JP2005331987A - Method for drying cylindrical base, and drying device for the same - Google Patents

Method for drying cylindrical base, and drying device for the same Download PDF

Info

Publication number
JP2005331987A
JP2005331987A JP2005227778A JP2005227778A JP2005331987A JP 2005331987 A JP2005331987 A JP 2005331987A JP 2005227778 A JP2005227778 A JP 2005227778A JP 2005227778 A JP2005227778 A JP 2005227778A JP 2005331987 A JP2005331987 A JP 2005331987A
Authority
JP
Japan
Prior art keywords
cylindrical
coating
base material
cylindrical base
coating liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005227778A
Other languages
Japanese (ja)
Other versions
JP4129597B2 (en
Inventor
Akira Ohira
晃 大平
Nobuaki Kobayashi
信昭 小林
Junji Ujihara
淳二 氏原
Masanari Asano
真生 浅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP2005227778A priority Critical patent/JP4129597B2/en
Publication of JP2005331987A publication Critical patent/JP2005331987A/en
Application granted granted Critical
Publication of JP4129597B2 publication Critical patent/JP4129597B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To provide a superior coating application method which eliminates fluctuations in the film thickness of a coating film of a cylindrical base, and to provide a coating applicator for the same. <P>SOLUTION: The coating application method comprises supplying a coating liquid from the inlet aperture of a coating liquid distribution slit forming an annular slit for distributing the coating liquid; making the coating liquid to flow out of an outlet aperture of the liquid distribution slit disposed inside the inlet aperture; making the coating liquid to flow out onto a hopper face inclining to a lower side inside the outlet aperture and extending up to an annular end in proximity to the outer peripheral surface of the cylindrical base; continuously supplying the coating liquid between the outer peripheral surface of the cylindrical base and the annular end of the hopper face; and forming a coating film, by applying the coating liquid to the outer peripheral surface of the cylindrical base. The coating application method, comprising passing of the coating liquid to the annular end of the hopper face satisfies the condition: 1.0<HRD<10, when the roundness at the annular end of the hopper surface is defined as HRD (μm). <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は円筒状基材(感光体ドラムともいう)の乾燥方法及び円筒状基材の乾燥装置に関する。さらに詳しくは、塗布膜を外周面に塗布された円筒状基材を外周にリング状の周方向均一の吸引部材を同心に設け、筒状部材の挿入開口部より挿入し、前記円筒状基材の挿入時に前記円筒状基材面と同心の前記筒状部材の内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる円筒状基材の乾燥方法及び装置に関する。このような乾燥方法、その装置は、例えば電子写真装置用の感光体ドラムの製造に際して好適に利用される。   The present invention relates to a method for drying a cylindrical substrate (also referred to as a photosensitive drum) and a cylindrical substrate drying apparatus. More specifically, a cylindrical base material coated with a coating film on the outer peripheral surface is provided with a ring-shaped circumferentially uniform suction member concentrically on the outer periphery and inserted from an insertion opening of the cylindrical member. The present invention relates to a drying method and apparatus for a cylindrical base material that sucks a gap portion between the cylindrical base material surface and the inner surface of the cylindrical member concentrically when the air is inserted to generate an air flow and promotes drying of a coating film. Such a drying method and its apparatus are preferably used in the production of a photosensitive drum for an electrophotographic apparatus, for example.

塗布直後の円筒状基材の乾燥装置としては、塗布後の円筒状基材に直接エアーを吹き付けて乾燥を促進する技術が開示されている(特許文献1、特許文献2参照)。前記エアーを吹き付ける方式のものは、エアーが塗布膜に衝突するため、塗布膜にはじき又は膜厚むら等が発生し易いという欠点がある。   As a drying apparatus for a cylindrical base material immediately after coating, a technique for accelerating drying by directly blowing air to the cylindrical base material after coating is disclosed (see Patent Document 1 and Patent Document 2). The method of blowing the air has a drawback in that the air collides with the coating film, so that the coating film is likely to be repelled or uneven in film thickness.

また、ドラフトを用いて吸気により乾燥を促進する技術が開示されている(特許文献3参照)。エアーを吸引する方法のものは、ドラフト内で発生する乱気流のために、やはり膜厚むらを発生し易い状況になっている。特に、これ等の方法は塗布液の粘度が低粘度化するに従い膜厚むらが顕著に増加する。   Moreover, the technique which accelerates | stimulates drying by inhalation using a draft is disclosed (refer patent document 3). In the method of sucking air, the film thickness is likely to be uneven due to the turbulent airflow generated in the draft. In particular, in these methods, the film thickness unevenness significantly increases as the viscosity of the coating solution decreases.

これらの改良として同出願人はすでに、円筒状基材の表面に塗布された円筒状基材を乾燥させる電子写真用感光体の乾燥装置において、前記円筒状基材を挿入可能にした筒状部材の中間部の外周にリング状の周方向均一の吸引部材を同心に設け、前記円筒状基材の挿入時に前記円筒状基材面と同心の筒状部材の内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる乾燥装置を開示している(特許文献4参照)。しかしながら、筒状物の中心にあるものは依然として未乾燥に強い風の影響が生じることが分かった。
特開昭59−73074号公報 特開昭62−44771号公報 特開昭62−4470号公報 特開平6−308747号公報
As these improvements, the applicant has already made a cylindrical member in which the cylindrical base material can be inserted in an electrophotographic photosensitive member drying apparatus for drying the cylindrical base material coated on the surface of the cylindrical base material. A ring-shaped circumferentially uniform suction member is provided concentrically on the outer periphery of the intermediate portion, and a gap between the cylindrical base material surface and the inner surface of the concentric cylindrical member is sucked when the cylindrical base material is inserted. The drying apparatus which raises airflow and accelerates | stimulates drying of a coating film is disclosed (refer patent document 4). However, it has been found that what is in the center of the cylinder still has a strong wind effect on the undried.
JP 59-73074 A JP 62-44771 A Japanese Patent Laid-Open No. 62-4470 JP-A-6-308747

改良検討の結果、塗布膜を塗布された円筒状基材を挿入開口部より挿入可能にした筒状部材の外周にリング状の周方向均一で同心の吸引部材を設け、円筒状基材を挿入開口部へ挿入時に円筒状基材面と同心の筒状部材内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる乾燥装置において、筒状部材の全長をL0とし、筒状部材の挿入開口部より吸引部材の吸引部までの距離をL1としたとき、筒状部材の全長の中心より、吸引部材の吸引部までの距離を上方にすることにより、特に薄膜塗布の場合、より良好になることが分かった。 As a result of improvement studies, a ring-shaped circumferentially uniform and concentric suction member is provided on the outer periphery of a cylindrical member that allows a cylindrical substrate coated with a coating film to be inserted from the insertion opening, and the cylindrical substrate is inserted. In the drying apparatus that sucks the gap between the cylindrical base material surface and the inner surface of the cylindrical member concentric when inserted into the opening to generate an air flow, and accelerates the drying of the coating film, the total length of the cylindrical member is L 0 , when the distance to the suction portion of the suction member from the insertion opening of the tubular member and the L 1, from the center of the entire length of the tubular member, by a distance to the suction of the suction member upward, particularly thin film coating In the case of, it turned out that it becomes better.

本発明の目的は、塗布直後の塗布膜に悪い影響を与えることなく、均一かつ急速に塗布溶媒を蒸発させ、更に乾燥中の塗布膜表面近傍での乱気流の発生を極力おさえ、かつ塗布膜近傍に溜まる溶媒蒸気を除去し、均一な安定した塗布膜の塗布ができる円筒状基材の乾燥方法、その装置を提供することにある。   The object of the present invention is to uniformly and rapidly evaporate the coating solvent without adversely affecting the coating film immediately after coating, and to suppress the generation of turbulence near the coating film surface during drying as much as possible, and in the vicinity of the coating film It is an object of the present invention to provide a method and apparatus for drying a cylindrical base material that can remove a solvent vapor accumulated in the substrate and apply a uniform and stable coating film.

上記の目的は下記の何れかによって達成される。即ち、
(1)、塗布膜を外周面に塗布された円筒状基材を外周にリング状の周方向均一吸引部材を同心に設け筒状部材の挿入開口部より挿入し、前記円筒状基材の挿入時に前記円筒状基材面と同心の前記筒状部材の内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる円筒状基材の乾燥方法において、
前記筒状部材の全長をL0、前記筒状部材の円筒状基材の挿入開口部より前記吸引部材までの距離をL1としたとき、
0.5<L1/L0<1.0 [1]
なる条件を満足することを特徴とする円筒状基材の乾燥方法。
The above object can be achieved by any of the following. That is,
(1) A cylindrical base material coated with a coating film on its outer peripheral surface is provided with a ring-shaped circumferential uniform suction member concentrically on the outer periphery and inserted from the insertion opening of the cylindrical member, and the cylindrical base material is inserted. In the method of drying a cylindrical base material that sometimes sucks a gap between the cylindrical base material surface and the inner surface of the cylindrical member concentric to cause an air flow, and accelerates drying of the coating film,
When the total length of the cylindrical member is L 0 , and the distance from the insertion opening of the cylindrical base material of the cylindrical member to the suction member is L 1 ,
0.5 <L 1 / L 0 <1.0 [1]
A method for drying a cylindrical substrate characterized by satisfying the following conditions:

(2)、更に、前記筒状部材の全長をL0、前記筒状部材の円筒状基材の挿入開口部より前記吸引部材までの距離をL1としたとき、
0.6<L1/L0<0.9 [2]
なる条件を満足することを特徴とする(1)に記載の円筒状基材の乾燥方法。
(2) Furthermore, when the total length of the cylindrical member is L 0 , and the distance from the insertion opening of the cylindrical base material of the cylindrical member to the suction member is L 1 ,
0.6 <L 1 / L 0 <0.9 [2]
The cylindrical substrate drying method according to (1), wherein the following condition is satisfied.

(3)、塗布膜を塗布された円筒状基材を挿入開口部より挿入可能にした筒状部材の外周にリング状の周方向均一で同心の吸引部材を設け、前記円筒状基材を前記挿入開口部へ挿入時に前記円筒状基材面と同心の前記筒状部材内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる円筒状基材の乾燥装置において、
前記筒状部材の全長をL0とし、前記筒状部材の挿入開口部より前記吸引部材の吸引部までの距離をL1としたとき、
0.5<L1/L0<1.0 [1]
なる条件を満足することを特徴とする円筒状基材の乾燥装置。
(3) A ring-shaped circumferentially uniform and concentric suction member is provided on the outer periphery of the cylindrical member that allows the cylindrical substrate coated with the coating film to be inserted from the insertion opening, and the cylindrical substrate is In the cylindrical substrate drying apparatus that sucks a gap portion between the cylindrical base material surface and the inner surface of the cylindrical member concentric when inserted into the insertion opening to generate an air flow, and accelerates drying of the coating film,
When the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical member to the suction portion of the suction member is L 1 ,
0.5 <L 1 / L 0 <1.0 [1]
A cylindrical substrate drying apparatus characterized by satisfying the following conditions:

(4)、更に、前記筒状部材の全長をL0とし、前記筒状部材の挿入開口部より前記吸引部材の吸引部までの距離をL1としたとき、
0.6<L1/L0<0.9 [2]
なる条件を満足することを特徴とする(3)に記載の円筒状基材の乾燥装置。
(4) Furthermore, when the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical member to the suction portion of the suction member is L 1 ,
0.6 <L 1 / L 0 <0.9 [2]
The cylindrical substrate drying apparatus according to (3), wherein the following condition is satisfied.

上記[1]式について説明すると、塗布直後の塗布膜に対する表面近傍での乱気流の発生が殆どなくなり、特に、乾燥膜厚0.5μm以下の薄膜塗布において、圧塗布膜に悪影響を与えることなく、均一かつ急速に溶媒を蒸発除去させて完全な乾燥をすることができ、高品質の電子写真感光体ドラムを効率良く生産することが可能となる。下限範囲を越えると、乾燥時に強い風の影響を受ける。より好ましい範囲は[2]式に示す範囲である。   Explaining the above formula [1], the generation of turbulence near the surface of the coating film immediately after coating is almost eliminated, and particularly in the thin film coating with a dry film thickness of 0.5 μm or less, without adversely affecting the pressure coating film, It is possible to evaporate and remove the solvent uniformly and rapidly and complete drying, and it is possible to efficiently produce a high-quality electrophotographic photosensitive drum. If the lower limit is exceeded, it will be affected by strong winds during drying. A more preferable range is the range shown in the formula [2].

本発明によれば、筒状部材に対する吸引部材の位置を本発明の位置にすることにより、塗布直後の塗布膜に対する表面近傍での乱気流の発生が殆どなくなり、塗布膜に悪影響を与えることなく、均一かつ急速に溶媒を蒸発除去させて完全な乾燥をすることができ、高品質の電子写真感光体ドラムを効率良く生産することが可能となる。   According to the present invention, by setting the position of the suction member with respect to the cylindrical member to the position of the present invention, generation of turbulence near the surface with respect to the coating film immediately after coating is almost eliminated, without adversely affecting the coating film, It is possible to evaporate and remove the solvent uniformly and rapidly and complete drying, and it is possible to efficiently produce a high-quality electrophotographic photosensitive drum.

図1は連続塗布装置の全体構成を示す正面図で、図2は図1の塗布手段の断面図で、図3は図1の塗布手段の斜視図をそれぞれ示す。   1 is a front view showing the overall configuration of the continuous coating apparatus, FIG. 2 is a sectional view of the coating means of FIG. 1, and FIG. 3 is a perspective view of the coating means of FIG.

図1で、供給手段140は円筒状基材1を塗布手段の垂直下方の所定位置に供給して上方に押し上げる。積載案内部材141は円筒状基材1を積載する案内部材で、テーブル142は円筒状基材1を回転する。また、駆動手段143は防振台181の上に設けられテーブル142を駆動している。さらに昇降部材144は防振台182の上に設けられ円筒状基材1を上下方向に昇降する。   In FIG. 1, the supply means 140 supplies the cylindrical substrate 1 to a predetermined position vertically below the application means and pushes it upward. The loading guide member 141 is a guide member for loading the cylindrical base material 1, and the table 142 rotates the cylindrical base material 1. The driving means 143 is provided on the vibration isolation table 181 and drives the table 142. Further, the elevating member 144 is provided on the vibration isolator 182 and elevates and lowers the cylindrical base material 1 in the vertical direction.

搬送手段120は供給された円筒状基材1の外周面を把持して円筒軸を合わせて積み重ね下から上へ垂直に押し上げて搬送する。防振台183の上に設けられたモータM3によりボールネジ124が回転して、上下移動手段123を上下動させ、把持手段121を移動させる。同様にしてモータM4によりボールネジ124が回転して、上下移動手段123を上下動させ、把持手段122を移動させる。   The conveyance means 120 grasps the outer peripheral surface of the supplied cylindrical base material 1 and aligns the cylinder axis, and vertically pushes it up from the bottom and conveys it. The ball screw 124 is rotated by the motor M3 provided on the anti-vibration table 183, the vertical moving means 123 is moved up and down, and the gripping means 121 is moved. Similarly, the ball screw 124 is rotated by the motor M4, the vertical movement means 123 is moved up and down, and the gripping means 122 is moved.

位置決め手段20はエアーベアリング式で、空気等の吹付けノズルから吹き付け、円筒状基材1を塗布手段の環状塗布部の中心に位置合わせする。   The positioning means 20 is of an air bearing type, and is blown from a blowing nozzle such as air to align the cylindrical substrate 1 with the center of the annular application portion of the application means.

塗布手段30は、円筒状基材1に塗布液を塗布する。詳しくは図2で説明する。   The coating unit 30 applies a coating solution to the cylindrical base material 1. Details will be described with reference to FIG.

乾燥装置150は環状に形成した乾燥装置となっており、装置本体170に固定されている。円筒状基材1は塗布された塗布膜が乾燥される。   The drying device 150 is a drying device formed in an annular shape, and is fixed to the device main body 170. The cylindrical coating 1 is dried on the coated film.

分離排出手段160は乾燥されて垂直搬送されてきた積み重ね状の複数の円筒状基材1からを分離させて1個ずつ取り出し排出する。垂直移動ロボットステージ161の軸体162には上チャック163と下チャック164があり、円筒状基材1をチャックしてエヤーシリンダ165で上下駆動する。   The separation and discharge means 160 separates and discharges one by one from the plurality of stacked cylindrical base materials 1 that have been dried and vertically conveyed. The shaft body 162 of the vertical moving robot stage 161 has an upper chuck 163 and a lower chuck 164, which chucks the cylindrical substrate 1 and drives it up and down by the air cylinder 165.

次に、図2で、塗布手段30について説明すると、塗布液供給手段である送液ポンプ6は塗布液タンク5の塗布液11を塗布液供給口6aに供給する。塗布液分配室7は円筒状基材1a、1b・・の周囲を環状にとり囲み設けられ、送液ポンプ6により供給される塗布液11を液溜めする。塗布液分配スリット8は塗布液供給手段より供給された塗布液を環状の入口開口部より入れ、前記入口開口部より内方の塗布液分配スリット8の環状の出口開口部9より流出させ塗布液11を分配する。搬送手段120はホッパー面4に対し前記円筒状基材1a、1b・・を把持して上方に垂直移動させる。ホッパー面の環状端部4bの真円度HRD(μm)は1.0<HRD<10の範囲にある。また、ホッパー面の環状端部4bの十点平均表面あらさRZ(μm)は0.1<RZ<5.0の範囲にある。また塗布部での円筒状基材最大振動巾VRはVR=40μm以下の範囲にある。ホッパー面4は前記環状の出口開口部9より内方で下側に傾斜し円筒状基材1a、1b・・の外周面に近接した環状端部4bまで延びて円錐状となっている。 Next, the coating means 30 will be described with reference to FIG. 2. The liquid feed pump 6 serving as the coating liquid supply means supplies the coating liquid 11 in the coating liquid tank 5 to the coating liquid supply port 6a. The coating liquid distribution chamber 7 is provided so as to surround the cylindrical bases 1a, 1b,... And stores the coating liquid 11 supplied by the liquid feed pump 6. The coating liquid distribution slit 8 puts the coating liquid supplied from the coating liquid supply means through the annular inlet opening and flows out from the annular outlet opening 9 of the coating liquid distribution slit 8 inward from the inlet opening. Distribute 11. The conveying means 120 grips the cylindrical base materials 1a, 1b,... With respect to the hopper surface 4 and vertically moves them upward. The roundness HRD (μm) of the annular end portion 4b of the hopper surface is in the range of 1.0 <HRD <10. The ten-point average surface roughness R Z (μm) of the annular end 4b of the hopper surface is in the range of 0.1 <R Z <5.0. Moreover, the cylindrical base material maximum vibration width VR in the application part is in a range of VR = 40 μm or less. The hopper surface 4 is inclined inward and downward from the annular outlet opening 9 and extends to the annular end 4b close to the outer peripheral surface of the cylindrical substrates 1a, 1b,.

円筒状基材とホッパー面の環状端部との隙間GP(μm)は50<GP<500の範囲にある。この範囲に収めないと、垂直方向に積み重ね誤差変動が加わるので、コータや位置決め部にこすれたりして多数本の連続塗布ができなくなる。また、塗布液の粘度V(ミリパスカル・秒)は1.0<V<300の範囲にある。円筒状基材1の真円度CRD(μm)はCRD<30の範囲にある。なお、円筒状基材1a、1b・・としては中空ドラム、例えば、アルミニウムドラム、プラスチックドラムの他、シームレスベルト型の円筒状基材でも良い。薄膜塗布とはウエット(Wet)膜厚が20μm以下のものをいう。   A gap GP (μm) between the cylindrical base material and the annular end portion of the hopper surface is in a range of 50 <GP <500. If it does not fall within this range, a stacking error fluctuation is applied in the vertical direction, and it becomes impossible to apply a large number of continuous coatings by rubbing the coater or positioning part. The viscosity V (millipascal · second) of the coating solution is in the range of 1.0 <V <300. The roundness CRD (μm) of the cylindrical substrate 1 is in the range of CRD <30. The cylindrical substrates 1a, 1b,... May be hollow drums, for example, aluminum drums, plastic drums, or seamless belt type cylindrical substrates. Thin film coating refers to those having a wet film thickness of 20 μm or less.

ここで、円筒状基材の塗布方法を説明する。供給工程では前記所定の諸元値に入った円筒状基材1はテーブル142上に置かれる。円筒状基材1はテーブル142の回転によりYY軸上に達する。この時、昇降部材144が下方より上方へ円筒状基材1を押し上げる。昇降部材144による押し上げが完了する時緩衝機構が作用し、円筒状基材1との接合時のショックを無くするのが良い。円筒状基材1が搬送工程のところまで運び込まれる。   Here, a method of applying the cylindrical substrate will be described. In the supplying step, the cylindrical base material 1 having entered the predetermined specification value is placed on the table 142. The cylindrical substrate 1 reaches the YY axis by the rotation of the table 142. At this time, the elevating member 144 pushes the cylindrical base material 1 upward from below. When the push-up by the elevating member 144 is completed, the shock absorbing mechanism acts, and it is preferable to eliminate the shock at the time of joining with the cylindrical base material 1. The cylindrical base material 1 is carried to the place of a conveyance process.

搬送工程では、円筒状基材1の外周面に圧接離間可能で且つ垂直上下方向に移動可能な2組の把持部121、122を有し、円筒状基材1を位置決めして把持し上方に搬送する。   In the transporting process, the outer peripheral surface of the cylindrical base material 1 has two sets of gripping portions 121 and 122 that can be pressed against and separated from each other and can move vertically and vertically. Transport.

位置決め工程では、円筒状基材1はエヤーシリンダ方式により正確に位置決めされ、位置決めされた円筒状基材1は塗布工程へと移行される。   In the positioning step, the cylindrical substrate 1 is accurately positioned by the air cylinder method, and the positioned cylindrical substrate 1 is transferred to the coating step.

塗布工程では塗布液タンク5にある所定の諸元値に入った塗布液11を送液ポンプ6で塗布液供給口6aに供給する。塗布液11は塗布液分配室7で液溜めした後に、塗布液分配スリット8の入口開口部より出口開口部9に流す。そして、塗布液11は出口開口部9より内方で下側に傾斜し円筒状基材1a、1b・・の外周面に近接した環状端部まで延びるホッパー面4に流す。   In the coating process, the coating liquid 11 having entered a predetermined specification value in the coating liquid tank 5 is supplied to the coating liquid supply port 6 a by the liquid feed pump 6. The coating liquid 11 is stored in the coating liquid distribution chamber 7 and then flows from the inlet opening of the coating liquid distribution slit 8 to the outlet opening 9. Then, the coating liquid 11 flows on the hopper surface 4 that is inclined inwardly from the outlet opening 9 and extends to the annular end portion close to the outer peripheral surface of the cylindrical base material 1a, 1b,.

ホッパー面4に対し円筒状基材1a、1b・・を上方向に垂直移動させながら、円筒状基材1a、1b・・の外周面とホッパー面4の環状端部との間に連続的に塗布液11を供給して前記円筒状基材1a、1b・・の外周面上に塗布し塗布膜2を形成する。   The cylindrical base materials 1a, 1b,... Are moved vertically upward with respect to the hopper surface 4 while continuously between the outer peripheral surface of the cylindrical base materials 1a, 1b,. A coating liquid 11 is supplied and coated on the outer peripheral surfaces of the cylindrical base materials 1a, 1b,.

乾燥工程では塗布された円筒状基材1を乾燥装置内を通り乾燥する。さらに、分離排出工程では円筒状基材1を分離して排出される。   In the drying step, the coated cylindrical substrate 1 is dried through the drying apparatus. Furthermore, in the separation / discharge step, the cylindrical substrate 1 is separated and discharged.

次に、図4は、同時重層塗布装置の構成断面図で、塗布装置を同時に重層塗布する装置である。図1と機構的、機能的に同じ部材は同一符号を付すとともに説明を省略する。   Next, FIG. 4 is a structural cross-sectional view of the simultaneous multilayer coating apparatus, which is an apparatus for simultaneously applying the multilayer coating apparatus. Members that are mechanically and functionally the same as those in FIG.

図4で、塗布液供給手段は送液ポンプ61で前記諸元値に入った塗布液111を塗布液分配スリット81に供給する。塗布液分配スリット81は塗布液111を円筒状基材1a、1b・・の外周面を取り囲み設けられた出口開口部9に流出し分配する。   In FIG. 4, the coating liquid supply means supplies the coating liquid 111 having entered the specification values to the coating liquid distribution slit 81 by the liquid feed pump 61. The coating liquid distribution slit 81 flows out and distributes the coating liquid 111 to the outlet opening 9 that surrounds the outer peripheral surface of the cylindrical base material 1a, 1b,.

同時重層の塗布方法について説明すると、前記諸元値に入った塗布液11を供給して前記諸元値に入った円筒状基材1a、1b・・の外周面を取り囲み出口開口部9に流出する。そして出口開口部9より円筒状基材1a、1b・・の外周面に近接する前記諸元値に入ったホッパー面4に流す。   The simultaneous multi-layer coating method will be described. The coating liquid 11 that has entered the specification values is supplied to surround the outer peripheral surfaces of the cylindrical substrates 1a, 1b,. To do. And it is made to flow to the hopper surface 4 which entered the said specification value close | similar to the outer peripheral surface of cylindrical base material 1a, 1b ... from the exit opening part 9. FIG.

さらに、塗布液111を供給して塗布液111を分配し円筒状基材1a、1b・・の外周面を取り囲み出口開口部91に流出する。出口開口部91より円筒状基材1a、1b・・の外周面に近接するホッパー面4に流す。   Further, the coating liquid 111 is supplied to distribute the coating liquid 111, surround the outer peripheral surfaces of the cylindrical base materials 1 a, 1 b,. Flow from the outlet opening 91 to the hopper surface 4 close to the outer peripheral surface of the cylindrical base material 1a, 1b,.

円筒状基材1a、1b・・をホッパー面4に対し上方で垂直方向に移動させる。ホッパー面4を流れた塗布液111を上方に移動する円筒状基材1a、1b・・の外周面に塗布液11を塗布し塗布膜2、2Aを同時に形成する。   The cylindrical base materials 1a, 1b,... Are moved vertically upward with respect to the hopper surface 4. The coating liquid 11 that has flowed through the hopper surface 4 is coated on the outer peripheral surface of the cylindrical base material 1a, 1b,... To form the coating films 2 and 2A simultaneously.

以上の如く塗布するので、膜厚変動のない、ビード切れのない、優れた塗布膜を形成する。   Since coating is performed as described above, an excellent coating film with no variation in film thickness and no bead breakage is formed.

次に、図5は、逐次重層塗布装置の構成断面図で、塗布装置を上下に配置した逐次重層塗布する塗布装置である。図1と機構的、機能的に同じ部材は同一符号を付すとともに説明を省略する。   Next, FIG. 5 is a configuration cross-sectional view of a sequential multilayer coating apparatus, which is a coating apparatus for sequential multilayer coating in which coating apparatuses are arranged vertically. Members that are mechanically and functionally the same as those in FIG.

図5で、塗布液供給手段は送液ポンプ62で前記諸元値に入った塗布液112を塗布液分配スリット82に供給する。塗布液分配スリット82は塗布液112を前記諸元値に入った円筒状基材1a、1b・・の外周面を取り囲み出口開口部92に流出するように分配する。前記諸元値に入ったホッパー面42は前記出口開口部92より円筒状基材1a、1b・・の外周面に近接する環状端部42bまで延びている。   In FIG. 5, the coating liquid supply means supplies the coating liquid 112 having entered the specification values to the coating liquid distribution slit 82 by the liquid feed pump 62. The coating liquid distribution slit 82 distributes the coating liquid 112 so as to surround the outer peripheral surface of the cylindrical base material 1a, 1b,. The hopper surface 42 having entered the specifications extends from the outlet opening 92 to the annular end 42b close to the outer peripheral surface of the cylindrical base material 1a, 1b,.

ここで、逐次重層の塗布方法について説明すると、前記諸元値に入った塗布液11を供給して塗布液11を分配し前記諸元値に入った円筒状基材1a、1b・・の外周面を取り囲み出口開口部9に流出する。流出する塗布液11を前記出口開口部9より円筒状基材1a、1b・・の外周面に近接するホッパー面4に流す。円筒状基材1a、1b・・を前記諸元値に入ったホッパー面4に対し上方で垂直方向に移動させる。ホッパー面4を流れた塗布液11を上方に移動する円筒状基材1a、1b・・の外周面に塗布液11を塗布し塗布膜2を形成する。   Here, the sequential multi-layer coating method will be described. The coating liquid 11 having entered the specification values is supplied to distribute the coating liquid 11 and the outer circumferences of the cylindrical substrates 1a, 1b,. It surrounds the surface and flows out to the outlet opening 9. The flowing coating liquid 11 is allowed to flow from the outlet opening 9 to the hopper surface 4 close to the outer peripheral surface of the cylindrical base material 1a, 1b. The cylindrical base materials 1a, 1b,... Are moved in the vertical direction upward with respect to the hopper surface 4 having entered the specification values. The coating liquid 11 is applied to the outer peripheral surfaces of the cylindrical substrates 1a, 1b,... That move the coating liquid 11 flowing on the hopper surface 4 upward.

塗布液112を供給して前記諸元値に入った塗布液112を分配し前記諸元値に入った円筒状基材1a、1b・・の外周面を取り囲み出口開口部92に流出する。流出する塗布液112を出口開口部92より円筒状基材1a、1b・・の外周面に近接する前記諸元値に入ったホッパー面42に流す。   The coating liquid 112 is supplied to distribute the coating liquid 112 that has entered the specifications, surrounds the outer peripheral surface of the cylindrical base material 1a, 1b,... That has entered the specifications, and flows out to the outlet opening 92. The flowing coating liquid 112 is allowed to flow from the outlet opening 92 to the hopper surface 42 that has entered the above specification values close to the outer peripheral surface of the cylindrical base material 1a, 1b.

円筒状基材1a、1b・・をホッパー面42に対し上方で垂直方向に移動させる。ホッパー面4を流れた塗布液112を上方に移動する円筒状基材1a、1b・・の外周面に塗布液112を塗布し塗布膜2Aを形成する。   The cylindrical base materials 1a, 1b,... Are moved vertically with respect to the hopper surface. The coating liquid 112 that has flowed through the hopper surface 4 is coated on the outer peripheral surface of the cylindrical base material 1a, 1b,... To form a coating film 2A.

なお、上記逐次重層の塗布装置は2つの塗布ヘッド32を設けたものであるが、更に塗布ヘッド32の上部に別の塗布ヘッドを設け塗布ヘッドが3つの逐次重層の塗布装置としてもよい。   The sequential multi-layer coating apparatus is provided with two coating heads 32. However, another coating head may be provided above the coating head 32 and the coating head may be three sequential multi-layer coating apparatuses.

図6は、位置決め装置と垂直塗布装置の縦断面図である。前記垂直塗布装置は、中心線Oに沿って垂直状に重ね合わせた円筒状基材1a、1bに塗布液2Aを塗布する垂直塗布装置10Aと、前記垂直塗布装置10Aの下方に固設された円筒状基材の位置決め装置20と、前記垂直塗布装置10Aの上方に設置された乾燥フード30Aと、前記位置決め装置20の下部に固定された支持装置40Aとから構成されている。   FIG. 6 is a longitudinal sectional view of the positioning device and the vertical coating device. The vertical applicator is fixed below the vertical applicator 10A and a vertical applicator 10A for applying the coating liquid 2A onto the cylindrical substrates 1a and 1b that are vertically stacked along the center line O. The positioning device 20 includes a cylindrical base material, a drying hood 30A installed above the vertical coating device 10A, and a support device 40A fixed to the lower portion of the positioning device 20.

垂直塗布装置10Aの内部には、円筒状基材1aの外周を取り囲み塗布液を塗布する塗布ヘッド30、前記塗布ヘッド30に隣接するテーパー状の塗布液流出口(塗布液スライド面)12A、水平方向の幅狭の塗布液通路を形成する塗布液分配用スリット13A、塗布液分配室14Aが形成されている。前記塗布液分配室14Aには塗布液供給パイプ16Aが接続され、図示しない圧送ポンプにより塗布液が供給される。   Inside the vertical coating apparatus 10A, a coating head 30 that surrounds the outer periphery of the cylindrical substrate 1a and coats the coating liquid, a tapered coating liquid outlet (coating liquid slide surface) 12A adjacent to the coating head 30, and a horizontal A coating liquid distribution slit 13 </ b> A and a coating liquid distribution chamber 14 </ b> A that form a narrow coating liquid passage in the direction are formed. A coating liquid supply pipe 16A is connected to the coating liquid distribution chamber 14A, and the coating liquid is supplied by a pressure feed pump (not shown).

上記垂直塗布装置10Aによる塗布方法は、垂直塗布装置10Aを固定し、前記円筒状基材1aを中心線Oに沿って矢示方向に上昇移動させながら円筒状基材1aの上端部より塗布ヘッド30により塗布を行う。   In the coating method using the vertical coating apparatus 10A, the vertical coating apparatus 10A is fixed, and the cylindrical base 1a is moved upward in the direction indicated by the arrow along the center line O from the upper end of the cylindrical base 1a. Application is carried out according to 30.

前記垂直塗布装置10Aには、圧送ポンプにより一定量の塗布液が安定して送り込まれ、塗布液供給パイプ16A、塗布液分配室14A、塗布液分配用スリット13A、塗布液流出口12Aを経て、塗布ヘッド30に供給され、円筒状基材1aの表面に塗布液が塗布され感光層が形成される。   A predetermined amount of coating liquid is stably fed into the vertical coating apparatus 10A by a pressure feed pump, and passes through a coating liquid supply pipe 16A, a coating liquid distribution chamber 14A, a coating liquid distribution slit 13A, and a coating liquid outlet 12A. It is supplied to the coating head 30 and a coating solution is applied to the surface of the cylindrical substrate 1a to form a photosensitive layer.

前記垂直塗布装置10Aの上部には、環状に形成した乾燥装置150が固定されている。垂直塗布装置10Aにより形成された円筒状基材上の感光層は、前記乾燥装置150内を通過しながら塗布された塗布液2Aを徐々に乾燥させる。乾燥は塗布液に含まれる溶媒を外部に放出させることにより行なわれる。   An annular drying device 150 is fixed to the upper part of the vertical coating device 10A. The photosensitive layer on the cylindrical substrate formed by the vertical coating apparatus 10 </ b> A gradually dries the coating solution 2 </ b> A applied while passing through the drying apparatus 150. Drying is performed by releasing the solvent contained in the coating solution to the outside.

前記垂直塗布装置10Aの下部には、円筒状基材の位置決め装置20が固定されている。図7(a)は図6における円筒状基材の位置決め装置のP−P断面図(給気部)、図7(b)はQ−Q断面図(排気部)である。   A cylindrical base material positioning device 20 is fixed to the lower portion of the vertical coating device 10A. FIG. 7A is a cross-sectional view of the cylindrical base material positioning apparatus in FIG. 6 taken along the line P-P (air supply part), and FIG.

円筒状基材の位置決め装置20は、外筒部材21Aと、前記外筒部材21Aの内部に固定された内筒部材22Aとから構成されている。外筒部材21Aと内筒部材22Aには、両部材を貫通する複数の給気口23Aと、複数の排気口26Aが穿設されている。前記複数の給気口23Aは、給気ポンプ29Aに接続され、空気等の流体が圧送される。   The cylindrical base material positioning device 20 includes an outer cylinder member 21A and an inner cylinder member 22A fixed inside the outer cylinder member 21A. The outer cylinder member 21A and the inner cylinder member 22A are provided with a plurality of air supply ports 23A and a plurality of exhaust ports 26A penetrating both members. The plurality of air supply ports 23A are connected to an air supply pump 29A, and fluid such as air is pumped.

図6及び図7(a)に示す如く、外筒部材21Aには、給気口23Aが水平方向に4個の放射状に配置され、さらに垂直方向に複数段(図示5段)配列されている。前記外筒部材21Aの内周面には水平溝24Aが穿設されていて、前記内筒部材22Aの外周面との間に水平流路を形成し、前記水平方向に放射状に配置された4個の給気口23Aに連通している。前記内筒部材22Aには、水平方向に12個の吐出口25Aを有する穴が貫通している。前記吐出口25Aは前記円筒状基材1の外周面と隙間Gを保って対向している。前記隙間Gは、20μm〜3mm、好ましくは30μm〜2mmである。この隙間Gが20μmより小さいと、円筒状基材1の僅かな振れで内筒部材22Aに接触して円筒状基材1を傷つけやすい。また、隙間Gが3mmより大であると、円筒状基材1の位置決め精度が低下する。前記吐出口25Aは直径0.01〜1.0mmの小口径のノズルであり、好ましくは0.05〜0.5mmが良い。   As shown in FIGS. 6 and 7A, the outer cylinder member 21A is provided with four air supply openings 23A in the horizontal direction and further arranged in a plurality of stages (five stages in the figure) in the vertical direction. . A horizontal groove 24A is perforated on the inner peripheral surface of the outer cylindrical member 21A, and a horizontal flow path is formed between the outer cylindrical member 22A and the outer peripheral surface of the inner cylindrical member 22A. The individual air supply ports 23A communicate with each other. The inner cylinder member 22A has a hole having twelve discharge ports 25A in the horizontal direction. The discharge port 25A faces the outer peripheral surface of the cylindrical base material 1 with a gap G therebetween. The gap G is 20 μm to 3 mm, preferably 30 μm to 2 mm. If the gap G is smaller than 20 μm, the cylindrical base material 1 is likely to be damaged by coming into contact with the inner cylindrical member 22 </ b> A with slight vibration of the cylindrical base material 1. Further, if the gap G is larger than 3 mm, the positioning accuracy of the cylindrical substrate 1 is lowered. The discharge port 25A is a small nozzle having a diameter of 0.01 to 1.0 mm, preferably 0.05 to 0.5 mm.

図6及び図7(b)に示す如く、前記外筒部材21A及び内筒部材22Aを貫通して、排気口26Aが水平方向に4個の放射状に配置され、さらに垂直方向に複数段(図示5段)配列されている。前記排気口26Aは垂直方向に前記給気口23Aと交互に配列されている。内筒部材22Aの内周面には、垂直溝27Aが穿設されていて、前記複数段の排気口26Aを連通している。   As shown in FIGS. 6 and 7 (b), exhaust ports 26A are horizontally arranged in four radial directions through the outer cylinder member 21A and the inner cylinder member 22A, and are further provided in a plurality of stages (not shown). (5 levels). The exhaust ports 26A are alternately arranged with the air supply ports 23A in the vertical direction. A vertical groove 27A is formed in the inner peripheral surface of the inner cylinder member 22A, and communicates with the multiple-stage exhaust ports 26A.

前記内筒部材22Aの下部の内周面は、フッ素樹脂材であるテフロン(登録商標)が内張りされており、入り口側が広がったテーパー面28Aになっている。このテーパー面28Aは、例えば軸方向の長さが50mmで、片側傾斜角が0.5mmの円錐面である。このテーパー面28Aのテーパー比は、0.005〜0.2、好ましくは0.01〜0.1である。このテーパー面28Aを設けた場合、円筒状基材1が水平移動または傾斜して位置決め装置20に進入する際に位置規制されるから有効である。このテーパー面28Aを設けることにより、円筒状基材1が内筒部材22Aに進入するとき、円筒状基材1の先端部が内筒部材22Aの内周面に接触することを防止している。また、別の例では円筒部材22A自体がフッ素樹脂材であるテフロン(登録商標)となっている。最も接触し易いのは導入部であるが、たとえ接触しても導入部材質がフッ素樹脂(比較的軟らかく、滑り性良い)なので傷が付きにくい。   The inner peripheral surface of the lower part of the inner cylinder member 22A is lined with Teflon (registered trademark), which is a fluororesin material, and has a tapered surface 28A with the entrance side widened. The tapered surface 28A is, for example, a conical surface having an axial length of 50 mm and a one-side inclination angle of 0.5 mm. The taper ratio of the tapered surface 28A is 0.005 to 0.2, preferably 0.01 to 0.1. Providing this tapered surface 28A is effective because the cylindrical base material 1 is regulated when the cylindrical base material 1 moves horizontally or inclines and enters the positioning device 20. By providing this tapered surface 28A, when the cylindrical base material 1 enters the inner cylinder member 22A, the tip of the cylindrical base material 1 is prevented from coming into contact with the inner peripheral surface of the inner cylinder member 22A. . In another example, the cylindrical member 22A itself is Teflon (registered trademark) which is a fluororesin material. The introduction part is most easily contacted, but even if it comes into contact, the introduction member is made of a fluororesin (relatively soft and slippery) so that it is hardly damaged.

前記給気ポンプ29Aから圧送された流体は、複数の給気口23Aから外筒部材21A内に導入されて、水平溝24Aを介して複数の吐出口25Aから吐出され、円筒状基材1a(1b)の外周面と均一な流体膜層を形成する。吐出後の流体は垂直溝27Aを経て複数の排気口26Aから装置外に排出される。   The fluid pumped from the air supply pump 29A is introduced into the outer cylinder member 21A from the plurality of air supply ports 23A, and is discharged from the plurality of discharge ports 25A through the horizontal grooves 24A. 1b) and a uniform fluid film layer are formed. The discharged fluid is discharged out of the apparatus through the plurality of exhaust ports 26A through the vertical groove 27A.

前記給気口23Aに供給される流体は、空気、不活性ガス例えば窒素ガスが良い。そして前記流体は、JIS規格でクラス100以上の清浄な気体が良い。   The fluid supplied to the air supply port 23A is preferably air or an inert gas such as nitrogen gas. The fluid is preferably a clean gas of class 100 or higher according to JIS standards.

また、前記給気口23Aに供給される毎分当たりの流体量は、0.1〜50m3/minが好ましい。流体量が0.1m3/minより小であると、円筒状基材1の位置決め精度が極端に悪化し、50m3/minより大になると、風量の影響が強く出て、積み重ねられた円筒状基材1が振動し、液膜が不均一となる。このため特に、毎分当たりの流体量は、0.2〜20m3/minが好ましい。ここで、規制供給する流体量は、流体圧規制でなく流体量制御にしないと、塗布直後の液膜への影響(膜厚むら等)が発生する。なお、毎分当たりの流体量は、位置決め装置20の給気口23Aの入り口で測定した。また、前記複数の給気口23Aに供給される毎分当たりの流体量は、軸方向の給気口23Aの流量が同じか、下方より上方の流量が多い方が良い。上記位置決め装置20は、図8の(a)、(b)、(c)に示す如く、2つ以上を連結して用いてもよい。 Moreover, the amount of fluid per minute supplied to the air supply port 23A is preferably 0.1 to 50 m 3 / min. If the amount of fluid is less than 0.1 m 3 / min, the positioning accuracy of the cylindrical base material 1 is extremely deteriorated. If the amount of fluid is greater than 50 m 3 / min, the effect of the air volume is strong and the stacked cylinders The substrate 1 vibrates and the liquid film becomes non-uniform. For this reason, the amount of fluid per minute is particularly preferably 0.2 to 20 m 3 / min. Here, if the amount of fluid to be regulated is not regulated by the fluid pressure and not controlled by the fluid pressure, an influence on the liquid film immediately after coating (film thickness unevenness, etc.) occurs. The amount of fluid per minute was measured at the inlet of the air supply port 23A of the positioning device 20. In addition, it is preferable that the fluid amount per minute supplied to the plurality of air supply ports 23A is the same as the flow rate of the air supply port 23A in the axial direction or a higher flow rate from below. Two or more of the positioning devices 20 may be connected and used as shown in FIGS.

なお、位置決め装置に接続される垂直塗布装置としては、スライドホッパー型、押し出し型、リングコータ、スプレー塗布等の各種装置が用いられる。   Various devices such as a slide hopper type, an extrusion type, a ring coater, and spray coating are used as the vertical coating device connected to the positioning device.

図9は乾燥装置の全体配置図で全体配置を説明すると、コータ30は塗布を行うためのコータであり、円筒状基材1は電子写真感光体基体のアルミニウム製の中空のドラムである。円筒状基材1は下方に上下方向に積み重ねられ、矢印の方向(上方)に搬送される。コータ30を通過することにより塗布された円筒状基材1はそのまま搬送されて、本発明の乾燥装置150を通り、塗布膜2の溶媒を除去するものである。   FIG. 9 is an overall layout diagram of the drying apparatus. The overall arrangement will be described. The coater 30 is a coater for coating, and the cylindrical substrate 1 is a hollow aluminum drum of an electrophotographic photoreceptor substrate. Cylindrical base material 1 is piled up and down below, and is conveyed in the direction of an arrow (upward). The cylindrical base material 1 applied by passing through the coater 30 is conveyed as it is, passes through the drying device 150 of the present invention, and removes the solvent of the coating film 2.

図10はコータの一部切断斜視図で、図11は円筒状基材とコータの塗布時の状態を表す断面図である。図10、図11でコータ30は円筒状基材に塗布液を塗布する。塗布液分配室7から塗布液分配スリット8を通りホッパー面4を流下して流延する塗布液は円筒状基材1のドラム表面に塗布膜2を形成して行く。   FIG. 10 is a partially cut perspective view of the coater, and FIG. 11 is a cross-sectional view showing a state where the cylindrical base material and the coater are applied. 10 and 11, the coater 30 applies a coating solution to a cylindrical base material. The coating liquid flowing from the coating liquid distribution chamber 7 through the coating liquid distribution slit 8 and flowing down the hopper surface 4 forms the coating film 2 on the drum surface of the cylindrical substrate 1.

図12は乾燥装置の断面図である。図12で乾燥装置150は吸引スリット16B、吸引チャンバー12B、吸引ノズル15Bを有する吸引スリット部材(吸引部材)18Bの下部に筒状部材9B、上部に筒状部材10Bがそれぞれ同心に結合されている。   FIG. 12 is a sectional view of the drying apparatus. In FIG. 12, a drying device 150 includes a suction slit member 16B having a suction slit 16B, a suction chamber 12B, and a suction nozzle 15B. .

筒状部材の全長をL0、前記筒状部材の円筒状基材の挿入開口部より前記吸引部材までの距離をL1としたとき、0.5<L1/L0<1.0である。より好ましくは0.6<L1/L0<0.9である。 When the total length of the cylindrical member is L 0 , and the distance from the insertion opening of the cylindrical base material of the cylindrical member to the suction member is L 1 , 0.5 <L 1 / L 0 <1.0 is there. More preferably, 0.6 <L 1 / L 0 <0.9.

そして、複数設けられた吸引ノズル15Bから吸引を行ない、周方向均一な吸引チャンバー12B、周方向均一な吸引スリット16Bにより周方向の均一化がなされた吸引エアーが流れ、更に、吸引スリット部材18B、その上下の筒状部材10B、9Bの各内径面と塗布済みの円筒状基材1の外周面との間の空気流の乱れをバッファー空間13Bで極僅かにおさえて、14Bに示す乾燥のための均一吸引エアーの空気流を作り出している。この乾燥ゾーンに矢印で示す方向に塗布済の円筒状基材1を搬送することにより、塗布膜の乾燥を行うものである。   Then, suction is performed from a plurality of suction nozzles 15B, suction air that has been made uniform in the circumferential direction by the suction chamber 12B that is uniform in the circumferential direction and the suction slit 16B that is uniform in the circumferential direction flows, and further, the suction slit member 18B, For the drying shown in 14B, the disturbance of the air flow between the inner diameter surfaces of the upper and lower cylindrical members 10B and 9B and the outer peripheral surface of the coated cylindrical base material 1 is suppressed in the buffer space 13B. The air flow of uniform suction air is created. The coated film is dried by conveying the coated cylindrical substrate 1 in the direction indicated by the arrow to the drying zone.

この乾燥装置は二重円筒の間を流れる風により乾燥が促進されるものであるが、塗布膜より蒸発する溶媒のガス濃度が高くなりすぎると乾燥効率が低下してしまうため、円筒内空気の溶媒のガス濃度が飽和状態にならない様に風量(風速)と円筒長さ及び円筒部長での吸引部を中心部からさける必要がある。   In this drying device, drying is promoted by the air flowing between the double cylinders, but if the gas concentration of the solvent evaporating from the coating film becomes too high, the drying efficiency will be reduced. In order to prevent the gas concentration of the solvent from becoming saturated, it is necessary to avoid the air volume (wind speed), the cylinder length, and the suction portion at the cylinder length from the center.

塗布膜の溶剤の蒸発速度は、溶剤の蒸気圧、気温、雰囲気の蒸気密度等によって左右される。この中で蒸気圧は、溶剤固有の物性であり、気温は塗布室の温度で決まるため、乾燥を促進させるには蒸気密度を下げればよい。塗膜に空気流を当てることによって、蒸気密度を低下させ、風乾の促進をはかることが可能になる。   The evaporation rate of the solvent of the coating film depends on the vapor pressure of the solvent, the temperature, the vapor density of the atmosphere, and the like. Among them, the vapor pressure is a physical property specific to the solvent, and the air temperature is determined by the temperature of the coating chamber. Therefore, the vapor density may be lowered to promote drying. By applying an air stream to the coating film, it is possible to reduce the vapor density and promote air drying.

塗布直後の溶媒の蒸発速度の速い時は塗布膜は風による影響を受けやすい。ある程度乾燥が進むと風による影響が小さくなる一方、同時に蒸発の潜熱により円筒状基材の温度低下が発生する。室温の空気をより多く流すことにより円筒状基材の温度低下を補正すると共に、円筒内の溶媒のガス濃度を下げる意味からも風量を上げることが望ましい。   When the evaporation rate of the solvent immediately after coating is high, the coating film is easily affected by wind. As the drying progresses to some extent, the influence of the wind is reduced, and at the same time, the temperature of the cylindrical substrate is lowered by the latent heat of evaporation. It is desirable to increase the air volume in order to correct the temperature drop of the cylindrical base material by flowing more air at room temperature and to reduce the gas concentration of the solvent in the cylinder.

円筒状基材の塗装膜の均一乾燥を行うためには周方向の吸引速度が均一であることが要求される。風速が周方向で相違を生じた場合、乾燥スピードが周方向で違うために、塗布膜にまだらな模様が発生する等の問題が起こるが、周方向の風速(風量)をコントロールするために、周方向に均一の圧力損失を持たせることにより、その目的を達成している。   In order to uniformly dry the coating film of the cylindrical base material, it is required that the suction speed in the circumferential direction is uniform. If the wind speed differs in the circumferential direction, the drying speed is different in the circumferential direction, causing problems such as mottled patterns on the coating film, but in order to control the circumferential wind speed (air volume), The purpose is achieved by giving a uniform pressure loss in the circumferential direction.

図13の吸引スリットを設けた吸引部材の一部破断斜視図に示すリング状に形成される容量を持つ吸引チャンバー12Bと周方向均一の吸引スリット16Bを用い、圧力損失の少ない前記チャンバー部分を負圧とし、前記周方向均一の吸引スリット16Bを圧力損失部材とした。   Using the suction chamber 12B having a ring-shaped capacity and a uniform suction slit 16B in the circumferential direction shown in the partially broken perspective view of the suction member provided with the suction slit of FIG. The suction slit 16B uniform in the circumferential direction was used as a pressure loss member.

また、周方向均一吸引の手段としては周方向均一スリットの代わりとして、図14のパンチ板を設けた吸引部材の一部破断斜視図に示すようなパンチ板19Bや、図15のメッシュを設けた吸引部材の一部破断斜視図に示すようなメッシュ20Bを用いることによってもその目的を達成し得る。なお、本発明において円筒内の風量、風速を変えることは、図12に示した整流用円筒としての筒状部材9B、10Bの内径、長さを変えることで容易に対応し得る。   Further, as a means for uniform suction in the circumferential direction, a punch plate 19B as shown in a partially broken perspective view of the suction member provided with the punch plate of FIG. 14 or a mesh of FIG. 15 is provided instead of the circumferential uniform slit. The object can also be achieved by using a mesh 20B as shown in the partially broken perspective view of the suction member. In the present invention, changing the air volume and speed in the cylinder can be easily handled by changing the inner diameter and length of the cylindrical members 9B and 10B as the rectifying cylinder shown in FIG.

次に実施例により本発明を説明するが、これに限定されるものではない。
(実施例1)
実験の条件は以下の通りである。
a)筒状部材9B、10Bの長さは共に400mm、外径は80mm
b)円筒状基材の移動スピードは20mm/S
c)コータ、乾燥装置間の距離:200mm
d)測定箇所:筒状部材の端部にて測定
e)塗布液 :下記に示すUCL−1塗布液組成物
f)乾燥膜厚:0.1μm
UCL−1塗布液組成物
共重合ナイロン樹脂(CM−8000 東レ社製)
メタノール/n−ブタノール=10/1(Vol比)
これ等の実験は図9、図10、図11、図12に示す装置で行い、筒状部材9B、10Bの内径及び風速を変化させて行った。その結果を表1に示す。
Next, the present invention will be described by way of examples, but the present invention is not limited to these examples.
(Example 1)
The experimental conditions are as follows.
a) The lengths of the cylindrical members 9B and 10B are both 400 mm and the outer diameter is 80 mm.
b) The moving speed of the cylindrical substrate is 20 mm / S.
c) Distance between coater and dryer: 200mm
d) Measurement location: measured at the end of the cylindrical member e) Coating solution: UCL-1 coating solution composition shown below f) Dry film thickness: 0.1 μm
UCL-1 coating liquid composition Copolymer nylon resin (CM-8000, manufactured by Toray Industries, Inc.)
Methanol / n-butanol = 10/1 (Vol ratio)
These experiments were performed with the apparatus shown in FIGS. 9, 10, 11, and 12, and the inner diameters and wind speeds of the cylindrical members 9B and 10B were changed. The results are shown in Table 1.

Figure 2005331987
Figure 2005331987

表1に示す如く、本発明の範囲であれば乾燥に強い風の影響を受けることなくなり、塗布が均一で良好である。
(実施例2)
下記に示すCGL−1塗布液組成物を用いた以外、(実施例1)と同様にし、乾燥膜厚0.2μmになるように塗布した。
CGL−1塗布液組成物
Y型チタニルフタロシアニン(CGM−1)
シリコーン樹脂(KR−5240 信越化学社製)
t−酢酸ブチル
上記塗布液組成物(固形分については固形分重量比CGM−1:KR−5240=2:1に固定)をサンドミルを用いて17時間分散したもの。CGM−1の化学式を化1に示す。
As shown in Table 1, within the range of the present invention, it is not affected by wind strong against drying, and the coating is uniform and good.
(Example 2)
It applied so that it might become a dry film thickness of 0.2 micrometer like (Example 1) except having used the CGL-1 coating liquid composition shown below.
CGL-1 coating solution composition Y-type titanyl phthalocyanine (CGM-1)
Silicone resin (KR-5240, manufactured by Shin-Etsu Chemical Co., Ltd.)
t-Butyl acetate Disperse the above coating liquid composition (solid content weight ratio CGM-1: KR-5240 = 2: 1) using a sand mill for 17 hours. The chemical formula of CGM-1 is shown in Chemical Formula 1.

Figure 2005331987
Figure 2005331987

塗布ムラもなく良好であった。   It was good with no coating unevenness.

なお、上記実施例は電子写真装置の感光体ドラムを製造する際の感光材料含有塗料の乾燥に関し説明されているが、本発明はこれにかぎらず、その他の適宜の塗装乾燥に適用できる。   Although the above embodiment has been described with respect to drying of the photosensitive material-containing paint when manufacturing the photosensitive drum of the electrophotographic apparatus, the present invention is not limited to this and can be applied to other appropriate coating drying.

連続塗布装置の全体構成を示す正面図である。It is a front view which shows the whole structure of a continuous coating device. 図1の塗布手段の断面図である。It is sectional drawing of the application | coating means of FIG. 図1の塗布手段の斜視図である。It is a perspective view of the application means of FIG. 同時重層塗布装置の構成断面図である。It is a structure sectional view of a simultaneous multilayer coating device. 逐次重層塗布装置の構成断面図である。It is a structure sectional view of a sequential multilayer coating device. 位置決め装置と垂直塗布装置の縦断面図である。It is a longitudinal cross-sectional view of a positioning device and a vertical coating device. 上記塗布装置のP−P断面図及びQ−Q断面図である。It is PP sectional drawing and QQ sectional drawing of the said coating device. 位置決め装置の他の各種実施例を示す模式断面図である。It is a schematic cross section showing other various examples of a positioning device. 塗布乾燥装置の全体配置図である。1 is an overall layout diagram of a coating and drying apparatus. コータの一部切断斜視図である。It is a partially cut perspective view of a coater. 円筒状基材とコータの塗布時の状態を表す断面図である。It is sectional drawing showing the state at the time of application | coating of a cylindrical base material and a coater. 乾燥装置の断面図である。It is sectional drawing of a drying apparatus. 吸引スリットを設けた吸引部材の一部破断斜視図である。It is a partially broken perspective view of the suction member provided with the suction slit. パンチ板を設けた吸引部材の一部破断斜視図である。It is a partially broken perspective view of a suction member provided with a punch plate. メッシュを設けた吸引部材の一部破断斜視図である。It is a partially broken perspective view of the suction member provided with the mesh.

符号の説明Explanation of symbols

1,1a,1b 円筒状基材(感光体ドラム)
11 塗布液
12A 塗布液流出口
13A 塗布液分配用スリット
14A 塗布液分配室
12B 吸引チャンバー
13B バッファー空間
14B 空気流
15B 吸引ノズル
16B 吸引スリット
18B 吸引スリット部材(吸引部材)
2,2A 塗布膜
20 位置決め装置(位置決め手段)
21A 外筒部材
22A 内筒部材(フッ素樹脂)
23A 給気口
25A 吐出口
26A 排気口
28A テーパー面
30,32 塗布ヘッド(コータ,塗布手段)
4 ホッパー面
4b,42b 環状端部
6a,6b,6c 塗布液供給口
7 塗布液分配室
8 塗布液分配スリット
9 出口開口部
9B,10B 筒状部材
150 乾燥装置
GP 隙間
G 隙間
1,1a, 1b Cylindrical base material (photosensitive drum)
DESCRIPTION OF SYMBOLS 11 Coating liquid 12A Coating liquid outlet 13A Coating liquid distribution slit 14A Coating liquid distribution chamber 12B Suction chamber 13B Buffer space 14B Air flow 15B Suction nozzle 16B Suction slit 18B Suction slit member (suction member)
2,2A Coating film 20 Positioning device (positioning means)
21A outer cylinder member 22A inner cylinder member (fluororesin)
23A Air supply port 25A Discharge port 26A Exhaust port 28A Tapered surface 30, 32 Application head (coater, application means)
4 hopper surface 4b, 42b annular end 6a, 6b, 6c coating liquid supply port 7 coating liquid distribution chamber 8 coating liquid distribution slit 9 outlet opening 9B, 10B cylindrical member 150 drying device GP gap G gap

Claims (4)

塗布膜を外周面に塗布された円筒状基材を外周にリング状の周方向均一吸引部材を同心に設け筒状部材の挿入開口部より挿入し、前記円筒状基材の挿入時に前記円筒状基材面と同心の前記筒状部材の内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる円筒状基材の乾燥方法において、
前記筒状部材の全長をL0、前記筒状部材の円筒状基材の挿入開口部より前記吸引部材までの距離をL1としたとき、
0.5<L1/L0<1.0
なる条件を満足することを特徴とする円筒状基材の乾燥方法。
A cylindrical base material coated with a coating film on the outer peripheral surface is provided with a ring-shaped circumferentially uniform suction member concentrically on the outer periphery and inserted from an insertion opening of the cylindrical member, and the cylindrical shape is inserted when the cylindrical base material is inserted. In the method of drying a cylindrical base material that sucks a gap between the base material surface and the inner surface of the cylindrical member concentrically to generate an air flow, and promotes drying of the coating film,
When the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical base material of the cylindrical member to the suction member is L 1 ,
0.5 <L 1 / L 0 <1.0
A method for drying a cylindrical substrate characterized by satisfying the following conditions:
更に、前記筒状部材の全長をL0、前記筒状部材の円筒状基材の挿入開口部より前記吸引部材までの距離をL1としたとき、
0.6<L1/L0<0.9
なる条件を満足することを特徴とする請求項1に記載の円筒状基材の乾燥方法。
Furthermore, when the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical base material of the cylindrical member to the suction member is L 1 ,
0.6 <L 1 / L 0 <0.9
The method for drying a cylindrical substrate according to claim 1, wherein the following condition is satisfied.
塗布膜を塗布された円筒状基材を挿入開口部より挿入可能にした筒状部材の外周にリング状の周方向均一で同心の吸引部材を設け、前記円筒状基材を前記挿入開口部へ挿入時に前記円筒状基材面と同心の前記筒状部材内面との隙間部を吸引して気流をおこし、塗布膜の乾燥を促進させる円筒状基材の乾燥装置において、
前記筒状部材の全長をL0とし、前記筒状部材の挿入開口部より前記吸引部材の吸引部までの距離をL1としたとき、
0.5<L1/L0<1.0
なる条件を満足することを特徴とする円筒状基材の乾燥装置。
The cylindrical base material coated with the coating film is provided with a ring-shaped circumferentially uniform and concentric suction member on the outer periphery of the cylindrical member that can be inserted from the insertion opening, and the cylindrical base material is connected to the insertion opening. In the cylindrical substrate drying apparatus that sucks the gap between the cylindrical substrate surface and the inner surface of the cylindrical member concentric at the time of insertion to generate an air flow, and accelerates drying of the coating film,
When the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical member to the suction portion of the suction member is L 1 ,
0.5 <L 1 / L 0 <1.0
A cylindrical substrate drying apparatus characterized by satisfying the following conditions:
更に、前記筒状部材の全長をL0とし、前記筒状部材の挿入開口部より前記吸引部材の吸引部までの距離をL1としたとき、
0.6<L1/L0<0.9
なる条件を満足することを特徴とする請求項3に記載の円筒状基材の乾燥装置。
Furthermore, when the total length of the cylindrical member is L 0 and the distance from the insertion opening of the cylindrical member to the suction portion of the suction member is L 1 ,
0.6 <L 1 / L 0 <0.9
The cylindrical substrate drying apparatus according to claim 3, wherein the following condition is satisfied.
JP2005227778A 2005-08-05 2005-08-05 Cylindrical substrate drying method Expired - Fee Related JP4129597B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005227778A JP4129597B2 (en) 2005-08-05 2005-08-05 Cylindrical substrate drying method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005227778A JP4129597B2 (en) 2005-08-05 2005-08-05 Cylindrical substrate drying method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17587298A Division JP2000005684A (en) 1998-06-23 1998-06-23 Method for coating cylindrical base and coating device therefor

Publications (2)

Publication Number Publication Date
JP2005331987A true JP2005331987A (en) 2005-12-02
JP4129597B2 JP4129597B2 (en) 2008-08-06

Family

ID=35486633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005227778A Expired - Fee Related JP4129597B2 (en) 2005-08-05 2005-08-05 Cylindrical substrate drying method

Country Status (1)

Country Link
JP (1) JP4129597B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9516989B2 (en) 2010-12-14 2016-12-13 Whirlpool Corporation Dishwasher system with a reuse tank

Also Published As

Publication number Publication date
JP4129597B2 (en) 2008-08-06

Similar Documents

Publication Publication Date Title
JP2006043702A (en) Method and apparatus of positioning cylindrical base material
CN102150234B (en) Film-forming apparatus, film-forming method and semiconductor device
US20190122914A1 (en) Device and method for treating substrates using a support roller having a porous material
CN107534011A (en) Substrate diagonal and back protection device
JP4889331B2 (en) Substrate processing apparatus and substrate processing method
JPH11197570A (en) Coating method and coating applicator
JP4129597B2 (en) Cylindrical substrate drying method
US20070187037A1 (en) Semiconductor development apparatus and method using same
KR101218449B1 (en) Substrate processing apparatus
US6716285B1 (en) Spin coating of substrate with chemical
JP5453057B2 (en) Manufacturing method of adhesive tape
JP6915498B2 (en) Nozzle standby device, liquid treatment device, operation method of liquid treatment device, and storage medium
US6613237B2 (en) Apparatus and method for removing matter on a fluid surface of a tank
JP2000005684A (en) Method for coating cylindrical base and coating device therefor
JP3694917B2 (en) Cylindrical substrate positioning method and apparatus
JP3778197B2 (en) Cylindrical substrate positioning method
JP4111213B2 (en) Apparatus and method for coating cylindrical substrate for electrophotographic photosensitive drum
JP7285677B2 (en) Can carrier
JP3709634B2 (en) Continuous coating apparatus and continuous coating method
JP2005313046A (en) Film forming apparatus
JP3661256B2 (en) Continuous coating apparatus and continuous coating method
JP4868404B2 (en) Processing method and processing apparatus
JP3635378B2 (en) Cylindrical substrate positioning method and apparatus
JP3613742B2 (en) Continuous coating apparatus and continuous coating method
JP3588727B2 (en) Method and apparatus for positioning cylindrical substrate

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070731

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070926

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080212

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080319

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080422

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080505

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110530

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110530

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120530

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120530

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130530

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130530

Year of fee payment: 5

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees