JPH08318188A - Method for positioning cylindrical base material and device therefor - Google Patents

Method for positioning cylindrical base material and device therefor

Info

Publication number
JPH08318188A
JPH08318188A JP12523195A JP12523195A JPH08318188A JP H08318188 A JPH08318188 A JP H08318188A JP 12523195 A JP12523195 A JP 12523195A JP 12523195 A JP12523195 A JP 12523195A JP H08318188 A JPH08318188 A JP H08318188A
Authority
JP
Japan
Prior art keywords
cylindrical base
base material
cylindrical
positioning
discharge port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12523195A
Other languages
Japanese (ja)
Inventor
Akira Ohira
晃 大平
Junji Ujihara
淳二 氏原
Eiichi Kijima
栄一 木島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12523195A priority Critical patent/JPH08318188A/en
Priority to US08/651,913 priority patent/US5674552A/en
Publication of JPH08318188A publication Critical patent/JPH08318188A/en
Pending legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE: To embody positioning with high accuracy without generating coating defects by changing the discharge rate of the fluid discharging from a discharge port in the joint part where the end faces of cylindrical base materials are connected to each other at the time of continuously applying a processing liquid on the outer peripheral surfaces of the cylindrical base materials, such as photoreceptors used in a electrophotographic device. CONSTITUTION: The positioning device 20 of an annular coating applicator 10 which executes coating on the cylindrical base material 1A by a coating head 11 while moving the base material 1A upward is composed of an outside cylindrical member 21 and an inside cylindrical member 22 fixed therein. This outside cylindrical member 21 is formed with four air feed ports 23 radially and perpendicularly in plural stages and the inside cylindrical member 22 is formed with 12 discharge ports. Four exhaust ports 26 are radially and perpendicularly formed in plural stages through both the members 21, 22. The discharge rate of the fluid discharged from these discharge ports is so controlled as to be changed in accordance with the outputs of a joint part detecting means for detecting the joint part between the base materials 1A and 1B.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、複数の円筒状基材外周
面上に処理液を連続的に塗布する際に、該円筒状基材を
位置決めする方法及び装置に関し、特に、円筒状基材に
感光液を塗布することにより、電子写真感光体を製造す
る際に、円筒状基材を正確に位置決めする方法及び装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for positioning a cylindrical substrate when continuously applying a treatment liquid onto the outer peripheral surfaces of a plurality of cylindrical substrates, and more particularly to a cylindrical substrate. The present invention relates to a method and apparatus for accurately positioning a cylindrical base material when manufacturing an electrophotographic photosensitive member by applying a photosensitive liquid to a material.

【0002】[0002]

【従来の技術】電子写真装置で使用される感光体である
有機光導電体感光ドラムの製造においては、円筒形状の
ドラムに感光性の感光液(処理液)を塗布する。その塗
布に当たっては、円筒ドラムの周面にスライドホッパー
を所定位置に位置せしめ、両者間の間隙を周方向に関し
て一定に保持する調整作業が必要となる。この場合、所
要の塗布層厚は極めて薄いため、円筒状ドラムが0.1
mmずれても周方向に関し、円筒面全体としてみれば塗
膜層の膜厚の大きな偏差要因となる。
2. Description of the Related Art In manufacturing an organic photoconductor photosensitive drum which is a photosensitive member used in an electrophotographic apparatus, a photosensitive photosensitive liquid (treatment liquid) is applied to a cylindrical drum. In the coating, it is necessary to adjust the slide hopper at a predetermined position on the peripheral surface of the cylindrical drum and to keep the gap between them constant in the circumferential direction. In this case, since the required coating layer thickness is extremely thin,
Even if it is deviated by mm, with respect to the circumferential direction, it causes a large deviation in the film thickness of the coating layer when viewed as the entire cylindrical surface.

【0003】かかる塗膜層の膜厚偏差があると、円筒状
ドラムの周方向で帯電量の変化、感度の不均一、残留電
位の変化等の各種不具合が生じることは周知の事実であ
る。従って、円筒状ドラムの正確な位置決めが極めて重
要となる。
It is a well-known fact that such a film thickness deviation of the coating layer causes various problems such as a change in charge amount, a non-uniform sensitivity, and a change in residual potential in the circumferential direction of the cylindrical drum. Therefore, accurate positioning of the cylindrical drum is extremely important.

【0004】従来、この種の円筒状ドラムの位置決め装
置としては、例えば特開昭60−50537号公報に記
載のように、支持部材に回転自在に設けた位置規制コロ
を円筒状ドラムの外周に接触させて設けたものがある。
また、特開平3−280063号公報及び特開平4−7
3655号公報には、エアベアリングを使用した感光ド
ラムの位置決め装置が開示されている。
Conventionally, as a positioning device for this type of cylindrical drum, for example, as disclosed in Japanese Patent Laid-Open No. 60-50537, a position regulating roller rotatably provided on a supporting member is provided on the outer periphery of the cylindrical drum. Some are provided in contact with each other.
Further, JP-A-3-280063 and JP-A-4-7
Japanese Patent No. 3655 discloses a photosensitive drum positioning device using an air bearing.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記の
コロ接触式の従来の位置決め装置は、位置規制コロを直
接円筒状ドラムに対して接触させながら位置決めするも
のであるので、円筒状ドラムに傷がついてしまうという
難点があった。円筒状ドラムに傷がつくと、電子写真特
性が悪化することは周知である。
However, since the above-mentioned conventional roller contact type positioning device positions the position regulating roller while directly contacting the cylindrical drum, the cylindrical drum is damaged. There was a difficulty that it would keep up. It is well known that scratching a cylindrical drum will degrade the electrophotographic properties.

【0006】上記エアベアリング式の位置決め装置は、
空気等の流体を吹付ノズルから吹き付けて位置決めを行
うようにしたもので、円筒状ドラムの傷付きが防止で
き、極めて有効である。
The air bearing type positioning device is
A fluid such as air is sprayed from a spray nozzle to perform positioning, which is extremely effective because scratches on the cylindrical drum can be prevented.

【0007】しかし、図6(a)に示すように、複数の
円筒状ドラム1A,1Bの端部を接して積み重ねて繋ぎ
合わせた状態で移動させる場合、先の円筒状ドラム1A
が位置決め用吹付ノズル3から逃げて、次の円筒状ドラ
ム1Bに移行するとき、先の円筒状ドラム1Aが外的要
因により、水平方向に移動させる外力が作用したときに
は、図6(b)のように、たとえ次の円筒状ドラム1B
の位置決めを行うことができたとしても、先の円筒状ド
ラム1Aが水平方向に急にずれてしまうことがある。こ
の移動現象が生じると、感光液の横段や液切れ塗布等と
なって現れる。
However, as shown in FIG. 6 (a), when the end portions of a plurality of cylindrical drums 1A and 1B are brought into contact with each other and stacked and moved, the cylindrical drum 1A is moved forward.
6 escapes from the positioning spray nozzle 3 and moves to the next cylindrical drum 1B, when an external force that causes the previous cylindrical drum 1A to move in the horizontal direction due to an external factor is applied, So even if the next cylindrical drum 1B
Even if the positioning can be performed, the cylindrical drum 1A may be abruptly displaced in the horizontal direction. When this movement phenomenon occurs, it appears as a horizontal step of the photosensitive solution or a coating solution running out.

【0008】本発明の主課題は円筒状ドラムに傷を付け
ることなく、円筒状ドラムの位置決めを行うとともに、
円筒状ドラム相互間の繋ぎ部分における円筒状ドラムの
位置ずれを防止することにある。
The main object of the present invention is to position the cylindrical drum without damaging the cylindrical drum, and
The purpose is to prevent displacement of the cylindrical drums at the connecting portion between the cylindrical drums.

【0009】[0009]

【課題を解決するための手段】上記課題を解決する本発
明の請求項1に記載の円筒状基材の位置決め方法は、複
数の円筒状基材の筒軸を合わせて積み重ね、下方から上
方に垂直に押し上げながら、垂直塗布装置により前記円
筒状基材外周面上に塗布液を連続的に塗布し、塗布前ま
たは塗布後の位置で、前記円筒状基材外周面上に流体を
吹き付ける吐出口を有する中空円筒状の吹き付け手段
を、前記円筒状基材の同軸に配設して成る位置決め手段
により前記円筒状基材の位置決めを行う円筒状基材の位
置決め方法において、前記各円筒状基材の端面が相互に
接する繋ぎ部で、前記吐出口から吐出する流体の吐出量
を変化させることを特徴とするものである。
A method of positioning a cylindrical base material according to claim 1 of the present invention which solves the above-mentioned problems is a method of stacking a plurality of cylindrical base materials by aligning their cylindrical axes, and from top to bottom. A discharge port for continuously applying the coating liquid on the outer peripheral surface of the cylindrical substrate by a vertical coating device while pushing it up vertically and spraying a fluid on the outer peripheral surface of the cylindrical substrate at a position before or after coating. In a cylindrical substrate positioning method for positioning the cylindrical substrate by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having The discharge amount of the fluid discharged from the discharge port is changed at a connecting portion where the end faces of the discharge nozzles are in contact with each other.

【0010】また、本発明の請求項2に記載の円筒状基
材の位置決め方法は、前記各円筒状基材の端面が相互に
接する繋ぎ部を検出する検出手段を設け、該検出手段に
より検出された検出信号に基づき、前記円筒状基材の繋
ぎ部が前記吐出口を通過するとき、前記吐出口から吐出
される流体の吐出量を変化させるように制御することを
特徴とするものである。
Further, in the method for positioning a cylindrical base material according to a second aspect of the present invention, a detecting means for detecting a connecting portion where the end faces of the cylindrical base materials contact each other is provided, and the detecting means detects the connecting portion. Based on the detected signal, when the connecting portion of the cylindrical base material passes through the discharge port, the discharge amount of the fluid discharged from the discharge port is controlled to be changed. .

【0011】さらに、本発明の請求項3に記載の円筒状
基材の位置決め方法は、前記各円筒状基材の端面が相互
に接する繋ぎ部を、タイマー手段により検出された検出
信号と計時信号に基づき、前記円筒状基材の繋ぎ部が前
記吐出口を通過するとき、前記吐出口から吐出される流
体の吐出量を変化させるように制御することを特徴とす
るものである。
Further, in the method for positioning a cylindrical base material according to a third aspect of the present invention, the connecting portion where the end faces of the respective cylindrical base materials contact each other is a detection signal and a timing signal detected by a timer means. Based on the above, when the connecting portion of the cylindrical base material passes through the discharge port, the discharge amount of the fluid discharged from the discharge port is controlled to be changed.

【0012】さらにまた、本発明の請求項4に記載の円
筒状基材の位置決め方法は、前記各円筒状基材の端面が
相互に接する繋ぎ部で、前記吐出口から吐出する流体の
圧力を変化させることを特徴とする。
Furthermore, in the method for positioning a cylindrical base material according to a fourth aspect of the present invention, the pressure of the fluid discharged from the discharge port is fixed at the connecting portion where the end faces of the cylindrical base materials contact each other. It is characterized by changing.

【0013】さらにまた、本発明の請求項5に記載の円
筒状基材の位置決め方法は、前記各円筒状基材の端面が
相互に接する繋ぎ部を検出する検出手段を設け、該検出
手段により検出された検出信号に基づき、前記円筒状基
材の繋ぎ部が前記吐出口を通過するとき、前記吐出口か
ら吐出される流体の圧力を変化させるように制御するこ
とを特徴とする。
Further, in the method for positioning a cylindrical base material according to a fifth aspect of the present invention, a detecting means for detecting a connecting portion where the end faces of the respective cylindrical base materials contact each other is provided, and the detecting means is used. Based on the detected detection signal, when the connecting portion of the cylindrical base material passes through the discharge port, the pressure of the fluid discharged from the discharge port is controlled to be changed.

【0014】さらにまた、本発明の請求項6に記載の円
筒状基材の位置決め方法は、前記各円筒状基材の端面が
相互に接する繋ぎ部を、タイマー手段により検出された
検出信号と計時信号に基づき、前記円筒状基材の繋ぎ部
が前記吐出口を通過するとき、前記吐出口から吐出され
る流体の圧力を変化させるように制御することを特徴と
する。
Furthermore, in the method for positioning a cylindrical base material according to a sixth aspect of the present invention, the connecting portion where the end faces of the cylindrical base materials contact each other is timed with a detection signal detected by the timer means. Based on the signal, when the connecting portion of the cylindrical base material passes through the discharge port, the pressure of the fluid discharged from the discharge port is controlled to be changed.

【0015】さらにまた、本発明の請求項9に記載の円
筒状基材の位置決め装置は、複数の円筒状基材の筒軸を
合わせて積み重ね、下方から上方に垂直に押し上げなが
ら、垂直塗布装置により前記円筒状基材外周面上に塗布
液を連続的に塗布し、塗布前または塗布後の位置で、前
記円筒状基材外周面上に流体を吹き付ける吐出口を有す
る中空円筒状の吹き付け手段を、前記円筒状基材の同軸
に配設して成る位置決め手段により前記円筒状基材の位
置決めを行う円筒状基材の位置決め装置において、前記
各円筒状基材の端面が相互に接する繋ぎ部を検出する検
出手段を設け、該検出手段により検出された検出信号に
基づき、前記円筒状基材の繋ぎ部が前記吐出口を通過す
るとき、前記吐出口から吐出される流体の吐出量を変化
させるように制御することを特徴とするものである。
Further, according to a ninth aspect of the present invention, there is provided a positioning device for a cylindrical base material, wherein a plurality of cylindrical base materials are stacked so that their cylindrical axes are aligned with each other, and the vertical coating device is vertically pushed upward from below. By means of which the coating liquid is continuously applied on the outer peripheral surface of the cylindrical base material, and at a position before or after application, a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In a cylindrical substrate positioning device for positioning the cylindrical substrate by a positioning means that is arranged coaxially with the cylindrical substrate, a connecting portion in which end faces of the cylindrical substrates are in contact with each other. Detecting means for detecting the change of the discharge amount of the fluid discharged from the discharge port when the connecting portion of the cylindrical base material passes through the discharge port based on the detection signal detected by the detecting means. Control to let And it is characterized in Rukoto.

【0016】[0016]

【作用】本発明では、円筒状基材の外周面に対して流体
を吹き付けて、その流体圧により円筒状基材の位置決め
を行う。すなわち、円筒状基材の周囲から流体、例えば
エアを吹き付けると、その吹き付け圧力により、円筒状
基材の位置が中立化し、これによって円筒状基材が所定
位置に位置決めされる。しかも、円筒状基材に機械的接
触することがないから、円筒状基材に傷を付けることが
防止される。
In the present invention, the fluid is sprayed onto the outer peripheral surface of the cylindrical substrate, and the fluid pressure causes the cylindrical substrate to be positioned. That is, when a fluid such as air is blown from around the cylindrical base material, the blowing pressure neutralizes the position of the cylindrical base material, thereby positioning the cylindrical base material at a predetermined position. Moreover, since the cylindrical base material does not come into mechanical contact with the cylindrical base material, it is possible to prevent the cylindrical base material from being damaged.

【0017】他方、複数の円筒状基材の筒軸を合わせて
積み重ね、下方から上方に垂直に押し上げながら、垂直
塗布装置により前記円筒状基材外周面上に塗布液を連続
的に塗布し、塗布前または塗布後の位置で、前記円筒状
基材外周面上に流体を吹き付ける吐出口を有する中空円
筒状の吹き付け手段を、前記円筒状基材の同軸に配設し
て成る位置決め手段により前記円筒状基材の位置決めを
行う円筒状基材の位置決め装置において、位置決めに当
たり、複数の円筒状基材のうち、直角度が悪い円筒状基
材がたとえ一つでもあると、吹き付け装置から吐出され
たエアーが前記各円筒状基材の端面が相互に接する繋ぎ
部に入って、円筒状基材が浮き上がって、傾いたり振動
したりして、積み重なって進行する円筒状基材すべてに
悪影響を与え、塗布性が低下する。
On the other hand, a plurality of cylindrical base materials are stacked by aligning the cylinder axes, and while vertically pushing upward from below, the coating liquid is continuously applied onto the outer peripheral surface of the cylindrical base material by a vertical coating device, At a position before or after coating, a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material is positioned by the positioning means arranged coaxially with the cylindrical base material. In a cylindrical base material positioning device that positions a cylindrical base material, when positioning, if there is at least one cylindrical base material with a bad squareness, it is ejected from the spraying device. The air enters the joint where the end faces of each of the cylindrical substrates come into contact with each other, and the cylindrical substrates float, tilt or vibrate, and adversely affect all the cylindrical substrates that progress in a stack. , Paint Sex is reduced.

【0018】本発明は、円筒状基材相互の繋ぎ部で流体
の吐出量または圧力を変化させるように制御することに
より、上記の問題点を解決した。すなわち、上記繋ぎ部
での流体の吐出量をストップさせるか、あるいは元の吐
出流量の80%以下にする。または、元の吐出圧力の8
0%以下にするのが良い。好ましくは上記吐出流量また
は吐出圧力の0〜70%が良い。
The present invention solves the above problems by controlling the discharge amount or pressure of the fluid to be changed at the connecting portion between the cylindrical substrates. That is, the discharge amount of the fluid at the connecting portion is stopped, or 80% or less of the original discharge flow rate. Or 8 of the original discharge pressure
It is better to set it to 0% or less. Preferably, the discharge flow rate or discharge pressure is 0 to 70%.

【0019】かくして複数の円筒状基材間の突き合わせ
部分においても、両円筒状基材の位置決めを正確に行う
ことができる。このように円筒状基材を正確かつ円滑に
保持、移動させることによって、塗布液の膜厚変動を押
さえて、塗布性を向上させることができる。また、円筒
状基材やコーターに傷を発生させることがなくなった。
Thus, even at the abutting portion between the plurality of cylindrical base materials, both the cylindrical base materials can be accurately positioned. By accurately and smoothly holding and moving the cylindrical substrate in this manner, it is possible to suppress the film thickness variation of the coating liquid and improve the coating property. In addition, the cylindrical base material and the coater are not damaged.

【0020】[0020]

【実施例】以下、本発明の実施例を図面に基づいて詳細
に説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0021】図1は、本発明の位置決め装置を含む垂直
塗布装置の全体を示す断面図である。該垂直型塗布装置
は、中心線Oに沿って垂直状に重ね合わせた円筒状基材
(円筒状ドラム)1A,1Bに塗布液(感光液)2を塗
布する環状塗布装置10と、該環状塗布装置10の下方
に固設された円筒状基材位置決め装置20と、前記垂直
塗布装置10の上方に設置された乾燥フード30と、前
記位置決め装置20の下部に固定された支持装置40と
から構成されている。
FIG. 1 is a sectional view showing the entire vertical coating apparatus including the positioning apparatus of the present invention. The vertical type coating apparatus includes a circular coating apparatus 10 for coating a coating liquid (photosensitive liquid) 2 on cylindrical base materials (cylindrical drums) 1A and 1B vertically stacked along a center line O, and the circular coating apparatus 10. From a cylindrical substrate positioning device 20 fixed below the coating device 10, a drying hood 30 installed above the vertical coating device 10, and a supporting device 40 fixed to the lower part of the positioning device 20. It is configured.

【0022】環状塗布装置10の内部には、円筒状基材
1Aの外周を取り囲むように処理液2を塗布する塗布ヘ
ッド11、該塗布ヘッド11に隣接するテーパ状の処理
液流出口(処理液スライド面)12、水平方向の幅狭の
処理液通路を形成する処理液分配用スリット13、塗布
液分配室14、減圧室15が形成されている。前記塗布
液分配室14には処理液供給パイプ16が接続され、図
示しない圧送ポンプにより処理液が供給される。減圧室
15には空気排気管17が接続され、図示しない排気ポ
ンプにより減圧される。
Inside the annular coating device 10, a coating head 11 for coating the treatment liquid 2 so as to surround the outer periphery of the cylindrical substrate 1A, and a tapered treatment liquid outlet (treatment liquid) adjacent to the coating head 11. A slide surface) 12, a processing liquid distribution slit 13 forming a narrow processing liquid passage in the horizontal direction, a coating liquid distribution chamber 14, and a decompression chamber 15 are formed. A processing liquid supply pipe 16 is connected to the coating liquid distribution chamber 14, and the processing liquid is supplied by a pressure feed pump (not shown). An air exhaust pipe 17 is connected to the decompression chamber 15 and decompressed by an exhaust pump (not shown).

【0023】上記垂直塗布装置10による塗布方法は、
環状塗布装置10を固定し、前記円筒状基材1Aを中心
線Oに沿って矢示方向に上昇移動させながら円筒状基材
1Aの上端部より塗布ヘッド11により塗布を行う。
The coating method by the vertical coating device 10 is as follows.
The annular coating device 10 is fixed, and coating is performed by the coating head 11 from the upper end of the cylindrical base material 1A while moving the cylindrical base material 1A upward along the center line O in the direction of the arrow.

【0024】前記垂直塗布装置10には、圧送ポンプに
より一定量の処理液が安定して送り込まれ、処理液供給
パイプ16、塗布液分配室14、処理液分配用スリット
13、処理液流出口12を経て、塗布ヘッド11に供給
され、排気ポンプに接続された減圧室15の減圧下にお
いて、円筒状基材1Aの表面に処理液が塗布され感光層
が形成される。
A fixed amount of the processing liquid is stably fed to the vertical coating device 10 by a pressure pump, and the processing liquid supply pipe 16, the coating liquid distribution chamber 14, the processing liquid distribution slit 13, and the processing liquid outlet 12 are provided. After that, the treatment liquid is applied to the surface of the cylindrical substrate 1A under reduced pressure in the decompression chamber 15 which is supplied to the coating head 11 and is connected to the exhaust pump to form a photosensitive layer.

【0025】前記垂直塗布装置10の上部には、環状に
形成した乾燥フード30が固定されている。該乾燥フー
ド30には多数の開口部31が形成されている。前記垂
直塗布装置10により形成された円筒状基材上の感光層
は、前記乾燥フード30内を通過しながら塗布された感
光液2を徐々に乾燥させる。乾燥は前記開口部31より
感光液に含まれる溶媒を外部に放出させることにより行
なわれる。
An annular drying hood 30 is fixed to the upper portion of the vertical coating device 10. A large number of openings 31 are formed in the drying hood 30. The photosensitive layer on the cylindrical substrate formed by the vertical coating device 10 gradually dries the coated photosensitive liquid 2 while passing through the drying hood 30. The drying is performed by releasing the solvent contained in the photosensitive liquid to the outside through the opening 31.

【0026】前記垂直塗布装置10の下部には、円筒状
基材位置決め装置20が固定されている。図2(a)は
図1における円筒状基材位置決め装置20のA−A断面
図(給気部)、図2(b)はB−B断面図(排気部)で
ある。
A cylindrical substrate positioning device 20 is fixed to the lower part of the vertical coating device 10. 2A is a cross-sectional view taken along the line AA (air supply portion) of the cylindrical base material positioning device 20 in FIG. 1, and FIG. 2B is a cross-sectional view taken along the line BB (exhaust portion).

【0027】前記円筒状基材の位置決め装置20は、外
筒部材21と、該外筒部材21の内部に固定された内筒
部材22とから構成されている。外筒部材21と内筒部
材22には、両部材を貫通する複数の給気口23と、複
数の排気口26が穿設されている。該複数の給気口23
は、給気ポンプ29に接続され、空気等の流体が圧送さ
れる。
The cylindrical base material positioning device 20 is composed of an outer cylinder member 21 and an inner cylinder member 22 fixed inside the outer cylinder member 21. The outer cylinder member 21 and the inner cylinder member 22 are provided with a plurality of air supply ports 23 penetrating both members and a plurality of exhaust ports 26. The plurality of air supply ports 23
Is connected to the air supply pump 29, and a fluid such as air is pressure-fed.

【0028】図1及び図2(a)に示すように、前記外
筒部材21には、給気口23が水平方向に4個の放射状
に配置され、さらに垂直方向に複数段(図示5段)配列
されている。該外筒部材21の内周面には水平溝24が
穿設されていて、前記内筒部材22の外周面との間に水
平流路を形成し、前記水平方向に放射状に配置された4
個の給気口23に連通している。前記内筒部材22に
は、水平方向に12個の吐出口25を有する穴が貫通し
ている。該吐出口25は前記円筒状基材1の外周面と間
隙Gを保って対向している。該間隙Gは、20μm〜3
mm、好ましくは30μm〜2mmである。この間隙G
が20μmより小さいと、円筒状基材1の僅かな振れで
内筒部材22に接触して円筒状基材1を傷つけやすい。
また、間隙Gが3mmより大であると、円筒状基材1の
位置決め精度が低下する。前記吐出口25は直径0.0
1〜1.0mmの小口径のノズルであり、好ましくは
0.05〜0.5mmが良い。
As shown in FIGS. 1 and 2 (a), the outer cylinder member 21 is provided with four air supply ports 23 in the horizontal direction in a radial pattern and further in a vertical direction in a plurality of stages (5 stages in the figure). ) It is arranged. A horizontal groove 24 is formed in the inner peripheral surface of the outer cylindrical member 21 to form a horizontal flow path between the outer cylindrical member 21 and the outer peripheral surface of the inner cylindrical member 22, and the grooves are arranged radially in the horizontal direction.
It communicates with the individual air supply port 23. A hole having twelve discharge ports 25 in the horizontal direction penetrates through the inner cylinder member 22. The discharge port 25 faces the outer peripheral surface of the cylindrical substrate 1 with a gap G therebetween. The gap G is 20 μm to 3
mm, preferably 30 μm to 2 mm. This gap G
Is less than 20 μm, the cylindrical base material 1 is likely to be damaged by contacting the inner cylindrical member 22 with a slight shake of the cylindrical base material 1.
Further, when the gap G is larger than 3 mm, the positioning accuracy of the cylindrical base material 1 is reduced. The discharge port 25 has a diameter of 0.0
The nozzle has a small diameter of 1 to 1.0 mm, preferably 0.05 to 0.5 mm.

【0029】図1及び図2(b)に示すように、前記外
筒部材21及び内筒部材22を貫通して、排気口26が
水平方向に4個の放射状に配置され、さらに垂直方向に
複数段(図示5段)配列されている。該排気口26は垂
直方向に前記給気口23と交互に配列されている。内筒
部材22の内周面には、垂直溝27が穿設されていて、
前記複数段の排気口26を連通している。
As shown in FIG. 1 and FIG. 2B, four exhaust holes 26 are arranged in a horizontal direction radially through the outer cylinder member 21 and the inner cylinder member 22, and further in a vertical direction. A plurality of stages (5 stages in the figure) are arranged. The exhaust ports 26 are arranged alternately with the air supply ports 23 in the vertical direction. A vertical groove 27 is formed on the inner peripheral surface of the inner cylinder member 22,
The plurality of stages of exhaust ports 26 communicate with each other.

【0030】前記内筒部材22の下部の内周面は、入り
口側が広がったテーパー面28になっている。このテー
パー面28は、例えば軸方向の長さが50mmで、片側
傾斜角が0.5mmの円錐面である。このテーパー面2
8を設けることにより、円筒状基材1が内筒部材22に
進入するとき、円筒状基材1の先端部が内筒部材22の
内周面に接触することを防止している。
The inner peripheral surface of the lower portion of the inner cylinder member 22 is a tapered surface 28 that widens on the inlet side. The tapered surface 28 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. This taper surface 2
By providing 8, the front end of the cylindrical base material 1 is prevented from coming into contact with the inner peripheral surface of the inner cylindrical member 22 when the cylindrical base material 1 enters the inner cylindrical member 22.

【0031】前記給気ポンプ29から圧送された流体
は、複数の給気口23から外筒部材23内に導入され
て、水平溝24を介して複数の吐出口25から吐出さ
れ、前記円筒状基材1A(1B)の外周面と均一な流体
膜層を形成する。吐出後の流体は垂直溝27を経て複数
の排気口26から装置外に排出される。
The fluid pumped from the air supply pump 29 is introduced into the outer cylinder member 23 through the plurality of air supply ports 23, and is discharged through the plurality of discharge ports 25 through the horizontal groove 24 to form the cylindrical shape. A uniform fluid film layer is formed on the outer peripheral surface of the base material 1A (1B). The discharged fluid is discharged to the outside of the apparatus through the plurality of exhaust ports 26 through the vertical groove 27.

【0032】前記吐出口25の開口直径は0.01〜1
mm、好ましくは0.05〜0.5mm、例えば0.2
〜0.5mmの円形に形成されている。排気口26の開
口直径は1.0〜10mm、好ましくは2.0〜8.0
mm、例えば3〜5mmの円形に形成されている。そし
て前記吐出口25及び排気口26とは、前記位置決め手
段20の最内面を形成する部材(内筒部材22)の円筒
状基材1の外周面に対向する側に、一体に組み込まれて
いる。
The opening diameter of the discharge port 25 is 0.01 to 1
mm, preferably 0.05-0.5 mm, eg 0.2
It is formed in a circular shape of 0.5 mm. The opening diameter of the exhaust port 26 is 1.0 to 10 mm, preferably 2.0 to 8.0.
It is formed in a circular shape of mm, for example, 3 to 5 mm. The discharge port 25 and the exhaust port 26 are integrally incorporated on the side of the member (inner tubular member 22) forming the innermost surface of the positioning means 20 facing the outer peripheral surface of the cylindrical substrate 1. .

【0033】前記吐出口25から吐出される流体の吐出
量は、複数の円筒状基材1間の繋ぎ部を検出する繋ぎ部
検出手段(53)、またはタイマー手段(51)により
繋ぎ部で変化するように制御される。
The discharge amount of the fluid discharged from the discharge port 25 is changed at the connecting portion by the connecting portion detecting means (53) for detecting the connecting portion between the plurality of cylindrical substrates 1 or the timer means (51). To be controlled.

【0034】あるいは、前記吐出口25から吐出される
流体の圧力は、複数の円筒状基材1間の繋ぎ部を検出す
る繋ぎ部検出手段(53)、またはタイマー手段(5
1)により繋ぎ部で変化するように制御される。
Alternatively, the pressure of the fluid discharged from the discharge port 25 is a joint portion detecting means (53) for detecting the joint portion between the plurality of cylindrical substrates 1 or a timer means (5).
It is controlled so as to change at the connecting portion by 1).

【0035】前記繋ぎ部検出手段として、例えば、反射
率変動検出、磁気変化計測、渦電流計測、電気容量変化
計測、レーザー計測等の手段を使用することにより容易
に円筒状基材1間の繋ぎ部を検出することができる。
By using, for example, reflectance fluctuation detection, magnetic change measurement, eddy current measurement, electric capacitance change measurement, laser measurement, etc. as the connecting portion detecting means, connection between the cylindrical substrates 1 can be easily performed. The part can be detected.

【0036】前記タイマー手段による円筒状基材1間の
繋ぎ部検出は、円筒状基材1の長さ、円筒状基材1の移
動速度、複数の吐出口25間の距離、吹き付け手段の最
初の吐出口距離等から検出される。
The connection between the cylindrical base materials 1 is detected by the timer means, and the length of the cylindrical base material 1, the moving speed of the cylindrical base material 1, the distance between the plurality of discharge ports 25, and the first of the spraying means. It is detected from the discharge port distance and the like.

【0037】なお、図1に示す位置決め装置20は、1
組のユニットであるが、2組以上のユニットを上下方向
に連続接続しても良い。
The positioning device 20 shown in FIG.
Although it is a set of units, two or more sets may be continuously connected in the vertical direction.

【0038】前記給気口23に供給される流体は、空
気、不活性ガス例えば窒素ガスが良い。そして該流体
は、JIS規格でクラス100以上の清浄な気体が良
い。
The fluid supplied to the air supply port 23 is preferably air or an inert gas such as nitrogen gas. The fluid is preferably clean gas of class 100 or higher according to JIS standard.

【0039】なお、本発明の位置決め装置に接続される
垂直塗布装置としては、スライドホッパー型、押し出し
型、リングコーター等の各種装置が用いられる。
As the vertical coating device connected to the positioning device of the present invention, various devices such as a slide hopper type, an extrusion type and a ring coater are used.

【0040】[実施例]次に、具体的な実施例により本
発明を説明するが、本発明はこれに限定されるものでは
ない。
[Embodiment] The present invention will be described with reference to specific embodiments, but the present invention is not limited thereto.

【0041】実施例1 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては鏡面加工を施した直径80mm、高さ355mm
のアルミニウムドラム支持体を用いた。
Example 1 (Examples and Comparative Examples) The conductive support (cylindrical base material) 1 has a mirror-finished diameter of 80 mm and a height of 355 mm.
Of aluminum drum support.

【0042】前記導電性支持体1上に下記の如く塗布液
組成物UCL−1(3.0W/V%ポリマー濃度)を調
製し、図1に記載の如くのスライドホッパー型塗布装置
10を用いて塗布した。図3は前記塗布装置10と、タ
イマー制御手段を備えた位置決め装置20の模式断面
図、図4は位置決め装置20の一部破断斜視図である。
この実施例では、上記塗布装置10の直前に図3に示す
位置決め装置20(長さH=250mm)を設置し、円
筒状基材1の移動速度は20mm/sec、コーター
(塗布ヘッド)11と円筒状基材1間ギャップは100
μmで連続塗布を行った。
A coating liquid composition UCL-1 (3.0 W / V% polymer concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 10 as shown in FIG. 1 was used. Applied. 3 is a schematic sectional view of the coating device 10 and a positioning device 20 provided with a timer control means, and FIG. 4 is a partially cutaway perspective view of the positioning device 20.
In this embodiment, a positioning device 20 (length H = 250 mm) shown in FIG. 3 is installed immediately before the coating device 10, the moving speed of the cylindrical substrate 1 is 20 mm / sec, and a coater (coating head) 11 is used. The gap between the cylindrical substrates 1 is 100
The continuous coating was performed with a thickness of μm.

【0043】・UCL−1塗布液組成物 共重合ナイロン樹脂(CM−8000 東レ社製) メタノール/n−ブタノール=10/1(Vol比) 円筒状基材1の塗布速度、円筒状基材1の長さ、基準箇
所から最初の吐出口25までの距離、吐出口から吐出口
までの距離等から算出されたタイマー制御により、位置
決め手段の吐出口25に丁度円筒状基材1の繋ぎ部がか
かった時のみ、吐出口25からの窒素ガス等の流体が一
時的に停止され、連続塗布が行われた。これにより円筒
状基材1の振動、揺れ等は起こらず塗布性は良好であっ
た。前記流体の吐出を一時停止しないで塗布した場合、
直角度の悪い円筒状基材1間の繋ぎ部の隙間に窒素ガス
流が流入し、円筒状基材1を傾けつつ持ち上げ、上に重
ねた全ての円筒状基材1を振動させたり、揺り動かせ
て、位置決め装置20の内壁やコーター11と擦れ合
い、塗布ムラや傷等の故障を発生させた。
UCL-1 coating liquid composition Copolymerized nylon resin (CM-8000 manufactured by Toray) Methanol / n-butanol = 10/1 (Vol ratio) Coating speed of cylindrical substrate 1, cylindrical substrate 1 By the timer control calculated from the length, the distance from the reference point to the first discharge port 25, the distance from the discharge port to the discharge port, and the like, the connecting portion of the cylindrical base material 1 is exactly located at the discharge port 25 of the positioning means. Only when it was applied, the fluid such as nitrogen gas from the discharge port 25 was temporarily stopped and the continuous coating was performed. As a result, the cylindrical substrate 1 did not vibrate or sway, and the coatability was good. When applied without pausing the discharge of the fluid,
A nitrogen gas flow flows into the gap between the connecting portions of the cylindrical base materials 1 having a poor squareness, and the cylindrical base material 1 is tilted and lifted to vibrate or shake all the cylindrical base materials 1 stacked thereon. It was moved and rubbed against the inner wall of the positioning device 20 and the coater 11, causing failure such as coating unevenness and scratches.

【0044】実施例2 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては、鏡面加工を施した直径80mm、高さ355m
mのアルミニウムドラム支持体を用いた。
Example 2 (Example and Comparative Example) As the conductive support (cylindrical base material) 1, a mirror-finished diameter 80 mm and height 355 m were used.
m aluminum drum support was used.

【0045】前記支持体上に下記の如く塗布液組成物C
GL−2(3.0W/V%ポリマー濃度)を調製し、図
1に記載の如くのスライドホッパー型塗布装置10を用
いて塗布した。この際、上記塗布装置10の直前に図3
に示すリング状位置決め装置(長さH=250mm)を
設置し、円筒状基材1の移動速度30mm/sec、コ
ーター11と円筒状基材1間のギャップを100μmで
連続塗布を行った。
Coating solution composition C was prepared on the support as follows.
GL-2 (3.0 W / V% polymer concentration) was prepared and coated using the slide hopper type coating device 10 as described in FIG. At this time, immediately before the coating device 10 shown in FIG.
The ring-shaped positioning device (length H = 250 mm) shown in 1 was installed, and continuous coating was performed at a moving speed of the cylindrical substrate 1 of 30 mm / sec and a gap between the coater 11 and the cylindrical substrate 1 of 100 μm.

【0046】・CGL−2塗布液組成物 ペリレン顔料(CGM−2) ブチラール樹脂(エスレックBX−L積水化学社製) メチルエチルケトン 上記塗布液組成物(固形分については固形分重量比CG
M−1:BX−L=2:1に固定)をサンドミルを用い
て20時間分散したもの。
CGL-2 coating liquid composition Perylene pigment (CGM-2) Butyral resin (S-REC BX-L Sekisui Chemical Co., Ltd.) Methyl ethyl ketone The above coating liquid composition (solid content weight ratio CG
M-1: BX-L = fixed at 2: 1) dispersed for 20 hours using a sand mill.

【0047】[0047]

【化1】 Embedded image

【0048】円筒状基材塗布速度、円筒状基材の長さ、
基準箇所から最初の吐出口までの距離、吐出口から吐出
口までの距離等から算出されたタイマー制御により、位
置決め装置の吐出口に丁度円筒状基材1の繋ぎ部がかか
った時のみ、吐出口25からの窒素ガス流量が一時的に
元の吐出流量の30%まで減少され、連続塗布が行われ
た。円筒状基材1の振動、揺れ等は起こらず塗布性は良
好であった。窒素ガス流量を減少しないで塗布した場
合、直角度の悪い円筒状基材1間の繋ぎ部の隙間に窒素
ガス流が流入し、円筒状基材1を傾けつつ持ち上げ、上
に重ねた全ての円筒状基材1を振動させたり、揺り動か
せて、位置決め装置20の内壁やコーター11と擦れ合
い、塗布ムラや傷等の故障を発生させた。
Cylindrical substrate coating speed, cylindrical substrate length,
By the timer control calculated from the distance from the reference point to the first discharge port, the distance from the discharge port to the discharge port, etc., the discharge is performed only when the connecting portion of the cylindrical substrate 1 is applied to the discharge port of the positioning device. The nitrogen gas flow rate from the outlet 25 was temporarily reduced to 30% of the original discharge flow rate, and continuous coating was performed. Vibration and shaking of the cylindrical substrate 1 did not occur, and the coatability was good. When applying without reducing the nitrogen gas flow rate, the nitrogen gas flow flows into the gap between the connecting portions between the cylindrical base materials 1 having a bad squareness, and the cylindrical base material 1 is tilted and lifted, and all The cylindrical substrate 1 was vibrated or rocked to rub against the inner wall of the positioning device 20 or the coater 11 to cause a failure such as coating unevenness or scratches.

【0049】実施例3 (実施例)導電性支持体(円筒状基材)1としては実施
例1と同じアルミニウムドラム支持体を用いた。
Example 3 (Example) As the conductive support (cylindrical base material) 1, the same aluminum drum support as in Example 1 was used.

【0050】前記導電性支持体1上に下記の如く塗布液
組成物CTL−1(35W/V%固形分濃度)を調製
し、図1に記載の如くのスライドホッパー型塗布装置1
0を用いて塗布した。この際、上記塗布装置10の直前
に図3に示す位置決め装置20(長さH=250mm)
を設置し、円筒状基材1の移動速度5mm/sec、コ
ーター11と円筒状基材1間のギャップを250μmで
連続塗布を行った。 ・CTL−1塗布液組成物 CTM−1 ポリカーボネート(Z−200 三菱瓦斯化学社製) 1,2−ジクロロエタン 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定
A coating solution composition CTL-1 (35 W / V% solid content concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 1 as shown in FIG. 1 was prepared.
0 was used for coating. At this time, the positioning device 20 (length H = 250 mm) shown in FIG.
Was installed, and continuous coating was performed at a moving speed of the cylindrical substrate 1 of 5 mm / sec and a gap between the coater 11 and the cylindrical substrate 1 of 250 μm. -CTL-1 coating liquid composition CTM-1 polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Co., Inc.) 1,2-dichloroethane For solids, solids weight ratio CTM-1: Z-200
Fixed at = 0.89: 1

【0051】[0051]

【化2】 Embedded image

【0052】円筒状基材1の塗布速度、円筒状基材1の
長さ、基準箇所から最初の吐出口までの距離、吐出口か
ら吐出口までの距離等から算出されたタイマー制御によ
り、位置決め装置の吐出口に丁度円筒状基材1の繋ぎ部
がかかった時のみ、吐出口からの窒素ガス圧が一時的に
元のガス圧の20%まで減少され、連続塗布が行われ
た。円筒状基材1の振動、揺れ等は起こらず塗布性は良
好であった。ガス圧を減少しないで塗布した場合、直角
度の悪い円筒状基材1の繋ぎ部の隙間に窒素ガス流が流
入し、円筒状基材1を傾けつつ持ち上げ、上に重ねた全
ての円筒状基材1を振動、揺り動かし、位置決め装置2
0の内壁やコーター11とこすれ合い、塗布ムラや傷等
の故障を発生させた。
Positioning is performed by timer control calculated from the coating speed of the cylindrical base material 1, the length of the cylindrical base material 1, the distance from the reference point to the first discharge port, the distance from the discharge port to the discharge port, and the like. Only when the connecting portion of the cylindrical substrate 1 was applied to the discharge port of the apparatus, the nitrogen gas pressure from the discharge port was temporarily reduced to 20% of the original gas pressure, and continuous coating was performed. Vibration and shaking of the cylindrical substrate 1 did not occur, and the coatability was good. When applied without reducing the gas pressure, a nitrogen gas flow flows into the gap between the connecting portions of the cylindrical base material 1 having a poor squareness, and the cylindrical base material 1 is tilted and lifted up, and all the cylindrical shapes Positioning device 2 that vibrates and rocks substrate 1
The inner wall of No. 0 and the coater 11 rubbed against each other, causing failure such as coating unevenness and scratches.

【0053】実施例4 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては、鏡面加工を施した直径80mm、高さ355m
mのアルミニウムドラム支持体を用いた。
Example 4 (Examples and Comparative Examples) The conductive support (cylindrical base material) 1 had a mirror-finished diameter of 80 mm and a height of 355 m.
m aluminum drum support was used.

【0054】前記導電性支持体1上に下記の如く塗布液
組成物UCL−2(3.0W/V%ポリマー濃度)を調
製し、図1に記載の如くのスライドホッパー型塗布装置
10を用いて塗布した。この際、上記塗布装置10の直
前に図5に示すリング状位置決め装置(長さH=250
mm、繋ぎ部検出装置53を第1の吐出口、即ち最下部
の吐出口下端に組み込んだ)に設置し、円筒状基材1の
移動速度20mm/sec、コーター11と円筒状基材
1間のギャップは100μmで連続塗布を行った。
A coating liquid composition UCL-2 (3.0 W / V% polymer concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 10 as shown in FIG. 1 was used. Applied. At this time, the ring-shaped positioning device (length H = 250) shown in FIG.
mm, the connecting portion detection device 53 is installed at the first discharge port, that is, the lower end of the lowermost discharge port is installed), the moving speed of the cylindrical base material 1 is 20 mm / sec, and the coater 11 and the cylindrical base material 1 are moved. The gap was 100 μm and continuous coating was performed.

【0055】・UCL−2塗布液組成物 塩化ビニル−酢酸ビニル系共重合体(エスレックMF−
10、積水化学社製) アセトン/シクロヘキサノン=10/1(Vol比) 位置決め装置20の吐出口25に丁度円筒状基材1の繋
ぎ部がかかった時のみ、繋ぎ部検出装置53により窒素
ガスが一時的に停止され、連続塗布が行われた。円筒状
基材1の振動、揺れ等は起こらず塗布性は良好であっ
た。停止しないで塗布した場合、直角度の悪い円筒状基
材1の繋ぎ部の隙間に窒素ガス流が流入し、円筒状基材
1を傾けつつ持ち上げ、上に重ねた全ての円筒状基材を
振動、揺り動かし、位置ぎめ装置20の内壁やコーター
11とこすれ合い、塗布ムラや傷故障を発生させた。
UCL-2 coating liquid composition vinyl chloride-vinyl acetate copolymer (S-REC MF-
10, Sekisui Chemical Co., Ltd.) Acetone / Cyclohexanone = 10/1 (Vol ratio) Only when the connecting portion of the cylindrical base material 1 is applied to the discharge port 25 of the positioning device 20, nitrogen gas is generated by the connecting portion detecting device 53. It was temporarily stopped and continuous coating was performed. Vibration and shaking of the cylindrical substrate 1 did not occur, and the coatability was good. When applying without stopping, the nitrogen gas flow flows into the gap between the connecting portions of the cylindrical base material 1 having a bad squareness, and the cylindrical base material 1 is lifted while being tilted to remove all the cylindrical base materials stacked on top of it. It vibrated and shook and rubbed against the inner wall of the positioning device 20 and the coater 11 to cause uneven coating and scratches.

【0056】実施例5 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては、鏡面加工を施した直径80mm、高さ355m
mのアルミニウムドラム支持体を用いた。
Example 5 (Example and Comparative Example) As the conductive support (cylindrical base material) 1, a mirror-finished diameter of 80 mm and height of 355 m were used.
m aluminum drum support was used.

【0057】前記導電性支持体1上に下記の如く塗布液
組成物CGL−3(3.0W/V%ポリマー濃度)を調
製し、図1に記載の如くのスライドホッパー型塗布装置
10を用いて塗布した。この際、上記塗布装置10の直
前に図5に示すリング状位置決め装置20(長さH=2
70mm、繋ぎ部検出装置53を第1の吐出口25−6
(最下部の吐出口下端に組み込んだ)を設置し、基材の
移動速度30mm/sec、コーター11と円筒状基材
1間のギャップは100μmで連続塗布を行った。
A coating liquid composition CGL-3 (3.0 W / V% polymer concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 10 as shown in FIG. 1 was used. Applied. At this time, the ring-shaped positioning device 20 (length H = 2) shown in FIG.
70 mm, the connecting portion detection device 53 to the first discharge port 25-6
(Incorporated into the lower end of the lowermost discharge port) was installed, and continuous coating was performed at a substrate moving speed of 30 mm / sec and a gap between the coater 11 and the cylindrical substrate 1 of 100 μm.

【0058】・CGL−3塗布液組成物 Y−型チタニルフタロシアニン顔料(CGM−3) シリコーン樹脂(KR−5240 信越化学社製) t−酢酸ブチル 上記塗布液組成物(固形分については固形分重量比CG
M−2:KR−5240=2:1に固定)をサンドミル
を用いて20時間分散したもの。
CGL-3 coating liquid composition Y-type titanyl phthalocyanine pigment (CGM-3) silicone resin (KR-5240 manufactured by Shin-Etsu Chemical Co., Ltd.) t-butyl acetate The above coating liquid composition (solid content is solid weight). Ratio CG
M-2: KR-5240 = fixed at 2: 1) dispersed for 20 hours using a sand mill.

【0059】[0059]

【化3】 Embedded image

【0060】位置決め装置20の吐出口25に丁度円筒
状基材1の繋ぎ部がかかった時のみ、繋ぎ部検出装置5
3により空気流量が一時的に元の空気流量の10%に減
少され、連続塗布が行われた。円筒状基材1の振動、揺
れ等は起こらず塗布性は良好であった。空気流量を減少
しないで塗布した場合、直角度の悪い円筒状基材の繋ぎ
部の隙間に空気流が流入し、円筒状基材を傾けつつ持ち
上げ、上に重ねた全ての円筒状基材を振動、揺り動か
し、位置ぎめ装置20の内壁やコーター11とこすれ合
い、塗布ムラや傷故障を発生させた。
Only when the connecting portion of the cylindrical substrate 1 is applied to the discharge port 25 of the positioning device 20, the connecting portion detecting device 5
By 3, the air flow rate was temporarily reduced to 10% of the original air flow rate, and continuous coating was performed. Vibration and shaking of the cylindrical substrate 1 did not occur, and the coatability was good. If applied without reducing the air flow rate, the air flow will flow into the gap between the connecting parts of the cylindrical base material with a bad squareness, and the cylindrical base material will be lifted while tilting, and all the cylindrical base materials stacked on top It vibrated and shook and rubbed against the inner wall of the positioning device 20 and the coater 11 to cause uneven coating and scratches.

【0061】実施例6 (実施例及び比較例)導電性支持体(円筒状基材)1と
しては実施例1と同じアルミニウムドラム支持体を用い
た。
Example 6 (Example and Comparative Example) As the conductive support (cylindrical base material) 1, the same aluminum drum support as in Example 1 was used.

【0062】前記導電性支持体1上に下記の如く塗布液
組成物CTL−2(35W/V%固形分濃度)を調製
し、図1に記載の如くのスライドホッパー型塗布装置1
0を用いて塗布した。この際、上記塗布装置10の直前
に図5示す位置決め装置20(長さH=250mm、繋
ぎ部検出装置53を第1の吐出口25−6(最下部の吐
出口下端に組み込んだ)を設置し、円筒状基材1の移動
速度5mm/sec、コーター11と円筒状基材1間の
ギャップは250μmで連続塗布を行った。
A coating liquid composition CTL-2 (35 W / V% solid content concentration) was prepared on the conductive support 1 as follows, and a slide hopper type coating apparatus 1 as shown in FIG. 1 was prepared.
0 was used for coating. At this time, the positioning device 20 (length H = 250 mm, the connecting portion detection device 53 is installed at the first discharge port 25-6 (incorporated at the lower end of the lowermost discharge port) shown in FIG. 5 immediately before the coating device 10. Then, continuous movement was performed at a moving speed of the cylindrical substrate 1 of 5 mm / sec and a gap between the coater 11 and the cylindrical substrate 1 of 250 μm.

【0063】・CTL−2塗布液組成物 CTM−2 ポリカーボネート(Z−200 三菱瓦斯化学社製) 1,2−ジクロロエタン 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定 位置決め装置20の吐出口25に丁度円筒状基材1の繋
ぎ部がかかった時のみ、繋ぎ部検出装置53により空気
圧力が一時的に元の空気圧力の20%に減少され、連続
塗布が行われた。円筒状基材の振動、揺れ等は起こらず
塗布性は良好であった。空気圧力を減少しないで塗布し
た場合、直角度の悪い円筒状基材の繋ぎ部の隙間に空気
流が流入し、円筒状基材を傾けつつ持ち上げ、上に重ね
た全ての円筒状基材を振動、揺り動かし、位置決め装置
20の内壁やコーター11とこすれ合い塗布ムラや傷故
障の隙間に窒素ガス流が流入し、基材を傾きつつ持ち上
げ上に重ねた全ての基材を振動、揺り動かし位置決め装
置壁やコーターとこすれ合い塗布ムラや傷故障を発生さ
せた。
CTL-2 coating liquid composition CTM-2 polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Co., Inc.) 1,2-dichloroethane For solids, solids weight ratio CTM-1: Z-200
Fixed at = 0.89: 1 Only when the connecting portion of the cylindrical substrate 1 is applied to the discharge port 25 of the positioning device 20, the air pressure is temporarily 20% of the original air pressure by the connecting portion detecting device 53. And continuous coating was performed. Vibration and shaking of the cylindrical substrate did not occur, and the coatability was good. When applied without reducing the air pressure, an airflow flows into the gap between the connecting parts of the cylindrical base material with a bad squareness, lifting the cylindrical base material while tilting it, and removing all the cylindrical base materials stacked on top. Positioning device that vibrates and shakes, and rubs against the inner wall of the positioning device 20 and the coater 11 into the gaps for coating unevenness and scratches, and tilts and lifts the base materials while vibrating and rocking all the base materials stacked on top. Rubbing with the wall or coater caused uneven coating and scratches.

【0064】本発明の感光体をUCL/CGL/CTL
と3層に逐次重層したOPC感光体を作製し実写したと
ころ、濃淡ムラ、カブリムラや画像欠陥(黒ポチ、白ポ
チ、スジ故障、キズ故障)がなく良好であった。またコ
ーターを損傷することもなかった。
The photoconductor of the present invention is UCL / CGL / CTL.
When an OPC photosensitive member having three layers sequentially formed was produced and actually copied, it was good without uneven density, fog unevenness and image defects (black spots, white spots, streak defects, and scratch defects). It also did not damage the coater.

【0065】[0065]

【発明の効果】本発明の塗布装置に備えた円筒状基材の
位置決め方法及び装置により、以下の優れた効果が得ら
れた。
By the method and apparatus for positioning a cylindrical substrate provided in the coating apparatus of the present invention, the following excellent effects are obtained.

【0066】(1)円筒状基材上に塗布された感光膜厚
の変動が極めて微小となった。
(1) The fluctuation of the photosensitive film thickness coated on the cylindrical substrate was extremely small.

【0067】(2)円筒状基材への塗布液の塗布性が良
好になった。
(2) The coating property of the coating liquid on the cylindrical substrate was improved.

【0068】(3)円筒状基材の表面の傷発生が解消さ
れた。
(3) The occurrence of scratches on the surface of the cylindrical substrate was eliminated.

【0069】(4)塗布装置の塗布液吐出部(コータ
ー)を損傷させることがない。
(4) The coating liquid discharge part (coater) of the coating device is not damaged.

【0070】(5)円筒状基材の位置決め精度が向上し
た。
(5) The positioning accuracy of the cylindrical substrate is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による位置決め装置と塗布装置の縦断面
図。
FIG. 1 is a vertical sectional view of a positioning device and a coating device according to the present invention.

【図2】上記塗布装置のA−A断面図及びB−B断面
図。
FIG. 2 is a sectional view taken along the line AA and a sectional view taken along the line BB of the coating apparatus.

【図3】塗布装置と位置決め装置の模式断面図。FIG. 3 is a schematic cross-sectional view of a coating device and a positioning device.

【図4】位置決め装置の一部破断斜視図。FIG. 4 is a partially cutaway perspective view of a positioning device.

【図5】位置決め装置の他の実施例を示す模式断面図。FIG. 5 is a schematic cross-sectional view showing another embodiment of the positioning device.

【図6】円筒状基材を積み重ねて搬送する状態を説明す
る模式図。
FIG. 6 is a schematic diagram illustrating a state in which cylindrical base materials are stacked and conveyed.

【符号の説明】[Explanation of symbols]

1,1A,1B 円筒状基材(円筒状ドラム、導電性支
持体) 2 処理面(感光液面) 10 垂直塗布装置(スライドホッパー型塗布装置) 11 塗布ヘッド(コーター) 20 位置決め装置(位置決め手段) 21 外筒部材 22 内筒部材 23 給気口 25 吐出口 26 排気口 29 給気ポンプ 51 タイマー手段 53 繋ぎ部検出装置
1, 1A, 1B Cylindrical base material (cylindrical drum, conductive support) 2 Treatment surface (photosensitive liquid surface) 10 Vertical coating device (slide hopper type coating device) 11 Coating head (coater) 20 Positioning device (positioning means) ) 21 outer cylinder member 22 inner cylinder member 23 air supply port 25 discharge port 26 exhaust port 29 air supply pump 51 timer means 53 joint detection device

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部で、前記
吐出口から吐出する流体の吐出量を変化させることを特
徴とする円筒状基材の位置決め方法。
1. A step of stacking a plurality of cylindrical base materials so that their cylindrical axes are aligned with each other and continuously pushing up the outer peripheral surface of the cylindrical base material with a vertical coating device while vertically pushing upward from below. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. The method for positioning a cylindrical base material according to claim 1, wherein the discharge amount of the fluid discharged from the discharge port is changed at a joint where the end faces of the cylindrical base materials contact each other.
【請求項2】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部を検出す
る検出手段を設け、該検出手段により検出された検出信
号に基づき、前記円筒状基材の繋ぎ部が前記吐出口を通
過するとき、前記吐出口から吐出される流体の吐出量を
変化させるように制御することを特徴とする円筒状基材
の位置決め方法。
2. A step of stacking a plurality of cylindrical base materials by aligning their cylindrical axes and vertically pushing upward from below to continuously apply a coating liquid onto the outer peripheral surface of the cylindrical base material by a vertical coating device. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In a method for positioning a cylindrical base material, a detecting means for detecting a connecting portion where end faces of the cylindrical base materials contact each other is provided, and based on a detection signal detected by the detecting means, the connecting portion of the cylindrical base material. The method for positioning a cylindrical substrate is characterized in that when the liquid passes through the discharge port, the discharge amount of the fluid discharged from the discharge port is controlled to be changed.
【請求項3】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部を、タイ
マー手段により検出された検出信号と計時信号に基づ
き、前記円筒状基材の繋ぎ部が前記吐出口を通過すると
き、前記吐出口から吐出される流体の吐出量を変化させ
るように制御することを特徴とする円筒状基材の位置決
め方法。
3. A step of stacking a plurality of cylindrical base materials so that the cylinder axes thereof are aligned with each other and continuously pushing up the outer peripheral surface of the cylindrical base material with a vertical coating device while vertically pushing upward from below. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In the method for positioning a cylindrical base material, the connecting portion where the end faces of the respective cylindrical base materials contact each other is based on a detection signal and a timing signal detected by a timer means, and the connecting portion of the cylindrical base material is the discharge port. A method for positioning a cylindrical substrate, characterized in that the amount of fluid discharged from the discharge port is controlled to change when passing through
【請求項4】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部で、前記
吐出口から吐出する流体の圧力を変化させることを特徴
とする円筒状基材の位置決め方法。
4. A step of stacking a plurality of cylindrical base materials by aligning their cylindrical axes with each other and continuously applying a coating liquid onto the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically pushing upward. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In the method for positioning a cylindrical base material, the pressure of the fluid discharged from the discharge port is changed at a joint where the end faces of the cylindrical base materials contact each other.
【請求項5】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部を検出す
る検出手段を設け、該検出手段により検出された検出信
号に基づき、前記円筒状基材の繋ぎ部が前記吐出口を通
過するとき、前記吐出口から吐出される流体の圧力を変
化させるように制御することを特徴とする円筒状基材の
位置決め方法。
5. A step of stacking a plurality of cylindrical base materials by aligning their cylindrical axes with each other and continuously applying a coating liquid onto the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically pushing upward. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In a method for positioning a cylindrical base material, a detecting means is provided for detecting a connecting portion where end faces of the cylindrical base materials contact each other, and based on a detection signal detected by the detecting means, the connecting portion of the cylindrical base material. Is controlled so that the pressure of the fluid discharged from the discharge port is changed when the liquid passes through the discharge port.
【請求項6】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め方法において、 前記各円筒状基材の端面が相互に接する繋ぎ部を、タイ
マー手段により検出された検出信号と計時信号に基づ
き、前記円筒状基材の繋ぎ部が前記吐出口を通過すると
き、前記吐出口から吐出される流体の圧力を変化させる
ように制御することを特徴とする円筒状基材の位置決め
方法。
6. A step of stacking a plurality of cylindrical base materials so that their cylindrical axes are aligned with each other and continuously pushing up a coating liquid on the outer peripheral surface of the cylindrical base material by a vertical coating device while vertically pushing upward. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In the method for positioning a cylindrical base material, the connecting portion where the end faces of the cylindrical base materials contact each other is based on a detection signal and a timing signal detected by a timer means, and the connecting portion of the cylindrical base material is the discharge port. A method for positioning a cylindrical substrate, characterized in that the pressure of the fluid discharged from the discharge port is controlled so as to change when passing through.
【請求項7】 前記垂直塗布装置がスライドホッパー型
塗布装置であることを特徴とする請求項1ないし6の何
れか1項に記載の円筒状基材の位置決め方法。
7. The method for positioning a cylindrical substrate according to claim 1, wherein the vertical coating device is a slide hopper type coating device.
【請求項8】 前記流体が不活性ガスであることを特徴
とする請求項1ないし6の何れか1項に記載の円筒状基
材の位置決め方法。
8. The method for positioning a cylindrical substrate according to claim 1, wherein the fluid is an inert gas.
【請求項9】 複数の円筒状基材の筒軸を合わせて積み
重ね、下方から上方に垂直に押し上げながら、垂直塗布
装置により前記円筒状基材外周面上に塗布液を連続的に
塗布する工程において、塗布前または塗布後の位置で、
前記円筒状基材外周面上に流体を吹き付ける吐出口を有
する中空円筒状の吹き付け手段を、前記円筒状基材の同
軸に配設して成る位置決め手段により前記円筒状基材の
位置決めを行う円筒状基材の位置決め装置において、 前記各円筒状基材の端面が相互に接する繋ぎ部を検出す
る検出手段を設け、該検出手段により検出された検出信
号に基づき、前記円筒状基材の繋ぎ部が前記吐出口を通
過するとき、前記吐出口から吐出される流体の吐出量を
変化させるように制御することを特徴とする円筒状基材
の位置決め装置。
9. A step of stacking a plurality of cylindrical base materials by aligning their cylindrical axes and vertically pushing them upward from below to continuously apply the coating liquid onto the outer peripheral surface of the cylindrical base material by a vertical coating device. In, at the position before or after application,
A cylinder for positioning the cylindrical base material by a positioning means formed by coaxially arranging a hollow cylindrical spraying means having a discharge port for spraying a fluid on the outer peripheral surface of the cylindrical base material. In a positioning device for a cylindrical base material, a detecting means is provided for detecting a connecting portion where end faces of the cylindrical base materials contact each other, and based on a detection signal detected by the detecting means, the connecting portion of the cylindrical base material. The cylindrical base material positioning device is characterized by controlling so that the discharge amount of the fluid discharged from the discharge port is changed when the liquid passes through the discharge port.
JP12523195A 1995-05-24 1995-05-24 Method for positioning cylindrical base material and device therefor Pending JPH08318188A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP12523195A JPH08318188A (en) 1995-05-24 1995-05-24 Method for positioning cylindrical base material and device therefor
US08/651,913 US5674552A (en) 1995-05-24 1996-05-21 Method of and apparatus for positioning a cylindrical base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12523195A JPH08318188A (en) 1995-05-24 1995-05-24 Method for positioning cylindrical base material and device therefor

Publications (1)

Publication Number Publication Date
JPH08318188A true JPH08318188A (en) 1996-12-03

Family

ID=14905070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12523195A Pending JPH08318188A (en) 1995-05-24 1995-05-24 Method for positioning cylindrical base material and device therefor

Country Status (1)

Country Link
JP (1) JPH08318188A (en)

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