JPH10277480A - Cylindrical substrate and method of continuously coating cylindrical substrate - Google Patents

Cylindrical substrate and method of continuously coating cylindrical substrate

Info

Publication number
JPH10277480A
JPH10277480A JP8360297A JP8360297A JPH10277480A JP H10277480 A JPH10277480 A JP H10277480A JP 8360297 A JP8360297 A JP 8360297A JP 8360297 A JP8360297 A JP 8360297A JP H10277480 A JPH10277480 A JP H10277480A
Authority
JP
Japan
Prior art keywords
coating
cylindrical substrate
cylindrical
peripheral surface
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8360297A
Other languages
Japanese (ja)
Inventor
Akira Ohira
晃 大平
Masanari Asano
真生 浅野
Yoshihiko Eto
嘉彦 江藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP8360297A priority Critical patent/JPH10277480A/en
Publication of JPH10277480A publication Critical patent/JPH10277480A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a cylindrical substrate and a method of continuously coating the cylindrical substrate in which when photosensitive liquid is applied by a vertical annular coating device, a coating layer of a cylindrical substrate is not damaged, coating unevenness does not occur, and a position means and a coating means are not damaged. SOLUTION: In a continuous coating method in which cylindrical substrates 1 are stacked with their cylinder axes being aligned and conveyed and coating liquid is continuously applied to the outer peripheral surface of the cylindrical substrates 1 by an annular coating means 40, the used cylindrical substrates 1 each have wall thickness of <=1.5 mm, roundness of <=80 μm, and verticality of <=80 μm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、円筒状基材の外周
面上に塗布液を連続的に塗布する連続塗布方法及び該連
続塗布方法に用いられる円筒状基材に関する。更に詳細
には円筒状基材の筒軸を合わせて積み重ね、下から上へ
押し上げながら、垂直塗布手段により円筒状基材の外周
面に塗布液を塗布する円筒状基材の連続塗布方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous coating method for continuously applying a coating solution on the outer peripheral surface of a cylindrical substrate, and a cylindrical substrate used in the continuous coating method. More specifically, the present invention relates to a method for continuously coating a cylindrical base material in which the coating liquid is applied to the outer peripheral surface of the cylindrical base material by a vertical coating means while stacking the cylindrical base materials with their cylinder axes aligned and pushing up from the bottom.

【0002】[0002]

【従来の技術】エンドレスに形成された連続面を有する
円筒状基材の外面上への薄膜で均一な塗布に関連してス
プレー塗布法、浸漬塗布法、ブレード塗布法、ロール塗
布法等の種々の方法が検討されている。特に電子写真感
光体ドラムのような薄膜で均一な塗布については生産性
の優れた塗布装置を開発すべく検討されている。しかし
ながら、いずれも均一な塗膜が得られなかったり、生産
性が悪い等の短所があった。
2. Description of the Related Art Various methods such as spray coating, dip coating, blade coating, roll coating, etc. are used in connection with thin and uniform coating on the outer surface of a cylindrical substrate having a continuous surface formed endlessly. Methods are being considered. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop a coating apparatus having excellent productivity. However, there were disadvantages such as that a uniform coating film could not be obtained and productivity was poor.

【0003】スプレー塗布法では、スプレーガンより噴
出した塗布液滴が該エンドレスに形成された連続面を有
する円筒状基材の外周面上に到達するまでに溶媒が蒸発
するために塗布液滴の固形分濃度が上昇してしまい、そ
れにともない塗布液滴の粘度上昇が起って液滴が面に到
達したとき、液滴が面上を充分に広がらないために、或
いは乾燥固化してしまった粒子が表面に付着するため
に、塗布表面の平滑性の良いものがえられない。また、
該連続面を有する円筒状基材への液滴の到達率が100
%でなく塗布液のロスがあったり、部分的にも不均一で
あるため、膜厚コントロールが非常に困難である。更
に、高分子溶液等では糸引きを起こす事があるため、使
用する溶媒及び樹脂に制限がある。
In the spray coating method, the solvent evaporates before the coating droplet ejected from the spray gun reaches the outer peripheral surface of the endlessly formed cylindrical substrate having a continuous surface. When the solid concentration increased, and the viscosity of the applied droplets increased accordingly, and the droplets reached the surface, the droplets did not spread sufficiently on the surface, or dried and solidified. Since the particles adhere to the surface, a product having good smoothness on the coated surface cannot be obtained. Also,
The arrival rate of droplets on the cylindrical substrate having the continuous surface is 100
%, And the coating liquid is lost or partially non-uniform, making it very difficult to control the film thickness. Furthermore, since stringing may occur in a polymer solution or the like, the solvent and resin used are limited.

【0004】ブレード塗布法、ロール塗布法は例えば円
筒状基材の長さ方向にブレード若しくはロールを配置
し、該円筒状基材を回転させて塗布を行い円筒状基材を
1回転させたのち、ブレード若しくはロールを後退させ
るものである。しかしながらブレード若しくはロールを
後退させる際、塗布液の粘性により、塗布膜厚の一部に
他の部分より厚い部分が生じ、均一な塗膜が得られない
欠点がある。
In the blade coating method and the roll coating method, for example, a blade or a roll is arranged in the longitudinal direction of a cylindrical substrate, the cylindrical substrate is rotated to perform coating, and the cylindrical substrate is rotated once. , Blades or rolls are retracted. However, when the blade or the roll is retracted, there is a disadvantage that a portion of the coating film thickness is thicker than other portions due to the viscosity of the coating solution, and a uniform coating film cannot be obtained.

【0005】浸漬塗布法は、上記におけるような塗布液
表面の平滑性、塗布膜の均一性の悪い点は改良される。
[0005] The dip coating method improves the above-mentioned problems of poor surface smoothness of the coating solution and uniformity of the coating film.

【0006】しかし、塗布膜厚の制御が塗布液物性例え
ば粘度、表面張力、密度、温度等と塗布速度に支配さ
れ、塗布液物性の調整が非常に重要となる。また塗布速
度も低いし、塗布液槽を満たすためにはある一定量以上
の液量が必要である。さらに重層する場合、下層成分が
溶け出し塗布液槽が汚染されやすい等の欠点がある。
However, the control of the coating film thickness is governed by the properties of the coating liquid, such as viscosity, surface tension, density, temperature, etc., and the coating speed, and the adjustment of the physical properties of the coating liquid is very important. In addition, the coating speed is low, and a certain amount or more of liquid is required to fill the coating liquid tank. Further, when layers are formed, there is a disadvantage that the lower layer components are dissolved and the coating solution tank is easily contaminated.

【0007】そこで特開昭58−189061号公報に
記載の如く円形量規制型塗布装置(この中にはスライド
ホッパー型塗布装置が含まれる)が開発された。このス
ライドホッパー型塗布装置はエンドレスに形成された連
続周面を有する円筒状基材を連続的にその長手軸方向に
移動させながら、その周囲を環状に取り囲み、円筒状基
材の外周面に対して塗布液を塗布するものであって、さ
らにこの塗布装置は環状の塗布液溜まり室と、この塗布
液溜まり室内の一部に対して外部から塗布液を供給する
供給口と、前記塗布液溜まり室の内方に開口する塗布液
分配スリットとを有し、このスリットから流出した塗布
液を斜め下方に傾斜する塗布液スライド面上に流下さ
せ、塗布液スライド面の下端のホッパー塗布面と円筒状
基材との僅かな間隙部分にビードを形成し、円筒状基材
の移動に伴ってその外周面に塗布するものである。この
スライドホッパー型塗布装置を用いることにより、少な
い液量で塗布でき、塗布液が汚染されず、生産性の高
い、膜厚制御の容易な塗布が可能となった。
[0007] Therefore, as disclosed in Japanese Patent Application Laid-Open No. 58-189061, a circular amount-regulated type coating apparatus (including a slide hopper type coating apparatus) has been developed. This slide hopper type coating apparatus surrounds the periphery of the cylindrical base material while continuously moving the cylindrical base material having a continuous peripheral surface formed endlessly in the longitudinal axis direction, and with respect to the outer peripheral surface of the cylindrical base material. The coating apparatus further includes a ring-shaped coating liquid storage chamber, a supply port for supplying a coating liquid from outside to a part of the coating liquid storage chamber, and the coating liquid storage chamber. A coating liquid distributing slit which is opened inside the chamber, and the coating liquid flowing out of the slit is caused to flow down onto the coating liquid slide surface inclined obliquely downward, and the hopper coating surface and the cylinder at the lower end of the coating liquid slide surface A bead is formed in a slight gap portion between the cylindrical base material and the bead is applied to the outer peripheral surface thereof as the cylindrical base material moves. By using this slide hopper type coating apparatus, coating can be performed with a small amount of liquid, the coating liquid is not contaminated, and the coating with high productivity and easy control of the film thickness can be performed.

【0008】[0008]

【発明が解決しようとする課題】前記スライドホッパー
型塗布装置は、円筒状基材の筒軸を合わせて積み重ねて
搬送し、環状塗布手段により前記円筒状基材の外周面に
塗布液を連続的に塗布する垂直型連続塗布装置であり、
その高生産性等の点で優れており注目されている。しか
しながら、垂直型連続塗布装置においては、円筒状基材
を筒軸を合わせて積み重ねて塗布するため、円筒状基材
の寸法精度が悪い場合は、上の方に積み重ねられた円筒
状基材の筒軸がずれて塗布装置や位置決め装置と接触
し、円筒状基材若しくは下層塗布膜に傷が付くという問
題点があった。
In the slide hopper type coating apparatus, the cylindrical base material is stacked and conveyed while aligning the cylindrical axes of the cylindrical base material, and the coating liquid is continuously applied to the outer peripheral surface of the cylindrical base material by an annular coating means. Vertical continuous coating device
It is excellent in terms of its high productivity and the like, and is attracting attention. However, in the vertical continuous coating apparatus, since the cylindrical base material is stacked and coated with the cylinder axis aligned, if the dimensional accuracy of the cylindrical base material is poor, the cylindrical base material stacked on the upper side is There has been a problem that the cylinder axis is shifted and comes into contact with the coating device or the positioning device, and the cylindrical substrate or the lower coating film is damaged.

【0009】また、下から積み上げられた円筒状基材は
まず位置決め装置に導入され垂直型環状塗布装置と軸芯
を合わせ、その後、環状塗布装置により外周面に塗布液
が塗布される。
Further, the cylindrical substrates stacked from below are first introduced into a positioning device, where the cylindrical core is aligned with the vertical annular coating device, and thereafter, the coating liquid is applied to the outer peripheral surface by the annular coating device.

【0010】位置決め装置は、例えばその内周面と円筒
状基材の外周面とでつくる100μm以下の隙間に空気
等の流体を吹き付けて円筒状基材を位置決めする装置で
あり、円筒状基材の真円度が悪い場合、円周方向の塗布
ムラが発生したり、位置決め装置の内周面と円筒状基材
の外周面とが接触して円筒状基材の外周面に傷を付けて
画像欠陥を発生したり、位置決め手段や塗布手段を損傷
させる恐れがある。最悪の場合には塗布工程の中断とな
る。
The positioning device is a device for positioning a cylindrical substrate by spraying a fluid such as air into a gap of 100 μm or less formed between the inner peripheral surface and the outer peripheral surface of the cylindrical substrate. If the roundness is poor, uneven coating may occur in the circumferential direction, or the inner peripheral surface of the positioning device may come into contact with the outer peripheral surface of the cylindrical base material to scratch the outer peripheral surface of the cylindrical base material. There is a risk of causing image defects and damaging the positioning means and the coating means. In the worst case, the coating process is interrupted.

【0011】また、直角度が悪い場合も、円筒状基材が
垂直的に積み重ねられないため、位置決め装置に導入す
る時や分離排出時に、入口で擦傷を生じたり、振動発生
による画像欠陥や塗布ムラを発生する。
Further, even when the perpendicularity is poor, the cylindrical substrates are not stacked vertically, so that they may be scratched at the entrance when introduced into the positioning device or separated and discharged, or image defects or coatings caused by vibration may occur. Unevenness occurs.

【0012】さらに、円筒状基材の肉厚が大きいと、位
置決め手段通過時に、円筒状基材の位置修正が確実に行
われず、円筒状基材の外周面に擦傷を発生することがあ
る。このため位置決め手段のエア圧力を増せば、円筒状
基材の移動による位置決めは可能になるが、エア振動が
増加することにより、塗布ムラが発生する恐れがある。
Further, if the thickness of the cylindrical base material is large, the position of the cylindrical base material cannot be reliably corrected when passing through the positioning means, and the outer peripheral surface of the cylindrical base material may be scratched. For this reason, if the air pressure of the positioning means is increased, positioning can be performed by moving the cylindrical base material, but coating vibration may be generated due to increased air vibration.

【0013】本発明の目的は、垂直型環状塗布装置によ
り感光液を塗布するとき、円筒状基材もしくは下層の塗
布層に傷が付いたり、塗布ムラを発生することがなく、
且つ、位置決め手段や塗布手段を損傷することのない連
続塗布方法を提供することにある。
An object of the present invention is to provide a vertical annular coating apparatus which does not damage the cylindrical substrate or the lower coating layer and does not cause uneven coating when the photosensitive liquid is coated by the vertical annular coating apparatus.
Another object of the present invention is to provide a continuous coating method that does not damage the positioning means and the coating means.

【0014】[0014]

【課題を解決するための手段】上記目的を達成する本発
明の円筒状基材は、円筒状基材の筒軸を合わせて積み重
ねて搬送し、環状塗布手段により前記円筒状基材の外周
面に塗布液を連続的に塗布する連続塗布方法に用いられ
る円筒状基材において、前記円筒状基材の肉厚が1.5
mm以下、真円度が80μm以下であり、且つ、直角度
が80μm以下であることを特徴とするものである(請
求項1の発明)。
The cylindrical substrate of the present invention, which achieves the above objects, is stacked and transported with the cylindrical axis of the cylindrical substrate aligned, and the outer peripheral surface of the cylindrical substrate is applied by an annular coating means. In a cylindrical substrate used in a continuous coating method of continuously applying a coating liquid to a substrate, the thickness of the cylindrical substrate is 1.5.
mm or less, the roundness is 80 μm or less, and the squareness is 80 μm or less (the invention of claim 1).

【0015】また、本発明の円筒状基材の連続塗布方法
は、円筒状基材の筒軸を合わせて積み重ねて搬送し、環
状塗布装置により前記円筒状基材の外周面に塗布液を連
続的に塗布する連続塗布方法において、前記円筒状基材
の肉厚が1.5mm以下、真円度が80μm以下であ
り、且つ、直角度が80μm以下である円筒状基材を用
いることを特徴とするものである(請求項2の発明)。
Further, in the method for continuously coating a cylindrical substrate according to the present invention, the cylindrical substrate is aligned, stacked, conveyed, and the coating liquid is continuously applied to the outer peripheral surface of the cylindrical substrate by an annular coating device. In the continuous coating method, the thickness of the cylindrical substrate is 1.5 mm or less, the roundness is 80 μm or less, and the squareness is 80 μm or less. (The invention of claim 2).

【0016】[0016]

【発明の実施の形態】以下、図面を用いて本発明の実施
の形態を説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0017】図1は本発明に係わる連続塗布装置の全体
構成を示す斜視図である。図において、10は導電性支
持体から成る円筒状基材1(1A〜1F)を塗布手段の
垂直下方の所定位置に供給して上方に押し上げる供給手
段、20は供給された円筒状基材1の外周面を把持して
筒軸を合わせて積み重ね下から上へ垂直に押し上げて搬
送する把持搬送手段、30は前記円筒状基材1を塗布装
置の環状塗布部の中心に位置合わせする位置決め手段、
40は前記円筒状基材の外周面上に塗布液を連続的に塗
布する塗布手段、50は円筒状基材1上に塗布された塗
布液を乾燥させる乾燥手段、60は乾燥されて垂直搬送
されてきた積み重ね状の複数の円筒状基材から分離させ
て1個ずつ取り出し排出させる分離排出手段である。
FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention. In the figure, reference numeral 10 denotes supply means for supplying a cylindrical base material 1 (1A to 1F) made of a conductive support to a predetermined position vertically below the coating means and pushing it upward, and reference numeral 20 denotes a supplied cylindrical base material 1. Gripping / transporting means for gripping the outer peripheral surface of the cylinder, aligning the cylinder axis, vertically pushing up from the bottom and transporting the pile, and conveying means 30 for positioning the cylindrical substrate 1 at the center of the annular coating section of the coating apparatus. ,
40 is a coating means for continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material, 50 is a drying means for drying the coating liquid applied on the cylindrical base material 1, and 60 is the dried and vertically conveyed. This is a separation / discharge unit that separates from a plurality of stacked cylindrical base materials and takes out and discharges one by one.

【0018】本発明の連続塗布装置は、上記の各手段を
連続して垂直中心線Z−Z上に配置した構成であり、人
手を要しない完全自動化生産が高精度で達成される。即
ち、前記供給手段10は前記円筒状基材1を載置するた
めの複数の取り付け手段11を備えた可動テーブル1
2、該可動テーブル12を回転させて前記把持搬送手段
20へつながる垂直ラインへ送り込む駆動手段13、前
記把持搬送手段20により既に上方に把持搬送されてい
る円筒状基材1を積み重なるように上方に押し上げる昇
降手段14、該昇降手段14の上端に設けられた円筒状
基材供給用のハンド手段15及び前記駆動手段13によ
る回転や昇降手段14による押し上げのタイミングを制
御する図示しない制御手段等から構成されている。な
お、前記可動テーブル12上への円筒状基材1の供給
は、ロボットハンドルにより行われる。
The continuous coating apparatus according to the present invention has a configuration in which the above-described units are continuously arranged on the vertical center line ZZ, so that fully automated production that requires no manual operation can be achieved with high precision. That is, the supply means 10 is a movable table 1 having a plurality of mounting means 11 for mounting the cylindrical substrate 1 thereon.
2. A driving means 13 for rotating the movable table 12 to feed it to a vertical line connected to the gripping / transporting means 20, and the cylindrical substrate 1 already gripped and transported upward by the gripping / transporting means 20 is stacked upward. It comprises a lifting means 14 for pushing up, a hand means 15 for supplying a cylindrical base material provided at an upper end of the lifting means 14, and a control means (not shown) for controlling rotation by the driving means 13 and timing of pushing up by the lifting means 14. Have been. The supply of the cylindrical substrate 1 onto the movable table 12 is performed by a robot handle.

【0019】前記供給手段10の上方に設けられた把持
搬送手段20は、円筒状基材1の外周面に圧接離間可能
で且つ垂直上下方向に移動可能な2組の把持手段21,
22を有し、円筒状基材1を位置決めして把持し上方に
搬送する機能を有する。
The gripping / transporting means 20 provided above the supply means 10 is capable of pressing and separating from the outer peripheral surface of the cylindrical substrate 1 and moving vertically in the vertical direction.
22 and has a function of positioning, grasping and transporting the cylindrical substrate 1 upward.

【0020】図2は本発明に係わる連続塗布装置の全体
構成を示す斜視図である。図において、10は円筒状基
材1を塗布手段の垂直下方の所定位置に供給して上方に
押し上げる供給手段、20は供給された円筒状基材1の
外周面を把持して筒軸を合わせて積み重ね下から上へ垂
直に押し上げて搬送する把持搬送手段である。
FIG. 2 is a perspective view showing the entire structure of the continuous coating apparatus according to the present invention. In the figure, reference numeral 10 denotes supply means for supplying the cylindrical substrate 1 to a predetermined position vertically below the coating means and pushing it up, and reference numeral 20 denotes a cylinder axis which is held by gripping the outer peripheral surface of the supplied cylindrical substrate 1. This is a gripping / transporting unit that vertically pushes up and transports the stack from below.

【0021】把持搬送手段20の上方の垂直中心線Z−
Z上には、位置決め手段30A、塗布手段(垂直型環状
塗布手段)40A、乾燥手段50Aから成るユニット
A、位置決め手段30B、塗布手段(垂直型環状塗布手
段)40B、乾燥手段50Bから成るユニットB、位置
決め手段30C、塗布手段(垂直型環状塗布手段)40
C、乾燥手段50Cから成るユニットCの3組のユニッ
トが縦列配置されている。位置決め手段30A,30
B,30Cは、前記円筒状基材1を環状塗布装置の環状
塗布部の中心に位置合わせする。塗布手段40A,40
B,40Cは円筒状基材1の外周面上に所定の塗布液
(感光液)を連続的に塗布する。各塗布手段40A,4
0B,40Cからそれぞれ吐出された塗布液は、円筒状
基材1上に多層の塗布層を逐次形成する。
The vertical center line Z-
On Z, a unit A comprising positioning means 30A, coating means (vertical annular coating means) 40A, and drying means 50A, a positioning means 30B, a unit B comprising coating means (vertical annular coating means) 40B, and drying means 50B , Positioning means 30C, coating means (vertical annular coating means) 40
C, and three sets of units C including drying means 50C are arranged in tandem. Positioning means 30A, 30
B and 30C align the cylindrical substrate 1 with the center of the annular coating section of the annular coating device. Coating means 40A, 40
B and 40C continuously apply a predetermined coating liquid (photosensitive liquid) on the outer peripheral surface of the cylindrical substrate 1. Each coating means 40A, 4
The coating liquids respectively discharged from OB and 40C sequentially form a multilayer coating layer on the cylindrical substrate 1.

【0022】塗布手段40Aは位置決め手段30Aの上
に固定されており、位置決め手段30Aは図示省略した
保持手段により保持されている。同様にして、塗布手段
40Bは位置決め手段30Bの上に固定され、塗布手段
40Cは位置決め手段30Cの上に固定されている。
The coating means 40A is fixed on the positioning means 30A, and the positioning means 30A is held by holding means (not shown). Similarly, the application unit 40B is fixed on the positioning unit 30B, and the application unit 40C is fixed on the positioning unit 30C.

【0023】位置決め手段30A,30B,30Cは円
筒状基材1を所定の位置に正確に保持する装置であり、
例えばエアーベアリング等により非接触保持される。塗
布手段40A,40B,40Cは円筒状基材1の外周面
上に塗布液を均一に塗布するものであり、円筒状基材1
が把持搬送手段20により把持搬送されるに従って、円
筒状基材1上に塗膜層が順次積層状に形成される。
The positioning means 30A, 30B and 30C are devices for accurately holding the cylindrical substrate 1 at a predetermined position.
For example, it is held in a non-contact manner by an air bearing or the like. The coating means 40A, 40B, and 40C apply the coating liquid uniformly on the outer peripheral surface of the cylindrical substrate 1.
Are gripped and transported by the gripping and transporting means 20, a coating layer is sequentially formed on the cylindrical substrate 1 in a laminated state.

【0024】乾燥手段50A,50B,50Cは円筒状
基材1上に重層塗布された塗布液を乾燥させる。最上段
には、乾燥されて垂直搬送されてきた積み重ね状の複数
の円筒状基材から分離させて1個ずつ取り出し排出させ
る前記分離排出手段60が配置されている。
The drying means 50A, 50B, 50C dries the coating solution applied on the cylindrical substrate 1 in a multilayer manner. At the uppermost stage, the separation / discharge means 60 for separating and discharging one by one from a plurality of stacked cylindrical base materials that have been dried and vertically conveyed is arranged.

【0025】本発明の連続塗布装置は、上記の各手段を
連続して垂直中心線Z−Z上に配置した構成であり、人
手を要しない完全自動化生産が高精度で達成される。即
ち、供給手段10は円筒状基材1を載置するための複数
の取り付け手段11を備えた可動テーブル12、該可動
テーブル12を回転させて前記把持搬送手段20へつな
がる垂直ラインへ送り込む駆動手段13、前記把持搬送
手段20により既に上方に把持搬送されている円筒状基
材1を積み重なるように上方に押し上げる昇降手段1
4、昇降手段14の上端に設けられた円筒状基材供給用
のハンド手段15、及び前記駆動手段13による回転や
昇降手段14による押し上げのタイミングを制御する図
示しない制御手段等から構成されている。なお、前記可
動テーブル12上への円筒状基材1の供給は、ロボット
ハンドルにより行われる。
The continuous coating apparatus of the present invention has a configuration in which the above-described units are continuously arranged on the vertical center line ZZ, and achieves fully automatic production with high accuracy without requiring any manpower. That is, the supply unit 10 includes a movable table 12 having a plurality of attachment units 11 for mounting the cylindrical substrate 1, and a driving unit that rotates the movable table 12 and feeds the movable table 12 to a vertical line connected to the gripping / conveying unit 20. 13. Elevating means 1 for pushing up cylindrical base materials 1 already gripped and transported upward by the gripping and transporting means 20 so as to be stacked.
4, a hand means 15 for supplying a cylindrical base material provided at the upper end of the elevating means 14, and a control means (not shown) for controlling the rotation of the driving means 13 and the timing of pushing up by the elevating means 14. . The supply of the cylindrical substrate 1 onto the movable table 12 is performed by a robot handle.

【0026】供給手段10の上方に設けられた把持搬送
手段20は、円筒状基材1の外周面に圧接離間可能で且
つ垂直上下方向に移動可能な2組の把持手段21,22
を有し、円筒状基材1を位置決めして把持し上方に搬送
する機能を有する。
The gripping / transporting means 20 provided above the supply means 10 can be pressed and separated from the outer peripheral surface of the cylindrical substrate 1 and can be moved vertically in two directions.
And has a function of positioning, gripping and transporting the cylindrical substrate 1 upward.

【0027】図3は把持搬送手段20の正面図である。
互いに相対向する一組の搬送装置本体23A,23Bの
内側には、それぞれ垂直上下方向に支持されたボールね
じ24A,24Bが設けられている。該各ボールねじ2
4A,24Bはそれぞれ駆動用モータ25A,25Bに
より正逆回転される。各ボールねじ24A,24Bにそ
れぞれ螺合する昇降部材26A,26Bは、ボールねじ
24A,24Bの正逆回転により直進昇降する。該昇降
部材26A,26Bにはそれぞれアーム部材27A,2
7Bが固定され、その各先端部にはそれぞれ前記把持手
段21,22が取り付けられた構成になっている。
FIG. 3 is a front view of the gripping / transporting means 20.
Ball screws 24A, 24B supported vertically in the vertical direction are provided inside the pair of transfer device bodies 23A, 23B opposed to each other. Each ball screw 2
4A and 24B are rotated forward and reverse by drive motors 25A and 25B, respectively. The elevating members 26A, 26B screwed to the ball screws 24A, 24B respectively move straight up and down by forward and reverse rotation of the ball screws 24A, 24B. The elevating members 26A, 26B are respectively provided with arm members 27A, 2B.
7B is fixed, and the gripping means 21 and 22 are attached to each end thereof.

【0028】搬送装置本体23A,23Bの間には、昇
降手段14が設置され、該昇降手段14の上端には、円
筒状基材供給用のハンド手段15が取り付けられてい
る。該ハンド手段15の上側には順に円筒状基材1D,
1C,1B,1Aが積載されている。最上段の円筒状基
材1Aは分離排出手段60の排出用ハンド61により分
離して取り出される。
An elevating means 14 is provided between the conveying device main bodies 23A and 23B, and a hand means 15 for supplying a cylindrical base material is attached to an upper end of the elevating means 14. On the upper side of the hand means 15, a cylindrical substrate 1D,
1C, 1B, and 1A are loaded. The uppermost cylindrical substrate 1A is separated and taken out by the discharge hand 61 of the separation / discharge means 60.

【0029】塗布手段40は位置決め手段30の垂直上
方に固定されており、位置決め手段30は図示省略した
保持手段により保持されている。位置決め手段30は円
筒状基材1を所定の位置に正確に保持する装置であり、
例えばエアーベアリング等により非接触保持される。塗
布手段40は円筒状基材1(1A,1B,1C,1D)
の外周面上に塗布液を均一に塗布する例えばスライドホ
ッパー型塗布装置であり、円筒状基材1A,1B,1
C,1Dが前記把持搬送手段20により把持搬送される
に従って、円筒状基材1A,1B,1C,1D上に順次
塗膜が形成される。
The application means 40 is fixed vertically above the positioning means 30, and the positioning means 30 is held by holding means (not shown). The positioning means 30 is a device that accurately holds the cylindrical substrate 1 at a predetermined position.
For example, it is held in a non-contact manner by an air bearing or the like. The coating means 40 is a cylindrical substrate 1 (1A, 1B, 1C, 1D)
For example, a slide hopper type coating device for uniformly coating the coating liquid on the outer peripheral surface of the cylindrical base material 1A, 1B, 1
As C and 1D are gripped and transported by the gripping and transporting means 20, a coating film is sequentially formed on the cylindrical substrates 1A, 1B, 1C and 1D.

【0030】図4は、位置決め手段30と塗布手段40
とを示す断面図である。
FIG. 4 shows the positioning means 30 and the coating means 40.
FIG.

【0031】図4に示されるように、垂直中心線Z−Z
に沿って垂直状に重ね合わせた複数の円筒状基材1A,
1B,1C(以下、円筒状基材1と称す)は連続的に矢
示方向に上昇移動され、位置決め手段30及び塗布手段
40を通過する。
As shown in FIG. 4, the vertical center line ZZ
A plurality of cylindrical substrates 1A vertically stacked along
1B and 1C (hereinafter, referred to as the cylindrical substrate 1) are continuously moved upward in the arrow direction, and pass through the positioning means 30 and the application means 40.

【0032】塗布手段40の下部には、円筒状基材の円
周方向を位置決めする位置決め手段30が固定されてい
る。前記円筒状基材1の位置決め装置30の本体31に
は、複数の給気口32と、複数の排気口33が穿設され
ている。該複数の給気口32は、図示しない給気ポンプ
に接続され、空気等の流体が圧送される。該給気口32
の一端部で円筒状基材1の外周面に対向する側には、吐
出口34が貫通している。該吐出口34は前記円筒状基
材1の外周面と所定の間隙を保って対向している。該間
隙は、20μm〜3mm、好ましくは30μm〜2mm
である。この間隙が20μmより小さいと、円筒状基材
1の僅かな振れで本体31の内壁に接触して円筒状基材
1を傷つけやすい。また、この間隙が3mmより大であ
ると、円筒状基材1の位置決め精度が低下する。前記吐
出口34は直径0.01〜1.0mmの小口径のノズル
であり、好ましくは0.05〜0.5mmが良い。
Below the coating means 40, a positioning means 30 for positioning the cylindrical substrate in the circumferential direction is fixed. A plurality of air inlets 32 and a plurality of air outlets 33 are formed in the main body 31 of the positioning device 30 for the cylindrical substrate 1. The plurality of air supply ports 32 are connected to an air supply pump (not shown), and a fluid such as air is pumped. The air supply port 32
A discharge port 34 penetrates through the one end of the cylindrical base 1 facing the outer peripheral surface of the cylindrical base 1. The discharge port 34 faces the outer peripheral surface of the cylindrical substrate 1 with a predetermined gap. The gap is 20 μm to 3 mm, preferably 30 μm to 2 mm
It is. If this gap is smaller than 20 μm, the cylindrical substrate 1 is likely to be damaged due to the slight vibration of the cylindrical substrate 1 coming into contact with the inner wall of the main body 31. Further, if the gap is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 is reduced. The discharge port 34 is a small-diameter nozzle having a diameter of 0.01 to 1.0 mm, preferably 0.05 to 0.5 mm.

【0033】本体31の内壁下部の内周面は、入り口側
が広がったテーパー面35になっている。このテーパー
面35は、例えば軸方向の長さが50mmで、片側傾斜
角が0.5mmの円錐面である。このテーパー面35を
設けることにより、円筒状基材1が本体31の内壁に進
入するとき、円筒状基材1の先端部が内壁の内周面に接
触することを防止している。
The inner peripheral surface of the lower part of the inner wall of the main body 31 is formed as a tapered surface 35 whose entrance side is widened. The tapered surface 35 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. By providing the tapered surface 35, when the cylindrical substrate 1 enters the inner wall of the main body 31, the tip of the cylindrical substrate 1 is prevented from contacting the inner peripheral surface of the inner wall.

【0034】給気ポンプから圧送された流体は、複数の
給気口32から本体31の内部に導入されて、複数の吐
出口34から吐出され、円筒状基材1A(1B)の外周
面と均一な流体膜層を形成する。吐出後の流体は複数の
排気口33から装置外に排出される。
The fluid pressure-fed from the air supply pump is introduced into the main body 31 from the plurality of air inlets 32, is discharged from the plurality of outlets 34, and contacts the outer peripheral surface of the cylindrical substrate 1A (1B). Form a uniform fluid film layer. The discharged fluid is discharged out of the apparatus from the plurality of exhaust ports 33.

【0035】吐出口34の開口直径は0.01〜1m
m、好ましくは0.05〜0.5mm、例えば0.2〜
0.5mmの円形に形成されている。排気口33の開口
直径は1.0〜10mm、好ましくは2.0〜8.0m
m、例えば3〜5mmの円形に形成されている。
The opening diameter of the discharge port 34 is 0.01 to 1 m.
m, preferably 0.05 to 0.5 mm, for example 0.2 to
It is formed in a 0.5 mm circular shape. The opening diameter of the exhaust port 33 is 1.0 to 10 mm, preferably 2.0 to 8.0 m.
m, for example, a circular shape of 3 to 5 mm.

【0036】給気口32に供給される流体は、空気、不
活性ガス例えば窒素ガスが良い。そして該流体は、JI
S規格でクラス100以上の清浄な気体が良い。
The fluid supplied to the air supply port 32 is preferably air, an inert gas such as nitrogen gas. And the fluid is JI
A clean gas of class 100 or higher in S standard is good.

【0037】位置決め手段30の上部には、塗布手段4
0が固定されている。塗布手段40は、円筒状基材1の
周囲を取り囲み、円筒状基材1の外周面に対し塗布手段
40の塗布に直接係わる部分の塗布ヘッド(コーター、
ホッパー塗布面)41により塗布液(感光液)Lを塗布
する。なお、円筒状基材1としては中空ドラム例えばア
ルミニウム合金ドラム、プラスチックドラムのほかシー
ムレスベルト型の基材でも良い。
On top of the positioning means 30, the coating means 4
0 is fixed. The coating means 40 surrounds the periphery of the cylindrical substrate 1, and the coating head (coater,
A coating liquid (photosensitive liquid) L is applied by a hopper application surface 41. The cylindrical substrate 1 may be a hollow drum, for example, an aluminum alloy drum, a plastic drum, or a seamless belt type substrate.

【0038】ホッパー塗布面41には、円筒状基材1側
に開口する塗布液流出口42を有する幅狭の塗布液分配
スリット(以下スリットと略称する)43が水平方向に
形成されている。このスリット43は環状の塗布液分配
室(塗布液溜り室)44に連通し、この環状の塗布液分
配室44には貯留タンク2内の塗布液Lを圧送ポンプ3
により供給管4を介して供給するようになっている。
On the hopper coating surface 41, a narrow coating liquid distribution slit (hereinafter abbreviated as slit) 43 having a coating liquid outlet 42 opening toward the cylindrical substrate 1 is formed in the horizontal direction. The slit 43 communicates with an annular coating liquid distribution chamber (coating liquid reservoir) 44, and the annular coating liquid distribution chamber 44 feeds the coating liquid L in the storage tank 2 to the pump 3.
The supply is made via the supply pipe 4.

【0039】他方、スリット43の塗布液流出口42の
下側には、連続して下方に傾斜し、円筒状基材1の外径
寸法よりやや大なる寸法で終端をなすように形成された
塗布液スライド面45が形成されている。さらに、この
塗布液スライド面45終端より下方に延びる唇状部46
が形成されている。
On the other hand, below the coating liquid outlet 42 of the slit 43, the slit 43 is continuously inclined downward so as to terminate at a dimension slightly larger than the outer diameter of the cylindrical substrate 1. A coating liquid slide surface 45 is formed. Further, a lip 46 extending downward from the end of the application liquid slide surface 45.
Are formed.

【0040】かかる塗布手段40による塗布において
は、円筒状基材1を引き上げる過程で、塗布液Lをスリ
ット43から押し出し、スライド面45に沿って流下さ
せると、塗布液スライド面45の終端に至った塗布液
は、その塗布液スライド面45の終端と円筒状基材1の
外周面との間にビードを形成した後、円筒状基材1の表
面に塗布される。
In the application by the application means 40, when the application liquid L is pushed out from the slit 43 and flows down along the slide surface 45 in the process of lifting the cylindrical substrate 1, the application liquid L reaches the end of the application liquid slide surface 45. The formed coating liquid is applied to the surface of the cylindrical substrate 1 after forming a bead between the end of the coating liquid slide surface 45 and the outer peripheral surface of the cylindrical substrate 1.

【0041】塗布液スライド面45の終端と円筒状基材
1は、ある間隙を持って配置されているため円筒状基材
1を傷つける事なく、また性質の異なる層を多層形成さ
せる場合においても、既に塗布された層を損傷すること
なく塗布できる。
Since the end of the coating liquid slide surface 45 and the cylindrical substrate 1 are arranged with a certain gap therebetween, the cylindrical substrate 1 is not damaged, and even when layers having different properties are formed in multiple layers. , Can be applied without damaging already applied layers.

【0042】一方、前記圧送ポンプ3の塗布液供給部よ
り最も遠い位置で、前記塗布液分配室44の一部には、
塗布液分配室44内の泡抜き用の空気抜き部材46が設
けられている。貯留タンク2内の塗布液Lが塗布液分配
室44に供給されてスリット43から塗布液流出口42
に供給されるとき、開閉弁47を開いて空気抜き部材4
8より塗布液分配室44内の空気を排出する。
On the other hand, at a position furthest from the application liquid supply section of the pressure feed pump 3, a part of the application liquid distribution chamber 44
An air release member 46 for removing bubbles in the coating liquid distribution chamber 44 is provided. The coating liquid L in the storage tank 2 is supplied to the coating liquid distribution chamber 44, and the coating liquid
, The on-off valve 47 is opened and the air vent member 4 is opened.
From 8, the air in the coating liquid distribution chamber 44 is discharged.

【0043】なお、本発明に係わる位置決め手段に接続
される垂直型環状塗布手段としては、スライドホッパー
型、押し出し型、リングコーター、スプレーコーター等
の各種装置が用いられ、何れも円筒状基材を軸方向に積
み重ねて、上方または下方に相対的に移動することによ
り塗布するもので、何れの塗布方式も適用可能である
が、塗布性、信頼性等の点でスライドホッパー型塗布手
段が優れている。
As the vertical annular coating means connected to the positioning means according to the present invention, various devices such as a slide hopper type, an extrusion type, a ring coater and a spray coater are used. The coating is performed by stacking in the axial direction and moving relatively upward or downward, and any coating method can be applied. However, the slide hopper type coating means is superior in terms of coating properties and reliability. I have.

【0044】前記塗布手段40の上方には、乾燥フード
51と乾燥器53とから成る乾燥手段50が設けられて
いる(図1、図2参照)。
Above the coating means 40, a drying means 50 comprising a drying hood 51 and a dryer 53 is provided (see FIGS. 1 and 2).

【0045】図5は、把持搬送手段20と位置決め手段
30の相対位置関係を示す断面図である。
FIG. 5 is a sectional view showing the relative positional relationship between the gripping / conveying means 20 and the positioning means 30.

【0046】図5(a)は、2個のハンド部214,2
15の内側にそれぞれ固定された把持子216を有する
上段側の把持手段21が、円筒状基材1D,1Eの端面
間の接続部(繋ぎ部)K付近の外周面を把持した状態を
示す。また、2個のハンド部224,225の内側にそ
れぞれ固定された把持子226を有する下段側の把持手
段22は、円筒状基材1Eの下端付近の外周面を把持す
るため待機している。
FIG. 5A shows two hand units 214 and 2
15 shows a state in which the upper gripping means 21 having grippers 216 respectively fixed inside 15 grips the outer peripheral surface in the vicinity of a connecting portion (connecting portion) K between the end surfaces of the cylindrical substrates 1D and 1E. The lower gripping means 22 having grippers 226 fixed inside the two hand portions 224 and 225 are on standby to grip the outer peripheral surface near the lower end of the cylindrical substrate 1E.

【0047】前記上段側の把持手段21に把持された円
筒状基材1Dの上端面の上部には、円筒状基材1Cが、
更にその上方には円筒状基材1B,1Aが自重で載置さ
れている。把持手段21に把持された前記円筒状基材1
Dの上に載置されている円筒状基材1Cの上端側は、前
記位置決め手段30に未だ進入していない状態にあり、
その円筒面には外力が加えられていない状態である。
On the upper part of the upper end surface of the cylindrical substrate 1D gripped by the upper gripping means 21, a cylindrical substrate 1C is provided.
Further above, the cylindrical substrates 1B and 1A are placed under their own weight. The cylindrical substrate 1 gripped by the gripping means 21
The upper end side of the cylindrical base material 1C placed on D has not yet entered the positioning means 30,
No external force is applied to the cylindrical surface.

【0048】図5(b)は、上段側の把持手段21が、
円筒状基材1Dの円筒面の上端側付近で、円筒状基材1
Cとの繋ぎ部Kの下方の位置を把持した状態を示す。ま
た、下段側の把持手段22は、円筒状基材1Dの下端付
近の外周面を把持するため待機している。
FIG. 5B shows that the upper gripping means 21
Near the upper end side of the cylindrical surface of the cylindrical substrate 1D, the cylindrical substrate 1
4 shows a state where a position below a connecting portion K with C is grasped. Further, the lower gripping means 22 is on standby to grip the outer peripheral surface near the lower end of the cylindrical substrate 1D.

【0049】前記上段側の把持手段21の上面と、位置
決め手段30の入口部下面との間には、外力の加えられ
ていない円筒状基材(1C)が少なくとも1個存在す
る。このような円筒状基材の把持方法においても、前記
上段側の把持手段21による把持及び把持解除時や、昇
降駆動時に発生した振動により、把持された円筒状基材
1Dから伝達された振動は、前記外力の加えられていな
い円筒状基材1Cに吸収されて、位置決め中の円筒状基
材1Bや、塗布中の円筒状基材1Aには伝達されない。
Between the upper surface of the upper gripping means 21 and the lower surface of the entrance of the positioning means 30, there is at least one cylindrical substrate (1C) to which no external force is applied. Even in such a method of gripping the cylindrical base material, the vibration transmitted from the gripped cylindrical base material 1D due to the vibration generated at the time of gripping and release by the gripping means 21 on the upper stage side and at the time of lifting / lowering drive is not performed. Is absorbed by the cylindrical substrate 1C to which no external force is applied, and is not transmitted to the cylindrical substrate 1B during positioning or the cylindrical substrate 1A during coating.

【0050】前記の連続塗布装置においては、円筒状基
材1が垂直型環状塗布手段40の塗布ヘッド41を正
確、安定、順調に連続通過し、かつ塗布ヘッド41から
円筒状基材1の外周面上に所定膜厚で均一に塗布される
ためには、円筒状基材1の垂直軸線が塗布ヘッド41の
中心線に正確かつ安定に位置し、かつ、円筒状基材1の
外周面と塗布ヘッド41との距離が一定であることが必
須条件となる。
In the continuous coating apparatus, the cylindrical substrate 1 passes the coating head 41 of the vertical annular coating means 40 continuously, accurately, stably and smoothly. In order to apply the film uniformly on the surface with a predetermined film thickness, the vertical axis of the cylindrical substrate 1 is accurately and stably positioned at the center line of the coating head 41, and the outer peripheral surface of the cylindrical substrate 1 It is an essential condition that the distance from the coating head 41 is constant.

【0051】本発明者らは、円筒状基材1の真円度及び
直角度と、連続塗布装置の位置決め手段及び環状塗布手
段との問題点を種々検討した。
The present inventors have studied variously the problems of the roundness and squareness of the cylindrical substrate 1 and the positioning means and the annular coating means of the continuous coating apparatus.

【0052】前記真円度及び直角度は、JIS B 0
621「幾何偏差の定義及び表示」に示される。
The circularity and squareness are determined according to JIS B 0
621 “Definition and display of geometric deviation”.

【0053】即ち、真円度は、「真円度とは、円形形体
の幾何学的に正しい円からの狂いの大きさをいう。」と
定義されている。また、真円度の表示は、「真円度は、
円形形体(C)を二つの同心の幾何学的円で挟んだと
き、同心二円の間隔が最小となる場合の、二円の半径の
差(f)で表し、真円度 mm又は μmと表示す
る。」と示されている(図6参照)。
In other words, the roundness is defined as "the roundness is a deviation of a circular shape from a geometrically correct circle". In addition, the display of the roundness is "
When the circular shape (C) is sandwiched between two concentric geometric circles, the roundness is expressed by the difference (f) between the radii of the two circles when the interval between the two concentric circles is minimized. mm or Display as μm. (See FIG. 6).

【0054】図6(b)は円筒状基材1の直円度を80
μm以下に設定した本発明の円筒状基材1の形状を示す
模式図である。
FIG. 6B shows that the circularity of the cylindrical substrate 1 is 80.
It is a schematic diagram which shows the shape of the cylindrical base material 1 of this invention set to micrometer or less.

【0055】直角度は、「直角度とは、データム直線又
はデータム平面に対して直角な幾何学的直線又は幾何学
的平面からの直角であるべき直線形体又は平面形体の狂
いの大きさをいう。」と定義されている。また、直角度
の表示のうち、一方向の直角度の表示は、「一方向の直
角度の表示は、その方向とデータム平面(PD)に垂直
な幾何学的平行二平面でその直線形体(L)を挟んだと
きの、二平面の間隔(f)で表す。」と示されている
(図7(a)参照)。図7(b)は円筒状基材1の理想
的な形態を示す模式図である。図7(c)は、円筒状基
材1の直角度を80μm以下に設定した本発明の円筒状
基材1の形態を示す模式図である。
The perpendicularity is defined as “a perpendicularity is a magnitude of a deviation of a linear or plane feature that should be a right angle from a geometric straight line or a geometric plane perpendicular to a datum straight line or a datum plane. . ". Furthermore, the perpendicularity of the display of the display in one direction of perpendicularity, "Show unidirectional perpendicularity, the linear form in that direction and datum plane (P D) in the vertical geometrical two parallel planes (L) and the distance between the two planes when (L) is sandwiched) (see FIG. 7A). FIG. 7B is a schematic diagram showing an ideal form of the cylindrical substrate 1. FIG. 7 (c) is a schematic view showing the form of the cylindrical substrate 1 of the present invention in which the perpendicularity of the cylindrical substrate 1 is set to 80 μm or less.

【0056】本発明者らは種々検討の結果、様々な真円
度、直角度、肉厚で作成した円筒状基材1を用いて垂直
塗布により円筒状基材1に塗布を行った結果、真円度8
0μm以下、且つ直角度80μm以下、且つ肉厚1.5
mm以下の円筒状基材を用いた場合に、円筒状基材1に
こすれ傷が付きにくいことが判明した。
As a result of various studies, the inventors of the present invention have performed a vertical application using the cylindrical substrate 1 having various roundness, squareness, and thickness, and applied the cylindrical substrate 1 to the cylindrical substrate 1. Roundness 8
0 μm or less, squareness 80 μm or less, and wall thickness 1.5
It has been found that when a cylindrical substrate having a diameter of not more than 1 mm is used, the cylindrical substrate 1 is not easily scratched.

【0057】真円度が80μmより大きいと、円周方向
での塗布ムラがひどくなったり、塗布ヘッド41や位置
決め手段(エアベアリング)30の内壁と接触して、画
像欠陥を発生したり、さらに悪い場合には、塗布中断と
なる。
When the roundness is larger than 80 μm, the coating unevenness in the circumferential direction becomes severe, and the coating head 41 and the inner wall of the positioning means (air bearing) 30 come into contact with each other to cause image defects. If not, the application is interrupted.

【0058】直角度が80μmより大きいと、位置決め
手段30を通過するときや、分離排出手段60による分
離時に、振動が発生し画像欠陥や塗布ムラを生じる。
If the perpendicularity is larger than 80 μm, vibration occurs when passing through the positioning means 30 or when separating by the separating and discharging means 60, causing image defects and coating unevenness.

【0059】なお、円筒状基材1の肉厚が1.5mmよ
り大きいと、円筒状基材1の自重及び繋ぎ部Kにおける
接触摩擦力により、位置決め手段30の通過時の位置決
め移動調整が行われにくく、位置決め手段30の内周面
に摺接、または衝突して円筒状基材1の外周面に擦れ傷
が発生したり、塗布不良を生じる。円筒状基材1の肉厚
は1.5mm以下、好ましくは1.25mm以下が良
い。また、円筒状基材1の外径は、位置決め手段30の
通過時の位置決め移動調整を円滑に行うために、100
mm以下が好ましい。
If the thickness of the cylindrical substrate 1 is larger than 1.5 mm, the positioning movement of the cylindrical substrate 1 when passing through the positioning means 30 is adjusted by the dead weight of the cylindrical substrate 1 and the contact frictional force at the connecting portion K. The outer peripheral surface of the cylindrical substrate 1 is rubbed or collides with the inner peripheral surface of the positioning means 30 due to sliding or collision, and poor coating occurs. The thickness of the cylindrical substrate 1 is 1.5 mm or less, preferably 1.25 mm or less. The outer diameter of the cylindrical substrate 1 is set at 100 to facilitate smooth positioning movement adjustment when passing through the positioning means 30.
mm or less is preferable.

【0060】[0060]

【実施例】アルミニウム合金製パイプを用いて、外径8
0mm、肉厚が1.0mm、1.25mm、1.5m
m、1.75mm、2.00mmの5種類の円筒状基材
をそれぞれ2,000本作成した。これらの円筒状基材
を前記JIS B 0621の規格に基づき寸法測定を
実施し、真円度、直角度の測定値により表1の通り、A
〜Iに分類した。
EXAMPLE Using an aluminum alloy pipe, the outer diameter was 8 mm.
0mm, thickness 1.0mm, 1.25mm, 1.5m
2,000 pieces of five types of cylindrical base materials each having a length of 1.75 mm and 2.00 mm were prepared. The dimensions of these cylindrical substrates were measured in accordance with the standard of JIS B 0621.
~ I.

【0061】[0061]

【表1】 [Table 1]

【0062】図2の逐次連続塗布装置を用い、鏡面加工
を施した直径80mm、高さ355mmのアルミニウム
ドラム支持体上に、下記の如く各々塗布液組成物UC
L−1、CGL−1、CTL−1を調整し、第一の
スライドホッパー型の塗布手段40A(UCL−1
用)、第二の塗布手段40B(CGL−1用)、第三
の塗布手段40C(CTL−1用)にて実施例1と同
様にして3層の逐次重層塗布を行った。なお、乾燥膜厚
としてはUCL−1は0.3μm、CGL−1は0.5
μm、CTL−1は27μmとした。
Using a sequential coating apparatus shown in FIG. 2, a coating liquid composition UC was formed on a mirror-finished aluminum drum support having a diameter of 80 mm and a height of 355 mm as follows.
L-1, CGL-1, and CTL-1 were adjusted, and the first slide hopper type coating means 40A (UCL-1
), The second coating means 40B (for CGL-1), and the third coating means 40C (for CTL-1), and three successive layers were applied in the same manner as in Example 1. The dry film thickness was 0.3 μm for UCL-1 and 0.5 μm for CGL-1.
μm and CTL-1 were 27 μm.

【0063】 UCL−1塗布液組成物 共重合ナイロン樹脂(CM−8000 東レ社製) 3g メタノール/n−ブタノール=10/1 1000ml CGL−1塗布液組成物 ペリレン顔料(CGM−1) 500g ブチラール樹脂(エスレックBX−L 積水化学社製) 500g メチルエチルケトン 24000ml 上記塗布液組成物をサンドミルを用いて20時間分散し
たもの。
UCL-1 coating liquid composition Copolymer nylon resin (CM-8000, manufactured by Toray Industries) 3 g methanol / n-butanol = 10/1 1000 ml CGL-1 coating liquid composition Perylene pigment (CGM-1) 500 g butyral resin (Eslec BX-L, manufactured by Sekisui Chemical Co., Ltd.) 500 g Methyl ethyl ketone 24000 ml A dispersion of the above coating solution composition for 20 hours using a sand mill.

【0064】[0064]

【化1】 Embedded image

【0065】 CTL−1塗布液組成物 CTM−1 500g ポリカーボネート(Z−200 三菱瓦斯化学社製) 560g 1,2−ジクロロエタン 2800mlCTL-1 coating solution composition CTM-1 500 g Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 560 g 1,2-dichloroethane 2800 ml

【0066】[0066]

【化2】 Embedded image

【0067】これらの円筒状基材を前記図2の逐次連続
塗布装置を用いて重層塗布を行った。塗布、乾燥処理後
の円筒状基材の外観精密検査を行い、こすれ傷の発生本
数をカウントして表2の結果を得た。
These cylindrical substrates were subjected to multilayer coating using the sequential continuous coating apparatus shown in FIG. The appearance of the cylindrical base material after the coating and drying treatment was inspected closely, and the number of scratches generated was counted to obtain the results shown in Table 2.

【0068】[0068]

【表2】 [Table 2]

【0069】表2は前記表1に示す円筒状基材の真円
度、直角度の分類A〜Iと、円筒状基材の肉厚tとの相
関による、円筒状基材の発生分布を示す。表2中の分数
の分母は、検査対象の円筒状基材の本数を示し、分子は
こすれ傷の発生本数を示す。なお、分母の本数に示す円
筒状基材の総数は、肉厚1.0mm、1.25mm、
1.5mm、1.75mm、2.0mmの5種類の円筒
状基材をそれぞれ2,000本である。
Table 2 shows the distribution of occurrence of the cylindrical base material based on the correlation between the roundness and squareness classification A to I of the cylindrical base material shown in Table 1 and the thickness t of the cylindrical base material. Show. The denominator of the fraction in Table 2 indicates the number of cylindrical substrates to be inspected, and the numerator indicates the number of scratches generated. In addition, the total number of cylindrical base materials shown in the number of denominators is 1.0 mm in thickness, 1.25 mm,
Five kinds of cylindrical base materials of 1.5 mm, 1.75 mm and 2.0 mm are 2,000 each.

【0070】表2に示すように、真円度80μm以下
で、且つ直角度80μm以下、更に肉厚1.5mm以下
の円筒状基材を用いた場合に、こすれ傷(擦傷)がつき
にくいことが判る(分子のこすれ傷の発生本数は何れも
0本)。即ち、表1の二重枠で囲んだ分類A,B,D,
Eの円筒状基材が好適であり、特に、表2の分類A,
B,D,Eのうち、肉厚1.5mm以下の二重枠で囲ん
だ円筒状基材を用いた場合に最適である。
As shown in Table 2, when a cylindrical base material having a roundness of 80 μm or less, a squareness of 80 μm or less, and a wall thickness of 1.5 mm or less is used, scratches (abrasions) are unlikely to occur. (The number of occurrences of scratches on the molecule is 0). That is, the classifications A, B, D,
The cylindrical substrate of E is suitable, and in particular, the classifications A and
Among B, D, and E, it is most suitable when a cylindrical substrate surrounded by a double frame having a thickness of 1.5 mm or less is used.

【0071】得られた感光体をコニカ社製U−BIX
3035複写機で実写し、1000コピー後の画像を評
価をしたところ、画像欠陥(黒ポチ、白ポチ、ゴミ、ス
ジ、キズ)等がなく良好であった。
The obtained photoreceptor was manufactured by Konica U-BIX.
The actual image was taken with a 3035 copying machine, and the image after 1000 copies was evaluated. The image was good without any image defects (black spots, white spots, dust, streaks, scratches, etc.).

【0072】以上のように本発明に規定する円筒状基材
1を用いることにより、塗布ムラ、膜厚ムラ、キズ、ゴ
ミ、ドラム損傷等の塗膜欠陥がなく、塗布性の良好な塗
布ドラムが得られた。しかも長時間、多数本の安定な連
続塗布や完全自動化ができるため、ホコリ、ゴミ等が混
入せず高品質の製品が可能となった。
As described above, by using the cylindrical substrate 1 defined in the present invention, the coating drum having no coating defects such as coating unevenness, film thickness unevenness, scratches, dust, drum damage and the like and having good coating properties. was gotten. In addition, stable continuous application of a large number of tubes and complete automation can be performed for a long time, so that high-quality products can be obtained without contamination of dust and dirt.

【0073】[0073]

【発明の効果】本発明の第1発明の円筒状基材及び第2
発明の連続塗布方法によるときは、円筒状基材の供給、
把持搬送、位置決め、塗布、乾燥、分離排出の各手段を
連続配置して、上記手段の各工程を連続処理することを
可能にするものであるから、以下の優れた効果を奏す
る。
The cylindrical substrate and the second substrate according to the first invention of the present invention.
When according to the continuous coating method of the invention, supply of a cylindrical substrate,
Since the respective means for gripping and conveying, positioning, coating, drying, and separation and discharge are continuously arranged to enable the respective steps of the above means to be continuously processed, the following excellent effects are obtained.

【0074】(1)塗布手段や位置決め手段の内面に接
触せず、画像欠陥の発生がない。
(1) There is no contact with the inner surfaces of the coating means and the positioning means, and no image defects occur.

【0075】(2)真円度や直角度の悪い円筒状基材の
搬送による塗布中断がなく、長時間安定した塗布ができ
る。
(2) There is no interruption of application due to the transport of a cylindrical substrate having poor roundness or a perpendicularity, and stable application can be performed for a long time.

【0076】(3)円筒状基材上に形成された塗膜が均
一であり、塗布ムラや塗膜欠陥がなく塗布性が良好であ
る。
(3) The coating film formed on the cylindrical substrate is uniform, and has good coating properties without coating unevenness and coating defects.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係わる連続塗布装置の全体構成を示す
斜視図。
FIG. 1 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention.

【図2】本発明に係わる連続塗布装置の全体構成を示す
斜視図。
FIG. 2 is a perspective view showing the overall configuration of a continuous coating apparatus according to the present invention.

【図3】把持搬送手段の正面図。FIG. 3 is a front view of the gripping and conveying means.

【図4】位置決め手段と塗布手段とを示す断面図。FIG. 4 is a sectional view showing a positioning unit and a coating unit.

【図5】把持搬送手段と位置決め手段の相対位置関係を
示す断面図。
FIG. 5 is a cross-sectional view showing a relative positional relationship between the gripping / conveying means and the positioning means.

【図6】真円度の表示の説明図。FIG. 6 is an explanatory diagram of a display of roundness.

【図7】直角度の表示及びの説明図。FIG. 7 is a diagram showing the display and description of a right angle.

【符号の説明】[Explanation of symbols]

1,1A,1B,1C,1D,1E,1F 円筒状基材 10 供給手段 20 把持搬送手段 21,22 把持手段 30,30A,30B,30C 位置決め手段 40,40A,40B,40C 塗布手段(垂直型環状
塗布手段) 41 塗布ヘッド(コーター、ホッパー塗布面) 50,50A,50B,50C 乾燥手段 60 分離排出手段 K 繋ぎ部 L 塗布液(感光液) Z−Z 垂直中心線
1, 1A, 1B, 1C, 1D, 1E, 1F Cylindrical base material 10 Supply means 20 Holding and conveying means 21, 22 Holding means 30, 30A, 30B, 30C Positioning means 40, 40A, 40B, 40C Coating means (vertical type Annular coating means) 41 coating head (coater, hopper coating surface) 50, 50A, 50B, 50C drying means 60 separation / discharge means K connecting part L coating liquid (photosensitive liquid) Z-Z vertical center line

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 円筒状基材の筒軸を合わせて積み重ねて
搬送し、環状塗布手段により前記円筒状基材の外周面に
塗布液を連続的に塗布する連続塗布方法に用いられる円
筒状基材において、前記円筒状基材の肉厚が1.5mm
以下、真円度が80μm以下であり、且つ、直角度が8
0μm以下であることを特徴とする円筒状基材。
1. A cylindrical substrate used in a continuous coating method in which a cylindrical substrate is aligned, stacked, conveyed, and a coating liquid is continuously applied to an outer peripheral surface of the cylindrical substrate by an annular coating means. In the material, the thickness of the cylindrical substrate is 1.5 mm
Hereinafter, the roundness is 80 μm or less, and the squareness is 8
A cylindrical substrate having a diameter of 0 μm or less.
【請求項2】 円筒状基材の筒軸を合わせて積み重ねて
搬送し、環状塗布手段により前記円筒状基材の外周面に
塗布液を連続的に塗布する円筒状基材の連続塗布方法に
おいて、前記円筒状基材の肉厚が1.5mm以下、真円
度が80μm以下であり、且つ、直角度が80μm以下
である円筒状基材を用いることを特徴とする円筒状基材
の連続塗布方法。
2. A method for continuously applying a coating liquid onto an outer peripheral surface of a cylindrical base material by stacking and transporting the cylindrical base material while aligning the cylindrical axes of the cylindrical base material. The thickness of the cylindrical substrate is 1.5 mm or less, the roundness is 80 μm or less, and the squareness is 80 μm or less. Coating method.
【請求項3】 前記円筒状基材の外周面上にリング状に
配置した吐出口から流体を吹き付け、前記環状塗布手段
の環状塗布部の中心に前記円筒状基材の中心を合わせて
位置決めする位置決め手段を、前記環状塗布手段の円筒
状基材搬送方向上流側で、且つ、前記環状塗布手段の環
状塗布部の同軸上に配設したことを特徴とする請求項2
に記載の円筒状基材の連続塗布方法。
3. A fluid is sprayed from a discharge port arranged in a ring shape on the outer peripheral surface of the cylindrical substrate, and the center of the cylindrical substrate is aligned with the center of an annular application portion of the annular application unit. 3. The positioning device according to claim 2, wherein the positioning device is disposed on the upstream side of the annular coating device in the conveying direction of the cylindrical substrate and coaxially with the annular coating portion of the annular coating device.
3. The method for continuously applying a cylindrical substrate according to item 1.
【請求項4】 前記環状塗布手段が、スライドホッパ型
塗布装置あるいは押し出し型塗布装置であることを特徴
とする請求項2または3に記載の円筒状基材の連続塗布
方法。
4. The method according to claim 2, wherein the annular coating means is a slide hopper type coating apparatus or an extrusion type coating apparatus.
JP8360297A 1997-04-02 1997-04-02 Cylindrical substrate and method of continuously coating cylindrical substrate Pending JPH10277480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8360297A JPH10277480A (en) 1997-04-02 1997-04-02 Cylindrical substrate and method of continuously coating cylindrical substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8360297A JPH10277480A (en) 1997-04-02 1997-04-02 Cylindrical substrate and method of continuously coating cylindrical substrate

Publications (1)

Publication Number Publication Date
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7374853B2 (en) 2004-12-02 2008-05-20 Konica Minolta Business Technologies, Inc. Organic photoreceptor and an image forming method using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7374853B2 (en) 2004-12-02 2008-05-20 Konica Minolta Business Technologies, Inc. Organic photoreceptor and an image forming method using the same

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