged, the cylindrical base material can be continuously and stably applied, and the productivity is improved. The coating film is uniform, has no coating unevenness and coating film defects, and has good coating properties without inclusion of dust and dust. Further, the time from cleaning to application of the cylindrical substrate can be shortened, and application can be performed before oxidation of the cylindrical substrate proceeds.

【0044】請求項3に記載の発明によれば、環状洗浄
手段が前記円筒状基材の外周を取り囲む環状の洗浄ユニ
ットであるので、環状洗浄手段の組み立て、保守点検が
容易となる。
According to the third aspect of the present invention, since the annular cleaning unit is an annular cleaning unit surrounding the outer periphery of the cylindrical substrate, assembly and maintenance and inspection of the annular cleaning unit are facilitated.

【0045】請求項4に記載の発明によれば、洗浄ユニ
ットがエアーシャワー部、洗浄剤液部及び濯ぎ部よりな
るので、円筒状基材の洗浄が確実となる。
According to the fourth aspect of the present invention, since the cleaning unit includes the air shower section, the cleaning agent liquid section, and the rinsing section, the cleaning of the cylindrical substrate is ensured.

【0046】請求項5に記載の発明によれば、塗布手段
が円筒状基材を連続的にその長手方向に移動させなが
ら、その周囲を環状に取り囲み、円筒状基材の外周面に
対して塗布液を塗布するスライドホッパー型であるの
で、塗膜が均一であり、塗布ムラや塗膜欠陥がなく、塗
布性が良好となる。
According to the fifth aspect of the present invention, while the coating means continuously moves the cylindrical base material in the longitudinal direction, the coating means surrounds the circumference of the cylindrical base material in a ring shape, and Since it is a slide hopper type for applying a coating solution, the coating film is uniform, there is no coating unevenness or coating film defect, and the coating property is good.

【0047】請求項6に記載の発明によれば、位置決め
手段が前記円筒状基材の外周面にリング状で流体を吹き
付ける吐出口を有するので、高精度の位置決めができ
る。
According to the sixth aspect of the present invention, since the positioning means has a discharge port for spraying a fluid in a ring shape on the outer peripheral surface of the cylindrical substrate, highly accurate positioning can be performed.

【0048】請求項7によれば、塗布手段が円筒状基材
の横断面上における塗布装置の位置を調整できる可動テ
ーブル上に設けられているので、塗布装置の位置の調整
が精度よくでき、塗膜が均一で、塗布ムラや塗膜欠陥が
なく、塗布性が良好となる。
According to the seventh aspect, since the coating means is provided on the movable table capable of adjusting the position of the coating device on the cross section of the cylindrical substrate, the position of the coating device can be adjusted with high accuracy. The coating is uniform, free of coating unevenness and coating defects, and has good coating properties.

【0049】請求項8に記載の発明によれば、塗布手段
が複数個あり、複数の塗布層を逐次形成させるので、円
筒状基材の多重塗布が効率良く連続的に安定して生産で
き、生産性が向上し、またゴミ、ほこりが混入しなくな
る。
According to the eighth aspect of the present invention, since there are a plurality of coating means and a plurality of coating layers are sequentially formed, multiple coating of the cylindrical substrate can be efficiently and continuously and stably produced. Productivity is improved and dust and dirt are not mixed.

【0050】請求項9に記載の発明によれば、把持搬送
手段、位置決め手段、塗布手段、乾燥/乾燥調整手段、
分離排出手段の各手段の作動開始位置がそれぞれ独立に
調整できる手段を有するので、それぞれ作動の開始位置
が独立して公知技術の調整機構等により容易で確実に行
えるようになる。
According to the ninth aspect of the present invention, the gripping / conveying means, the positioning means, the coating means, the drying / drying adjusting means,
Since the operation start position of each unit of the separation / discharge unit is independently adjustable, the operation start position can be independently and easily and reliably performed by a known adjusting mechanism or the like.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1実施形態の連続塗布装置の全体構成を示す
斜視図。
FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to a first embodiment.

【図2】供給手段を示す斜視図。FIG. 2 is a perspective view showing a supply unit.

【図3】把持搬送手段における把持の斜視図。FIG. 3 is a perspective view of a grip in the gripping and conveying means.

【図4】環状洗浄手段を示す断面図。FIG. 4 is a sectional view showing an annular cleaning means.

【図5】他の環状洗浄手段を示す断面図。FIG. 5 is a sectional view showing another annular cleaning means.

【図6】乾燥手段を示す断面図。FIG. 6 is a sectional view showing a drying unit.

【図7】位置決め手段と塗布手段とを示す断面図。FIG. 7 is a sectional view showing a positioning unit and an application unit.

【図8】塗布手段を示す斜視図。FIG. 8 is a perspective view showing an application unit.

【図9】塗布手段と塗布手段の上部に設けた乾燥フード
を示す断面図。
FIG. 9 is a cross-sectional view showing a coating unit and a drying hood provided above the coating unit.

【図10】乾燥/乾燥調整手段を示す断面図。FIG. 10 is a sectional view showing a drying / drying adjustment unit.

【図11】分離排出手段による分離排出過程を説明する
状態図。
FIG. 11 is a state diagram illustrating a separation and discharge process by a separation and discharge unit.

【図12】第2実施形態の連続塗布装置の全体構成を示
す斜視図。
FIG. 12 is a perspective view showing the entire configuration of a continuous coating apparatus according to a second embodiment.

【符号の説明】[Explanation of symbols]

1,1A,1B 円筒状基材(塗布ドラム、ドラム) 10 供給手段 12 回転テーブル 13 駆動手段 14 昇降部材 15 押し上げ部材 20 把持搬送手段 21,22 把持部 211 搬送ハンド 212 搬送ハンド 221 搬送ハンド 222 搬送ハンド 30 位置決め手段 40,40A,40B,40C 塗布手段(コーター) 50,50A,50B,50C 乾燥/乾燥調整手段 60 分離排出手段 70 環状洗浄手段 80 乾燥手段 M1,M2 モータ 1, 1A, 1B Cylindrical base material (coating drum, drum) 10 Supply means 12 Rotary table 13 Driving means 14 Elevating member 15 Push-up member 20 Holding transport means 21, 22 Holding section 211 Transport hand 212 Transport hand 221 Transport hand 222 Transport Hand 30 Positioning means 40, 40A, 40B, 40C Coating means (coater) 50, 50A, 50B, 50C Drying / drying adjusting means 60 Separating and discharging means 70 Annular cleaning means 80 Drying means M1, M2 Motor

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 円筒状基材を供給し、供給された前記円
筒状基材の円筒軸を合わせ積み重ねて把持搬送し、把持
搬送された前記円筒状基材を下から上へ垂直に押し上げ
ながら外周面を洗浄し、洗浄後の前記円筒状基材の中心
に塗布手段の環状の中心を合わせて位置決めし、位置決
め後の前記円筒状基材の外周面上に塗布液を連続的に塗
布し、塗布された前記円筒状基材を乾燥又は乾燥調整
し、乾燥又は乾燥調整した前記円筒状基材を分離し排出
することを特徴とする連続塗布方法。
1. A cylindrical base material is supplied, the supplied cylindrical base material is aligned, stacked, stacked and gripped and conveyed, and the gripped and conveyed cylindrical base material is vertically pushed upward from below. Cleaning the outer peripheral surface, positioning the annular center of the application means in alignment with the center of the cleaned cylindrical substrate, and continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate after the positioning. A continuous coating method, wherein the applied cylindrical substrate is dried or dried and adjusted, and the dried or dried adjusted cylindrical substrate is separated and discharged.
【請求項2】 円筒状基材を供給する供給手段と、前記
供給手段により供給された前記円筒状基材を円筒軸を合
わせて積み重ね把持搬送する把持搬送手段と、把持搬送
された前記円筒状基材を下から上へ垂直に押し上げなが
ら、外周面を洗浄する環状洗浄手段と、塗布手段の環状
の中心に洗浄後の前記円筒状基材の中心を合わせる位置
決め手段と、前記円筒状基材の外周面上に塗布液を連続
的に塗布する塗布手段と、塗布された前記円筒状基材を
乾燥又は乾燥調整する乾燥/乾燥調整手段と、塗布され
た前記円筒状基材を分離し排出するための分離排出手段
と、を備えたことを特徴とする連続塗布装置。
2. A supply means for supplying a cylindrical base material, a gripping / conveying means for stacking and conveying the cylindrical base materials supplied by the supplying means with their cylindrical axes aligned, and the cylindrical shape gripped and transported. An annular cleaning means for cleaning the outer peripheral surface while vertically lifting the base material from bottom to top, a positioning means for aligning the center of the cylindrical base material after cleaning with an annular center of the coating means, and the cylindrical base material A coating means for continuously applying a coating liquid on the outer peripheral surface of the substrate, a drying / drying adjusting means for drying or adjusting the applied cylindrical base material, and separating and discharging the applied cylindrical base material And a separating / discharging means for performing the operation.
【請求項3】 前記環状洗浄手段が前記円筒状基材の外
周を取り囲む環状の洗浄ユニットであることを特徴とす
る請求項2に記載の連続塗布装置。
3. The continuous coating apparatus according to claim 2, wherein said annular cleaning means is an annular cleaning unit surrounding the outer periphery of said cylindrical substrate.
【請求項4】 前記洗浄ユニットがエアーシャワー部、
洗浄剤液部及び濯ぎ部より成ることを特徴とする請求項
3に記載の連続塗布装置。
4. The cleaning unit is an air shower unit,
4. The continuous coating apparatus according to claim 3, comprising a cleaning liquid section and a rinsing section.
【請求項5】 前記塗布手段が円筒状基材を連続的にそ
の長手方向に移動させながら、その周囲を環状に取り囲
み、円筒状基材の外周面に対して塗布液を塗布するスラ
イドホッパー型であることを特徴とする請求項2に記載
の連続塗布装置。
5. A slide hopper type wherein the coating means continuously moves the cylindrical substrate in its longitudinal direction, surrounds the periphery thereof in an annular shape, and applies a coating liquid to the outer peripheral surface of the cylindrical substrate. 3. The continuous coating apparatus according to claim 2, wherein
【請求項6】 前記位置決め手段が前記円筒状基材の外
周面にリング状で流体を吹き付ける吐出口を有すること
を特徴とする請求項2に記載の連続塗布装置。
6. The continuous coating apparatus according to claim 2, wherein the positioning means has a discharge port for spraying a fluid in a ring shape on the outer peripheral surface of the cylindrical substrate.
【請求項7】 前記塗布手段が円筒状基材の横断面上に
おける塗布装置の位置を調整できる可動テーブル上に設
けられていることを特徴とする請求項2に記載の連続塗
布装置。
7. The continuous coating apparatus according to claim 2, wherein said coating means is provided on a movable table capable of adjusting a position of the coating apparatus on a cross section of the cylindrical substrate.
【請求項8】 前記塗布手段が複数個あり、複数の塗布
層を逐次形成させることを特徴とする請求項2に記載の
連続塗布装置。
8. The continuous coating apparatus according to claim 2, wherein there are a plurality of said coating means, and a plurality of coating layers are sequentially formed.
【請求項9】 前記把持搬送手段、前記位置決め手段、
前記塗布手段、前記乾燥/乾燥調整手段、前記分離排出
手段の各手段の作動開始位置がそれぞれ独立に調整でき
る手段を有することを特徴とする請求項2に記載の連続
塗布装置。
9. The gripping / conveying means, the positioning means,
3. The continuous coating apparatus according to claim 2, further comprising a unit that can independently adjust the operation start position of each of the coating unit, the drying / drying adjustment unit, and the separation / discharge unit. 4.
JP18967597A 1997-07-15 1997-07-15 Continuous coating method and continuos coating applicator Pending JPH1133473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18967597A JPH1133473A (en) 1997-07-15 1997-07-15 Continuous coating method and continuos coating applicator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18967597A JPH1133473A (en) 1997-07-15 1997-07-15 Continuous coating method and continuos coating applicator

Publications (1)

Publication Number Publication Date
JPH1133473A true JPH1133473A (en) 1999-02-09

Family

ID=16245306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18967597A Pending JPH1133473A (en) 1997-07-15 1997-07-15 Continuous coating method and continuos coating applicator

Country Status (1)

Country Link
JP (1) JPH1133473A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10766296B2 (en) 2015-10-06 2020-09-08 Schwan-Stabilo Cosmetics Gmbh & Co. Kg Method for lacquering pencils, and lacquering apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10766296B2 (en) 2015-10-06 2020-09-08 Schwan-Stabilo Cosmetics Gmbh & Co. Kg Method for lacquering pencils, and lacquering apparatus

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