JP3635378B2 - Cylindrical substrate positioning method and apparatus - Google Patents

Cylindrical substrate positioning method and apparatus Download PDF

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Publication number
JP3635378B2
JP3635378B2 JP12523295A JP12523295A JP3635378B2 JP 3635378 B2 JP3635378 B2 JP 3635378B2 JP 12523295 A JP12523295 A JP 12523295A JP 12523295 A JP12523295 A JP 12523295A JP 3635378 B2 JP3635378 B2 JP 3635378B2
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cylindrical
base material
cylindrical base
positioning
coating
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JPH08318189A (en
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晃 大平
淳二 氏原
栄一 木島
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Konica Minolta Inc
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Konica Minolta Inc
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Description

【0001】
【産業上の利用分野】
本発明は、複数の円筒状基材外周面上に処理液を連続的に塗布する際に、該円筒状基材を位置決めする方法及び装置に関し、特に、円筒状基材に感光液を塗布することにより、電子写真感光体を製造する際に、円筒状基材を正確に位置決めする方法及び装置に関する。
【0002】
【従来の技術】
電子写真装置で使用される感光体である有機光導電体感光ドラムの製造においては、円筒形状のドラムに感光性の感光液(処理液)を塗布する。その塗布に当たっては、円筒ドラムの周面にスライドホッパーを所定位置に位置せしめ、両者間の間隙を周方向に関して一定に保持する調整作業が必要となる。この場合、所要の塗布層厚は極めて薄いため、円筒状ドラムが0.1mmずれても周方向に関し、円筒面全体としてみれば塗膜層の膜厚の大きな偏差要因となる。
【0003】
かかる塗膜層の膜厚偏差があると、円筒状ドラムの周方向で帯電量の変化、感度の不均一、残留電位の変化等の各種不具合が生じることは周知の事実である。従って、円筒状ドラムの正確な位置決めが極めて重要となる。
【0004】
従来、この種の円筒状ドラムの位置決め装置としては、例えば特開昭60−50537号公報に記載のように、支持部材に回転自在に設けた位置規制コロを円筒状ドラムの外周に接触させて設けたものがある。また、特開平3−280063号公報及び特開平4−73655号公報には、エアベアリングを使用した感光ドラムの位置決め装置が開示されている。
【0005】
【発明が解決しようとする課題】
しかしながら、上記のコロ接触式の従来の位置決め装置は、位置規制コロを直接円筒状ドラムに対して接触させながら位置決めするものであるので、円筒状ドラムに傷がついてしまうという難点があった。円筒状ドラムに傷がつくと、電子写真特性が悪化することは周知である。
【0006】
上記エアベアリング式の位置決め装置は、空気等の流体を吹付ノズルから吹き付けて位置決めを行うようにしたもので、円筒状ドラムの傷付きが防止でき、極めて有効である。
【0007】
しかし、図7(a)に示すように、複数の円筒状ドラム1A,1Bの端部を接して積み重ねて繋ぎ合わせた状態で移動させる場合、先の円筒状ドラム1Aが位置決め用吹付ノズル3から逃げて、次の円筒状ドラム1Bに移行するとき、先の円筒状ドラム1Aが外的要因により、水平方向に移動させる外力が作用したときには、図7(b)のように、たとえ次の円筒状ドラム1Bの位置決めを行うことができたとしても、先の円筒状ドラム1Aが水平方向に急にずれてしまうことがある。この移動現象が生じると、感光液の横段や液切れ塗布等となって現れる。
【0008】
本発明の主課題は円筒状ドラムに傷を付けることなく、円筒状ドラムの位置決めを行うとともに、円筒状ドラム相互間の繋ぎ部分における円筒状ドラムの位置ずれを防止することにある。
【0009】
【課題を解決するための手段】
上記課題を解決する本発明の請求項1に記載の円筒状基材の位置決め方法は、複数の円筒状基材の筒軸を合わせて積み重ね、下方から上方に垂直に押し上げながら、垂直塗布装置により前記円筒状基材外周面上に塗布液を連続的に塗布する工程において、塗布前または塗布後の位置で、前記円筒状基材外周面上に流体を吹き付ける吐出口を有する中空円筒状の吹き付け手段を、前記円筒状基材の同軸に配設して成る位置決め手段により前記円筒状基材の位置決めを行う円筒状基材の位置決め方法において、前記位置決め手段の吐出口を有する面の内径寸法を、前記垂直塗布装置の流体塗布部の内径寸法より小さく設定したことを特徴とするものである。
【0010】
また、本発明の請求項2に記載の円筒状基材の位置決め装置は、複数の円筒状基材の筒軸を合わせて積み重ね、下方から上方に垂直に押し上げながら、垂直塗布装置により前記円筒状基材外周面上に塗布液を連続的に塗布する工程において、塗布前または塗布後の位置で、前記円筒状基材外周面上に流体を吹き付ける吐出口を有する中空円筒状の吹き付け手段を、前記円筒状基材の同軸に配設して成る位置決め手段により前記円筒状基材の位置決めを行う円筒状基材の位置決め装置において、前記位置決め手段の吐出口を有する面の内径寸法を、前記垂直塗布装置の流体塗布部の内径寸法より小さく設定したことを特徴とするものである。
【0011】
【作用】
本発明では、円筒状基材の外周面に対して流体を吹き付けて、その流体圧により円筒状基材の位置決めを行う。すなわち、円筒状基材の周囲から流体、例えばエアを吹き付けると、その吹き付け圧力により、円筒状基材の位置が中立化し、これによって円筒状基材が所定位置に位置決めされる。しかも、円筒状基材に機械的接触することがないから、円筒状基材に傷を付けることが防止される。
【0012】
他方、複数の円筒状基材の筒軸を合わせて積み重ね、下方から上方に垂直に押し上げながら、垂直塗布装置により前記円筒状基材外周面上に塗布液を連続的に塗布し、塗布前または塗布後の位置で、前記円筒状基材外周面上に流体を吹き付ける吐出口を有する中空円筒状の吹き付け手段を、前記円筒状基材の同軸に配設して成る位置決め手段により前記円筒状基材の位置決めを行う円筒状基材の位置決め装置において、位置決めに当たり、複数の円筒状基材のうち、直角度が悪い円筒状基材がたとえ一つでもあると、吹き付け装置から吐出されたエアーが前記各円筒状基材の端面が相互に接する繋ぎ部に入って、円筒状基材が浮き上がって、傾いたり振動したりして、積み重なって進行する円筒状基材すべてに悪影響を与え、塗布性が低下する。
【0013】
本発明は、円筒状基材の外径をD1、位置決め装置の吐出口を有する円筒状内面の内径寸法をD2、垂直塗布装置の円筒状内面をなす流体塗布部の内径寸法をD3とすると、D1<D2≦D3、好ましくは、D1<D2<D3、に設定することにより、円筒状基材の位置決め精度が向上するから、円筒状基材の外形と、垂直塗布装置の円筒状内面をなす流体塗布部との接触や、円筒状基材の外形と、位置決め装置の吐出口を有する円筒状内面との接触が防止される。前記円筒状基材には直角度や平滑性の劣るものがあるため、複数の円筒状基材を積み重ねたときに不安定があって、もし、D2>D3であると、位置決め精度が悪く、塗布装置の入口部と円筒状基材とが接触し易い。なお、(D2−D1)≧20μmが好ましい。また、吐出口径は、0.01〜1.0mm、好ましくは0.05〜0.7mmが良い。
【0014】
前記複数の吐出口を有する位置決め装置は、2組以上を軸方向に連続接続して用いても良い。
【0015】
また、前記位置決め装置に用いる好ましい流体は、空気、不活性ガス(例えば窒素ガス)が良い。そして、これらの流体は、JIS規格でクラス100以上の清浄な気体が良い。
【0016】
前記垂直塗布装置としては、スライドホッパー型、押し出し型、リングコーター型等が用いられる。
【0017】
【実施例】
以下、本発明の実施例を図面に基づいて詳細に説明する。
【0018】
図1は、本発明の位置決め装置を含む環状の垂直塗布装置の全体を示す断面図である。該垂直型塗布装置は、中心線Oに沿って垂直状に重ね合わせた円筒状基材(円筒状ドラム)1A,1Bに塗布液(感光液)2を塗布する垂直塗布装置10と、該垂直塗布装置10の下方に固設された円筒状基材位置決め装置20と、前記垂直塗布装置10の上方に設置された乾燥フード30と、前記位置決め装置20の下部に固定された支持装置40とから構成されている。
【0019】
垂直塗布装置10の内部には、円筒状基材1Aの外周を取り囲むように処理液2を塗布する塗布ヘッド11、該塗布ヘッド11に隣接するテーパ状の処理液流出口(処理液スライド面)12、水平方向の幅狭の処理液通路を形成する処理液分配用スリット13、塗布液分配室14が形成されている。前記塗布液分配室14には処理液供給パイプ16が接続され、図示しない圧送ポンプにより処理液が供給される。
【0020】
上記垂直塗布装置10による塗布方法は、環状塗布装置10を固定し、前記円筒状基材1Aを中心線Oに沿って矢示方向に上昇移動させながら円筒状基材1Aの上端部より塗布ヘッド11により塗布を行う。
【0021】
前記垂直塗布装置10には、圧送ポンプにより一定量の処理液が安定して送り込まれ、処理液供給パイプ16、塗布液分配室14、処理液分配用スリット13、処理液流出口12を経て、塗布ヘッド11に供給され、円筒状基材1Aの表面に処理液が塗布され感光層が形成される。
【0022】
前記垂直塗布装置10の上部には、環状に形成した乾燥フード30が固定されている。該乾燥フード30には多数の開口部31が形成されている。前記環状塗布装置10により形成された円筒状基材上の感光層は、前記乾燥フード30内を通過しながら塗布された感光液2を徐々に乾燥させる。乾燥は前記開口部31より感光液に含まれる溶媒を外部に放出させることにより行なわれる。
【0023】
前記垂直塗布装置10の下部には、円筒状基材位置決め装置20が固定されている。図2(a)は図1における円筒状基材位置決め装置20のA−A断面図(給気部)、図2(b)はB−B断面図(排気部)である。
【0024】
前記円筒状基材の位置決め装置20は、外筒部材21と、該外筒部材21の内部に固定された内筒部材22とから構成されている。外筒部材21と内筒部材22には、両部材を貫通する複数の給気口23と、複数の排気口26が穿設されている。該複数の給気口23は、給気ポンプ29に接続され、空気等の流体が圧送される。
【0025】
図1及び図2(a)に示すように、前記外筒部材21には、給気口23が水平方向に4個の放射状に配置され、さらに垂直方向に複数段(図示5段)配列されている。該外筒部材21の内周面には水平溝24が穿設されていて、前記内筒部材22の外周面との間に水平流路を形成し、前記水平方向に放射状に配置された4個の給気口23に連通している。前記内筒部材22には、水平方向に12個の吐出口25を有する穴が貫通している。該吐出口25は前記円筒状基材1の外周面と間隙Gを保って対向している。該間隙Gは、20μm〜3mm、好ましくは30μm〜2mmである。この間隙Gが20μmより小さいと、円筒状基材1の僅かな振れで内筒部材22に接触して円筒状基材1を傷つけやすい。また、間隙Gが3mmより大であると、円筒状基材1の位置決め精度が低下する。前記吐出口25は直径0.01〜1.0mmの小口径のノズルであり、好ましくは0.07〜0.5mmが良い。
【0026】
図1及び図2(b)に示すように、前記外筒部材21及び内筒部材22を貫通して、排気口26が水平方向に4個の放射状に配置され、さらに垂直方向に複数段(図示5段)配列されている。該排気口26は垂直方向に前記給気口23と交互に配列されている。内筒部材22の内周面には、垂直溝27が穿設されていて、前記複数段の排気口26を連通している。
【0027】
前記内筒部材22の下部の内周面は、入り口側が広がったテーパー面28になっている。このテーパー面28は、例えば軸方向の長さが50mmで、片側傾斜角が0.5mmの円錐面である。このテーパー面28を設けることにより、円筒状基材1が内筒部材22に進入するとき、円筒状基材1の先端部が内筒部材22の内周面に接触することを防止している。
【0028】
前記給気ポンプ29から圧送された流体は、複数の給気口23から外筒部材23内に導入されて、水平溝24を介して複数の吐出口25から吐出され、前記円筒状基材1A(1B)の外周面と均一な流体膜層を形成する。吐出後の流体は垂直溝27を経て複数の排気口26から装置外に排出される。
【0029】
前記吐出口25の開口直径は0.01〜1mm、好ましくは0.05〜0.7mm、例えば0.2〜0.5mmの円形に形成されている。排気口26の開口直径は1.0〜10mm、好ましくは2.0〜8.0mm、例えば3〜5mmの円形に形成されている。そして前記吐出口25及び排気口26とは、前記位置決め手段20の最内面を形成する部材(内筒部材22)の円筒状基材1の外周面に対向する側に、一体に組み込まれている。
【0030】
前記吐出口25から吐出される流体の吐出量は、複数の円筒状基材1間の繋ぎ部を検出する繋ぎ部検出手段(53)、またはタイマー手段(51)により繋ぎ部で変化するように制御される。
【0031】
あるいは、前記吐出口25から吐出される流体の圧力は、複数の円筒状基材1間の繋ぎ部を検出する繋ぎ部検出手段(53)、またはタイマー手段(51)により繋ぎ部で変化するように制御される。
【0032】
前記繋ぎ部検出手段として、例えば、反射率変動検出、磁気変化計測、渦電流計測、電気容量変化計測、レーザー計測等の手段を使用することにより容易に円筒状基材1間の繋ぎ部を検出することができる。
【0033】
前記タイマー手段による円筒状基材1間の繋ぎ部検出は、円筒状基材1の長さ、円筒状基材1の移動速度、複数の吐出口25間の距離、吹き付け手段の最初の吐出口距離等から検出される。
【0034】
なお、図1に示す位置決め装置20は、1組のユニットであるが、2組以上のユニットを上下方向に連続接続しても良い。
【0035】
前記給気口23に供給される流体は、空気、不活性ガス例えば窒素ガスが良い。そして該流体は、JIS規格でクラス100以上の清浄な気体が良い。
【0036】
なお、本発明の位置決め装置に接続される垂直塗布装置としては、スライドホッパー型、押し出し型、リングコーター、スプレー塗布等の各種装置が用いられる。
【0037】
[実施例]
次に、具体的な実施例により本発明を説明するが、本発明はこれに限定されるものではない。
【0038】
実施例1
(実施例及び比較例)
導電性支持体(円筒状基材)1としては鏡面加工を施した直径D1=80mm、高さ355mmのアルミニウムドラム支持体を用いた。
【0039】
前記導電性支持体1上に下記の如く塗布液組成物UCL−1(3.0W/V%ポリマー濃度)を調製し、図1に記載の如くのスライドホッパー型塗布装置10(内径D3=80.2mm)を用いて塗布した。図3は前記塗布装置10と、位置決め装置20の模式断面図、図4は位置決め装置20の一部破断斜視図である。この実施例では、上記塗布装置10の直前に図3に示すリング状位置決め装置20(長さH=250mm、内径D2)を設置し、下記の表1に記載のように、位置決め装置20のリング状吐出面の内径D2を変えて、円筒状基材1の移動速度を20mm/sec、コーター(塗布ヘッド)11と円筒状基材1間ギャップを100μmで連続塗布を行った。
【0040】
・UCL−1塗布液組成物
共重合ナイロン樹脂(CM−8000 東レ社製)
メタノール/n−ブタノール=10/1(Vol比)
実施例及び比較例による塗布結果を表1に示す。
【0041】
【表1】

Figure 0003635378
【0042】
表1に示すように、感光体ドラムNO.1−1,1−2,1−3に対する本実施例では、位置決め装置20の内径D2と、塗布装置10の内径D3とは、何れもD1<D2<D3であり、位置決め精度が高く、傷故障や塗布ムラもなく、塗布性も良好であった。これに対して、各装置の内径をD2>D3とした感光体ドラムNO.1−4に対する比較例では、位置決め性能は不安定で、円筒状基材1と塗布装置10入口部での接触、円筒状基材1と位置決め装置20内壁面との接触等のトラブルを発生し、この接触時の振動により塗布ムラを発生した。また、円筒状基材1への塗布液の塗布性も悪く、こすれ傷や擦り傷等の故障が発生した。
【0043】
実施例2
(実施例及び比較例)
導電性支持体(円筒状基材)1としては、鏡面加工を施した直径D1=80mm、高さH=355mmのアルミニウムドラム支持体を用いた。
【0044】
前記支持体上に下記の如く塗布液組成物CGL−2(3.0W/V%ポリマー濃度)を調製し、図1に記載の如くのスライドホッパー型塗布装置10(内径D3=80.2mm)を用いて塗布した。図5は前記塗布装置10と、位置決め装置20の模式断面図、図6は位置決め装置20の一部破断斜視図である。この実施例では、上記塗布装置10の直前に図5に示すリング状位置決め装置20(長さH=200mm、内径D2)を設置し、下記の表2に記載のように、位置決め装置20のリング状吐出面の内径D2を変えて、円筒状基材1の移動速度を25mm/sec、コーター(塗布ヘッド)11と円筒状基材1間ギャップを100μmで連続塗布を行った。
【0045】
・CGL−1塗布液組成物
ペリレン顔料(CGM−2)
ブチラール樹脂(エスレックBX−L積水化学社製)
メチルエチルケトン
上記塗布液組成物(固形分については固形分重量比CGM−2:BX−L=2:1に固定)をサンドミルを用いて20時間分散したもの。
【0046】
【化1】
Figure 0003635378
【0047】
塗布結果を表2に示す。
【0048】
【表2】
Figure 0003635378
【0049】
表2に示すように、感光体ドラムNO.2−1,2−2,2−3に対する本実施例では、位置決め装置20の内径D2と、塗布装置10の内径D3とは、何れもD1<D2<D3であり、位置決め精度が高く、傷故障や塗布ムラもなく、塗布性も良好であった。これに対して、各装置の内径をD2>D3とした感光体ドラムNO.2−4に対する比較例では、位置決め性能は不安定で、円筒状基材1と塗布装置10入口部での接触、円筒状基材1と位置決め装置20内壁面との接触等のトラブルを発生し、この接触時の振動により塗布ムラを発生した。また、円筒状基材1への塗布液の塗布性も悪く、こすれ傷や擦り傷等の故障が発生した。
【0050】
実施例3
(実施例)
導電性支持体(円筒状基材)1としては実施例1と同じアルミニウムドラム支持体を用いた。
【0051】
前記導電性支持体1上に下記の如く塗布液組成物CTL−1(35W/V%固形分濃度)を調製し、図1に記載の如くのスライドホッパー型塗布装置(内径D3=80.5mm)10を用いて塗布した。この際、上記塗布装置10の直前に図5に示す位置決め装置20(長さH=250mm,内径D2)を設置し、円筒状基材1の移動速度5mm/sec、コーター11と円筒状基材1間のギャップを250μmで連続塗布を行った。
【0052】
・CTL−1塗布液組成物
CTM−1
ポリカーボネート(Z−200 三菱瓦斯化学社製)
1,2−ジクロロエタン
固形分については固形分重量比CTM−1:Z−200=0.89:1に固定
【0053】
【化2】
Figure 0003635378
【0054】
塗布結果を表3に示す。
【0055】
【表3】
Figure 0003635378
【0056】
表3に示すように、感光体ドラムNO.3−1,3−2,3−3に対する本実施例では、位置決め装置20の内径D2と、塗布装置10の内径D3とは、何れもD1<D2<D3であり、位置決め精度が高く、傷故障や塗布ムラもなく、塗布性も良好であった。これに対して、各装置の内径をD2>D3とした感光体ドラムNO.3−4に対する比較例では、位置決め性能は不安定で、円筒状基材1と塗布装置10入口部での接触、円筒状基材1と位置決め装置20内壁面との接触等のトラブルを発生し、この接触時の振動により塗布ムラを発生した。また、円筒状基材1への塗布液の塗布性も悪く、こすれ傷や擦り傷等の故障が発生した。
【0057】
本発明の感光体をUCL/CGL/CTLと3層に逐次重層したOPC感光体を作製し実写したところ、濃淡ムラ、カブリムラや画像欠陥(黒ポチ、白ポチ、スジ故障、キズ故障)がなく良好であった。またコーターを損傷することもなかった。
【0058】
【発明の効果】
本発明の塗布装置に備えた円筒状基材の位置決め方法及び装置により、以下の優れた効果が得られた。
【0059】
(1)円筒状基材上に塗布された感光膜厚の変動が極めて微小となった。
【0060】
(2)円筒状基材への塗布液の塗布性が良好になった。
【0061】
(3)円筒状基材の表面の傷発生が解消された。
【0062】
(4)塗布装置の塗布液吐出部(コーター)を損傷させることがない。
【0063】
(5)円筒状基材の位置決め精度が向上した。
【図面の簡単な説明】
【図1】本発明による位置決め装置と塗布装置の縦断面図。
【図2】上記塗布装置のA−A断面図及びB−B断面図。
【図3】塗布装置と位置決め装置の模式断面図。
【図4】上記位置決め装置の一部破断斜視図。
【図5】位置決め装置の他の実施例を示す模式断面図。
【図6】上記位置決め装置の一部破断斜視図。
【図7】円筒状基材を積み重ねて搬送する状態を説明する模式図。
【符号の説明】
1,1A,1B 円筒状基材(円筒状ドラム、導電性支持体)
2 処理面(感光液面)
10 垂直塗布装置(スライドホッパー型塗布装置)
11 塗布ヘッド(コーター)
20 位置決め装置(位置決め手段)
21 外筒部材
22 内筒部材
23 給気口
25 吐出口
26 排気口
29 給気ポンプ
D1 円筒状基材の外径
D2 位置決め装置の内径
D3 塗布装置の内径[0001]
[Industrial application fields]
The present invention relates to a method and apparatus for positioning a cylindrical base material when a processing liquid is continuously applied on the outer peripheral surfaces of a plurality of cylindrical base materials, and in particular, a photosensitive liquid is applied to a cylindrical base material. Thus, the present invention relates to a method and apparatus for accurately positioning a cylindrical base material when manufacturing an electrophotographic photosensitive member.
[0002]
[Prior art]
In the manufacture of an organic photoconductor photosensitive drum which is a photosensitive member used in an electrophotographic apparatus, a photosensitive photosensitive solution (processing solution) is applied to a cylindrical drum. For the application, an adjustment operation is required in which the slide hopper is positioned at a predetermined position on the circumferential surface of the cylindrical drum and the gap between the two is kept constant in the circumferential direction. In this case, since the required coating layer thickness is extremely thin, even if the cylindrical drum is deviated by 0.1 mm, it causes a large deviation in the film thickness of the coating layer in the circumferential direction when viewed as the entire cylindrical surface.
[0003]
It is a well-known fact that when there is such a film thickness deviation of the coating layer, various problems such as a change in charge amount, non-uniform sensitivity, and a change in residual potential occur in the circumferential direction of the cylindrical drum. Therefore, accurate positioning of the cylindrical drum is extremely important.
[0004]
Conventionally, as this kind of cylindrical drum positioning device, for example, as described in JP-A-60-50537, a position regulating roller provided rotatably on a support member is brought into contact with the outer periphery of the cylindrical drum. There is something provided. JP-A-3-280063 and JP-A-4-73655 disclose a photosensitive drum positioning device using an air bearing.
[0005]
[Problems to be solved by the invention]
However, the above-described conventional roller contact type positioning device positions the position regulating roller in direct contact with the cylindrical drum, so that there is a problem in that the cylindrical drum is damaged. It is well known that electrophotographic properties deteriorate when a cylindrical drum is damaged.
[0006]
The air-bearing type positioning device is positioned by spraying a fluid such as air from a spray nozzle, and can prevent the cylindrical drum from being damaged and is extremely effective.
[0007]
However, as shown in FIG. 7A, when the cylindrical drums 1A and 1B are moved in a state where the ends of the cylindrical drums 1A and 1B are in contact with each other and stacked and joined together, the previous cylindrical drum 1A is moved from the positioning spray nozzle 3. When escaping and moving to the next cylindrical drum 1B, when an external force is applied that causes the previous cylindrical drum 1A to move in the horizontal direction due to an external factor, as shown in FIG. Even if the cylindrical drum 1B can be positioned, the previous cylindrical drum 1A may suddenly shift in the horizontal direction. When this movement phenomenon occurs, it appears as a lateral step of the photosensitive solution, or a coating of running out of the solution.
[0008]
SUMMARY OF THE INVENTION The main object of the present invention is to position a cylindrical drum without damaging the cylindrical drum and to prevent a positional deviation of the cylindrical drum at a connecting portion between the cylindrical drums.
[0009]
[Means for Solving the Problems]
The cylindrical base material positioning method according to claim 1 of the present invention that solves the above-described problems is achieved by using a vertical coating device while stacking the cylindrical shafts of a plurality of cylindrical base materials together and vertically pushing upward from below. In the step of continuously applying the coating liquid onto the outer peripheral surface of the cylindrical base material, a hollow cylindrical spray having a discharge port for spraying fluid onto the outer peripheral surface of the cylindrical base material at a position before application or after application. In the cylindrical base material positioning method for positioning the cylindrical base material by positioning means arranged coaxially with the cylindrical base material, the inner diameter dimension of the surface having the discharge port of the positioning means is set. The vertical coating apparatus is set to be smaller than the inner diameter dimension of the fluid application portion.
[0010]
According to a second aspect of the present invention, there is provided a cylindrical base material positioning device comprising: a plurality of cylindrical base materials that are aligned and stacked, and vertically pushed upward from below, while the cylindrical base material is positioned by the vertical coating device. In the step of continuously applying the coating liquid on the outer peripheral surface of the base material, a hollow cylindrical spraying means having a discharge port for spraying fluid onto the outer peripheral surface of the cylindrical base material at a position before application or after application. In the cylindrical base material positioning apparatus for positioning the cylindrical base material by positioning means arranged coaxially with the cylindrical base material, the inner diameter dimension of the surface having the discharge port of the positioning means is set as the vertical dimension. It is characterized in that it is set smaller than the inner diameter dimension of the fluid application part of the coating device.
[0011]
[Action]
In the present invention, fluid is sprayed on the outer peripheral surface of the cylindrical base material, and the cylindrical base material is positioned by the fluid pressure. That is, when a fluid such as air is sprayed from the periphery of the cylindrical base material, the position of the cylindrical base material is neutralized by the spraying pressure, thereby positioning the cylindrical base material at a predetermined position. And since it does not contact a cylindrical base material mechanically, it is prevented that a cylindrical base material is damaged.
[0012]
On the other hand, the cylindrical shafts of a plurality of cylindrical base materials are aligned and stacked, and while vertically pushing upward from below, a coating liquid is continuously applied onto the outer peripheral surface of the cylindrical base material by a vertical application device, and before application or A hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material at a position after application is positioned by a positioning means formed coaxially with the cylindrical base material. In the positioning device of the cylindrical base material that performs positioning of the material, when there is at least one cylindrical base material having a bad perpendicularity among the plurality of cylindrical base materials, the air discharged from the spraying device is The end surfaces of each cylindrical base material enter the connecting portion where they are in contact with each other, the cylindrical base material floats, tilts and vibrates, adversely affects all the cylindrical base materials that progress in a stack, and is coated. Decrease .
[0013]
In the present invention, when the outer diameter of the cylindrical base material is D1, the inner diameter dimension of the cylindrical inner surface having the discharge port of the positioning device is D2, and the inner diameter dimension of the fluid application portion forming the cylindrical inner surface of the vertical coating apparatus is D3. By setting D1 <D2 ≦ D3, preferably D1 <D2 <D3, the positioning accuracy of the cylindrical base material is improved, so that the outer shape of the cylindrical base material and the cylindrical inner surface of the vertical coating apparatus are formed. Contact with the fluid application part, contact between the outer shape of the cylindrical base material and the cylindrical inner surface having the discharge port of the positioning device is prevented. Since the cylindrical base material has inferior squareness and smoothness, there is instability when stacking a plurality of cylindrical base materials, and if D2> D3, the positioning accuracy is poor, The inlet part of the coating device and the cylindrical base material are easy to contact. In addition, (D2-D1) ≧ 20 μm is preferable. The discharge port diameter is 0.01 to 1.0 mm, preferably 0.05 to 0.7 mm.
[0014]
Two or more sets of the positioning device having the plurality of discharge ports may be continuously connected in the axial direction.
[0015]
Moreover, air and an inert gas (for example, nitrogen gas) are good for the preferable fluid used for the said positioning apparatus. These fluids are preferably clean gases of class 100 or higher according to JIS standards.
[0016]
As the vertical coating device, a slide hopper type, an extrusion type, a ring coater type, or the like is used.
[0017]
【Example】
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
[0018]
FIG. 1 is a cross-sectional view showing the entirety of an annular vertical coating apparatus including a positioning device of the present invention. The vertical coating apparatus includes a vertical coating apparatus 10 that coats a coating solution (photosensitive solution) 2 on cylindrical substrates (cylindrical drums) 1A and 1B that are vertically superposed along a center line O, and the vertical coating apparatus 10. From the cylindrical base material positioning device 20 fixed below the coating device 10, the drying hood 30 installed above the vertical coating device 10, and the support device 40 fixed to the lower portion of the positioning device 20. It is configured.
[0019]
Inside the vertical coating apparatus 10, a coating head 11 that coats the treatment liquid 2 so as to surround the outer periphery of the cylindrical substrate 1 </ b> A, and a tapered treatment liquid outlet (treatment liquid slide surface) adjacent to the coating head 11. 12. A treatment liquid distribution slit 13 and a coating liquid distribution chamber 14 that form a narrow processing liquid passage in the horizontal direction are formed. A processing liquid supply pipe 16 is connected to the coating liquid distribution chamber 14, and the processing liquid is supplied by a pressure feed pump (not shown).
[0020]
The coating method using the vertical coating apparatus 10 is as follows. The annular coating apparatus 10 is fixed, and the cylindrical substrate 1A is moved upward in the direction indicated by the arrow along the center line O from the upper end of the cylindrical substrate 1A. 11 is applied.
[0021]
A fixed amount of processing liquid is stably fed into the vertical coating apparatus 10 by a pressure feed pump, and passes through a processing liquid supply pipe 16, a coating liquid distribution chamber 14, a processing liquid distribution slit 13, and a processing liquid outlet 12. The coating head 11 is supplied, and a processing solution is applied to the surface of the cylindrical substrate 1A to form a photosensitive layer.
[0022]
An annular drying hood 30 is fixed to the upper portion of the vertical coating apparatus 10. A large number of openings 31 are formed in the dry hood 30. The photosensitive layer on the cylindrical substrate formed by the annular coating apparatus 10 gradually dries the applied photosensitive solution 2 while passing through the drying hood 30. Drying is performed by releasing the solvent contained in the photosensitive solution from the opening 31 to the outside.
[0023]
A cylindrical substrate positioning device 20 is fixed to the lower part of the vertical coating device 10. 2A is an AA sectional view (air supply part) of the cylindrical substrate positioning device 20 in FIG. 1, and FIG. 2B is a BB sectional view (exhaust part).
[0024]
The cylindrical base material positioning device 20 includes an outer cylinder member 21 and an inner cylinder member 22 fixed inside the outer cylinder member 21. The outer cylinder member 21 and the inner cylinder member 22 have a plurality of air supply ports 23 and a plurality of exhaust ports 26 penetrating both members. The plurality of air supply ports 23 are connected to an air supply pump 29, and fluid such as air is pumped.
[0025]
As shown in FIGS. 1 and 2 (a), the outer cylinder member 21 is provided with four air supply openings 23 in the horizontal direction and further arranged in a plurality of stages (five in the figure) in the vertical direction. ing. A horizontal groove 24 is formed in the inner peripheral surface of the outer cylinder member 21, and a horizontal flow path is formed between the outer cylinder member 22 and the outer peripheral surface of the inner cylinder member 22, and is arranged radially in the horizontal direction 4. The air supply ports 23 communicate with each other. The inner cylinder member 22 is penetrated by a hole having twelve discharge ports 25 in the horizontal direction. The discharge port 25 faces the outer peripheral surface of the cylindrical substrate 1 with a gap G therebetween. The gap G is 20 μm to 3 mm, preferably 30 μm to 2 mm. If the gap G is smaller than 20 μm, the cylindrical base material 1 is liable to be damaged by coming into contact with the inner cylindrical member 22 with slight vibration of the cylindrical base material 1. Further, when the gap G is larger than 3 mm, the positioning accuracy of the cylindrical base material 1 is lowered. The discharge port 25 is a nozzle having a small diameter of 0.01 to 1.0 mm, preferably 0.07 to 0.5 mm.
[0026]
As shown in FIGS. 1 and 2 (b), exhaust ports 26 are arranged radially in four radial directions through the outer cylinder member 21 and the inner cylinder member 22, and a plurality of stages (in the vertical direction ( (5 stages in the figure) are arranged. The exhaust ports 26 are arranged alternately with the air supply ports 23 in the vertical direction. A vertical groove 27 is formed in the inner peripheral surface of the inner cylinder member 22 and communicates with the plurality of exhaust ports 26.
[0027]
The inner peripheral surface of the lower part of the inner cylinder member 22 is a tapered surface 28 whose entrance side is widened. The tapered surface 28 is, for example, a conical surface having an axial length of 50 mm and a one-side inclination angle of 0.5 mm. By providing the tapered surface 28, the tip of the cylindrical base material 1 is prevented from coming into contact with the inner peripheral surface of the inner cylindrical member 22 when the cylindrical base material 1 enters the inner cylindrical member 22. .
[0028]
The fluid pressure-fed from the air supply pump 29 is introduced into the outer cylindrical member 23 from the plurality of air supply ports 23, and is discharged from the plurality of discharge ports 25 through the horizontal grooves 24. A uniform fluid film layer is formed on the outer peripheral surface of (1B). The discharged fluid is discharged out of the apparatus from the plurality of exhaust ports 26 through the vertical groove 27.
[0029]
The discharge port 25 has an opening diameter of 0.01 to 1 mm, preferably 0.05 to 0.7 mm, for example 0.2 to 0.5 mm. The opening diameter of the exhaust port 26 is 1.0 to 10 mm, preferably 2.0 to 8.0 mm, for example, 3 to 5 mm. The discharge port 25 and the exhaust port 26 are integrally incorporated on the side of the member (inner cylinder member 22) that forms the innermost surface of the positioning means 20 that faces the outer peripheral surface of the cylindrical substrate 1. .
[0030]
The discharge amount of the fluid discharged from the discharge port 25 is changed at the connecting portion by the connecting portion detecting means (53) for detecting the connecting portions between the plurality of cylindrical base materials 1 or the timer means (51). Be controlled.
[0031]
Alternatively, the pressure of the fluid discharged from the discharge port 25 is changed at the connecting portion by the connecting portion detecting means (53) for detecting the connecting portions between the plurality of cylindrical base materials 1 or the timer means (51). Controlled.
[0032]
As the connecting part detecting means, for example, a connecting part between the cylindrical substrates 1 can be easily detected by using means such as reflectance fluctuation detection, magnetic change measurement, eddy current measurement, electric capacity change measurement, laser measurement, etc. can do.
[0033]
The connecting part detection between the cylindrical base materials 1 by the timer means is the length of the cylindrical base material 1, the moving speed of the cylindrical base material 1, the distance between the plurality of discharge ports 25, the first discharge port of the spraying means. Detected from distance or the like.
[0034]
The positioning device 20 shown in FIG. 1 is a set of units, but two or more sets of units may be continuously connected in the vertical direction.
[0035]
The fluid supplied to the air supply port 23 is preferably air or an inert gas such as nitrogen gas. The fluid is preferably a clean gas of class 100 or higher according to JIS standards.
[0036]
As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type, a ring coater, and spray coating are used.
[0037]
[Example]
Next, the present invention will be described with reference to specific examples, but the present invention is not limited thereto.
[0038]
Example 1
(Examples and Comparative Examples)
As the conductive support (cylindrical base material) 1, a mirror-finished aluminum drum support having a diameter D1 = 80 mm and a height of 355 mm was used.
[0039]
A coating liquid composition UCL-1 (3.0 W / V% polymer concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 10 (inner diameter D3 = 80 as shown in FIG. 1). .2 mm). FIG. 3 is a schematic cross-sectional view of the coating device 10 and the positioning device 20, and FIG. 4 is a partially broken perspective view of the positioning device 20. In this embodiment, the ring-shaped positioning device 20 (length H = 250 mm, inner diameter D2) shown in FIG. 3 is installed immediately before the coating device 10, and the ring of the positioning device 20 is set as shown in Table 1 below. The inner diameter D2 of the cylindrical discharge surface was changed, and continuous coating was performed at a moving speed of the cylindrical substrate 1 of 20 mm / sec and a gap between the coater (coating head) 11 and the cylindrical substrate 1 of 100 μm.
[0040]
-UCL-1 coating liquid composition copolymer nylon resin (CM-8000 manufactured by Toray Industries, Inc.)
Methanol / n-butanol = 10/1 (Vol ratio)
Table 1 shows the coating results of the examples and comparative examples.
[0041]
[Table 1]
Figure 0003635378
[0042]
As shown in Table 1, the photosensitive drum NO. In the present embodiment for 1-1, 1-2, and 1-3, the inner diameter D2 of the positioning device 20 and the inner diameter D3 of the coating device 10 are both D1 <D2 <D3, and the positioning accuracy is high. There was no failure or coating unevenness, and coating properties were good. In contrast to this, the photosensitive drum NO. In the comparative example for 1-4, the positioning performance is unstable, and troubles such as contact between the cylindrical base material 1 and the coating device 10 inlet and contact between the cylindrical base material 1 and the inner wall surface of the positioning device 20 occur. The coating unevenness was generated by the vibration during the contact. Moreover, the coating property of the coating liquid on the cylindrical substrate 1 was poor, and failures such as a scratch and a scratch occurred.
[0043]
Example 2
(Examples and Comparative Examples)
As the conductive support (cylindrical base material) 1, a mirror-finished aluminum drum support having a diameter D1 = 80 mm and a height H = 355 mm was used.
[0044]
A coating liquid composition CGL-2 (3.0 W / V% polymer concentration) was prepared on the support as follows, and a slide hopper type coating apparatus 10 (inner diameter D3 = 80.2 mm) as shown in FIG. It applied using. FIG. 5 is a schematic cross-sectional view of the coating device 10 and the positioning device 20, and FIG. 6 is a partially broken perspective view of the positioning device 20. In this embodiment, a ring-shaped positioning device 20 (length H = 200 mm, inner diameter D2) shown in FIG. 5 is installed immediately before the coating device 10, and the ring of the positioning device 20 is set as shown in Table 2 below. The inner diameter D2 of the cylindrical discharge surface was changed, and continuous coating was performed at a moving speed of the cylindrical substrate 1 of 25 mm / sec and a gap between the coater (coating head) 11 and the cylindrical substrate 1 of 100 μm.
[0045]
-CGL-1 coating liquid composition perylene pigment (CGM-2)
Butyral resin (S-REC BX-L made by Sekisui Chemical Co., Ltd.)
Methyl ethyl ketone The above coating liquid composition (solid content is fixed at a solid content weight ratio CGM-2: BX-L = 2: 1) is dispersed for 20 hours using a sand mill.
[0046]
[Chemical 1]
Figure 0003635378
[0047]
The coating results are shown in Table 2.
[0048]
[Table 2]
Figure 0003635378
[0049]
As shown in Table 2, the photosensitive drum NO. In this embodiment for 2-1, 2-2, and 2-3, the inner diameter D2 of the positioning device 20 and the inner diameter D3 of the coating device 10 are both D1 <D2 <D3, and the positioning accuracy is high. There was no failure or coating unevenness, and coating properties were good. In contrast to this, the photosensitive drum NO. In the comparative example for 2-4, the positioning performance is unstable, and troubles such as contact between the cylindrical base material 1 and the coating device 10 inlet and contact between the cylindrical base material 1 and the inner wall surface of the positioning device 20 occur. The coating unevenness was generated by the vibration during the contact. Moreover, the coating property of the coating liquid on the cylindrical substrate 1 was poor, and failures such as a scratch and a scratch occurred.
[0050]
Example 3
(Example)
As the conductive support (cylindrical base material) 1, the same aluminum drum support as in Example 1 was used.
[0051]
A coating liquid composition CTL-1 (35 W / V% solid content concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus (inner diameter D3 = 80.5 mm) as shown in FIG. ) 10 was applied. At this time, a positioning device 20 (length H = 250 mm, inner diameter D2) shown in FIG. 5 is installed immediately before the coating device 10, the moving speed of the cylindrical substrate 1 is 5 mm / sec, the coater 11 and the cylindrical substrate. Continuous coating was performed with a gap of 1 at 250 μm.
[0052]
CTL-1 coating solution composition CTM-1
Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company)
The solid content of 1,2-dichloroethane was fixed at a solid content weight ratio CTM-1: Z-200 = 0.89: 1.
[Chemical formula 2]
Figure 0003635378
[0054]
The coating results are shown in Table 3.
[0055]
[Table 3]
Figure 0003635378
[0056]
As shown in Table 3, the photosensitive drum NO. In the present embodiment with respect to 3-1, 3-2 and 3-3, the inner diameter D2 of the positioning device 20 and the inner diameter D3 of the coating device 10 are both D1 <D2 <D3, and the positioning accuracy is high, and the scratches There was no failure or coating unevenness, and coating properties were good. In contrast to this, the photosensitive drum NO. In the comparative example for 3-4, the positioning performance is unstable, and troubles such as contact between the cylindrical base material 1 and the coating device 10 inlet and contact between the cylindrical base material 1 and the inner wall surface of the positioning device 20 occur. The coating unevenness was generated by the vibration during the contact. Moreover, the coating property of the coating liquid on the cylindrical substrate 1 was poor, and failures such as a scratch and a scratch occurred.
[0057]
An OPC photoconductor in which the photoconductor of the present invention is successively laminated in UCL / CGL / CTL and three layers is produced and photographed. It was good. Also, the coater was not damaged.
[0058]
【The invention's effect】
The following excellent effects were obtained by the cylindrical substrate positioning method and apparatus provided in the coating apparatus of the present invention.
[0059]
(1) The variation of the photosensitive film thickness applied on the cylindrical substrate was extremely small.
[0060]
(2) The coating property of the coating liquid on the cylindrical base material was improved.
[0061]
(3) The occurrence of scratches on the surface of the cylindrical substrate was eliminated.
[0062]
(4) The coating liquid discharge part (coater) of the coating apparatus is not damaged.
[0063]
(5) The positioning accuracy of the cylindrical base material was improved.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view of a positioning device and a coating device according to the present invention.
FIG. 2 is a cross-sectional view taken along line AA and BB of the coating apparatus.
FIG. 3 is a schematic cross-sectional view of a coating device and a positioning device.
FIG. 4 is a partially broken perspective view of the positioning device.
FIG. 5 is a schematic cross-sectional view showing another embodiment of the positioning device.
FIG. 6 is a partially broken perspective view of the positioning device.
FIG. 7 is a schematic diagram illustrating a state in which cylindrical substrates are stacked and conveyed.
[Explanation of symbols]
1,1A, 1B Cylindrical base material (cylindrical drum, conductive support)
2 Processing surface (photosensitive solution surface)
10 Vertical coating device (slide hopper type coating device)
11 Coating head (coater)
20 Positioning device (positioning means)
21 Outer cylinder member 22 Inner cylinder member 23 Air supply port 25 Discharge port 26 Exhaust port 29 Air supply pump D1 Outer diameter D2 of cylindrical base material D2 Inside diameter of positioning device D3 Inner diameter of coating device

Claims (3)

複数の円筒状基材の筒軸を合わせて積み重ね、下方から上方に垂直に押し上げながら、垂直塗布装置により前記円筒状基材外周面上に塗布液を連続的に塗布する工程において、塗布前または塗布後の位置で、前記円筒状基材外周面上に流体を吹き付ける吐出口を有する中空円筒状の吹き付け手段を、前記円筒状基材の同軸に配設して成る位置決め手段により前記円筒状基材の位置決めを行う円筒状基材の位置決め方法において、
前記位置決め手段の吐出口を有する面の内径寸法を、前記垂直塗布装置の流体塗布部の内径寸法より小さく設定したことを特徴とする円筒状基材の位置決め方法。
In the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material by the vertical coating device while vertically stacking the cylindrical shafts of the plurality of cylindrical base materials, A hollow cylindrical spraying means having a discharge port for spraying fluid on the outer peripheral surface of the cylindrical base material at a position after application is positioned by a positioning means formed coaxially with the cylindrical base material. In the positioning method of the cylindrical base material for positioning the material,
A cylindrical base material positioning method, wherein an inner diameter dimension of a surface having a discharge port of the positioning means is set smaller than an inner diameter dimension of a fluid application portion of the vertical coating apparatus.
複数の円筒状基材の筒軸を合わせて積み重ね、下方から上方に垂直に押し上げながら、垂直塗布装置により前記円筒状基材外周面上に塗布液を連続的に塗布する工程において、塗布前または塗布後の位置で、前記円筒状基材外周面上に流体を吹き付ける吐出口を有する中空円筒状の吹き付け手段を、前記円筒状基材の同軸に配設して成る位置決め手段により前記円筒状基材の位置決めを行う円筒状基材の位置決め装置において、
前記位置決め手段の吐出口を有する面の内径寸法を、前記垂直塗布装置の流体塗布部の内径寸法より小さく設定したことを特徴とする円筒状基材の位置決め装置。
In the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material by the vertical coating device while vertically stacking the cylindrical shafts of the plurality of cylindrical base materials, A hollow cylindrical spraying means having a discharge port for spraying fluid on the outer peripheral surface of the cylindrical base material at a position after application is positioned by a positioning means formed coaxially with the cylindrical base material. In a positioning device for a cylindrical base material for positioning a material,
An apparatus for positioning a cylindrical base material, wherein an inner diameter dimension of a surface having a discharge port of the positioning means is set smaller than an inner diameter dimension of a fluid application portion of the vertical coating apparatus.
前記垂直塗布装置がスライドホッパー型塗布装置であることを特徴とする請求項2記載の円筒状基材の位置決め装置。3. The cylindrical substrate positioning device according to claim 2, wherein the vertical coating device is a slide hopper type coating device.
JP12523295A 1995-05-24 1995-05-24 Cylindrical substrate positioning method and apparatus Expired - Fee Related JP3635378B2 (en)

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JP12523295A JP3635378B2 (en) 1995-05-24 1995-05-24 Cylindrical substrate positioning method and apparatus
US08/651,913 US5674552A (en) 1995-05-24 1996-05-21 Method of and apparatus for positioning a cylindrical base material

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