JPH08323279A - Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus - Google Patents

Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus

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Publication number
JPH08323279A
JPH08323279A JP13361895A JP13361895A JPH08323279A JP H08323279 A JPH08323279 A JP H08323279A JP 13361895 A JP13361895 A JP 13361895A JP 13361895 A JP13361895 A JP 13361895A JP H08323279 A JPH08323279 A JP H08323279A
Authority
JP
Japan
Prior art keywords
base material
cylindrical base
cylindrical
coating
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13361895A
Other languages
Japanese (ja)
Inventor
Junji Ujihara
淳二 氏原
Eiichi Kijima
栄一 木島
Akira Ohira
晃 大平
Masanari Asano
真生 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP13361895A priority Critical patent/JPH08323279A/en
Publication of JPH08323279A publication Critical patent/JPH08323279A/en
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE: To perform positioning of a base material without giving any flaw by setting static frictional coefficients of both end faces of the base material within a specified range in a process wherein step differences among a plurality of base materials each other are modified by applying an external force on the outer peripheral face of a cylindrical base material by a positioning means. CONSTITUTION: In a vertical coating apparatus 10 for performing coating on cylindrical base materials 1A and 1B by means of a coating head 11, a coating liq. is fed to the coating head 11 through a coating liq. distributing room 14, a coating liq. outlet 12, etc. A positioning device 20 is arranged on the lower part of this vertical coating apparatus. This positioning device 20 consists of an outer cylindrical member 21 and an inner cylindrical member 22 and a plurality of intake vents 23 and exhaust vents 26 are respectively recessedly provided. Then, step differences or positioning for a plurality of base materials each other are performed by applying an external force on the outer peripheral face of the base material 1, and in this case, static frictional coefficients of both end faces of the base material are set in a range of 0.5-2.5. Generation of deviation between both end faces of adjoining base materials is suppressed thereby.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、複数の円筒状基材外周
面上に処理液を連続的に塗布する際に、該円筒状基材を
位置決めする方法及び垂直塗布装置用円筒状基材に関
し、特に、円筒状基材に感光液を塗布することにより、
電子写真感光体を製造する際に、円筒状基材を正確に位
置決めする方法及び円筒状基材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for positioning a cylindrical base material when continuously coating a treatment liquid on the outer peripheral surface of a plurality of cylindrical base materials, and a cylindrical base material for a vertical coating device. In particular, by applying a photosensitive solution to a cylindrical substrate,
The present invention relates to a method for accurately positioning a cylindrical substrate and a cylindrical substrate when manufacturing an electrophotographic photosensitive member.

【0002】[0002]

【従来の技術】電子写真装置で使用される感光体である
有機光導電体感光ドラムの製造においては、円筒形状の
ドラムに感光性の感光液(処理液)を塗布する。その塗
布に当たっては、円筒ドラムの周面にスライドホッパー
を所定位置に位置せしめ、両者間の間隙を周方向に関し
て一定に保持する調整作業が必要となる。この場合、所
要の塗布層厚は極めて薄いため、円筒状ドラムが0.1
mmずれても周方向に関し、円筒面全体としてみれば塗
膜層の膜厚の大きな偏差要因となる。
2. Description of the Related Art In manufacturing an organic photoconductor photosensitive drum which is a photosensitive member used in an electrophotographic apparatus, a photosensitive photosensitive liquid (treatment liquid) is applied to a cylindrical drum. In the coating, it is necessary to adjust the slide hopper at a predetermined position on the peripheral surface of the cylindrical drum and to keep the gap between them constant in the circumferential direction. In this case, since the required coating layer thickness is extremely thin,
Even if it is deviated by mm, with respect to the circumferential direction, it causes a large deviation in the film thickness of the coating layer when viewed as the entire cylindrical surface.

【0003】かかる塗膜層の膜厚偏差があると、円筒状
ドラムの周方向で帯電量の変化、感度の不均一、残留電
位の変化等の各種不具合が生じることは周知の事実であ
る。従って、円筒状ドラムの正確な位置決めが極めて重
要となる。
It is a well-known fact that such a film thickness deviation of the coating layer causes various problems such as a change in charge amount, a non-uniform sensitivity, and a change in residual potential in the circumferential direction of the cylindrical drum. Therefore, accurate positioning of the cylindrical drum is extremely important.

【0004】従来、この種の円筒状ドラムの位置決め装
置としては、例えば特開昭60−50537号公報に記
載のように、支持部材に回転自在に設けた位置規制コロ
を円筒状ドラムの外周に接触させて設けたものがある。
また、特開平3−280063号公報及び特開平4−7
3655号公報には、エアベアリングを使用した感光ド
ラムの位置決め装置が開示されている。
Conventionally, as a positioning device for this type of cylindrical drum, for example, as disclosed in Japanese Patent Laid-Open No. 60-50537, a position regulating roller rotatably provided on a supporting member is provided on the outer periphery of the cylindrical drum. Some are provided in contact with each other.
Further, JP-A-3-280063 and JP-A-4-7
Japanese Patent No. 3655 discloses a photosensitive drum positioning device using an air bearing.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記の
コロ接触式の従来の位置決め装置は、位置規制コロを直
接円筒状ドラムに対して接触させながら位置決めするも
のであるので、円筒状ドラムに傷がついてしまうという
難点があった。円筒状ドラムに傷がつくと、電子写真特
性が悪化することは周知である。
However, since the above-mentioned conventional roller contact type positioning device positions the position regulating roller while directly contacting the cylindrical drum, the cylindrical drum is damaged. There was a difficulty that it would keep up. It is well known that scratching a cylindrical drum will degrade the electrophotographic properties.

【0006】上記エアベアリング式の位置決め装置は、
空気等の流体を吹付ノズルから吹き付けて位置決めを行
うようにしたもので、円筒状ドラムの傷付きが防止で
き、極めて有効である。
The air bearing type positioning device is
A fluid such as air is sprayed from a spray nozzle to perform positioning, which is extremely effective because scratches on the cylindrical drum can be prevented.

【0007】しかし、図7(a)に示すように、複数の
円筒状ドラム1A,1Bの端部を接して積み重ねて繋ぎ
合わせた状態で移動させる場合、先の円筒状ドラム1A
が位置決め用吹付ノズル3から逃げて、次の円筒状ドラ
ム1Bに移行するとき、先の円筒状ドラム1Aが外的要
因により、水平方向に移動させる外力が作用したときに
は、図7(b)のように、たとえ次の円筒状ドラム1B
の位置決めを行うことができたとしても、先の円筒状ド
ラム1Aが水平方向に急にずれてしまうことがある。こ
の移動現象が生じると、感光液の横段や液切れ塗布等と
なって現れる。
However, as shown in FIG. 7 (a), when the end portions of a plurality of cylindrical drums 1A and 1B are brought into contact with each other and stacked and moved, the cylindrical drum 1A is moved forward.
7 escapes from the positioning spray nozzle 3 and moves to the next cylindrical drum 1B, when an external force is applied to move the previous cylindrical drum 1A in the horizontal direction due to an external factor, as shown in FIG. So even if the next cylindrical drum 1B
Even if the positioning can be performed, the cylindrical drum 1A may be abruptly displaced in the horizontal direction. When this movement phenomenon occurs, it appears as a horizontal step of the photosensitive solution or a coating solution running out.

【0008】本発明の主課題は円筒状ドラムに傷を付け
ることなく、円筒状ドラムの位置決めを行うとともに、
円筒状ドラム相互間の繋ぎ部分における円筒状ドラムの
位置ずれを防止することにある。
The main object of the present invention is to position the cylindrical drum without damaging the cylindrical drum, and
The purpose is to prevent displacement of the cylindrical drums at the connecting portion between the cylindrical drums.

【0009】[0009]

【課題を解決するための手段】上記課題を解決する本発
明の請求項1に記載の円筒状基材の位置決め方法は、複
数の円筒状基材の筒軸を合わせて積み重ね、下方から上
方に垂直に押し上げながら、垂直塗布装置により前記円
筒状基材外周面上に塗布液を連続的に塗布する工程にお
いて、塗布前または塗布後の位置で、前記円筒状基材と
同軸に配設して成る位置決め手段により、前記円筒状基
材の外周面の筒軸に対して直角方向から外力を加えて、
複数の円筒状基材相互の段差修正または位置決めを行う
円筒状基材の位置決め方法において、前記複数の円筒状
基材の両端面の静止摩擦係数が、0.5〜2.5の範囲
であることを特徴とするものである。
A method of positioning a cylindrical base material according to claim 1 of the present invention which solves the above-mentioned problems is a method of stacking a plurality of cylindrical base materials by aligning their cylindrical axes, and from top to bottom. While vertically pushing up, in the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device, the coating liquid is disposed coaxially with the cylindrical substrate at a position before or after coating. By the positioning means consisting of, by applying an external force from a direction perpendicular to the cylinder axis of the outer peripheral surface of the cylindrical substrate,
In a method of positioning a cylindrical base material for correcting a step between or positioning a plurality of cylindrical base materials, static friction coefficients of both end surfaces of the plurality of cylindrical base materials are in the range of 0.5 to 2.5. It is characterized by that.

【0010】また、本発明の請求項4に記載の垂直塗布
装置用円筒状基材の位置決め装置は、複数の円筒状基材
の筒軸を合わせて積み重ね、下方から上方に垂直に押し
上げながら、垂直塗布装置により前記円筒状基材外周面
上に塗布液を連続的に塗布する工程において、塗布前ま
たは塗布後の位置で、前記円筒状基材と同軸に配設して
成る位置決め手段により、前記円筒状基材の外周面の筒
軸に対して直角方向から外力を加えて、複数の円筒状基
材相互の段差修正または位置決めを行いながら塗布する
垂直塗布装置に用いられる円筒状基材において、前記複
数の円筒状基材の両端面の静止摩擦係数が、0.5〜
2.5の範囲であることを特徴とするものである。
According to a fourth aspect of the present invention, in a positioning device for a cylindrical base material for a vertical coating device, a plurality of cylindrical base materials are piled up by aligning their cylindrical axes, and vertically pushed upward from below, In the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material by a vertical coating device, at a position before or after coating, by a positioning means arranged coaxially with the cylindrical base material, In a cylindrical base material used in a vertical coating device that applies an external force from a direction perpendicular to the cylinder axis of the outer peripheral surface of the cylindrical base material while performing step correction or positioning between the plurality of cylindrical base materials. The static friction coefficient of both end surfaces of the plurality of cylindrical base materials is 0.5 to
It is characterized by being in the range of 2.5.

【0011】[0011]

【作用】本発明では、円筒状基材の外周面に対して流体
を吹き付けて、その流体量により円筒状基材の位置決め
を行う。すなわち、円筒状基材の周囲から流体、例えば
エアを吹き付けると、その吹き付け流体量により、円筒
状基材の位置が中立化し、これによって円筒状基材が所
定位置に位置決めされる。しかも、円筒状基材に機械的
接触することがないから、円筒状基材に傷を付けること
が防止される。
In the present invention, the fluid is sprayed onto the outer peripheral surface of the cylindrical substrate, and the cylindrical substrate is positioned by the amount of the fluid. That is, when a fluid such as air is blown from around the cylindrical base material, the position of the cylindrical base material is neutralized due to the amount of the sprayed fluid, whereby the cylindrical base material is positioned at a predetermined position. Moreover, since the cylindrical base material does not come into mechanical contact with the cylindrical base material, it is possible to prevent the cylindrical base material from being damaged.

【0012】他方、複数の円筒状基材の筒軸を合わせて
積み重ね、下方から上方に垂直に押し上げながら、垂直
塗布装置により前記円筒状基材外周面上に塗布液を連続
的に塗布し、塗布前または塗布後の位置で、前記円筒状
基材外周面上に流体を吹き付ける吐出口を有する中空円
筒状吹き付け手段を、前記円筒状基材の同軸に配設して
成る位置決め手段により前記円筒状基材の位置決めを行
う円筒状基材の位置決め装置において、位置決めに当た
り、複数の円筒状基材のうち、直角度が悪い円筒状基材
がたとえ一つでもあると、吹き付け装置から吐出された
エアーが前記各円筒状基材の端面が相互に接する繋ぎ部
に入って、円筒状基材が浮き上がって、傾いたり振動し
たりして、積み重なって進行する円筒状基材すべてに悪
影響を与え、塗布性が低下する。
[0012] On the other hand, a plurality of cylindrical base materials are stacked by aligning the cylinder axes, and while vertically pushing upward from below, a vertical coating device continuously applies the coating liquid onto the outer peripheral surface of the cylindrical base material, At the position before or after coating, the hollow cylindrical spraying means having a discharge port for spraying a fluid onto the outer peripheral surface of the cylindrical base material is positioned by the positioning means formed coaxially with the cylindrical base material to form the cylinder. In a cylindrical substrate positioning device that positions a cylindrical substrate, if there is at least one cylindrical substrate with a poor squareness in positioning, it is discharged from the spraying device. Air enters the connecting portion where the end faces of each of the cylindrical base materials are in contact with each other, the cylindrical base material floats up, tilts or vibrates, and adversely affects all the cylindrical base materials that progress in a stack, Application There is reduced.

【0013】本発明は、円筒状基材の両端面の静止摩擦
係数が、0.5〜2.5の範囲であることを特徴とす
る。複数の円筒状基材の筒軸を合わせて積み重ね、下方
から上方に垂直に押し上げながら、垂直塗布装置により
前記円筒状基材外周面上に塗布液を連続的に塗布する工
程において、該静止摩擦係数が0.5より小さいと、振
動や好ましからざる外力により、相接する円筒状基材の
双方の各両端面間にずれを発生し易い。円筒状基材の両
端面の静止摩擦係数が、2.5より大きいと、相接する
円筒状基材の双方の各両端面同志が滑りにくく、複数の
円筒状基材相互の段差修正または位置決めを行うことが
困難になる。特に、1本当たりの重量が大きい円筒状基
材を、筒軸を垂直にして複数本を積み重ねて、下方から
上方に垂直に押し上げながら、垂直塗布装置により前記
円筒状基材外周面上に塗布液を連続的に塗布する工程に
おいては、最下部の円筒状基材にかかる力(総重量)は
大きくなるため、円筒状基材相互の段差修正または位置
決めを行うことが困難である。従って、円筒状基材の両
端面の静止摩擦係数は小さい側が良い。この静止摩擦係
数は、円筒状基材の大きさや重量によって異なるが、一
般に使用される画像形成装置において、好ましくは0.
7〜2.0の範囲が良い。
The present invention is characterized in that the static friction coefficient of both end faces of the cylindrical substrate is in the range of 0.5 to 2.5. In the process of continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material by the vertical coating device while vertically stacking the cylindrical base materials of the plurality of cylindrical base materials by vertically stacking them up from below, the static friction When the coefficient is less than 0.5, a shift is likely to occur between both end faces of both of the cylindrical base materials that are in contact with each other due to vibration or unwanted external force. If the static friction coefficient of both end surfaces of the cylindrical base material is larger than 2.5, both end surfaces of the adjoining cylindrical base materials are hard to slip, and the step difference between the plurality of cylindrical base materials is corrected or positioned. Will be difficult to do. In particular, a plurality of cylindrical base materials having a large weight per one are stacked with the cylinder axis being vertical and vertically pushed upward from below, and applied onto the outer peripheral surface of the cylindrical base material by a vertical coating device. In the step of continuously applying the liquid, the force (total weight) applied to the lowermost cylindrical base material becomes large, so that it is difficult to perform the step correction or the positioning between the cylindrical base materials. Therefore, it is preferable that the static friction coefficient of both end surfaces of the cylindrical substrate is small. This static friction coefficient varies depending on the size and weight of the cylindrical base material, but is preferably 0. 0 in a commonly used image forming apparatus.
A range of 7 to 2.0 is good.

【0014】上記静止摩擦係数(μ)は、2本の円筒状
基材を筒軸を垂直にして積み重ね、下方の円筒状基材を
固定し、重量Wの上方の円筒状基材に対して水平方向の
外力を加え、該上方の円筒状基材が動き始めた時の外力
(静止最大摩擦力)Fを、例えばヒズミゲージで測定
し、F/W=μにより、算出される。上記静止最大摩擦
力Fは、具体的な測定器として、FRICTRON M
ODEL EFM−3−F(オリオンテック社製)、ま
たは上記測定器をベースにした改良機により測定した。
The static friction coefficient (μ) is obtained by stacking two cylindrical base materials with the cylinder axis vertical and fixing the lower cylindrical base material to the upper cylindrical base material having a weight W. An external force in the horizontal direction is applied, and an external force (static maximum frictional force) F when the upper cylindrical base material starts to move is measured by, for example, a strain gauge, and is calculated by F / W = μ. The above static maximum frictional force F is measured by the FRICTRON M
It measured by ODEL EFM-3-F (made by Orion Tech) or the improvement machine based on the said measuring device.

【0015】垂直塗布装置により前記円筒状基材外周面
上に塗布液を連続的に塗布する工程において、塗布前ま
たは塗布後の位置で、前記円筒状基材と同軸に配設して
成る位置決め手段または円筒状基材間の段差修正手段と
しては、流体例えばエアー等の吐出流によるものが良
く、特開平3−274564号公報等に記載されてい
る。または、タッチロールによるもの、例えば特開昭6
0−50537号、同60−95546号各公報等に記
載されたものも良い。
In a step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical base material by a vertical coating device, positioning is performed by arranging coaxially with the cylindrical base material at a position before or after coating. As the means or the means for correcting the step difference between the cylindrical base materials, a method using a discharge flow of a fluid such as air is preferable, and it is described in JP-A-3-274564. Alternatively, those using a touch roll, for example, Japanese Patent Laid-Open No.
Those described in each of the gazettes of 0-50537 and 60-95546 may also be used.

【0016】前記複数の吐出口を有する位置決め装置
は、2組以上を軸方向に連続接続して用いても良い。
The positioning device having a plurality of discharge ports may be used by continuously connecting two or more sets in the axial direction.

【0017】また、前記位置決め装置に用いる好ましい
流体は、空気、不活性ガス(例えば窒素ガス)が良い。
そして、これらの流体は、JIS規格でクラス100以
上の清浄な気体が良い。
The preferred fluid used for the positioning device is air or an inert gas (for example, nitrogen gas).
And, these fluids are preferably clean gases of class 100 or higher according to JIS standard.

【0018】前記垂直塗布装置としては、スライドホッ
パー型コーター、押し出し型コーター、リング型コータ
ー、スプレーコーター等が用いられる。円筒状基材の筒
軸を垂直にして複数本を積み重ねて、上方または下方に
相対的に移動させることにより、塗布装置により感光液
を塗布できるものであれば、塗布装置として上記の何れ
のコーターでも良いが、特にスライドホッパー型コータ
ーが好適である。
As the vertical coating device, a slide hopper type coater, an extrusion type coater, a ring type coater, a spray coater or the like is used. Any of the above coaters as a coating device as long as the photosensitive liquid can be coated by the coating device by stacking a plurality of cylindrical base materials with the cylinder axis vertical and moving them relatively upward or downward. However, a slide hopper type coater is particularly preferable.

【0019】[0019]

【実施例】以下、本発明の実施例を図面に基づいて詳細
に説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0020】図1は、本発明の位置決め装置を含む環状
の垂直塗布装置の全体を示す断面図である。該垂直塗布
装置は、中心線Oに沿って垂直状に重ね合わせた円筒状
基材(円筒状ドラム)1A,1Bに塗布液(感光液)2
を塗布する垂直塗布装置10と、該垂直塗布装置10の
下方に固設された円筒状基材位置決め装置20と、前記
垂直塗布装置10の上方に設置された乾燥フード30
と、前記位置決め装置20の下部に固定された支持装置
40とから構成されている。
FIG. 1 is a sectional view showing the entire annular vertical coating device including the positioning device of the present invention. The vertical coating apparatus comprises a cylindrical base material (cylindrical drum) 1A and 1B which are vertically stacked along a center line O, and a coating liquid (photosensitive liquid) 2
A vertical coating device 10 for coating the substrate, a cylindrical substrate positioning device 20 fixed below the vertical coating device 10, and a drying hood 30 installed above the vertical coating device 10.
And a supporting device 40 fixed to the lower part of the positioning device 20.

【0021】垂直塗布装置10の内部には、円筒状基材
1Aの外周を取り囲むように塗布液2を塗布する塗布ヘ
ッド11、該塗布ヘッド11に隣接するテーパ状の塗布
液流出口(塗布液スライド面)12、水平方向の幅狭の
塗布液通路を形成する塗布液分配用スリット13、塗布
液分配室14が形成されている。前記塗布液分配室14
には塗布液供給パイプ16が接続され、図示しない圧送
ポンプにより塗布液が供給される。
Inside the vertical coating device 10, a coating head 11 for coating the coating liquid 2 so as to surround the outer periphery of the cylindrical substrate 1A, and a tapered coating liquid outlet (coating liquid) adjacent to the coating head 11. A slide surface 12, a coating liquid distribution slit 13 forming a horizontal coating liquid passage, and a coating liquid distribution chamber 14 are formed. The coating liquid distribution chamber 14
A coating liquid supply pipe 16 is connected to the coating liquid, and the coating liquid is supplied by a pressure feed pump (not shown).

【0022】上記垂直塗布装置10による塗布方法は、
垂直塗布装置10を固定し、前記円筒状基材1Aを中心
線Oに沿って矢示方向に上昇移動させながら円筒状基材
1Aの上端部より塗布ヘッド11により塗布を行う。
The coating method by the vertical coating device 10 is as follows.
The vertical coating device 10 is fixed, and coating is performed by the coating head 11 from the upper end of the cylindrical substrate 1A while moving the cylindrical substrate 1A upward along the center line O in the direction of the arrow.

【0023】前記垂直塗布装置10には、圧送ポンプに
より一定量の塗布液が安定して送り込まれ、塗布液供給
パイプ16、塗布液分配室14、塗布液分配用スリット
13、塗布液流出口12を経て、塗布ヘッド11に供給
され、円筒状基材1Aの表面に塗布液が塗布され感光層
が形成される。
A fixed amount of the coating liquid is stably fed to the vertical coating device 10 by a pressure pump, and the coating liquid supply pipe 16, the coating liquid distribution chamber 14, the coating liquid distribution slit 13, and the coating liquid outlet 12 are provided. After that, the coating liquid is supplied to the coating head 11, and the coating liquid is coated on the surface of the cylindrical substrate 1A to form a photosensitive layer.

【0024】前記垂直塗布装置10の上部には、環状に
形成した乾燥フード30が固定されている。該乾燥フー
ド30には多数の開口部31が形成されている。前記垂
直塗布装置10により形成された円筒状基材上の感光層
は、前記乾燥フード30内を通過しながら塗布された感
光液2を徐々に乾燥させる。乾燥は前記開口部31より
感光液に含まれる溶媒を外部に放出させることにより行
なわれる。
An annular drying hood 30 is fixed to the upper portion of the vertical coating device 10. A large number of openings 31 are formed in the drying hood 30. The photosensitive layer on the cylindrical substrate formed by the vertical coating device 10 gradually dries the coated photosensitive liquid 2 while passing through the drying hood 30. The drying is performed by releasing the solvent contained in the photosensitive liquid to the outside through the opening 31.

【0025】前記垂直塗布装置10の下部には、位置決
め装置20が固定されている。図2(a)は図1におけ
る位置決め装置20のA−A断面図(給気部)、図2
(b)はB−B断面図(排気部)である。
A positioning device 20 is fixed to the lower portion of the vertical coating device 10. 2A is a sectional view of the positioning device 20 in FIG.
(B) is a BB sectional view (exhaust part).

【0026】前記円筒状基材の位置決め装置20は、外
筒部材21と、該外筒部材21の内部に固定された内筒
部材22とから構成されている。外筒部材21と内筒部
材22には、両部材を貫通する複数の給気口23と、複
数の排気口26が穿設されている。該複数の給気口23
は、給気ポンプ29に接続され、空気等の流体が圧送さ
れる。
The cylindrical base material positioning device 20 comprises an outer cylinder member 21 and an inner cylinder member 22 fixed inside the outer cylinder member 21. The outer cylinder member 21 and the inner cylinder member 22 are provided with a plurality of air supply ports 23 penetrating both members and a plurality of exhaust ports 26. The plurality of air supply ports 23
Is connected to the air supply pump 29, and a fluid such as air is pressure-fed.

【0027】図1及び図2(a)に示すように、前記外
筒部材21には、給気口23が水平方向に4個の放射状
に配置され、さらに垂直方向に複数段(図示5段)配列
されている。該外筒部材21の内周面には水平溝24が
穿設されていて、前記内筒部材22の外周面との間に水
平流路を形成し、前記水平方向に放射状に配置された4
個の給気口23に連通している。前記内筒部材22に
は、水平方向に12個の吐出口25を有する穴が貫通し
ている。該吐出口25は前記円筒状基材1の外周面と間
隙Gを保って対向している。該間隙Gは、20μm〜3
mm、好ましくは30μm〜2mmである。この間隙G
が20μmより小さいと、円筒状基材1の僅かな振れで
内筒部材22に接触して円筒状基材1を傷つけやすい。
また、間隙Gが3mmより大であると、円筒状基材1の
位置決め精度が低下する。前記吐出口25は直径0.0
1〜1.0mmの小口径のノズルであり、好ましくは
0.05〜0.5mmが良い。
As shown in FIGS. 1 and 2 (a), the outer cylinder member 21 has four air supply ports 23 arranged horizontally in a radial direction, and further has a plurality of vertical stages (five stages shown in the figure). ) It is arranged. A horizontal groove 24 is formed in the inner peripheral surface of the outer cylindrical member 21 to form a horizontal flow path between the outer cylindrical member 21 and the outer peripheral surface of the inner cylindrical member 22, and the grooves are arranged radially in the horizontal direction.
It communicates with the individual air supply port 23. A hole having twelve discharge ports 25 in the horizontal direction penetrates through the inner cylinder member 22. The discharge port 25 faces the outer peripheral surface of the cylindrical substrate 1 with a gap G therebetween. The gap G is 20 μm to 3
mm, preferably 30 μm to 2 mm. This gap G
Is less than 20 μm, the cylindrical base material 1 is likely to be damaged by contacting the inner cylindrical member 22 with a slight shake of the cylindrical base material 1.
Further, when the gap G is larger than 3 mm, the positioning accuracy of the cylindrical base material 1 is reduced. The discharge port 25 has a diameter of 0.0
The nozzle has a small diameter of 1 to 1.0 mm, preferably 0.05 to 0.5 mm.

【0028】図1及び図2(b)に示すように、前記外
筒部材21及び内筒部材22を貫通して、排気口26が
水平方向に4個の放射状に配置され、さらに垂直方向に
複数段(図示5段)配列されている。該排気口26は垂
直方向に前記給気口23と交互に配列されている。内筒
部材22の内周面には、垂直溝27が穿設されていて、
前記複数段の排気口26を連通している。
As shown in FIG. 1 and FIG. 2B, four exhaust holes 26 are arranged horizontally in a radial direction through the outer cylinder member 21 and the inner cylinder member 22, and further in a vertical direction. A plurality of stages (5 stages in the figure) are arranged. The exhaust ports 26 are arranged alternately with the air supply ports 23 in the vertical direction. A vertical groove 27 is formed on the inner peripheral surface of the inner cylinder member 22,
The plurality of stages of exhaust ports 26 communicate with each other.

【0029】前記内筒部材22の下部の内周面は、入り
口側が広がったテーパー面28になっている。このテー
パー面28は、例えば軸方向の長さが50mmで、片側
傾斜角が0.5mmの円錐面である。このテーパー面2
8のテーパー比は、0.005〜0.2、好ましくは
0.01〜0.1である。このテーパー面28を設けた
ることにより、円筒状基材1が水平移動または傾斜して
位置決め装置20に進入した際に、位置規制されるから
有効である。
The inner peripheral surface of the lower portion of the inner cylinder member 22 is a tapered surface 28 that widens on the inlet side. The tapered surface 28 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. This taper surface 2
The taper ratio of 8 is 0.005 to 0.2, preferably 0.01 to 0.1. By providing the tapered surface 28, the position is regulated when the cylindrical base material 1 horizontally moves or tilts and enters the positioning device 20, which is effective.

【0030】このテーパー面28を設けることにより、
円筒状基材1が内筒部材22に進入するとき、円筒状基
材1の先端部が内筒部材22の内周面に接触することを
防止している。
By providing this tapered surface 28,
When the cylindrical base material 1 enters the inner cylinder member 22, the tip of the cylindrical base material 1 is prevented from coming into contact with the inner peripheral surface of the inner cylinder member 22.

【0031】前記給気ポンプ29から圧送された流体
は、複数の給気口23から外筒部材23内に導入され
て、水平溝24を介して複数の吐出口25から吐出さ
れ、前記円筒状基材1A(1B)の外周面と均一な流体
膜層を形成する。吐出後の流体は垂直溝27を経て複数
の排気口26から装置外に排出される。
The fluid pumped from the air supply pump 29 is introduced into the outer cylinder member 23 through the plurality of air supply ports 23, and is discharged through the plurality of discharge ports 25 through the horizontal groove 24 to form the cylindrical shape. A uniform fluid film layer is formed on the outer peripheral surface of the base material 1A (1B). The discharged fluid is discharged to the outside of the apparatus through the plurality of exhaust ports 26 through the vertical groove 27.

【0032】前記吐出口25の開口直径は0.01〜1
mm、好ましくは0,05〜0.5mm、例えば0.2
〜0.5mmの円形に形成されている。排気口26の開
口直径は1.0〜10mm、好ましくは2.0〜8.0
mm、例えば3〜5mmの円形に形成されている。そし
て前記吐出口25及び排気口26とは、前記位置決め手
段20の最内面を形成する部材(内筒部材22)の円筒
状基材1の外周面に対向する側に、一体に組み込まれて
いる。
The opening diameter of the discharge port 25 is 0.01 to 1
mm, preferably 0.05 to 0.5 mm, for example 0.2
It is formed in a circular shape of 0.5 mm. The opening diameter of the exhaust port 26 is 1.0 to 10 mm, preferably 2.0 to 8.0.
It is formed in a circular shape of mm, for example, 3 to 5 mm. The discharge port 25 and the exhaust port 26 are integrally incorporated on the side of the member (inner tubular member 22) forming the innermost surface of the positioning means 20 facing the outer peripheral surface of the cylindrical substrate 1. .

【0033】また、前記給気口23に供給される毎分当
たりの流体量は、0.1〜50m3/min.が好まし
い。流体量が0.1m3/min.より小であると、円
筒状基材1の位置決め精度が極端に悪化し、50m3
min.より大になると、風量の影響が強く出て、積み
重ねられた円筒状基材1が振動し、液膜が不均一とな
る。このため特に、毎分当たりの流体量は、0.2〜2
0m3/min.が好ましい。ここで、規制供給する流
体は、流体圧規制でなく、流体量制御にしないと、塗布
直後の液膜への影響(膜厚ムラ等)が発生する。なお、
毎分当たりの流体量は、位置決め装置20の給気口23
の入り口で測定した。また、前記複数の給気口23に供
給される毎分当たりの流体量は、軸方向の給気口23の
流量が同じか、下方より上方の流量が多い方が良い。
The amount of fluid supplied to the air supply port 23 per minute is 0.1 to 50 m 3 / min. Is preferred. The amount of fluid is 0.1 m 3 / min. If it is smaller, the positioning accuracy of the cylindrical substrate 1 is extremely deteriorated, and 50 m 3 /
min. When it becomes larger, the influence of the air volume becomes stronger, the stacked cylindrical substrates 1 vibrate, and the liquid film becomes nonuniform. Therefore, in particular, the amount of fluid per minute is 0.2 to 2
0 m 3 / min. Is preferred. Here, if the fluid to be regulated and supplied is not fluid pressure regulation and fluid amount control is not performed, an influence on the liquid film immediately after coating (film thickness unevenness or the like) occurs. In addition,
The amount of fluid per minute is determined by the air supply port 23 of the positioning device 20.
It was measured at the entrance. The amount of fluid supplied to the plurality of air supply ports 23 per minute is preferably the same as the flow rate of the air supply ports 23 in the axial direction or higher in the upper flow rate than in the lower flow rate.

【0034】また、図1に示す位置決め装置20は、1
組のユニットであるが、2組以上のユニットを上下方向
に連結接続しても良い。
The positioning device 20 shown in FIG.
Although it is a set of units, two or more sets may be connected and connected in the vertical direction.

【0035】なお、本発明の位置決め装置に接続される
垂直塗布装置としては、スライドホッパー型、押し出し
型、リングコーター、スプレー塗布等の各種装置が用い
られる。
As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type, a ring coater, and spray coating are used.

【0036】前記給気口23に供給される流体は、空
気、不活性ガス例えば窒素ガスが良い。そして該流体
は、JIS規格でクラス100以上の清浄な気体が良
い。
The fluid supplied to the air supply port 23 is preferably air or an inert gas such as nitrogen gas. The fluid is preferably clean gas of class 100 or higher according to JIS standard.

【0037】[実施例]次に、具体的な実施例により本
発明を説明するが、本発明はこれに限定されるものでは
ない。
[Examples] The present invention will now be described with reference to specific examples, but the present invention is not limited thereto.

【0038】実施例1 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては鏡面加工を施した直径80mm、高さ355mm
のアルミニウムドラム支持体を用いた。
Example 1 (Examples and Comparative Examples) The conductive support (cylindrical base material) 1 has a mirror-finished diameter of 80 mm and a height of 355 mm.
Of aluminum drum support.

【0039】前記導電性支持体1上に下記の如く塗布液
組成物UCL−1(3.0W/V%ポリマー濃度)を調
製し、図1に記載の如くのスライドホッパー型塗布装置
10を用いて塗布した。図3は前記塗布装置10と、位
置決め装置20の模式断面図、図4は位置決め装置20
の一部破断斜視図である。この実施例では、上記塗布装
置10の直前に図3に示すリング状位置決め装置20
(長さH=250mm、吐出口25の直径0.3mm、
排気口26の直径2.0mm)を設置し、下記の表1に
記載の静止摩擦係数(μ)を有する円筒状基材No.1
−1〜No.1−5を用いて、実験した。なお、静止摩
擦係数μが0.60より小さい円筒状基材の端面にはテ
フロンコート処理を施し、静止摩擦係数μが2.5より
大きい円筒状基材の端面にはウレタンコートを施し、静
止摩擦係数μを調整した。また、円筒状基材1(1A,
1B)の移動速度を20mm/sec、コーター(塗布
ヘッド)11と円筒状基材1間ギャップを100μm、
位置決め装置20の内壁面と円筒状基材1との間隙G=
100μmで連続塗布を行った。
A coating liquid composition UCL-1 (3.0 W / V% polymer concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 10 as shown in FIG. 1 was used. Applied. 3 is a schematic sectional view of the coating device 10 and the positioning device 20, and FIG. 4 is a positioning device 20.
It is a partially broken perspective view of FIG. In this embodiment, the ring-shaped positioning device 20 shown in FIG.
(Length H = 250 mm, diameter of discharge port 25 is 0.3 mm,
An exhaust port 26 having a diameter of 2.0 mm) is installed, and a cylindrical base material No. having a static friction coefficient (μ) shown in Table 1 below. 1
-1 to No. Experiments were performed using 1-5. The end surface of the cylindrical base material having a static friction coefficient μ of less than 0.60 is subjected to Teflon coating treatment, and the end surface of the cylindrical base material having a static friction coefficient of more than 2.5 is subjected to urethane coating to make it stationary. The friction coefficient μ was adjusted. In addition, the cylindrical substrate 1 (1A,
1B) moving speed is 20 mm / sec, the gap between the coater (coating head) 11 and the cylindrical substrate 1 is 100 μm,
Gap between the inner wall surface of the positioning device 20 and the cylindrical substrate 1 G =
Continuous coating was performed at 100 μm.

【0040】・UCL−1塗布液組成物 共重合ナイロン樹脂(CM−8000 東レ社製) メタノール/n−ブタノール=10/1(Vol比) 実施例及び比較例による塗布結果を表1に示す。UCL-1 coating liquid composition Copolymerized nylon resin (CM-8000, manufactured by Toray Industries, Inc.) Methanol / n-butanol = 10/1 (Vol ratio) Table 1 shows the coating results according to Examples and Comparative Examples.

【0041】[0041]

【表1】 [Table 1]

【0042】表1に示すように、感光体ドラムNo.1
−1,1−2,1−3に対する本実施例では、円筒状基
材の端面の静止摩擦係数μが0.5〜2.5の範囲内に
あり、何れも円筒状基材1やコーター11に傷、損傷を
与えず、また塗布膜の塗布ムラや膜厚変動が少なく、塗
布欠陥も発生しなかった。
As shown in Table 1, the photosensitive drum No. 1
In this example for -1,1-2,1-3, the static friction coefficient μ of the end surface of the cylindrical base material is in the range of 0.5 to 2.5, and the cylindrical base material 1 and the coater are all used. No scratch or damage was given to No. 11, the coating unevenness of the coating film and the film thickness fluctuation were small, and the coating defect did not occur.

【0043】これに対して、静止摩擦係数μが0.5よ
り小さい感光体ドラムNo.1−4(比較例)は、位置
決め装置20における位置決め工程中で、円筒状基材1
の端面間で滑りを発生し易く、もれ風やささいな振動で
すぐ両端面間でズレを生じた。この比較例では、位置決
め性能は不安定で、円筒状基材1と塗布装置10入口部
での接触、円筒状基材1と位置決め装置20内壁面との
接触等のトラブルを発生し、この接触時の振動により塗
布ムラを発生した。また、円筒状基材1への塗布液の塗
布性も悪く、こすれ傷や擦り傷等の故障が発生した。
On the other hand, the photosensitive drum No. 1 having a static friction coefficient μ of less than 0.5. 1-4 (Comparative Example) is a cylindrical substrate 1 during the positioning process in the positioning device 20.
It was easy for slippage to occur between the end faces, and a gap between the two end faces immediately occurred due to stray wind and small vibrations. In this comparative example, the positioning performance was unstable, and troubles such as contact between the cylindrical base material 1 and the inlet of the coating device 10 and contact between the cylindrical base material 1 and the inner wall surface of the positioning device 20 occurred. The application of vibration caused uneven coating. Further, the coating property of the coating liquid on the cylindrical substrate 1 was poor, and troubles such as scratches and abrasions occurred.

【0044】また、静止摩擦係数μが2.5より大きい
感光体ドラムNo.1−5(比較例)は、位置決め装置
20における位置決め工程中で、円筒状基材1A,1B
の端面間で相対移動することが困難で、上下の円筒状基
材間の段差修正ができなかった。このため円筒状基材1
が塗布装置10のコーター11と衝突して正常の塗布が
できなかった。
Further, the photosensitive drum No. 1 having a static friction coefficient μ of more than 2.5. 1-5 (comparative example) are cylindrical base materials 1A and 1B during the positioning process in the positioning device 20.
It was difficult to make relative movement between the end faces of, and the step difference between the upper and lower cylindrical substrates could not be corrected. Therefore, the cylindrical substrate 1
Collided with the coater 11 of the coating apparatus 10 and normal coating could not be performed.

【0045】実施例2 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては、実施例1と同様の鏡面加工を施した直径80m
m、高さ355mmのアルミニウムドラム支持体を用い
た。
Example 2 (Examples and Comparative Examples) As the conductive support (cylindrical base material) 1, a mirror-finished surface having a diameter of 80 m similar to that of Example 1 was used.
An aluminum drum support having a height of 355 mm and a height of 355 mm was used.

【0046】前記支持体上に下記の如く塗布液組成物C
GL−2(3.0W/V%ポリマー濃度)を分散調製
し、図1に記載の如くのスライドホッパー型塗布装置1
0を用いて塗布した。図5は前記塗布装置10と、位置
決め装置20の模式断面図である。位置決め装置20の
複数の吐出口25を有する吐出口面は、上方の出口部の
長さH1の内壁部分は一定間隙Gを有する円筒面であ
り、下方の入口部の長さH2の内壁部分はテーパー面2
8を有する円錐面である。図6はこのテーパー面28の
テーパー比Cを説明する断面図である。このテーパー比
Cは、円錐の軸線に直角な入口部直径Dと出口部直径d
との差を、テーパー面28の軸方向の長さH2で除した
ものである(C=(D−d)/H2)。
Coating solution composition C was formed on the support as follows.
GL-2 (3.0 W / V% polymer concentration) was dispersed and prepared, and a slide hopper type coating apparatus 1 as shown in FIG.
0 was used for coating. FIG. 5 is a schematic cross-sectional view of the coating device 10 and the positioning device 20. The discharge port surface of the positioning device 20 having a plurality of discharge ports 25 is a cylindrical surface having a constant gap G at the inner wall portion of the upper outlet portion having a length H1, and the inner wall portion having a constant gap G of the lower inlet portion is Tapered surface 2
8 is a conical surface having 8. FIG. 6 is a sectional view for explaining the taper ratio C of the taper surface 28. The taper ratio C is defined by the inlet diameter D and the outlet diameter d perpendicular to the axis of the cone.
Is divided by the axial length H2 of the tapered surface 28 (C = (D−d) / H2).

【0047】この実施例では、上記塗布装置10の直前
に図5に示すリング状位置決め装置20(長さH1=2
40mm、H2=100mm、吐出口25の直径0.1
mm、排気口26の直径4.0mm、テーパー比C=
0.05)を設置し、下記の表2に記載のように、静止
摩擦係数μの異なる円筒状基材1を用い、感光体ドラム
No.2−1〜No.2−5を得た。なお、静止摩擦係
数μが0.60より小さい円筒状基材1の端面にはテフ
ロンコート処理を施し、静止摩擦係数μが2.5より大
きい円筒状基材1の端面にはウレタン樹脂コートを施
し、静止摩擦係数μを調整した。
In this embodiment, a ring-shaped positioning device 20 (length H1 = 2) shown in FIG.
40 mm, H2 = 100 mm, diameter of discharge port 25 is 0.1
mm, the diameter of the exhaust port 26 is 4.0 mm, the taper ratio C =
0.05), and using cylindrical base materials 1 having different static friction coefficients μ as shown in Table 2 below. 2-1 to No. 2-5 was obtained. The end surface of the cylindrical base material 1 having a static friction coefficient μ smaller than 0.60 is subjected to Teflon coating treatment, and the end surface of the cylindrical base material 1 having a static friction coefficient μ larger than 2.5 is coated with urethane resin. Then, the coefficient of static friction μ was adjusted.

【0048】また、円筒状基材1の移動速度を30mm
/sec、コーター(塗布ヘッド)11と円筒状基材1
間ギャップを100μm、位置決め装置20の内壁面と
円筒状基材1との間隙G=100μmで連続塗布を行っ
た。
The moving speed of the cylindrical substrate 1 is 30 mm.
/ Sec, coater (coating head) 11 and cylindrical substrate 1
The continuous coating was performed with a gap of 100 μm and a gap G = 100 μm between the inner wall surface of the positioning device 20 and the cylindrical substrate 1.

【0049】・CGL−2塗布液組成物 ペリレン顔料(CGM−2) ブチラール樹脂(エスレックBX−L積水化学社製) メチルエチルケトン 上記塗布液組成物(固形分については固形分重量比CG
M−2:BX−L=2:1に固定)をサンドミルを用い
て20時間分散したもの。
CGL-2 coating liquid composition Perylene pigment (CGM-2) Butyral resin (S-REC BX-L Sekisui Chemical Co., Ltd.) Methyl ethyl ketone The above coating liquid composition (solid content weight ratio CG
M-2: BX-L = fixed at 2: 1) dispersed with a sand mill for 20 hours.

【0050】[0050]

【化1】 Embedded image

【0051】塗布結果を表2に示す。The coating results are shown in Table 2.

【0052】[0052]

【表2】 [Table 2]

【0053】表2に示すように、感光体ドラムNo.2
−1,2−2,2−3に対する本実施例では、円筒状基
材の端面の静止摩擦係数μが0.5〜2.5の範囲内に
あり、何れも円筒状基材1やコーター11に傷、損傷を
与えず、また塗布膜の塗布ムラや膜厚変動が少なく、塗
布欠陥も発生しなかった。
As shown in Table 2, the photosensitive drum No. Two
In this example for -1, 2, 2 and 2-3, the static friction coefficient μ of the end surface of the cylindrical base material is in the range of 0.5 to 2.5, and the cylindrical base material 1 and the coater are all used. No scratch or damage was given to No. 11, the coating unevenness of the coating film and the film thickness fluctuation were small, and the coating defect did not occur.

【0054】これに対して、静止摩擦係数μが0.5よ
り小さい感光体ドラムNo.2−4(比較例)は、位置
決め装置20における位置決め工程中で、円筒状基材1
の端面間で滑りを発生し易く、もれ風やささいな振動で
すぐ両端面間でズレを生じた。この比較例では、位置決
め性能は不安定で、円筒状基材1と塗布装置10入口部
での接触、円筒状基材1と位置決め装置20内壁面との
接触等のトラブルを発生し、この接触時の振動により塗
布ムラを発生した。また、円筒状基材1への塗布液の塗
布性も悪く、こすれ傷や擦り傷等の故障が発生した。
On the other hand, the photosensitive drum No. 1 having a static friction coefficient μ of less than 0.5. 2-4 (Comparative Example) is a cylindrical substrate 1 during the positioning process in the positioning device 20.
It was easy for slippage to occur between the end faces, and a gap between the two end faces immediately occurred due to stray wind and small vibrations. In this comparative example, the positioning performance is unstable, and troubles such as contact between the cylindrical base material 1 and the inlet of the coating device 10 and contact between the cylindrical base material 1 and the inner wall surface of the positioning device 20 occur. The application of vibration caused uneven coating. Further, the coating property of the coating liquid on the cylindrical substrate 1 was poor, and troubles such as scratches and abrasions occurred.

【0055】また、静止摩擦係数μが2.5より大きい
感光体ドラムNo.2−5(比較例)は、位置決め装置
20における位置決め工程中で、円筒状基材1A,1B
の端面間で相対移動することが困難で、上下の円筒状基
材間の段差修正ができなかった。このため円筒状基材1
が塗布装置10のコーター11と衝突して正常の塗布が
できなかった。
Further, the photosensitive drum No. 1 having a static friction coefficient μ of more than 2.5. 2-5 (comparative example) is a cylindrical base material 1A, 1B during the positioning process in the positioning device 20.
It was difficult to make relative movement between the end faces of, and the step difference between the upper and lower cylindrical substrates could not be corrected. Therefore, the cylindrical substrate 1
Collided with the coater 11 of the coating apparatus 10 and normal coating could not be performed.

【0056】実施例3 (実施例)導電性支持体(円筒状基材)1としては実施
例1と同じアルミニウムドラム支持体を用いた。
Example 3 (Example) As the conductive support (cylindrical base material) 1, the same aluminum drum support as in Example 1 was used.

【0057】前記導電性支持体1上に下記の如く塗布液
組成物CTL−1(35W/V%固形分濃度)を調製
し、図1に記載の如くのスライドホッパー型塗布装置1
0を用いて塗布した。この際、上記塗布装置10の直前
に実施例1と同じ位置決め装置20を設置し、表3に記
載の如くの円筒状基材1を用い、感光体ドラムNo.3
−1〜No.3−3を得た。なお、静止摩擦係数μが
0.60より小さい円筒状基材の端面にはテフロンコー
ト処理を施し、静止摩擦係数μが2.5より大きい円筒
状基材の端面にはウレタンコートを施し、静止摩擦係数
μを調整した。また、移動速度5mm/sec、コータ
ー11と円筒状基材1間のギャップを250μm、間隙
G=100μmで連続塗布を行った。
A coating liquid composition CTL-1 (35 W / V% solid content concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 1 as shown in FIG. 1 was prepared.
0 was used for coating. At this time, the same positioning device 20 as in Example 1 was installed immediately before the coating device 10, the cylindrical substrate 1 as shown in Table 3 was used, and the photosensitive drum No. Three
-1 to No. 3-3 was obtained. The end surface of the cylindrical base material having a static friction coefficient μ of less than 0.60 is subjected to Teflon coating treatment, and the end surface of the cylindrical base material having a static friction coefficient of more than 2.5 is subjected to urethane coating to make it stationary. The friction coefficient μ was adjusted. Further, continuous coating was performed at a moving speed of 5 mm / sec, a gap between the coater 11 and the cylindrical substrate 1 of 250 μm, and a gap G of 100 μm.

【0058】・CTL−1塗布液組成物 CTM−1 ポリカーボネート(Z−200 三菱瓦斯化学社製) 1,2−ジクロロエタン 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定
CTL-1 coating liquid composition CTM-1 polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Co., Inc.) 1,2-dichloroethane Solid content weight ratio CTM-1: Z-200 for solid content.
Fixed at = 0.89: 1

【0059】[0059]

【化2】 Embedded image

【0060】塗布結果を表3に示す。The coating results are shown in Table 3.

【0061】[0061]

【表3】 [Table 3]

【0062】表3に示すように、感光体ドラムNo.3
−1,3−2,3−3に対する本実施例では、位置決め
精度が高く、傷、塗布むらもなく、塗布性能が良好であ
った。
As shown in Table 3, the photosensitive drum No. Three
In this example for -1, 3-2 and 3-3, the positioning accuracy was high, there were no scratches and coating unevenness, and the coating performance was good.

【0063】本発明の感光体をUCL/CGL/CTL
と3層に逐次重層したOPC感光体を作製し実写したと
ころ、搬送性、塗布性ともに良好であり、実写して画像
形成したところ、濃淡ムラ、カブリムラや画像欠陥(黒
ポチ、白ポチ、スジ故障、キズ故障)がなく良好であっ
た。またコーターを損傷することもなかった。
The photoconductor of the present invention is UCL / CGL / CTL.
When an OPC photoconductor having three layers, which were sequentially laminated, was produced and actually photographed, both the transportability and the coating property were good. When the images were actually photographed, unevenness in light and shade, fog and image defects (black spots, white spots, stripes) There was no failure or damage, and it was good. It also did not damage the coater.

【0064】[0064]

【発明の効果】本発明の塗布装置に備えた円筒状基材の
位置決め方法及び装置により、以下の優れた効果が得ら
れた。
By the method and apparatus for positioning a cylindrical substrate provided in the coating apparatus of the present invention, the following excellent effects are obtained.

【0065】(1)円筒状基材上に塗布された感光膜厚
の変動が極めて微小となった。
(1) The fluctuation of the photosensitive film thickness coated on the cylindrical substrate was extremely small.

【0066】(2)円筒状基材への塗布液の塗布性が良
好になった。
(2) The coating property of the coating liquid on the cylindrical substrate was improved.

【0067】(3)円筒状基材の表面の傷発生が解消さ
れた。
(3) The occurrence of scratches on the surface of the cylindrical substrate was eliminated.

【0068】(4)塗布装置の塗布液吐出部(コータ
ー)を損傷させることがない。
(4) The coating liquid discharge part (coater) of the coating device is not damaged.

【0069】(5)円筒状基材の位置決め精度が向上し
た。
(5) The positioning accuracy of the cylindrical substrate is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による位置決め装置と塗布装置の縦断面
図。
FIG. 1 is a vertical sectional view of a positioning device and a coating device according to the present invention.

【図2】上記位置決め装置のA−A断面図及びB−B断
面図。
FIG. 2 is a sectional view taken along line AA and a sectional view taken along line BB of the positioning device.

【図3】塗布装置と位置決め装置の模式断面図。FIG. 3 is a schematic cross-sectional view of a coating device and a positioning device.

【図4】上記位置決め装置の一部破断斜視図。FIG. 4 is a partially cutaway perspective view of the positioning device.

【図5】位置決め装置の他の実施例を示す模式断面図。FIG. 5 is a schematic cross-sectional view showing another embodiment of the positioning device.

【図6】位置決め装置の吐出テーパー面を説明する断面
図。
FIG. 6 is a sectional view illustrating a discharge taper surface of a positioning device.

【図7】円筒状基材を積み重ねて搬送する状態を説明す
る模式図。
FIG. 7 is a schematic diagram illustrating a state in which cylindrical base materials are stacked and conveyed.

【符号の説明】[Explanation of symbols]

1,1A,1B 円筒状基材(円筒状ドラム、導電性支
持体) 2 処理面(感光液面) 10 垂直塗布装置(スライドホッパー型塗布装置) 11 塗布ヘッド(コーター) 20 位置決め装置(位置決め手段) 21 外筒部材 22 内筒部材 23 給気口 25 吐出口 26 排気口 28 テーパー面 29 給気ポンプ
1, 1A, 1B Cylindrical base material (cylindrical drum, conductive support) 2 Treatment surface (photosensitive liquid surface) 10 Vertical coating device (slide hopper type coating device) 11 Coating head (coater) 20 Positioning device (positioning means) ) 21 outer cylinder member 22 inner cylinder member 23 air supply port 25 discharge port 26 exhaust port 28 taper surface 29 air supply pump

───────────────────────────────────────────────────── フロントページの続き (72)発明者 浅野 真生 東京都八王子市石川町2970番地コニカ株式 会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masao Asano 2970 Ishikawacho, Hachioji City, Tokyo Konica Stock Company

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材と同軸に配設して成る位置決め手段によ
り、前記円筒状基材の外周面の筒軸に対して直角方向か
ら外力を加えて、複数の円筒状基材相互の段差修正また
は位置決めを行う円筒状基材の位置決め方法において、 前記複数の円筒状基材の両端面の静止摩擦係数が、0.
5〜2.5の範囲であることを特徴とする円筒状基材の
位置決め方法。
1. A step of stacking a plurality of cylindrical base materials so that their cylindrical axes are aligned with each other and continuously pushing up the outer peripheral surface of the cylindrical base material with a vertical coating device while vertically pushing upward from below. In, at the position before or after application,
Positioning means arranged coaxially with the cylindrical base material applies an external force from a direction perpendicular to the cylinder axis of the outer peripheral surface of the cylindrical base material to correct a step between the plurality of cylindrical base materials or In the method of positioning a cylindrical base material for positioning, the static friction coefficient of both end surfaces of the plurality of cylindrical base materials is 0.
A method for positioning a cylindrical substrate, which is in the range of 5 to 2.5.
【請求項2】 前記垂直塗布装置がスライドホッパー型
塗布装置であることを特徴とする請求項1記載の円筒状
基材の位置決め装置。
2. The positioning device for a cylindrical substrate according to claim 1, wherein the vertical coating device is a slide hopper type coating device.
【請求項3】 前記外力が、吐出口から噴出する流体の
圧力であることを特徴とする請求項1記載の円筒状基材
の位置決め方法。
3. The method for positioning a cylindrical substrate according to claim 1, wherein the external force is a pressure of a fluid ejected from a discharge port.
【請求項4】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材と同軸に配設して成る位置決め手段によ
り、前記円筒状基材の外周面の筒軸に対して直角方向か
ら外力を加えて、複数の円筒状基材相互の段差修正また
は位置決めを行いながら塗布する垂直塗布装置に用いら
れる円筒状基材において、 前記複数の円筒状基材の両端面の静止摩擦係数が、0.
5〜2.5の範囲であることを特徴とする垂直塗布装置
用円筒状基材。
4. A step of stacking a plurality of cylindrical base materials by aligning their cylindrical axes with each other and continuously applying a coating liquid onto the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically pushing upward. In, at the position before or after application,
Positioning means arranged coaxially with the cylindrical base material applies an external force from a direction perpendicular to the cylinder axis of the outer peripheral surface of the cylindrical base material to correct a step between the plurality of cylindrical base materials or In a cylindrical base material used for a vertical coating device that performs coating while performing positioning, the static friction coefficient of both end faces of the plurality of cylindrical base materials is 0.
A cylindrical substrate for a vertical coating device, which is in the range of 5 to 2.5.
JP13361895A 1995-05-31 1995-05-31 Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus Pending JPH08323279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13361895A JPH08323279A (en) 1995-05-31 1995-05-31 Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13361895A JPH08323279A (en) 1995-05-31 1995-05-31 Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus

Publications (1)

Publication Number Publication Date
JPH08323279A true JPH08323279A (en) 1996-12-10

Family

ID=15109037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13361895A Pending JPH08323279A (en) 1995-05-31 1995-05-31 Method for positioning of cylindrical base material and cylindrical base material for vertical coating apparatus

Country Status (1)

Country Link
JP (1) JPH08323279A (en)

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