JPH10116769A5 - - Google Patents

Info

Publication number
JPH10116769A5
JPH10116769A5 JP1996270601A JP27060196A JPH10116769A5 JP H10116769 A5 JPH10116769 A5 JP H10116769A5 JP 1996270601 A JP1996270601 A JP 1996270601A JP 27060196 A JP27060196 A JP 27060196A JP H10116769 A5 JPH10116769 A5 JP H10116769A5
Authority
JP
Japan
Prior art keywords
imaging
exposure apparatus
reticle
alignment
projection exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996270601A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10116769A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8270601A priority Critical patent/JPH10116769A/ja
Priority claimed from JP8270601A external-priority patent/JPH10116769A/ja
Publication of JPH10116769A publication Critical patent/JPH10116769A/ja
Publication of JPH10116769A5 publication Critical patent/JPH10116769A5/ja
Pending legal-status Critical Current

Links

JP8270601A 1996-10-14 1996-10-14 投影露光装置 Pending JPH10116769A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8270601A JPH10116769A (ja) 1996-10-14 1996-10-14 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8270601A JPH10116769A (ja) 1996-10-14 1996-10-14 投影露光装置

Publications (2)

Publication Number Publication Date
JPH10116769A JPH10116769A (ja) 1998-05-06
JPH10116769A5 true JPH10116769A5 (enExample) 2004-10-21

Family

ID=17488377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8270601A Pending JPH10116769A (ja) 1996-10-14 1996-10-14 投影露光装置

Country Status (1)

Country Link
JP (1) JPH10116769A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5121096B2 (ja) * 2001-04-27 2013-01-16 キヤノン株式会社 合焦位置検出方法、合焦位置検出装置及び露光装置
JP4658589B2 (ja) * 2004-12-28 2011-03-23 Ｏｋｉセミコンダクタ株式会社 半導体装置の製造方法
JP2023136106A (ja) * 2022-03-16 2023-09-29 キヤノン株式会社 計測装置、露光装置、及び物品の製造方法

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