JPH0957171A - Applicator for cylindrical base material and coating method - Google Patents

Applicator for cylindrical base material and coating method

Info

Publication number
JPH0957171A
JPH0957171A JP7214692A JP21469295A JPH0957171A JP H0957171 A JPH0957171 A JP H0957171A JP 7214692 A JP7214692 A JP 7214692A JP 21469295 A JP21469295 A JP 21469295A JP H0957171 A JPH0957171 A JP H0957171A
Authority
JP
Japan
Prior art keywords
coating
cylindrical base
base material
drying
coating liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7214692A
Other languages
Japanese (ja)
Inventor
Akira Ohira
晃 大平
Junji Ujihara
淳二 氏原
Eiichi Kijima
栄一 木島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7214692A priority Critical patent/JPH0957171A/en
Publication of JPH0957171A publication Critical patent/JPH0957171A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To reduce the variation in the thickness of a photosensitive film applied onto a cylindrical base material, to improve the application and drying properties of coating liquid applied onto the cylindrical base material, and to obtain a uniform dried film free from unevenness and defects. SOLUTION: An apparatus in which a group of cylindrical base materials which are piled with the cylinder shafts of the base materials made coincided vertically are installed on a fixed base 45, the peripheral surface of the group is made to penetrate inside an annular inside diameter part having the coating liquid discharge opening of an annular application means 20, and coating liquid is applied continuously on the peripheral surface of the cylindrical base material while the application means 20 being brought down vertically is equipped integrally with a drying means 30 composed of a drying adjuster 31 for adjusting the evaporation and drying of the coating liquid applied on the cylindrical base material and a drier 32 for drying the coating liquid forcibly.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、複数の円筒状基材外周
面上に塗布液を連続的に塗布する垂直型環状塗布装置及
び方法に関し、特に、該円筒状基材を供給、搬送、位置
決め、塗布したのち乾燥する連続塗布装置及び方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vertical type annular coating apparatus and method for continuously coating a coating liquid on the outer peripheral surface of a plurality of cylindrical substrates, and more particularly to supplying, conveying, and transporting the cylindrical substrates. The present invention relates to a continuous coating device and method for positioning, coating, and then drying.

【0002】[0002]

【従来の技術】エンドレスに形成された連続面を有する
円筒状基材の外面上への薄膜で均一な塗布に関連してス
プレー塗布法、浸漬塗布法、ブレード塗布法、ロール塗
布法等の種々の方法が検討されている。特に電子写真感
光体ドラムのような薄膜で均一な塗布については生産性
の優れた塗布装置を開発すべく検討されている。しかし
ながら、従来のエンドレスに形成された連続面を有する
円筒状基材への塗布装置及び塗布方法においては、均一
な塗膜が得られなかったり、生産性が悪い等の短所があ
った。
2. Description of the Related Art Various methods such as spray coating, dip coating, blade coating, roll coating, etc. are used in connection with thin and uniform coating on the outer surface of a cylindrical substrate having a continuous surface formed endlessly. Methods are being considered. In particular, a thin and uniform coating such as an electrophotographic photosensitive drum is being studied to develop a coating apparatus having excellent productivity. However, the conventional coating apparatus and coating method for a cylindrical substrate having a continuous surface formed endlessly have disadvantages such as a failure to obtain a uniform coating film and poor productivity.

【0003】スプレー塗布法では、スプレーガンより噴
出した塗布液滴が該エンドレスに形成された連続面を有
する円筒状基材の外周面上に到達するまでに溶媒が蒸発
するために塗布液滴の固形分濃度が上昇してしまい、そ
れにともない塗布液滴の粘度上昇が起って液滴が面に到
達したとき、液滴が面上を充分に広がらないために、或
いは乾燥固化してしまった粒子が表面に付着するため
に、塗布表面の平滑性の良いものがえられない。また、
該連続面を有する円筒状基材への液滴の到達率が100
%でなく塗布液のロスがあったり、部分的にも不均一で
あるため、膜厚コントロールが非常に困難である。更
に、高分子溶液等では糸引きを起こす事があるため、使
用する溶媒及び樹脂に制限がある。
In the spray coating method, the solvent evaporates before the coating droplet ejected from the spray gun reaches the outer peripheral surface of the endlessly formed cylindrical substrate having a continuous surface. When the solid concentration increased, and the viscosity of the applied droplets increased accordingly, and the droplets reached the surface, the droplets did not spread sufficiently on the surface, or dried and solidified. Since the particles adhere to the surface, a product having good smoothness on the coated surface cannot be obtained. Also,
The arrival rate of droplets on the cylindrical substrate having the continuous surface is 100
%, There is a loss of the coating liquid, and there is partial non-uniformity, so it is very difficult to control the film thickness. Furthermore, since a polymer solution or the like may cause stringing, there are restrictions on the solvent and resin used.

【0004】ブレード塗布法、ロール塗布法は例えば円
筒状基材の長さ方向にブレード若しくはロールを配置
し、該円筒状基材を回転させて塗布を行い円筒状基材を
1回転させたのち、ブレード若しくはロールを後退させ
るものである。しかしながらブレード若しくはロールを
後退させる際、塗布液の粘性により、塗布膜厚の一部に
他の部分より厚い部分が生じ、均一な塗膜が得られない
欠点がある。
In the blade coating method and the roll coating method, for example, a blade or a roll is arranged in the longitudinal direction of a cylindrical substrate, the cylindrical substrate is rotated to perform coating, and the cylindrical substrate is rotated once. , Blades or rolls are retracted. However, when the blade or the roll is retracted, there is a disadvantage that a portion of the coating film thickness is thicker than other portions due to the viscosity of the coating solution, and a uniform coating film cannot be obtained.

【0005】浸漬塗布法は、上記におけるような塗布液
表面の平滑性、塗布膜の均一性の悪い点は改良される。
[0005] The dip coating method improves the above-mentioned problems of poor surface smoothness of the coating solution and uniformity of the coating film.

【0006】しかし、塗布膜厚の制御が塗布液物性例え
ば粘度、表面張力、密度、温度等と塗布速度に支配さ
れ、塗布液物性の調整が非常に重要となる。また塗布速
度も低いし、塗布液槽を満たすためにはある一定量以上
の液量が必要である。さらに重層する場合、下層成分が
溶け出し塗布液槽が汚染されやすい等の欠点がある。
However, the control of the coating film thickness is governed by the properties of the coating liquid, such as viscosity, surface tension, density, temperature, etc., and the coating speed, and the adjustment of the physical properties of the coating liquid is very important. In addition, the coating speed is low, and a certain amount or more of liquid is required to fill the coating liquid tank. Further, when layers are formed, there is a disadvantage that the lower layer components are dissolved and the coating solution tank is easily contaminated.

【0007】そこで特開昭58−189061号公報に
記載の如く円形量規制型塗布装置(この中にはスライド
ホッパー型塗布装置が含まれる)が開発された。このス
ライドホッパー型塗布装置はエンドレスに形成された連
続周面を有する円筒状基材を連続的にその長手方向に移
動させながら、その周囲を環状に取り囲み、円筒状基材
の外周面に対して塗布液を塗布するものであって、さら
にこの塗布装置は環状の塗布液溜まり室と、この塗布液
溜まり室内の一部に対して外部から塗布液を供給する供
給口と、前記塗布液溜まり室の内方に開口する塗布液分
配スリットとを有し、このスリットから流出した塗布液
を斜め下方に傾斜する塗布液スライド面上に流下させ、
塗布液スライド面の下端のホッパー塗布面と円筒状基材
との僅かな間隙部分にビードを形成し、円筒状基材の移
動に伴ってその外周面に塗布するものである。このスラ
イドホッパー型塗布装置を用いることにより、少ない液
量で塗布でき、塗布液が汚染されず、生産性の高い、膜
厚制御の容易な塗布が可能となった。
[0007] Therefore, as disclosed in Japanese Patent Application Laid-Open No. 58-189061, a circular amount-regulated type coating apparatus (including a slide hopper type coating apparatus) has been developed. This slide hopper type coating apparatus surrounds the periphery of the cylindrical base material while continuously moving the cylindrical base material having a continuous peripheral surface formed endlessly in the longitudinal direction thereof, with respect to the outer peripheral surface of the cylindrical base material. The coating apparatus is for applying a coating liquid. The coating apparatus further includes an annular coating liquid storage chamber, a supply port for supplying a coating liquid from outside to a part of the coating liquid storage chamber, and the coating liquid storage chamber. Having a coating liquid distribution slit that opens inward, and allows the coating liquid flowing out of this slit to flow down onto a coating liquid slide surface that is inclined obliquely downward,
A bead is formed at a small gap between the hopper application surface at the lower end of the application liquid slide surface and the cylindrical substrate, and the outer peripheral surface is applied as the cylindrical substrate moves. By using this slide hopper type coating apparatus, coating can be performed with a small amount of liquid, the coating liquid is not contaminated, and the coating with high productivity and easy control of the film thickness can be performed.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、前記ス
ライドホッパー型塗布装置を用いてもなお諸問題があり
未だ満足のいくものではない。
However, the use of the slide hopper type coating apparatus still has various problems and is not yet satisfactory.

【0009】本発明は従来の諸問題を解決するために提
案されたものであり、その目的とするところのものは、 (イ)使用塗布液によるビード切れ発生を防止する。
The present invention has been proposed in order to solve the various problems of the prior art, and its object is to (a) prevent bead breakage due to the coating liquid used.

【0010】(ロ)塗布ムラや膜厚変動等の塗膜欠陥が
なく、塗布性を向上する。
(B) There are no coating defects such as coating unevenness and film thickness variation, and coating properties are improved.

【0011】(ハ)円筒状基材の把持搬送性能を向上
し、長期の安定塗布を可能にする。
(C) The gripping and conveying performance of the cylindrical base material is improved, and stable coating can be performed for a long period of time.

【0012】(ニ)円筒状基材の把持搬送性能を安定化
し、円筒状基材の変形、損傷を防止する。
(D) The gripping and conveying performance of the cylindrical base material is stabilized, and the deformation and damage of the cylindrical base material are prevented.

【0013】(ホ)円筒状基材を供給、搬送、位置決
め、塗布、乾燥、搬出する生産工程を連続安定生産にす
ることにより、生産性が向上する。
(E) The productivity is improved by making the production process of supplying, transporting, positioning, coating, drying and unloading the cylindrical base material continuous and stable.

【0014】(ヘ)上記工程を連続且つ完全自動化する
ことにより、ゴミやほこり等の異物混入を防止し、高品
質な製品を得る。
(F) By continuously and completely automating the above steps, foreign matter such as dust and dirt is prevented from entering, and a high quality product is obtained.

【0015】(ト)円筒状基材に振動が発生しても、完
成された感光体ドラム上の画像形成に影響を与えないよ
うな連続塗布装置を達成する。
(G) A continuous coating device is achieved which does not affect the image formation on the completed photosensitive drum even if vibration is generated in the cylindrical substrate.

【0016】(チ)円筒状基材に振動が発生しても、振
動が同じ位置に集中しないで分散させることにより、重
畳されて大きな振動となることを防止する。
(H) Even if vibrations occur in the cylindrical base material, the vibrations are not concentrated at the same position but dispersed so that they are prevented from being superposed and becoming large vibrations.

【0017】等の効果が達成される優れた塗布装置及び
塗布方法を提供することにある。
An object of the present invention is to provide an excellent coating apparatus and coating method that achieve the effects described above.

【0018】[0018]

【課題を解決するための手段】上記目的は、複数の円筒
状基材の筒軸を垂直方向に合致させて積み重ねた円筒状
基材群を固定台上に設置し、該円筒状基材群の外周面を
環状塗布手段の塗布液吐出口を有する環状内径部の内方
に貫通させ、前記環状塗布手段を垂直方向に下降させな
がら、前記円筒状基材の外周面上に塗布液を連続的に塗
布する円筒状基材の塗布装置に、前記円筒状基材上に塗
布された塗布液の蒸発乾燥を調整する乾燥調整器と該塗
布液を強制乾燥する乾燥器とから成る乾燥手段を一体に
設けたことを特徴とする円筒状基材の塗布装置によって
達成される。
The above-mentioned object is to install a cylindrical base material group, which is obtained by stacking a plurality of cylindrical base materials with their cylinder axes vertically aligned, on a fixed base. The inner peripheral surface of the annular coating means is penetrated inward of the annular inner diameter portion having the coating solution discharge port, and while the annular coating means is vertically lowered, the coating solution is continuously applied on the outer peripheral surface of the cylindrical base material. In a coating device for a cylindrical base material to be applied selectively, a drying means comprising a drying controller for adjusting the evaporation and drying of the coating liquid applied on the cylindrical base material and a dryer for forcibly drying the coating liquid is provided. This is achieved by a coating device for a cylindrical substrate, which is provided integrally.

【0019】また上記目的は、複数の円筒状基材の筒軸
を垂直方向に合致させて積み重ねた円筒状基材群を固定
台上に設置し、該円筒状基材群の外周面を環状塗布手段
の塗布液吐出口を有する環状内径部の内方に貫通させ、
前記環状塗布手段を垂直方向に下降させながら、前記円
筒状基材の外周面上に塗布液を連続的に塗布する円筒状
基材の塗布方法であって、前記円筒状基材上に塗布され
た塗布液の蒸発乾燥を調整する乾燥調整器と該塗布液を
強制乾燥する乾燥器とから成る乾燥手段を一体に設けた
塗布手段により塗布、乾燥することを特徴とする円筒状
基材の塗布方法によって達成される。
Further, the above object is to install a cylindrical base material group in which the cylindrical axes of a plurality of cylindrical base materials are vertically aligned with each other on a fixed base, and to form an annular outer peripheral surface of the cylindrical base material group. Penetrating inward of the annular inner diameter portion having the coating liquid discharge port of the coating means,
A method of coating a cylindrical base material, wherein the coating solution is continuously applied onto the outer peripheral surface of the cylindrical base material while lowering the annular coating means in the vertical direction. The coating of a cylindrical base material, characterized by applying and drying by a coating means integrally provided with a drying means for adjusting the evaporation and drying of the coating solution and a dryer for forcedly drying the coating solution. Achieved by the method.

【0020】[0020]

【実施例】以下、図面を用いて本発明の一実施例を説明
する。
An embodiment of the present invention will be described below with reference to the drawings.

【0021】図1は本発明による実施例1である円筒状
基材の塗布装置の全体構成を示す正面図、図2は円筒状
基材の塗布装置の要部斜視図である。
FIG. 1 is a front view showing the overall construction of a cylindrical substrate coating apparatus according to a first embodiment of the present invention, and FIG. 2 is a perspective view of the main parts of the cylindrical substrate coating apparatus.

【0022】互いに相対向し直立する一組の装置本体1
0A,10Bの内側には、それぞれ垂直方向に支持され
たボールねじ11A,11Bが設けられている。該各ボ
ールねじ11A,11Bはそれぞれ駆動用モータ12
A,12Bにより正逆回転される。各ボールねじ11
A,11Bにそれぞれ螺合する昇降部材13は、ボール
ねじ11A,11Bの正逆回転により直進昇降する。該
昇降部材13には、内径部に環状の塗布液吐出口を有す
る環状塗布手段20と、該環状塗布手段20の上方に設
けた乾燥手段30とが一体に設けてある。前記乾燥手段
30は、円筒状基材1上に塗布された塗布液の蒸発乾燥
を調整する乾燥調整器31および該塗布液を強制乾燥す
る乾燥器(リング式吸引乾燥器)32から成る乾燥手段
を一体に備えている。
A set of apparatus bodies 1 facing each other and standing upright
Ball screws 11A and 11B supported in the vertical direction are provided inside 0A and 10B, respectively. Each of the ball screws 11A and 11B is a drive motor 12 respectively.
A and 12B rotate forward and backward. Each ball screw 11
The elevating member 13, which is screwed into the A and 11B, moves up and down in a straight line by the forward and reverse rotations of the ball screws 11A and 11B. The elevating member 13 is integrally provided with an annular coating means 20 having an annular coating liquid discharge port in its inner diameter portion, and a drying means 30 provided above the annular coating means 20. The drying means 30 comprises a drying controller 31 for adjusting the evaporation and drying of the coating liquid applied on the cylindrical substrate 1 and a dryer (ring type suction dryer) 32 for forcedly drying the coating liquid. It is equipped with.

【0023】なお、前記環状塗布手段20の下方には図
示省略した位置決め手段を一体に固定してもよい。該位
置決め手段は前記昇降部材13により保持されている。
位置決め手段は円筒状基材1を所定の位置に正確に保持
する装置であり、例えばエアーベアリング等により構成
され、円筒状基材1を非接触保持する。
A positioning means (not shown) may be integrally fixed below the annular coating means 20. The positioning means is held by the elevating member 13.
The positioning means is a device that accurately holds the cylindrical base material 1 at a predetermined position, and is constituted by, for example, an air bearing or the like, and holds the cylindrical base material 1 in a non-contact manner.

【0024】複数の円筒状基材、例えば7本の円筒状基
材の最下部の円筒状基材1Gは、予め相互に段差のない
ように下部スペーサードラム41上に垂直に積み重ねら
れ、最上部の円筒状基材1Aの上部には上部スペーサー
ドラム42が設置されている。下部スペーサードラム4
1は下部把持部材43により外方から把持され、所定位
置に固定されている。また上部スペーサードラム42は
上部把持部材44により外方から把持され、所定位置に
固定されている。45は下部スペーサードラム41を所
定位置に載置する固定台であるが、塗布、乾燥処理後の
円筒状基材群を上方に順次押し上げる機構を有し、図示
しない分離手段により最上段の円筒状基材1Aから順次
分離、搬出して、排出ロボットにより収納室、乾燥室あ
るいは次の工程に移行するようにしてもよい。
A plurality of cylindrical substrates, for example, the lowermost cylindrical substrate 1G of the seven cylindrical substrates is vertically stacked on the lower spacer drum 41 so as not to have a step with each other in advance, and the uppermost substrate is formed. An upper spacer drum 42 is installed above the cylindrical substrate 1A. Lower spacer drum 4
The lower grip member 43 is gripped from the outside by a lower grip member 43 and is fixed at a predetermined position. The upper spacer drum 42 is grasped from the outside by an upper grasping member 44 and fixed at a predetermined position. Reference numeral 45 denotes a fixed base on which the lower spacer drum 41 is placed at a predetermined position. The fixed base 45 has a mechanism for sequentially pushing up the cylindrical base material group after coating and drying, and the uppermost cylindrical shape by a separating means (not shown). The base material 1A may be sequentially separated and carried out, and transferred to the storage chamber, the drying chamber, or the next step by the discharge robot.

【0025】環状塗布手段20は円筒状基材1(1A〜
1G)の外周面上に塗布液を均一に塗布するものであ
り、昇降部材13が所定速度で下降することにより、円
筒状基材1(1A〜1G)上に順次塗膜が形成される。
同時に、環状塗布手段20と一体をなす前記乾燥調整器
31および乾燥器32により塗膜が乾燥させられる。こ
の間、円筒状基材群は動くことはないから、振動による
塗布ムラは発生しない。
The annular coating means 20 is a cylindrical substrate 1 (1A-
The coating liquid is uniformly applied onto the outer peripheral surface of 1G), and when the elevating member 13 descends at a predetermined speed, a coating film is sequentially formed on the cylindrical substrate 1 (1A to 1G).
At the same time, the coating film is dried by the drying adjuster 31 and the dryer 32 which are integrated with the annular coating means 20. During this period, the cylindrical base material group does not move, so that coating unevenness due to vibration does not occur.

【0026】本発明の塗布装置は、上記の各手段を連続
して垂直中心線ZZ上に配置した構成であり、人手を要
しない完全自動化生産が高精度で達成される。
The coating apparatus of the present invention has a construction in which the above-mentioned means are continuously arranged on the vertical center line ZZ, and fully automated production requiring no human labor is achieved with high accuracy.

【0027】上記環状塗布手段20および乾燥手段30
の詳細は後述する。
The above annular coating means 20 and drying means 30
Details of will be described later.

【0028】図3は本発明による実施例2の塗布装置を
示す正面図である。なお、図中前記実施例1と同じ機能
を有する部分には同符号を付している。また、前記実施
例と異なる点を説明する。この実施例2では、前記昇降
部材13上に設けた前記環状塗布手段20の上方に、前
記乾燥調整器31、前記乾燥器(リング式吸引乾燥器)
32、第2の乾燥器(リング式加熱乾燥器)33から成
る乾燥手段30を一体に設けたものである。また、前記
環状塗布手段20の下部には、エアベアリング式位置決
め手段50も一体に設けてある。これら環状塗布手段2
0、乾燥手段30、位置決め手段50は昇降部材13と
ともに一体となってボールねじ11A,11Bに沿って
上下駆動される。
FIG. 3 is a front view showing a coating apparatus according to the second embodiment of the present invention. In the figure, the same reference numerals are given to the parts having the same functions as those in the first embodiment. Further, the points different from the above embodiment will be described. In the second embodiment, the drying controller 31 and the dryer (ring type suction dryer) are provided above the annular coating means 20 provided on the elevating member 13.
32 and a second dryer (ring type heating dryer) 33 are integrally provided with a drying means 30. An air bearing type positioning means 50 is also integrally provided under the annular coating means 20. These annular coating means 2
0, the drying means 30, and the positioning means 50 are united with the elevating member 13 and are vertically driven along the ball screws 11A and 11B.

【0029】前記装置本体10A,10Bの下方には供
給手段60が設けてある。該供給手段60は、前記円筒
状基材を取り付け可能にする複数の保持部材61を配置
した回転テーブル62と、該回転テーブル62制御して
回転させ前記塗布手段20の前記垂直中心線ZZ直下へ
円筒状基材を送り込む駆動手段63と、前記保持部材6
1により保持された複数の円筒状基材のうち、垂直中心
線ZZ直下の円筒状基材を順次上方に押し上げる押し上
げ手段64等から構成されている。なお、前記回転テー
ブル62上の保持部材61への円筒状基材の供給は、ロ
ボットハンドルにより行われる。
A supply means 60 is provided below the apparatus main bodies 10A and 10B. The supply means 60 has a rotary table 62 on which a plurality of holding members 61 for mounting the cylindrical base material are arranged, and the rotary table 62 is controlled to rotate to directly below the vertical center line ZZ of the coating means 20. Driving means 63 for feeding the cylindrical base material, and the holding member 6
Of the plurality of cylindrical base materials held by 1, the cylindrical base material immediately below the vertical center line ZZ is configured to be sequentially pushed upward by a pushing-up means 64 and the like. The cylindrical handle is supplied to the holding member 61 on the rotary table 62 by a robot handle.

【0030】一方、装置本体10A,10Bの垂直中心
線ZZ最上方には、分離排出手段70が配置されてい
る。該分離排出手段70は、塗布乾燥されて垂直上方に
搬送されてきた積み重ね状の複数の円筒状基材の最上部
から、内径部を把持して分離させて1個ずつ取り出して
装置本体外に排出させる装置である。
On the other hand, the separating and discharging means 70 is arranged at the uppermost part of the vertical center line ZZ of the apparatus main bodies 10A and 10B. The separating / discharging means 70 holds the inner diameter portions from the uppermost portions of the plurality of stacked cylindrical base materials which have been coated and dried and conveyed vertically upward, and separates them to take them out one by one to the outside of the apparatus main body. It is a device for discharging.

【0031】図4は、位置決め手段50と環状塗布手段
20とを示す断面図、図5は環状塗布手段20の斜視図
である。
FIG. 4 is a sectional view showing the positioning means 50 and the annular coating means 20, and FIG. 5 is a perspective view of the annular coating means 20.

【0032】図4に示されるように中心線ZZに沿って
垂直状に重ね合わせた複数の円筒状基材1A,1B(以
下、円筒状基材1と称す)を連続的に積み重ね、その周
囲を取り囲み、円筒状基材1の外周面に対しスライドホ
ッパー型の環状塗布手段20を垂直方向に下降駆動させ
て、塗布に直接係わる部分であるホッパー塗布面21に
より塗布液(感光液)Lを塗布させる。なお、円筒状基
材1としては中空ドラム例えばアルミニウムドラム、プ
ラスチックドラムのほかシームレスベルト型の基材でも
良い。前記ホッパー塗布面21には、円筒状基材1側に
開口する塗布液流出口22を有する幅狭の塗布液分配ス
リット(スリットと略称する)23が水平方向に形成さ
れている。このスリット23は環状の塗布液分配室(塗
布液溜り室)24に連通し、この環状の塗布液分配室2
4には貯留タンク2内の塗布液Lを圧送ポンプ3により
供給管4を介して供給するようになっている。他方、ス
リット23の塗布液流出口22の下側には、連続して下
方に傾斜し、円筒状基材1の外径寸法よりやや大なる寸
法で終端をなすように形成された塗布液スライド面(以
下、スライド面と称す)25が形成されている。さら
に、このスライド面25終端より下方に延びる唇状部2
6が形成されている。かかる環状塗布手段20による塗
布においては、円筒状基材1を固定して環状塗布手段2
0を下降させる過程で、塗布液Lをスリット23から押
し出し、スライド面25に沿って流下させると、スライ
ド面25の終端に至った塗布液は、そのスライド面25
の終端と円筒状基材1の外周面との間にビードを形成し
た後、円筒状基材1の表面に塗布される。スライド面2
5の終端と円筒状基材1は、ある間隙を持って配置され
ているため円筒状基材1を傷つける事なく、また性質の
異なる層を多層形成させる場合においても、既に塗布さ
れた層を損傷することなく塗布できる。
As shown in FIG. 4, a plurality of cylindrical base materials 1A and 1B (hereinafter, referred to as cylindrical base material 1) vertically stacked along the center line ZZ are continuously stacked and the periphery thereof is stacked. The slide hopper type annular coating means 20 is vertically driven to be lowered with respect to the outer peripheral surface of the cylindrical substrate 1, and the coating liquid (photosensitive liquid) L is supplied by the hopper coating surface 21 which is a portion directly related to coating. Apply. The cylindrical substrate 1 may be a hollow drum, for example, an aluminum drum, a plastic drum, or a seamless belt type substrate. On the hopper coating surface 21, a narrow coating liquid distribution slit (abbreviated as slit) 23 having a coating liquid outlet 22 opening to the side of the cylindrical substrate 1 is formed in the horizontal direction. The slit 23 communicates with an annular coating liquid distribution chamber (coating liquid reservoir chamber) 24, and the annular coating liquid distribution chamber 2
4, the coating liquid L in the storage tank 2 is supplied by the pressure feed pump 3 via the supply pipe 4. On the other hand, below the coating liquid outlet 22 of the slit 23, a coating liquid slide formed so as to continuously incline downward and terminate at a dimension slightly larger than the outer diameter dimension of the cylindrical substrate 1. A surface (hereinafter referred to as a slide surface) 25 is formed. Further, the lip portion 2 extending downward from the end of the slide surface 25.
6 are formed. In the application by the annular application means 20, the cylindrical base material 1 is fixed and the annular application means 2 is applied.
When the coating liquid L is pushed out from the slit 23 and made to flow down along the slide surface 25 in the process of lowering 0, the coating liquid reaching the end of the slide surface 25 will move to the slide surface 25.
After forming a bead between the end of the cylindrical base material and the outer peripheral surface of the cylindrical base material 1, it is applied to the surface of the cylindrical base material 1. Slide surface 2
Since the end of 5 and the cylindrical base material 1 are arranged with a certain gap, the cylindrical base material 1 is not damaged, and even when forming multiple layers having different properties, the already applied layer is Can be applied without damage.

【0033】一方、前記圧送ポンプ3の塗布液供給部よ
り最も遠い位置で、前記塗布液分配室24の一部には、
塗布液分配室24内の泡抜き用の空気抜き部材26が設
けられている。貯留タンク2内の塗布液Lが塗布液分配
室24に供給されて塗布液分配スリット23から塗布液
流出口22に供給されるとき、開閉弁27を開いて空気
抜き部材28より塗布液分配室24内の空気を排出す
る。
On the other hand, at a position farthest from the coating liquid supply portion of the pressure feed pump 3, a part of the coating liquid distribution chamber 24 is
An air vent member 26 for removing bubbles in the coating liquid distribution chamber 24 is provided. When the coating liquid L in the storage tank 2 is supplied to the coating liquid distribution chamber 24 and supplied from the coating liquid distribution slit 23 to the coating liquid outlet 22, the opening / closing valve 27 is opened and the coating liquid distribution chamber 24 is opened by the air bleeding member 28. Exhaust the air inside.

【0034】前記環状塗布手段20の下部には、円筒状
基材の円周方向を位置決めする位置決め手段50が固定
されている。前記円筒状基材1の位置決め手段50の本
体51には、複数の給気口52と、複数の排気口53が
穿設されている。該複数の給気口52は、図示しない給
気ポンプに接続され、空気等の流体が圧送される。該給
気口52の一端部で円筒状基材1の外周面に対向する側
には、吐出口54が貫通している。該吐出口54は前記
円筒状基材1の外周面と所定の間隙を保って対向してい
る。該間隙は、20μm〜3mm、好ましくは30μm
〜2mmである。この間隙が20μmより小さいと、円
筒状基材1の僅かな振れで本体51の内壁に接触して円
筒状基材1を傷つけやすい。また、この間隙が3mmよ
り大であると、円筒状基材1の位置決め精度が低下す
る。前記吐出口54は直径0.01〜1.0mmの小口
径のノズルであり、好ましくは0.05〜0.5mmが
良い。
Positioning means 50 for positioning the cylindrical substrate in the circumferential direction is fixed to the lower part of the annular coating means 20. A plurality of air supply ports 52 and a plurality of exhaust ports 53 are formed in the main body 51 of the positioning means 50 for the cylindrical substrate 1. The plurality of air supply ports 52 are connected to an air supply pump (not shown), and a fluid such as air is pressure-fed. A discharge port 54 penetrates through the one end of the air supply port 52 that faces the outer peripheral surface of the cylindrical substrate 1. The discharge port 54 faces the outer peripheral surface of the cylindrical substrate 1 with a predetermined gap. The gap is 20 μm to 3 mm, preferably 30 μm
~ 2 mm. If this gap is smaller than 20 μm, the cylindrical base material 1 is likely to be damaged by contacting the inner wall of the main body 51 with a slight swing of the cylindrical base material 1. Further, if the gap is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 is reduced. The discharge port 54 is a small diameter nozzle having a diameter of 0.01 to 1.0 mm, preferably 0.05 to 0.5 mm.

【0035】前記本体51の内壁下部の内周面は、入り
口側が広がったテーパー面55になっている。このテー
パー面55は、例えば軸方向の長さが50mmで、片側
傾斜角が0.5mmの円錐面である。このテーパー面5
5を設けることにより、円筒状基材1が本体51の内壁
に進入するとき、円筒状基材1の先端部が内壁の内周面
に接触することを防止している。
The inner peripheral surface of the lower part of the inner wall of the main body 51 is a tapered surface 55 that widens on the inlet side. The tapered surface 55 is, for example, a conical surface having an axial length of 50 mm and a one-sided inclination angle of 0.5 mm. This taper surface 5
By providing 5, the front end of the cylindrical base material 1 is prevented from coming into contact with the inner peripheral surface of the inner wall when the cylindrical base material 1 enters the inner wall of the main body 51.

【0036】前記給気ポンプから圧送された流体は、複
数の給気口52から本体51の内部に導入されて、複数
の吐出口54から吐出され、前記円筒状基材1A(1
B)の外周面と均一な流体膜層を形成する。吐出後の流
体は複数の排気口53から装置外に排出される。
The fluid pumped from the air supply pump is introduced into the main body 51 through the plurality of air supply ports 52 and discharged through the plurality of discharge ports 54, and the cylindrical substrate 1A (1
A uniform fluid film layer is formed on the outer peripheral surface of B). The discharged fluid is discharged to the outside of the apparatus through the plurality of exhaust ports 53.

【0037】前記吐出口54の開口直径は0.01〜1
mm、好ましくは0.05〜0.5mm、例えば0.2
〜0.5mmの円形に形成されている。排気口53の開
口直径は1.0〜10mm、好ましくは2.0〜8.0
mm、例えば3〜5mmの円形に形成されている。
The opening diameter of the discharge port 54 is 0.01-1.
mm, preferably 0.05-0.5 mm, for example 0.2
It is formed in a circular shape of about 0.5 mm. The opening diameter of the exhaust port 53 is 1.0 to 10 mm, preferably 2.0 to 8.0.
mm, for example, 3 to 5 mm.

【0038】前記給気口53に供給される流体は、空
気、不活性ガス例えば窒素ガスが良い。そして該流体
は、JIS規格でクラス100以上の清浄な気体が良
い。
The fluid supplied to the air supply port 53 is preferably air or an inert gas such as nitrogen gas. The fluid is preferably a clean gas of class 100 or more according to JIS.

【0039】なお、位置決め手段50に接続される環状
塗布装置としては、スライドホッパー型、押し出し型、
リングコーター等の各種装置が用いられる。
As the annular coating device connected to the positioning means 50, a slide hopper type, an extrusion type,
Various devices such as a ring coater are used.

【0040】前記環状塗布手段20の上方には、乾燥調
整器(乾燥フード)31と乾燥器(例えばリング式吸引
乾燥器)32とから成る乾燥手段30が設けられている
(実施例1)。また、実施例2では乾燥調整器(乾燥フ
ード)31と乾燥器(例えばリング式吸引乾燥器)32
と、第2の乾燥器(リング式加熱乾燥器)33とから成
る乾燥手段30が設けられている。第2の乾燥機33は
リング状のヒーターを内蔵し、円筒状基材1の表面に塗
布された塗布液を加熱して蒸発乾燥させる。
Above the annular coating means 20, there is provided a drying means 30 comprising a drying conditioner (drying hood) 31 and a drying machine (for example, a ring type suction dryer) 32 (Example 1). Further, in the second embodiment, a drying conditioner (drying hood) 31 and a drier (for example, a ring suction drier) 32
And a second dryer (ring-type heating dryer) 33 are provided. The second dryer 33 has a ring-shaped heater built therein and heats the coating liquid applied to the surface of the cylindrical substrate 1 to evaporate and dry it.

【0041】図6は前記環状塗布手段20と該塗布手段
20の上部に設けた乾燥フード31の断面図である。該
乾燥フード31は環状の壁面を有し、該壁面には多数の
開口31Aが穿設されている。前記環状塗布手段20を
矢示方向に下降させ、前記塗布手段20のホッパー塗布
面(塗布ヘッド)21で塗布液を塗布し、感光層5を形
成する。円筒状基材1上に形成された感光層5は前記乾
燥フード31内を通過しながら徐々に乾燥される。この
乾燥は前記多数の開口31Aより塗布液に含まれている
溶媒の蒸気を壁面外に発散させることにより行われる。
前記のように、塗布手段20により円筒状基材1上に塗
布液を塗布することにより、形成された感光層5は、塗
布直後において乾燥フード31により包囲されており、
開口31Aからのみ溶媒が放出されるため、塗布直後に
おける感光層5の乾燥速度は、前記開口31Aの開口面
積にほぼ比例する。
FIG. 6 is a sectional view of the annular coating means 20 and the drying hood 31 provided on the coating means 20. The dry hood 31 has an annular wall surface, and a large number of openings 31A are formed in the wall surface. The annular coating means 20 is lowered in the direction of the arrow, and the hopper coating surface (coating head) 21 of the coating means 20 coats the coating liquid to form the photosensitive layer 5. The photosensitive layer 5 formed on the cylindrical substrate 1 is gradually dried while passing through the drying hood 31. This drying is performed by letting the vapor of the solvent contained in the coating liquid out of the wall surface through the large number of openings 31A.
As described above, the photosensitive layer 5 formed by coating the coating liquid on the cylindrical substrate 1 by the coating means 20 is surrounded by the dry hood 31 immediately after coating,
Since the solvent is released only from the opening 31A, the drying speed of the photosensitive layer 5 immediately after coating is almost proportional to the opening area of the opening 31A.

【0042】図7は乾燥フードの他の実施例と環状塗布
手段20とを示す断面図である。この乾燥フード34は
前記図6における乾燥フード31の上部を延長してA部
とB部を形成したものである。このA部には複数個の開
口34Aが、B部には複数個の開口34Bがそれぞれ穿
設されている。この乾燥フード34を環状塗布手段20
の上部に設けることにより、円筒状基材1の外周面上に
塗布された塗布液Lの溶媒蒸気濃度が制御される。従っ
て塗膜乾燥速度が制御されることで塗膜の均一化を計る
ことが可能である。また上記のような乾燥フード34を
設けることで、ビード部分の溶媒蒸気濃度が高くなるた
め、急速な乾燥が防止され、ビード切れを防止できる。
FIG. 7 is a sectional view showing another embodiment of the drying hood and the annular coating means 20. The drying hood 34 is formed by extending the upper portion of the drying hood 31 shown in FIG. 6 to form a portion A and a portion B. A plurality of openings 34A are formed in the A portion, and a plurality of openings 34B are formed in the B portion. The dry hood 34 is applied to the annular coating means 20.
The solvent vapor concentration of the coating liquid L applied on the outer peripheral surface of the cylindrical base material 1 is controlled by being provided on the upper part of the. Therefore, by controlling the coating film drying speed, it is possible to make the coating film uniform. Further, by providing the drying hood 34 as described above, the concentration of the solvent vapor in the bead portion is increased, so that rapid drying is prevented and bead breakage can be prevented.

【0043】図8に本発明の乾燥器32の断面図を示
す。乾燥器32は吸引スリット321、吸引チャンバー
322、吸引ノズル323を有する吸引スリット部材3
24の下部に筒状部材325、上部に筒状部材326が
それぞれ同心に結合されている。
FIG. 8 shows a sectional view of the dryer 32 of the present invention. The dryer 32 includes a suction slit member 32, a suction chamber 322, and a suction slit member 3 having a suction nozzle 323.
A tubular member 325 is concentrically connected to the lower portion of 24 and a tubular member 326 is concentrically connected to the upper portion thereof.

【0044】そして、複数設けられた吸引ノズル323
から吸引を行ない、周方向均一な吸引チャンバー32
2、周方向均一な吸引スリット321により周方向の均
一化がなされた吸引エアーが流れ、更に、吸引スリット
部材324、その上下の筒状部材326,325の各内
径面と塗布済みの円筒状基材1の外周面との間の空気流
の乱れをバッファー空間327で極く僅かにおさえて、
328に示す乾燥の為の均一吸引エアーの空気流を作り
出している。
A plurality of suction nozzles 323 are provided.
Suction chamber 32 that suctions from the inside and is uniform in the circumferential direction
2. Suction air uniformed in the circumferential direction by the circumferentially uniform suction slit 321 flows, and further, the suction slit member 324, each inner diameter surface of the upper and lower cylindrical members 326 and 325, and the coated cylindrical base. The turbulence of the air flow between the outer peripheral surface of the material 1 is suppressed very slightly in the buffer space 327,
An air flow of uniform suction air for drying shown in 328 is created.

【0045】この乾燥ゾーンに矢印で示す方向に塗布済
の円筒状基材1を搬送することにより、塗布膜の乾燥を
行うものである。
The coated film is dried by transporting the coated cylindrical substrate 1 to the drying zone in the direction indicated by the arrow.

【0046】次に、乾燥手段30の他の実施例として、
図9に示された強制排気乾燥器36について説明する。
前記のように円筒状基体1A、1Bに環状塗布手段20
にて塗布液(感光液)Lが塗布されて感光層5が形成さ
れる。前記強制排気乾燥器36は塗布した直後の感光層
5より蒸発する溶媒を吸引し、更に乾燥を行うもので、
前記環状塗布手段20の直上に設けられている。361
は環状に形成された吸引ダクトで、該吸引ダクト361
より前記感光層5に向けて吸引口362が形成されてい
る。前記吸引ダクト361の一部には排気管363が接
続され、該排気管363内に設けた排気ファン364に
より前記感光層5より蒸発する溶媒を吸引して、強制的
に外部に排出し乾燥させる。前記のように環状塗布手段
20にて感光液Lを塗布した直後に、該感光液Lより発
生する溶媒蒸気を排気するため円筒状基体1A、1Bに
塗布された感光液Lが多量に流下するのを停止させるこ
とができる。その際前記排気ファン364による排気風
速を0.5〜5m/secで行い、前記吸引口362は
前記塗布ヘッド21の位置より300mm以下が望まし
い。そして前記感光液L内の溶媒が30%以上蒸発する
まで前記円筒状基体1A、1Bを連結状態に保ち、分離
した後、感光層5を完全に乾燥させる。前記のような強
制排気乾燥器36を作動させることにより、多数の円筒
状基体1を接続して感光液Lを塗布した場合でも感光層
5の近傍より溶媒を急速に排出出来ると共に、感光液L
による塗膜の流下を強制的に制御して感光層5に発生す
る前記薄膜や液溜りの発生を防止する事も出来る。尚、
前記排気ファン364は、吸引ダクト361に複数箇所
設けてもよい。
Next, as another embodiment of the drying means 30,
The forced exhaust dryer 36 shown in FIG. 9 will be described.
As described above, the annular coating means 20 is attached to the cylindrical substrates 1A and 1B.
Then, the coating liquid (photosensitive liquid) L is applied to form the photosensitive layer 5. The forced exhaust drier 36 sucks the solvent that evaporates from the photosensitive layer 5 immediately after coating and further dries,
It is provided directly above the annular coating means 20. 361
Is a suction duct formed in an annular shape, and the suction duct 361
A suction port 362 is formed further toward the photosensitive layer 5. An exhaust pipe 363 is connected to a part of the suction duct 361, and a solvent evaporating from the photosensitive layer 5 is sucked by an exhaust fan 364 provided in the exhaust pipe 363, forcibly discharged to the outside and dried. . Immediately after the photosensitive solution L is applied by the annular applying means 20 as described above, a large amount of the photosensitive solution L applied to the cylindrical substrates 1A and 1B flows down in order to exhaust the solvent vapor generated from the photosensitive solution L. Can be stopped. At that time, it is preferable that the exhaust air velocity by the exhaust fan 364 is 0.5 to 5 m / sec, and the suction port 362 is 300 mm or less from the position of the coating head 21. Then, the cylindrical substrates 1A and 1B are kept in a connected state until the solvent in the photosensitive liquid L is evaporated by 30% or more, and after separation, the photosensitive layer 5 is completely dried. By operating the forced exhaust dryer 36 as described above, even when a large number of cylindrical substrates 1 are connected and the photosensitive liquid L is applied, the solvent can be rapidly discharged from the vicinity of the photosensitive layer 5 and the photosensitive liquid L can be discharged.
It is also possible to forcibly control the flow-down of the coating film by the above method to prevent the above-mentioned thin film or liquid pool generated in the photosensitive layer 5. still,
The exhaust fan 364 may be provided at a plurality of locations in the suction duct 361.

【0047】次に、具体的な実施例により本発明を説明
するが、本発明はこれに限定されるものではない。
Next, the present invention will be described with reference to specific examples, but the present invention is not limited thereto.

【0048】実施例1 導電性支持体(円筒状基材)1としては鏡面加工を施し
た直径80mm、高さ355mm、283gのアルミニ
ウムドラム支持体を用いた。又塗布液Lとしては下記記
載のUCL−1塗布液組成物を用い、乾燥膜厚3.0
μmになるように塗布した。
Example 1 As the conductive support (cylindrical base material) 1, a mirror-finished aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g was used. As the coating liquid L, the UCL-1 coating liquid composition described below was used, and the dry film thickness was 3.0.
It was applied to a thickness of μm.

【0049】UCL−1塗布液組成物(4.0W/V
%ポリマ−濃度) 共重合ナイロン樹脂(CM−8000 東レ社製) メタノール/n−ブタノール=10/1(Vol比) 塗布装置を前記図1に示す。
UCL-1 coating liquid composition (4.0 W / V
% Polymer concentration) Copolymerized nylon resin (CM-8000, manufactured by Toray Industries, Inc.) Methanol / n-butanol = 10/1 (Vol ratio) The coating device is shown in FIG.

【0050】円筒状基材(1A〜1G)7本はあらかじ
め段差がないよう下部スペサードラム41上に積み重ね
られ、上部には上部スペーサードラム42が設置されて
いる。下部及び上部スペサードラム41,42は外方よ
り把持され円筒状基材1を固定している。リング式吸引
乾燥器32及び乾燥フード31からなる乾燥手段30と
コーターとは1つの組になっており、上方より下方に下
降しながら塗布、乾燥される。この間ドラムは動かない
ため振動による塗布ムラは発生しない。
Seven cylindrical substrates (1A to 1G) are stacked in advance on the lower spacer drum 41 so that there is no step, and an upper spacer drum 42 is installed on the upper portion. The lower and upper spacer drums 41, 42 are gripped from the outside to fix the cylindrical substrate 1. The drying means 30 including the ring-type suction dryer 32 and the drying hood 31 and the coater form one set, and are applied and dried while descending downward from above. During this period, the drum does not move, so that uneven coating due to vibration does not occur.

【0051】本実施例1では、図6に示されるA−1タ
イプ(全長100mm、穴径3.4mm)乾燥フード3
1と、図8に示されるB−1タイプ(全長600mm)
リング式吸引乾燥器32とを使用した。なお比較例とし
て本発明の乾燥調整器31、乾燥器32とから成る乾燥
手段30を用いないもので塗布乾燥を行った。結果を表
1に示す。
In the first embodiment, the A-1 type (total length 100 mm, hole diameter 3.4 mm) dry hood 3 shown in FIG. 6 is used.
1 and B-1 type shown in FIG. 8 (total length 600 mm)
A ring suction dryer 32 was used. As a comparative example, application and drying were performed without using the drying means 30 including the drying adjuster 31 and the drier 32 of the present invention. The results are shown in Table 1.

【0052】[0052]

【表1】 [Table 1]

【0053】表1に示す如く膜厚ムラ、液タレ等の塗膜
欠陥がなく、塗布性の良好な塗布済み円筒状基材が得ら
れた。
As shown in Table 1, there was no coating film defect such as film thickness unevenness or liquid sagging, and a coated cylindrical substrate having good coatability was obtained.

【0054】実施例2 円筒状基材1として鏡面加工を施した直径80mm、高
さ355mm、283gのアルミニウムドラム支持体を
用いた。塗布液Lとしては下記の如く各々塗布液組成物
UCL−1、CGL−2及びCTL−1を調整
し、スライドホッパ−型環状塗布手段20にて図3に示
す塗布装置に従い各層それぞれ乾燥膜厚0.8μm、
2.1μm及び23μmになるように3層の逐次重層塗
布、乾燥を行った。60は供給手段を示す。円筒状基材
1は図示されていない供給ロボットにより円筒状基材収
納室より回転テーブル62上にある円筒状基材1Hの位
置に置かれる。円筒状基材1Hは回転テーブル62の回
転により1Gの位置に達する。この時、押し上げ手段6
4が下方より上方へ円筒状基材1Gを押し上げ、下部把
持部材43の搬送ハンド位置まで供給される。好ましく
は押し上げ手段64による押し上げが完了する時、緩衝
機構が作用し、上下の円筒状基材1F,1G間の接合時
のショックを無くするのが良い。このようにして円筒状
基材1Gが円筒状基材1Fまで運び込まれる。このよう
にして図3の如く7本の円筒状基材が段差無しに積み重
ねられる。
Example 2 As the cylindrical substrate 1, an aluminum drum support having a diameter of 80 mm, a height of 355 mm, and 283 g, which was mirror-finished, was used. As the coating liquid L, coating liquid compositions UCL-1, CGL-2 and CTL-1 were prepared as described below, and each layer was dried by a slide hopper-type annular coating means 20 according to the coating apparatus shown in FIG. 0.8 μm,
Sequential multilayer coating of three layers and drying were performed so as to have a thickness of 2.1 μm and 23 μm. Reference numeral 60 represents a supply means. The cylindrical base material 1 is placed at the position of the cylindrical base material 1H on the rotary table 62 from the cylindrical base material storage chamber by a supply robot (not shown). The cylindrical substrate 1H reaches the position of 1G by the rotation of the rotary table 62. At this time, the pushing-up means 6
4 pushes up the cylindrical base material 1G from the lower side to the upper side, and is supplied to the position of the transport hand of the lower grip member 43. Preferably, when the pushing-up by the pushing-up means 64 is completed, the cushioning mechanism acts to eliminate the shock at the time of joining the upper and lower cylindrical substrates 1F and 1G. In this way, the cylindrical substrate 1G is carried to the cylindrical substrate 1F. In this way, as shown in FIG. 3, seven cylindrical substrates are stacked without any step.

【0055】リング式加熱乾燥器33、リング式吸引乾
燥器32及び乾燥フ−ド31からなる乾燥手段30とコ
ーターとは1つの組になっており、上方より下方に下降
しながら塗布、乾燥される。20はコーターすなわち垂
直型環状塗布手段であり、スライドホッパー型押し
出し型リングコーター型スプレーコーター型等円筒
状基材を積み重ねて上方又は下方に相対的に移動する事
により塗布するものであれば種類を問わないが、信頼性
の高い連続安定塗布が得られる事によりのスライドホ
ッパー型コーターが好ましく、例えば特開昭58−18
9061号公報に詳しい。このようにして正確に位置決
めされた円筒状基材は垂直型環状塗布手段20により塗
布される。
The drying means 30 comprising the ring type heating / drying device 33, the ring type suction / drying device 32, and the drying hood 31 and the coater form one set, and are coated and dried while descending from above to below. It Reference numeral 20 is a coater, that is, a vertical annular coating means, and any type of coating is possible as long as cylindrical base materials such as slide hopper type extrusion type ring coater type spray coater type are stacked and relatively moved upward or downward. Although it does not matter, a slide hopper type coater is preferable because it is possible to obtain a highly reliable continuous stable coating, for example, JP-A-58-18.
9061. The cylindrical base material accurately positioned in this manner is applied by the vertical annular applying means 20.

【0056】塗布され乾燥された円筒状基材は上方にあ
る分離排出手段70により排出される。分離手段70と
しては特開平7−43917号公報に詳しく述べられて
いるものが良い。別のものとしては特開昭61−120
662号、同61−120664号公報等も良い。分離
された円筒状基材は排出ロボットにより本乾燥室、収納
室、あるいは次の工程に移行される。
The coated and dried cylindrical substrate is discharged by the separating and discharging means 70 located above. As the separating means 70, the one described in detail in JP-A-7-43917 is preferable. Another example is JP-A-61-120.
Nos. 662 and 61-120664 are also good. The separated cylindrical substrate is transferred to the main drying chamber, the storage chamber, or the next step by the discharge robot.

【0057】なお比較例として本発明の乾燥器、乾燥調
節器を用いないもので塗布、乾燥を行った。使用した乾
燥フ−ド、吸引リング式乾燥器は実施例1と同じであ
る。結果を表2に示す。
As a comparative example, coating and drying were carried out without using the dryer of the present invention and the drying controller. The drying hood and suction ring type dryer used are the same as in Example 1. Table 2 shows the results.

【0058】[0058]

【表2】 [Table 2]

【0059】 UCL−1塗布液組成物(4.0W/V% ポリマー濃度) 共重合ナイロン樹脂(CM−8000 東レ社製) メタノール/n−ブタノール=10/1(Vol比) CGL−2塗布液組成物 ペリレン顔料(CGM−2) 150g ブチラール樹脂(エスレックBX−L 積水化学社製) 75g メチルエチルケトン 8l 上記塗布液組成物(固形分については固形分重量比CG
M−2:BX−L=2:1に固定)をサンサミルを用い
て20時間分散したもの。
UCL-1 coating liquid composition (4.0 W / V% polymer concentration) Copolymer nylon resin (CM-8000 Toray Co.) Methanol / n-butanol = 10/1 (Vol ratio) CGL-2 coating liquid Composition Perylene pigment (CGM-2) 150 g Butyral resin (S-REC BX-L Sekisui Chemical Co., Ltd.) 75 g Methyl ethyl ketone 8 l The above coating liquid composition (solid content weight ratio CG for solid content)
(M-2: BX-L = fixed at 2: 1) dispersed using Sansamil for 20 hours.

【0060】 CTL−1塗布液組成物 CTM−1 5kg ポリカーボネート(Z−200 三菱瓦斯化学社製) 5.6kg 1,2−ジクロロエタン 28l 固形分については固形分重量比CTM−1:Z−200
=0.89:1に固定
CTL-1 coating liquid composition CTM-1 5 kg Polycarbonate (Z-200 manufactured by Mitsubishi Gas Chemical Co., Inc.) 5.6 kg 1,2-dichloroethane 28 l Solid content weight ratio CTM-1: Z-200 for solid content.
= 0.89: 1 fixed

【0061】[0061]

【化1】 Embedded image

【0062】[0062]

【化2】 Embedded image

【0063】表2に示す如く塗布ムラ、膜厚ムラ、色ム
ラ、液タレ、色流れ等の塗膜欠陥がなく、塗布性の良好
な塗布ドラムが得られた。
As shown in Table 2, there were no coating defects such as coating unevenness, film thickness unevenness, color unevenness, liquid sag, and color flow, and a coating drum having good coatability was obtained.

【0064】得られた感光体No.2−1をコニカ社製
U−BIX 3035複写機で実写したところ濃淡ム
ラ、カブリムラやゴミ等に起因する画像欠陥(黒ポチ、
白ポチ、ゴミ、スジ)等がなく、良好な画像が得られ
た。比較例感光体については画像ムラがひどく評価の対
象とならなかった。
The obtained photoreceptor No. 2-1 was actually photographed with a U-MIX 3035 copying machine manufactured by Konica Corporation, and image defects (black spots, black spots, etc.) caused by uneven shading, fog unevenness, dust, etc.
A good image was obtained without white spots, dust, streaks, etc. The image unevenness was not seriously evaluated for the comparative photoconductor.

【0065】[0065]

【発明の効果】本発明の第1発明の連続塗布装置及び第
2発明の連続塗布方法によるときは、円筒状基材の供
給、把持搬送、位置決め、塗布、乾燥、分離排出の各手
段を連続配置して、上記手段の各工程を連続処理するこ
とを可能にするもであるから、円筒状基材上に形成さ
れた塗膜が均一であり、塗布ムラや塗膜欠陥がなく塗布
性が良好である、円筒状基材の把持搬送性能をが高
く、長期安定塗布ができる、円筒状基材の変形や損傷
を受けることなく確実に保持できる、連続安定生産が
可能となり、生産性が向上した、連続かつ完全自動化
が達成されたからゴミやほこり等の異物が混入せず高品
質な製品が得られる。
According to the continuous coating apparatus of the first aspect of the invention and the continuous coating method of the second aspect of the invention, the means for supplying, gripping, conveying, positioning, coating, drying and separating and discharging the cylindrical substrate are continuously connected. By arranging, it is also possible to continuously process each step of the above means, the coating film formed on the cylindrical substrate is uniform, coating unevenness and coating defects without coating defects Good, high gripping and conveying performance of cylindrical base material, long-term stable coating, reliable holding without deformation or damage of cylindrical base material, continuous stable production possible, productivity improved In addition, since continuous and completely automated processing has been achieved, high quality products can be obtained without the inclusion of foreign matter such as dust and dirt.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による一実施例としての塗布装置の全体
構成を示す正面図。
FIG. 1 is a front view showing the overall configuration of a coating apparatus as an embodiment according to the present invention.

【図2】上記塗布装置の要部斜視図。FIG. 2 is a perspective view of a main part of the coating device.

【図3】本発明による塗布装置の他の実施例を示す正面
図。
FIG. 3 is a front view showing another embodiment of the coating apparatus according to the present invention.

【図4】位置決め手段と塗布手段とを示す断面図。FIG. 4 is a sectional view showing a positioning unit and a coating unit.

【図5】上記塗布手段の斜視図。FIG. 5 is a perspective view of the application unit.

【図6】上記塗布手段と乾燥フードとを示す断面図。FIG. 6 is a sectional view showing the application unit and a drying hood.

【図7】乾燥フードの他の実施例を示す断面図。FIG. 7 is a sectional view showing another embodiment of the drying hood.

【図8】リング式吸引乾燥器の断面図。FIG. 8 is a sectional view of a ring suction dryer.

【図9】乾燥手段の他の実施例としての強制排気乾燥装
置の断面図。
FIG. 9 is a sectional view of a forced-exhaust dryer as another embodiment of the drying means.

【符号の説明】[Explanation of symbols]

1,1A〜1H 円筒状基材(円筒状ドラム、導電性支
持体) 5 感光層 10A,10B 装置本体 11A,11B ボールねじ 13 昇降部材 20 環状塗布手段(コーター) 30 乾燥手段 31,34 乾燥調整器(乾燥フード) 32,35 乾燥器(リング式吸引乾燥器) 33 第2の乾燥器(リング式加熱乾燥器) 36 強制排気乾燥器 41 下部スペーサードラム 42 上部スペーサードラム 43 下部把持部材 44 上部把持部材 50 位置決め手段 60 供給手段 61 保持部材 62 回転テーブル 64 押し上げ手段 70 分離排出手段 L 塗布液(感光液)
1, 1A to 1H Cylindrical substrate (cylindrical drum, conductive support) 5 Photosensitive layer 10A, 10B Device body 11A, 11B Ball screw 13 Elevating member 20 Annular coating means (coater) 30 Drying means 31, 34 Drying adjustment Dryer (drying hood) 32, 35 Dryer (ring-type suction dryer) 33 Second dryer (ring-type heating dryer) 36 Forced exhaust dryer 41 Lower spacer drum 42 Upper spacer drum 43 Lower gripping member 44 Upper grip Member 50 Positioning means 60 Supplying means 61 Holding member 62 Rotating table 64 Pushing up means 70 Separating and discharging means L Coating liquid (photosensitive liquid)

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 複数の円筒状基材の筒軸を垂直方向に合
致させて積み重ねた円筒状基材群を固定台上に設置し、
該円筒状基材群の外周面を環状塗布手段の塗布液吐出口
を有する環状内径部の内方に貫通させ、前記環状塗布手
段を垂直方向に下降させながら、前記円筒状基材の外周
面上に塗布液を連続的に塗布する円筒状基材の塗布装置
に、前記円筒状基材上に塗布された塗布液の蒸発乾燥を
調整する乾燥調整器と該塗布液を強制乾燥する乾燥器と
から成る乾燥手段を一体に設けたことを特徴とする円筒
状基材の塗布装置。
1. A cylindrical base material group obtained by stacking a plurality of cylindrical base materials by aligning the cylinder axes of the plurality of cylindrical base materials in the vertical direction is set on a fixed base,
The outer peripheral surface of the cylindrical base material is penetrated inwardly of the annular inner diameter portion having the coating solution discharge port of the annular coating means, and the outer peripheral surface of the cylindrical base material is lowered vertically in the annular coating means. A coating device for a cylindrical base material that continuously coats a coating liquid on the top, a drying controller that adjusts evaporation drying of the coating liquid coated on the cylindrical base material, and a dryer that forcibly dries the coating liquid. An apparatus for coating a cylindrical substrate, characterized in that a drying means consisting of (1) and (2) is integrally provided.
【請求項2】 前記環状塗布手段が、スライドホッパー
型塗布装置であることを特徴とする請求項1記載の円筒
状基材の塗布装置。
2. The apparatus for coating a cylindrical substrate according to claim 1, wherein the annular coating means is a slide hopper type coating apparatus.
【請求項3】 前記乾燥器が、リング式吸引乾燥器およ
びリング式加熱乾燥器であることを特徴とする請求項1
記載の円筒状基材の塗布装置。
3. The dryer according to claim 1, wherein the dryer is a ring suction dryer and a ring heating dryer.
A coating device for a cylindrical substrate as described.
【請求項4】 複数の円筒状基材の筒軸を垂直方向に合
致させて積み重ねた円筒状基材群を固定台上に設置し、
該円筒状基材群の外周面を環状塗布手段の塗布液吐出口
を有する環状内径部の内方に貫通させ、前記環状塗布手
段を垂直方向に下降させながら、前記円筒状基材の外周
面上に塗布液を連続的に塗布する円筒状基材の塗布方法
にであって、前記円筒状基材上に塗布された塗布液の蒸
発乾燥を調整する乾燥調整器と該塗布液を強制乾燥する
乾燥器とから成る乾燥手段を一体に設けた塗布手段によ
り塗布、乾燥することを特徴とする円筒状基材の塗布方
法。
4. A cylindrical base material group, which is obtained by stacking a plurality of cylindrical base materials by aligning the cylinder axes of the cylindrical base materials in the vertical direction, is set on a fixed base,
The outer peripheral surface of the cylindrical base material is penetrated inwardly of the annular inner diameter portion having the coating liquid discharge port of the annular coating means, and the outer peripheral surface of the cylindrical base material is lowered vertically in the annular coating means. A method for coating a cylindrical base material, wherein a coating liquid is continuously applied onto the coating liquid, wherein a drying controller for adjusting evaporation and drying of the coating liquid applied on the cylindrical base material and forced drying of the coating liquid. A coating method for a cylindrical base material, which comprises coating and drying by a coating means integrally provided with a drying means.
JP7214692A 1995-08-23 1995-08-23 Applicator for cylindrical base material and coating method Pending JPH0957171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7214692A JPH0957171A (en) 1995-08-23 1995-08-23 Applicator for cylindrical base material and coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7214692A JPH0957171A (en) 1995-08-23 1995-08-23 Applicator for cylindrical base material and coating method

Publications (1)

Publication Number Publication Date
JPH0957171A true JPH0957171A (en) 1997-03-04

Family

ID=16660026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7214692A Pending JPH0957171A (en) 1995-08-23 1995-08-23 Applicator for cylindrical base material and coating method

Country Status (1)

Country Link
JP (1) JPH0957171A (en)

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