JP2000005684A - Method for coating cylindrical base and coating device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To control the circumferential and vertical variation in the thickness of a coating film on a cylindrical base in the coating film and thereby prevent a bead from being cut by setting the roundness within a specific range since the roundness of a coated face on the annular end part of a hopper face influences the formation of the bead by a coating liquid. SOLUTION: A coating liquid is supplied to the inlet opening part of an annular coating liquid distribution slit 8 and is made to flow out of an outlet opening part 9 and further is made to flow out onto a hopper face 4 extending to an annular end part in close proximity to the outer peripheral face of a cylindrical base 1a which is slant from the outlet opening part 9 to the lower side. Further the coating liquid is supplied while the cylindrical base 1a is moved upward perpendicularly and thus is applied to the surface of the outer periphery of the cylindrical base 1a to form a coating film 2. In this case, when the roundness of the annular end part of the hopper face 4 is set at HRD (μm), the hopper face 4 is formed in such a way that the conditions 1.0<HRD<10 are satisfied. In addition, when the viscosity of the coating liquid is set to be V (m pascal.sec.), the viscosity of the coating liquid is adjusted so that the conditions 1.0<V<300 are satisfied.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for coating a cylindrical substrate (also referred to as a photosensitive drum), an apparatus for coating a cylindrical substrate,
The present invention relates to a method for positioning a cylindrical substrate, a device for positioning a cylindrical substrate, a method for drying a cylindrical substrate, and a device for drying a cylindrical substrate. More specifically, the coating liquid is applied to the outer peripheral surface of the cylindrical base material while flowing the coating liquid from the coating liquid distribution slit to the hopper surface and vertically moving the cylindrical base material relative to the hopper surface. TECHNICAL FIELD The present invention relates to a coating method for forming a coating film and a coating apparatus therefor. Such a coating method and apparatus are suitably used, for example, in the production of a photosensitive drum (cylindrical substrate) for an electrophotographic apparatus.

[0002] Further, the present invention relates to a method and an apparatus for positioning the cylindrical substrate when a coating liquid is continuously applied on the outer peripheral surface of a plurality of cylindrical substrates. In particular, by applying a coating liquid to a cylindrical substrate, it is suitably used for accurately positioning the cylindrical substrate when an electrophotographic photosensitive member is manufactured.

[0003] Further, a ring-shaped circumferentially uniform suction member is provided concentrically on the outer periphery of a cylindrical base material having a coating film applied on the outer peripheral surface, and inserted through an insertion opening of the cylindrical member. The present invention relates to a method and an apparatus for drying a cylindrical substrate, which sucks a gap between the surface of the cylindrical substrate and the inner surface of the cylindrical member concentric with the surface of the cylindrical member to generate an air current to promote drying of a coating film. Such a drying method and its apparatus are suitably used, for example, when manufacturing a photosensitive drum for an electrophotographic apparatus.

[0004]

2. Description of the Related Art As a <prior art 1>, a spray coating method, a dip coating method, a blade coating method, and the like are used as coating methods for forming a coating film by applying a coating liquid on the outer peripheral surface of a cylindrical substrate.
There are various methods such as a roll coating method. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop a coating apparatus having excellent productivity. However, the conventional method for coating a cylindrical substrate has disadvantages such as a failure to obtain a thin and uniform coating film (coating film) and poor productivity.

Therefore, a hopper type coating device was developed.
This apparatus supplies a coating liquid from an inlet opening of a coating liquid distribution slit which forms an annular slit for distributing a coating liquid, and a coating liquid from an outlet opening of a coating liquid distribution slit provided inside the inlet opening. And the coating liquid is allowed to flow out to a hopper surface which is inclined downward from the outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical base material, and the cylindrical base material is raised with respect to the hopper surface. While moving vertically, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical base material and the annular end of the hopper surface, and applied on the outer peripheral surface of the cylindrical base material to form a coating film. I do.

[0006] As <Prior Art 2>, in the production of an organic photoconductor photosensitive drum (cylindrical substrate) which is a photosensitive member used in an electrophotographic apparatus, a photosensitive coating solution is applied to a cylindrical drum. Apply. In the application, the slide hopper is positioned at a predetermined position on the peripheral surface of the cylindrical substrate,
It is necessary to perform an adjustment operation for keeping the gap between the two constant in the circumferential direction. In this case, since the required coating film thickness is extremely thin, even in the case where the cylindrical base material is shifted by 0.1 mm, in the circumferential direction,
This causes a large deviation in the thickness of the coating layer as a whole cylindrical surface. When there is such a film thickness deviation of the coating layer, various problems such as a change in charge amount, a non-uniform sensitivity, and a change in residual potential occur in the circumferential direction of the cylindrical substrate. Therefore, accurate positioning of the cylindrical substrate is extremely important.

Conventionally, as a positioning device for a cylindrical substrate of this type, for example, as described in JP-A-60-50537, a position regulating roller rotatably provided on a supporting member is provided for the cylindrical substrate. Some are provided in contact with the outer periphery. Also, JP-A-3-280063 and JP-A-4-73.
No. 655 discloses a positioning device for a photosensitive drum (cylindrical substrate) using an air bearing.

As a prior art 3 as a device for drying a cylindrical base material immediately after coating, there is disclosed a technique of directly blowing air to the cylindrical base material after coating to promote drying (Japanese Patent Application Laid-Open No. 59-1984). -73074, JP-A-62-24771.
No.). The method of blowing the air has a drawback that the air impinges on the coating film, so that the coating film is likely to be repelled or uneven in film thickness.

Further, a technique for promoting drying by suction using a draft has been disclosed (Japanese Patent Application Laid-Open No. 62-4470).
No.). In the method of sucking air, the turbulence generated in the draft also tends to cause uneven film thickness. In particular, in these methods, as the viscosity of the coating liquid decreases, the unevenness of the film thickness increases remarkably.

As an improvement, the applicant has already made it possible to insert the cylindrical substrate in an electrophotographic photoreceptor drying apparatus for drying the cylindrical substrate coated on the surface of the cylindrical substrate. A ring-shaped circumferentially uniform suction member is provided concentrically on the outer periphery of the intermediate portion of the cylindrical member, and a gap between the cylindrical substrate surface and the inner surface of the concentric cylindrical member when the cylindrical substrate is inserted. There is disclosed a drying apparatus which sucks and generates an air current to accelerate drying of a coating film (see Japanese Patent Application Laid-Open No. 6-308747). However, it was found that the thing in the center of the cylindrical object was still affected by strong wind in the undried state.

[0011]

However, as <Prior Art 1>, even if a cylindrical substrate coating apparatus is used, depending on the roundness of the annular end portion of the hopper surface, the circumferential direction or the vertical direction may be insufficient. In addition, there are problems such as fluctuations in the coating film thickness of the coating solution, film breakage of the coating solution, etc., and similar problems due to the compatibility of the viscosity of the coating solution and the poor roundness of the cylindrical base material.
The problem was solved by -80456. However, in thin film coating, it was found that the above range was deviated, and the present invention was achieved. Especially, it was found that the roundness was important.

[0012] As <Prior Art 2>, the above-described conventional roller contact-type positioning device positions the position regulating rollers directly in contact with the cylindrical substrate, so that the positioning roller is positioned on the cylindrical substrate. There was a drawback that it was scratched. If the cylindrical substrate is damaged, the characteristics of electrophotography are deteriorated when the cylindrical substrate is used as a photosensitive drum (cylindrical substrate). The air bearing type positioning device performs positioning by blowing air or the like from a blowing nozzle.
There was still rubbing in the introduction.

[0013] As a <prior art 3>, as a result of a subsequent study for improvement, a ring-shaped circumferentially uniform and concentric ring is formed around the outer periphery of a cylindrical member having a cylindrical base material coated with a coating film inserted through an insertion opening. Drying device that provides a suction member, suctions a gap between the cylindrical base material surface and the inner surface of the cylindrical member concentric with the cylindrical base material surface when the cylindrical base material is inserted into the insertion opening, and generates an air current to promote drying of the coating film. in the total length of the tubular member and L _0, and a distance to the suction portion of the suction member from the insertion opening of the tubular member and the L _1, from the center of the entire length of the tubular member, to the suction of the suction member It has been found that setting the distance upward is better, especially in the case of thin film coating.

An object of the present invention is to provide an excellent method for coating a cylindrical substrate having no fluctuation in the coating film thickness in the circumferential direction and the vertical direction of the coating film on the cylindrical substrate and no bead breakage, and an apparatus for coating the same. To provide. In so-called simultaneous multi-layer coating in which a plurality of coating films are simultaneously formed on a cylindrical base material from the same coating device, so-called sequential multi-layer coating in which coating films are sequentially formed on a cylindrical base material from a plurality of coating devices. It is also an object of the present invention to provide an excellent method for coating a cylindrical substrate, which does not cause fluctuations in film thickness in the circumferential direction and vertical direction of the cylindrical substrate and does not cause bead breakage.

An object of the present invention 2 is to perform positioning of a cylindrical substrate without damaging the cylindrical substrate, and to prevent displacement of the cylindrical substrate at a connecting portion between the cylindrical substrates. It is an object of the present invention to provide a method and an apparatus for positioning a cylindrical base material to be prevented.

The object of the present invention 3 is to uniformly and rapidly evaporate the coating solvent without adversely affecting the coating film immediately after coating, and to further minimize the generation of turbulence near the surface of the coating film during drying. It is another object of the present invention to provide a method and an apparatus for drying a cylindrical substrate capable of removing a solvent vapor accumulated in the vicinity of a coating film and applying a uniform and stable coating film.

[0017]

The above object is achieved by one of the following. (1) An application liquid is supplied from an entrance opening of a coating liquid distribution slit forming an annular slit for distributing a coating liquid, and an exit opening of a coating liquid distribution slit provided inside the entrance opening. The coating liquid is caused to flow out, and the coating liquid is caused to flow out to a hopper surface which is inclined downward inward from the outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical substrate, and the hopper surface is While vertically moving the cylindrical base material upward, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical base material and the annular end of the hopper surface to form an outer peripheral surface of the cylindrical base material. In a method of applying a cylindrical substrate to form a coating film by coating the hopper, the circularity of the annular end of the hopper surface is determined by HR
A method for coating a cylindrical substrate, comprising: flowing a coating liquid to an annular end of the hopper surface satisfying the following condition: D (μm): 1.0 <HRD <10 [1]

(2) Assuming that the viscosity of the coating liquid is V (millipascal-second), the coating liquid having a viscosity satisfying the condition of 1.0 <V <300 [2] is applied to the cylindrical substrate. (1) The method for coating a cylindrical substrate according to (1).

(3) The circularity of the cylindrical substrate is determined by CRD.
(3) The method for coating a cylindrical substrate according to (1) or (2), wherein the coating is performed on a cylindrical substrate satisfying the following condition: CRD <30.

(4) The coating liquid is supplied from the inlet opening of the coating liquid distribution slit forming an annular slit for distributing the coating liquid, and the outlet opening of the coating liquid distribution slit provided inside the inlet opening. The coating liquid flows out from the hopper surface, and the coating liquid flows out to a hopper surface which is inclined downward inward from the outlet opening and extends to an annular end portion close to the outer peripheral surface of the cylindrical substrate, and the hopper surface is While vertically moving the cylindrical base material upward, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical base material and the annular end of the hopper surface, and the outer peripheral surface of the cylindrical base material is supplied. In the method for applying a cylindrical substrate, which is applied on a surface to form a coating film, the circularity of the annular end of the hopper surface is HRD (μm), and the viscosity of the coating solution is V
(Millipascal-second) and the circularity of the cylindrical substrate is CRD (μm): 1.0 <HRD <10 [1] 1.0 <V <300 [2] CRD <30 [ 3) A method for coating a cylindrical substrate, wherein the method is applied to a cylindrical substrate while satisfying the following conditions.

(5) When the gap between the cylindrical substrate and the annular end of the hopper surface is GP (μm), the gap satisfying the following condition: 50 <GP <500 [4] The method for applying a cylindrical substrate according to (1), wherein the method is applied to a substrate.

(6) When the ten-point average surface roughness of the annular end of the hopper surface is R _Z (μm), the hopper satisfies the condition of 0.1 <R _Z <5.0 [5]. The method for coating a cylindrical substrate according to (1), wherein the coating is performed on the cylindrical substrate by an annular end of the surface.

(7) When the maximum vibration width of the cylindrical base material, which is the maximum vibration width of the cylindrical base material in the coating section, is VR (μm), the coating is performed with VR ≦ 40 [6]. The method for coating a cylindrical substrate according to (1), (5) or (6).

(8) A plurality of coating liquid distributing slits are provided, and different coating liquids are caused to flow out from the annular outlet opening of the coating liquid distributing slit to the same hopper surface, and a plurality of coating films are simultaneously formed into a cylindrical shape. The method for coating a cylindrical substrate according to (1), wherein the method is formed on an outer peripheral surface of the substrate.

(9) A plurality of coating liquid distributing slits and a hopper surface are provided, and different coating liquids are supplied to each of the coating liquid distributing slits. The method for coating a cylindrical substrate according to (1), wherein the method is carried out by flowing the film onto a hopper surface and forming a plurality of coating films sequentially on the outer peripheral surface of the cylindrical substrate.

(10) A coating liquid supply means for supplying the coating liquid, and a coating liquid supplied from the coating liquid supply means is introduced through an annular inlet opening, and an annular outlet opening inside the inlet opening. A coating liquid distributing slit that flows out from the portion and distributes the coating liquid, a hopper surface that is inclined downward inward from the annular outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical base material, Transport means for vertically moving the cylindrical substrate upward with respect to the hopper surface, while vertically moving the cylindrical substrate, the outer peripheral surface of the cylindrical substrate and the annular end of the hopper surface In a coating apparatus for a cylindrical substrate, which continuously supplies a coating liquid during the coating on the outer peripheral surface of the cylindrical substrate to form a coating film, the circularity of the annular end of the hopper surface is determined by HRD. (Μm), 1.0 <HRD <10 [1 ] A coating device for a cylindrical substrate, characterized by satisfying the following conditions.

(11) Assuming that the viscosity of the coating solution is V (millipascal-second), a coating solution having a viscosity satisfying the following condition is applied: 1.0 <V <300 [2] (10) The apparatus for coating a cylindrical substrate according to (10).

(12) The circularity of the cylindrical substrate is determined by CRD.
(10) The apparatus for coating a cylindrical substrate according to (10) or (11), wherein the coating is performed on a cylindrical substrate satisfying the following condition: CRD <30.

(13) A coating liquid supply means for supplying a coating liquid, and a coating liquid supplied from the coating liquid supply means is introduced through an annular inlet opening, and an annular outlet opening inside the inlet opening. A coating liquid distributing slit that flows out from the portion and distributes the coating liquid, a hopper surface that is inclined downward inward from the annular outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical base material, Transport means for vertically moving the cylindrical substrate upward with respect to the hopper surface, while vertically moving the cylindrical substrate, the outer peripheral surface of the cylindrical substrate and the annular end of the hopper surface In a coating apparatus for a cylindrical substrate, which continuously supplies a coating liquid during the coating on the outer peripheral surface of the cylindrical substrate to form a coating film, the circularity of the annular end of the hopper surface is determined by HRD. (Μm) and the viscosity of the coating solution is V (millipass 1.0 <HRD <10 [1] 1.0 <V <300 [2] CRD <30 [3] When the circularity of the cylindrical base material is CRD (μm). An apparatus for coating a cylindrical substrate, which satisfies the following conditions.

(14) A plurality of cylindrical base materials are stacked with their cylinder axes aligned, and pushed vertically upward from below.
In the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device, at a position before or after the application, a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical substrate, In a method of positioning a cylindrical base material by positioning means having a ring-shaped spraying portion having the cylindrical base material disposed coaxially with the cylindrical base material, the cylindrical base material is positioned by the positioning means. A method for positioning a cylindrical base material, wherein the cylindrical base material is introduced from at least an introduction part formed of a fluororesin material.

(15) The method for positioning a cylindrical substrate according to (14), wherein a taper is provided in the introduction portion of the positioning means to position the cylindrical substrate.

(16) A plurality of cylindrical substrates are stacked with their cylindrical axes aligned, and pushed vertically upward from below.
In the step of continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device, at a position before or after the application, a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical substrate, A ring-shaped spraying means having the cylindrical base material positioned coaxially with the cylindrical base material, wherein the positioning of the cylindrical base material is performed by the positioning means. The gap between the spraying means and the discharge port facing the nozzle is 20 μm to ³ mm, and the amount of the discharged fluid per minute is 0.1 to 50 m ³ / min.
Wherein the positioning means has a tapered introduction portion formed of a fluororesin material, and wherein the cylindrical substrate is introduced from the introduction portion.

(17) A plurality of cylindrical substrates are stacked with their cylinder axes aligned, and pushed vertically upward from below.
In a cylindrical substrate positioning device for continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device, at a position before or after application, on the outer peripheral surface of the cylindrical substrate. In a cylindrical base material positioning apparatus for positioning the cylindrical base material by a positioning means formed coaxially with the cylindrical base material, a ring-shaped spraying means having a discharge port for spraying a fluid, the positioning means A positioning device for a cylindrical base material, comprising an introduction portion formed of a fluororesin material.

(18) The cylindrical base material positioning apparatus according to (17), wherein the introduction portion of the positioning means has a taper.

(19) A plurality of cylindrical base materials are stacked with their cylinder axes aligned, and pushed vertically upward from below.
In a cylindrical substrate positioning device for continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device, at a position before or after application, on the outer peripheral surface of the cylindrical substrate. In a cylindrical base material positioning apparatus for positioning the cylindrical base material by a ring-shaped spraying means having a discharge port for spraying a fluid, and positioning means arranged coaxially with the cylindrical base material, The gap between the base material surface and the discharge port of the spraying means facing the base material is 20 μm.
m to 3 mm, and the amount of fluid to be discharged per minute is 0.
1 to 50 m ³ / min, wherein the positioning means includes a tapered introduction portion formed of a fluororesin material.

(20), wherein the vertical coating device is a slide hopper type coating device (17),
(18) The positioning device for a cylindrical substrate according to (19).

(21) The fluid sprayed on the outer peripheral surface of the cylindrical substrate has a temperature of 20 to 24 ° C. and a humidity of 10 to 65%.
(17), (1)
8) The apparatus for positioning a cylindrical substrate according to (19) or (20).

(22) A ring-shaped circumferential uniform suction member is provided concentrically on the outer periphery of a cylindrical base material having a coating film applied on the outer peripheral surface, and inserted through the insertion opening of the cylindrical member. In the method of drying a cylindrical base material, when a material is inserted, a gap between the cylindrical base material surface and an inner surface of the cylindrical member concentric with the cylindrical base material is sucked to generate an air current, and drying of a coating film is promoted. When the total length of the member is L ₀ and the distance from the insertion opening of the cylindrical member to the suction member is L ₁ , 0.5 <L ₁ / L ₀ <1.0 [7] A method for drying a cylindrical substrate, characterized by satisfying the following conditions.

(23) Further, the total length of the cylindrical member is L
_0, when the distance to the suction member from the insertion opening of the cylindrical base material of the cylindrical member and the L _1, satisfying _{0.6 <L 1 / L 0 <} 0.9 [8] The condition The method for drying a cylindrical substrate according to (22), wherein:

(24) A ring-shaped, circumferentially uniform and concentric suction member is provided on the outer periphery of a cylindrical member in which a cylindrical base material coated with a coating film can be inserted from an insertion opening. When the material is inserted into the insertion opening, the cylindrical substrate surface and the concentric space between the cylindrical member inner surface and the cylindrical member are suctioned to generate an air flow, and in a cylindrical substrate drying device for promoting drying of a coating film. The total length of the cylindrical member is L _0, and the distance from the insertion opening of the cylindrical member to the suction part of the suction member is L.
_An apparatus for drying a cylindrical substrate, which satisfies the following condition: 0.5 <L ₁ / L ₀ <1.0 [7]

(25) Further, the overall length of the cylindrical member is L
_0, and when the distance to the suction portion of the suction member from the insertion opening of the tubular member and the _{L 1, 0.6 <L 1 /} L 0 <0.9 [8] becomes possible to satisfy the condition The drying device for a cylindrical substrate according to (24), wherein:

Explaining the above equation (1), the roundness HRD (μm) of the coating surface at the annular end of the hopper surface is determined by the formation of beads of the coating liquid formed between the annular end and the cylindrical substrate. 1.0 <HRD <10 is preferable. If the upper limit is exceeded, beads are difficult to form. If the lower limit is exceeded, processing becomes difficult. "Circularity" means that the object to be measured is rotated by a rotary table, traced in and out of the object to be measured in the radial direction, and the polar coordinate recording figure excluding the effect of the eccentricity of the installation is obtained, and the concentric circle template And read the difference in radius to determine the roundness.

To explain the formula [2], the viscosity V (millipascal-second) of the coating liquid affects the formation of beads of the coating liquid formed between the annular end portion and the cylindrical base material.
1.0 <V <300 is preferred. Beyond the upper and lower limits, beads are difficult to form. The “viscosity” is a resistance generated inside a flowing coating solution, and is a ratio between a shear stress applied to a fluid and a shear strain rate.

Explaining the equation [3], the circularity CRD (μm) of the cylindrical substrate is liable to cause a variation in the film thickness in the circumferential direction, and is formed between the annular end portion and the cylindrical substrate. This also affects the bead formation of the coating solution, and CRD <30. Preferably, 5.0 <CRD <30. If the upper limit is exceeded, coating unevenness in the circumferential direction tends to occur, and if the lower limit is exceeded, processing becomes difficult. The “roundness” is the same as described above.

To explain the equation [4], the gap GP (μm) between the cylindrical substrate and the annular end of the hopper surface is determined by the gap of the coating liquid bead formed between the annular end and the cylindrical substrate. Influences the formation, preferably 50 <GP <500. If the upper limit or the lower limit is exceeded, beads are hardly formed, and the coating film is liable to break.

To explain the equation [5], the ten-point average surface roughness R _Z (μm) of the annular end of the hopper surface is determined by the formation of a bead of the coating solution formed between the annular end and the cylindrical substrate. 0.1 <R _Z <5.0 is preferred. If the upper limit or the lower limit is exceeded, the coating film is liable to break, and coating unevenness in the circumferential direction is likely to occur. "Ten-point average surface roughness"
Means roughness defined in JIS B0601-1982.

In the range of the present invention, when equation (6) is within the scope of the present invention, the beat is stable without breakage of the beat due to vibration, no streak failure occurs, and there is no variation in the film thickness in the circumferential and longitudinal directions. If the upper limit is exceeded, beat breakage due to vibration occurs, and a streak failure is likely to occur.

Explaining the equation [7], almost no turbulence is generated in the vicinity of the surface of the coating film immediately after the coating, and this has an adverse effect on the pressure-coated film particularly in the case of coating a thin film having a dry film thickness of 0.5 μm or less. Without drying, the solvent can be uniformly and rapidly evaporated to complete drying,
High-quality electrophotographic photosensitive drums can be efficiently produced. Above the lower limit, strong winds can affect dry conditions. A more preferred range is the range shown by the formula [8].

[0049]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiment will be described with respect to a photosensitive material-containing paint for manufacturing a photosensitive drum of an electrophotographic apparatus. However, the present invention is not limited to this, and can be applied to other appropriate paint application.

<Embodiment 1> An embodiment according to claims 1 to 13 will be described with reference to FIGS. 1 to 5. FIG. 1 is a front view showing the entire configuration of a continuous coating apparatus according to the present invention, FIG. 2 is a sectional view of the coating unit of FIG. 1, and FIG. 3 is a perspective view of the coating unit of FIG.

In FIG. 1, the supply means 140 supplies the cylindrical substrate 1 to a predetermined position vertically below the coating means and pushes it upward. The loading guide member 141 is a guide member for loading the cylindrical substrate 1, and the table 142 rotates the cylindrical substrate 1.
The driving unit 143 is provided on the vibration isolating table 181 and drives the table 142. Further, the elevating member 144 is provided on the anti-vibration table 182 and moves up and down the cylindrical substrate 1 in the vertical direction.

The conveying means 120 is provided with the supplied cylindrical substrate 1.
The stacking is carried out by vertically holding the outer peripheral surface of the stack, aligning the axes of the cylinders, and vertically pushing up from the bottom. The ball screw 124 is rotated by the motor M3 provided on the anti-vibration table 183,
The vertical moving means 123 is moved up and down, and the gripping means 121 is moved. Similarly, the ball screw 12 is driven by the motor M4.
4 rotates to move the up and down moving means 123 up and down, and to move the gripping means 122.

The positioning means 20 is of an air bearing type, and is blown from a blowing nozzle of air or the like to form the cylindrical substrate 1.
To the center of the annular application section of the application means.

The coating means 30 applies a coating liquid to the cylindrical substrate 1. Details will be described with reference to FIG.

The drying device 150 is a drying device formed in an annular shape, and is fixed to the device main body 170. The applied film of the cylindrical substrate 1 is dried.

The separating / discharging means 160 separates from the plurality of stacked cylindrical substrates 1 which have been dried and conveyed vertically and take out and discharge one by one. The shaft body 162 of the vertical movement robot stage 161 has an upper chuck 163 and a lower chuck 164, which chuck the cylindrical base material 1 and drive up and down by an air cylinder 165.

Next, the application means 30 will be described with reference to FIG. 2. The liquid supply pump 6 serving as the application liquid supply means supplies the application liquid 11 in the application liquid tank 5 to the application liquid supply port 6a. The coating liquid distribution chamber 7 is provided so as to surround the cylindrical substrates 1a, 1b,... In a ring shape, and stores the coating liquid 11 supplied by the liquid sending pump 6. The coating liquid distribution slit 8 receives the coating liquid supplied from the coating liquid supply means through an annular inlet opening, and the coating liquid distribution slit 8 inside the inlet opening.
And the coating liquid 11 is distributed from the annular outlet opening 9. The transporting means 120 grips the cylindrical substrates 1a, 1b,... With respect to the hopper surface 4 and vertically moves them upward. The circularity HRD (μm) of the annular end 4b of the hopper surface is 1.
0 <HRD <10. The ten-point average surface roughness R _Z (μm) of the annular end portion 4b of the hopper surface is 0.1.
<R _Z <5.0. Further, the maximum vibration width VR of the cylindrical base material in the coating section is in a range of VR = 40 μm or less.
The hopper surface 4 is inclined downward inward from the annular outlet opening 9 and extends to an annular end 4b close to the outer peripheral surface of the cylindrical substrates 1a, 1b.

The gap GP (μm) between the cylindrical substrate and the annular end of the hopper surface is in the range of 50 <GP <500. If it does not fall within this range, a stacking error fluctuation is added in the vertical direction as in the present invention, so that a large number of continuous coatings cannot be performed due to rubbing on the coater or the positioning portion. The viscosity V (millipascal-second) of the coating solution is in the range of 1.0 <V <300. The circularity CRD (μm) of the cylindrical substrate 1 is C
RD <30. In addition, the cylindrical substrates 1a, 1b
.. May be a hollow drum, for example, an aluminum drum, a plastic drum, or a seamless belt-type cylindrical substrate. The term “thin film coating” as used in the present invention means a coating having a wet film thickness of 20 μm or less.

Here, a method of applying the cylindrical substrate will be described. In the supply step, the cylindrical base material 1 having the predetermined specification values is placed on the table 142. The cylindrical substrate 1 reaches on the YY axis by the rotation of the table 142. At this time, the lifting member 144 pushes the cylindrical substrate 1 upward from below. When the lifting by the elevating member 144 is completed, the shock absorbing mechanism operates to eliminate a shock at the time of joining with the cylindrical substrate 1. The cylindrical substrate 1 is carried to the transport step.

In the transporting step, the outer peripheral surface of the cylindrical substrate 1 is provided with two sets of grippers 121 and 122 which can be pressed and separated from each other and can move in the vertical and vertical directions. And transport it upward.

In the positioning step, the cylindrical substrate 1 is accurately positioned by an air cylinder method, and the positioned cylindrical substrate 1 is transferred to a coating step.

In the coating step, the coating liquid 11 having a predetermined value in the coating liquid tank 5 is supplied to the coating liquid supply port 6 a by the liquid feed pump 6. The coating liquid 11 is stored in the coating liquid distribution chamber 7 and then flows from the inlet opening of the coating liquid distribution slit 8 to the outlet opening 9. The coating liquid 11 is supplied to the outlet opening 9.
It flows to a hopper surface 4 which is inclined further inward and extends downward to an annular end close to the outer peripheral surfaces of the cylindrical substrates 1a, 1b,.

The cylindrical substrates 1a and 1b are
.. While vertically moving the cylindrical substrate 1a,
The coating liquid 11 is continuously supplied between the outer peripheral surface of the cylindrical bases 1a and 1b
.. To form a coating film 2 on the outer peripheral surface of.

In the drying step, the coated cylindrical substrate 1 is dried through a drying device. Further, in the separation and discharge step, the cylindrical substrate 1 is separated and discharged.

Next, FIG. 4 is a sectional view showing the structure of a simultaneous multi-layer coating apparatus according to the present invention. Members that are mechanically and functionally the same as those in FIG. 1 are given the same reference numerals, and descriptions thereof are omitted.

In FIG. 4, the application liquid supply means is a liquid supply pump 61.
To supply the coating liquid 111 having the above specification values to the coating liquid distribution slit 81. The coating liquid distribution slit 81 is used for coating liquid 1
11 flows out to the outlet opening 9 which surrounds the outer peripheral surfaces of the cylindrical substrates 1a, 1b,.

The method of applying the simultaneous multilayer will be described.
The coating liquid 11 having the above specification values is supplied, and the coating liquid 11 surrounds the outer peripheral surfaces of the cylindrical base materials 1a, 1b,... Then, it flows from the outlet opening 9 to the hopper surface 4 which has entered the above-mentioned specification values in the vicinity of the outer peripheral surfaces of the cylindrical substrates 1a, 1b,.

Further, the coating liquid 111 is supplied to supply the coating liquid 1.
11 are distributed and flow out to the outlet opening 91 by surrounding the outer peripheral surfaces of the cylindrical substrates 1a, 1b,. Flow from the outlet opening 91 to the hopper surface 4 close to the outer peripheral surfaces of the cylindrical substrates 1a, 1b,.

The cylindrical substrates 1a, 1b,.
To move vertically upward. The cylindrical substrates 1a, 1 which move the coating liquid 111 flowing on the hopper surface 4 upward.
The coating liquid 11 is applied to the outer peripheral surface of b .... to form the coating films 2 and 2A simultaneously.

Since the coating is performed as described above, an excellent coating film having no variation in film thickness and no break in beads is formed.

Next, FIG. 5 is a sectional view of the structure of a sequential multi-layer coating apparatus according to the present invention. Members that are mechanically and functionally the same as those in FIG. 1 are given the same reference numerals, and descriptions thereof are omitted.

In FIG. 5, the application liquid supply means is a liquid supply pump 62.
Supplies the application liquid 112 having the above specification values to the application liquid distribution slit 82. The coating liquid distribution slit 82 is used for coating liquid 1
12 are distributed so as to surround the outer peripheral surfaces of the cylindrical substrates 1a, 1b,... The hopper surface 42 having entered the above-mentioned specification values extends from the outlet opening 92 to an annular end portion 42b close to the outer peripheral surface of the cylindrical substrates 1a, 1b,.

Here, the coating method of the successive superposed layers will be described. The coating liquid 11 having the above specification values is supplied to distribute the coating liquid 11, and the cylindrical substrates 1a, 1
.., and flows out to the outlet opening 9. The flowing out coating liquid 11 is transferred from the outlet opening 9 to the cylindrical substrate 1.
a, 1b,... flows to the hopper surface 4 close to the outer peripheral surface.
The cylindrical substrates 1a, 1b,... Are vertically moved upward with respect to the hopper surface 4 that has entered the above specification values. Cylindrical substrate 1 that moves coating solution 11 flowing on hopper surface 4 upward
The coating liquid 11 is applied to the outer peripheral surfaces of a, 1b,.

The coating liquid 112 is supplied to distribute the coating liquid 112 which has entered the above-mentioned specification values, and surrounds the outer peripheral surfaces of the cylindrical base materials 1a, 1b,. I do. The flowing out coating liquid 112 flows from the outlet opening 92 to the hopper surface 42 which has entered the above-mentioned specification values in proximity to the outer peripheral surfaces of the cylindrical substrates 1a, 1b,.

The cylindrical substrates 1a, 1b,.
2. Move vertically above 2. A cylindrical substrate 1a for moving the coating liquid 112 flowing on the hopper surface 4 upward,
The coating liquid 112 is applied to the outer peripheral surface of 1b to form a coating film 2A.

The above-mentioned sequential coating apparatus is provided with two coating heads 32.
Another coating head may be provided on the upper part of 2 to form a three-layer coating apparatus.

<Embodiment 2> An embodiment according to claims 14 to 21 will be described. FIG. 6 is a longitudinal sectional view of the positioning device and the vertical coating device according to the present invention. The vertical coating device is provided below the vertical coating device 10A and a vertical coating device 10A that applies the coating liquid 2A to the cylindrical substrates 1a and 1b that are vertically stacked along the center line O. A positioning device 20 for a cylindrical base material, a drying hood 30A installed above the vertical coating device 10A, and a support device 40A fixed to a lower portion of the positioning device 20
It is composed of

Inside the vertical coating device 10A, a coating head 3 that surrounds the outer periphery of the cylindrical substrate 1a and applies a coating liquid is provided.
0, a tapered coating liquid outlet (coating liquid slide surface) 12A adjacent to the coating head 30, a coating liquid distribution slit 13A forming a narrow coating liquid passage in the horizontal direction, and a coating liquid distribution chamber 14A are formed. Have been. A coating liquid supply pipe 16A is connected to the coating liquid distribution chamber 14A, and the coating liquid is supplied by a pressure pump (not shown).

In the coating method using the vertical coating device 10A, the vertical coating device 10A is fixed and the cylindrical substrate 1a is fixed.
Is applied by the application head 30 from the upper end of the cylindrical substrate 1a while moving upward in the direction of the arrow along the center line O.

A constant amount of the coating liquid is stably fed into the vertical coating apparatus 10A by a pressure pump, and the coating liquid supply pipe 16A, the coating liquid distribution chamber 14A, the coating liquid distribution slit 13A, and the coating liquid outlet 12A. The coating liquid is supplied to the coating head 30 through the process, and the coating liquid is applied to the surface of the cylindrical substrate 1a to form a photosensitive layer.

An annular drying device 150 is fixed above the vertical coating device 10A. The photosensitive layer on the cylindrical substrate formed by the vertical coating device 10A is:
The applied coating liquid 2A is gradually dried while passing through the drying device 150. Drying is performed by releasing the solvent contained in the coating solution to the outside.

A positioning device 20 for a cylindrical substrate is fixed below the vertical coating device 10A. FIG.
(A) is P- of the positioning device of the cylindrical base material in FIG.
FIG. 7 (b) is a sectional view taken along line QQ (exhaust portion).

The cylindrical substrate positioning device 20 comprises an outer cylinder member 21A and an inner cylinder member 22A fixed inside the outer cylinder member 21A. The outer cylinder member 21A and the inner cylinder member 22A have a plurality of air supply ports 2 penetrating both members.
3A and a plurality of exhaust ports 26A are formed. The plurality of air supply ports 23A are connected to an air supply pump 29A, and a fluid such as air is pumped.

As shown in FIGS. 6 and 7 (a), the outer cylinder member 21A is provided with four radially arranged air supply ports 23A, and a plurality of vertically (five in the figure) arrangement in the vertical direction. Have been. A horizontal groove 24 is formed on the inner peripheral surface of the outer cylindrical member 21A.
A is formed and forms a horizontal flow path with the outer peripheral surface of the inner cylinder member 22A, and communicates with the four air supply ports 23A radially arranged in the horizontal direction. A hole having twelve discharge ports 25A extends through the inner cylinder member 22A in the horizontal direction. The discharge port 25A faces the outer peripheral surface of the cylindrical substrate 1 with a gap G therebetween. The gap G
Is 20 μm to 3 mm, preferably 30 μm to 2 mm. If the gap G is smaller than 20 μm, the cylindrical substrate 1 is likely to be damaged by a slight deflection of the cylindrical substrate 1 by contacting the inner cylindrical member 22A. If the gap G is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 will be reduced. The discharge port 25A is a small-diameter nozzle having a diameter of 0.01 to 1.0 mm, preferably 0.05 to 0.5 mm.

As shown in FIGS. 6 and 7B, the exhaust port 26 penetrates through the outer cylinder member 21A and the inner cylinder member 22A.
A are arranged radially in four rows in the horizontal direction, and are further arranged in a plurality of rows (five rows in the figure) in the vertical direction. The exhaust port 2
6A are arranged alternately with the air supply ports 23A in the vertical direction. A vertical groove 27A is formed in the inner peripheral surface of the inner cylindrical member 22A, and communicates with the plurality of exhaust ports 26A.

The inner peripheral surface of the lower portion of the inner cylindrical member 22A is lined with Teflon, which is a fluororesin material, and has a tapered surface 28A having a wide entrance side. The tapered surface 28A is, for example, a conical surface having an axial length of 50 mm and a one-side inclination angle of 0.5 mm. The taper ratio of the tapered surface 28A is 0.005 to 0.2, preferably 0.01 to 0.1. The provision of the tapered surface 28A is effective because the position is regulated when the cylindrical substrate 1 enters the positioning device 20 while being horizontally moved or inclined. By providing the tapered surface 28A, when the cylindrical base material 1 enters the inner cylindrical member 22A, it is prevented that the front end portion of the cylindrical base material 1 comes into contact with the inner peripheral surface of the inner cylindrical member 22A. . In another example, the cylindrical member 22A itself is Teflon, which is a fluororesin material. The introduction portion is most easily contacted, but even if it comes into contact, the introduction member is made of fluororesin (relatively soft and has good slipperiness), so that it is hardly damaged.

The fluid pumped from the air supply pump 29A is introduced into the outer cylinder member 21A from the air supply ports 23A, and is discharged from the plural discharge ports 25A through the horizontal grooves 24A. A uniform fluid film layer is formed on the outer peripheral surface of the material 1a (1b). The discharged fluid is discharged from the device through the plurality of exhaust ports 26A through the vertical grooves 27A.

The fluid supplied to the air supply port 23A is preferably air, an inert gas such as nitrogen gas. The fluid is preferably a clean gas of class 100 or more according to JIS.

Further, every minute supplied to the air supply port 23A
Fluid volume per unit is 0.1-50m ^Three/ Min is preferred
No. Fluid volume is 0.1m^Three/ Min is smaller than
The positioning accuracy of the substrate 1 is extremely deteriorated,^Three/ M
When it is larger than in, the influence of the air volume comes out strongly,
The obtained cylindrical substrate 1 vibrates, and the liquid film becomes non-uniform. This
Especially, the fluid volume per minute is 0.2-20m^Three
/ Min is preferred. Here, the regulated supply fluid amount is
If fluid volume control is not used instead of fluid pressure regulation, the liquid
Influence on the film (uneven film thickness etc.) occurs. In addition, hit every minute
The amount of fluid flowing into the air inlet 23A of the positioning device 20
Measured by mouth. Further, the air supplied to the plurality of air supply ports 23A is
Fluid flow per minute is determined by the flow rate of the axial air inlet 23A.
It is better if the flow rates are the same or the upper flow rate is higher than the lower flow rate. the above
The positioning device 20 is described below with reference to FIGS.
As shown in (d), two or more may be used in combination.

As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type, a ring coater and a spray coating are used.

<Embodiment 3> An embodiment according to claims 22 to 25 will be described with reference to FIGS. FIG. 12 illustrates the overall arrangement of the drying apparatus. The coater 30 is a coater for performing coating, and the cylindrical substrate 1 is a hollow aluminum drum as an electrophotographic photosensitive member substrate. The cylindrical substrates 1 are stacked vertically in the downward direction, and are conveyed in the direction of the arrow (upward).
The cylindrical substrate 1 applied by passing through the coater 30 is transported as it is, and passes through the drying device 150 of the present invention to remove the solvent of the coating film 2.

FIG. 13 is a partially cut perspective view of the coater.
FIG. 4 is a cross-sectional view showing a state at the time of coating the cylindrical base material and the coater. 13 and 14, the coater 30 applies a coating liquid to a cylindrical substrate. The coating liquid flowing from the coating liquid distribution chamber 7 down the hopper surface 4 through the coating liquid distribution slit 8 forms a coating film 2 on the drum surface of the cylindrical substrate 1.

FIG. 15 is a sectional view of the drying device. FIG.
In the drying device 150, a cylindrical member 9B is concentrically connected to a lower portion of a suction slit member (suction member) 18B having a suction slit 16B, a suction chamber 12B, and a suction nozzle 15B, and a cylindrical member 10B is concentrically connected to an upper portion.

The overall length of the cylindrical member is L ₀ , and the distance from the insertion opening of the cylindrical member to the suction member is L.
_{When 1} is set, 0.5 <L ₁ / L ₀ <1.0. More preferably from _{0.6 <L 1 / L 0 <} 0.9.

Then, a plurality of suction nozzles 15B are provided.
Suction from the suction chamber 12 which is uniform in the circumferential direction.
B, suction air uniformized in the circumferential direction by the uniform suction slit 16B in the circumferential direction flows, and further, the suction slit member 18B, the inner diameter surfaces of the upper and lower cylindrical members 10B and 9B, and the coated cylindrical base The turbulence of the air flow between the outer peripheral surface of the material 1 and the outer surface of the material 1 is extremely small in the buffer space 13B.
A uniform suction air flow for drying shown in FIG. The applied film is dried by transporting the applied cylindrical substrate 1 to the drying zone in the direction indicated by the arrow.

In this drying apparatus, drying is promoted by the air flowing between the double cylinders. However, if the gas concentration of the solvent evaporating from the coating film becomes too high, the drying efficiency is reduced. In order to prevent the gas concentration of the solvent in the internal air from becoming saturated, it is necessary to avoid the air volume (wind speed), the length of the cylinder and the suction part at the length of the cylinder from the center.

The evaporation rate of the solvent in the coating film depends on the vapor pressure of the solvent, the temperature, the vapor density of the atmosphere, and the like. Among them, the vapor pressure is a physical property inherent to the solvent, and the temperature is determined by the temperature of the coating chamber. Therefore, the drying can be promoted by lowering the vapor density. Exposure of the coating to an air stream reduces the vapor density and facilitates air drying.

When the evaporation rate of the solvent immediately after coating is high, the coating film is easily affected by wind. When the drying proceeds to some extent, the influence of the wind decreases, and at the same time, the temperature of the cylindrical base material decreases due to the latent heat of evaporation. It is desirable to correct the temperature drop of the cylindrical base material by flowing more room temperature air and to increase the air volume in order to lower the gas concentration of the solvent in the cylinder.

In order to uniformly dry the coating film on the cylindrical substrate, it is required that the suction speed in the circumferential direction is uniform.
If the wind speed varies in the circumferential direction, the drying speed differs in the circumferential direction, causing problems such as the occurrence of mottled patterns on the coating film. However, in order to control the circumferential wind speed (air volume), The purpose is achieved by having a uniform pressure loss in the circumferential direction.

A suction chamber 12B having a ring-shaped capacity shown in a partially cutaway perspective view of a suction member provided with a suction slit in FIG.
Using B, the chamber portion having a small pressure loss was set to a negative pressure, and the circumferentially uniform suction slit 16B was used as a pressure loss member.

As a means of uniform suction in the circumferential direction, a punch plate 1 as shown in a partially broken perspective view of a suction member provided with a punch plate in FIG.
The object can also be achieved by using a mesh 20B as shown in 9B or a partially cutaway perspective view of the suction member provided with the mesh in FIG. In the present invention, changing the air volume and the air velocity in the cylinder can be easily dealt with by changing the inner diameter and length of the cylindrical members 9B and 10B as the rectifying cylinder shown in FIG.

[0102]

The present invention will now be described by way of examples, which should not be construed as limiting the invention. First, Examples and Comparative Examples relating to the application of a cylindrical substrate will be described.

(Example 1) As a conductive support, a mirror-finished aluminum drum support having a diameter of 80 mm and a height of 355 mm was used.
What was changed to 0 μm was used. Each of the following coating liquid compositions UCL-1 was prepared on a cylindrical substrate at a polymer concentration (by addition of a solvent amount) so as to have the viscosity shown in Table 1, and a coating apparatus having the roundness shown in Table 1 Using FIG. 1 (FIG. 1), coating was performed to a dry film thickness of 0.1 μm, 1a-No. 4
a was obtained. The processing accuracy Rz of the hopper application surface of the used coater was in the range of 0.2 to 4.5 μm.

UCL-1 coating solution composition Copolymerized nylon resin (CM-8000, manufactured by Toray Industries) Methanol / n-butanol = 10/1 (vol ratio) The results are shown in Table 1.

[0105]

[Table 1]

Within the scope of the present invention, the formation of beads is stable, and in particular, there is no change in film thickness in the case of coating a thin film having a dry film thickness of 0.1 μm, and the coating properties are good. A large number of substrate-like substrates can be advantageously used in terms of cost.

(Example 2) As a conductive support, a mirror-finished aluminum drum support having a diameter of 80 mm and a height of 355 mm was used.
What was changed to 0 μm was used. Each of the following coating liquid compositions CGL-1 was dispersed and prepared on the cylindrical substrate, and the solid content concentration (by addition of the amount of the solvent) was adjusted so as to obtain the viscosity shown in Table 2. Using a coating device having a roundness (FIG. 1), coating was performed so that the dry film thickness became 0.2 μm. 1b-No. 4b was obtained. The processing accuracy Rz of the hopper application surface of the used coater is 1.1 to 1.5.
Was in the range.

CGL-1 Coating Composition Y-type titanyl phthalocyanine (CGM-3) Silicone resin (KR-5240 manufactured by Shin-Etsu Chemical Co., Ltd.) t-butyl acetate The above coating composition (solid content: CG
M-3: KR-5240 = 2: 1) dispersed using a sand mill for 17 hours. The chemical formula of CGM-3 is shown in Chemical formula 1.

[0109]

Embedded image

Table 2 shows the coating results.

[0111]

[Table 2]

Within the scope of the present invention, the formation of beads is stable. In particular, when the thin film is applied as a dry film having a thickness of 0.2 μm, there is no variation in the film thickness and the coating properties are good. A large number of substrate-like substrates can be advantageously used in terms of cost.

(Embodiment 3) The coating drum No. of (Embodiment 1) was used. 2a, the coating drum N of the above (Example 2)
o. The coating composition 2b was further successively overlaid with the following CTL-1 coating composition using a coating apparatus (using three coaters) shown in FIG.

CTL-1 Coating Composition CTM-1; 129 g Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical); 1
60 g 1,2-dichloroethane; 800 ml For solid content, solid content weight ratio CTM-1: Z-200
= 0.89: 1. The chemical formula of CTM-1 is shown in Chemical formula 2.

[0115]

Embedded image

There was no change in the film thickness and the coatability of the multilayer was good. In addition, when a real image test was performed, a good image was obtained without any image unevenness caused by coating unevenness.

According to the present invention, as is clear from (Example 1) to (Example 3), there is no coating unevenness and film thickness variation, especially no unevenness in the longitudinal direction and step unevenness, and density unevenness caused by coating unevenness. No good image was obtained.

Next, an example of positioning of the cylindrical substrate will be described.

Example 4 A mirror-finished aluminum drum support (cylindrical substrate) 1 having a diameter of 80 mm and a height of 355 mm was used as a conductive support.

Each of the coating liquid compositions UCL-1, UCL-2, UCL-3 (3.0 W each) was formed on the cylindrical substrate 1 as described below.
/ V% polymer concentration) and applied using a slide hopper type application device 10A as shown in FIG. FIG. 8 is a schematic sectional view of a coating device and a positioning device, and FIG. 9 is a partially cutaway perspective view of the positioning device. In this example,
A positioning device 20 (length H = 200 mm, discharge port diameter 0.3 mm, shown in FIG. 8) provided immediately before the coating device 10A,
Teflon resin-lined). The moving speed of the cylindrical substrate 1 was 23 mm / sec, and the gap between the coating head (coater) 30 and the cylindrical substrate 1 was 100 μm.
m. The gap G between the cylindrical substrate and the discharge port is 30 μm,
The test was performed at an air volume of 0.2 m ³ / min.

UCL-1 coating solution composition Copolymerized nylon resin (CM-8000, manufactured by Toray Industries) Methanol / n-butanol = 10/1 (vol ratio) UCL-2 coating solution composition Vinyl chloride-vinyl acetate copolymer Combined (Eslec MF-
10 Sekisui Chemical Co., Ltd.) Acetone / cyclohexanone = 10/1 (vol ratio) UCL-3 coating liquid composition Ethylene-vinyl acetate copolymer (Elvacs 426)
0 Mitsui Dupont Chemical Co., Ltd.) Toluene / n-butanol = 5/1 (vol ratio) As a result, the introduction portion was rubbed. Did not occur.

(Example 5) Cylindrical substrate (conductive support)
For 1, the same aluminum drum support as in (Example 4) was used.

Each coating solution CGL was formed on the support as described below.
-1, CGL-2, and CGL-3 (3.0 W / V% solid content concentration respectively) were dispersed and prepared, and were applied using a slide hopper type application device 10A shown in FIG. At this time, a positioning device 20 (length H = 150 mm, discharge port diameter = 0.1 mm, lined with Teflon) shown in FIG. 8 was installed immediately before the coating device 10A. The moving speed of the cylindrical substrate 1 was 37 mm / sec, and the gap between the coater (coating head) 30 and the cylindrical substrate was 100 μm.

When the distance G between the cylindrical base material and the discharge port is 40 μm,
The test was performed at an air volume of 0.5 m ³ / min.

CGL-1 Coating Liquid Composition Fluorenone Disazo Pigment (CGM-1) Butyral Resin (Eslec BX-L, Sekisui Chemical Co., Ltd.) Methyl Ethyl Ketone The above coating liquid composition (solid content: CG
M-1: BX-L = fixed to 3: 1) dispersed using a sand mill for 20 hours.

CGL-2 Coating Liquid Composition Perylene Pigment (CGM-2) Butyral Resin (Eslec BX-L, manufactured by Sekisui Chemical Co., Ltd.) Methyl Ethyl Ketone The above coating liquid composition (solid content: CG
M-2: BX-L = 2: 1) dispersed using a sand mill for 20 hours.

CGL-3 coating solution composition Y-type titanyl phthalocyanine (CGM-3) silicone resin (KR-5240 manufactured by Shin-Etsu Chemical Co., Ltd.) t-butyl acetate The above coating solution composition (solid content: CG
M-3: KR-5240 = 2: 1) dispersed using a sand mill for 17 hours. CGM-1, CGM-
2, Chemical formula of CGM-3 is shown in Chemical formula 3.

[0128]

Embedded image

As a result, at the beginning of the introduction, there was rubbing between the cylindrical base material introduction member and the cylindrical base material. However, the cylindrical base material and the coater were not damaged, there was little change in film thickness, and color unevenness and coating defects were also observed. Did not occur.

(Example 6) Cylindrical substrate (conductive support)
For 1, the same aluminum drum support as in (Example 4) was used. Each of the coating liquid compositions CTL-1 and CTL-2 (35 W / V% solid content concentration) was prepared on the cylindrical substrate 1 as described below, and was applied using a slide hopper type coating apparatus 10A shown in FIG. Applied. At this time, the coating device 1
0A, the positioning device 20 (length H = 2) shown in FIG.
50 mm, discharge port diameter 0.3 mm, lined with Teflon resin), as shown in Table 3, installed at the gap G between the cylindrical base material and the discharge port and the fluid amount. 1c ~
No. 2c was obtained. The moving speed of the cylindrical substrate 1 is 8
mm / sec, the gap between the coater 30 and the cylindrical substrate 1 was 250 μm. As shown in FIG. 8, in the positioning device 20, a plurality of air supply ports 23A and exhaust ports 26A are alternately arranged in the axial direction, and the total amount of fluid discharged from the positioning device 20 is the same as in the previous embodiment. From the discharge port 25-1 to the discharge port 25-6, the air volume was sequentially reduced by 2% with respect to the discharge port 25-1.

CTL-1 Coating Composition CTM-1 Polycarbonate (Z-200, manufactured by Mitsubishi Gas Chemical Company) 1,2-Dichloroethane For the solid content, the solid content weight ratio CTM-1: Z-200
= 0.89: 1 CTL-2 coating liquid composition CTM-2 polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Company) 1,2-dichloroethane For solid content, solid content weight ratio CTM-2: Z-200
The chemical formula of fixed CTM-1 and CTM-2 at 0.89: 1 is shown in Chemical formula 4.

[0132]

Embedded image

Table 3 shows the results of the examples.

[0134]

[Table 3]

As shown in Table 3, even if the cylindrical base material and the introduction member are rubbed at the initial stage of the introduction, the Teflon member has good slipperiness, so that no damage or coating defect occurs, the positioning accuracy is high, and the coating unevenness is low. There was no coating and the coating was good.

(Embodiment 7) A positioning device 20 (length H = 200 mm, taper ratio C = 0.01-0.1, gap G) shown in FIG. = 100 μm, using Teflon resin), and coated in the same manner as in Example 4 except that UCL-2 was used.
Coating drum No. 1d-No. 4d was obtained. FIG.
(A) is a schematic sectional view showing one embodiment of the positioning device 20. The discharge port surface of the positioning device 20 having the plurality of discharge ports 25A has a taper angle that narrows in the traveling direction of the cylindrical substrate 1, and the minimum gap between the discharge port surfaces is the gap G. The taper ratio C is a ratio (C = (D−d) / L) of the difference between the diameters (D−d) of two cross sections perpendicular to the axis of the cone and the length (L) of the tapered portion of both cross sections. ). FIG. 11 is a cross-sectional view for explaining the discharge taper surface of the positioning device. The above-mentioned taper ratio C means C = (D−d) / L as shown in the figure. Table 4 shows the results of the examples.

[0137]

[Table 4]

As shown in Table 4, the positioning accuracy was high, and there was no coating unevenness or coating defect, and the coating property was good.

Example 8 One million coatings of UCL, CGL, and CTL were successively applied using an introduction portion made of a fluororesin material, but no damage was caused by the coater or the cylindrical base material.

Further, examples relating to coating and drying of a cylindrical substrate will be described.

(Example 9) The conditions of the experiment are as follows.

A) The length of each of the cylindrical members 9B and 10B is 4
00 mm, outer diameter is 80 mm, b) moving speed of the cylindrical substrate is 20 mm / S c) distance between the coater and the drying device: 200 mm d) measurement point: measured at the end of the cylindrical member e) coating liquid: UCL-1 coating solution composition of Example 4 f) Dry film thickness: 0.1 μm These experiments were performed using the apparatus shown in FIGS. 12, 13, 14 and 15, and the inner diameters of the cylindrical members 9B and 10B. And the wind speed was changed. Table 5 shows the results.

[0143]

[Table 5]

As shown in Table 5, in the range of the present invention, there is no influence of strong wind on drying, and the coating is uniform and good.

(Embodiment 10) The CGL of the above (Embodiment 5)
Coating was performed in the same manner as in (Example 9) except that the coating composition was used so as to have a dry film thickness of 0.2 μm. It was good without coating unevenness.

Although the above embodiment has been described with respect to the drying of the photosensitive material-containing paint when the photosensitive drum of the electrophotographic apparatus is manufactured, the present invention is not limited to this and can be applied to other appropriate coating drying. it can.

[0147]

According to the structure described above, the following effects can be obtained. According to the method for coating a cylindrical substrate according to any one of claims 1 to 4, the coatability is good, the beat is stable without breakage of the beat, the streak does not occur, and the film thickness variation in the circumferential and longitudinal directions. And stable for long-time continuous coating.

According to the method for applying a cylindrical substrate according to the fifth and sixth aspects, the method is stable with no beat breakage, has no streak failure, and has no fluctuation in the film thickness in the circumferential direction and the longitudinal direction. .

According to the method for coating a cylindrical substrate according to the seventh aspect, the beat is not broken by vibration and is stable, no streak failure occurs, and there is no variation in the film thickness in the circumferential direction and the longitudinal direction. .

According to the method for applying a cylindrical substrate according to the eighth and ninth aspects, the same effect as that of the first aspect can be obtained, and in the case of a plurality of coating films, the application time can be shortened.

According to the apparatus for coating a cylindrical substrate according to the tenth to thirteenth aspects, the beat is stable without breakage of the beat, no streak failure occurs, and there is no variation in the film thickness in the circumferential and longitudinal directions. .

According to the method for positioning a cylindrical substrate according to the fourteenth to sixteenth aspects, the variation in the thickness of the photosensitive film applied on the cylindrical substrate becomes extremely small. In addition, the applicability of the coating solution to the cylindrical substrate is improved. Further, generation of scratches on the surface of the cylindrical substrate was eliminated. Further, the coating liquid discharge section (coater) of the coating apparatus is not damaged. Further, the positioning accuracy of the cylindrical substrate can be improved.

According to the positioning device for a cylindrical base material according to the seventeenth to twenty-first aspects, the same effect as the positioning method can be obtained.

According to the method for drying a cylindrical substrate according to the twenty-second and twenty-third aspects, the position of the suction member with respect to the cylindrical member is set to the position according to the present invention, so that the vicinity of the surface with respect to the coating film immediately after coating is obtained. The generation of turbulence is almost eliminated, and the solvent can be completely and rapidly evaporated and dried completely without adversely affecting the coating film, thereby efficiently producing a high-quality electrophotographic photosensitive drum. It becomes possible.

According to the apparatus for drying a cylindrical substrate according to the twenty-fourth and twenty-fifth aspects, similarly to the drying method, almost no turbulence is generated in the vicinity of the surface with respect to the coating film immediately after the coating, which adversely affects the coating film. The solvent can be uniformly and rapidly evaporated off without drying to complete drying.

[Brief description of the drawings]

FIG. 1 is a front view showing the overall configuration of a continuous coating apparatus according to the present invention.

FIG. 2 is a cross-sectional view of the application unit of FIG.

FIG. 3 is a perspective view of the application unit of FIG.

FIG. 4 is a sectional view showing the configuration of a simultaneous multilayer coating apparatus according to the present invention.

FIG. 5 is a cross-sectional view of a configuration of a sequential multilayer coating apparatus according to the present invention.

FIG. 6 is a longitudinal sectional view of a positioning device and a vertical coating device according to the present invention.

FIG. 7 is a cross-sectional view of the coating apparatus taken along a line PP and a line QQ.

FIG. 8 is a schematic sectional view of a coating device and a positioning device.

FIG. 9 is a partially broken perspective view of the positioning device.

FIG. 10 is a schematic sectional view showing other various embodiments of the positioning device.

FIG. 11 is a cross-sectional view illustrating a discharge taper surface of the positioning device.

FIG. 12 is an overall layout view of a coating and drying apparatus.

FIG. 13 is a partially cutaway perspective view of the coater.

FIG. 14 is a cross-sectional view illustrating a state in which a cylindrical base material and a coater are applied.

FIG. 15 is a sectional view of a drying device.

FIG. 16 is a partially cutaway perspective view of a suction member provided with a suction slit.

FIG. 17 is a partially cutaway perspective view of a suction member provided with a punch plate.

FIG. 18 is a partially cutaway perspective view of a suction member provided with a mesh.

[Explanation of symbols]

 1, 1a, 1b Cylindrical substrate (photosensitive drum) 11 Coating liquid 12A Coating liquid outlet 13A Coating liquid distribution slit 14A Coating liquid distribution chamber 12B Suction chamber 13B Buffer space 14B Air flow 15B Suction nozzle 16B Suction slit 18B Suction Slit member (suction member) 2, 2A Coating film 20 Positioning device (positioning means) 21A Outer tube member 22A Inner tube member (fluororesin) 23A Air supply port 25A Discharge port 26A Exhaust port 28A Tapered surface 30, 32 Coating head (coater) , Coating means) 4 hopper surface 4b, 42b annular end 6a, 6b, 6c coating liquid supply port 7 coating liquid distribution chamber 8 coating liquid distribution slit 9 outlet opening 9B, 10B tubular member 150 drying device GP gap G gap

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Mao Asano 2970 Ishikawa-cho, Hachioji-shi, Tokyo Konica Corporation F-term (reference) 4D075 AB14 AB32 AB36 AB51 AB54 AB56 AE06 BB24Z BB56Z BB57X BB57Z CA47 CA48 DA15 DA20 DB07 DB31 DC27 EA07 EB15 EB19 EB35 EB39 EB42 4F041 AA05 AB02 BA07 BA12 BA23 BA56

Claims (25)

[Claims] 1. A coating liquid is supplied from an inlet opening of a coating liquid distributing slit forming an annular slit for distributing a coating liquid, and is supplied from an outlet opening of a coating liquid distributing slit provided inside the inlet opening. The coating liquid is caused to flow out, and the coating liquid is caused to flow out to a hopper surface which is inclined downward inward from the outlet opening and extends to an annular end portion close to an outer peripheral surface of the cylindrical base material, and the cylinder is formed with respect to the hopper surface. While vertically moving the base material upward, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical base material and the annular end portion of the hopper surface, and the outer peripheral surface of the cylindrical base material is supplied. Wherein the circularity of the annular end of the hopper surface is defined as HRD (μm), wherein the condition of 1.0 <HRD <10 is satisfied. It is characterized by flowing the coating liquid to the annular end of the hopper surface The method of coating that the cylindrical base member. 2. The method according to claim 1, wherein the viscosity of the coating solution is V (millipascal.
2. The method for coating a cylindrical substrate according to claim 1, wherein the liquid is applied to the cylindrical substrate with a coating liquid having a viscosity satisfying the following condition: 1.0 <V <300. 3. The method according to claim 1, wherein the circularity of the cylindrical substrate is CRD (μ
The method for coating a cylindrical substrate according to claim 1 or 2, wherein the coating is performed on a cylindrical substrate that satisfies the following condition: CRD <30. 4. A coating liquid is supplied from an inlet opening of a coating liquid distribution slit forming an annular slit for distributing the coating liquid, and is supplied from an outlet opening of a coating liquid distribution slit provided inside the inlet opening. The coating liquid is caused to flow out, and the coating liquid is caused to flow out to a hopper surface which is inclined downward inward from the outlet opening and extends to an annular end portion close to an outer peripheral surface of the cylindrical base material, and the cylinder is formed with respect to the hopper surface. While vertically moving the base material upward, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical base material and the annular end portion of the hopper surface, and the outer peripheral surface of the cylindrical base material is supplied. In a method of applying a cylindrical substrate to form a coating film by applying to the substrate, the circularity of the annular end of the hopper surface is HRD (μm), the viscosity of the coating liquid is V (millipascal-second),
Assuming that the circularity of the cylindrical substrate is CRD (μm), it is necessary to satisfy the following condition: 1.0 <HRD <10 1.0 <V <300 CRD <30 Characteristic method of applying a cylindrical substrate. 5. When the gap between the cylindrical base material and the annular end of the hopper surface is GP (μm), coating is performed on the cylindrical base material at the gap satisfying the following condition: 50 <GP <500. The method for coating a cylindrical substrate according to claim 1, wherein: 6. An annular end portion of the hopper surface which satisfies a condition of 0.1 <R _Z <5.0, where a ten-point average surface roughness of the annular end portion of the hopper surface is R _Z (μm). The method for coating a cylindrical substrate according to claim 1, wherein the method is applied to a cylindrical substrate by: 7. When the maximum vibration width of the cylindrical base material, which is the maximum vibration width of the cylindrical base material in the coating section, is VR, the coating is performed at a VR of 40 μm or less.
Or a method for applying a cylindrical substrate according to item 6. 8. A plurality of coating liquid distribution slits are provided, and different coating liquids are caused to flow out from an annular outlet opening of the coating liquid distribution slit to the same hopper surface, and a plurality of coating films are simultaneously formed on a cylindrical substrate. The method for coating a cylindrical substrate according to claim 1, wherein the method is formed on an outer peripheral surface of the substrate. 9. A plurality of coating liquid distributing slits and a hopper surface are respectively provided, and different coating liquids are supplied to each of the coating liquid distributing slits, and each of the hopper surfaces is provided from an outlet opening of each of the coating liquid distributing slits. 2. The method for coating a cylindrical substrate according to claim 1, wherein a plurality of coating films are sequentially formed on an outer peripheral surface of the cylindrical substrate. 3. 10. A coating liquid supply means for supplying a coating liquid,
A coating liquid dispensing slit for introducing the coating liquid supplied from the coating liquid supply means through an annular inlet opening, flowing out from an annular outlet opening inside the inlet opening, and distributing the coating liquid; A hopper surface that is inclined downward from the inside of the outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical substrate, and a transport unit that vertically moves the cylindrical substrate relative to the hopper surface; While vertically moving the cylindrical substrate, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical substrate and the annular end of the hopper surface, and the outer peripheral surface of the cylindrical substrate is provided. When the circularity of the annular end of the hopper surface is defined as HRD (μm), the condition of 1.0 <HRD <10 is satisfied. An apparatus for coating a cylindrical substrate. 11. The method according to claim 1, wherein when the viscosity of the coating liquid is V (millipascal-second), the coating liquid having a viscosity satisfying a condition of 1.0 <V <300 is applied to the cylindrical substrate. The apparatus for coating a cylindrical substrate according to claim 10. 12. The circularity of a cylindrical substrate is determined by CRD (μm).
The coating apparatus for a cylindrical substrate according to claim 10, wherein the coating is performed on a cylindrical substrate satisfying a condition of CRD <30. 13. A coating liquid supply means for supplying a coating liquid,
A coating liquid dispensing slit for introducing the coating liquid supplied from the coating liquid supply means through an annular inlet opening, flowing out from an annular outlet opening inside the inlet opening, and distributing the coating liquid; A hopper surface that is inclined downward from the inside of the outlet opening and extends to an annular end close to the outer peripheral surface of the cylindrical substrate, and a transport unit that vertically moves the cylindrical substrate relative to the hopper surface; While vertically moving the cylindrical substrate, the coating liquid is continuously supplied between the outer peripheral surface of the cylindrical substrate and the annular end of the hopper surface, and the outer peripheral surface of the cylindrical substrate is provided. In a coating apparatus for a cylindrical base material that forms a coating film by coating on a surface, the circularity of the annular end of the hopper surface is HRD (μm), and the viscosity of the coating solution is V (millipascal-second). age,
When the circularity of the cylindrical substrate is CRD (μm), the following condition is satisfied: 1.0 <HRD <10 1.0 <V <300 CRD <30 Coating device. 14. A plurality of cylindrical substrates are stacked with their cylindrical axes aligned, and the coating liquid is continuously applied on the outer peripheral surface of the cylindrical substrate by a vertical coating device while vertically pushing up from below. In the step, at a position before or after the coating, a positioning means comprising a ring-shaped spraying portion having a discharge port for spraying a fluid onto the outer peripheral surface of the cylindrical substrate, coaxially disposed on the cylindrical substrate. In the method for positioning a cylindrical base material, the cylindrical base material is introduced from at least an introduction portion formed of a fluororesin material of the positioning means. Method of positioning the base material. 15. The method for positioning a cylindrical substrate according to claim 14, wherein a taper is provided in the introduction portion of the positioning means to introduce and position the cylindrical substrate. 16. A coating solution is continuously applied on the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically stacking a plurality of cylindrical base materials with their cylinder axes aligned and vertically pushing up from below. In the step, at a position before or after coating, a ring-shaped spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material, a positioning means comprising coaxially disposing the cylindrical base material. In the method for positioning a cylindrical base material, the gap between the surface of the cylindrical base material and the discharge port of the spraying means opposed to the cylindrical base material is set to 20 μm to 3 mm. The fluid amount per minute is 0.1 to 50 m ³ / min, and the positioning means has a tapered introduction portion formed of a fluororesin material, and the cylindrical base material is introduced from the introduction portion. thing A method for positioning a cylindrical substrate. 17. A coating solution is continuously applied on the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically stacking a plurality of cylindrical base materials with their cylinder axes aligned and vertically pushing up from below. In the cylindrical substrate positioning device, a ring-shaped spraying means having a discharge port for spraying a fluid onto the outer peripheral surface of the cylindrical substrate at a position before or after the coating is disposed coaxially with the cylindrical substrate. An apparatus for positioning a cylindrical base material, wherein the positioning means includes an introduction portion formed of a fluororesin material. Positioning device. 18. The apparatus for positioning a cylindrical substrate according to claim 17, wherein the introduction portion of the positioning means has a taper. 19. A plurality of cylindrical substrates are stacked with their cylindrical axes aligned, and the coating liquid is continuously applied on the outer peripheral surface of the cylindrical substrate by a vertical coating device while vertically pushing up from below. In the cylindrical substrate positioning device, a ring-shaped spraying means having a discharge port for spraying a fluid onto the outer peripheral surface of the cylindrical substrate at a position before or after the coating is disposed coaxially with the cylindrical substrate. In a cylindrical base material positioning device for positioning the cylindrical base material by positioning means provided, a gap between a surface of the cylindrical base material and a discharge port of a spraying means opposed thereto is 20 μm to 3 mm, The amount of fluid discharged per minute is 0.1 to 50 m ³ / min,
The positioning device for a cylindrical base material, wherein the positioning means has a tapered introduction portion formed of a fluororesin material. 20. The positioning device for a cylindrical substrate according to claim 17, wherein the vertical coating device is a slide hopper type coating device. 21. The method according to claim 17, wherein the fluid sprayed onto the outer peripheral surface of the cylindrical substrate is air having a temperature of 20 to 24 ° C. and a humidity of 10 to 65% RH. An apparatus for positioning a cylindrical substrate according to the above. 22. A cylindrical base material having a coating film applied to an outer peripheral surface thereof, a ring-shaped circumferential uniform suction member is provided concentrically on the outer periphery, and inserted through an insertion opening of the cylindrical member. At the time of insertion, the cylindrical substrate surface is condensed with the inner surface of the cylindrical member concentric with the surface of the cylindrical member to cause an air flow, and in a method of drying the cylindrical substrate to promote drying of the coating film, When the total length is L ₀ and the distance from the insertion opening of the cylindrical member to the suction member is L ₁ , the following condition is satisfied: 0.5 <L ₁ / L ₀ <1.0 A method for drying a cylindrical substrate. 23. When the total length of the cylindrical member is L ₀ , and the distance from the insertion opening of the cylindrical base of the cylindrical member to the suction member is L ₁ , 0.6 <L ₁ The method for drying a cylindrical substrate according to claim 22, wherein a condition of / L ₀ <0.9 is satisfied. 24. A ring-shaped, circumferentially uniform and concentric suction member is provided on the outer periphery of a cylindrical member into which a cylindrical substrate coated with a coating film has been inserted through an insertion opening. In the drying apparatus for a cylindrical base material, which sucks a gap between the cylindrical base material surface and the inner surface of the cylindrical member concentrically with the cylindrical base material surface when the cylindrical base material surface is inserted into the insertion opening to generate an air current, thereby promoting drying of the coating film. When the total length of the tubular member is L ₀ and the distance L ₁ from the insertion opening of the tubular member to the suction portion of the suction member is L _{0, the following} condition is satisfied: 0.5 <L ₁ / L ₀ <1.0 An apparatus for drying a cylindrical substrate, characterized by satisfying the following. 25. When the total length of the cylindrical member is L ₀ and the distance L ₁ from the insertion opening of the cylindrical member to the suction portion of the suction member is 0.6 <L ₁ / L _The apparatus for drying a cylindrical substrate according to claim 24, wherein the condition ₀ <0.9 is satisfied.