JPH10142501A - 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法 - Google Patents

投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法

Info

Publication number
JPH10142501A
JPH10142501A JP8309976A JP30997696A JPH10142501A JP H10142501 A JPH10142501 A JP H10142501A JP 8309976 A JP8309976 A JP 8309976A JP 30997696 A JP30997696 A JP 30997696A JP H10142501 A JPH10142501 A JP H10142501A
Authority
JP
Japan
Prior art keywords
lens
optical system
projection optical
lens group
inclination angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8309976A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10142501A5 (enExample
Inventor
Maiko Takeuchi
麻衣子 武内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8309976A priority Critical patent/JPH10142501A/ja
Publication of JPH10142501A publication Critical patent/JPH10142501A/ja
Publication of JPH10142501A5 publication Critical patent/JPH10142501A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8309976A 1996-11-06 1996-11-06 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法 Pending JPH10142501A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8309976A JPH10142501A (ja) 1996-11-06 1996-11-06 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8309976A JPH10142501A (ja) 1996-11-06 1996-11-06 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH10142501A true JPH10142501A (ja) 1998-05-29
JPH10142501A5 JPH10142501A5 (enExample) 2004-12-24

Family

ID=17999644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8309976A Pending JPH10142501A (ja) 1996-11-06 1996-11-06 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH10142501A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023934A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6606144B1 (en) 1999-09-29 2003-08-12 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6710930B2 (en) 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus
JP2004226956A (ja) * 2002-11-28 2004-08-12 Pentax Corp 像シフト装置
US6912094B2 (en) 2001-03-27 2005-06-28 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method
JP2009038152A (ja) * 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
CN113835209A (zh) * 2021-11-19 2021-12-24 中导光电设备股份有限公司 一种大视场duv物镜

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001023934A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
US6606144B1 (en) 1999-09-29 2003-08-12 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6674513B2 (en) 1999-09-29 2004-01-06 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6864961B2 (en) 1999-09-29 2005-03-08 Nikon Corporation Projection exposure methods and apparatus, and projection optical systems
US6710930B2 (en) 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus
US6912094B2 (en) 2001-03-27 2005-06-28 Nikon Corporation Projection optical system, a projection exposure apparatus, and a projection exposure method
JP2004226956A (ja) * 2002-11-28 2004-08-12 Pentax Corp 像シフト装置
JP2009038152A (ja) * 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
TWI397781B (zh) * 2007-07-31 2013-06-01 Canon Kk Optical system, exposure apparatus and apparatus manufacturing method
CN113835209A (zh) * 2021-11-19 2021-12-24 中导光电设备股份有限公司 一种大视场duv物镜
CN113835209B (zh) * 2021-11-19 2024-04-26 中导光电设备股份有限公司 一种大视场duv物镜

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